US20070051668A1 - Apatite and method for producing the same, and apatite base material - Google Patents

Apatite and method for producing the same, and apatite base material Download PDF

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US20070051668A1
US20070051668A1 US11/594,829 US59482906A US2007051668A1 US 20070051668 A1 US20070051668 A1 US 20070051668A1 US 59482906 A US59482906 A US 59482906A US 2007051668 A1 US2007051668 A1 US 2007051668A1
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apatite
metal atoms
atoms
metal
visible light
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Toshiya Watanabe
Masato Wakamura
Yasuo Naganuma
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Fujitsu Ltd
University of Tokyo NUC
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Fujitsu Ltd
University of Tokyo NUC
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Assigned to FUJITSU LIMITED, THE UNIVERSITY OF TOKYO reassignment FUJITSU LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: WATANABE, TOSHIYA, NAGANUMA, YASUO, WAKAMURA, MASATO
Publication of US20070051668A1 publication Critical patent/US20070051668A1/en
Priority to US13/067,816 priority Critical patent/US8846563B2/en
Abandoned legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00—Phosphorus; Compounds thereof
    • C01B25/16—Oxyacids of phosphorus; Salts thereof
    • C01B25/26—Phosphates
    • C01B25/32—Phosphates of magnesium, calcium, strontium, or barium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
    • B01J23/84—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J23/85—Chromium, molybdenum or tungsten
    • B01J23/86—Chromium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • B01J27/14—Phosphorus; Compounds thereof
    • B01J27/16—Phosphorus; Compounds thereof containing oxygen, i.e. acids, anhydrides and their derivates with N, S, B or halogens without carriers or on carriers based on C, Si, Al or Zr; also salts of Si, Al and Zr
    • B01J27/18—Phosphorus; Compounds thereof containing oxygen, i.e. acids, anhydrides and their derivates with N, S, B or halogens without carriers or on carriers based on C, Si, Al or Zr; also salts of Si, Al and Zr with metals other than Al or Zr
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • B01J27/14—Phosphorus; Compounds thereof
    • B01J27/186—Phosphorus; Compounds thereof with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J27/188—Phosphorus; Compounds thereof with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium with chromium, molybdenum, tungsten or polonium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39—Photocatalytic properties

Definitions

  • the present invention relates to apatite and a method for producing the same, and an apatite base material.
  • a semiconductor material such as titanium oxide has a photocatalytic function. Namely, when a semiconductor material such as titanium oxide absorbs light energy of a wavelength corresponding to a bandgap between a valence band and a conduction band, electrons in the valence band move to the conduction band by excitation, and positive electric charge (positive hole) is generated in the valence band. In a case where a foreign substance (such as organics) is adsorbed on the surface of the semiconductor material, electrons moving to the conduction band move to the organics on the surface of the semiconductor material and reduce the organics. In the valence band, the positive hole generated there seizes the electrons and oxidizes the organics.
  • the positive hole in the titanium oxide has an extremely strong oxidizing power, it will decompose the organics into water and carbon dioxide ultimately.
  • the photocatalytic function (oxidation-decomposition function) of the titanium oxide has been used. Specifically, titanium oxide has been used for an antibacterial agent, a disinfectant, a deodorant, an environmental clean-up antipollution agent, and the like. However, since the titanium oxide itself has no capability of adsorbing organics onto the surface, available oxidation-decomposition function is limited.
  • Calcium hydroxyapatite Ca 10 (PO 4 ) 6 (OH) 2 as a main component of biological hard tissues such as teeth and bones will exchange ions easily with various cations and anions, and thus it has high bio-compatibility and adsorptivity. Therefore, applications of the apatite to medical materials such as artificial bones and artificial dental roots, and to various fields such as chromatography adsorbents, chemical sensors, ion exchangers and catalysts, have been studied keenly.
  • the apatite has a particularly remarkable capability in adsorbing organics such as protein.
