TWI754753B - 無鉛銲料助焊劑用洗淨劑組成物、無鉛銲料助焊劑之洗淨方法 - Google Patents
無鉛銲料助焊劑用洗淨劑組成物、無鉛銲料助焊劑之洗淨方法 Download PDFInfo
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- TWI754753B TWI754753B TW107117401A TW107117401A TWI754753B TW I754753 B TWI754753 B TW I754753B TW 107117401 A TW107117401 A TW 107117401A TW 107117401 A TW107117401 A TW 107117401A TW I754753 B TWI754753 B TW I754753B
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- Taiwan
- Prior art keywords
- lead
- free solder
- solder flux
- flux
- cleaning
- Prior art date
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- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- KHDDHEBEVNRFAT-UHFFFAOYSA-N n,n,n',n'-tetra(propan-2-yl)hexane-1,6-diamine Chemical compound CC(C)N(C(C)C)CCCCCCN(C(C)C)C(C)C KHDDHEBEVNRFAT-UHFFFAOYSA-N 0.000 description 1
- SRTOAFZPEOCBGW-UHFFFAOYSA-N n,n,n',n'-tetraethylhexane-1,6-diamine Chemical compound CCN(CC)CCCCCCN(CC)CC SRTOAFZPEOCBGW-UHFFFAOYSA-N 0.000 description 1
- OQIRZNNBUNOXTQ-UHFFFAOYSA-N n,n,n',n'-tetraethylpentane-1,5-diamine Chemical compound CCN(CC)CCCCCN(CC)CC OQIRZNNBUNOXTQ-UHFFFAOYSA-N 0.000 description 1
- TXXWBTOATXBWDR-UHFFFAOYSA-N n,n,n',n'-tetramethylhexane-1,6-diamine Chemical compound CN(C)CCCCCCN(C)C TXXWBTOATXBWDR-UHFFFAOYSA-N 0.000 description 1
- DNOJGXHXKATOKI-UHFFFAOYSA-N n,n,n',n'-tetramethylpentane-1,5-diamine Chemical compound CN(C)CCCCCN(C)C DNOJGXHXKATOKI-UHFFFAOYSA-N 0.000 description 1
- UICCSKORMGVRCB-UHFFFAOYSA-N n-[2-(diethylamino)ethyl]-n',n'-diethylethane-1,2-diamine Chemical compound CCN(CC)CCNCCN(CC)CC UICCSKORMGVRCB-UHFFFAOYSA-N 0.000 description 1
- DVVORTHDQVBZOO-UHFFFAOYSA-N n-[2-[di(propan-2-yl)amino]ethyl]-n',n'-di(propan-2-yl)ethane-1,2-diamine Chemical compound CC(C)N(C(C)C)CCNCCN(C(C)C)C(C)C DVVORTHDQVBZOO-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 125000001453 quaternary ammonium group Chemical class 0.000 description 1
- 239000002265 redox agent Substances 0.000 description 1
- 238000010405 reoxidation reaction Methods 0.000 description 1
- 239000002455 scale inhibitor Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/263—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3218—Alkanolamines or alkanolimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5022—Organic solvents containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning By Liquid Or Steam (AREA)
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JP2017104384 | 2017-05-26 | ||
JP2017-104384 | 2017-05-26 |
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TW201900862A TW201900862A (zh) | 2019-01-01 |
TWI754753B true TWI754753B (zh) | 2022-02-11 |
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JP (1) | JP6822440B2 (ja) |
KR (1) | KR102419315B1 (ja) |
CN (1) | CN108929808B (ja) |
TW (1) | TWI754753B (ja) |
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JP7215978B2 (ja) * | 2019-08-21 | 2023-01-31 | 荒川化学工業株式会社 | 洗浄剤組成物及び洗浄方法 |
US11781092B2 (en) * | 2019-08-27 | 2023-10-10 | Resonac Corporation | Composition, and method for cleaning adhesive polymer |
