US20150144900A1 - Layered structure for oled device, method for manufacturing the same, and oled device having the same - Google Patents

Layered structure for oled device, method for manufacturing the same, and oled device having the same Download PDF

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Publication number
US20150144900A1
US20150144900A1 US14/408,154 US201314408154A US2015144900A1 US 20150144900 A1 US20150144900 A1 US 20150144900A1 US 201314408154 A US201314408154 A US 201314408154A US 2015144900 A1 US2015144900 A1 US 2015144900A1
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Prior art keywords
light
layer
oled device
internal extraction
extraction layer
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US14/408,154
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Young Seong Lee
Jin Woo Han
Ji Woong Baek
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Saint Gobain Glass France SAS
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Saint Gobain Glass France SAS
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Priority to US14/408,154 priority Critical patent/US20150144900A1/en
Assigned to SAINT-GOBAIN GLASS FRANCE reassignment SAINT-GOBAIN GLASS FRANCE ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BAEK, JI WOONG, HAN, JIN WOO, LEE, YOUNG SEONG
Publication of US20150144900A1 publication Critical patent/US20150144900A1/en
Abandoned legal-status Critical Current

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    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24496—Foamed or cellular component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249961—With gradual property change within a component
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Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140353705A1 (en) * 2012-03-23 2014-12-04 Sharp Kabushiki Kaisha Semiconductor light emitting element, method of manufacturing semiconductor light emitting element, semiconductor light emitting device and substrate
US20150270512A1 (en) * 2012-10-11 2015-09-24 Panasonic Intellectual Property Management Co., Ltd. Organic electroluminescence element and lighting device
US20170003547A1 (en) * 2014-03-14 2017-01-05 Toppan Printing Co., Ltd. El element, el element substrate, lighting device, display device, and liquid crystal display device
US20170358776A1 (en) * 2014-12-29 2017-12-14 Corning Precision Materials Co., Ltd. Method for manufacturing light extraction substrate for organic light emitting element, light extraction substrate for organic light emitting element, and organic light emitting element including same
US20170373275A1 (en) * 2014-12-18 2017-12-28 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Barrier film laminate comprising submicron getter particles and electronic device comprising such a laminate
US20190019976A1 (en) * 2017-07-11 2019-01-17 Lg Display Co., Ltd. Lighting apparatus using organic light-emitting diode
US10319934B2 (en) * 2014-04-22 2019-06-11 Saint-Gobain Glass France Transparent supported electrode for OLED
US10361398B2 (en) 2014-12-01 2019-07-23 Saint-Gobain Glass France Transparent diffusive OLED substrate and method for producing such a substrate
CN110115106A (zh) * 2016-12-28 2019-08-09 Dic株式会社 发光元件和使用其的图像显示元件
US10794569B2 (en) * 2017-03-02 2020-10-06 Panasonic Intellectual Property Management Co., Ltd. Wavelength conversion member, light source and lighting device
US11018322B2 (en) * 2018-12-21 2021-05-25 Lg Display Co., Ltd. Light emitting device using light emitting diode
WO2021217738A1 (zh) * 2020-04-28 2021-11-04 Tcl华星光电技术有限公司 一种显示面板及其制备方法、显示装置
US20220052118A1 (en) * 2020-08-12 2022-02-17 Samsung Display Co., Ltd. Display apparatus
US11690249B2 (en) * 2018-05-28 2023-06-27 Corning Incorporated Light extraction substrate of organic light-emitting device and method of fabricating the same

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6080386B2 (ja) * 2012-05-23 2017-02-15 キヤノン株式会社 光学部材、撮像装置及び光学部材の製造方法
ES2693105T3 (es) * 2013-05-17 2018-12-07 Saint-Gobain Glass France Sustrato OLED difusivo transparente y método para producir semejante sustrato
EP2803644B1 (en) * 2013-05-17 2018-08-08 Saint-Gobain Glass France Transparent diffusive oled substrate and method for producing such a substrate
CN104009062B (zh) * 2014-04-23 2015-04-29 京东方科技集团股份有限公司 彩膜基板及制备方法、有机电致发光显示面板、显示装置
ES2625733T3 (es) 2014-07-16 2017-07-20 Saint-Gobain Glass France Sustrato OLED difusor transparente y método para producir dicho sustrato
EP3082172A1 (en) 2015-04-16 2016-10-19 Saint-Gobain Glass France Layered structure for an oled and a method for producing such a structure
KR102459950B1 (ko) * 2015-12-22 2022-10-27 엘지이노텍 주식회사 형광체 플레이트 패키지
DE102016113962A1 (de) * 2016-07-28 2018-02-01 Osram Oled Gmbh Strahlungsemittierendes Bauelement und Verfahren zur Herstellung eines strahlungsemittierenden Bauelements
WO2018102512A1 (en) 2016-11-30 2018-06-07 Corning Incorporated Textured glass for light extraction enhancement of oled lighting
CN108512029B (zh) * 2018-04-16 2020-03-24 齐鲁工业大学 一种基于非晶铋酸盐的超宽带随机激光散射材料、激光器件及制备与应用
CN112670323B (zh) * 2020-12-22 2022-12-09 湖北长江新型显示产业创新中心有限公司 显示面板及其制作方法、显示装置
US11626576B2 (en) 2021-06-15 2023-04-11 Sharp Kabushiki Kaisha Layered light-emitting structure with roughened interface

