JP7760044B2 - 荷電粒子線装置の調整方法及び荷電粒子線装置 - Google Patents
荷電粒子線装置の調整方法及び荷電粒子線装置Info
- Publication number
- JP7760044B2 JP7760044B2 JP2024511344A JP2024511344A JP7760044B2 JP 7760044 B2 JP7760044 B2 JP 7760044B2 JP 2024511344 A JP2024511344 A JP 2024511344A JP 2024511344 A JP2024511344 A JP 2024511344A JP 7760044 B2 JP7760044 B2 JP 7760044B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- sample
- adjustment
- particle beam
- irradiation position
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20292—Means for position and/or orientation registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24578—Spatial variables, e.g. position, distance
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPPCT/JP2022/014901 | 2022-03-28 | ||
| PCT/JP2022/014901 WO2023187876A1 (ja) | 2022-03-28 | 2022-03-28 | 荷電粒子線装置の調整方法及び荷電粒子線装置 |
| PCT/JP2023/003515 WO2023188810A1 (ja) | 2022-03-28 | 2023-02-03 | 荷電粒子線装置の調整方法及び荷電粒子線装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023188810A1 JPWO2023188810A1 (https=) | 2023-10-05 |
| JP7760044B2 true JP7760044B2 (ja) | 2025-10-24 |
Family
ID=88199669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024511344A Active JP7760044B2 (ja) | 2022-03-28 | 2023-02-03 | 荷電粒子線装置の調整方法及び荷電粒子線装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250157785A1 (https=) |
| JP (1) | JP7760044B2 (https=) |
| KR (1) | KR20240134220A (https=) |
| TW (1) | TWI856565B (https=) |
| WO (2) | WO2023187876A1 (https=) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003151483A (ja) | 2001-11-19 | 2003-05-23 | Hitachi Ltd | 荷電粒子線を用いた回路パターン用基板検査装置および基板検査方法 |
| JP2009004114A (ja) | 2007-06-19 | 2009-01-08 | Hitachi Ltd | 検査方法および装置 |
| JP2010097768A (ja) | 2008-10-15 | 2010-04-30 | Topcon Corp | 複合型観察装置 |
| US20180166247A1 (en) | 2016-12-09 | 2018-06-14 | Waviks, Inc. | Method and apparatus for alignment of optical and charged-particle beams in an electron microscope |
| JP2019016600A (ja) | 2017-07-10 | 2019-01-31 | エフ イー アイ カンパニFei Company | 荷電粒子ビームに光ビームをアライメントするための方法 |
| WO2020115876A1 (ja) | 2018-12-06 | 2020-06-11 | 株式会社日立ハイテク | 荷電粒子線装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060060781A1 (en) * | 1997-08-11 | 2006-03-23 | Masahiro Watanabe | Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection |
| JP4222927B2 (ja) * | 2002-09-20 | 2009-02-12 | エーエスエムエル ネザーランズ ビー.ブイ. | 少なくとも2波長を使用するリソグラフィ装置用アライメント・システム |
| JP4426519B2 (ja) | 2005-11-11 | 2010-03-03 | 株式会社日立ハイテクノロジーズ | 光学的高さ検出方法、電子線測定装置および電子線検査装置 |
| JP2007172886A (ja) * | 2005-12-19 | 2007-07-05 | Toyota Motor Corp | 光電子顕微鏡装置 |
| US8143603B2 (en) * | 2008-02-28 | 2012-03-27 | Ricoh Company, Ltd. | Electrostatic latent image measuring device |
| TW202006778A (zh) * | 2018-07-09 | 2020-02-01 | 美商Fei公司 | 用於將光束對準帶電粒子束之方法 |
| US11538714B2 (en) * | 2020-05-21 | 2022-12-27 | Applied Materials, Inc. | System apparatus and method for enhancing electrical clamping of substrates using photo-illumination |
-
2022
- 2022-03-28 WO PCT/JP2022/014901 patent/WO2023187876A1/ja not_active Ceased
-
2023
- 2023-02-03 WO PCT/JP2023/003515 patent/WO2023188810A1/ja not_active Ceased
- 2023-02-03 KR KR1020247028173A patent/KR20240134220A/ko active Pending
- 2023-02-03 US US18/839,987 patent/US20250157785A1/en active Pending
- 2023-02-03 JP JP2024511344A patent/JP7760044B2/ja active Active
- 2023-03-16 TW TW112109713A patent/TWI856565B/zh active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003151483A (ja) | 2001-11-19 | 2003-05-23 | Hitachi Ltd | 荷電粒子線を用いた回路パターン用基板検査装置および基板検査方法 |
| JP2009004114A (ja) | 2007-06-19 | 2009-01-08 | Hitachi Ltd | 検査方法および装置 |
| JP2010097768A (ja) | 2008-10-15 | 2010-04-30 | Topcon Corp | 複合型観察装置 |
| US20180166247A1 (en) | 2016-12-09 | 2018-06-14 | Waviks, Inc. | Method and apparatus for alignment of optical and charged-particle beams in an electron microscope |
| JP2019016600A (ja) | 2017-07-10 | 2019-01-31 | エフ イー アイ カンパニFei Company | 荷電粒子ビームに光ビームをアライメントするための方法 |
| WO2020115876A1 (ja) | 2018-12-06 | 2020-06-11 | 株式会社日立ハイテク | 荷電粒子線装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2023188810A1 (https=) | 2023-10-05 |
| TWI856565B (zh) | 2024-09-21 |
| TW202338895A (zh) | 2023-10-01 |
| KR20240134220A (ko) | 2024-09-06 |
| WO2023188810A1 (ja) | 2023-10-05 |
| WO2023187876A1 (ja) | 2023-10-05 |
| US20250157785A1 (en) | 2025-05-15 |
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