US20040161608A1 - Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same - Google Patents
Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same Download PDFInfo
- Publication number
- US20040161608A1 US20040161608A1 US10/780,626 US78062604A US2004161608A1 US 20040161608 A1 US20040161608 A1 US 20040161608A1 US 78062604 A US78062604 A US 78062604A US 2004161608 A1 US2004161608 A1 US 2004161608A1
- Authority
- US
- United States
- Prior art keywords
- inorganic powder
- powders
- alcohol
- powder
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000843 powder Substances 0.000 title claims abstract description 265
- 238000000576 coating method Methods 0.000 title claims abstract description 61
- 239000011248 coating agent Substances 0.000 title claims abstract description 50
- 238000000034 method Methods 0.000 title claims abstract description 47
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 86
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 43
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 43
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 37
- -1 amine compound Chemical class 0.000 claims abstract description 29
- 229910052751 metal Inorganic materials 0.000 claims abstract description 24
- 239000002184 metal Substances 0.000 claims abstract description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910000000 metal hydroxide Inorganic materials 0.000 claims abstract description 17
- 150000004692 metal hydroxides Chemical class 0.000 claims abstract description 17
- 150000003839 salts Chemical class 0.000 claims abstract description 16
- 238000003756 stirring Methods 0.000 claims abstract description 12
- 238000002156 mixing Methods 0.000 claims abstract description 4
- 229910002113 barium titanate Inorganic materials 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 13
- 238000001035 drying Methods 0.000 claims description 13
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 8
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims description 8
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 8
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 6
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- 229910052681 coesite Inorganic materials 0.000 claims description 6
- 229910052906 cristobalite Inorganic materials 0.000 claims description 6
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000002002 slurry Substances 0.000 claims description 6
- 229910052682 stishovite Inorganic materials 0.000 claims description 6
- 229910052905 tridymite Inorganic materials 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 229910052745 lead Inorganic materials 0.000 claims description 5
- 229910052748 manganese Inorganic materials 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052720 vanadium Inorganic materials 0.000 claims description 5
- 238000005406 washing Methods 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- KDSNLYIMUZNERS-UHFFFAOYSA-N 2-methylpropanamine Chemical compound CC(C)CN KDSNLYIMUZNERS-UHFFFAOYSA-N 0.000 claims description 4
- JJYPMNFTHPTTDI-UHFFFAOYSA-N 3-methylaniline Chemical compound CC1=CC=CC(N)=C1 JJYPMNFTHPTTDI-UHFFFAOYSA-N 0.000 claims description 4
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 claims description 4
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 claims description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 4
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 claims description 4
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 claims description 4
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 claims description 4
- BHHGXPLMPWCGHP-UHFFFAOYSA-N Phenethylamine Chemical compound NCCC1=CC=CC=C1 BHHGXPLMPWCGHP-UHFFFAOYSA-N 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 claims description 4
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 claims description 4
- 229910052593 corundum Inorganic materials 0.000 claims description 4
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 claims description 4
- AMWRITDGCCNYAT-UHFFFAOYSA-L manganese oxide Inorganic materials [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims description 4
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 4
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 4
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 4
- 150000001298 alcohols Chemical class 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 claims description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 claims description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 2
- RQEUFEKYXDPUSK-UHFFFAOYSA-N 1-phenylethylamine Chemical compound CC(N)C1=CC=CC=C1 RQEUFEKYXDPUSK-UHFFFAOYSA-N 0.000 claims description 2
- KFUXXYVYKOMRFA-UHFFFAOYSA-N 2,4,5-trinitroaniline Chemical compound NC1=CC([N+]([O-])=O)=C([N+]([O-])=O)C=C1[N+]([O-])=O KFUXXYVYKOMRFA-UHFFFAOYSA-N 0.000 claims description 2
- IAHOUQOWMXVMEH-UHFFFAOYSA-N 2,4,6-trinitroaniline Chemical compound NC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O IAHOUQOWMXVMEH-UHFFFAOYSA-N 0.000 claims description 2
- AOPBDRUWRLBSDB-UHFFFAOYSA-N 2-bromoaniline Chemical compound NC1=CC=CC=C1Br AOPBDRUWRLBSDB-UHFFFAOYSA-N 0.000 claims description 2
- AKCRQHGQIJBRMN-UHFFFAOYSA-N 2-chloroaniline Chemical compound NC1=CC=CC=C1Cl AKCRQHGQIJBRMN-UHFFFAOYSA-N 0.000 claims description 2
- DPJCXCZTLWNFOH-UHFFFAOYSA-N 2-nitroaniline Chemical compound NC1=CC=CC=C1[N+]([O-])=O DPJCXCZTLWNFOH-UHFFFAOYSA-N 0.000 claims description 2
- DHYHYLGCQVVLOQ-UHFFFAOYSA-N 3-bromoaniline Chemical compound NC1=CC=CC(Br)=C1 DHYHYLGCQVVLOQ-UHFFFAOYSA-N 0.000 claims description 2
- PNPCRKVUWYDDST-UHFFFAOYSA-N 3-chloroaniline Chemical compound NC1=CC=CC(Cl)=C1 PNPCRKVUWYDDST-UHFFFAOYSA-N 0.000 claims description 2
- XJCVRTZCHMZPBD-UHFFFAOYSA-N 3-nitroaniline Chemical compound NC1=CC=CC([N+]([O-])=O)=C1 XJCVRTZCHMZPBD-UHFFFAOYSA-N 0.000 claims description 2
- WDFQBORIUYODSI-UHFFFAOYSA-N 4-bromoaniline Chemical compound NC1=CC=C(Br)C=C1 WDFQBORIUYODSI-UHFFFAOYSA-N 0.000 claims description 2
- QSNSCYSYFYORTR-UHFFFAOYSA-N 4-chloroaniline Chemical compound NC1=CC=C(Cl)C=C1 QSNSCYSYFYORTR-UHFFFAOYSA-N 0.000 claims description 2
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 claims description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 claims description 2
- 150000001242 acetic acid derivatives Chemical class 0.000 claims description 2
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 150000004703 alkoxides Chemical class 0.000 claims description 2
- 229960004050 aminobenzoic acid Drugs 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 150000001805 chlorine compounds Chemical class 0.000 claims description 2
