TWI737892B - 電鍍液及使用此電鍍液之附絕緣被膜之導體的製造方法 - Google Patents

電鍍液及使用此電鍍液之附絕緣被膜之導體的製造方法 Download PDF

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TWI737892B
TWI737892B TW107105467A TW107105467A TWI737892B TW I737892 B TWI737892 B TW I737892B TW 107105467 A TW107105467 A TW 107105467A TW 107105467 A TW107105467 A TW 107105467A TW I737892 B TWI737892 B TW I737892B
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polyimide resin
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飯田慎太郎
桜井英章
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日商三菱綜合材料股份有限公司
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Abstract

本發明之電鍍液係由分散介質(13)與固體成分(11)所構成。固體成分(11)係包含聚醯亞胺系樹脂粒子(11a)與氟樹脂粒子(11b)。又,固體成分(11)中之氟樹脂粒子(11b)的含有比例為20~70質量%。再者,聚醯亞胺系樹脂粒子(11a)的中值直徑為50~400nm。

Description

電鍍液及使用此電鍍液之附絕緣被膜之導體的製造方法
本發明係有關於一種用來形成介電率低且絕緣崩潰電壓高的絕緣被膜之電鍍液、及使用此電鍍液來製造具有絕緣被膜之導體的方法。   本案係對2017年2月16日於日本所申請之日本特願2017-027100號主張其優先權,將其內容援用於此。
以往,已有人揭示一種在水性介質中分散有平均粒徑為1μm以下且比介電率為3以下的非成膜性微粒子、與由聚合性化合物及聚合物之至少一者所構成的有機粒子,可藉由電鍍形成絕緣膜的低介電率絕緣膜形成用水性分散液(例如參照專利文獻1)。於此低介電率絕緣膜形成用水性分散液中,非成膜性微粒子為選自含氟微粒子及交聯有機微粒子的至少一種。又,水性分散液係使用有機粒子分散於水性介質中的水性乳液所調製而成。此處所稱「水性介質」,係指以水為主成分的介質,此水性介質中之水的含有率通常為40重量%以上,較佳為50重量%以上。
如此構成的低介電率絕緣膜形成用水性分散液,可藉由將此分散液用於電鍍液的電鍍,形成介電率低且密接性良好的絕緣膜。又,此低介電率之絕緣膜,由於係藉由使用上述水性分散液的電鍍所製作而成,因此,比起藉由塗佈來製作之情形等,膜厚控制性及膜形成位置之控制性更優良。
再者,有人揭示一種藉由將聚醯亞胺樹脂、氟樹脂與電荷賦予劑分散於水中而成的水分散型樹脂乳液電鍍於導體上後,加以乾燥、烘烤而形成絕緣層之絕緣電線的製造方法(例如參照專利文獻2)。就此絕緣電線的製造方法,係藉由電鍍而以水分散型樹脂乳液被覆導體。此電鍍係藉由使上述導體通過充滿水分散型樹脂乳液的電鍍浴中等,在使導體浸漬於水分散型樹脂乳液中的狀態下施加電壓來進行。
