TWI723043B - 新穎化合物、潛在性添加劑及含該添加劑之組合物 - Google Patents
新穎化合物、潛在性添加劑及含該添加劑之組合物 Download PDFInfo
- Publication number
- TWI723043B TWI723043B TW105128858A TW105128858A TWI723043B TW I723043 B TWI723043 B TW I723043B TW 105128858 A TW105128858 A TW 105128858A TW 105128858 A TW105128858 A TW 105128858A TW I723043 B TWI723043 B TW I723043B
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- carbon atoms
- compounds
- photosensitive composition
- optionally substituted
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/96—Esters of carbonic or haloformic acids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/16—Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/412—Transparent
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015179466 | 2015-09-11 | ||
JP??2015-179466 | 2015-09-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201713670A TW201713670A (zh) | 2017-04-16 |
TWI723043B true TWI723043B (zh) | 2021-04-01 |
Family
ID=58239540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105128858A TWI723043B (zh) | 2015-09-11 | 2016-09-07 | 新穎化合物、潛在性添加劑及含該添加劑之組合物 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6748083B2 (fr) |
KR (1) | KR20180053273A (fr) |
CN (1) | CN107614477B (fr) |
TW (1) | TWI723043B (fr) |
WO (1) | WO2017043353A1 (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108473611B (zh) * | 2016-03-29 | 2024-05-14 | 株式会社艾迪科 | 感光性组合物 |
JP7436176B2 (ja) * | 2018-10-25 | 2024-02-21 | 株式会社Adeka | 組成物、ソルダーレジスト組成物、硬化物及び硬化物の製造方法 |
US20220121113A1 (en) | 2019-01-23 | 2022-04-21 | Basf Se | Oxime ester photoinitiators having a special aroyl chromophore |
TW202138351A (zh) | 2020-03-04 | 2021-10-16 | 德商巴地斯顏料化工廠 | 肟酯光起始劑 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06107769A (ja) * | 1992-10-01 | 1994-04-19 | Sumitomo Chem Co Ltd | エポキシ樹脂、その組成物および樹脂封止型半導体装置 |
JPH06266107A (ja) * | 1993-03-10 | 1994-09-22 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
JPH0769954A (ja) * | 1993-08-30 | 1995-03-14 | Sumitomo Chem Co Ltd | 多官能ビニルエーテル化合物 |
JPH07258142A (ja) * | 1994-03-23 | 1995-10-09 | Sumitomo Chem Co Ltd | 多官能ビニルエーテル化合物 |
JP2002174894A (ja) * | 2000-12-07 | 2002-06-21 | Fuji Photo Film Co Ltd | 電子線又はx線用ポジ型レジスト組成物 |
JP2003029400A (ja) * | 2001-07-19 | 2003-01-29 | Fuji Photo Film Co Ltd | 画像形成材料 |
JP2010026478A (ja) * | 2008-06-20 | 2010-02-04 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物およびレジストパターン形成方法 |
JP2010160300A (ja) * | 2009-01-08 | 2010-07-22 | Toray Ind Inc | ネガ型感光性樹脂組成物およびそれを用いたタッチパネル用材料 |
JP2011148713A (ja) * | 2010-01-19 | 2011-08-04 | Jsr Corp | 新規化合物および該化合物の合成方法、ならびに該化合物を含有する酸化防止剤、樹脂組成物および樹脂成型体 |
JP6107769B2 (ja) | 2014-08-12 | 2017-04-05 | 株式会社豊田自動織機 | 車両用パネル |
JP6266107B2 (ja) | 2013-07-24 | 2018-01-24 | ケメット エレクトロニクス コーポレーション | コンデンサ用の二重架橋剤系を含む導電性ポリマー組成物 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5247842A (en) * | 1975-10-14 | 1977-04-16 | Adeka Argus Chem Co Ltd | Stabilized synthetic resin compositions |
JPS52100543A (en) * | 1976-02-18 | 1977-08-23 | Adeka Argus Chem Co Ltd | Stabilized synthetic resin compositions |
