TWI856565B - 光照射位置之調整方法及荷電粒子束裝置 - Google Patents

光照射位置之調整方法及荷電粒子束裝置 Download PDF

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Publication number
TWI856565B
TWI856565B TW112109713A TW112109713A TWI856565B TW I856565 B TWI856565 B TW I856565B TW 112109713 A TW112109713 A TW 112109713A TW 112109713 A TW112109713 A TW 112109713A TW I856565 B TWI856565 B TW I856565B
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TW
Taiwan
Prior art keywords
light
sample
irradiation position
particle beam
adjustment
Prior art date
Application number
TW112109713A
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English (en)
Chinese (zh)
Other versions
TW202338895A (zh
Inventor
町屋秀憲
關口好文
中井直也
Original Assignee
日商日立全球先端科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 日商日立全球先端科技股份有限公司 filed Critical 日商日立全球先端科技股份有限公司
Publication of TW202338895A publication Critical patent/TW202338895A/zh
Application granted granted Critical
Publication of TWI856565B publication Critical patent/TWI856565B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20292—Means for position and/or orientation registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
TW112109713A 2022-03-28 2023-03-16 光照射位置之調整方法及荷電粒子束裝置 TWI856565B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2022/014901 2022-03-28
PCT/JP2022/014901 WO2023187876A1 (ja) 2022-03-28 2022-03-28 荷電粒子線装置の調整方法及び荷電粒子線装置

Publications (2)

Publication Number Publication Date
TW202338895A TW202338895A (zh) 2023-10-01
TWI856565B true TWI856565B (zh) 2024-09-21

Family

ID=88199669

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112109713A TWI856565B (zh) 2022-03-28 2023-03-16 光照射位置之調整方法及荷電粒子束裝置

Country Status (5)

Country Link
US (1) US20250157785A1 (https=)
JP (1) JP7760044B2 (https=)
KR (1) KR20240134220A (https=)
TW (1) TWI856565B (https=)
WO (2) WO2023187876A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030094572A1 (en) * 2001-11-19 2003-05-22 Hitachi, Ltd. Inspection system and inspection process for wafer with circuit using charged-particle beam
TW200416500A (en) * 2002-09-20 2004-09-01 Asml Netherlands Bv Alignment systems and methods for lithographic systems
US20060060781A1 (en) * 1997-08-11 2006-03-23 Masahiro Watanabe Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection
US8143603B2 (en) * 2008-02-28 2012-03-27 Ricoh Company, Ltd. Electrostatic latent image measuring device
US20180166247A1 (en) * 2016-12-09 2018-06-14 Waviks, Inc. Method and apparatus for alignment of optical and charged-particle beams in an electron microscope
TW202006778A (zh) * 2018-07-09 2020-02-01 美商Fei公司 用於將光束對準帶電粒子束之方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4426519B2 (ja) 2005-11-11 2010-03-03 株式会社日立ハイテクノロジーズ 光学的高さ検出方法、電子線測定装置および電子線検査装置
JP2007172886A (ja) * 2005-12-19 2007-07-05 Toyota Motor Corp 光電子顕微鏡装置
JP4988444B2 (ja) * 2007-06-19 2012-08-01 株式会社日立製作所 検査方法および装置
JP5325522B2 (ja) 2008-10-15 2013-10-23 株式会社堀場製作所 複合型観察装置
US10777383B2 (en) 2017-07-10 2020-09-15 Fei Company Method for alignment of a light beam to a charged particle beam
US11610754B2 (en) * 2018-12-06 2023-03-21 Hitachi High-Tech Corporation Charged particle beam device
US11538714B2 (en) * 2020-05-21 2022-12-27 Applied Materials, Inc. System apparatus and method for enhancing electrical clamping of substrates using photo-illumination

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060060781A1 (en) * 1997-08-11 2006-03-23 Masahiro Watanabe Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection
US20030094572A1 (en) * 2001-11-19 2003-05-22 Hitachi, Ltd. Inspection system and inspection process for wafer with circuit using charged-particle beam
TW200416500A (en) * 2002-09-20 2004-09-01 Asml Netherlands Bv Alignment systems and methods for lithographic systems
US8143603B2 (en) * 2008-02-28 2012-03-27 Ricoh Company, Ltd. Electrostatic latent image measuring device
US20180166247A1 (en) * 2016-12-09 2018-06-14 Waviks, Inc. Method and apparatus for alignment of optical and charged-particle beams in an electron microscope
TW202006778A (zh) * 2018-07-09 2020-02-01 美商Fei公司 用於將光束對準帶電粒子束之方法

Also Published As

Publication number Publication date
JPWO2023188810A1 (https=) 2023-10-05
TW202338895A (zh) 2023-10-01
KR20240134220A (ko) 2024-09-06
WO2023188810A1 (ja) 2023-10-05
JP7760044B2 (ja) 2025-10-24
WO2023187876A1 (ja) 2023-10-05
US20250157785A1 (en) 2025-05-15

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