就如此構成之絕緣電線的製造方法,可製造具備具充分的絕緣性能、厚度小,而且耐熱性亦優良的絕緣層之絕緣電線。其結果,絕緣電線可適用於要求耐熱性之電子設備內或電子設備間的配線。 [先前技術文獻] [專利文獻]
[專利文獻1] 日本特開2001-294815號公報(A)(請求項1、請求項2、段落[0023]、[0068])   [專利文獻2] 日本特開2002-298674號公報(A)(請求項1、段落[0020]、[0037]、圖1)
[發明所欲解決之課題]
然而,就上述習知專利文獻1所示之低介電率絕緣膜形成用水性分散液,由於未示出有機粒子的粒徑,且水在電鍍液中之溶媒中所佔的比率較高,因此乾燥時的溶媒揮發速度較快,容易產生起泡,有不易形成厚膜的問題。另外,就上述習知專利文獻2所示之絕緣電線的製造方法,由於未示出聚醯亞胺樹脂的粒徑,且水分散型樹脂乳液(電鍍液)中的溶媒全為水,因此乾燥時的溶媒揮發速度較快,容易產生起泡,有不易形成厚膜的問題。
本發明目的在於提供一種可使聚醯亞胺系樹脂及氟樹脂的複合膜厚膜化,而能夠獲得介電率低且絕緣崩潰電壓高的絕緣被膜之電鍍液及使用此電鍍液之附絕緣被膜之導體的製造方法。 [解決課題之手段]
本發明第1形態一種電鍍液,其特徵為:由分散介質與固體成分所構成,固體成分係包含聚醯亞胺系樹脂粒子與氟樹脂粒子,固體成分中之氟樹脂粒子的含有比例為20~70質量%,聚醯亞胺系樹脂粒子的中值直徑為50~400nm。
本發明第2形態為基於第1形態之發明,其中進而分散介質係包含極性溶劑、水及鹼,極性溶劑係具有高於水的沸點,分散介質中之水的含有比例為15~40質量%。
本發明第3形態為基於第1或第2形態之發明,其中進而聚醯亞胺系樹脂粒子係具有小於氟樹脂粒子的中值直徑。
本發明第4形態為一種附絕緣被膜之導體的製造方法,其係使用如第1至第3形態中任一項之電鍍液,在導體表面藉由電鍍形成絕緣被膜。
本發明第5形態為基於第4形態之發明,其中進而導體為金屬線。 [發明之效果]
就本發明第1形態之電鍍液,由於聚醯亞胺系樹脂粒子的中值直徑小至50~400nm,可減少電鍍時封入於聚醯亞胺系樹脂粒子或氟樹脂粒子之間之分散介質的量,而能夠抑制熱處理時之絕緣被膜的起泡。其結果,由於可使聚醯亞胺系樹脂及氟樹脂的複合膜之絕緣被膜形成為厚膜,因而介電率低、不易產生部分放電,且可提高絕緣被膜的絕緣崩潰電壓。
就本發明第2形態之電鍍液,由於極性溶劑具有高於水的沸點,且分散介質中之水的含有比例少至15~40質量%,因此,熱處理時的分散介質揮發速度較慢,可進一步抑制熱處理時之絕緣被膜的起泡。尤其是,在最終靜置於設定為皮膜的熱處理所需之溫度的爐內時,亦可進一步抑制絕緣被膜的起泡。
就本發明第3形態之電鍍液,由於聚醯亞胺系樹脂粒子具有小於氟樹脂粒子的中值直徑,聚醯亞胺系樹脂粒子更容易進入氟樹脂粒子間的間隙。其結果,可減少分散介質的封入量,而能夠進一步抑制熱處理時之絕緣被膜的起泡。
就本發明第4形態之附絕緣被膜之導體的製造方法,由於係使用上述電鍍液藉由電鍍將絕緣被膜形成於導體表面,而能夠抑制熱處理時之絕緣被膜的起泡。其結果,由於可使絕緣被膜厚膜化,而能夠製造具有介電率低、不易產生部分放電,且絕緣崩潰電壓高之絕緣被膜的導體。
