TWI736489B - 攝像裝置、監視裝置、以及電子裝置 - Google Patents
攝像裝置、監視裝置、以及電子裝置 Download PDFInfo
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- TWI736489B TWI736489B TW109144013A TW109144013A TWI736489B TW I736489 B TWI736489 B TW I736489B TW 109144013 A TW109144013 A TW 109144013A TW 109144013 A TW109144013 A TW 109144013A TW I736489 B TWI736489 B TW I736489B
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- current
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
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- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/709—Circuitry for control of the power supply
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/10—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from different wavelengths
- H04N23/11—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from different wavelengths for generating image signals from visible and infrared light wavelengths
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
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- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
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- H—ELECTRICITY
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- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/78—Readout circuits for addressed sensors, e.g. output amplifiers or A/D converters
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- H—ELECTRICITY
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- H04N5/30—Transforming light or analogous information into electric information
- H04N5/32—Transforming X-rays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/803—Pixels having integrated switching, control, storage or amplification elements
- H10F39/8037—Pixels having integrated switching, control, storage or amplification elements the integrated elements comprising a transistor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
- H10F39/8063—Microlenses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/811—Interconnections
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- Signal Processing (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Dram (AREA)
- Alarm Systems (AREA)
- Indicating And Signalling Devices For Elevators (AREA)
- Maintenance And Inspection Apparatuses For Elevators (AREA)
- Studio Devices (AREA)
- Thin Film Transistor (AREA)
- Electroluminescent Light Sources (AREA)
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| JP2014-156296 | 2014-07-31 | ||
| JP2014156296 | 2014-07-31 | ||
| JP2014-179769 | 2014-09-04 | ||
| JP2014179769 | 2014-09-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202126029A TW202126029A (zh) | 2021-07-01 |
| TWI736489B true TWI736489B (zh) | 2021-08-11 |
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Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109144013A TWI736489B (zh) | 2014-07-31 | 2015-07-22 | 攝像裝置、監視裝置、以及電子裝置 |
| TW104123779A TWI672045B (zh) | 2014-07-31 | 2015-07-22 | 攝像裝置、監視裝置、以及電子裝置 |
| TW108121632A TWI714134B (zh) | 2014-07-31 | 2015-07-22 | 攝像裝置、監視裝置、以及電子裝置 |
| TW110127999A TWI766782B (zh) | 2014-07-31 | 2015-07-22 | 攝像裝置、監視裝置、以及電子裝置 |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104123779A TWI672045B (zh) | 2014-07-31 | 2015-07-22 | 攝像裝置、監視裝置、以及電子裝置 |