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090153972A1 (en) * 2007-07-27 2009-06-18 Asahi Glass Company Limited Translucent substrate, process for producing the same, organic led element and process for producing the same
US20090247385A1 (en) * 2008-03-28 2009-10-01 Asahi Glass Company, Limited Frit
US20110001159A1 (en) * 2008-03-18 2011-01-06 Asahi Glass Company, Limited Substrate for electronic device, layered body for organic led element, method for manufacturing the same, organic led element, and method for manufacturing the same
US20110156063A1 (en) * 2009-12-28 2011-06-30 Au Optronics Corp. Organic light emitting diode (oled) display device
US20120194065A1 (en) * 2009-10-15 2012-08-02 Asahi Glass Company, Limited Organic led element, glass frit for diffusion layer for use in organic led element, and method for production of diffusion layer for use in organic led element

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1638585A (zh) * 2003-12-26 2005-07-13 日东电工株式会社 电致发光装置，平面光源和使用该平面光源的显示器
JP4564773B2 (ja) 2004-04-07 2010-10-20 株式会社 日立ディスプレイズ 発光素子及びその表示装置
JP4231501B2 (ja) * 2005-10-12 2009-03-04 株式会社オハラ 光学ガラス
CN101855939B (zh) * 2007-11-09 2012-04-25 旭硝子株式会社 透光性基板、其制造方法、有机led元件及其制造方法
JP2009245786A (ja) * 2008-03-31 2009-10-22 Rohm Co Ltd 有機ｅｌ素子
JP5258436B2 (ja) * 2008-07-30 2013-08-07 株式会社東芝 表示装置及びその製造方法
JP2010170969A (ja) * 2009-01-26 2010-08-05 Asahi Glass Co Ltd 電極付き基板、その製造方法、有機ｌｅｄ素子およびその製造方法
IN2012DN03223A (zh) 2009-10-15 2015-10-23 Asahi Glass Co Ltd
FR2955575B1 (fr) * 2010-01-22 2012-02-24 Saint Gobain Substrat verrier revetu d'une couche haut indice sous un revetement electrode et dispositif electroluminescent organique comportant un tel substrat.
KR20120007472A (ko) * 2010-07-14 2012-01-20 엘티씨 (주) 높은 광추출 성능을 갖는 무기 산란막
JP2013539158A (ja) * 2010-07-16 2013-10-17 エージーシー グラス ユーロップ 有機発光デバイスのための半透明導電性基板
FR2963705B1 (fr) * 2010-08-06 2012-08-17 Saint Gobain Support a couche diffusante pour dispositif a diode electroluminescente organique, dispositif electroluminescent organique comportant un tel support
KR20120024358A (ko) * 2010-09-06 2012-03-14 주식회사 엘지화학 유기전자소자용 기판 및 그 제조방법
KR20130061206A (ko) * 2011-12-01 2013-06-11 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조방법
US9269536B2 (en) * 2012-04-17 2016-02-23 Varian Semiconductor Equipment Associates, Inc. Double ended electrode manipulator
JP6320994B2 (ja) * 2012-04-20 2018-05-09 フィリップス ライティング ホールディング ビー ヴィ 制御可能な照明のための時分割多重化切り替え可能光学素子のためのデバイス及び方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090153972A1 (en) * 2007-07-27 2009-06-18 Asahi Glass Company Limited Translucent substrate, process for producing the same, organic led element and process for producing the same
US20110001159A1 (en) * 2008-03-18 2011-01-06 Asahi Glass Company, Limited Substrate for electronic device, layered body for organic led element, method for manufacturing the same, organic led element, and method for manufacturing the same
US20090247385A1 (en) * 2008-03-28 2009-10-01 Asahi Glass Company, Limited Frit
US20120194065A1 (en) * 2009-10-15 2012-08-02 Asahi Glass Company, Limited Organic led element, glass frit for diffusion layer for use in organic led element, and method for production of diffusion layer for use in organic led element
US20110156063A1 (en) * 2009-12-28 2011-06-30 Au Optronics Corp. Organic light emitting diode (oled) display device