就本發明第5形態之附絕緣被膜之導體的製造方法,由於係使用上述電鍍液藉由電鍍將絕緣被膜形成於金屬線表面,而能夠抑制熱處理時之絕緣被膜的起泡。其結果,由於可使絕緣被膜形成為厚膜,而能夠製造具有介電率低、不易產生部分放電,且絕緣崩潰電壓高之絕緣被膜的金屬線。
[實施發明之形態]
其次基於圖式說明用來實施本發明之形態。電鍍液係由分散介質與固體部分所構成。固體部分係包含聚醯亞胺系樹脂粒子與氟樹脂粒子。作為聚醯亞胺系樹脂,可舉出聚醯胺醯亞胺樹脂、聚醯亞胺樹脂、聚酯醯亞胺樹脂、聚醯胺酸樹脂等。又,作為氟樹脂,可舉出聚四氟乙烯(四氟)樹脂、四氟乙烯・全氟烷基乙烯基醚共聚物樹脂、全氟乙烯丙烯共聚物樹脂、聚偏二氟乙烯樹脂等。
固體成分中之氟樹脂粒子的含有比例為20~70質量%,較佳為30~70質量%。又,聚醯亞胺系樹脂粒子的中值直徑為50~400nm,較佳為50~200nm。又,氟樹脂粒子的中值直徑為50~500nm,較佳為50~300nm。再者,聚醯亞胺系樹脂粒子較佳具有小於氟樹脂粒子的中值直徑。於此,之所以將固體成分中之氟樹脂粒子的含有比例限定於20~70質量%的範圍內,是因為:若未達20質量%,便無法降低絕緣被膜的介電率;若超過70質量%,則絕緣被膜無法連續成膜而容易產生裂痕之故。又,之所以將聚醯亞胺系樹脂粒子的中值直徑限定於50~400nm的範圍內,是因為:若未達50nm,存在於樹脂粒子間的分散介質較少,使得膜的阻力變大而導致電鍍速度變慢,要獲得厚膜則需耗費時間;若超過400nm,電鍍液的分散穩定性會變差,而且在電鍍液的乾燥時若水的揮發量增加而形成較厚的絕緣被膜的話,則絕緣被膜容易起泡之故。再者,之所以將氟樹脂粒子的較佳中值直徑限定於50~500nm的範圍內,是因為:若未達50nm,存在於樹脂粒子間的分散介質較少,使得膜的阻力變大而導致電鍍速度變慢,要獲得厚膜則需耗費時間;若超過500nm,則電鍍液會凝聚產生沉澱而導致分散穩定性變差之故。
分散介質較佳包含極性溶劑、水及鹼。又,極性溶劑較佳具有高於水的沸點。作為極性溶劑,可舉出N-甲基-2-吡咯啶酮、1,3-二甲基-2-咪唑啉酮、二甲基亞碸、N,N-二甲基乙醯胺等的有機溶劑。再者,作為鹼,可舉出三正丙胺、二丁胺、哌啶、三乙胺等。分散介質中之水的含有比例較佳為15~40質量%,更佳為18~30質量%。又,分散介質中之極性溶劑的含有比例較佳為60~70質量%,更佳為65~70質量%。分散介質中之鹼的含有比例較佳為0.1~0.3質量%,更佳為0.1~0.2質量%。再者,電鍍液中之固體成分的含有比例較佳為1~10質量%,更佳為2~5質量%。
於此,之所以將分散介質中之水的較佳含有比例限定於15~40質量%的範圍內,是因為:若小於15質量%,電鍍液的導電率較小而無法藉由電鍍形成絕緣被膜;若超過40質量%,在電鍍液的乾燥時分散介質的揮發速度變快而形成較厚的絕緣被膜的話則絕緣被膜容易起泡之故。又,之所以將分散介質中之極性溶劑的較佳含有比例限定於60~70質量%的範圍內,是因為:若未達60質量%,分散介質中之水的比例偏多,致揮發速度變快而容易起泡;若超過70質量%則分散介質中之水的比例減少,致電鍍速度變慢,要獲得厚膜則需耗費時間。又,之所以將分散介質中之鹼的較佳含有比例限定於0.1~0.3質量%的範圍內,是因為:若未達0.1質量%,聚醯亞胺系樹脂粒子的中值直徑增加而使分散穩定性惡化;若超過0.3質量%則聚醯亞胺系樹脂粒子的中值直徑減少,存在於樹脂粒子間的分散介質變少,使得膜的阻力變大而導致電鍍速度變慢,要獲得厚膜則需耗費時間之故。再者,之所以將電鍍液中之固體成分的較佳含有比例限定於1~10質量%的範圍內,是因為:若未達1質量%,電鍍速度變慢,要獲得厚膜則需耗費時間;若超過10質量%則分散穩定性會惡化之故。此外,上述聚醯亞胺系樹脂粒子的中值直徑及氟樹脂粒子的中值直徑係使用動態光散射粒徑分布測定裝置(堀場製作所製LB-550)所測得的體積基準平均粒徑。
