US8444281B2 - Optical device - Google Patents

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US8444281B2
US8444281B2 US12/801,254 US80125410A US8444281B2 US 8444281 B2 US8444281 B2 US 8444281B2 US 80125410 A US80125410 A US 80125410A US 8444281 B2 US8444281 B2 US 8444281B2
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silicon
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optical device
reflecting mirror
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US20100309570A1 (en
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Katsuhiko Tsuno
Shoko Suyama
Yoshiyasu Ito
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NEC Corp
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NEC Space Technologies Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0652Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • CCHEMISTRY; METALLURGY
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    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/56Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
    • C04B35/565Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
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    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/56Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
    • C04B35/565Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
    • C04B35/573Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide obtained by reaction sintering or recrystallisation
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    • C04B37/00Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/003Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts
    • C04B37/005Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts consisting of glass or ceramic material
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    • C04B37/00Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/003Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts
    • C04B37/006Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts consisting of metals or metal salts
    • CCHEMISTRY; METALLURGY
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    • C04B37/00Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/008Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of an organic adhesive, e.g. phenol resin or pitch
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B23/00Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
    • G02B23/16Housings; Caps; Mountings; Supports, e.g. with counterweight
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/183Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors specially adapted for very large mirrors, e.g. for astronomy, or solar concentrators
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/38Non-oxide ceramic constituents or additives
    • C04B2235/3817Carbides
    • C04B2235/3826Silicon carbides
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/42Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
    • C04B2235/422Carbon
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/42Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
    • C04B2235/428Silicon
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/60Aspects relating to the preparation, properties or mechanical treatment of green bodies or pre-forms
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    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/04Ceramic interlayers
    • C04B2237/08Non-oxidic interlayers
    • C04B2237/083Carbide interlayers, e.g. silicon carbide interlayers
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    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/16Silicon interlayers
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    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32Ceramic
    • C04B2237/36Non-oxidic
    • C04B2237/365Silicon carbide
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    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/52Pre-treatment of the joining surfaces, e.g. cleaning, machining
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/52Pre-treatment of the joining surfaces, e.g. cleaning, machining
    • C04B2237/525Pre-treatment of the joining surfaces, e.g. cleaning, machining by heating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12993Surface feature [e.g., rough, mirror]

Definitions

  • the present invention relates to an optical device, and more particularly to an optical device having an optical reflecting mirror.
  • Patent Document 1 Japanese laid-open patent publication No. 2004-317647
  • an optical device includes a reflecting mirror which has plurality of segments joined to each other.
  • the segments are formed of a particle-dispersed silicon material including silicon carbide and silicon. Therefore, it is possible to shorten the time required for processing each segment and to reduce a rate of defective products due to breakage. Accordingly, the cost of an optical reflecting mirror can be reduced.
  • FIG. 1 is a view explanatory of an optical reflecting mirror according to an embodiment of the present invention
  • FIG. 2 is a view showing an arrangement of an optical device using the optical reflecting mirror of FIG. 1 ;
  • FIG. 3 is a perspective view of the optical device of FIG. 2 ;
  • FIG. 4 is a perspective view explanatory of a structure of a support portion for the optical reflecting mirror in the optical device of FIG. 2 ;
  • FIG. 5 is an exploded perspective view showing the support portion of FIG. 4 ;
  • FIG. 6 is a perspective view showing a structure of an optical bench used in the optical device of FIG. 2 ;
  • FIG. 7 is an exploded perspective view showing the optical bench of FIG. 6 .
  • FIG. 1 shows an optical reflecting mirror 10 used in an optical device according to the present invention.
  • the optical reflecting mirror 10 is formed by joining three segments 11 , 12 , and 13 to each other.
  • Each of the segments 11 - 13 is formed of a particle-dispersed silicon material.
  • a particle-dispersed silicon material is disclosed in Japanese laid-open patent publication No. 2001-348288 as well as Patent Document 1.
  • a particle-dispersed silicon material has a flexural strength twice or more than that of a usual silicon carbide ceramic (e.g., 800 MPa or higher). Furthermore, a particle-dispersed silicon material has a dense structure without pores. Therefore, an optical reflecting mirror can be produced by polishing a surface of a particle-dispersed silicon material without coating the material with a different kind of a dense material.