  • light energy required for exciting the photocatalyst having a strong oxidizing power is 3.2 eV, which corresponds to a light wavelength of about 380 nm. Therefore, titanium oxide can be excited with near-ultraviolet light but cannot be excited with visible light. Since the content of the UV light in sunlight is 4-5%, the photocatalytic function of the titanium oxide cannot be sufficient. In particular, the photocatalytic function cannot be exhibited indoors under fluorescent light including substantially no UV light.
  • the present invention relates to apatite containing metal atoms having a photocatalytic function and other metal atoms.
  • the apatite is characterized in that the metal atoms having a photocatalytic function comprise metal atoms that absorb light energy of visible light.
  • the present invention relates to also a method for producing apatite, and the method includes a step of preparing a solution containing metal atoms that absorb visible light at a concentration of not less than 1 ⁇ 10 ⁇ 6 mol/dm 3 and not more than 1 ⁇ 10 ⁇ 2 mol/dm 3 , and a step of dipping apatite in the solution.
  • the present invention relates to also a method for producing apatite, and the method includes a step of preparing an apatite material solution containing metal atoms that absorb visible light and other metal atoms, where the content of the metal atoms that absorb visible light is not less than 0.5 mol % and not more than 3 mol % with respect to the whole metal atoms contained in the solution, and a step of coprecipitating components contained in the apatite material solution so as to deposit apatite.
  • the present invention relates to also an apatite base material comprising apatite containing metal atoms that absorb visible light and other metal atoms.
  • the apatite base material is characterized in that the metal atoms that absorb visible light are atoms of at least one kind of metal selected from the group consisting of Cr, Co, Cu, Fe and Ni, and the other metal atoms are atoms of at least one kind of metal selected from the group consisting of Ca, Al, La, Mg, Sr, Ba, Pb, Cd, Eu, Y, Ce, Na and K.
  • FIG. 1 is a graph showing UV-visible reflection spectra for Example 1 and Comparative Example.
  • FIG. 2 is a graph showing UV-visible reflection spectra for Example 8, Example 9 and Comparative Example.
  • FIG. 3 is a graph showing changes in carbon dioxide gas concentrations and acetaldehyde gas concentrations for Example 1 and Comparative Example.
  • FIG. 4 is a graph showing changes in carbon dioxide gas concentrations and acetaldehyde gas concentrations for Example 8 and Example 9.
  • FIG. 5 is a graph showing relationships between chromium concentrations in aqueous solutions of chromium nitrate and decreases of acetaldehyde gases.
  • FIG. 6 is a graph showing a relationship between a firing temperature and a carbon dioxide gas concentration.
  • FIG. 7 is a graph showing a change in a carbon dioxide gas concentration and an acetaldehyde gas concentration for Example 14.
  • An example of apatite of the present invention contains metal atoms A, metal atoms B and metal atoms C.
  • the metal atoms A denote metal atoms contained in a normal apatite
  • the metal atoms B denote metal atoms that absorb UV light
  • the metal atoms C denote metal atoms that absorb visible light.
  • apatite that can exhibit a photocatalytic function under not only UV light but also visible light, by adding to the apatite not only metal atoms that absorb UV light but metal atoms that absorb visible light.
  • the apatite in this embodiment can be expressed generally with a Formula (1) below.
  • the metal atoms A are atoms of at least one kind of metal selected from the group consisting of Ca, Al, La, Mg, Sr, Ba, Pb, Cd, Eu, Y, Ce, Na and K, and it is a main component contained in apatite.
  • metals Ca is used most generally.
  • the metal atoms B that absorb UV light are atoms of at least one kind of metal selected from the group consisting of Ti, Zr and W. Among them, Ti is most preferred. It is preferable that the content of the metal atoms B with respect to the whole metal atoms contained in the apatite is not less than 3 mol % and not more than 11 mol %, and more preferably, not less than 8 mol % and not more than 10 mol %.