| TW108121632A TWI714134B (zh) | 2014-07-31 | 2015-07-22 | 攝像裝置、監視裝置、以及電子裝置 |
| TW110127999A TWI766782B (zh) | 2014-07-31 | 2015-07-22 | 攝像裝置、監視裝置、以及電子裝置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10021329B2 (enExample) |
| JP (3) | JP6555956B2 (enExample) |
| KR (2) | KR20160016638A (enExample) |
| TW (4) | TWI736489B (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014112002A1 (ja) * | 2013-01-15 | 2014-07-24 | オリンパス株式会社 | 撮像素子、及び撮像装置 |
| US9773832B2 (en) | 2014-12-10 | 2017-09-26 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and electronic device |
| US10389961B2 (en) | 2015-04-09 | 2019-08-20 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device and electronic device |
| US9848146B2 (en) | 2015-04-23 | 2017-12-19 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device and electronic device |
| JP6777421B2 (ja) | 2015-05-04 | 2020-10-28 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| KR20160144314A (ko) | 2015-06-08 | 2016-12-16 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 촬상 장치 및 그 동작 방법, 및 전자 기기 |
| US9860465B2 (en) | 2015-06-23 | 2018-01-02 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device and electronic device |
| TWI738569B (zh) | 2015-07-07 | 2021-09-01 | 日商半導體能源研究所股份有限公司 | 成像裝置及其運作方法 |
| US10373991B2 (en) | 2015-08-19 | 2019-08-06 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device, operating method thereof, and electronic device |
| JP6796461B2 (ja) * | 2015-11-18 | 2020-12-09 | 株式会社半導体エネルギー研究所 | 半導体装置、コンピュータ及び電子機器 |
| KR20170061602A (ko) | 2015-11-26 | 2017-06-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 전자 기기 |
| US10027896B2 (en) | 2016-01-15 | 2018-07-17 | Semiconductor Energy Laboratory Co., Ltd. | Image display system, operation method of the same, and electronic device |
| US10250247B2 (en) | 2016-02-10 | 2019-04-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic component, and electronic device |
| JP6906978B2 (ja) | 2016-02-25 | 2021-07-21 | 株式会社半導体エネルギー研究所 | 半導体装置、半導体ウェハ、および電子機器 |
| JP7007257B2 (ja) | 2016-03-18 | 2022-01-24 | 株式会社半導体エネルギー研究所 | 撮像装置、モジュール、および電子機器 |
| US10547803B2 (en) * | 2016-09-30 | 2020-01-28 | Canon Kabushiki Kaisha | Imaging apparatuses, systems, and moving imaging objects |
| WO2018069785A1 (en) * | 2016-10-12 | 2018-04-19 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and system using the same |
| KR102786020B1 (ko) | 2016-10-18 | 2025-03-26 | 소니 세미컨덕터 솔루션즈 가부시키가이샤 | 광검출기 |
| JP7058479B2 (ja) * | 2016-10-18 | 2022-04-22 | ソニーセミコンダクタソリューションズ株式会社 | 光検出器 |
| TW201824870A (zh) * | 2016-12-08 | 2018-07-01 | 日商半導體能源研究所股份有限公司 | 電子裝置及包含該電子裝置的系統 |
| US10777597B2 (en) * | 2017-03-22 | 2020-09-15 | Sony Semiconductor Solutions Corporation | Imaging device |
| US11284033B2 (en) * | 2017-10-13 | 2022-03-22 | Sony Semiconductor Solutions Corporation | Solid-state image sensor, method of driving solid-state image sensor, and electronic apparatus |
| WO2019102296A1 (ja) * | 2017-11-23 | 2019-05-31 | 株式会社半導体エネルギー研究所 | 撮像装置、および電子機器 |
| US11317045B2 (en) * | 2017-12-11 | 2022-04-26 | Prophesee | Event-based image sensor and operating method thereof |
| JP2020162320A (ja) * | 2019-03-27 | 2020-10-01 | ソニー株式会社 | 医療用電源システム、情報処理装置、情報処理方法、画像処理装置、画像処理方法 |
| FR3100925B1 (fr) * | 2019-09-17 | 2021-10-15 | Commissariat Energie Atomique | Capteur d’image à plage dynamique augmentée |