  • a base material for the segment using a particle-dispersed silicon material (a material to be polished) is produced as follows.
  • a silicon carbide powder, a carbon powder, and a binder are mixed into a material powder.
  • the processed compact is supplied into a kiln along with silicon and heated at a temperature that is equal to or higher than the melting temperature of silicon.
  • the molten silicon reacts with carbon of the initial material, thereby producing silicon carbide.
  • a base material for the segment that is formed of a particle-dispersed silicon material including silicon carbide of the initial material, silicon carbide produced by the reaction, and excess silicon.
  • the resultant particle-dispersed silicon material hardly exhibits shrinkage at the time of burning. Therefore, it is possible to obtain a base material having a shape close to that of a final product of the segment.
  • the compact obtained by cold isostatic press has low strength because it has been formed of powder pressed under pressure in the above manufacturing process. Therefore, if a base material is produced integrally for a large reflecting mirror, it may be broken by the weight of the compact. Furthermore, breakage may be caused by difficult handling. According to the present embodiment, a base material is produced for each of a plurality of segments. Therefore, it is possible to reduce the possibility of the breakage.
  • an integrally formed compact has a weight of more than 300 kg.
  • a compact for each segment has a weight of about 100 kg. This weight difference mitigates the requirements for the strength of tools used in the manufacturing process or the like. After the integrally formed compact is processed, it has a weight of about 30 kg. After the compact for each segment is processed, it has a weight of about 10 kg.
  • the probability of breakage of the compact is increased if the process time becomes longer. As the compact (the process area) is larger, the process time for the compact becomes longer.
  • the reflecting mirror is manufactured from a plurality of divided segments. Since each segment requires a shorter process time, the probability of breakage can be reduced.
  • a yield of processing an integrally formed compact of a reflecting mirror is 50%.
  • the probability of getting at least one completed reflecting mirror is 75%.
  • a yield of processing a single segment of three divided segments is in proportion to the process time (i.e., the process area) and is thus about 79%, which is higher than that of the integrally formed compact.
  • the probability of getting three good products is about 81%.
  • a yield of producing a reflecting mirror by connecting those segments to each other is 90%, the probability of getting one completed product from four segments is about 73%.
  • the segments produced as described above are joined to each other so as to form an optical reflecting mirror.
  • the technology disclosed in Japanese laid-open patent publications Nos. 2005-22905 and 2008-137830 can be used to join those segments to each other.
  • the segments are joined as follows.
  • Si is removed from bonding surfaces 14 of the segments 11 - 13 by heat treatment or chemical treatment.
  • An organic adhesive agent is applied to the boding surfaces 14 .
  • the segments are bonded to each other so as to form a joined body.
  • heat treatment is performed so that the organic adhesive agent has a porous structure.
  • the joined body is heated to a temperature that is equal to or higher than the melting point of Si so as to impregnate the molten Si.
  • the porous structure is subjected to reaction sintering, so that the segments 11 - 13 are integrated.
  • the organic adhesive agent may include silicon carbide powder (and carbon powder).
  • the segments may be bonded by an adhesive agent before they are sintered. Thus, sintering of the segments and reaction sintering of the joined portions may be conducted simultaneously.
  • the integrated optical reflecting mirror is subjected to necessary processes such as mirror polishing and is used, for example, as a primary mirror 21 of an optical device shown in FIGS. 2 and 3 (a reflecting telescope in this example).
  • the illustrated optical device includes an optical bench 20 (i.e. an optical device structure), a primary mirror 21 , a secondary mirror 22 , a tertiary mirror 23 , a fold mirror (quaternary mirror) 24 , a fold mirror (quinary mirror) 25 , a fold mirror (senary mirror) 26 , and a focal plane 27 .
  • the primary mirror 21 , the secondary mirror 22 , the tertiary mirror 23 , the fold mirrors 24 - 26 , and the focal plane 27 are provided on the optical bench 20 .