  • the metal atoms C that absorb visible light are atoms of at least one kind of metal selected from the group consisting of Cr, Co, Cu, Fe and Ni. Among them, Cr is most preferred. It is preferable that the content of the metal atoms C with respect to the whole metal atoms contained in the apatite is not less than 0.5 mol % and not more than 2 mol %, and more preferably, not less than 0.5 mol % and not more than 1.5 mol %.
  • the metal atoms A form an apatite crystal structure, and the metal atoms A are substituted partially by the metal atoms B and the metal atoms C.
  • D in the above formula denotes atoms such as P and S, and “O” denotes an oxygen atom.
  • E denotes a hydroxyl group (—OH), a halogen atom (F, Cl, Br, I) or the like.
  • Apatite expressed by the above formula is provided, for example, by substituting metal atoms contained in hydroxyapatite, fluoroapatite, chloroapatite, tricalcium phosphate, calcium hydrogenphosphate or the like with metal atoms that absorb UV light and metal atoms that absorb visible light.
  • apatite used in this embodiment is calcium titanium chromium hydroxyapatite where the metal atom A denotes Ca, the metal atom.
  • the metal atom C denotes Cr.
  • D denotes P and E denotes a hydroxyl group.
  • Apatite expressed by a Formula (2) below is preferred particularly. Ca 9 Ti 0.9 Cr 0.1 (PO 4 ) 6 (OH) 2 Formula (2)
  • the apatite in this embodiment is fired at a temperature not lower than 500° C. and not higher than 700° C. Thereby, the crystallinity of the apatite can be improved and the photocatalytic effect under the visible light can be improved further.
  • the apatite in this embodiment can be provided in various shapes and dimensions in accordance with the use, processing conditions or the like.
  • Examples of the preferred shapes include a powder, a tablet, a rod, a plate, a block, a sheet, a film, and a membrane.
  • apatite of the present invention contains metal atoms that absorb visible light and other metal atoms.
  • the metal atoms that absorb visible light are atoms of at least one kind of metal selected from the group consisting of Cr, Co, Cu, Fe and Ni, and the other metal atoms are atoms of at least one kind of metal selected from the group consisting of Ca, Al, La, Mg, Sr, Ba, Pb, Cd, Eu, Y, Ce, Na and K.
  • apatite exhibiting a visible photocatalytic function can be provided.
  • This embodiment excludes metal atoms having a UV photocatalytic function.
  • apatite in this embodiment is expressed by a Formula (3) below.
  • the apatite in this embodiment is substantially same as the apatite expressed by the Formula (1).
  • An example of a method for producing apatite of the present invention is a method including a step of preparing a solution that contains metal atoms that absorb visible light at a concentration of not less than 1 ⁇ 10 ⁇ 6 mol/dm 3 and not more than 1 ⁇ 10 ⁇ 2 mol/dm 3 , and a step of dipping apatite in the solution. Namely, it is a producing method based on a so-called dipping process. Thereby, apatite that can exhibit a photocatalytic function even under visible light can be produced easily.
  • the metal atoms that absorb visible light are atoms of at least one kind of metal selected from the group consisting of Cr, Co, Cu, Fe and Ni.
  • the concentration of the metal atoms that absorb visible light in the solution is not less than 1 ⁇ 10 ⁇ 5 mol/dm 3 and not more than 1 ⁇ 10 ⁇ 3 mol/dm 3 , and more preferably, not less than 4 ⁇ 10 ⁇ 5 mol/dm 3 and not more than 2 ⁇ 10 ⁇ 4 mol/dm 3 .
  • the visible photocatalytic function can be improved further when the concentration is in the above-mentioned range.
  • the producing method in this embodiment includes further steps of drying the apatite dipped in the solution and then firing at a temperature not lower than 500° C. and not higher than 700° C.
  • a temperature not lower than 500° C. and not higher than 700° C. By firing the photoresponsive apatite at a temperature not lower than 500° C. and not higher than 700° C., the crystallinity of the apatite can be improved and the visible photocatalytic function can be improved further. It is more preferable that the firing temperature is not lower than 550° C. and not higher than 650° C.