以下說明電鍍液的製造方法。 [聚醯亞胺系樹脂清漆的合成]   首先,在具備攪拌機、冷卻管、氮氣導入管及溫度計的2升四頸燒瓶內混合極性溶劑、異氰酸酯成分與酸成分,昇溫至80~130℃的溫度並於維持此溫度2~8小時使其反應,而得到聚醯亞胺系樹脂。於此,作為異氰酸酯成分,可舉出二苯基甲烷-4,4’-二異氰酸酯(MDI)、二苯基甲烷-3,3’-二異氰酸酯、二苯基甲烷-3,4’-二異氰酸酯、二苯基醚-4,4’-二異氰酸酯、二苯甲酮-4,4’-二異氰酸酯、二苯碸-4,4’-二異氰酸酯等芳香族二異氰酸酯等;作為酸成分,可舉出偏苯三酸酐(TMA)、1,2,5-偏苯三酸(1,2,5-ETM)、聯苯四羧酸二酐、二苯甲酮四羧酸二酐、二苯碸四羧酸二酐、氧二苯二甲酸二酐(OPDA)、苯均四酸二酐(PMDA)、4,4’-(2,2’-六氟亞異丙基)二鄰苯二甲酸二酐等。其後,將上述合成之聚醯亞胺系樹脂,使用極性溶劑稀釋而調製聚醯亞胺系樹脂清漆。
[聚醯亞胺系樹脂粒子的分散液的調製]   其次,將上述所得聚醯亞胺系樹脂清漆,以有機溶劑進一步加以稀釋,並添加鹼性化合物後,一邊攪拌一邊在室溫下添加水。藉此,即得到中值直徑50~400nm之聚醯亞胺系樹脂粒子的分散液。
[氟樹脂粒子的分散液的調製]   將市售氟樹脂粒子用水稀釋後,加以攪拌,而得到中值直徑50~500nm之氟樹脂粒子的分散液。
[電鍍液的調製]   藉由將聚醯亞胺系樹脂粒子的分散液與氟樹脂粒子的分散液混合,而得到電鍍液。
要使用上述電鍍液在導體表面形成絕緣被膜,較佳為使用電鍍液藉由電鍍法在導體的表面形成電鍍膜後,藉由進行乾燥處理及烘烤處理,而於導體的表面形成絕緣被膜。此絕緣被膜的厚度較佳為10~70μm,更佳為20~50μm。絕緣被膜的絕緣崩潰電壓,當絕緣被膜的厚度為40μm時,較佳至少為5kV。又,作為上述導體,可舉出金屬線、金屬板等。當導體為金屬線時,作為金屬線之材質,較佳為具有良好的導電性的銅、銅合金、鋁、鋁合金等。
就如此構成之附絕緣被膜之導體,由於用來形成絕緣被膜的電鍍液中之聚醯亞胺系樹脂粒子的中值直徑小至50~400nm,可減少在電鍍時封入於聚醯亞胺系樹脂粒子或氟樹脂粒子之間之分散介質的量,而能夠抑制熱處理時之絕緣被膜的起泡。具體而言,係如圖1所示,當屬固體成分11的聚醯亞胺系樹脂粒子11a及氟樹脂粒子11b當中聚醯亞胺系樹脂粒子11a的中值直徑小至50~400nm時,在導體12表面,聚醯亞胺系樹脂粒子11a大量進入氟樹脂粒子11b之間而緊密地堆填,由於殘留於此等粒子11a,11b間的分散介質13變少(圖1(b)),於烘烤處理後絕緣被膜14不易產生起泡(圖1(c))。相對於此,如圖2所示,屬固體成分21的聚醯亞胺系樹脂粒子21a及氟樹脂粒子21b當中,氟樹脂粒子21b的中值直徑係與上述氟樹脂粒子11b相同,當聚醯亞胺系樹脂粒子21a的中值直徑大於上述範圍時,則在導體22表面,聚醯亞胺系樹脂粒子21a無法大量進入氟樹脂粒子21b之間而稀疏地堆填,由於殘留於此等粒子21a,21b間的分散介質23變多(圖2(b)),於烘烤處理後絕緣被膜24容易產生起泡24a(圖2(c))。