| JP7686438B2 (ja) * | 2020-05-07 | 2025-06-02 | キヤノン株式会社 | 撮像素子、撮像装置、監視装置、および撮像素子の制御方法 |
| CN114303307B (zh) * | 2020-06-23 | 2024-08-16 | 庆鼎精密电子(淮安)有限公司 | 相机模组及其制备方法 |
| CN111988568B (zh) * | 2020-08-19 | 2022-01-28 | 淄博职业学院 | 轻轨路口沿线移动监控的机器人 |
| CN112532899B (zh) * | 2020-11-27 | 2023-06-30 | 京东方科技集团股份有限公司 | 光电转换电路、驱动方法、光电检测基板、光电检测装置 |
| CN114823745B (zh) | 2021-01-28 | 2024-10-29 | 睿生光电股份有限公司 | X射线装置 |
| TWI813943B (zh) | 2021-02-04 | 2023-09-01 | 神盾股份有限公司 | 影像感測器晶片及其感測方法 |
| US11616926B2 (en) | 2021-04-29 | 2023-03-28 | Samsung Electronics Co., Ltd. | Analog-to-digital converting circuit using output signal feedback and operation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030067424A1 (en) * | 2001-10-10 | 2003-04-10 | Hajime Akimoto | Image display device |
| US20050007316A1 (en) * | 2003-05-15 | 2005-01-13 | Hajime Akimoto | Image display device |
| US20050051707A1 (en) * | 2003-04-11 | 2005-03-10 | Cyrus Bamji | Method and system to differentially enhance sensor dynamic range |
| US20130134535A1 (en) * | 2011-11-08 | 2013-05-30 | Victor Lenchenkov | Backside image sensor pixel with silicon microlenses and metal reflector |
| US20130194474A1 (en) * | 2008-10-31 | 2013-08-01 | Canon Kabushiki Kaisha | Solid-state image pickup apparatus, image pickup system, and driving method of the solid-state image pickup apparatus |
Family Cites Families (115)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60198861A (ja) | 1984-03-23 | 1985-10-08 | Fujitsu Ltd | 薄膜トランジスタ |
| JPH0244256B2 (ja) | 1987-01-28 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn2o5deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPS63210023A (ja) | 1987-02-24 | 1988-08-31 | Natl Inst For Res In Inorg Mater | InGaZn↓4O↓7で示される六方晶系の層状構造を有する化合物およびその製造法 |
| JPH0244260B2 (ja) | 1987-02-24 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn5o8deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH0244258B2 (ja) | 1987-02-24 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn3o6deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH0244262B2 (ja) | 1987-02-27 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn6o9deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH0244263B2 (ja) | 1987-04-22 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn7o10deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
| JPH05251705A (ja) | 1992-03-04 | 1993-09-28 | Fuji Xerox Co Ltd | 薄膜トランジスタ |
| US5705807A (en) | 1994-10-24 | 1998-01-06 | Nissan Motor Co., Ltd. | Photo detecting apparatus for detecting reflected light from an object and excluding an external light componet from the reflected light |
| JP3479375B2 (ja) | 1995-03-27 | 2003-12-15 | 科学技術振興事業団 | 亜酸化銅等の金属酸化物半導体による薄膜トランジスタとpn接合を形成した金属酸化物半導体装置およびそれらの製造方法 |
| EP0820644B1 (en) | 1995-08-03 | 2005-08-24 | Koninklijke Philips Electronics N.V. | Semiconductor device provided with transparent switching element |
| JP3625598B2 (ja) | 1995-12-30 | 2005-03-02 | 三星電子株式会社 | 液晶表示装置の製造方法 |
| JP4271268B2 (ja) | 1997-09-20 | 2009-06-03 | 株式会社半導体エネルギー研究所 | イメージセンサおよびイメージセンサ一体型アクティブマトリクス型表示装置 |
| JP4170454B2 (ja) | 1998-07-24 | 2008-10-22 | Hoya株式会社 | 透明導電性酸化物薄膜を有する物品及びその製造方法 |
| JP2000150861A (ja) | 1998-11-16 | 2000-05-30 | Tdk Corp | 酸化物薄膜 |
