TWI830349B - 曝光方法 - Google Patents

曝光方法 Download PDF

Info

Publication number
TWI830349B
TWI830349B TW111132449A TW111132449A TWI830349B TW I830349 B TWI830349 B TW I830349B TW 111132449 A TW111132449 A TW 111132449A TW 111132449 A TW111132449 A TW 111132449A TW I830349 B TWI830349 B TW I830349B
Authority
TW
Taiwan
Prior art keywords
substrate
stage
cleaning
aforementioned
cleaning roller
Prior art date
Application number
TW111132449A
Other languages
English (en)
Chinese (zh)
Other versions
TW202248770A (zh
Inventor
名古屋淳
Original Assignee
日商亞多特克工程股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商亞多特克工程股份有限公司 filed Critical 日商亞多特克工程股份有限公司
Publication of TW202248770A publication Critical patent/TW202248770A/zh
Application granted granted Critical
Publication of TWI830349B publication Critical patent/TWI830349B/zh

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cleaning In General (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Electronic Switches (AREA)
  • Magnetic Resonance Imaging Apparatus (AREA)
  • Gas-Filled Discharge Tubes (AREA)
TW111132449A 2017-03-26 2018-03-01 曝光方法 TWI830349B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017060265A JP6865609B2 (ja) 2017-03-26 2017-03-26 露光装置
JP2017-060265 2017-03-26

Publications (2)

Publication Number Publication Date
TW202248770A TW202248770A (zh) 2022-12-16
TWI830349B true TWI830349B (zh) 2024-01-21

Family

ID=63696234

Family Applications (2)

Application Number Title Priority Date Filing Date
TW107106781A TWI779014B (zh) 2017-03-26 2018-03-01 曝光裝置
TW111132449A TWI830349B (zh) 2017-03-26 2018-03-01 曝光方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW107106781A TWI779014B (zh) 2017-03-26 2018-03-01 曝光裝置

Country Status (4)

Country Link
JP (2) JP6865609B2 (ja)
KR (1) KR102531997B1 (ja)
CN (1) CN108628106B (ja)
TW (2) TWI779014B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110683751B (zh) * 2019-11-20 2022-04-08 成都南玻玻璃有限公司 一种浮法玻璃过渡辊清洁方法及实现该方法的过渡辊
CN110764373A (zh) * 2019-11-24 2020-02-07 湖南凯通电子有限公司 一种电路板曝光机

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000330097A (ja) * 1999-05-18 2000-11-30 Ricoh Co Ltd 液晶基板の搬送装置
JP2007025436A (ja) * 2005-07-20 2007-02-01 Adtec Engineeng Co Ltd 露光装置
TW200811606A (en) * 2006-08-09 2008-03-01 Adtec Eng Co Ltd Exposure apparatus
US20140268074A1 (en) * 2013-03-15 2014-09-18 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography System with an Embedded Cleaning Module

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0611839A (ja) * 1992-06-26 1994-01-21 Matsushita Electric Ind Co Ltd プリント配線板用露光装置
JP3533380B2 (ja) * 2000-09-12 2004-05-31 誠一郎 豊田 露光機の除塵装置及び除塵方法
JP2008216433A (ja) * 2007-03-01 2008-09-18 Adtec Engineeng Co Ltd 露光装置
JP5752088B2 (ja) * 2012-06-11 2015-07-22 株式会社アドテックエンジニアリング 露光装置
JP5893537B2 (ja) * 2012-09-19 2016-03-23 株式会社オーク製作所 露光装置の除塵装置及び除塵方法
JP5631464B1 (ja) * 2013-08-30 2014-11-26 株式会社 ベアック 露光装置
JP2016018070A (ja) * 2014-07-08 2016-02-01 旭硝子株式会社 露光方法および露光装置
CN105093854B (zh) * 2015-09-09 2017-04-12 合肥芯碁微电子装备有限公司 一种用于激光直写曝光机的自动粘尘装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000330097A (ja) * 1999-05-18 2000-11-30 Ricoh Co Ltd 液晶基板の搬送装置
JP2007025436A (ja) * 2005-07-20 2007-02-01 Adtec Engineeng Co Ltd 露光装置
TW200811606A (en) * 2006-08-09 2008-03-01 Adtec Eng Co Ltd Exposure apparatus
US20140268074A1 (en) * 2013-03-15 2014-09-18 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography System with an Embedded Cleaning Module

Also Published As

Publication number Publication date
JP7196222B2 (ja) 2022-12-26
JP6865609B2 (ja) 2021-04-28
JP2021113985A (ja) 2021-08-05
KR102531997B1 (ko) 2023-05-12
KR20180109045A (ko) 2018-10-05
TW201903519A (zh) 2019-01-16
CN108628106A (zh) 2018-10-09
JP2018163272A (ja) 2018-10-18
CN108628106B (zh) 2021-12-21
TWI779014B (zh) 2022-10-01
TW202248770A (zh) 2022-12-16

Similar Documents

Publication Publication Date Title
JP2007025436A (ja) 露光装置
JP7196222B2 (ja) 露光方法
TWI718309B (zh) 工件平台及曝光裝置
JP2009157247A (ja) 露光装置
JP7263466B2 (ja) 基板取り扱い装置及び基板取り扱い方法
JP2010098125A (ja) 基板搬送装置及び基板搬送方法
JP2007157902A (ja) 基板のパーティクル除去方法、その装置及び塗布、現像装置
JP2009157249A (ja) 露光装置
JP6694778B2 (ja) スクリーン印刷装置
JP5743437B2 (ja) 露光装置、露光方法、搬送方法及びデバイスの製造方法
JP6894034B2 (ja) ワーク吸着保持方法、ワークステージ及び露光装置
JP2003131387A (ja) マスクと露光対象基板との搬送に兼用できる搬送アーム及びそれを備えた露光装置
TWI427426B (zh) Drawing device
JP2001343753A (ja) 基板搬送機構および露光装置
JP5004786B2 (ja) 露光装置の反転部
JPH07271048A (ja) 露光装置
JPH10171125A (ja) シート状ワークのプロキシミティ露光装置
JP2005286219A (ja) 部品搭載装置、及びそのプログラム
JP2011033953A (ja) 基板搬送装置および表示パネルモジュール組立装置
JP6773435B2 (ja) 露光装置
JP2015060910A (ja) 搬入出装置および搬入出方法
JP2020188141A (ja) 部品装着装置、および部品装着方法
JPH0541982B2 (ja)
JPH0719059B2 (ja) 自動露光装置
JP2011025587A (ja) パターン形成装置