  • an optical device such as a reflecting telescope
  • an athermal method of forming the entire optical device including a body tube, of the same material so that the characteristics of the optical device do not depend upon the temperature.
  • the entire optical device is formed of the same material having the same coefficient of linear expansion, the entire device is maintained to have a similar shape as long as the temperature of the entire device is maintained uniformly even if the temperature of the entire device is varied.
  • the focus of the telescope remains at the same position relative to the optical device. Therefore, when a film or a detector is arranged at such a position, an obtained image is in good focus if the temperature of the device is maintained uniformly. In other words, such a device has thermal stability.
  • the coefficient of linear expansion of a particle-dispersed silicon material is 2.5 ⁇ 10 ⁇ 6 K ⁇ 1 , which is lower than that of metal. Furthermore, a particle-dispersed silicon material has high thermal conductivity. Thus, a particle-dispersed silicon material is a suitable material for athermal design. In a case of an optical device produced by using a particle-dispersed silicon material, the entire device can readily be maintained at a uniform temperature. Even if any temperature variation is produced, only a small strain is caused by the temperature variation. Components of the optical device shown in FIGS. 2 and 3 are formed of a particle-dispersed silicon material, which is the same as a material of the primary mirror. Those components are joined to each other by the aforementioned reaction sintering.
  • Some components require an assembling precision of 1 micrometer or less (sometimes 10 nm or less). Furthermore, adjustment of the reflecting mirror is essentially required. Therefore, not all of the components can be joined to each other by reaction sintering. Components that cannot be joined to each other are joined by fastening bolts or the like with an adhesive agent or a thermal conductive sheet having a high thermal conductivity. With such a method, it is possible to achieve the uniformity of the temperature and to provide a high-performance optical device.
  • an attachment flange 42 is attached to a rear face of an optical reflecting mirror 41 via a pipe 43 and a support plate (triangular plate) 44 .
  • the flange 42 , the pipe 43 and the support plate 44 are form a support portion.
  • the attachment flange 42 and the pipe 43 , the pipe 43 and the support plate 44 , and the support plate 44 and the reflecting mirror 41 are respectively joined to each other by the aforementioned reaction sintering.
  • the optical bench 20 may have a honeycomb structure as shown in FIG. 6 to achieve sufficient stiffness and weight reduction.
  • the optical bench 20 may have a plurality of components, i.e., a core 71 of a honeycomb structure and surface plates 72 and 73 covering upper and lower surfaces of the core 71 .
  • Those components can be produced by using a particle-dispersed silicon material and can be joined to each other by reaction sintering with the same method as described in connection with the optical reflecting mirror.
  • the core 71 may be divided into a plurality of segments to shorten the process time, reduce the amount of material used, and reduce the cost as in the case of production of the reflecting mirror.
  • the optical reflecting mirror is divided into three segments in the above embodiment. Nevertheless, the optical reflecting mirror may be divided into two segments, or four or more segments in consideration of the weight and shape of the optical reflecting mirror.