| JP3276930B2 (ja) | 1998-11-17 | 2002-04-22 | 科学技術振興事業団 | トランジスタ及び半導体装置 |
| TW460731B (en) | 1999-09-03 | 2001-10-21 | Ind Tech Res Inst | Electrode structure and production method of wide viewing angle LCD |
| JP4089858B2 (ja) | 2000-09-01 | 2008-05-28 | 国立大学法人東北大学 | 半導体デバイス |
| KR20020038482A (ko) | 2000-11-15 | 2002-05-23 | 모리시타 요이찌 | 박막 트랜지스터 어레이, 그 제조방법 및 그것을 이용한표시패널 |
| JP3997731B2 (ja) | 2001-03-19 | 2007-10-24 | 富士ゼロックス株式会社 | 基材上に結晶性半導体薄膜を形成する方法 |
| JP2002289859A (ja) | 2001-03-23 | 2002-10-04 | Minolta Co Ltd | 薄膜トランジスタ |
| JP4090716B2 (ja) | 2001-09-10 | 2008-05-28 | 雅司 川崎 | 薄膜トランジスタおよびマトリクス表示装置 |
| JP3925839B2 (ja) | 2001-09-10 | 2007-06-06 | シャープ株式会社 | 半導体記憶装置およびその試験方法 |
| WO2003040441A1 (fr) | 2001-11-05 | 2003-05-15 | Japan Science And Technology Agency | Film mince monocristallin homologue a super-reseau naturel, procede de preparation et dispositif dans lequel est utilise ledit film mince monocristallin |
| JP4164562B2 (ja) | 2002-09-11 | 2008-10-15 | 独立行政法人科学技術振興機構 | ホモロガス薄膜を活性層として用いる透明薄膜電界効果型トランジスタ |
| JP4083486B2 (ja) | 2002-02-21 | 2008-04-30 | 独立行政法人科学技術振興機構 | LnCuO(S,Se,Te)単結晶薄膜の製造方法 |
| CN1445821A (zh) | 2002-03-15 | 2003-10-01 | 三洋电机株式会社 | ZnO膜和ZnO半导体层的形成方法、半导体元件及其制造方法 |
| JP3933591B2 (ja) | 2002-03-26 | 2007-06-20 | 淳二 城戸 | 有機エレクトロルミネッセント素子 |
| US7339187B2 (en) | 2002-05-21 | 2008-03-04 | State Of Oregon Acting By And Through The Oregon State Board Of Higher Education On Behalf Of Oregon State University | Transistor structures |
| JP2004022625A (ja) | 2002-06-13 | 2004-01-22 | Murata Mfg Co Ltd | 半導体デバイス及び該半導体デバイスの製造方法 |
| US7105868B2 (en) | 2002-06-24 | 2006-09-12 | Cermet, Inc. | High-electron mobility transistor with zinc oxide |
| US7067843B2 (en) | 2002-10-11 | 2006-06-27 | E. I. Du Pont De Nemours And Company | Transparent oxide semiconductor thin film transistors |
| JP4166105B2 (ja) | 2003-03-06 | 2008-10-15 | シャープ株式会社 | 半導体装置およびその製造方法 |
| JP2004273732A (ja) | 2003-03-07 | 2004-09-30 | Sharp Corp | アクティブマトリクス基板およびその製造方法 |
| JP4108633B2 (ja) | 2003-06-20 | 2008-06-25 | シャープ株式会社 | 薄膜トランジスタおよびその製造方法ならびに電子デバイス |
| US7262463B2 (en) | 2003-07-25 | 2007-08-28 | Hewlett-Packard Development Company, L.P. | Transistor including a deposited channel region having a doped portion |
| US7297977B2 (en) | 2004-03-12 | 2007-11-20 | Hewlett-Packard Development Company, L.P. | Semiconductor device |
| US7282782B2 (en) | 2004-03-12 | 2007-10-16 | Hewlett-Packard Development Company, L.P. | Combined binary oxide semiconductor device |
| US7145174B2 (en) | 2004-03-12 | 2006-12-05 | Hewlett-Packard Development Company, Lp. | Semiconductor device |
| CN1998087B (zh) | 2004-03-12 | 2014-12-31 | 独立行政法人科学技术振兴机构 | 非晶形氧化物和薄膜晶体管 |
| US7211825B2 (en) | 2004-06-14 | 2007-05-01 | Yi-Chi Shih | Indium oxide-based thin film transistors and circuits |
| JP2006100760A (ja) | 2004-09-02 | 2006-04-13 | Casio Comput Co Ltd | 薄膜トランジスタおよびその製造方法 |
| US7285501B2 (en) | 2004-09-17 | 2007-10-23 | Hewlett-Packard Development Company, L.P. | Method of forming a solution processed device |
| US7298084B2 (en) | 2004-11-02 | 2007-11-20 | 3M Innovative Properties Company | Methods and displays utilizing integrated zinc oxide row and column drivers in conjunction with organic light emitting diodes |