JPS52140555A (en) * | 1976-05-19 | 1977-11-24 | Adeka Argus Chem Co Ltd | Stabilized synthetic resin composition |
JPS6016976B2 (ja) * | 1976-06-17 | 1985-04-30 | アデカ・ア−ガス化学株式会社 | 安定化された架橋エチレン系重合体組成物 |
JPS53110642A (en) * | 1977-03-08 | 1978-09-27 | Adeka Argus Chem Co Ltd | Stabilized synthetic resin composition |
BE856674A (fr) * | 1977-07-11 | 1978-01-11 | Argus Chem | Polyolefines a liaisons croisees |
US4839462A (en) * | 1987-08-14 | 1989-06-13 | General Electric Company | Cyclic polycarbonate oligomers: inhibition of polymerization to linear polycarbonates |
JP2002229193A (ja) * | 2001-02-06 | 2002-08-14 | Fuji Photo Film Co Ltd | 電子線又はx線用ポジ型レジスト組成物 |
JP2009073738A (ja) * | 2007-09-18 | 2009-04-09 | Idemitsu Kosan Co Ltd | ポリカルボン酸エステル化合物、フォトレジスト基材及びフォトレジスト組成物 |
WO2009154291A1 (fr) * | 2008-06-20 | 2009-12-23 | 本州化学工業株式会社 | Nouveau tétrakis(formylphényl substitué par éther) et nouveau poly(phénol) polynucléaire issu de celui-ci |
JP5884375B2 (ja) * | 2011-09-29 | 2016-03-15 | 日立化成株式会社 | リビングラジカル重合開始剤、星型共重合体、樹脂組成物、及びダイボンドフィルム |
CN104334684B (zh) * | 2012-07-31 | 2019-08-27 | 株式会社艾迪科 | 潜伏性添加剂以及含有该添加剂的组合物 |
KR101968510B1 (ko) * | 2013-02-06 | 2019-04-12 | 동우 화인켐 주식회사 | 적색 화소 패턴 형성용 감광성 수지 조성물 |
JP2015117271A (ja) * | 2013-12-17 | 2015-06-25 | 日立化成株式会社 | 高分子の精製方法および精製された高分子とそれを用いた半導体用接着剤 |
-
2016
- 2016-08-29 JP JP2017539119A patent/JP6748083B2/ja active Active
- 2016-08-29 KR KR1020177032493A patent/KR20180053273A/ko not_active Application Discontinuation
- 2016-08-29 WO PCT/JP2016/075160 patent/WO2017043353A1/fr active Application Filing
- 2016-08-29 CN CN201680032026.1A patent/CN107614477B/zh active Active
- 2016-09-07 TW TW105128858A patent/TWI723043B/zh active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06107769A (ja) * | 1992-10-01 | 1994-04-19 | Sumitomo Chem Co Ltd | エポキシ樹脂、その組成物および樹脂封止型半導体装置 |
JPH06266107A (ja) * | 1993-03-10 | 1994-09-22 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
JPH0769954A (ja) * | 1993-08-30 | 1995-03-14 | Sumitomo Chem Co Ltd | 多官能ビニルエーテル化合物 |
JPH07258142A (ja) * | 1994-03-23 | 1995-10-09 | Sumitomo Chem Co Ltd | 多官能ビニルエーテル化合物 |
JP2002174894A (ja) * | 2000-12-07 | 2002-06-21 | Fuji Photo Film Co Ltd | 電子線又はx線用ポジ型レジスト組成物 |
JP2003029400A (ja) * | 2001-07-19 | 2003-01-29 | Fuji Photo Film Co Ltd | 画像形成材料 |
JP2010026478A (ja) * | 2008-06-20 | 2010-02-04 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物およびレジストパターン形成方法 |
JP2010160300A (ja) * | 2009-01-08 | 2010-07-22 | Toray Ind Inc | ネガ型感光性樹脂組成物およびそれを用いたタッチパネル用材料 |
JP2011148713A (ja) * | 2010-01-19 | 2011-08-04 | Jsr Corp | 新規化合物および該化合物の合成方法、ならびに該化合物を含有する酸化防止剤、樹脂組成物および樹脂成型体 |
JP6266107B2 (ja) | 2013-07-24 | 2018-01-24 | ケメット エレクトロニクス コーポレーション | コンデンサ用の二重架橋剤系を含む導電性ポリマー組成物 |
JP6107769B2 (ja) | 2014-08-12 | 2017-04-05 | 株式会社豊田自動織機 | 車両用パネル |
Also Published As
Publication number | Publication date |
---|---|
JPWO2017043353A1 (ja) | 2018-07-05 |
KR20180053273A (ko) | 2018-05-21 |
CN107614477A (zh) | 2018-01-19 |
JP6748083B2 (ja) | 2020-08-26 |
WO2017043353A1 (fr) | 2017-03-16 |
CN107614477B (zh) | 2021-08-24 |
TW201713670A (zh) | 2017-04-16 |
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