其結果,於本實施形態中,由於可使屬聚醯亞胺系樹脂及氟樹脂的複合膜之絕緣被膜14厚膜化,而能夠提高附絕緣被膜之導體10之絕緣被膜14的絕緣崩潰電壓。又,於本實施形態中,透過極性溶劑具有高於水的沸點,並使分散介質中之水的含有比例少至15~40質量%,使熱處理時的分散介質揮發速度變慢,而能夠進一步抑制熱處理時之絕緣被膜的起泡。再者,於本實施形態中,聚醯亞胺系樹脂粒子若具有小於氟樹脂粒子的中值直徑,則聚醯亞胺系樹脂粒子更容易進入氟樹脂粒子間的間隙,因此可減少分散介質的封入量,而能夠進一步抑制熱處理時之絕緣被膜的起泡。 [實施例]
其次與比較例共同詳細說明本發明之實施例。
<實施例1>   茲說明電鍍液的製造方法。 [聚醯亞胺系樹脂清漆的合成]   首先,對具備攪拌機、冷卻管、氮氣導入管及溫度計的2升四頸燒瓶內投入747g的N-甲基-2-吡咯啶酮(極性溶劑)、298g(1.19莫耳)的二苯基甲烷-4,4’-二異氰酸酯(MDI,異氰酸酯成分)與227g(1.18莫耳)的偏苯三酸酐(TMA,酸成分)並使其昇溫至130℃。於此溫度下使其反應約4小時,而得到數量平均分子量為17000的聚合物(聚醯胺醯亞胺樹脂)。其後,將上述合成之聚醯胺醯亞胺樹脂,以N-甲基-2-吡咯啶酮(極性溶劑)稀釋成聚醯胺醯亞胺樹脂(不揮發分)的濃度為20質量%,而得到聚醯胺醯亞胺樹脂清漆(聚醯胺醯亞胺樹脂:N-甲基-2-吡咯啶酮=20質量%:80質量%)。
[聚醯亞胺系樹脂粒子的分散液的調製]   其次,將上述所得聚醯胺醯亞胺樹脂清漆62.5g以N-甲基-2-吡咯啶酮140g(極性溶劑)進一步加以稀釋,並添加三正丙胺(鹼性化合物(鹼))0.5g後,一邊以旋轉速度10000rpm的高速攪拌此液,一邊在室溫下(25℃)添加47g的水。藉此,即得到中值直徑160nm之聚醯胺醯亞胺樹脂粒子的分散液(聚醯胺醯亞胺樹脂粒子:N-甲基-2-吡咯啶酮:水:三正丙胺=5質量%:76質量%:18.8質量%:0.2質量%)250g。
[氟樹脂粒子的分散液的調製]   用水稀釋氟樹脂粒子:水為60質量%:40質量%的Polyflon PTFE-D(DAIKIN工業公司製),而得到中值直徑200nm之氟樹脂粒子的分散液(氟樹脂粒子:水=30質量%:70質量%)。
[電鍍液的調製]   將聚醯亞胺系樹脂粒子的分散液60g與氟樹脂粒子的分散液10g混合而得到電鍍液(聚醯胺醯亞胺樹脂粒子:氟樹脂粒子:N-甲基-2-吡咯啶酮:水:三正丙胺=4.3質量%:4.3質量%:65質量%:26.2質量%:0.2質量%)。此外,上述聚醯胺醯亞胺樹脂粒子及氟樹脂粒子為固體成分,上述N-甲基-2-吡咯啶酮(極性溶劑)、水及三正丙胺(鹼)為分散介質。
[絕緣被膜的製作]   使用上述調製之電鍍液製作絕緣被膜。具體而言,首先,將電鍍液儲存於電鍍槽內,將此電鍍槽內之電鍍液的溫度調成20℃。其次,以直徑及長度各為1mm及300mm的銅線(導體)為陽極、以插入至上述電鍍槽內之電鍍液的圓筒型銅板為陰極,在對銅線與圓筒型銅板之間施加直流電壓100V的狀態下,將銅線及圓筒型銅板保持於電鍍槽內的電鍍液中30秒。藉此,便於銅線的表面形成電鍍膜。其次,將形成有電鍍膜的銅線靜置於250℃的馬弗爐中3分鐘進行乾燥處理,而得到表面形成有厚度40μm之絕緣被膜的銅線。以此附絕緣被膜之銅線作為實施例1。