JP2023167583A (ja) * | 2022-05-12 | 2023-11-24 | 三菱重工業株式会社 | 洗浄装置及び洗浄方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996007503A1 (en) * | 1994-09-09 | 1996-03-14 | Fry's Metals, Inc. | Rosin-free, low voc, no-clean soldering flux and method using the same |
TW200745327A (en) * | 2006-03-17 | 2007-12-16 | Arakawa Chem Ind | Cleaner composition for removal of lead-free soldering flux, rinsing agent for removal of lead-free soldering flux, and method for removal of lead-free soldering flux |
TW200914606A (en) * | 2007-08-08 | 2009-04-01 | Arakawa Chem Ind | Cleanser composition for removal of lead-free soldering flux, and method for removal of lead-free soldering flux |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0457899A (ja) | 1990-06-27 | 1992-02-25 | Arakawa Chem Ind Co Ltd | ロジン系ハンダフラックスの洗浄剤および該洗浄剤を用いてなるロジン系ハンダフラックスの洗浄方法 |
JP2813862B2 (ja) | 1994-07-05 | 1998-10-22 | 荒川化学工業株式会社 | 洗浄剤組成物 |
JPH0959698A (ja) * | 1995-08-23 | 1997-03-04 | Asahi Chem Ind Co Ltd | メタルマスク用洗浄剤組成物 |
US5733378A (en) * | 1996-02-26 | 1998-03-31 | Austin American Technology | Method for cleaning printed circuit boards |
CN101037646B (zh) * | 2003-08-27 | 2010-12-08 | 化研科技株式会社 | 除去助焊剂用洗涤剂及助焊剂的洗涤方法 |
JP2005112887A (ja) * | 2003-10-03 | 2005-04-28 | Kaken Tec Kk | フラックス用洗浄剤組成物およびそれを用いた洗浄方法 |
KR20090020199A (ko) | 2007-08-23 | 2009-02-26 | 주식회사 코오롱 | 연마패드 및 그의 제조방법 |
JP5556658B2 (ja) * | 2008-08-27 | 2014-07-23 | 荒川化学工業株式会社 | 鉛フリーはんだフラックス除去用洗浄剤組成物および鉛フリーはんだフラックス除去システム |
WO2011019189A2 (ko) * | 2009-08-11 | 2011-02-17 | 동우 화인켐 주식회사 | 레지스트 박리액 조성물 및 이를 이용한 레지스트의 박리방법 |
JP5857740B2 (ja) * | 2009-09-03 | 2016-02-10 | 荒川化学工業株式会社 | 鉛フリーハンダ水溶性フラックス除去用洗浄剤、除去方法及び洗浄方法 |
KR101128865B1 (ko) * | 2010-10-01 | 2012-03-26 | 에이케이켐텍 주식회사 | 리플로우 공정에 따른 플럭스 잔사 세정제 조성물 및 이를 이용한 세정방법 |
JP2018127573A (ja) * | 2017-02-10 | 2018-08-16 | 荒川化学工業株式会社 | 電子材料用リンス剤 |
-
2018
- 2018-05-21 CN CN201810487405.0A patent/CN108929808B/zh active Active
- 2018-05-21 JP JP2018096880A patent/JP6822440B2/ja active Active
- 2018-05-22 TW TW107117401A patent/TWI754753B/zh active
- 2018-05-23 KR KR1020180058299A patent/KR102419315B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996007503A1 (en) * | 1994-09-09 | 1996-03-14 | Fry's Metals, Inc. | Rosin-free, low voc, no-clean soldering flux and method using the same |
TW200745327A (en) * | 2006-03-17 | 2007-12-16 | Arakawa Chem Ind | Cleaner composition for removal of lead-free soldering flux, rinsing agent for removal of lead-free soldering flux, and method for removal of lead-free soldering flux |
TW200914606A (en) * | 2007-08-08 | 2009-04-01 | Arakawa Chem Ind | Cleanser composition for removal of lead-free soldering flux, and method for removal of lead-free soldering flux |
Also Published As
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TW201900862A (zh) | 2019-01-01 |
KR20180129663A (ko) | 2018-12-05 |
JP6822440B2 (ja) | 2021-01-27 |
JP2018199808A (ja) | 2018-12-20 |
KR102419315B1 (ko) | 2022-07-08 |
CN108929808A (zh) | 2018-12-04 |
CN108929808B (zh) | 2020-11-27 |
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