| US7453065B2 (en) | 2004-11-10 | 2008-11-18 | Canon Kabushiki Kaisha | Sensor and image pickup device |
| US7863611B2 (en) | 2004-11-10 | 2011-01-04 | Canon Kabushiki Kaisha | Integrated circuits utilizing amorphous oxides |
| US7829444B2 (en) | 2004-11-10 | 2010-11-09 | Canon Kabushiki Kaisha | Field effect transistor manufacturing method |
| KR20070085879A (ko) | 2004-11-10 | 2007-08-27 | 캐논 가부시끼가이샤 | 발광 장치 |
| CA2585190A1 (en) | 2004-11-10 | 2006-05-18 | Canon Kabushiki Kaisha | Amorphous oxide and field effect transistor |
| US7868326B2 (en) | 2004-11-10 | 2011-01-11 | Canon Kabushiki Kaisha | Field effect transistor |
| US7791072B2 (en) | 2004-11-10 | 2010-09-07 | Canon Kabushiki Kaisha | Display |
| US7579224B2 (en) | 2005-01-21 | 2009-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing a thin film semiconductor device |
| TWI472037B (zh) | 2005-01-28 | 2015-02-01 | 半導體能源研究所股份有限公司 | 半導體裝置,電子裝置,和半導體裝置的製造方法 |
| TWI569441B (zh) | 2005-01-28 | 2017-02-01 | 半導體能源研究所股份有限公司 | 半導體裝置,電子裝置,和半導體裝置的製造方法 |
| US7858451B2 (en) | 2005-02-03 | 2010-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device, semiconductor device and manufacturing method thereof |
| US7948171B2 (en) | 2005-02-18 | 2011-05-24 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
| US20060197092A1 (en) | 2005-03-03 | 2006-09-07 | Randy Hoffman | System and method for forming conductive material on a substrate |
| US8681077B2 (en) | 2005-03-18 | 2014-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, and display device, driving method and electronic apparatus thereof |
| US7544967B2 (en) | 2005-03-28 | 2009-06-09 | Massachusetts Institute Of Technology | Low voltage flexible organic/transparent transistor for selective gas sensing, photodetecting and CMOS device applications |
| US7645478B2 (en) | 2005-03-31 | 2010-01-12 | 3M Innovative Properties Company | Methods of making displays |
| US8300031B2 (en) | 2005-04-20 | 2012-10-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device comprising transistor having gate and drain connected through a current-voltage conversion element |
| JP2006344849A (ja) | 2005-06-10 | 2006-12-21 | Casio Comput Co Ltd | 薄膜トランジスタ |
| US7691666B2 (en) | 2005-06-16 | 2010-04-06 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| US7402506B2 (en) | 2005-06-16 | 2008-07-22 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| US7507618B2 (en) | 2005-06-27 | 2009-03-24 | 3M Innovative Properties Company | Method for making electronic devices using metal oxide nanoparticles |
| KR100711890B1 (ko) | 2005-07-28 | 2007-04-25 | 삼성에스디아이 주식회사 | 유기 발광표시장치 및 그의 제조방법 |
| JP2007059128A (ja) | 2005-08-23 | 2007-03-08 | Canon Inc | 有機el表示装置およびその製造方法 |
| JP4280736B2 (ja) | 2005-09-06 | 2009-06-17 | キヤノン株式会社 | 半導体素子 |
| JP5116225B2 (ja) | 2005-09-06 | 2013-01-09 | キヤノン株式会社 | 酸化物半導体デバイスの製造方法 |
| JP4850457B2 (ja) | 2005-09-06 | 2012-01-11 | キヤノン株式会社 | 薄膜トランジスタ及び薄膜ダイオード |
| JP2007073705A (ja) | 2005-09-06 | 2007-03-22 | Canon Inc | 酸化物半導体チャネル薄膜トランジスタおよびその製造方法 |
| EP1998373A3 (en) | 2005-09-29 | 2012-10-31 | Semiconductor Energy Laboratory Co, Ltd. | Semiconductor device having oxide semiconductor layer and manufacturing method thereof |
| JP5037808B2 (ja) | 2005-10-20 | 2012-10-03 | キヤノン株式会社 | アモルファス酸化物を用いた電界効果型トランジスタ、及び該トランジスタを用いた表示装置 |