<實施例2~10及比較例1~8>   如表1所示,分別改變聚醯亞胺系樹脂粒子及氟系樹脂粒子的種類、固體成分中之聚醯亞胺系樹脂粒子的含有比例、固體成分中之氟樹脂粒子的含有比例、分散介質中之極性溶媒的含有比例、分散介質中之水的含有比例、分散介質中之鹼的含有比例與聚醯亞胺系樹脂粒子的中值直徑,以與實施例1同樣的方式調製電鍍液,並使用此電鍍液製作附絕緣被膜之銅線。以此等附絕緣被膜之銅線作為實施例2~10及比較例1~5。
<比較試驗1及評定>   觀察實施例1~10及比較例1~5之附絕緣被膜之銅線之絕緣被膜的外觀,並分別測定比介電率及絕緣崩潰電壓。具體而言,係根據目視觀察絕緣被膜的外觀。又,比介電率係使用LCR計(日置電機公司製),由絕緣被膜的靜電電容與絕緣被膜的膜厚算出介電率,再由此介電率除以真空的介電率ε0 (8.85×10-12 F/m)來求得。此外,絕緣被膜的膜厚係使用測微計(Mitutoyo公司製)來測定。再者,絕緣崩潰電壓係將金屬箔捲繞於厚度40μm之附絕緣被膜之導線,使用絕緣崩潰試驗機(東特塗料公司製)來測定。將其結果示於表1。
此外,就表1之絕緣被膜的外觀,「良好」表示絕緣被膜未產生裂痕而能夠電鍍絕緣被膜;「裂痕」表示絕緣被膜產生裂痕;「無法電鍍」表示無法形成厚度40μm的絕緣被膜;「起泡」表示絕緣被膜產生起泡。另外,表1中,「PI系樹脂粒子」為聚醯亞胺系樹脂粒子,「PAI」為聚醯胺醯亞胺樹脂粒子,「PI」為聚醯亞胺樹脂粒子,「PTFE」為聚四氟乙烯(四氟)樹脂粒子(DAIKIN工業公司製Polyflon PTFE-D),「PFA」為四氟乙烯・全氟烷基乙烯基醚共聚物樹脂粒子(DAIKIN工業公司製Neoflon PFA)。又,表1中,PI/固體成分為固體成分(氟樹脂粒子及聚醯亞胺系樹脂粒子的合計量)中之聚醯亞胺系樹脂粒子的含有比例,F/固體成分為固體成分(氟樹脂粒子及聚醯亞胺系樹脂粒子的合計量)中之氟樹脂粒子的含有比例,「分散介質」為水、極性溶劑及鹼的合計量。
Figure 02_image001
由表1可知,就未使用氟樹脂粒子而僅使用聚醯胺醯亞胺樹脂粒子的比較例1,其絕緣被膜的外觀良好,絕緣崩潰電壓雖高達6.3kV,但比介電率高達4.7;就氟樹脂粒子少至10質量%的比較例2,其絕緣被膜的外觀良好,絕緣崩潰電壓雖高達6.1kV,但比介電率高達4.5;就氟樹脂粒子多到80質量%的比較例3,其絕緣被膜的比介電率雖低至2.7,但絕緣被膜產生裂痕,且絕緣崩潰電壓低至0.4kV。相對於此等,就氟樹脂粒子為20~70質量%而屬適切範圍內的實施例1~3,其絕緣被膜的外觀良好,比介電率低至2.8~4.3,且絕緣崩潰電壓高達5.0~6.0kV。
又,就聚醯胺醯亞胺樹脂粒子的中值直徑大到500nm的比較例6,絕緣被膜的比介電率雖低至3.4,但絕緣被膜產生起泡,且絕緣崩潰電壓低至0.5kV;就聚醯胺醯亞胺樹脂粒子的中值直徑小至20nm的比較例7,絕緣被膜的比介電率雖低至3.4,但絕緣被膜的厚度未達到40μm,而測不出厚度40μm之絕緣被膜的絕緣崩潰電壓。相對於此等,就聚醯胺醯亞胺樹脂粒子的中值直徑為50~400nm而屬適切範圍內的實施例6及7,其絕緣被膜的外觀良好,比介電率各低至3.4,且絕緣崩潰電壓各高達5.5kV。