  • the present invention is applicable to optical devices that require high stability, such as a telescope mounted on a spacecraft, a telescope mounted on an aircraft, a ground astronomical telescope, and a semiconductor exposure apparatus.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Astronomy & Astrophysics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
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CN103217777B (zh) * 2013-04-12 2015-01-07 中国科学院西安光学精密机械研究所 一种大口径主反射镜
CN103983223B (zh) * 2014-05-04 2017-04-12 中国科学院长春光学精密机械与物理研究所 液压支撑主镜位置测量装置和测量方法
JP6079906B2 (ja) * 2016-01-06 2017-02-15 三菱電機株式会社 軽量化ミラー
CN106646817B (zh) * 2016-12-08 2019-05-07 中国科学院长春光学精密机械与物理研究所 基于静压原理的望远镜主镜芯轴机构及注油方法
JP6995030B2 (ja) * 2018-08-30 2022-01-14 京セラ株式会社 ミラー
US11579431B2 (en) * 2020-01-15 2023-02-14 Sheltered Wings, Inc. Viewing optic with contours
US20230373871A1 (en) * 2022-05-18 2023-11-23 Ii-Vi Delaware, Inc. Reaction-bonded silicon-carbide with in-situ formed silicon layer for optical finishing

Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4214818A (en) * 1978-11-08 1980-07-29 Westinghouse Electric Corp. Hot pressed SiC-high power laser mirror
US4443059A (en) * 1982-01-13 1984-04-17 The United States Of America As Represented By The Secretary Of The Air Force High energy laser mirror
US4825062A (en) * 1987-10-29 1989-04-25 Kaman Aerospace Corporation Extendable large aperture phased array mirror system
DE3934546A1 (de) 1989-10-17 1991-04-18 Zeiss Carl Fa Verfahren zum verbinden von segmenten eines koerpers, vorrichtungen zur durchfuehrung des verfahrens sowie ein mittels des verfahrens hergestellter spiegel
EP0642040A1 (fr) 1993-09-02 1995-03-08 Industrieanlagen-Betriebsgesellschaft M.B.H. Réflecteur et méthode de fabrication d'un réflecteur
JPH0894813A (ja) 1993-09-30 1996-04-12 Shinetsu Quartz Prod Co Ltd 軽量反射鏡
DE19962831A1 (de) 1999-12-23 2001-07-12 Dlr Ev Teleskop
DE10035111A1 (de) 2000-03-24 2001-10-31 Industrieanlagen Betriebsges Ultra-Leichtgewichts-Träger und Verfahren zu seiner Herstellung
JP2001348288A (ja) 2000-06-05 2001-12-18 Toshiba Corp 粒子分散シリコン材料およびその製造方法
JP2004317647A (ja) 2003-04-14 2004-11-11 Nec Toshiba Space Systems Ltd 鏡面母材及びそれを用いた鏡体及び、鏡体を用いた光学装置
JP2005022905A (ja) 2003-06-30 2005-01-27 Toshiba Corp 炭化ケイ素基接合部品とその製造方法
JP2005195706A (ja) 2003-12-26 2005-07-21 Hisanori Sako 分解組み立て可能凹面鏡
JP2005234344A (ja) 2004-02-20 2005-09-02 Taiheiyo Cement Corp 天体望遠鏡用ミラー
US20060158753A1 (en) * 2005-01-19 2006-07-20 Ealey Mark A Active hybrid optical component
US7244034B1 (en) * 1999-08-20 2007-07-17 M Cubed Technologies, Inc. Low CTE metal-ceramic composite articles, and methods for making same
US20080043352A1 (en) 2006-06-20 2008-02-21 Tong Liu Lightweight mirrors and methods of manufacturing lightweight mirrors
US20080131665A1 (en) 2006-11-30 2008-06-05 Shoko Suyama Ceramics composite member and method of producing the same
US20090039536A1 (en) * 2003-02-12 2009-02-12 Texas Instruments Incorporated Electrical Connections in Microelectromechanical Devices
JP2009205108A (ja) 2008-02-29 2009-09-10 Mitsubishi Electric Corp 軽量化ミラーおよびその製造方法
US7740362B1 (en) * 2008-02-19 2010-06-22 Jefferson Science Associates Mirror with thermally controlled radius of curvature
US20100279446A1 (en) * 2005-03-07 2010-11-04 Joseph Reid Henrichs Optical phase conjugation laser diode
US20110309271A1 (en) * 2010-06-16 2011-12-22 Gigaphoton Inc. Spectral purity filter and extreme ultraviolet light generation apparatus provided with the spectral purity filter