| WO2007058329A1 (en) | 2005-11-15 | 2007-05-24 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| TWI292281B (en) | 2005-12-29 | 2008-01-01 | Ind Tech Res Inst | Pixel structure of active organic light emitting diode and method of fabricating the same |
| US7867636B2 (en) | 2006-01-11 | 2011-01-11 | Murata Manufacturing Co., Ltd. | Transparent conductive film and method for manufacturing the same |
| JP4977478B2 (ja) | 2006-01-21 | 2012-07-18 | 三星電子株式会社 | ZnOフィルム及びこれを用いたTFTの製造方法 |
| US7576394B2 (en) | 2006-02-02 | 2009-08-18 | Kochi Industrial Promotion Center | Thin film transistor including low resistance conductive thin films and manufacturing method thereof |
| US7977169B2 (en) | 2006-02-15 | 2011-07-12 | Kochi Industrial Promotion Center | Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof |
| KR20070101595A (ko) | 2006-04-11 | 2007-10-17 | 삼성전자주식회사 | ZnO TFT |
| US20070252928A1 (en) | 2006-04-28 | 2007-11-01 | Toppan Printing Co., Ltd. | Structure, transmission type liquid crystal display, reflection type display and manufacturing method thereof |
| JP5028033B2 (ja) | 2006-06-13 | 2012-09-19 | キヤノン株式会社 | 酸化物半導体膜のドライエッチング方法 |
| JP4609797B2 (ja) | 2006-08-09 | 2011-01-12 | Nec液晶テクノロジー株式会社 | 薄膜デバイス及びその製造方法 |
| JP4999400B2 (ja) | 2006-08-09 | 2012-08-15 | キヤノン株式会社 | 酸化物半導体膜のドライエッチング方法 |
| JP4332545B2 (ja) | 2006-09-15 | 2009-09-16 | キヤノン株式会社 | 電界効果型トランジスタ及びその製造方法 |
| JP5164357B2 (ja) | 2006-09-27 | 2013-03-21 | キヤノン株式会社 | 半導体装置及び半導体装置の製造方法 |
| JP4274219B2 (ja) | 2006-09-27 | 2009-06-03 | セイコーエプソン株式会社 | 電子デバイス、有機エレクトロルミネッセンス装置、有機薄膜半導体装置 |
| US7622371B2 (en) | 2006-10-10 | 2009-11-24 | Hewlett-Packard Development Company, L.P. | Fused nanocrystal thin film semiconductor and method |
| US7772021B2 (en) | 2006-11-29 | 2010-08-10 | Samsung Electronics Co., Ltd. | Flat panel displays comprising a thin-film transistor having a semiconductive oxide in its channel and methods of fabricating the same for use in flat panel displays |
| JP2008140684A (ja) | 2006-12-04 | 2008-06-19 | Toppan Printing Co Ltd | カラーelディスプレイおよびその製造方法 |
| KR101303578B1 (ko) | 2007-01-05 | 2013-09-09 | 삼성전자주식회사 | 박막 식각 방법 |
| US8207063B2 (en) | 2007-01-26 | 2012-06-26 | Eastman Kodak Company | Process for atomic layer deposition |
| KR100851215B1 (ko) | 2007-03-14 | 2008-08-07 | 삼성에스디아이 주식회사 | 박막 트랜지스터 및 이를 이용한 유기 전계 발광표시장치 |
| US7795613B2 (en) | 2007-04-17 | 2010-09-14 | Toppan Printing Co., Ltd. | Structure with transistor |
| KR101325053B1 (ko) | 2007-04-18 | 2013-11-05 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 이의 제조 방법 |
| KR20080094300A (ko) | 2007-04-19 | 2008-10-23 | 삼성전자주식회사 | 박막 트랜지스터 및 그 제조 방법과 박막 트랜지스터를포함하는 평판 디스플레이 |
| KR101334181B1 (ko) | 2007-04-20 | 2013-11-28 | 삼성전자주식회사 | 선택적으로 결정화된 채널층을 갖는 박막 트랜지스터 및 그제조 방법 |
| CN101663762B (zh) | 2007-04-25 | 2011-09-21 | 佳能株式会社 | 氧氮化物半导体 |
| KR101345376B1 (ko) | 2007-05-29 | 2013-12-24 | 삼성전자주식회사 | ZnO 계 박막 트랜지스터 및 그 제조방법 |
| JP5215158B2 (ja) | 2007-12-17 | 2013-06-19 | 富士フイルム株式会社 | 無機結晶性配向膜及びその製造方法、半導体デバイス |
| JP4623179B2 (ja) | 2008-09-18 | 2011-02-02 | ソニー株式会社 | 薄膜トランジスタおよびその製造方法 |
| JP5451280B2 (ja) | 2008-10-09 | 2014-03-26 | キヤノン株式会社 | ウルツ鉱型結晶成長用基板およびその製造方法ならびに半導体装置 |
| JP5562172B2 (ja) * | 2010-08-10 | 2014-07-30 | キヤノン株式会社 | 定電流回路及びそれを用いた固体撮像装置 |