- 125000000623 heterocyclic group Chemical group 0.000 claims description 2
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 claims description 2
- 239000007791 liquid phase Substances 0.000 claims description 2
- NCBZRJODKRCREW-UHFFFAOYSA-N m-anisidine Chemical compound COC1=CC=CC(N)=C1 NCBZRJODKRCREW-UHFFFAOYSA-N 0.000 claims description 2
- 229940018564 m-phenylenediamine Drugs 0.000 claims description 2
- 150000002823 nitrates Chemical class 0.000 claims description 2
- VMPITZXILSNTON-UHFFFAOYSA-N o-anisidine Chemical compound COC1=CC=CC=C1N VMPITZXILSNTON-UHFFFAOYSA-N 0.000 claims description 2
- BHAAPTBBJKJZER-UHFFFAOYSA-N p-anisidine Chemical compound COC1=CC=C(N)C=C1 BHAAPTBBJKJZER-UHFFFAOYSA-N 0.000 claims description 2
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 2
- BHRZNVHARXXAHW-UHFFFAOYSA-N sec-butylamine Chemical compound CCC(C)N BHRZNVHARXXAHW-UHFFFAOYSA-N 0.000 claims description 2
- 229950000244 sulfanilic acid Drugs 0.000 claims description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 2
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 claims description 2
- 229940086542 triethylamine Drugs 0.000 claims description 2
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 claims description 2
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 claims 1
- 238000005054 agglomeration Methods 0.000 abstract description 25
- 230000002776 aggregation Effects 0.000 abstract description 25
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 154
- 239000010410 layer Substances 0.000 description 48
- 239000000243 solution Substances 0.000 description 37
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical class O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 25
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 20
- 238000010438 heat treatment Methods 0.000 description 17
- 239000002245 particle Substances 0.000 description 15
- 229910003074 TiCl4 Inorganic materials 0.000 description 13
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 13
- 239000007864 aqueous solution Substances 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- 230000006911 nucleation Effects 0.000 description 11
- 238000010899 nucleation Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 239000002612 dispersion medium Substances 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- OPQCEZJIHDNSLT-UHFFFAOYSA-N butan-1-ol;n-ethylethanamine Chemical compound CCCCO.CCNCC OPQCEZJIHDNSLT-UHFFFAOYSA-N 0.000 description 4
- 230000001376 precipitating effect Effects 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 238000010669 acid-base reaction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 230000032798 delamination Effects 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 229910001252 Pd alloy Inorganic materials 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000003985 ceramic capacitor Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910003088 Ti−O−Ti Inorganic materials 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 229960004592 isopropanol Drugs 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/628—Coating the powders or the macroscopic reinforcing agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
- B01J2/006—Coating of the granules without description of the process or the device by which the granules are obtained
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
- B22F1/102—Metallic powder coated with organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/16—Metallic particles coated with a non-metal
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G53/00—Compounds of nickel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/008—Selection of materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/012—Form of non-self-supporting electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/24—Electrodes for alkaline accumulators
- H01M4/32—Nickel oxide or hydroxide electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/362—Composites
- H01M4/366—Composites as layered products
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/48—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
- H01M4/52—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/62—Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
- C01P2004/82—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
- C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M2004/021—Physical characteristics, e.g. porosity, surface area
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2998—Coated including synthetic resin or polymer
Definitions
- the present invention relates to a method of coating the surface of an inorganic powder and a coated inorganic powder manufactured by this method, more particularly, it is related to a method of depositing a uniform metal oxide coating on the surface of an inorganic powder which can be used in the manufacture of Multi Layer Ceramic Capacitor or as an active material in lithium batteries.
- Multi Layer Ceramic Capacitor (hereinafter ‘MLCC’) consists of multi-layers of capacitors in which a dielectric ceramic layer of BaTiO 3 is inserted between thin-layer metal electrodes like Nickel or Copper. MLCC is widely used in computers, mobile communication equipments, and other small electronic equipments due to its small volume but large capacity.
- Ag—Pd alloys that have been used as the metal electrode have the advantage of being able to be sintered in air, but it has the drawback of high manufacturing cost. Therefore, in the late 1990s in order to reduce the manufacturing cost, Ag—Pd alloys were replaced by Ni, and a Ni-MLCC technology of firing Ni was introduced in a reducing atmosphere to prevent oxidation of Ni.
- FIG. 1 is a plan view illustrating schematically BaTiO 3 powder dielectric layer 100 and Ni powder electrode layer pattern 200 formed during the manufacturing process of the Ni-MLCC.
- BaTiO 3 powder dielectric layer 100 is formed by coating a surface, such as a PET film, with BaTiO 3 powder dispersion. Afterwards, the Ni powder dispersion is screen-printed on the BaTiO 3 powder dielectric layer to form a plurality of Ni powder electrode layer pattern 200 . By repeating the processes of forming BaTiO3 powder dielectric layer 100 and Ni powder electrode layer pattern 200 , multi-layers of BaTiO3 powder layer 100 and Ni powder electrode layer pattern 200 are formed.
- This multilayer is then cut along the cutting line 300 and sintered to transform BaTiO 3 powder dielectric layer 100 and Ni powder electrode layer pattern 200 into BaTiO 3 mono-layer dielectric layer and Ni mono-layer electrode layer pattern, respectively. This completes the manufacturing of Ni-MLCC.
