JPWO2023188810A1 - - Google Patents

Info

Publication number
JPWO2023188810A1
JPWO2023188810A1 JP2024511344A JP2024511344A JPWO2023188810A1 JP WO2023188810 A1 JPWO2023188810 A1 JP WO2023188810A1 JP 2024511344 A JP2024511344 A JP 2024511344A JP 2024511344 A JP2024511344 A JP 2024511344A JP WO2023188810 A1 JPWO2023188810 A1 JP WO2023188810A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024511344A
Other languages
Japanese (ja)
Other versions
JP7760044B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023188810A1 publication Critical patent/JPWO2023188810A1/ja
Application granted granted Critical
Publication of JP7760044B2 publication Critical patent/JP7760044B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20292—Means for position and/or orientation registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2024511344A 2022-03-28 2023-02-03 荷電粒子線装置の調整方法及び荷電粒子線装置 Active JP7760044B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPPCT/JP2022/014901 2022-03-28
PCT/JP2022/014901 WO2023187876A1 (ja) 2022-03-28 2022-03-28 荷電粒子線装置の調整方法及び荷電粒子線装置
PCT/JP2023/003515 WO2023188810A1 (ja) 2022-03-28 2023-02-03 荷電粒子線装置の調整方法及び荷電粒子線装置

Publications (2)

Publication Number Publication Date
JPWO2023188810A1 true JPWO2023188810A1 (https=) 2023-10-05
JP7760044B2 JP7760044B2 (ja) 2025-10-24

Family

ID=88199669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024511344A Active JP7760044B2 (ja) 2022-03-28 2023-02-03 荷電粒子線装置の調整方法及び荷電粒子線装置

Country Status (5)

Country Link
US (1) US20250157785A1 (https=)
JP (1) JP7760044B2 (https=)
KR (1) KR20240134220A (https=)
TW (1) TWI856565B (https=)
WO (2) WO2023187876A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003151483A (ja) * 2001-11-19 2003-05-23 Hitachi Ltd 荷電粒子線を用いた回路パターン用基板検査装置および基板検査方法
JP2009004114A (ja) * 2007-06-19 2009-01-08 Hitachi Ltd 検査方法および装置
JP2010097768A (ja) * 2008-10-15 2010-04-30 Topcon Corp 複合型観察装置
US20180166247A1 (en) * 2016-12-09 2018-06-14 Waviks, Inc. Method and apparatus for alignment of optical and charged-particle beams in an electron microscope
JP2019016600A (ja) * 2017-07-10 2019-01-31 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 荷電粒子ビームに光ビームをアライメントするための方法
WO2020115876A1 (ja) * 2018-12-06 2020-06-11 株式会社日立ハイテク 荷電粒子線装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060060781A1 (en) * 1997-08-11 2006-03-23 Masahiro Watanabe Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection
JP4222927B2 (ja) * 2002-09-20 2009-02-12 エーエスエムエル ネザーランズ ビー．ブイ． 少なくとも２波長を使用するリソグラフィ装置用アライメント・システム
JP4426519B2 (ja) 2005-11-11 2010-03-03 株式会社日立ハイテクノロジーズ 光学的高さ検出方法、電子線測定装置および電子線検査装置
JP2007172886A (ja) * 2005-12-19 2007-07-05 Toyota Motor Corp 光電子顕微鏡装置
US8143603B2 (en) * 2008-02-28 2012-03-27 Ricoh Company, Ltd. Electrostatic latent image measuring device
TW202006778A (zh) * 2018-07-09 2020-02-01 美商Fei公司 用於將光束對準帶電粒子束之方法
US11538714B2 (en) * 2020-05-21 2022-12-27 Applied Materials, Inc. System apparatus and method for enhancing electrical clamping of substrates using photo-illumination

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003151483A (ja) * 2001-11-19 2003-05-23 Hitachi Ltd 荷電粒子線を用いた回路パターン用基板検査装置および基板検査方法
JP2009004114A (ja) * 2007-06-19 2009-01-08 Hitachi Ltd 検査方法および装置
JP2010097768A (ja) * 2008-10-15 2010-04-30 Topcon Corp 複合型観察装置
US20180166247A1 (en) * 2016-12-09 2018-06-14 Waviks, Inc. Method and apparatus for alignment of optical and charged-particle beams in an electron microscope
JP2019016600A (ja) * 2017-07-10 2019-01-31 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 荷電粒子ビームに光ビームをアライメントするための方法
WO2020115876A1 (ja) * 2018-12-06 2020-06-11 株式会社日立ハイテク 荷電粒子線装置

Also Published As

Publication number Publication date
TWI856565B (zh) 2024-09-21
TW202338895A (zh) 2023-10-01
KR20240134220A (ko) 2024-09-06
WO2023188810A1 (ja) 2023-10-05
JP7760044B2 (ja) 2025-10-24
WO2023187876A1 (ja) 2023-10-05
US20250157785A1 (en) 2025-05-15

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