| JP5982748B2 (ja) * | 2011-08-01 | 2016-08-31 | ソニー株式会社 | 半導体装置、半導体装置の製造方法、および電子機器 |
| US8896125B2 (en) * | 2011-07-05 | 2014-11-25 | Sony Corporation | Semiconductor device, fabrication method for a semiconductor device and electronic apparatus |
| US8836626B2 (en) | 2011-07-15 | 2014-09-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for driving the same |
| JP6151530B2 (ja) * | 2012-02-29 | 2017-06-21 | 株式会社半導体エネルギー研究所 | イメージセンサ、カメラ、及び監視システム |
| JP2013182906A (ja) * | 2012-02-29 | 2013-09-12 | Sony Corp | 固体撮像装置及びその製造方法、電子機器 |
| CN104160295B (zh) * | 2012-03-09 | 2017-09-15 | 株式会社半导体能源研究所 | 半导体装置的驱动方法 |
| DE102013217278B4 (de) * | 2012-09-12 | 2017-03-30 | Semiconductor Energy Laboratory Co., Ltd. | Photodetektorschaltung, Bildgebungsvorrichtung und Verfahren zum Ansteuern einer Photodetektorschaltung |
| JP6128787B2 (ja) * | 2012-09-28 | 2017-05-17 | キヤノン株式会社 | 半導体装置 |
| JP5604700B2 (ja) * | 2012-10-29 | 2014-10-15 | 弘一 関根 | 動き検出用撮像装置、動き検出カメラおよび動き検出システム |
| JP2014107448A (ja) * | 2012-11-28 | 2014-06-09 | Nikon Corp | 積層半導体装置の製造方法および積層半導体製造装置 |
| JP5747238B2 (ja) * | 2012-12-07 | 2015-07-08 | 関根 弘一 | 動き検出用固体撮像装置及び動き検出システム |
| JP6612056B2 (ja) | 2014-05-16 | 2019-11-27 | 株式会社半導体エネルギー研究所 | 撮像装置、及び監視装置 |
-
2015
- 2015-07-16 JP JP2015141839A patent/JP6555956B2/ja active Active
- 2015-07-22 TW TW109144013A patent/TWI736489B/zh active
- 2015-07-22 TW TW104123779A patent/TWI672045B/zh not_active IP Right Cessation
- 2015-07-22 TW TW108121632A patent/TWI714134B/zh not_active IP Right Cessation
- 2015-07-22 TW TW110127999A patent/TWI766782B/zh not_active IP Right Cessation
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- 2015-07-28 KR KR1020150106748A patent/KR20160016638A/ko not_active Ceased
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2019
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2021
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2022
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030067424A1 (en) * | 2001-10-10 | 2003-04-10 | Hajime Akimoto | Image display device |
| US20050051707A1 (en) * | 2003-04-11 | 2005-03-10 | Cyrus Bamji | Method and system to differentially enhance sensor dynamic range |
| US20050007316A1 (en) * | 2003-05-15 | 2005-01-13 | Hajime Akimoto | Image display device |
| US20130194474A1 (en) * | 2008-10-31 | 2013-08-01 | Canon Kabushiki Kaisha | Solid-state image pickup apparatus, image pickup system, and driving method of the solid-state image pickup apparatus |
| US20130134535A1 (en) * | 2011-11-08 | 2013-05-30 | Victor Lenchenkov | Backside image sensor pixel with silicon microlenses and metal reflector |
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| Publication number | Publication date |
|---|---|
| TWI766782B (zh) | 2022-06-01 |
| KR20220127215A (ko) | 2022-09-19 |
| KR20160016638A (ko) | 2016-02-15 |
| US10021329B2 (en) | 2018-07-10 |
| TWI672045B (zh) | 2019-09-11 |
| TW202005360A (zh) | 2020-01-16 |
| JP2019216426A (ja) | 2019-12-19 |
| JP2021184476A (ja) | 2021-12-02 |
| JP2016054478A (ja) | 2016-04-14 |
| US20160037106A1 (en) | 2016-02-04 |
| TW202126029A (zh) | 2021-07-01 |
| TW201607321A (zh) | 2016-02-16 |
| TWI714134B (zh) | 2020-12-21 |
| TW202213980A (zh) | 2022-04-01 |
| JP6555956B2 (ja) | 2019-08-07 |
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