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4261130B2 (ja) * 2002-06-18 2009-04-30 株式会社東芝 シリコン/炭化ケイ素複合材料
JP2006027946A (ja) * 2004-07-15 2006-02-02 Toshiba Corp 炭化ケイ素系接合構造体、炭化ケイ素系接合構造体の製造方法および炭化ケイ素系接合構造体の製造装置

Patent Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4214818A (en) * 1978-11-08 1980-07-29 Westinghouse Electric Corp. Hot pressed SiC-high power laser mirror
US4443059A (en) * 1982-01-13 1984-04-17 The United States Of America As Represented By The Secretary Of The Air Force High energy laser mirror
US4825062A (en) * 1987-10-29 1989-04-25 Kaman Aerospace Corporation Extendable large aperture phased array mirror system
DE3934546A1 (de) 1989-10-17 1991-04-18 Zeiss Carl Fa Verfahren zum verbinden von segmenten eines koerpers, vorrichtungen zur durchfuehrung des verfahrens sowie ein mittels des verfahrens hergestellter spiegel
EP0642040A1 (fr) 1993-09-02 1995-03-08 Industrieanlagen-Betriebsgesellschaft M.B.H. Réflecteur et méthode de fabrication d'un réflecteur
JPH0821905A (ja) 1993-09-02 1996-01-23 Ind Anlagen Betriebs Gmbh 反射体及びその製造方法
JPH0894813A (ja) 1993-09-30 1996-04-12 Shinetsu Quartz Prod Co Ltd 軽量反射鏡
US7244034B1 (en) * 1999-08-20 2007-07-17 M Cubed Technologies, Inc. Low CTE metal-ceramic composite articles, and methods for making same
DE19962831A1 (de) 1999-12-23 2001-07-12 Dlr Ev Teleskop
DE10035111A1 (de) 2000-03-24 2001-10-31 Industrieanlagen Betriebsges Ultra-Leichtgewichts-Träger und Verfahren zu seiner Herstellung
JP2001348288A (ja) 2000-06-05 2001-12-18 Toshiba Corp 粒子分散シリコン材料およびその製造方法
US20090039536A1 (en) * 2003-02-12 2009-02-12 Texas Instruments Incorporated Electrical Connections in Microelectromechanical Devices
JP2004317647A (ja) 2003-04-14 2004-11-11 Nec Toshiba Space Systems Ltd 鏡面母材及びそれを用いた鏡体及び、鏡体を用いた光学装置
US20040246610A1 (en) 2003-04-14 2004-12-09 Nec Toshiba Space Systems, Ltd. Mirror substrate, mirror body using the same, and optical device using mirror body
JP2005022905A (ja) 2003-06-30 2005-01-27 Toshiba Corp 炭化ケイ素基接合部品とその製造方法
JP2005195706A (ja) 2003-12-26 2005-07-21 Hisanori Sako 分解組み立て可能凹面鏡
JP2005234344A (ja) 2004-02-20 2005-09-02 Taiheiyo Cement Corp 天体望遠鏡用ミラー
US20060158753A1 (en) * 2005-01-19 2006-07-20 Ealey Mark A Active hybrid optical component
US20100279446A1 (en) * 2005-03-07 2010-11-04 Joseph Reid Henrichs Optical phase conjugation laser diode
US20080043352A1 (en) 2006-06-20 2008-02-21 Tong Liu Lightweight mirrors and methods of manufacturing lightweight mirrors
US20080131665A1 (en) 2006-11-30 2008-06-05 Shoko Suyama Ceramics composite member and method of producing the same
JP2008137830A (ja) 2006-11-30 2008-06-19 Toshiba Corp セラミックス複合部材とその製造方法
US7740362B1 (en) * 2008-02-19 2010-06-22 Jefferson Science Associates Mirror with thermally controlled radius of curvature
JP2009205108A (ja) 2008-02-29 2009-09-10 Mitsubishi Electric Corp 軽量化ミラーおよびその製造方法
US20110309271A1 (en) * 2010-06-16 2011-12-22 Gigaphoton Inc. Spectral purity filter and extreme ultraviolet light generation apparatus provided with the spectral purity filter

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
B. Harnisch, et al., "Ultra-lightweight C/SiC Mirrors and Structures", ESA Bulletin, ESA Scientific and Publications Branch, Noordwijk, NL, No. 95, Aug. 1, 1998, pp. 108-112, XP000776670.
European Search Report dated Aug. 3, 2010.
Japanese Office Action dated Feb. 6, 2013 with partial translation thereof.
Shoko Suyama, et al, "Nanostructured Joining Technology for High-Strength Reaction-Sintered Silicon Carbide", Toshiba Review, Japan, 2008, vol. 63, No. 2, pp. 11-14.

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