  • the apatite for the above-mentioned hydroxyapatite, fluoroapatite, chloroapatite, tricalcium phosphate, calcium hydrogenphosphate or the like can be used.
  • the apatite contains metal atoms of at least one kind of metal selected from the group consisting of Ca, Al, La, Mg, Sr, Ba, Pb, Cd, Eu, Y. Ce, Na and K.
  • calcium hydroxyapatite Ca 10 (PO 4 ) 6 (OH) 2 is preferred particularly.
  • the apatite contains further metal atoms of at least one kind of metal selected from the group consisting of Ti, Zr and W as metal atoms that absorb UV light.
  • metal atoms that can exhibit a photocatalytic function under not only visible light but UV light can be produced easily.
  • apatite calcium titanium hydroxyapatite Ca 9 Ti(PO 4 ) 6 (OH) 2 is preferred particularly.
  • Another example of a method for producing apatite of the present invention includes a step of preparing an apatite material solution containing metal atoms that absorb visible light and other metal atoms, where the content of the metal atoms that absorb visible light is not less than 0.5 mol % and not more than 3 mol % with respect to the whole metal atoms contained in the solution, and a step of coprecipitating components contained in the apatite material solution so as to deposit apatite.
  • the method is based on a so-called coprecipitation process. Thereby, apatite that can exhibit a photocatalytic function even under visible light can be produced easily.
  • the metal atoms that absorb visible light are of at least one kind of metal selected from the group consisting of Cr, Co, Cu, Fe and Ni.
  • the content of the metal atoms that absorb visible light in the solution is not less than 0.5 mol % and not more than 2 mol % with respect to the whole metal atoms contained in the solution, and more preferably, not less than 0.5 mol % and not more than 1.5 mol %.
  • concentration is in this range, the visible photocatalytic function can be improved further.
  • the other metal atoms are atoms of at least one kind of metal selected from the group consisting of Ca, Al, La, Mg, Sr, Ba, Pb, Cd, Eu, Y, Ce, Na and K. Among them, Ca is preferred particularly.
  • the apatite contains further metal atoms of at least one kind of metal selected from the group consisting of Ti, Zr and W as metal atoms that absorb UV light.
  • metal atoms that can exhibit a photocatalytic function under not only visible light but UV light can be produced easily.
  • Ti is preferred particularly.
  • the content of the metal atoms that absorb UV light in the solution is preferably not less than 3 mol % and not more than 11 mol % with respect to the whole metal atoms contained in the solution, and more preferably, not less than 8 mol % and not more than 10 mol %.
  • the producing method in this embodiment includes further steps of drying the apatite dipped in the solution and then firing at a temperature not lower than 500° C. and not higher than 700° C.
  • a temperature not lower than 500° C. and not higher than 700° C. By firing the photoresponsive apatite at a temperature not lower than 500° C. and not higher than 700° C., the crystallinity of the apatite can be improved and the visible photocatalytic function can be improved further. It is more preferable that the firing temperature is not lower than 550° C. and not higher than 650° C.
  • calcium titanium chromium hydroxyapatite Ca 9 Ti 0.9 Cr 0.1 (PO 4 ) 6 (OH) 2 is preferred.
  • An example of an apatite base material according to the present invention is a base material of apatite containing metal atoms that absorb visible light and other metal atoms.
  • the metal atoms that absorb UV light are atoms of at least one metal selected from the group consisting of Cr. Co, Cu, Fe and Ni, and the other metal atoms are atoms of at least one kind of metal selected from the group consisting of Ca, Al, La, Mg, Sr, Ba, Pb, Cd, Eu, Y, Ce, Na and K.
  • the other metal atoms include at least one kind of metal selected from the group consisting of Ti, Zr and W
  • the base material can be selected from the group consisting of paper, synthetic paper, woven fabric, nonwoven fabric, leather, lumber, glass, metal, ceramics, plastics, and printing ink.