- the Ni powder electrode layer pattern 200 contains a large amount of organic vehicle prior to the sintering process, which causes the Ni powder to have a relatively low packing density. Therefore, when sintering, the Ni powder electrode layer pattern 200 shows greater shrinkage than the BaTiO 3 powder dielectric layer 100 .
- the sintering temperature of Ni powder is about 600° C. and that of BaTiO 3 is about 1250 ⁇ 1300° C.
- Ni powder starts to shrink significantly around 400 ⁇ 500° C.
- BaTiO 3 powder starts to shrink beyond about 1100° C. Therefore, in the sintering process, the Ni powder electrode layer pattern 200 starts to shrink at a temperature range of 400 ⁇ 500° C. but the BaTiO 3 powder dielectric layer 100 shows no actual shrinkage in this temperature range.
- Ni powder electrode layer pattern 200 Another solution used to reduce heat-shrinkage rate of the Ni powder electrode layer is to form the Ni powder electrode layer pattern 200 by using Ni powder coated with a metal oxide, whose shrinkage starting temperature is close to that of BaTiO 3 .
- Metal oxides that can be used for coating the Ni powder are MgO, SiO 2 , TiO 2 , BaTiO 3 and rare-earth metal oxides. These metal oxides can coat the surface of Ni powders using spray thermal decomposition or sol-gel coating process disclosed in U.S. Pat. No. 6,268,054, for example.
- Spray thermal decomposition is a method of forming Ni powder in which a solution containing both thermally decomposable compounds and Ni powders are sprayed to a heating tube, and the thermally decomposable compounds are thermally decomposed, thereby producing Ni powders coated with metal oxide.
- metal oxide is formed not only on the surface of the Ni powders but also within the Ni powders. This results in waste of the raw materials and also high processing costs.
- Ni powders are added in the solution and through the sol-gel reaction, the surface of the Ni powders are coated with the coating materials physically/chemically.
- the coated Ni powders are filtered, dried, and heat-treated, to thereby crystallize the coated layer.
- This method provides the Ni powders with a strong metal oxide coating layer, and allows mass production of coated Ni powders economically.
- FIG. 2 is a flow chart illustrating the manufacture of Ni powders coated with titanium oxide by the sol-gel process.
- an aqueous Ni slurry ( 1 ) i.e., Ni powder dispersed in water, is mixed with a TiCl 4 aqueous solution and an NH 4 OH aqueous solution under stirring.
- TiCl 4 precipitates as titanium hydroxides, Ti(OH)x, after undergoing reaction with hydroxide ions produced by the acid-base reaction formula illustrated below:
- the resulting titanium hydroxide is deposited and coated on the surface of the Ni powders ( 3 ).
- the Ni powders coated with titanium hydroxide are then washed with alcohol ( 5 ). Washing with alcohol removes impurities and transforms the hydroxide ions of Ti(OH)x on the surface of the coated layer to an alkoxy group in order to reduce agglomeration of the Ni powders which may occur by condensation reaction among the hydroxide ions during the drying process.
- the coated Ni powders are dried ( 7 ). When drying is completed, the Ni powders are heat treated ( 9 ) at a temperature of 400 ⁇ 500° C. in an oxidative atmosphere. In this heat treatment process, titanium hydroxide is transformed into titanium oxide TiO 2 . Thus, the manufacture of Ni powders coated with TiO 2 is completed.
- the conventional sol-gel coating method has a few drawbacks as summarized below because the method uses water as the coating medium. That is,
- a portion of titanium oxide may exist not on the surface of the Ni powders but as clusters between the spaces of the Ni powders and remain there, not coating the surface of the Ni powders. Further, a portion of the surface of Ni powders may remain uncoated and exposed. This is due to the usage of a large amount of water as the coating medium in which a large number of hydroxide ions are produced according to the acid-base reaction in a short period of time, and the hydroxide ions react with TiCl 4 at a short period of time and produce large amount of titanium hydroxide precipitations. In this case, some of the titanium hydroxide precipitates are stabilized in the water medium and remain as a cluster before contacting the Ni powders to coat the surface of the Ni powders. Accordingly, some portions of the Ni powders remain uncoated with titanium oxide.
- FIG. 3 is a SEM photograph of Ni powders that have been obtained by the conventional sol-gel coating method as illustrated by the flow chart in FIG. 2.
- agglomerates of titanium hydroxide are seen between the coated spherical Ni powders, and a portion of the Ni powders is exposed without being coated with titanium hydroxide. These titanium hydroxide agglomerates are maintained during the heat treatment for crystallizing the coated layer and the agglomeration strength increases as the crystallization proceeds.
- Ni electrode layer prepared by using the agglomerated Ni powders has a surface with increased roughness, increasing non-uniformity in the thickness of the Ni electrode layer.
- the electrode layer produced using the Ni powders produced by the conventional sol-gel coating method degrades quality of MLCC and increases failure rate. Therefore, there is a need to develop a method of coating the surface of Ni powders with metal oxide without substantially forming agglomerates and with uniform thickness to improve of the quality of MLCC.
- a development of a method of coating inorganic powders without substantially forming agglomerates is also important in producing high capacity lithium batteries.
- the present invention provides an improved method of coating the surface of inorganic powders without substantially having agglomeration of the coated inorganic powders and without substantially having a clustering of metal oxide coating materials.
- the present invention provides also improved inorganic powders having a metal oxide coating with uniform thickness without substantially having an agglomeration of the coated inorganic powders and without substantially having a clustering of metal oxide coating materials.
- the method according to an aspect of the present invention further comprises drying the inorganic powder and thermally-treating the inorganic powder at a temperature range of 300 ⁇ 500° C. under an oxidative atmosphere so as to convert the metal hydroxide coating into metal oxides coating.
- a inorganic powder coated with a metal oxide wherein each of the inorganic powder exist independently without substantially being agglomerated, and wherein the metal oxide coating is deposited only on the surface of the inorganic powder with uniform thickness without being substantially clustered in the space between the inorganic powders.