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140353705A1 (en) * 2012-03-23 2014-12-04 Sharp Kabushiki Kaisha Semiconductor light emitting element, method of manufacturing semiconductor light emitting element, semiconductor light emitting device and substrate
US20150270512A1 (en) * 2012-10-11 2015-09-24 Panasonic Intellectual Property Management Co., Ltd. Organic electroluminescence element and lighting device
US9620740B2 (en) * 2012-10-11 2017-04-11 Panasonic Intellectual Property Management Co., Ltd. Organic electroluminescence element and lighting device
US10705378B2 (en) * 2014-03-14 2020-07-07 Toppan Printing Co., Ltd. EL element, EL element substrate, lighting device, display device, and liquid crystal display device
US20170003547A1 (en) * 2014-03-14 2017-01-05 Toppan Printing Co., Ltd. El element, el element substrate, lighting device, display device, and liquid crystal display device
US10319934B2 (en) * 2014-04-22 2019-06-11 Saint-Gobain Glass France Transparent supported electrode for OLED
US10361398B2 (en) 2014-12-01 2019-07-23 Saint-Gobain Glass France Transparent diffusive OLED substrate and method for producing such a substrate
US20170373275A1 (en) * 2014-12-18 2017-12-28 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Barrier film laminate comprising submicron getter particles and electronic device comprising such a laminate
US20210234130A1 (en) * 2014-12-18 2021-07-29 Basf Coatings Gmbh Barrier Film Laminate Comprising Submicron Getter Particles and Electronic Device Comprising Such a Laminate
US20170358776A1 (en) * 2014-12-29 2017-12-14 Corning Precision Materials Co., Ltd. Method for manufacturing light extraction substrate for organic light emitting element, light extraction substrate for organic light emitting element, and organic light emitting element including same
US9893320B2 (en) * 2014-12-29 2018-02-13 Corning Precision Materials Co., Ltd. Method for manufacturing light extraction substrate for organic light emitting element, light extraction substrate for organic light emitting element, and organic light emitting element including same
CN110115106A (zh) * 2016-12-28 2019-08-09 Dic株式会社 发光元件和使用其的图像显示元件
US20190393273A1 (en) * 2016-12-28 2019-12-26 Dic Corporation Light-emitting device and image display apparatus including the same
US11049911B2 (en) * 2016-12-28 2021-06-29 Dic Corporation Light-emitting device and image display apparatus including the same
US10794569B2 (en) * 2017-03-02 2020-10-06 Panasonic Intellectual Property Management Co., Ltd. Wavelength conversion member, light source and lighting device
US10497891B2 (en) * 2017-07-11 2019-12-03 Lg Display Co., Ltd. Lighting apparatus using organic light-emitting diode
US20190019976A1 (en) * 2017-07-11 2019-01-17 Lg Display Co., Ltd. Lighting apparatus using organic light-emitting diode
US11690249B2 (en) * 2018-05-28 2023-06-27 Corning Incorporated Light extraction substrate of organic light-emitting device and method of fabricating the same
US11018322B2 (en) * 2018-12-21 2021-05-25 Lg Display Co., Ltd. Light emitting device using light emitting diode
WO2021217738A1 (zh) * 2020-04-28 2021-11-04 Tcl华星光电技术有限公司 一种显示面板及其制备方法、显示装置
US20220052118A1 (en) * 2020-08-12 2022-02-17 Samsung Display Co., Ltd. Display apparatus
US11839129B2 (en) * 2020-08-12 2023-12-05 Samsung Display Co., Ltd. Display apparatus including a low refractive index layer

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US20150179979A1 (en) 2015-06-25
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EP2862213A1 (en) 2015-04-22
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JP2015523690A (ja) 2015-08-13
WO2013187735A1 (en) 2013-12-19
EA201590012A1 (ru) 2015-07-30
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EP2862212B1 (en) 2021-03-17

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