  • the shape of the base material can be a foil, a film, a sheet and a plate, for example.
  • the apatite can be used in a state being applied/coated on at least one surface of the base material.
  • the apatite can be contained in the base material.
  • the apatite can be contained in the ink.
  • the apatite can be used for a base material of various products to be arranged indoors, and thus the apatite can exhibit the photocatalytic function even indoors where substantially no UV light exists.
  • the apatite base material in this embodiment when indoor wallpaper, clothes, and filters for air cleaners are produced by using the apatite base material in this embodiment, various bacteria, dust, bad smell, smoke of cigarettes indoors can be removed, and indoor environmental clean-up can be realized easily.
  • peripheral equipment of computers, such as keyboards, mice, and cases with the apatite base material of this embodiment, adhesion of stains such as fingerprints can be prevented.
  • the apatite base material in this embodiment can be used for sanitary goods such as masks, bandages, and antimicrobial gloves.
  • any of the apatite mentioned in the embodiment can be used. It is preferable that the apatite is fired at a temperature not lower than 500° C. and not higher than 700° C.
  • the present invention will be described below by referring to Examples.
  • the description below for respective Examples refers to apatite generally containing the metal atoms A, B and C that are determined as Ca, Ti and Cr respectively in the Formula (1).
  • similar effects can be obtained by using apatite containing a combination of any other metal atoms applicable in the present invention.
  • Apatite was produced by a dipping process in the following manner.
  • a commercially available calcium titanium hydroxyapatite Ca 9 Ti(PO 4 ) 6 (OH) 2 (trade name: “TiHAP0201” supplied by Taihei Chemical Industrial Co., Ltd.; hereinafter, referred to as TiHAP) of 1.5 g was added to 300 cm 3 of an aqueous solution of chromium nitrate of 1 ⁇ 10 ⁇ 4 mol/dm 3 , which was then stirred with a magnetic stirrer for 5 minutes. After stirring and filtering, the thus obtained product was washed in pure water of 4 dm 3 , dried in an oven at 100° C. so as to obtain a Cr-doped TiHAP powder. Subsequently, this TiHAP powder was heated to 650° C. in one hour to be fired, and thus a sample for Example 1 was obtained.
  • Example 2 Samples for Examples 2-7 were produced in the same manner as in Example 1 except that aqueous solutions of chromium nitrate of concentrations as shown in Table 1 were used. TABLE 1 Concentration (mol/dm 3 ) Example 2 1 ⁇ 10 ⁇ 6 Example 3 1 ⁇ 10 ⁇ 5 Example 4 4 ⁇ 10 ⁇ 5 Example 5 2 ⁇ 10 ⁇ 4 Example 6 1 ⁇ 10 ⁇ 3 Example 7 1 ⁇ 10 ⁇ 2
  • Apatite was produced by a coprecipitation process in the following manner. First, 21.25 g of calcium nitrate and 0.40 g of chromium nitrate were dissolved in decarbonated pure water. While stirring the solution with a magnetic stirrer, 5.55 cm 3 of 30% aqueous solution of titanium sulfate and 2.94 cm 3 of 95% aqueous solution of phosphoric acid were dripped. Finally, 10% aqueous ammonia was added quickly to adjust the pH to 9. Later, it was aged at 100° C. for 5 hours, filtered and washed in 4 dm 3 of pure water, dried in a 100° C. oven so as to obtain a Cr-doped TiHAP powder. This TiHAP powder was heated to 650° C. in one hour to be fired, and thus a sample for Example 8 was obtained.
  • Example 10 A sample for Example 10 was produced in the same manner as in Example 8 except that the powder was heated to 300° C. in one hour to be fired.
  • Example 11 A sample for Example 11 was produced in the same manner as in Example 8 except that the powder was heated to 550° C. in one hour to be fired.
  • Example 12 A sample for Example 12 was produced in the same manner as in Example 8 except that the powder was heated to 600° C. in one hour to be fired.