- the inorganic powder of the present invention is interpreted in a broad sense and includes metal oxides, and other ceramic powders as well as metal powders.
- the inorganic powders coated with metal oxide manufactured according to the present invention exist independently without substantial agglomeration, and the metal oxide coating is deposited substantially only on the surface of the inorganic powders with uniform thickness without substantial clustering among the inorganic powders. Consequently, when a Ni electrode layer is prepared using the titanium oxide coated Ni powders manufactured according to the present invention, not only quality but also yield of MLCC can be improved.
- FIG. 1 is a plan view illustrating schematically BaTiO 3 powder dielectric layer 100 and Ni powder electrode layer pattern 200 formed during the manufacturing process of Ni-MLCC.
- FIG. 2 is a flow chart illustrating the manufacture of Ni powders coated with titanium oxide by the sol-gel coating method .
- FIG. 3 is a SEM photograph of Ni powders that have been obtained by the conventional sol-gel coating method as illustrated by the flow chart in FIG. 2.
- FIG. 4 is a flow chart explaining the manufacture of an inorganic powder coated with metal oxide according to an aspect of the present invention.
- FIG. 5 is a SEM photograph of Ni powders coated with about 19 wt % of titanium hydroxide based on the weight of the Ni powders, manufactured in Example 1 according to the present investment.
- FIG. 6 is a SEM photograph of Ni powders coated with TiO 2 , which are obtained by heat-treating the Ni powders coated with about 19 wt % of titanium hydroxide based on the weight of the Ni powders at 300° C. in air.
- FIG. 4 is a flow chart explaining the manufacture of an inorganic powder coated with metal oxide according to an aspect of the present invention.
- the inorganic powder to be coated may be used in a slurry form, dispersed in alcohol, or used as powder itself.
- the inorganic powder of the present invention may be at least one metal powder selected from the group consisting of Ni, Cu, Pd and Ag; or at least one metal oxide powder selected from the group consisting of TiO 2 , ZrO 2 , TiZrO 4 , Al 2 O 3 , SiO 2 , Y 2 O 3 , MgO, Mn 3 O 4 , MnO 2 , NiO and ZnO, but not limited thereto.
- An alcohol slurry of an inorganic powder is mixed under stirring with an alcohol solution of an alcohol-soluble metal salt, a small amount of water and an alcohol solution of an amine compound. Any water existing in this system is water that comes from the alcohol solution of an alcohol-soluble metal salt or that is added to the system.
- the alcohol-soluble metal salt react with the hydroxide ions produced according to the following reaction formula, and precipitates as metal hydroxide.
- the metal hydroxide is deposited and coated on the surface of the inorganic powder ( 3 ).
- alcohol is used as a dispersion medium/solvent for inorganic powder, metal salt and amine compound instead of water, the formation of hydroxide ions on the surface of the inorganic powder to be coated is suppressed more than the case with using water. This reduced number of hydroxide ions enables the suppression of agglomeration of the inorganic powder coated in the following drying process.
- the alcohol compounds There is no specific limitation in the selection of the alcohol compounds for this purpose, but alcohol compound that has 1 to 5 OH groups and is in liquid phase at room temperature is preferable.
- C1 ⁇ C7 aliphatic mono-ol compounds C6 ⁇ C9 aromatic mono-ol compounds, C4 ⁇ C7 alicyclic mono-ol compounds, C3 ⁇ C7 heterocyclic mono-ol compounds, C2 ⁇ C7 aliphatic di-ol compounds or C2 ⁇ C7 aliphatic tri-ol compounds can be used for this purpose.
- Amine compounds that can be used for the present invention do not need to distinguish between primary amines (RNH 2 ), secondary amines (R 2 NH) or tertiary amines (R 3 N); mono amine compounds or diamine compounds; or aliphatic amine compounds or aromatic amine compounds.
- Particular examples include: methyl amine, di-methyl amine, tri-methyl amine, ethyl amine, di-ethyl amine, tri-ethyl amine, n-propyl amine, iso- propyl amine, n-butyl amine, sec-butyl amine, iso-butylamine, tert-butylamine, cyclohexylamine, benzylamine, ⁇ -phenylethylamine, ⁇ -phenylethylamine, ethylenediamine, tetramethylenediamine, hexamethylenediamine, aniline, methylaniline, dimethylaniline, diphenylamine, triphenylamine, o-toluidine, m-toluidine, p-toluidine, o-anisidine, m-anisidine, p-anisidine, o-chloroaniline, m-chloroaniline, p-chloro
- Alcohol-soluble metal salts that can be used for the present invention are chlorides, sulphates, nitrates, acetates, and alkoxides of Ti, Zr, Si, V, Cr, Mn, Fe, Co, Zn or Pb and mixtures thereof. These alcohol-soluble metal salts are converted to metal hydroxides in the solution and form a coating layer on the surface of the particle of inorganic powder through heterogeneous nucleation. Hydroxides of, for example, Ti, Zr, Hf, Si, V, Cr, Mn, Fe, Co, Zn, Pb or mixtures thereof are coated on the surface of the inorganic powdesr.
- inorganic powder for the method of coating inorganic powder according to an embodiment of the present invention, it is desirable to use 0.1 ⁇ 1.5M of the inorganic powders, 0.1 ⁇ 1.5M of the alcohol-soluble metal salt, 0.2 ⁇ 3.0M of the amine compound and 0.05 ⁇ 0.3M of water based on alcohol content.
- the content of the inorganic powder is less than 0.1M, manufacturing cost increases, but if it exceeds 1.5M, agglomeration problem may occur among the particles.
- the content of the alcohol-soluble metal oxide is less than 0.1 M, the manufacturing cost increases, but if it exceeds 1.5M, agglomeration problem may occur among particles.
- the content of the amine compound is less than 0.2M, it does not produce sufficient hydroxide ions to supply for the reaction, but if it exceeds 3.0M, washing of excessive amine is difficult.
