KR20240134220A - 하전 입자선 장치의 조정 방법 및 하전 입자선 장치 - Google Patents

하전 입자선 장치의 조정 방법 및 하전 입자선 장치 Download PDF

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Publication number
KR20240134220A
KR20240134220A KR1020247028173A KR20247028173A KR20240134220A KR 20240134220 A KR20240134220 A KR 20240134220A KR 1020247028173 A KR1020247028173 A KR 1020247028173A KR 20247028173 A KR20247028173 A KR 20247028173A KR 20240134220 A KR20240134220 A KR 20240134220A
Authority
KR
South Korea
Prior art keywords
light
sample
adjustment
reference structure
irradiation position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247028173A
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English (en)
Korean (ko)
Inventor
히데노리 마찌야
요시후미 세끼구치
나오야 나까이
Original Assignee
주식회사 히타치하이테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 히타치하이테크 filed Critical 주식회사 히타치하이테크
Publication of KR20240134220A publication Critical patent/KR20240134220A/ko
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20292—Means for position and/or orientation registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
KR1020247028173A 2022-03-28 2023-02-03 하전 입자선 장치의 조정 방법 및 하전 입자선 장치 Pending KR20240134220A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPPCT/JP2022/014901 2022-03-28
PCT/JP2022/014901 WO2023187876A1 (ja) 2022-03-28 2022-03-28 荷電粒子線装置の調整方法及び荷電粒子線装置
PCT/JP2023/003515 WO2023188810A1 (ja) 2022-03-28 2023-02-03 荷電粒子線装置の調整方法及び荷電粒子線装置

Publications (1)

Publication Number Publication Date
KR20240134220A true KR20240134220A (ko) 2024-09-06

Family

ID=88199669

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247028173A Pending KR20240134220A (ko) 2022-03-28 2023-02-03 하전 입자선 장치의 조정 방법 및 하전 입자선 장치

Country Status (5)

Country Link
US (1) US20250157785A1 (https=)
JP (1) JP7760044B2 (https=)
KR (1) KR20240134220A (https=)
TW (1) TWI856565B (https=)
WO (2) WO2023187876A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003151483A (ja) 2001-11-19 2003-05-23 Hitachi Ltd 荷電粒子線を用いた回路パターン用基板検査装置および基板検査方法
JP2007132836A (ja) 2005-11-11 2007-05-31 Hitachi High-Technologies Corp 光学的高さ検出方法、電子線測定装置および電子線検査装置
JP2009004114A (ja) 2007-06-19 2009-01-08 Hitachi Ltd 検査方法および装置
US20180166247A1 (en) 2016-12-09 2018-06-14 Waviks, Inc. Method and apparatus for alignment of optical and charged-particle beams in an electron microscope
WO2020115876A1 (ja) 2018-12-06 2020-06-11 株式会社日立ハイテク 荷電粒子線装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060060781A1 (en) * 1997-08-11 2006-03-23 Masahiro Watanabe Charged-particle beam apparatus and method for automatically correcting astigmatism and for height detection
JP4222927B2 (ja) * 2002-09-20 2009-02-12 エーエスエムエル ネザーランズ ビー．ブイ． 少なくとも２波長を使用するリソグラフィ装置用アライメント・システム
JP2007172886A (ja) * 2005-12-19 2007-07-05 Toyota Motor Corp 光電子顕微鏡装置
US8143603B2 (en) * 2008-02-28 2012-03-27 Ricoh Company, Ltd. Electrostatic latent image measuring device
JP5325522B2 (ja) 2008-10-15 2013-10-23 株式会社堀場製作所 複合型観察装置
US10777383B2 (en) 2017-07-10 2020-09-15 Fei Company Method for alignment of a light beam to a charged particle beam
TW202006778A (zh) * 2018-07-09 2020-02-01 美商Fei公司 用於將光束對準帶電粒子束之方法
US11538714B2 (en) * 2020-05-21 2022-12-27 Applied Materials, Inc. System apparatus and method for enhancing electrical clamping of substrates using photo-illumination

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003151483A (ja) 2001-11-19 2003-05-23 Hitachi Ltd 荷電粒子線を用いた回路パターン用基板検査装置および基板検査方法
JP2007132836A (ja) 2005-11-11 2007-05-31 Hitachi High-Technologies Corp 光学的高さ検出方法、電子線測定装置および電子線検査装置
JP2009004114A (ja) 2007-06-19 2009-01-08 Hitachi Ltd 検査方法および装置
US20180166247A1 (en) 2016-12-09 2018-06-14 Waviks, Inc. Method and apparatus for alignment of optical and charged-particle beams in an electron microscope
WO2020115876A1 (ja) 2018-12-06 2020-06-11 株式会社日立ハイテク 荷電粒子線装置

Also Published As

Publication number Publication date
JPWO2023188810A1 (https=) 2023-10-05
TWI856565B (zh) 2024-09-21
TW202338895A (zh) 2023-10-01
WO2023188810A1 (ja) 2023-10-05
JP7760044B2 (ja) 2025-10-24
WO2023187876A1 (ja) 2023-10-05
US20250157785A1 (en) 2025-05-15

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