  • Example 13 A sample for Example 13 was produced in the same manner as in Example 8 except that the powder was heated to 800° C. in one hour to be fired.
  • Example 14 A sample for Example 14 was produced in the same manner as in Example 8 except that an aqueous solution of titanium sulfate was not dripped.
  • UV-visible (UV-Vis) Reflection Spectra Measurement of UV-visible (UV-Vis) Reflection Spectra
  • UV-Vis reflection spectra of the respective samples in Examples 1, 8, 9 and Comparative Example were measured.
  • a UV/VIS Spectrophotometer “JASCO V-560” supplied by JASCO Corporation was used for the instrument.
  • the results are shown in FIGS. 1 and 2 .
  • FIGS. 1 and 2 illustrate that reflectance was lowered due to optical absorption not only for UV light (light having a wavelength of less than 380 nm) but also for visible light (light having a wavelength of 380 to 780 nm) in Examples 1, 8 and 9.
  • reflectance decrease caused by absorption of visible light did not occur, while the reflectance was decreased due to absorption of UV light alone.
  • the specific surface areas of the samples were measured by a BET method, and the samples were weighed on the basis of the values of the specific surface areas so that the surface areas would be 85.5 m 2 .
  • the samples were pressed to form tablet-shape test samples.
  • Each of the test samples was introduced into a closed glass vessel of a capacity of 500 cm 3 substituted by standard air, and an acetaldehyde gas (CH 3 CHO) was introduced until the gas phase concentration became 7500 ppm.
  • CH 3 CHO acetaldehyde gas
  • the product was irradiated with visible light for 3 hours and then irradiated with UV light for 2 hours.
  • the concentration of the acetaldehyde gas in the closed glass vessel and the concentration of carbon dioxide gas (CO 2 ) generated due to decomposition of the acetaldehyde gas were measured every hour.
  • a gas chromatograph “GC-390B” supplied by GL Sciences was used for the instrument.
  • Alight beam (39500 lx) used for irradiation of visible light was obtained by removing UV light through a combination of a xenon light source “LA-251Xe” supplied by Hayashi Watch-Works Co., Ltd. and an L-42 filter.
  • a black light (1 mW/cm 2 ) was used for irradiation of UV light.
  • FIGS. 3 and 4 The results are shown in FIGS. 3 and 4 .
  • “In dark, 1h” indicates that the product was kept in dark for 1 hour.
  • “Vis-1h” indicates that visible light was irradiated for 1 hour, and “UV-1h” indicates that UV light was irradiated for 1 hour. The same will be applied in the following figures.
  • FIGS. 3 and 4 illustrate that the acetaldehyde gas concentrations were decreased and the carbon dioxide gas concentrations were raised due to irradiation of visible light in Examples 1, 8 and 9. This tendency was maintained also by irradiation of UV light. Thereby, it was confirmed that the samples in Examples 1, 8 and 9 have not only a UV photocatalytic function but visible photocatalytic function.
  • Comparative Example there were neither decrease in the acetaldehyde gas concentration or increase in the carbon dioxide gas concentration substantially in a case of irradiation of visible light.
  • Comparative Example similarly in Comparative Example, the acetaldehyde gas concentration was decreased and the carbon dioxide gas concentration was increased by irradiation of UV light.
  • FIG. 4 indicates that the chromium content in the apatite material solution in a coprecipitation process is not less than 0.5 mol % and not more than 2 mol % preferably with respect to the total of the titanium and chromium, and more preferably, not less than 0.5 mol % and not more than 1.5 mol %.
  • FIG. 5 shows a decrease in the acetaldehyde gas concentration every hour of irradiation of visible light plotted for every concentration of the aqueous solution of chromium sulfate.
  • the concentration of the aqueous solution of chromium sulfate (dipping solution) is preferably not less than 1 ⁇ 10 ⁇ 5 mol/dm 3 and not more than 1 ⁇ 10 ⁇ 3 mol/dm 3 , and more preferably, not less than 4 ⁇ 10 ⁇ 5 mol/dm 3 and not more than 2 ⁇ 10 ⁇ 3 mol/dm 3 .