- the water content is less than 0.05M, the formation of hydroxides is so slow that the reaction takes a long time or the production of OH ⁇ groups for hydration is insufficient. If it exceeds 0.3M, coating may proceed not by the heterogeneous nucleation but by homogenous nucleation.
- stirring time 12 to 72 hours after mixing the above components.
- the stirring time is between 24 to 48 hours. If the stirring time is less than 12 hours, the reaction does not take place sufficiently, while, if it exceeds 72 hours, the processing cost increases.
- the inorganic powder coated with metal hydroxide is washed with alcohol so as to remove impurities and to convert the hydroxy group on the surface of the metal hydroxide to alkoxy group, which does not undergo condensation reaction. It is desirable to use alcohols for this washing purpose that have a lower aliphatic alcohol compound with 1 ⁇ 5 carbon atoms such as methanol, ethanol, and iso-propanol etc.
- the next step is the drying process.
- the above inorganic powder coated with metal hydroxide is dried at about 80 ⁇ 150° C. for about 1 ⁇ 5 hours in an oven. If the drying temperature is lower than 80° C., the solvent used for the reaction does not evaporate completely or evaporation takes a long time. If the drying temperature exceeds 150° C., unnecessary energy is wasted.
- the above inorganic powder coated with metal hydroxide is treated at a temperature range of 300 ⁇ 500° C. under an oxidative atmosphere, preferably at 300 ⁇ 450° C., more preferably at 300 ⁇ 400° C., for about 1 ⁇ 4 hours.
- the temperature range for heat treatment may vary depending on the materials to be coated.
- metal hydroxide coated on the surface of the inorganic powder is transformed into metal oxide.
- the manufacturing of inorganic powder being coated with metal oxide is completed. If the temperature for heat treatment is lower than 300° C., crystallization of metal oxide coating does not take place, which results in moisture release or large shrinkage in the sintering process of MLCC manufacturing process. If it is higher than 500° C., energy consumption is increased without gain in efficiency.
- the inorganic powder manufactured according to the present invention is an inorganic powder coated with a metal oxide, wherein each of the inorganic powder exist independently without substantially being agglomerated, and wherein the metal oxide coating is deposited only on the surface of the inorganic powder with uniform thickness without being substantially clustered in the space between the inorganic powders.
- Metal powders or metal oxide powders may be used as the inorganic powder of the present invention but are not limited thereto.
- examples include Ni, Cu, Pd or Ag powder but are not limited thereto.
- metal oxide powders there are also no specific limits but examples include TiO 2 , ZrO 2 , TiZrO 4 , Al 2 O 3 , SiO 2 , Y 2 O 3 , MgO, Mn 3 O 4 , MnO 2 , NiO, ZnO thereof.
- the above metal oxides for coating include, for example, oxides of Ti, Zr, Hf, Si, V, Cr, Mn, Fe, Co, Zn, Pb or mixtures thereof
- the average diameter of the inorganic powder in the core portion is preferably about 10 nm 100 ⁇ m. If the average diameter of inorganic powder is less than about 10 nm, the agglomeration of the inorganic powders is so excessive that it is not coated uniformly on the surface of the respective particles. If it exceeds about 100 ⁇ m, it could be precipitated in the solution during the coating process because the weight of the inorganic powder increases too much.
- the thickness of metal oxide coating on the surface portion is about 0.1 ⁇ 500 nm.
- the thickness of the metal oxide coating is less than about 0.1 nm, it causes uneven coating thickness , while if it exceeds about 500 nm, it becomes merely a mixture of inorganic powder and metal oxides that does not achieve the purpose of the present invention.
- the Ni powders were washed with ethanol and dried for about 24 hours in an oven at about 60° C.
- SEM analysis was performed. The investigation revealed that coated Ni powders exist independently without agglomeration and that titanium hydroxides were deposited substantially only on the surface of the Ni powders and did not exist independently outside of the surface of the Ni powder.
- FIG. 5 is a SEM photograph of Ni powders coated with about 19 wt % of titanium hydroxide based on the weight of the Ni powders, manufactured in Example 1 according to the present investment.
- the coated Ni powders exist independently without agglomeration, and also the above titanium hydroxide coating occurs substantially only on the surface of the Ni powder with a uniform thickness and that no clustering occurred between the Ni powders.
- FIG. 6 is a SEM photograph of Ni powders coated with TiO 2 , which are obtained by heat-treating the Ni powders coated with about 19 wt % of titanium hydroxide based on the weight of the Ni powders at 300° C. in the air.
- the coated Ni powders exist independently without agglomeration, and also that the above titanium oxide coating occurs substantially only on the surface of the Ni powders with a uniform thickness and that no clustering occurs between the Ni powders.
- Example 2 The same procedures as described in Example 1 were followed. A SEM photograph observation showed that the coated Ni powders exist independently without substantial agglomeration among the particles. Moreover, the observation revealed that crystalline TiO 2 produced as a result of heat treatment at about 300° C. deposited substantially only on the surface of the Ni powders, and that practically no TiO 2 was found to exist independently between the Ni powders.
- Ni powders coated with TiO 2 were manufactured using the same method as in Example 1, except that the concentration of the diethylamine butanol solution was changed from 0.2M to 0.4M and that of TiCl 4 butanol solution was changed from 0.1M to 0.2M.
- a SEM photograph observation showed that the coated Ni powders exist independently without substantial agglomeration among the particles. Moreover, the observation revealed that crystalline TiO 2 produced as a result of heat treatment at about 300° C. deposited substantially only on the surface of the Ni powders, and that practically no TiO 2 was found to exist independently between the Ni powders.
- Ni powders coated with TiO 2 were manufactured using the same method as in Example 1, except that the concentration of the diethylamine butanol solution was changed from 0.2M to 0.8M and that of TiCl 4 butanol solution was changed from 0.1M to 0.4M.