再者,就水/分散介質為10~40質量%而屬較佳範圍之下限值及上限值的實施例4及5,其絕緣被膜的外觀良好,比介電率各低至3.4,且絕緣崩潰電壓高達5.5~5.7kV。
另一方面,就對聚醯胺醯亞胺樹脂粒子混合PFA樹脂粒子而成的實施例8,其絕緣被膜的外觀良好,比介電率低至3.4,且絕緣崩潰電壓高達5.8kV。又,就對聚醯亞胺樹脂粒子混合PTFE樹脂粒子而成的實施例9,其絕緣被膜的外觀良好,比介電率低至3.0,且絕緣崩潰電壓高達5.5kV。再者,就對聚醯亞胺樹脂粒子混合PFA樹脂粒子而成的實施例10,其絕緣被膜的外觀良好,比介電率低至3.0,且絕緣崩潰電壓高達5.3kV。 [產業上可利用性]
本發明之電鍍液可利用於如絕緣電線般耐部分放電性優良,且需要高絕緣崩潰電壓之被覆的物品的製造。
10‧‧‧附絕緣被膜之導體11‧‧‧固體成分11a‧‧‧聚醯亞胺系樹脂粒子11b‧‧‧氟樹脂粒子12‧‧‧導體13‧‧‧分散介質14‧‧‧絕緣被膜
圖1為表示使用本發明實施形態之聚醯亞胺系樹脂粒子的中值直徑較小的電鍍液來形成絕緣被膜時未產生氣泡之機制的示意圖;(a)為表示剛開始電鍍後之電鍍液的剖面示意圖;(b)為表示電鍍結束後之電鍍膜的剖面示意圖;(c)為表示烘烤處理後之絕緣被膜的剖面示意圖。   圖2為表示使用參考形態之聚醯亞胺系樹脂粒子的中值直徑較大的電鍍液來形成絕緣被膜時產生氣泡之機制的示意圖;(a)為表示剛開始電鍍後之電鍍液的剖面示意圖;(b)為表示電鍍結束後之電鍍膜的剖面示意圖;(c)為表示烘烤處理後之絕緣被膜的剖面示意圖。
10‧‧‧附絕緣被膜之導體
11‧‧‧固體成分
11a‧‧‧聚醯亞胺系樹脂粒子
11b‧‧‧氟樹脂粒子
12‧‧‧導體
13‧‧‧分散介質
14‧‧‧絕緣被膜

Claims (4)

  1. 一種電鍍液,其特徵為:由分散介質與固體成分所構成,前述固體成分係包含聚醯亞胺系樹脂粒子與氟樹脂粒子,前述固體成分中之前述氟樹脂粒子的含有比例為20~70質量%,前述聚醯亞胺系樹脂粒子的中值直徑為50~400nm,構成前述聚醯亞胺系樹脂粒子之聚醯亞胺系樹脂係由聚醯胺醯亞胺樹脂、聚醯亞胺樹脂、聚酯醯亞胺樹脂及聚醯胺酸樹脂選出的1種以上,構成前述氟樹脂粒子之氟樹脂係由聚四氟乙烯(四氟)樹脂、四氟乙烯‧全氟烷基乙烯基醚共聚物樹脂、全氟乙烯丙烯共聚物樹脂及聚偏二氟乙烯樹脂選出的1種以上,前述分散介質係包含極性溶劑、水及鹼,前述極性溶劑係具有高於水的沸點,前述極性溶劑係由N-甲基-2-吡咯啶酮、1,3-二甲基-2-咪唑啉酮、二甲基亞碸及N,N-二甲基乙醯胺選出的1種以上,前述鹼係由三正丙胺、二丁胺、哌啶及三乙胺選出的1種以上,前述分散介質中之前述水的含有比例為15~40質量%, 前述分散介質中之前述極性溶劑的含有比例為59.8~84.8質量%,前述分散介質中之前述鹼的含有比例為0.1~0.3質量%。
  2. 如請求項1之電鍍液,其中前述聚醯亞胺系樹脂粒子係具有小於前述氟樹脂粒子的中值直徑。
  3. 一種附絕緣被膜之導體的製造方法,其係使用如請求項1或2中任一項之電鍍液,在導體表面藉由電鍍形成絕緣被膜。
  4. 如請求項3之附絕緣被膜之導體的製造方法,其中前述導體為金屬線。
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