  • FIG. 6 shows a carbon dioxide gas concentrations measured at every time during irradiation with visible light and UV light.
  • the results in FIG. 6 and the result in the above Example 8 indicate that preferably the firing temperature is not lower than 500° C. and not higher than 700° C., and more preferably, not lower than 550° C. and not higher than 650° C.
  • the photocatalytic function of the sample in Example 14 was measured in the same manner as mentioned above. The results are shown in FIG. 7 .
  • visible light alone was irradiated for 5 hours.
  • the sample in Example 14 does not contain titanium for absorbing UV light, it exhibited a visible photocatalytic function substantially same as that in Example 1, since the sample in Example 14 contains chromium that absorbs visible light. Thereby, it is shown that chromium substantially alone serves to exhibit a visible catalytic function.
  • the present invention provides apatite having novel constitution and a method for producing the same, and an apatite base material.
  • a photocatalytic function can be exhibited even indoors by using the apatite base material for various products to be arranged indoors.

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US20080050440A1 (en) * 2006-07-27 2008-02-28 Fujitsu Limited Plant epidemic prevention agent, plant epidemic prevention method, plant epidemic prevention system, plant, and plant cultivation method
CN103537253A (zh) * 2013-10-21 2014-01-29 哈尔滨工业大学 一种用羟基磷灰石制备介孔材料的方法
EP2799135A4 (en) * 2011-12-28 2015-09-09 Fujitsu Ltd PHOTOCATALYSTS AND PROCESS FOR PREPARING PHOTOCATALYSTS
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US20060199729A1 (en) * 2005-03-01 2006-09-07 Fujitsu Limited Broad band light absorbing photocatalyst, process for producing thereof, broad band light absorbing photocatalyst composition, and molded article
US7579296B2 (en) 2005-03-01 2009-08-25 Fujitsu Limited Broad band light absorbing photocatalyst, process for producing thereof, broad band light absorbing photocatalyst composition, and molded article
US20070215006A1 (en) * 2006-03-20 2007-09-20 Fujitsu Limited Photocatalyst, method for manufacturing the same, and molded articles
US20070232487A1 (en) * 2006-03-29 2007-10-04 Fujitsu Limited Photocatalytic apatite composition as well as production method and article thereof
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US20080050440A1 (en) * 2006-07-27 2008-02-28 Fujitsu Limited Plant epidemic prevention agent, plant epidemic prevention method, plant epidemic prevention system, plant, and plant cultivation method
EP2799135A4 (en) * 2011-12-28 2015-09-09 Fujitsu Ltd PHOTOCATALYSTS AND PROCESS FOR PREPARING PHOTOCATALYSTS
US20160074288A1 (en) * 2013-05-28 2016-03-17 Fujitsu Limited Intraoral fixing composition
CN103537253A (zh) * 2013-10-21 2014-01-29 哈尔滨工业大学 一种用羟基磷灰石制备介孔材料的方法
CN103537253B (zh) * 2013-10-21 2015-08-05 哈尔滨工业大学 一种用羟基磷灰石制备介孔材料的方法
US11475023B2 (en) 2014-11-05 2022-10-18 Ab Initio Technology Llc Impact analysis

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US8846563B2 (en) 2014-09-30
KR20100131504A (ko) 2010-12-15
DE112004002861B4 (de) 2015-02-26
DE112004002861T5 (de) 2007-04-19
KR20100023976A (ko) 2010-03-04
CN1953808A (zh) 2007-04-25
KR101000821B1 (ko) 2010-12-14
JPWO2005110598A1 (ja) 2008-03-21
CN1953808B (zh) 2011-07-27
JP4368379B2 (ja) 2009-11-18
WO2005110598A1 (ja) 2005-11-24
KR20070022266A (ko) 2007-02-26

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