- a SEM photograph observation showed that the coated Ni powders exist independently without substantial agglomeration among the particles. Moreover, the observation revealed that crystalline TiO 2 produced as a result of heat treatment at about 300° C. deposited substantially only on the surface of the Ni powders, and that practically no TiO 2 was found to exist independently between the Ni powders.
- Ni powders coated with TiO 2 were manufactured using the same method as in Example 1, except that cyclohexylamine was used as a precipitating agent instead of diethylamine.
- a SEM photograph observation showed that the coated Ni powders exist independently without substantial agglomeration among the particles. Moreover, the observation revealed that crystalline TiO 2 produced as a result of heat treatment at about 300° C. deposited substantially only on the surface of the Ni powders, and that practically no TiO 2 was found to exist independently between the Ni powders.
- Ni powders coated with TiO 2 were manufactured using the same method as in Example 1, except that propylamine was used as a precipitating agent instead of diethylamine.
- a SEM photograph observation showed that the coated Ni powders exist independently without substantial agglomeration among the particles. Moreover, the observation revealed that crystalline TiO 2 produced as a result of heat treatment at about 300° C. deposited substantially only on the surface of the Ni powders, and that practically no TiO 2 was found to exist independently between the Ni powders.
- Ni powders coated with TiO 2 were manufactured using the same method as in Example 1, except that butylamine was used as a precipitating agent instead of diethylamine.
- a SEM photograph observation showed that the coated Ni powders exist independently without substantial agglomeration among the particles. Moreover, the observation revealed that crystalline TiO 2 produced as a result of heat treatment at about 300° C. deposited substantially only on the surface of the Ni powders, and that practically no TiO 2 was found to exist independently between the Ni powders.
- Ni powders coated with TiO 2 were manufactured using the same method as in Example 1, except that propanol was used as a dispersion medium/solvent instead of butanol.
- a SEM photograph observation showed that the coated Ni powders exist independently without substantial agglomeration among the particles. Moreover, the observation revealed that crystalline TiO 2 produced as a result of heat treatment at about 300° C. deposited substantially only on the surface of the Ni powders, and that practically no TiO 2 was found to exist independently between the Ni powders.
- Ni powders coated with TiO 2 were manufactured using the same method as in Example 1, except that ethanol was used as a dispersion medium/solvent instead of butanol.
- a SEM photograph observation showed that the coated Ni powders exist independently without substantial agglomeration among the particles. Moreover, the observation revealed that crystalline TiO 2 produced as a result of heat treatment at about 300° C. deposited substantially only on the surface of the Ni powders, and that practically no TiO 2 was found to exist independently between the Ni powders.
- Ni powders coated with TiO 2 were manufactured using the same method as in Example 1, except that methanol was used as a dispersion medium/solvent instead of butanol.
- a SEM photograph observation showed that the coated Ni powders exist independently without substantial agglomeration among the particles. Moreover, the observation revealed that crystalline TiO 2 produced as a result of heat treatment at about 300° C. deposited substantially only on the surface of the Ni powders, and that practically no TiO 2 was found to exist independently between the Ni powders.
- FIG. 3 is a SEM photograph of the Ni powders coated with 19 wt % of titanium hydroxide based on the weight of the Ni powders in accordance with the present comparative example. Referring to FIG. 3, agglomerates of titanium hydroxide are seen between the coated spherical Ni powders, and a portion of the Ni powders is exposed without being coated with titanium hydroxide. These titanium hydroxide agglomerates are maintained during the heat treatment for crystallizing the coated layer and the agglomeration strength increases as the crystallization proceeds.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Electrochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ceramic Engineering (AREA)
- Composite Materials (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Structural Engineering (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Powder Metallurgy (AREA)
- Chemically Coating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/319,450 US7745002B2 (en) | 2003-02-19 | 2005-12-29 | Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2003-10415 | 2003-02-19 | ||
KR10-2003-0010415A KR100528330B1 (ko) | 2003-02-19 | 2003-02-19 | 무기 분말의 코팅방법 및 이에 의하여 제조된 코팅된무기입자 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/319,450 Division US7745002B2 (en) | 2003-02-19 | 2005-12-29 | Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
US20040161608A1 true US20040161608A1 (en) | 2004-08-19 |
Family
ID=36316665
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/780,626 Abandoned US20040161608A1 (en) | 2003-02-19 | 2004-02-19 | Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same |
US11/319,450 Expired - Fee Related US7745002B2 (en) | 2003-02-19 | 2005-12-29 | Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/319,450 Expired - Fee Related US7745002B2 (en) | 2003-02-19 | 2005-12-29 | Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same |
Country Status (5)
Country | Link |
---|---|
US (2) | US20040161608A1 (zh) |
JP (1) | JP2004250793A (zh) |
KR (1) | KR100528330B1 (zh) |
DE (1) | DE102004008875B4 (zh) |
TW (1) | TWI272318B (zh) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070218259A1 (en) * | 2006-03-16 | 2007-09-20 | Kyocera Corporation | Laminate, method for manufacturing the laminate and method for manufacturing wiring board |
US20090098005A1 (en) * | 2007-10-11 | 2009-04-16 | Hyundai Motor Company | Method of manufacture Ni-doped TiO2 nanotube-shaped powder and sheet film comprising the same |
US20130160843A1 (en) * | 2010-05-11 | 2013-06-27 | Bangor University | Ultra-low temperature sintering of dye-sensitesed solar cells |
JP2014029013A (ja) * | 2012-04-04 | 2014-02-13 | Nippon Steel & Sumikin Chemical Co Ltd | 複合ニッケル粒子 |
US20140141156A1 (en) * | 2012-11-22 | 2014-05-22 | Samsung Electronics Co., Ltd. | Method of forming electric wiring using inkjet printing |
US9574271B2 (en) | 2009-09-02 | 2017-02-21 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Method for forming metal oxide film, metal oxide film and apparatus for forming metal oxide film |
US20180233289A1 (en) * | 2017-01-25 | 2018-08-16 | Holy Stone Enterprise Co., Ltd. | Multilayer ceramic capacitor |
CN108906061A (zh) * | 2018-07-25 | 2018-11-30 | 吉林大学 | 一种镍基催化剂及其在生产空间位阻胺叔丁胺基乙氧基乙醇中的应用 |
US10777359B2 (en) | 2017-01-25 | 2020-09-15 | Holy Stone Enterprise Co., Ltd. | Multilayer ceramic capacitor |
US11478848B2 (en) * | 2018-02-14 | 2022-10-25 | H.C. Starck Tungsten Gmbh | Powder comprising coated hard material particles |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1950713A3 (en) * | 2001-07-19 | 2008-09-10 | Sega Corporation | Bet control method for race game |
JP2006193796A (ja) * | 2005-01-14 | 2006-07-27 | Ishifuku Metal Ind Co Ltd | 導電ペースト用貴金属粉末及びその製造方法 |
KR100665122B1 (ko) * | 2005-04-22 | 2007-01-09 | 삼성전기주식회사 | 화학적 작용기를 도입하여 세라믹 분말 및 슬러리를안정화시키는 방법 |
US20070080967A1 (en) * | 2005-10-11 | 2007-04-12 | Animetrics Inc. | Generation of normalized 2D imagery and ID systems via 2D to 3D lifting of multifeatured objects |
JP5440647B2 (ja) * | 2006-09-11 | 2014-03-12 | 住友金属鉱山株式会社 | 酸化物被覆ニッケル微粒子 |
JP4957465B2 (ja) * | 2006-09-11 | 2012-06-20 | 住友金属鉱山株式会社 | 酸化物被覆銅微粒子とその製造方法 |
JP5034796B2 (ja) * | 2006-09-11 | 2012-09-26 | 住友金属鉱山株式会社 | 酸化物被覆ニッケル微粒子とその製造方法 |
KR100830871B1 (ko) * | 2006-10-11 | 2008-05-21 | 삼성전기주식회사 | 비분산성 금속 나노입자의 표면개질방법 및 이에 의해표면개질된 잉크젯용 금속 나노입자 |
KR100781503B1 (ko) * | 2006-12-07 | 2007-11-30 | 재단법인서울대학교산학협력재단 | 실리카-지르코니아 복합산화물에 담지된 니켈 촉매, 그제조방법 및 상기 촉매를 이용한 액화천연가스의 수증기개질반응에 의한 수소 제조 방법 |
DE102007027971A1 (de) * | 2007-06-19 | 2008-12-24 | Robert Bosch Gmbh | Verfahren zur Herstellung von stabilisierten Partikeln |
JP4807347B2 (ja) * | 2007-10-29 | 2011-11-02 | 住友金属鉱山株式会社 | 酸化物被覆銅微粒子の製造方法 |
JP4952680B2 (ja) * | 2008-08-05 | 2012-06-13 | ソニー株式会社 | リチウムイオン二次電池およびリチウムイオン二次電池用負極 |
KR101365144B1 (ko) | 2012-10-30 | 2014-02-25 | 한국생산기술연구원 | 금속 나노입자를 부착하여 효율을 향상시킨 염료감응형 태양전지용 활성전극 페이스트 제조방법 |
KR101365143B1 (ko) | 2012-10-30 | 2014-02-25 | 한국생산기술연구원 | 유무기 하이브리드 기법을 적용한 염료감응형 태양전지용 활성전극 페이스트 제조방법 |
US9162245B1 (en) | 2012-03-29 | 2015-10-20 | BTD Wood Powder Coating, Inc. | Powder coating conveyor support |
CN103834044B (zh) * | 2014-03-17 | 2016-05-04 | 山东润峰集团新能源科技有限公司 | 一种快速溶解应用于电池浆料中羧甲基纤维素钠的方法 |
CN110586933B (zh) * | 2019-10-31 | 2021-08-31 | 福州大学 | 一种二氧化锆包覆FeCo吸收剂的耐高温改性方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5266536A (en) * | 1990-07-30 | 1993-11-30 | Tioxide Group Services Limited | Ceramic green bodies |
US6187438B1 (en) * | 1996-07-08 | 2001-02-13 | Rhodia Chimie | Titanium dioxide particles, method for their preparation and their use in cosmetics, varnish and surface coating |
US6207280B1 (en) * | 1996-06-10 | 2001-03-27 | Nittetsu Mining Co., Ltd. | Multilayer-coated powder and process for producing the same |
US6268054B1 (en) * | 1997-02-18 | 2001-07-31 | Cabot Corporation | Dispersible, metal oxide-coated, barium titanate materials |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0834370B1 (en) * | 1996-09-25 | 2002-01-16 | Shoei Chemical Inc. | Coated metal powder and process for preparing the same by decomposition |
KR20000001996A (ko) | 1998-06-16 | 2000-01-15 | 이형도 | 유전체 세라믹 분말의 코팅방법 |
-
2003
- 2003-02-19 KR KR10-2003-0010415A patent/KR100528330B1/ko active IP Right Grant
-
2004
- 2004-02-18 JP JP2004042061A patent/JP2004250793A/ja not_active Withdrawn
- 2004-02-18 DE DE102004008875A patent/DE102004008875B4/de not_active Expired - Fee Related
- 2004-02-19 US US10/780,626 patent/US20040161608A1/en not_active Abandoned
- 2004-02-19 TW TW093104144A patent/TWI272318B/zh not_active IP Right Cessation
-
2005
- 2005-12-29 US US11/319,450 patent/US7745002B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5266536A (en) * | 1990-07-30 | 1993-11-30 | Tioxide Group Services Limited | Ceramic green bodies |
US6207280B1 (en) * | 1996-06-10 | 2001-03-27 | Nittetsu Mining Co., Ltd. | Multilayer-coated powder and process for producing the same |
US6187438B1 (en) * | 1996-07-08 | 2001-02-13 | Rhodia Chimie | Titanium dioxide particles, method for their preparation and their use in cosmetics, varnish and surface coating |
US6268054B1 (en) * | 1997-02-18 | 2001-07-31 | Cabot Corporation | Dispersible, metal oxide-coated, barium titanate materials |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070218259A1 (en) * | 2006-03-16 | 2007-09-20 | Kyocera Corporation | Laminate, method for manufacturing the laminate and method for manufacturing wiring board |
US20090098005A1 (en) * | 2007-10-11 | 2009-04-16 | Hyundai Motor Company | Method of manufacture Ni-doped TiO2 nanotube-shaped powder and sheet film comprising the same |
US7867437B2 (en) * | 2007-10-11 | 2011-01-11 | Hyundai Motor Company | Method of manufacture Ni-doped TiO2 nanotube-shaped powder and sheet film comprising the same |
US9574271B2 (en) | 2009-09-02 | 2017-02-21 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Method for forming metal oxide film, metal oxide film and apparatus for forming metal oxide film |
US20130160843A1 (en) * | 2010-05-11 | 2013-06-27 | Bangor University | Ultra-low temperature sintering of dye-sensitesed solar cells |
JP2014029013A (ja) * | 2012-04-04 | 2014-02-13 | Nippon Steel & Sumikin Chemical Co Ltd | 複合ニッケル粒子 |
US9386708B2 (en) * | 2012-11-22 | 2016-07-05 | Samsung Electronics Co., Ltd. | Method of forming electric wiring using inkjet printing |
US20140141156A1 (en) * | 2012-11-22 | 2014-05-22 | Samsung Electronics Co., Ltd. | Method of forming electric wiring using inkjet printing |
US20180233289A1 (en) * | 2017-01-25 | 2018-08-16 | Holy Stone Enterprise Co., Ltd. | Multilayer ceramic capacitor |
US10217568B2 (en) * | 2017-01-25 | 2019-02-26 | Holy Stone Enterprise Co., Ltd. | Multilayer ceramic capacitor |
US10593481B2 (en) * | 2017-01-25 | 2020-03-17 | Holy Stone Enterprise Co., Ltd. | Multilayer ceramic capacitor |
US10777359B2 (en) | 2017-01-25 | 2020-09-15 | Holy Stone Enterprise Co., Ltd. | Multilayer ceramic capacitor |
US11478848B2 (en) * | 2018-02-14 | 2022-10-25 | H.C. Starck Tungsten Gmbh | Powder comprising coated hard material particles |
CN108906061A (zh) * | 2018-07-25 | 2018-11-30 | 吉林大学 | 一种镍基催化剂及其在生产空间位阻胺叔丁胺基乙氧基乙醇中的应用 |
Also Published As
Publication number | Publication date |
---|---|
KR100528330B1 (ko) | 2005-11-16 |
TWI272318B (en) | 2007-02-01 |
US7745002B2 (en) | 2010-06-29 |
DE102004008875B4 (de) | 2006-06-08 |
DE102004008875A1 (de) | 2004-09-09 |
US20060099409A1 (en) | 2006-05-11 |
JP2004250793A (ja) | 2004-09-09 |
KR20040074512A (ko) | 2004-08-25 |
TW200426243A (en) | 2004-12-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7745002B2 (en) | Method of coating the surface of an inorganic powder and a coated inorganic powder manufactured using the same | |
JP4661726B2 (ja) | 微粒ニッケル粉末及びその製造方法 | |
US6808697B2 (en) | Spherical tetragonal barium titanate particles and process for producing the same | |
US20090170961A1 (en) | Method of manufacturing dysprosium oxide nanoparticles and method of manufacturing dysprosium oxide nanosol | |
JP4839854B2 (ja) | ニッケル微粒子の製造方法 | |
EP1777198A1 (en) | Fine barium titanate particles | |
CN111017977A (zh) | 一种介电陶瓷电容器用纳米氧化镝的制备方法 | |
CN113348150B (zh) | 钛氧化物、钛氧化物的制造方法以及使用含有钛氧化物的电极活性物质的锂二次电池 | |
JP2007091549A (ja) | シェル成分含有ペロブスカイト型複合酸化物粉末およびその製造方法 | |
US20040248724A1 (en) | Silicate-based sintering aid and method | |
CN115246653A (zh) | 纳米氧化镝及其制备方法与应用 | |
JPH1017324A (ja) | 酸化インジウム粉末の製造方法 | |
JPH0580427B2 (zh) | ||
GB2534069A (en) | Method for producing barium titanate powder | |
JP3306614B2 (ja) | セラミック材料粉末の製造方法 | |
JPH09129028A (ja) | 無機皮膜を有する金属粉の製造法及び金属粉 | |
JP3376468B2 (ja) | セラミックス材料粉末の製造方法 | |
JPH06336601A (ja) | ニッケル粉末の製造方法 | |
JP2004339601A (ja) | ニッケル粉末の製造方法 | |
JP2001107103A (ja) | 球状ニッケル粉末、及びその製造方法 | |
JPH06321630A (ja) | セラミツク誘電体用組成物 | |
KR20040094096A (ko) | 습식환원법에 의한 구형 니켈 미분말 제조 | |
JP3531047B2 (ja) | チタン酸化合物系セラミック材料粉末の製造方法 | |
KR100572741B1 (ko) | 니켈 분말의 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: SAMSUNG ELECTRONICS CO., LTD., KOREA, REPUBLIC OF Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:CHOI, JAE-YOUNG;LEE, JONG-HEUN;HONG, SEONG-HYEON;REEL/FRAME:015009/0379 Effective date: 20040217 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |