以下，基於較佳之實施形態對本發明進行詳細說明。 作為上述通式(1)中之R1
、R2
、R3
、R4
、R5
、R6
、R7
、R8
、R9
、R10
、R11
及R12
所表示之碳原子數1～20之烷基，可列舉：甲基、乙基、丙基、異丙基、丁基、第二丁基、第三丁基、異丁基、戊基、異戊基、第三戊基、環戊基、己基、2-己基、3-己基、環己基、4-甲基環己基、庚基、2-庚基、3-庚基、異庚基、第三庚基、1-辛基、異辛基、第三辛基、金剛烷基等。 作為R1
、R2
、R3
、R4
、R5
、R6
、R7
、R8
、R9
、R10
、R11
及R12
所表示之碳原子數6～20之芳基，可列舉：苯基、萘基、蒽基等。 作為R1
、R2
、R3
、R4
、R5
、R6
、R7
、R8
、R9
、R10
、R11
及R12
所表示之碳原子數7～20之芳烷基，可列舉：苄基、苯乙基、二苯基甲基、三苯基甲基、2-苯基丙基、3-苯基丙基、茀基、茚基、9-茀基甲基等。 作為R1
、R2
、R3
、R4
、R5
、R6
、R7
、R8
、R9
、R10
、R11
及R12
所表示之碳原子數2～20之含雜環之基，可列舉：吡啶基、嘧啶基、嗒基、哌啶基、吡喃基、吡唑基、三基、吡咯基、喹啉基、異喹啉基、咪唑基、苯并咪唑基、三唑基、呋喃基(furyl)、呋喃基(furanyl)、苯并呋喃基、噻吩基(thienyl)、噻吩基(thiophenyl)、苯并噻吩基、噻二唑基、噻唑基、苯并噻唑基、唑基、苯并唑基、異噻唑基、異唑基、吲哚基、2-吡咯啶酮-1-基、2-哌啶酮-1-基、2,4-二氧基咪唑啶-3-基、2,4-二氧基唑啶-3-基等、或雜環經由二價鍵結基鍵結而成之基等。 作為R1
、R2
、R3
及R4
所表示之三烷基矽烷基，可列舉：三甲基矽烷、三乙基矽烷、乙基二甲基矽烷等。 作為R5
、R6
、R7
、R8
、R9
及R10
所表示之鹵素原子，可列舉：氟、氯、溴、碘， 作為將R1
、R2
、R3
、R4
、R5
、R6
、R7
、R8
、R9
、R10
、R11
及R12
所表示之碳原子數1～20之烷基、碳原子數6～20之芳基、碳原子數7～20之芳烷基或碳原子數2～20之含雜環之基取代之取代基，可列舉：乙烯基、烯丙基、丙烯酸基、甲基丙烯基等乙烯性不飽和基；氟、氯、溴、碘等鹵素原子；乙醯基、2-氯乙醯基、丙醯基、辛醯基、丙烯醯基、甲基丙烯醯基、苯基羰基(苯甲醯基)、酞醯基、4-三氟甲基苯甲醯基、特戊醯基、鄰羥苯甲醯基、草醯基、硬脂醯基、甲氧基羰基、乙氧基羰基、第三丁氧基羰基、正十八烷氧基羰基、胺甲醯基等醯基；乙醯氧基、苯甲醯氧基等醯氧基；胺基、乙基胺基、二甲基胺基、二乙基胺基、丁基胺基、環戊基胺基、2-乙基己基胺基、十二烷基胺基、苯胺基、氯苯基胺基、甲苯胺基、甲氧苯胺基、N-甲基-苯胺基、二苯基胺基、萘基胺基、2-吡啶基胺基、甲氧基羰基胺基、苯氧基羰基胺基、乙醯基胺基、苯甲醯基胺基、甲醯基胺基、特戊醯基胺基、月桂醯基胺基、胺甲醯基胺基、N,N-二甲基胺基羰基胺基、N,N-二乙基胺基羰基胺基、嗎啉基羰基胺基、甲氧基羰基胺基、乙氧基羰基胺基、第三丁氧基羰基胺基、正十八烷氧基羰基胺基、N-甲基-甲氧基羰基胺基、苯氧基羰基胺基、胺磺醯基胺基、N,N-二甲基胺基磺醯基胺基、甲基磺醯基胺基、丁基磺醯基胺基、苯基磺醯基胺基等取代胺基；磺醯胺基、磺醯基、羧基、氰基、磺基、羥基、硝基、巰基、亞胺基、胺甲醯基、磺醯胺基、膦酸基、磷酸基或羧基、磺基、膦酸基、磷酸基之鹽等；其取代位置並無限制。 於上述通式(1)所表示之化合物中，R1
、R2
、R3
及R4
為-CO-O-R11
者由於溶解性較高，於用作潛在性添加劑時，含有其之組合物之硬化物之耐熱性較高，故而較佳。又，R11
為第三丁基者由於溶解性較高，於用作潛在性添加劑時，含有其之組合物之硬化物之耐熱性較高，故而較佳。 作為上述通式(1)中之X1
所表示之碳原子數1～4之伸烷基，可列舉：亞甲基、伸乙基、亞丙基、亞異丙基、亞丁基等。 作為X1
所表之碳原子數3～20之脂環式烴基，可列舉：環戊基、環己基、環戊基甲基、環戊基乙基、環己基甲基、環己基乙基等。 作為將X1
所表示之碳原子數1～4之伸烷基或碳原子數3～20之脂環式烴基取代之取代基，可列舉上述作為將R1
、R2
、R3
、R4
、R5
、R6
、R7
、R8
、R9
、R10
、R11
及R12
所表示之碳原子數1～20之烷基、碳原子數6～20之芳基、碳原子數7～20之芳烷基或碳原子數2～20之含雜環之基取代之取代基而例示者。 作為上述式(1-1)中之R71
所表示之碳原子數3～10之環烷基，可列舉：環丙基、環丁基、環戊基、環庚基、環辛基等。 作為R72
所表示之碳原子數1～10之烷基及鹵素原子，可列舉上述通式(1)之說明中例示之烷基及鹵素原子等。 作為R72
所表示之碳原子數1～10之烷氧基，可列舉：甲氧基、乙氧基、異丙氧基、丁氧基、第二丁氧基、第三丁氧基、異丁氧基、戊氧基、異戊氧基、第三戊氧基、己氧基、2-己氧基、3-己氧基、環己氧基、4-甲基環己氧基、庚氧基、2-庚氧基、3-庚氧基、異庚氧基、第三庚氧基、1-辛氧基、異辛氧基、第三辛氧基等。 作為R72
所表示之碳原子數2～10之烯基，可列舉：乙烯基、烯丙基、1-丙烯基、異丙烯基、2-丁烯基、1,3-丁二烯基、2-戊烯基、2-辛烯基等。 作為將R71
所表示之苯基或碳原子數3～10之環烷基、及R72
所表示之碳原子數1～10之烷基、碳原子數1～10之烷氧基或碳原子數2～10之烯基取代之取代基，可列舉上述作為將R1
、R2
、R3
、R4
、R5
、R6
、R7
、R8
、R9
、R10
、R11
及R12
所表示之碳原子數1～20之烷基、碳原子數6～20之芳基、碳原子數7～20之芳烷基或碳原子數2～20之含雜環之基取代之取代基而例示者。 作為上述式(1-3)中之R73
及R74
所表示之碳原子數1～10之烷基、碳原子數6～20之芳基、碳原子數7～20之芳烷基、碳原子數2～20之含雜環之基及鹵素原子，可列舉上述說明中例示之烷基、芳基、芳烷基、碳原子數2～20之含雜環之基及鹵素原子。 作為R73
及R74
所表示之碳原子數6～20之芳氧基，可列舉：苯氧基、萘氧基、2-甲基苯氧基、3-甲基苯氧基、4-甲基苯氧基、4-乙烯基苯基氧基、3-異丙基苯氧基、4-異丙基苯氧基、4-丁基苯氧基、4-第三丁基苯氧基、4-己基苯氧基、4-環己基苯氧基、4-辛基苯氧基、4-(2-乙基己基)苯氧基、2,3-二甲基苯氧基、2,4-二甲基苯氧基、2,5-二甲基苯氧基、2,6-二甲基苯氧基、3,4-二甲基苯氧基、3,5-二甲基苯氧基、2,4-二第三丁基苯氧基、2,5-二第三丁基苯氧基、2,6-二第三丁基苯氧基、2,4-二第三戊基苯氧基、2,5-第三戊基苯氧基、4-環己基苯氧基、2,4,5-三甲基苯氧基、二茂鐵基氧基等基。 作為R73
及R74
所表示之碳原子數6～20之芳硫基，可列舉將上述碳原子數6～20之芳氧基之氧原子取代為硫原子所得之基等。 作為R73
及R74
所表示之碳原子數8～20之芳烯基，可列舉由乙烯基、烯丙基、1-丙烯基、異丙烯基、2-丁烯基、1,3-丁二烯基、2-戊烯基、2-辛烯基等烯基取代上述碳原子數6-20之芳氧基之氧原子所得之基等。 作為相鄰之R73
彼此形成之環，可列舉：環戊烷環、環己烷環、環戊烯環、苯環、哌啶環、嗎啉環、內酯環、內醯胺環等。 作為將R73
及R74
所表示之碳原子數1～10之烷基、碳原子數6～20之芳基、碳原子數6～20之芳氧基、碳原子數6～20之芳硫基、碳原子數6～20之芳烯基、碳原子數7～20之芳烷基、碳原子數2～20之含雜環之基取代之取代基，可列舉上述作為將R1
、R2
、R3
、R4
、R5
、R6
、R7
、R8
、R9
、R10
、R11
及R12
所表示之碳原子數1～20之烷基、碳原子數6～20之芳基、碳原子數7～20之芳烷基或碳原子數2～20之含雜環之基取代之取代基而例示者。 作為上述通式(1)所表示之化合物之具體例，可列舉下述[化5]～[化7]所表示之化合物，但本發明並不限制於該等化合物。 [化5][化6][化7]上述通式(1)所表示之化合物之製造方法並無特別限定，例如，可使由日本專利特開昭57-111375、日本專利特開平3-173843、日本專利特開平6-128195、日本專利特開平7-206771、日本專利特開平7-252191、日本專利特表2004-501128之各公報中記載之方法所製造之酚系化合物與酸酐、醯氯化物、Boc(tert-butoxycarbonyl，第三丁氧基羰基)化試劑、烷基鹵化物化合物、矽烷基氯化物化合物、烯丙醚化合物等反應而獲得。 上述通式(1)所表示之化合物可作為半導體用、感光性照片用、平版印刷版用、醫藥用化合物之中間物、感熱紙用、潛在性抗氧化劑、潛在性紫外線吸收劑等潛在性添加劑而使用。 本發明之潛在性添加劑含有至少一種以上之作為上述通式(1)之化合物。 上述潛在性添加劑係指如下者：於常溫或150℃以下之預烘烤步驟中為惰性，藉由以100～250℃進行加熱，或者於酸/鹼觸媒存在下以80～200℃加熱而脫去保護基變為活性。 本發明之感光性組合物含有本發明之潛在性添加劑。於本發明之感光性組合物中，本發明之潛在性添加劑之含量較佳為0.001～20質量%，更佳為0.005～5質量%。 本發明之感光性組合物係藉由光照射而性質發生改變之組合物，於對化學反應成為可溶者中有正型光阻劑，於對化學反應成為不溶者中有負型光阻劑。本發明之感光性組合物除了含有本發明之潛在性添加劑作為潛在性抗氧化劑以外，還含有具有酸值之含乙烯性不飽和鍵之聚合性化合物及光自由基聚合起始劑。 作為該具有酸值之含乙烯性不飽和鍵之聚合性化合物，可列舉：(甲基)丙烯酸、α-氯丙烯酸、伊康酸、順丁烯二酸、檸康酸、反丁烯二酸、雙環庚烯二甲酸、丁烯酸、異丁烯酸、乙烯基乙酸、烯丙基乙酸、肉桂酸、己二烯酸、中康酸、琥珀酸單[2-(甲基)丙烯醯氧基乙基]酯、鄰苯二甲酸單[2-(甲基)丙烯醯氧基乙基]酯、ω-羧基聚己內酯單(甲基)丙烯酸酯等於兩末端具有羧基與羥基之聚合物之單(甲基)丙烯酸酯、(甲基)丙烯酸羥基乙酯·順丁烯二酸酯、(甲基)丙烯酸羥基丙酯·順丁烯二酸酯、二環戊二烯·順丁烯二酸酯或者具有1個羧基與2個以上(甲基)丙烯醯基之多官能(甲基)丙烯酸酯等不飽和多元酸；苯酚及/或甲酚酚醛清漆環氧樹脂、具有聯苯骨架、萘骨架之酚醛清漆環氧樹脂、雙酚A酚醛清漆型環氧化合物、二環戊二烯酚醛清漆型環氧化合物等酚醛清漆型環氧化合物、多官能具有環氧基之聚苯基甲烷型環氧樹脂、使不飽和一元酸作用於下述通式(I)所表示之環氧化合物等環氧樹脂之環氧基而獲得之樹脂、使不飽和一元酸作用於下述通式(1)所表示之環氧化合物等環氧樹脂之環氧基並進而使多元酸酐作用而獲得之樹脂、季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯等含羥基之多官能丙烯酸酯與琥珀酸酐、鄰苯二甲酸酐、四氫鄰苯二甲酸酐等二元酸酐之反應物即具有酸值之多官能丙烯酸酯等。 [化8](式中，X41
表示直接鍵、可具有取代基之碳原子數1～4之伸烷基、可具有取代基之碳原子數3～20之脂環式烴基、-O-、-S-、-SO2
-、-SS-、-SO-、-CO-、-OCO-或上述(1-1)～(1-3)所表示之取代基， R41
、R42
、R43
及R44
分別獨立地表示氫原子、可具有取代基之碳原子數1～5之烷基、可具有取代基之碳原子數1～8之烷氧基、可具有取代基之碳原子數2～5之烯基或鹵素原子， m為0～10之整數) 該等具有酸值之含乙烯性不飽和鍵之聚合性化合物可單獨使用或將2種以上混合而使用。本發明之感光性組合物中之具有酸值之含乙烯性不飽和鍵之聚合性化合物的含量較佳為固形物成分中之20～80質量%，進而較佳為固形物成分中之30～70質量%。又，可與不具有酸值之含乙烯性不飽和鍵之聚合性化合物組合使用。於將2種以上混合而使用之情形時，亦可預先使該等共聚合而以共聚物之形式使用。 作為上述不具有酸值之含乙烯性不飽和鍵之聚合性化合物，例如可列舉：(甲基)丙烯酸-2-羥基乙酯、(甲基)丙烯酸-2-羥基丙酯、(甲基)丙烯酸縮水甘油酯、下述化合物No.A1～No.A4、(甲基)丙烯酸甲酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸二甲基胺基甲酯、(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸胺基丙酯、(甲基)丙烯酸二甲基胺基丙酯、(甲基)丙烯酸乙氧基乙酯、(甲基)丙烯酸聚(乙氧基)乙酯、(甲基)丙烯酸丁氧基乙氧基乙酯、(甲基)丙烯酸乙基己酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸四氫呋喃酯、(甲基)丙烯酸乙烯基酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸苄酯、乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、異氰尿酸三[(甲基)丙烯醯基乙基]酯、聚酯(甲基)丙烯酸酯低聚物等不飽和一元酸及多元醇或多元酚之酯；(甲基)丙烯酸鋅、(甲基)丙烯酸鎂等不飽和多元酸之金屬鹽；順丁烯二酸酐、伊康酸酐、檸康酸酐、甲基四氫鄰苯二甲酸酐、四氫鄰苯二甲酸酐、三烷基四氫鄰苯二甲酸酐、5-(2,5-二側氧四氫呋喃基)-3-甲基-3-環己烯-1,2-二羧酸酐、三烷基四氫鄰苯二甲酸酐-順丁烯二酸酐加成物、十二烯基琥珀酸酐、甲基雙環庚烯二甲酸酐等不飽和多元酸之酸酐；(甲基)丙烯醯胺、亞甲基雙(甲基)丙烯醯胺、二伸乙基三胺三(甲基)丙烯醯胺、苯二甲基雙(甲基)丙烯醯胺、α-氯丙烯醯胺、N-2-羥基乙基(甲基)丙烯醯胺等不飽和一元酸及多價胺之醯胺；丙烯醛等不飽和醛；(甲基)丙烯腈、α-氯丙烯腈、二氰亞乙烯、烯丙基氰等不飽和腈；苯乙烯、4-甲基苯乙烯、4-乙基苯乙烯、4-甲氧基苯乙烯、4-羥基苯乙烯、4-氯苯乙烯、二乙烯基苯、乙烯基甲苯、乙烯基苯甲酸、乙烯基苯酚、乙烯基磺酸、4-乙烯基苯磺酸、乙烯基苄基甲醚、乙烯基苄基縮水甘油醚等不飽和芳香族化合物；甲基乙烯基酮等不飽和酮；乙烯胺、烯丙胺、N-乙烯基吡咯啶酮、乙烯基哌啶等不飽和胺化合物；乙烯基甲醚、乙烯基乙醚、正丁基乙烯基醚、異丁基乙烯基醚、烯丙基縮水甘油醚等乙烯基醚；順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺、N-環己基順丁烯二醯亞胺等不飽和醯亞胺類；茚、1-甲基茚等茚類；1,3-丁二烯、異戊二烯、氯丁二烯等脂肪族共軛二烯類；聚苯乙烯、聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸正丁酯、聚矽氧烷等於聚合物分子鏈之末端具有單(甲基)丙烯醯基之巨單體類；(甲基)丙烯腈、乙烯、丙烯、丁烯、氯乙烯、乙酸乙烯酯等其他乙烯系化合物、及聚甲基丙烯酸甲酯巨單體、聚苯乙烯巨單體等巨單體類、三環癸烷骨架之單甲基丙烯酸酯、N-苯基順丁烯二醯亞胺、甲基丙烯醯氧基甲基-3-乙基氧雜環丁烷等與(甲基)丙烯酸之共聚物、及使該等與如昭和電工(股)公司製造之Karenz MOI、AOI之具有不飽和鍵之異氰酸酯化合物反應所得之(甲基)丙烯酸之共聚物、或氯乙烯、偏二氯乙烯、琥珀酸二乙烯基酯、鄰苯二甲酸二烯丙酯、磷酸三烯丙酯、異氰尿酸三烯丙酯、乙烯基硫醚、乙烯基咪唑、乙烯基唑啉、乙烯基咔唑、乙烯基吡咯啶酮、乙烯基吡啶、含羥基之乙烯基單體及聚異氰酸酯化合物之乙烯基胺基甲酸乙酯化合物、含羥基之乙烯基單體及聚環氧化合物之乙烯基環氧化合物、季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯等含羥基之多官能丙烯酸酯與甲苯二異氰酸酯、六亞甲基二異氰酸酯等多官能異氰酸酯之反應物。 [化9][化10][化11][化12]發明之感光性組合物中之不具有酸值之含乙烯性不飽和鍵之聚合性化合物之含量較佳為固形物成分中之20～80質量%，進而較佳為固形物成分中之30～60質量%。 為了調整酸值而改良上述感光性組合物之顯影性，可於本發明之感光性組合物中，與上述具有酸值之含乙烯性不飽和鍵之聚合性化合物一同，還使用單官能或多官能環氧化合物。上述具有酸值之含乙烯性不飽和鍵之聚合性化合物較佳為固形物成分之酸值為5～120 mgKOH/g之範圍，單官能或多官能環氧化合物之使用量較佳為以滿足上述酸值之方式進行選擇。 作為上述單官能環氧化合物，可列舉：甲基丙烯酸縮水甘油酯、甲基縮水甘油醚、乙基縮水甘油醚、丙基縮水甘油醚、異丙基縮水甘油醚、丁基縮水甘油醚、異丁基縮水甘油醚、第三丁基縮水甘油醚、戊基縮水甘油醚、己基縮水甘油醚、庚基縮水甘油醚、辛基縮水甘油醚、壬基縮水甘油醚、癸基縮水甘油醚、十一烷基縮水甘油醚、十二烷基縮水甘油醚、十三烷基縮水甘油醚、十四烷基縮水甘油醚、十五烷基縮水甘油醚、十六烷基縮水甘油醚、2-乙基己基縮水甘油醚、烯丙基縮水甘油醚、炔丙基縮水甘油醚、對甲氧基乙基縮水甘油醚、苯基縮水甘油醚、對甲氧基縮水甘油醚、對丁基苯酚縮水甘油醚、甲苯基縮水甘油醚、2-甲基甲苯基縮水甘油醚、4-壬基苯基縮水甘油醚、苄基縮水甘油醚、對異丙苯基苯基縮水甘油醚、三苯甲基縮水甘油醚、甲基丙烯酸2,3-環氧丙酯、環氧化大豆油、環氧化亞麻籽油、丁酸縮水甘油酯、一氧化乙烯基環己烷、1,2-環氧基-4-乙烯基環己烷、環氧苯乙烷、氧化蒎烯、甲基環氧苯乙烷、環氧環己烷、環氧丙烷等。 作為上述多官能環氧化合物，若使用選自由雙酚型環氧化合物及縮水甘油醚類所組成之群中之一種以上，則能夠獲得特性更良好之著色鹼性顯影性感光性組合物，故而較佳。作為該雙酚型環氧化合物，除了可使用上述通式(I)所表示之環氧化合物以外，例如亦可使用氫化雙酚型環氧化合物等雙酚型環氧化合物。作為該縮水甘油醚類，可列舉：乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、1,4-丁二醇二縮水甘油醚、1,6-己二醇二縮水甘油醚、1,8-辛二醇二縮水甘油醚、1,10-癸二醇二縮水甘油醚、2,2-二甲基-1,3-丙二醇二縮水甘油醚、二乙二醇二縮水甘油醚、三乙二醇二縮水甘油醚、四乙二醇二縮水甘油醚、六乙二醇二縮水甘油醚、1,4-環己烷二甲醇二縮水甘油醚、1,1,1-三(縮水甘油氧基甲基)丙烷、1,1,1-三(縮水甘油氧基甲基)乙烷、1,1,1-三(縮水甘油氧基甲基)甲烷、1,1,1,1-四(縮水甘油氧基甲基)甲烷。 此外，亦可使用：酚系酚醛清漆型環氧化合物、聯苯酚醛清漆型環氧化合物、甲酚酚醛清漆型環氧化合物、雙酚A酚醛清漆型環氧化合物、二環戊二烯酚醛清漆型環氧化合物等酚醛清漆型環氧化合物；3,4-環氧基-6-甲基環己烷羧酸3,4-環氧基-6-甲基環己基甲酯、3,4-環氧環己烷羧酸3,4-環氧環己基甲酯、1-環氧乙基-3,4-環氧環己烷等脂環式環氧化合物；鄰苯二甲酸二縮水甘油酯、四氫鄰苯二甲酸二縮水甘油酯、二聚酸縮水甘油酯等縮水甘油酯類；四縮水甘油基二胺基二苯基甲烷、三縮水甘油基對胺基苯酚、N,N-二縮水甘油基苯胺等縮水甘油胺類；1,3-二縮水甘油基-5,5-二甲尿囊素、異氰尿酸三縮水甘油酯等雜環式環氧化合物；二氧化二環戊二烯等二氧化物化合物；萘型環氧化合物、三苯基甲烷型環氧化合物、二環戊二烯型環氧化合物等。 上述光自由基聚合起始劑只要為能夠藉由受到光照射使自由基聚合開始之化合物即可，例如作為較佳者，可例示苯乙酮系化合物、苯偶醯系化合物、二苯甲酮系化合物、9-氧硫
系化合物等酮系化合物、肟系化合物等。 作為苯乙酮系化合物，例如可列舉：二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、4'-異丙基-2-羥基-2-甲基苯丙酮、2-羥基甲基-2-甲基苯丙酮、2,2-二甲氧基-1,2-二苯乙烷-1-酮、對二甲基胺基苯乙酮、對第三丁基二氯苯乙酮、對第三丁基三氯苯乙酮、對疊氮苯亞甲基苯乙酮、1-羥基環己基苯基酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙酮-1、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮-1、安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香正丁醚、安息香異丁醚、1-[4-(2-羥基乙氧基)-苯基]-2-羥基-2-甲基-1-丙烷-1-酮等。 作為苯偶醯系化合物，可列舉苯偶醯、茴香偶醯等。 作為二苯甲酮系化合物，例如可列舉：二苯甲酮、鄰苯甲醯基苯甲酸甲酯、米其勒酮、4,4'-雙二乙基胺基二苯甲酮、4,4'-二氯二苯甲酮、4-苯甲醯基-4'-甲基二苯基硫醚等。 作為9-氧硫
系化合物，可列舉：9-氧硫
、2-甲基9-氧硫
、2-乙基9-氧硫
、2-氯9-氧硫
、2-異丙基9-氧硫
、2,4-二乙基9-氧硫
等。 作為肟系化合物，就感度及耐熱性之方面而言，尤佳為下述通式(II)所表示之化合物。 [化13](式中，R51
及R52
分別獨立地表示氫原子、氰基、可具有取代基之碳原子數1～20之烷基、可具有取代基之碳原子數6～30之芳基、可具有取代基之碳原子數7～30之芳烷基或可具有取代基之碳原子數2～20之含雜環之基， R53
及R54
分別獨立地表示鹵素原子、硝基、氰基、羥基、羧基、R55
、OR56
、SR57
、NR58
R59
、COR60
、SOR61
、SO2
R62
或CONR63
R64
，R53
及R54
亦可相互鍵結而形成環， R55
、R56
、R57
、R58
、R59
、R60
、R61
、R62
、R63
及R64
分別獨立地表示可具有取代基之碳原子數1～20之烷基、可具有取代基之碳原子數6～30之芳基、可具有取代基之碳原子數7～30之芳烷基或可具有取代基之碳原子數2～20之含雜環之基， X2
表示氧原子、硫原子、硒原子、CR75
R76
、CO、NR77
或PR78
， X3
表示單鍵或CO， 表示R51
、R52
、R55
、R56
、R57
、R58
、R59
、R60
、R65
、R66
、R67
及R68
中之碳原子數1～20之烷基、碳原子數6～30之芳基或碳原子數7～30之芳烷基，該烷基或芳烷基中之亞甲基可被取代為鹵素原子、硝基、氰基、羥基、羧基或含雜環之基，亦可被取代為-O-， R53
及R54
亦可分別獨立地與相鄰之任一苯環一同形成環， a表示0～4之整數， b表示0～5之整數) 作為其他光自由基聚合起始劑，可列舉：2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(環戊二烯基)-雙[2,6-二氟-3-(吡啶-1-基)]鈦等。 該等光自由基聚合起始劑可根據所需之性能使用1種或調配2種以上者而使用。 如上所述之光自由基聚合起始劑於本發明之感光性組合物之固形物成分中較佳為0.1～30質量%，尤佳為0.5～10質量%。若上述光自由基聚合起始劑之含量小於0.1質量%，則存在利用曝光之硬化變得不充分之情況，若大於30質量%，則存在於感光性組合物中光自由基起始劑析出之情況。 根據本發明，亦提供一種著色感光性組合物。該著色感光性組合物係含有上述感光性組合物及著色劑者。該著色感光性組合物之硬化物適宜用作彩色濾光片。 於上述著色感光性組合物中，著色劑之含量較佳為0.01～50質量%，更佳為0.1～30質量%。 作為上述著色劑，可列舉染料或顏料。 作為染料，只要為於380～1200 nm中具有吸收之化合物，則並無特別限定，例如可列舉：偶氮化合物、蒽醌化合物、靛藍化合物、三芳基甲烷化合物、
化合物、茜素化合物、吖啶化合物、茋化合物、噻唑化合物、萘酚化合物、喹啉化合物、硝基化合物、吲達胺化合物、 化合物、酞菁化合物、花青化合物、二亞銨化合物、氰基乙烯基化合物、二氰基苯乙烯化合物、若丹明化合物、苝化合物、多烯萘內醯胺化合物、香豆素化合物、方酸鎓化合物、克酮鎓化合物、螺吡喃化合物、螺 化合物、部花青化合物、氧喏化合物、苯乙烯基化合物、吡喃鎓化合物、繞丹寧化合物、唑啉酮化合物、鄰苯二甲醯亞胺化合物、
啉化合物、萘醌化合物、氮雜蒽醌化合物、卟啉化合物、氮雜卟啉化合物、吡咯亞甲基化合物、喹吖啶酮化合物、吡咯并吡咯二酮化合物、靛藍化合物、吖啶化合物、吖化合物、甲亞胺化合物、苯胺化合物、喹吖啶酮化合物、喹酞酮化合物、醌亞胺化合物、銥錯合物、銪錯合物等染料等，該等亦可將複數種混合使用。 作為顏料，可使用無機顏料或有機顏料，例如可使用：亞硝基化合物、硝基化合物、偶氮化合物、重氮化合物、
化合物、喹啉化合物、蒽醌化合物、香豆素化合物、酞菁化合物、異吲哚啉酮化合物、異吲哚啉化合物、喹吖啶酮化合物、蒽締蒽酮化合物、芘化合物、苝化合物、吡咯并吡咯二酮化合物、硫靛藍化合物、二 化合物、三苯基甲烷化合物、喹酞酮化合物、萘四羧酸；偶氮染料、花青染料之金屬錯合物；色澱顏料；利用熔爐法、導槽法、熱處理法所獲得之碳黑、或乙炔黑、科琴黑或燈黑等碳黑；利用環氧樹脂調整並被覆上述碳黑而得者、預先於溶劑中利用樹脂對上述碳黑進行分散處理並使20～200 mg/g之樹脂吸附而得者、對上述碳黑進行酸性或鹼性表面處理而得者、平均粒徑為8 nm以上且DBP(Dibutyl phthalate，鄰苯二甲酸二丁酯)吸油量為90 ml/100 g以下者、根據950℃下之揮發分中之CO、CO2
算出之總氧量係碳黑之每100 m2
表面積為9 mg以上者；石墨、石墨化碳黑、活性碳、碳纖維、奈米碳管、螺旋碳纖維、碳奈米角、碳氣凝膠、富勒烯；苯胺黑、顏料黑7、鈦黑；疏水性樹脂、氧化鉻綠、米洛麗藍、鈷綠、鈷藍、錳系、亞鐵氰化物、磷酸鹽群青、鐵藍、群青、天藍、鉻綠、翡翠綠、硫酸鉛、黃丹、鋅黃、鐵丹(氧化鐵紅(III))、鎘紅、合成鐵黑、棕土等無機含量或有機顏料。該等顏料可單獨使用或將複數種混合而使用。 作為上述無機顏料或有機顏料，亦可使用市售之顏料，例如可列舉：顏料紅1、2、3、9、10、14、17、22、23、31、38、41、48、49、88、90、97、112、119、122、123、144、149、166、168、169、170、171、177、179、180、184、185、192、200、202、209、215、216、217、220、223、224、226、227、228、240、254；顏料橙13、31、34、36、38、43、46、48、49、51、52、55、59、60、61、62、64、65、71；顏料黃1、3、12、13、14、16、17、20、24、55、60、73、81、83、86、93、95、97、98、100、109、110、113、114、117、120、125、126、127、129、137、138、139、147、148、150、151、152、153、154、166、168、175、180、185；顏料綠7、10、36；顏料藍15、15：1、15：2、15：3、15：4、15：5、15：6、22、24、56、60、61、62、64；顏料紫1、19、23、27、29、30、32、37、40、50等。 於本發明之著色感光性組合物中，較佳為使用染料作為上述著色劑，尤佳為使用三芳基甲烷化合物及氰基乙烯基化合物。藉由使用染料、尤其是三芳基甲烷化合物及氰基乙烯基化合物作為著色劑，著色劑之耐熱性進一步提高，結果發揮著色感光性組合物於焙燒前後之色度變化變更小之效果。 於上述感光性組合物及著色感光性組合物中，可進而添加溶劑。作為該溶劑，可列舉通常視需要能夠將上述各成分溶解或分散之溶劑，例如可列舉：甲基乙基酮、甲基戊基酮、二乙基酮、丙酮、甲基異丙基酮、甲基異丁基酮、環己酮、2-庚酮等酮類；乙醚、二烷、四氫呋喃、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷、二丙二醇二甲醚等醚系溶劑；乙酸甲酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸環己酯、乳酸乙酯、琥珀酸二甲酯、酯醇(Texanol)等酯系溶劑；乙二醇單甲醚、乙二醇單乙醚等溶纖劑系溶劑；甲醇、乙醇、異或正丙醇、異或正丁醇、戊醇、二丙酮醇等醇系溶劑；乙二醇單乙酸甲酯、乙二醇單乙酸乙酯、丙二醇-1-單甲醚-2-乙酸酯(PGMEA)、二丙二醇單甲醚乙酸酯、乙酸3-甲氧基丁酯、丙酸乙氧基乙酯、1-第三丁氧基-2-丙醇、乙酸3-甲氧基丁酯、乙酸環己二醇酯等醚酯系溶劑；苯、甲苯、二甲苯等BTX(Benzene-Toluene-Xylene，苯-甲苯-二甲苯)系溶劑；己烷、庚烷、辛烷、環己烷等脂肪族烴系溶劑；松節油、D-檸檬烯、蒎烯等萜烯系烴油；礦油精、Swazol#310(科斯莫松山石油(股))、Solvesso#100(Exxon化學(股))等石蠟系溶劑；四氯化碳、氯仿、三氯乙烯、二氯甲烷、1,2-二氯乙烷等鹵化脂肪族烴系溶劑；氯苯等鹵化芳香族烴系溶劑；卡必醇系溶劑、苯胺、三乙胺、吡啶、乙酸、乙腈、二硫化碳、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮、二甲基亞碸、水等；該等溶劑可使用1種或以2種以上之混合溶劑之形式使用。該等之中，酮類、醚酯系溶劑等，尤其是丙二醇-1-單甲醚-2-乙酸酯、環己酮等由於在感光性組合物中，光阻劑與光自由基聚合起始劑之相容性良好，故而較佳。 於上述感光性組合物及上述著色感光性組合物中，可進而含有無機化合物。作為該無機化合物，例如可列舉：氧化鎳、氧化鐵、氧化銥、氧化鈦、氧化鋅、氧化鎂、氧化鈣、氧化鉀、氧化矽、氧化鋁等金屬氧化物；層狀黏土礦物、米洛麗藍、碳酸鈣、碳酸鎂、鈷系、錳系、玻璃粉末、雲母、滑石、陶土、亞鐵氰化物、各種金屬硫酸鹽、硫化物、硒化物、矽酸鋁、矽酸鈣、氫氧化鋁、鉑、金、銀、銅等。 於在上述感光性組合物及上述著色感光性組合物中使用顏料及/或無機化合物之情形時，可添加分散劑。作為該分散劑，只要為能夠將有色材料、無機化合物分散、穩定化者，則無論何種均可，可使用市售之分散劑，例如BYK-Chemie公司製造之BYK系列等，適宜使用具有鹼性官能基之包括聚酯、聚醚、聚胺基甲酸酯之高分子分散劑；具有氮原子作為鹼性官能基、且具有氮原子之官能基為胺、及/或其四級鹽，胺值為1～100 mgKOH/g者。 又，於上述感光性組合物及上述著色感光性組合物中，可視需要添加以下慣用之添加物：對苯甲醚、對苯二酚、鄰苯二酚、第三丁基兒茶酚、吩噻等熱聚合抑制劑；塑化劑；助黏劑；填充劑；消泡劑；調平劑；表面調整劑；酚系抗氧化劑、亞磷酸酯系抗氧化劑、硫醚系抗氧化劑等抗氧化劑；紫外線吸收劑；分散助劑；凝聚防止劑；觸媒；效果促進劑；交聯劑；增黏劑等。 又，藉由與上述具有酸值之含乙烯性不飽和鍵之聚合性化合物一同使用其他有機聚合物，亦能夠改善本發明之著色感光性組合物之硬化物之特性。作為上述有機聚合物，例如可列舉：聚苯乙烯、聚甲基丙烯酸甲酯、甲基丙烯酸甲酯-丙烯酸乙酯共聚物、聚(甲基)丙烯酸、苯乙烯-(甲基)丙烯酸共聚物、(甲基)丙烯酸-甲基丙烯酸甲酯共聚物、乙烯-氯乙烯共聚物、乙烯-乙烯基共聚物、聚氯乙烯樹脂、ABS(Acrylonitrile-Butadiene-Styrene，丙烯腈-丁二烯-苯乙烯)樹脂、尼龍6、尼龍66、尼龍12、胺基甲酸乙酯樹脂、聚碳酸酯聚乙烯丁醛、纖維素酯、聚丙烯醯胺、飽和聚酯、酚系樹脂、苯氧基樹脂、聚醯胺醯亞胺樹脂、聚醯胺酸樹脂、環氧樹脂等，該等之中，較佳為聚苯乙烯、(甲基)丙烯酸-甲基丙烯酸甲酯共聚物、環氧樹脂。 於上述感光性組合物及上述著色感光性組合物中，可進而併用鏈轉移劑、增感劑、界面活性劑、矽烷偶合劑、三聚氰胺等。 作為上述鏈轉移劑、增感劑，一般使用含硫原子之化合物。例如可列舉：硫代乙醇酸、硫代蘋果酸、硫代水楊酸、2-巰基丙酸、3-巰基丙酸、3-巰基丁酸、N-(2-巰基丙醯基)甘胺酸、2-巰基菸鹼酸、3-[N-(2-巰基乙基)胺甲醯基]丙酸、3-[N-(2-巰基乙基)胺基]丙酸、N-(3-巰基丙醯基)丙胺酸、2-巰基乙磺酸、3-巰基丙磺酸、4-巰基丁磺酸、十二烷基(4-甲硫基)苯醚、2-巰基乙醇、3-巰基-1,2-丙二醇、1-巰基-2-丙醇、3-巰基-2-丁醇、巰基苯酚、2-巰基乙基胺、2-巰基咪唑、2-巰基苯并咪唑、2-巰基-3-羥基吡啶、2-巰基苯并噻唑、巰基乙酸、三羥甲基丙烷三(3-巰基丙酸酯)、季戊四醇四(3-巰基丙酸酯)等巰基化合物；將該巰基化合物氧化而獲得之二硫醚化合物、碘乙酸、碘丙酸、2-碘乙醇、2-碘乙磺酸、3-碘丙磺酸等碘化烷基化合物；三羥甲基丙烷三(3-巰基異丁酸酯)、丁二醇雙(3-巰基異丁酸酯)、己二硫醇、癸二硫醇、1,4-二甲基巰基苯、丁二醇雙硫代丙酸酯、丁二醇雙硫代乙酸酯、乙二醇雙硫代乙酸酯、三羥甲基丙烷三硫代乙酸酯、丁二醇雙硫代丙酸酯、三羥甲基丙烷三硫代丙酸酯、三羥甲基丙烷三硫代乙酸酯、季戊四醇四硫代丙酸酯、季戊四醇四硫代乙酸酯、三羥基乙基三硫代丙酸酯、下述化合物No.C1、三巰基丙酸三(2-羥基乙基)異氰尿酸酯等脂肪族多官能硫醇化合物；昭和電工公司製造之Karenz MT BD1、PE1、NR1等。 [化14]作為上述界面活性劑，可使用：磷酸全氟烷基酯、全氟烷基羧酸鹽等氟界面活性劑；高級脂肪酸鹼鹽、烷磺酸鹽、烷基硫酸鹽等陰離子系界面活性劑；高級胺氫鹵酸鹽、四級銨鹽等陽離子系界面活性劑；聚乙二醇烷基醚、聚乙二醇脂肪酸酯、山梨醇酐脂肪酸酯、脂肪酸單甘油酯等非離子界面活性劑；兩性界面活性劑；矽酮系界面活性劑等界面活性劑，該等可組合使用。 作為上述矽烷偶合劑，例如可使用信越化學公司製造之矽烷偶合劑，其中，適宜使用KBE-9007、KBM-502、KBE-403等具有異氰酸酯基、甲基丙烯醯基、環氧基之矽烷偶合劑。 作為上述三聚氰胺化合物，可列舉：(聚)羥甲基三聚氰胺、(聚)羥甲基甘脲、(聚)羥甲基苯胍胺、(聚)羥甲基脲等氮化合物中之活性羥甲基(CH2
OH基)之全部或一部分(至少2個)被烷基醚化之化合物。此處，作為構成烷基醚之烷基，可列舉甲基、乙基或丁基，可彼此相同，亦可不同。又，未被烷基醚化之羥甲基可於一分子內自縮合，亦可於兩分子間縮合，其結果形成低聚物成分。具體而言，可使用六甲氧基甲基三聚氰胺、六丁氧基甲基三聚氰胺、四甲氧基甲基甘脲、四丁氧基甲基甘脲等。該等之中，較佳為六甲氧基甲基三聚氰胺、六丁氧基甲基三聚氰胺等經烷基醚化之三聚氰胺。 上述感光性組合物及著色感光性組合物可利用旋轉塗佈機、輥式塗佈機、棒式塗佈機、模嘴塗佈機、簾幕式塗佈機、各種印刷、浸漬等公知之方法，應用於鈉玻璃、石英玻璃、半導體基板、金屬、紙、塑膠等支持基體上。又，亦可暫時先於膜等支持基體上實施，之後轉印至其他支持基體上，其應用方法並無限制。 又，作為使上述感光性組合物及著色感光性組合物硬化時所使用之活性光之光源，可使用發出波長300～450 nm之光者，例如可使用超高壓水銀、水銀蒸汽電弧、碳弧、氙弧等。 進而，藉由曝光光源使用雷射光，而不使用光罩，根據電腦等之數位資訊形成直接圖像之雷射直接刻寫法不僅生產性，而且亦實現解像性或位置精度等之提高，故而有用，作為該雷射光，適宜使用340～430 nm之波長之光，亦可使用氬離子雷射、氦氖雷射、YAG(Yttrium Aluminum Garnet，釔鋁石榴石)雷射、及半導體雷射等發出可視至紅外區域之光者。於使用該等雷射之情形時，於上述感光性組合物及著色感光性組合物中添加吸收可視至紅外之該區域之增感色素。 本發明之感光性組合物及著色感光性組合物亦可經由雙重圖案化製程來進行圖案化，該雙重圖案化製程係使用二種感光性組合物或著色感光性組合物分為二次進行圖案化。 上述感光性組合物及著色感光性組合物(或其硬化物)可用於以下各種用途：光硬化性塗料或清漆、光硬化性接著劑、印刷基板、或彩色電視機、PC(Personal Computer，個人電腦)顯示器、攜帶型資訊終端、數位相機等彩色顯示之液晶顯示面板中之彩色濾光片、CCD(Charge Coupled Device，電荷耦合元件)影像感測器之彩色濾光片、感光性間隔件、黑色管柱隔片、電漿顯示面板用之電極材料、觸控面板、觸控感測器、粉末塗層、印刷油墨、印刷版、接著劑、牙科用組合物、光造形用樹脂、凝膠塗層、電子工學用之光阻劑、電鍍阻劑、蝕刻阻劑、液狀及乾燥膜之兩者、防焊油墨、用以製造各種顯示用途用之彩色濾光片之或用以於電漿顯示面板、電發光顯示裝置、及LCD(Liquid Crystal Display，液晶顯示裝置)之製造步驟中形成構造之光阻劑、用以將電性及電子零件封入之組合物、阻焊劑、磁性記錄材料、微小機械零件、波導管、光開關、鍍敷用遮罩、蝕刻遮罩、彩色試驗系、玻璃纖維纜線塗層、網版印刷用模板、用於利用立體光刻製造三維物體之材料、全像術記錄用材料、圖像記錄材料、微細電子電路、脫色材料、用於圖像記錄材料之脫色材料、使用微膠囊之圖像記錄材料用之脫色材料、印刷配線板用光阻材料、UV(Ultraviolet，紫外線)及可見光雷射直接圖像系用之光阻材料、用於印刷電路基板之逐次積層中之介電層形成之光阻材料、3D安裝用光阻材料或保護膜等，其用途並無特別限制。 本發明之感光性組合物藉由硬化而能夠用於透明導電膜、反射膜、偏光板、保護膜等，且可作為藉由以下方式積層而成之透明積層體使用：依序將上述各層塗佈於透明基板，介隔具有特定之圖案形狀之光罩照射活性光，利用顯影液使曝光後之覆膜顯影，並加熱顯影後之覆膜。作為透明積層體，例如可列舉於透明基材交替地形成包含氧化銦及氧化鈰之複合氧化物之透明薄膜層與金屬薄膜層者等。可於上述各層分別使用含有本發明之化合物作為潛在性添加劑之感光性組合物，亦可於任一以上之層使用該感光性組合物。本發明之透明積層體適宜用於顯示裝置。 本發明之感光性組合物可藉由硬化而用作透明構造體。作為透明構造體，例如可列舉：被稱為感光性間隔件(PS)、柱狀間隔件(CS)之柱形物；(奈米)壓印之微細圖案；用於大型廣告看板等之製造或液晶顯示器用彩色濾光片或配向膜之印刷等電子裝置製造之噴墨受容層等。本發明之透明構造體適宜用於顯示裝置。 上述著色感光性組合物用於形成彩色濾光片之像素，尤其是作為用以形成液晶顯示面板等圖像顯示裝置用之顯示裝置用彩色濾光片之感光性組合物較為有用。 上述顯示裝置用彩色濾光片較佳為藉由以下步驟形成：(1)於基板上形成上述著色感光性組合物之塗膜；(2)對該塗膜介隔具有特定之圖案形狀之光罩照射活性光；(3)利用顯影液使曝光後之覆膜顯影；(4)對顯影後之該覆膜進行加熱。又，本發明之著色感光性組合物作為無顯影步驟之噴墨方式之著色感光性組合物亦有用。 作為上述光罩，亦可使用半色調光罩或灰度掩膜等多階光罩。 [實施例] 以下，列舉實施例等更詳細地對本發明進行說明，但本發明不限定於該等實施例等。 [實施例1-1～1-3]化合物No.1～No.3之合成 室溫下向酚化合物1當量之乙酸乙酯溶液(理論產量之3倍量)中添加4-二甲基胺基吡啶0.2當量，於10℃以下滴加二碳酸二第三丁酯5當量，於氮氣環境下，於室溫下攪拌2小時。於進行油水分離，並利用無水硫酸鈉乾燥有機層後，蒸餾去除溶劑，利用矽膠去除無需成分，之後進行晶析。使所獲得之固體於60℃下減壓乾燥3小時，分別獲得目標物。所獲得之固體為目標物係藉由1
H-NMR、IR進行確認。將結果示於[表1]～[表2]。 [化15][表1]
[表2]
[實施例2-1～2-3及比較例2-1～2-2]感光性組合物No.1～No.3及比較感光性組合物No.1～No.2之製備 將50.9 g之SPC-1000(昭和電工公司製造，固形物成分29%之PGMEA溶液)、11.9 g之ARONIX M-450(東亞合成公司製造)、1.04 g之OXE-01(BASF公司製造)、34.0 g之PGMEA、2.9 g之FZ2122(東麗道康寧公司製造，固形物成分1%之PGMEA溶液)及0.81 g之[表3]中記載之化合物混合，並進行攪拌直至不溶物消失，獲得感光性組合物No.1～No.3及比較感光性組合物No.1～No.2。比較感光性組合物No.1中使用之比較化合物No.1表示下述比較化合物No.1。 [表3]
[化16][實施例3-1～3-3及比較例3-1～3-2]著色感光性組合物No.1～No.3及比較著色感光性組合物No.1～No.3之製備 將1.26 g之SPC-1000(昭和電工公司製造，固形物成分29%之PGMEA溶液)、0.30 g之ARONIX M-450(東亞合成公司製造)、0.03 g之OXE-01(BASF公司製造)、0.85 g之PGMEA、0.08 g之FZ2122(東麗道康寧公司製造，固形物成分1%之PGMEA溶液)及0.02 g之[表3A]中記載之潛在性添加劑混合，並進行攪拌直至不溶物消失。進而添加向[表3A]中記載之0.05 g之著色劑中加入0.95 g之PGMEA並攪拌使之溶解所得之著色劑溶液，進行攪拌直至變得均勻，獲得著色感光性組合物No.1～No.3及比較著色感光性組合物No.1～No.3。 [表3A]
[表3A]之化合物A～C分別表示下述化合物A～C。 [化17][評估例1-1～1-3及比較評估例1-1～1-2]利用焙燒進行之耐熱性評估 於410 rpm×7 sec之條件下將實施例2-1～2-3中製備之感光性組合物No.1～No.3以及比較例2-1～2-2中製備之比較感光性組合物No.1～No.2分別塗佈於玻璃基板，利用加熱板使之乾燥(90℃，90 sec)。利用超高壓水銀燈對所獲得之塗膜進行曝光(150 mJ/cm2
)。於230℃×30 min之條件下焙燒曝光後之塗膜。測定焙燒後之塗膜之400 nm之透過率並進行評估。將結果示於[表4]。 [表4]
根據上述結果，可認為含有本發明之化合物作為潛在性添加劑之感光性組合物與含有比較化合物作為潛在性添加劑之比較感光性組合物相比，焙燒後之透明性維持得較高，耐熱性與比較化合物No.1同等，且優於比較化合物No.2。 [評估例2-1～2-3及比較評估例2-1]溶解性之測定 對化合物No.1～No.3以及比較化合物No.1進行於丙二醇-1-單甲醚-2-乙酸酯(PGMEA)中之溶解性之測定。將結果示於[表5]。 [表5]
根據上述結果，可知本發明之化合物之溶解性較高，於用於感光性組合物之情形時，處理性良好。 [評估例3-1～3-3及比較評估例3-1～3-3]著色感光性組合物基於焙燒之耐熱性評估 於410 rpm×7 sec之條件下將實施例3-1～3-3中製備之著色感光性組合物No.1～No.3以及比較例3-1～3-3中製備之比較著色感光性組合物No.1～No.3分別塗佈於玻璃基板，利用加熱板使之乾燥(90℃、90 sec)。利用超高壓水銀燈對所獲得之塗膜進行曝光(150 mJ/cm2
)。於230℃×30 min之條件下焙燒曝光後之塗膜，檢查焙燒前後之色差(ΔEab*
)。將結果示於[表6]。 [表6]
根據上述結果，可知含有本發明之化合物作為潛在性添加劑之著色感光性組合物與含有相同著色劑之比較感光性組合物相比，焙燒後之色度變化較少，著色劑之耐熱性維持得較高。 根據以上之結果，可知本發明之化合物之溶解性較高，使用該化合物作為潛在性添加劑之感光性組合物之耐熱性優異，作為潛在性添加劑較為有用。Hereinafter, the present invention will be described in detail based on preferred embodiments. As the number of carbon atoms represented by R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 in the above general formula (1) 1-20 alkyl groups, including: methyl, ethyl, propyl, isopropyl, butyl, second butyl, tertiary butyl, isobutyl, pentyl, isopentyl, tertiary pentyl Base, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, third heptyl, 1- Octyl, isooctyl, tertiary octyl, adamantyl, etc. As the aryl group with 6 to 20 carbon atoms represented by R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12, Examples: phenyl, naphthyl, anthracenyl and the like. As the aralkyl group having 7 to 20 carbon atoms represented by R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12, Examples include benzyl, phenethyl, diphenylmethyl, triphenylmethyl, 2-phenylpropyl, 3-phenylpropyl, stilbyl, indenyl, and 9-stilbylmethyl. As R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11, and R 12 represented by the heterocyclic ring containing 2-20 carbon atoms The group can include: pyridyl, pyrimidinyl, and Group, piperidinyl, pyranyl, pyrazolyl, three Group, pyrrolyl, quinolinyl, isoquinolinyl, imidazolyl, benzimidazolyl, triazolyl, furyl (furyl), furanyl (furanyl), benzofuranyl, thienyl (thienyl), thiophene Thiophenyl, benzothienyl, thiadiazolyl, thiazolyl, benzothiazolyl, Azolyl, benzo Azolyl, isothiazolyl, iso Azolyl, indolyl, 2-pyrrolidone-1-yl, 2-piperidone-1-yl, 2,4-dioxyimidazolidine-3-yl, 2,4-dioxy An azolidine-3-yl group, etc., or a group in which a heterocycle is bonded via a divalent bonding group, etc. Examples of the trialkylsilyl group represented by R 1 , R 2 , R 3 and R 4 include trimethylsilane, triethylsilane, and ethyldimethylsilane. Examples of the halogen atom represented by R 5 , R 6 , R 7 , R 8 , R 9 and R 10 include fluorine, chlorine, bromine, and iodine. As the halogen atom represented by R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, and a carbon number of 7 to Substituents substituted by 20 aralkyl groups or heterocyclic ring-containing groups with 2 to 20 carbon atoms include ethylenically unsaturated groups such as vinyl, allyl, acrylic, and methacryl; fluorine, chlorine , Bromine, iodine and other halogen atoms; Acetyl, 2-chloroacetyl, propionyl, octyl, allyl, methacrylic, phenylcarbonyl (benzyl), phthaloyl, 4 -Trifluoromethylbenzyl, p-pentyl, o-hydroxybenzyl, oxalyl, stearyl, methoxycarbonyl, ethoxycarbonyl, tertiary butoxycarbonyl, n-ten Acetyl groups such as octaalkoxycarbonyl and aminomethyl; acetoxy and benzyloxy groups; amino, ethylamino, dimethylamino, diethylamino, butyl Amino group, cyclopentyl amino group, 2-ethylhexyl amino group, dodecyl amino group, anilino group, chlorophenyl amino group, toluidine group, methoxy anilino group, N-methyl-anilino group , Diphenylamino, naphthylamino, 2-pyridylamino, methoxycarbonylamino, phenoxycarbonylamino, acetylamino, benzylamino, formylamine Group, popenylamino group, laurylamino group, carbamate amino group, N,N-dimethylaminocarbonylamino group, N,N-diethylaminocarbonylamino group, morpholine Carbonylamino group, methoxycarbonylamino group, ethoxycarbonylamino group, tertiary butoxycarbonylamino group, n-octadecyloxycarbonylamino group, N-methyl-methoxycarbonylamino group, Phenoxycarbonylamino group, sulfamoylamino group, N,N-dimethylaminosulfonylamino group, methylsulfonylamino group, butylsulfonylamino group, phenylsulfonylamino group Amino groups and other substituted amino groups; sulfonamide, sulfonyl, carboxyl, cyano, sulfo, hydroxyl, nitro, sulfhydryl, imino, carbamethan, sulfonamide, phosphonic acid, phosphoric acid The salt of carboxyl group, sulfo group, phosphonic acid group, phosphoric acid group, etc.; the substitution position is not limited. Among the compounds represented by the above general formula (1), R 1 , R 2 , R 3 and R 4 are -CO-OR 11 because of their higher solubility, so when used as a latent additive, a composition containing it The hardened material has higher heat resistance, so it is better. In addition, R 11 is a tertiary butyl group because it has higher solubility, and when used as a latent additive, the cured product of the composition containing it has higher heat resistance, so it is preferable. Examples of the alkylene group having 1 to 4 carbon atoms represented by X 1 in the general formula (1) include methylene, ethylene, propylene, isopropylene, butylene, and the like. The number of carbon atoms of X 1 Suo table 3 to 20 of the aliphatic cyclic hydrocarbon group include: cyclopentyl, cyclohexyl, cyclopentylmethyl, cyclopentylethyl, cyclohexylmethyl, cyclohexylethyl and the like . Examples of the substituent for substituting the alkylene group having 1 to 4 carbon atoms or the alicyclic hydrocarbon group having 3 to 20 carbon atoms represented by X 1 include the above-mentioned examples of R 1 , R 2 , R 3 , and R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, and the number of carbon atoms Examples include substituents substituted with 7-20 aralkyl groups or heterocyclic ring-containing groups with 2-20 carbon atoms. Examples of the cycloalkyl group having 3 to 10 carbon atoms represented by R 71 in the above formula (1-1) include cyclopropyl, cyclobutyl, cyclopentyl, cycloheptyl, and cyclooctyl. Examples of the alkyl group having 1 to 10 carbon atoms and the halogen atom represented by R 72 include the alkyl group and the halogen atom exemplified in the description of the general formula (1). Examples of the alkoxy group having 1 to 10 carbon atoms represented by R 72 include: methoxy, ethoxy, isopropoxy, butoxy, second butoxy, tertiary butoxy, iso Butoxy, pentyloxy, isopentyloxy, third pentyloxy, hexyloxy, 2-hexyloxy, 3-hexyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, heptyl Oxy, 2-heptyloxy, 3-heptyloxy, isoheptyloxy, third heptyloxy, 1-octyloxy, isooctyloxy, third octyloxy and the like. Examples of the alkenyl group having 2 to 10 carbon atoms represented by R 72 include vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2-pentenyl, 2-octenyl, etc. As the phenyl group represented by R 71 or the cycloalkyl group having 3 to 10 carbon atoms, and the alkyl group represented by R 72 having 1 to 10 carbon atoms, the alkoxy group having 1 to 10 carbon atoms or carbon atoms The substituents substituted by the alkenyl group of 2 to 10 include the above-mentioned examples of R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 is substituted with an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, or a heterocyclic ring-containing group having 2 to 20 carbon atoms Substituents are exemplified. As the alkyl group having 1 to 10 carbon atoms, the aryl group having 6 to 20 carbon atoms, the aralkyl group having 7 to 20 carbon atoms, and carbon atoms represented by R 73 and R 74 in the above formula (1-3) The heterocyclic ring-containing group having 2 to 20 atoms and the halogen atom include the alkyl group, aryl group, aralkyl group, and the heterocyclic ring-containing group having 2 to 20 carbon atoms and the halogen atom exemplified in the above description. Examples of the aryloxy group having 6 to 20 carbon atoms represented by R 73 and R 74 include phenoxy, naphthyloxy, 2-methylphenoxy, 3-methylphenoxy, and 4-methyl Phenyloxy, 4-vinylphenyloxy, 3-isopropylphenoxy, 4-isopropylphenoxy, 4-butylphenoxy, 4-tert-butylphenoxy, 4-hexylphenoxy, 4-cyclohexylphenoxy, 4-octylphenoxy, 4-(2-ethylhexyl)phenoxy, 2,3-dimethylphenoxy, 2,4 -Dimethylphenoxy, 2,5-dimethylphenoxy, 2,6-dimethylphenoxy, 3,4-dimethylphenoxy, 3,5-dimethylphenoxy Group, 2,4-di-tertiary butylphenoxy, 2,5-di-tertiary butylphenoxy, 2,6-di-tertiary butylphenoxy, 2,4-di-tertiary pentyl Groups such as phenoxy, 2,5-tert-pentylphenoxy, 4-cyclohexylphenoxy, 2,4,5-trimethylphenoxy, and ferrocenyloxy. Examples of the arylthio group having 6 to 20 carbon atoms represented by R 73 and R 74 include a group obtained by substituting a sulfur atom for the oxygen atom of the above-mentioned aryloxy group having 6 to 20 carbon atoms. Examples of the aralkenyl group having 8 to 20 carbon atoms represented by R 73 and R 74 include vinyl groups, allyl groups, 1-propenyl groups, isopropenyl groups, 2-butenyl groups, and 1,3-butane groups. Alkenyl groups such as dienyl, 2-pentenyl, and 2-octenyl are substituted for the oxygen atom of the above-mentioned aryloxy group having 6 to 20 carbon atoms. Examples of the ring formed by adjacent R 73 each other include a cyclopentane ring, a cyclohexane ring, a cyclopentene ring, a benzene ring, a piperidine ring, a morpholine ring, a lactone ring, and a lactone ring. As the alkyl group having 1 to 10 carbon atoms, the aryl group having 6 to 20 carbon atoms, the aryloxy group having 6 to 20 carbon atoms, and the aryl sulfur having 6 to 20 carbon atoms represented by R 73 and R 74 The substituents substituted with a C6-20 aralkenyl group, a C7-20 aralkyl group, and a C2-20 heterocyclic group-containing group include the above-mentioned substituents as R 1 , R 2. Alkyl groups with 1-20 carbon atoms and 6-20 carbon atoms represented by R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 Examples include substituents substituted with an aryl group, an aralkyl group having 7 to 20 carbon atoms, or a heterocyclic ring-containing group having 2 to 20 carbon atoms. As specific examples of the compound represented by the above general formula (1), the compounds represented by the following [Chemical Formula 5] to [Chemical Formula 7] can be cited, but the present invention is not limited to these compounds. [化5] [化6] [化7] The method for producing the compound represented by the above general formula (1) is not particularly limited. For example, it can be described in Japanese Patent Laid-Open No. 57-111375, Japanese Patent Laid-Open Hei 3-173343, Japanese Patent Laid-Open Hei 6-128195, and Japanese Patent JP 7-206771, JP 7-252191, JP 2004-501128, and phenolic compounds produced by the methods described in the gazettes and acid anhydrides, acetyl chlorides, Boc(tert-butoxycarbonyl, tert-butoxycarbonyl, tert-butoxycarbonyl) Oxycarbonylation reagent, alkyl halide compound, silyl chloride compound, allyl ether compound, etc. are obtained by reaction. The compound represented by the above general formula (1) can be used as an intermediate for semiconductors, photosensitive photographs, lithographic printing plates, medicinal compounds, thermal paper, latent antioxidants, latent ultraviolet absorbers, and other latent additives And use. The latent additive of the present invention contains at least one compound as the above-mentioned general formula (1). The above-mentioned latent additives refer to the following: they are inert in the pre-baking step at room temperature or below 150°C, and are heated at 100-250°C, or heated at 80-200°C in the presence of acid/alkali catalysts. Deprotection group becomes active. The photosensitive composition of the present invention contains the latent additive of the present invention. In the photosensitive composition of the present invention, the content of the latent additive of the present invention is preferably 0.001 to 20% by mass, more preferably 0.005 to 5% by mass. The photosensitive composition of the present invention is a composition whose properties are changed by light irradiation. There is a positive photoresist in those that are soluble in chemical reactions, and a negative photoresist in those that are insoluble in chemical reactions. . The photosensitive composition of the present invention contains the latent additive of the present invention as a latent antioxidant, and also contains an ethylenically unsaturated bond-containing polymerizable compound having an acid value and a photoradical polymerization initiator. Examples of the polymerizable compound containing an ethylenically unsaturated bond having an acid value include (meth)acrylic acid, α-chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, and fumaric acid. , Bicycloheptene dicarboxylic acid, crotonic acid, methacrylic acid, vinyl acetic acid, allyl acetic acid, cinnamic acid, hexadienoic acid, mesaconic acid, succinic acid mono[2-(meth)acryloyloxyethyl] ester , Phthalic acid mono[2-(meth)acryloyloxyethyl] ester, ω-carboxyl polycaprolactone mono(meth)acrylate is equal to the monomer of a polymer with carboxyl and hydroxyl groups at both ends Base) acrylate, hydroxyethyl (meth)acrylate maleate, hydroxypropyl (meth)acrylate maleate, dicyclopentadiene maleate or Unsaturated polybasic acids such as polyfunctional (meth)acrylates with one carboxyl group and two or more (meth)acrylic acid groups; phenol and/or cresol novolac epoxy resin, biphenyl skeleton, naphthalene skeleton Novolac epoxy compounds, bisphenol A novolac epoxy compounds, dicyclopentadiene novolac epoxy compounds, and other novolac epoxy compounds, polyphenylmethane epoxy resins with polyfunctional epoxy groups A resin obtained by applying an unsaturated monobasic acid to the epoxy group of an epoxy compound such as an epoxy compound represented by the following general formula (I), and causing an unsaturated monobasic acid to act on the following general formula (1) The epoxy group of the epoxy compound such as epoxy compound and the resin obtained by the action of polybasic acid anhydride, pentaerythritol triacrylate, dipentaerythritol pentaacrylate and other hydroxyl-containing polyfunctional acrylates, succinic anhydride, phthalic anhydride The reactants of dibasic acid anhydrides such as tetrahydrophthalic anhydride are polyfunctional acrylates with acid value. [化8] (In the formula, X 41 represents a direct bond, an optionally substituted alkylene group with 1 to 4 carbon atoms, an optionally substituted alicyclic hydrocarbon group with 3 to 20 carbon atoms, -O-, -S- , -SO 2 -, -SS-, -SO-, -CO-, -OCO- or the substituents represented by (1-1) to (1-3) above, R 41 , R 42 , R 43 and R 44 each independently represents a hydrogen atom, an optionally substituted alkyl group with 1 to 5 carbon atoms, an optionally substituted group with 1 to 8 carbon atoms, and an optionally substituted group with 2 to 5 carbon atoms The alkenyl group or halogen atom, m is an integer of 0-10) These acid value-containing polymerizable compounds containing ethylenic unsaturated bonds can be used singly or in combination of two or more kinds. The content of the ethylenically unsaturated bond-containing polymerizable compound having an acid value in the photosensitive composition of the present invention is preferably 20 to 80% by mass in the solid content, and more preferably 30 to 30 to the solid content. 70% by mass. In addition, it can be used in combination with a polymerizable compound containing an ethylenically unsaturated bond that does not have an acid value. When two or more types are mixed and used, these may be copolymerized in advance and used as a copolymer. Examples of polymerizable compounds containing ethylenically unsaturated bonds that do not have an acid value include: 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and (methyl) Glycidyl acrylate, the following compounds No.A1～No.A4, methyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, tertiary butyl (meth)acrylate , Cyclohexyl (meth)acrylate, n-octyl (meth)acrylate, isooctyl (meth)acrylate, isononyl (meth)acrylate, stearyl (meth)acrylate, (meth) Lauryl acrylate, methoxyethyl (meth)acrylate, dimethylaminomethyl (meth)acrylate, dimethylaminoethyl (meth)acrylate, aminopropyl (meth)acrylate , Dimethylaminopropyl (meth)acrylate, ethoxyethyl (meth)acrylate, poly(ethoxy)ethyl (meth)acrylate, butoxyethoxy (meth)acrylate Ethyl, ethylhexyl (meth)acrylate, phenoxyethyl (meth)acrylate, tetrahydrofuran (meth)acrylate, vinyl (meth)acrylate, allyl (meth)acrylate, Benzyl (meth)acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate Base) acrylate, propylene glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, trimethylolethane Tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, pentaerythritol tetra(meth)acrylate, Pentaerythritol tri(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, tris[(meth)acryloyl ethyl] isocyanurate, polyester (meth)acrylate oligomerization Unsaturated monobasic acid and polyol or polyphenol ester; zinc (meth)acrylate, magnesium (meth)acrylate and other unsaturated polybasic acid metal salt; maleic anhydride, itaconic anhydride, citraconic anhydride , Methyltetrahydrophthalic anhydride, tetrahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, 5-(2,5-dioxotetrahydrofuranyl)-3-methyl-3 -Cyclohexene-1,2-dicarboxylic anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, dodecenyl succinic anhydride, methyl bicycloheptene dicarboxylic anhydride, etc. Saturated polybasic acid anhydride; (meth)acrylamide, methylenebis(meth)acrylamide, diethylenetriamine tri(meth)acrylamide, xylylene bis(methyl) Unsaturated monobasic acids and polyvalent amines such as acrylamide, α-chloroacrylamide, N-2-hydroxyethyl (meth)acrylamide, etc.; unsaturated aldehydes such as acrolein; (meth)propylene Unsaturated nitriles such as nitrile, α-chloroacrylonitrile, vinylidene cyanide, and allyl cyanide; styrene, 4-methylstyrene, 4-ethylstyrene, 4-methoxystyrene, 4-hydroxyl Styrene, 4-chlorostyrene, divinylbenzene, vinyl toluene, Unsaturated aromatic compounds such as vinyl benzoic acid, vinyl phenol, vinyl sulfonic acid, 4-vinylbenzene sulfonic acid, vinyl benzyl methyl ether, vinyl benzyl glycidyl ether; methyl vinyl ketone, etc. Saturated ketones; unsaturated amine compounds such as vinylamine, allylamine, N-vinylpyrrolidone, and vinylpiperidine; vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether, isobutyl vinyl ether, Vinyl ethers such as allyl glycidyl ether; unsaturated imines such as maleimide, N-phenyl maleimide, N-cyclohexyl maleimide; Indenes such as indene and 1-methylindene; aliphatic conjugated dienes such as 1,3-butadiene, isoprene, and chloroprene; polystyrene, polymethyl (meth)acrylate, Poly(meth)acrylate and polysiloxane are macromonomers with mono(meth)acrylic acid group at the end of the polymer molecular chain; (meth)acrylonitrile, ethylene, propylene, butene, Other vinyl compounds such as vinyl chloride and vinyl acetate, and macromonomers such as polymethyl methacrylate macromonomers, polystyrene macromonomers, tricyclodecane skeleton monomethacrylate, N-benzene Co-polymers of methyl maleimide, methacryloxymethyl-3-ethyloxetane, etc. and (meth)acrylic acid, and make these co-polymers with Showa Denko Co., Ltd. (Meth)acrylic acid copolymers obtained by the reaction of Karenz MOI and AOI with unsaturated bond isocyanate compounds, or vinyl chloride, vinylidene chloride, divinyl succinate, diallyl phthalate , Triallyl phosphate, triallyl isocyanurate, vinyl sulfide, vinyl imidazole, vinyl Oxazoline, vinyl carbazole, vinyl pyrrolidone, vinyl pyridine, vinyl urethane compounds containing hydroxyl-containing vinyl monomers and polyisocyanate compounds, hydroxyl-containing vinyl monomers and polyepoxy Compounds such as vinyl epoxy compounds, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and other hydroxyl-containing polyfunctional acrylates, are reactants of polyfunctional isocyanates such as toluene diisocyanate and hexamethylene diisocyanate. [化9] [化10] [化11] [化12] The content of the ethylenically unsaturated bond-containing polymerizable compound that does not have an acid value in the photosensitive composition of the invention is preferably 20 to 80% by mass in the solid content, and more preferably 30 to 30 to the solid content. 60% by mass. In order to adjust the acid value and improve the developability of the above-mentioned photosensitive composition, the photosensitive composition of the present invention may be used together with the above-mentioned acid value-containing polymerizable compound containing an ethylenically unsaturated bond and a monofunctional or polyfunctional compound. Functional epoxy compound. The above-mentioned polymerizable compound containing an ethylenically unsaturated bond with an acid value is preferably in the range of 5 to 120 mgKOH/g for the solid content, and the amount of monofunctional or polyfunctional epoxy compound used is preferably to satisfy Choose the method of the above acid value. Examples of the above-mentioned monofunctional epoxy compounds include: glycidyl methacrylate, methyl glycidyl ether, ethyl glycidyl ether, propyl glycidyl ether, isopropyl glycidyl ether, butyl glycidyl ether, isopropyl glycidyl ether, and isopropyl glycidyl ether. Butyl glycidyl ether, tertiary butyl glycidyl ether, pentyl glycidyl ether, hexyl glycidyl ether, heptyl glycidyl ether, octyl glycidyl ether, nonyl glycidyl ether, decyl glycidyl ether, ten Monoalkyl glycidyl ether, lauryl glycidyl ether, tridecyl glycidyl ether, tetradecyl glycidyl ether, pentadecyl glycidyl ether, hexadecyl glycidyl ether, 2-ethyl Hexyl glycidyl ether, allyl glycidyl ether, propargyl glycidyl ether, p-methoxyethyl glycidyl ether, phenyl glycidyl ether, p-methoxy glycidyl ether, p-butyl phenol glycidyl Ether, cresyl glycidyl ether, 2-methylcresyl glycidyl ether, 4-nonylphenyl glycidyl ether, benzyl glycidyl ether, p-cumyl phenyl glycidyl ether, trityl glycidyl Glyceryl ether, 2,3-glycidyl methacrylate, epoxidized soybean oil, epoxidized linseed oil, glycidyl butyrate, vinyl monoxide cyclohexane, 1,2-epoxy-4- Vinyl cyclohexane, styrene oxide, pinene oxide, methyl styrene oxide, cyclohexane oxide, propylene oxide, etc. As the polyfunctional epoxy compound, if one or more selected from the group consisting of bisphenol-type epoxy compounds and glycidyl ethers is used, it is possible to obtain a colored alkaline developable photosensitive composition with better characteristics. Better. As the bisphenol-type epoxy compound, in addition to the epoxy compound represented by the above-mentioned general formula (I), for example, a bisphenol-type epoxy compound such as a hydrogenated bisphenol-type epoxy compound can also be used. Examples of the glycidyl ethers include ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, 1, 8-octanediol diglycidyl ether, 1,10-decanediol diglycidyl ether, 2,2-dimethyl-1,3-propanediol diglycidyl ether, diethylene glycol diglycidyl ether, three Ethylene glycol diglycidyl ether, tetraethylene glycol diglycidyl ether, hexaethylene glycol diglycidyl ether, 1,4-cyclohexane dimethanol diglycidyl ether, 1,1,1-tri(glycidyl) Oxymethyl)propane, 1,1,1-tris(glycidoxymethyl)ethane, 1,1,1-tris(glycidoxymethyl)methane, 1,1,1,1- Tetrakis(glycidoxymethyl)methane. In addition, you can also use: phenol novolak type epoxy compound, biphenol novolak type epoxy compound, cresol novolak type epoxy compound, bisphenol A novolak type epoxy compound, dicyclopentadiene novolak Novolac type epoxy compounds such as type epoxy compounds; 3,4-epoxy-6-methylcyclohexane carboxylic acid 3,4-epoxy-6-methylcyclohexyl methyl ester, 3,4- Alicyclic epoxy compounds such as epoxycyclohexane carboxylic acid 3,4-epoxycyclohexyl methyl ester, 1-epoxyethyl-3,4-epoxycyclohexane; diglycidyl phthalate , Tetrahydrophthalic acid diglycidyl ester, dimer acid glycidyl ester and other glycidyl esters; tetraglycidyl diamino diphenyl methane, triglycidyl p-aminophenol, N,N-di Glycidyl amines such as glycidyl aniline; heterocyclic epoxy compounds such as 1,3-diglycidyl-5,5-dimethyl allantoin and triglycidyl isocyanurate; dicyclopentadiene dioxide Dioxide compounds such as olefins; naphthalene type epoxy compounds, triphenylmethane type epoxy compounds, dicyclopentadiene type epoxy compounds, etc. The above-mentioned photoradical polymerization initiator may be a compound capable of initiating radical polymerization by being irradiated with light. For example, preferable examples include acetophenone-based compounds, benzyl-based compounds, and benzophenones. Series compounds, 9-oxysulfur Ketone-based compounds, oxime-based compounds, etc. Examples of acetophenone compounds include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, and 4'-isopropyl-2-hydroxy-2 -Methylpropiophenone, 2-hydroxymethyl-2-methylpropiophenone, 2,2-dimethoxy-1,2-diphenylethane-1-one, p-dimethylaminoacetophenone , P-tert-butyldichloroacetophenone, p-tert-butyltrichloroacetophenone, p-azidobenzylidene acetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- [4-(Methylthio)phenyl]-2-morpholinoacetone-1, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1 , Benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl Base-1-propan-1-one and so on. As the benzyl compound, benzyl and anise and the like can be mentioned. Examples of benzophenone-based compounds include benzophenone, methyl phthalate, Michelone, 4,4'-bisdiethylaminobenzophenone, 4, 4'-dichlorobenzophenone, 4-benzyl-4'-methyldiphenyl sulfide, etc. As 9-oxysulfur Series compounds, including: 9-oxysulfur , 2-Methyl 9-oxysulfur , 2-Ethyl 9-oxysulfur , 2-Chloro 9-oxysulfur , 2-isopropyl 9-oxysulfur , 2,4-Diethyl 9-oxysulfur Wait. As the oxime compound, in terms of sensitivity and heat resistance, a compound represented by the following general formula (II) is particularly preferable. [化13] (In the formula, R 51 and R 52 each independently represent a hydrogen atom, a cyano group, an optionally substituted alkyl group with 1 to 20 carbon atoms, an optionally substituted aryl group with 6 to 30 carbon atoms, and A substituted aralkyl group having 7 to 30 carbon atoms or an optionally substituted group containing a heterocyclic ring having 2 to 20 carbon atoms, R 53 and R 54 each independently represent a halogen atom, a nitro group, and a cyano group , Hydroxyl, carboxyl, R 55 , OR 56 , SR 57 , NR 58 R 59 , COR 60 , SOR 61 , SO 2 R 62 or CONR 63 R 64 , R 53 and R 54 can also be bonded to each other to form a ring, R 55 , R 56 , R 57 , R 58 , R 59 , R 60 , R 61 , R 62 , R 63 and R 64 each independently represent an optionally substituted alkyl group with 1 to 20 carbon atoms, optionally substituted The group is an aryl group having 6 to 30 carbon atoms, an optionally substituted aralkyl group having 7 to 30 carbon atoms, or an optionally substituted group containing a heterocyclic ring with 2 to 20 carbon atoms, X 2 represents oxygen Atom, sulfur atom, selenium atom, CR 75 R 76 , CO, NR 77 or PR 78 , X 3 represents a single bond or CO, represents R 51 , R 52 , R 55 , R 56 , R 57 , R 58 , R 59 , R 60 , R 65 , R 66 , R 67 and R 68 include an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or an aralkyl group having 7 to 30 carbon atoms. The methylene group in the aralkyl group or the aralkyl group can be substituted with a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group or a heterocyclic-containing group, and can also be substituted with -O-. R 53 and R 54 can also be respectively It forms a ring independently with any adjacent benzene ring, a represents an integer from 0 to 4, and b represents an integer from 0 to 5) As other photoradical polymerization initiators, examples include: 2,4,6-tri Methylbenzyl diphenyl phosphine oxide, bis(cyclopentadienyl)-bis[2,6-difluoro-3-(pyridin-1-yl)]titanium and the like. These photoradical polymerization initiators can be used by using one type or by blending two or more types according to the required performance. The photo-radical polymerization initiator as described above is preferably 0.1-30% by mass, and particularly preferably 0.5-10% by mass in the solid content of the photosensitive composition of the present invention. If the content of the above-mentioned photo radical polymerization initiator is less than 0.1% by mass, the curing by exposure may become insufficient, and if it is more than 30% by mass, the photo radical initiator may be deposited in the photosensitive composition. The situation. According to the present invention, a colored photosensitive composition is also provided. The colored photosensitive composition contains the above-mentioned photosensitive composition and a coloring agent. The cured product of the colored photosensitive composition is suitably used as a color filter. In the above-mentioned colored photosensitive composition, the content of the colorant is preferably 0.01 to 50% by mass, more preferably 0.1 to 30% by mass. Examples of the above-mentioned coloring agent include dyes and pigments. The dye is not particularly limited as long as it is a compound having absorption in the range of 380 to 1200 nm, and examples include azo compounds, anthraquinone compounds, indigo compounds, triarylmethane compounds, Compounds, alizarin compounds, acridine compounds, stilbene compounds, thiazole compounds, naphthol compounds, quinoline compounds, nitro compounds, indamine compounds, Compounds, phthalocyanine compounds, cyanine compounds, diiminium compounds, cyanovinyl compounds, dicyanostyrene compounds, rhodamine compounds, perylene compounds, polyene naphthalene lactam compounds, coumarin compounds, formulas Acid onium compounds, croconium compounds, spiropyran compounds, spiro Compounds, merocyanine compounds, oxygen compounds, styryl compounds, pyrylium compounds, rhodanine compounds, Oxazolinone compounds, phthalimide compounds, Phline compounds, naphthoquinone compounds, azaanthraquinone compounds, porphyrin compounds, azaporphyrin compounds, pyrromethene compounds, quinacridone compounds, dione pyrrolopyrrole compounds, indigo compounds, acridine compounds, acridine Dyes such as compounds, azomethine compounds, aniline compounds, quinacridone compounds, quinophthalone compounds, quinonimine compounds, iridium complexes, europium complexes, etc., and these may be used in combination of plural kinds. As the pigment, inorganic pigments or organic pigments can be used, for example: nitroso compounds, nitro compounds, azo compounds, diazo compounds, Compounds, quinoline compounds, anthraquinone compounds, coumarin compounds, phthalocyanine compounds, isoindolinone compounds, isoindoline compounds, quinacridone compounds, anthracenanthone compounds, pyrene compounds, perylene compounds, Pyrrolopyrrole dione compound, thioindigo compound, two Compounds, triphenylmethane compounds, quinophthalone compounds, naphthalenetetracarboxylic acid; metal complexes of azo dyes and cyanine dyes; lake pigments; carbon black obtained by furnace method, channel method, and heat treatment method , Or carbon black such as acetylene black, Ketjen black or lamp black; the carbon black is adjusted by epoxy resin and coated with the above carbon black, and the carbon black is dispersed in a solvent with the resin in advance and made 20～200 mg/g It is obtained by resin adsorption, obtained by acidic or alkaline surface treatment of the above carbon black, with an average particle size of 8 nm or more and DBP (Dibutyl phthalate) oil absorption of 90 ml/100 The total oxygen content calculated from the CO and CO 2 in the volatile matter at 950°C is 9 mg or more per 100 m 2 of the surface area of carbon black; graphite, graphitized carbon black, activated carbon, carbon fiber, naphthalene Rice carbon tube, spiral carbon fiber, carbon nanohorn, carbon aerogel, fullerene; aniline black, pigment black 7, titanium black; hydrophobic resin, chromium oxide green, milori blue, cobalt green, cobalt blue, Manganese series, ferrocyanide, phosphate ultramarine, iron blue, ultramarine, sky blue, chrome green, emerald green, lead sulfate, yellow red, zinc yellow, iron red (iron oxide red (III)), cadmium red, synthetic iron Inorganic or organic pigments such as black and umber. These pigments can be used alone or in a mixture of plural kinds. As the above-mentioned inorganic pigments or organic pigments, commercially available pigments can also be used, for example: Pigment Red 1, 2, 3, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48, 49, 88, 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 254; Pigment Orange 13, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 65, 71; Pigment Yellow 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109, 110, 113, 114, 117, 120, 125, 126, 127, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 166, 168, 175, 180, 185; Pigment Green 7, 10, 36; Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 5, 15: 6, 22, 24, 56, 60, 61, 62, 64; Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 50, etc. In the colored photosensitive composition of the present invention, it is preferable to use a dye as the above-mentioned coloring agent, and it is particularly preferable to use a triarylmethane compound and a cyanovinyl compound. By using dyes, especially triarylmethane compounds and cyanovinyl compounds, as colorants, the heat resistance of the colorants is further improved, and as a result, the coloring photosensitive composition has an effect of small changes in chromaticity before and after firing. In the above-mentioned photosensitive composition and colored photosensitive composition, a solvent can be further added. Examples of the solvent include solvents capable of dissolving or dispersing the above-mentioned components as necessary. Examples include methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, Methyl isobutyl ketone, cyclohexanone, 2-heptanone and other ketones; diethyl ether, two Ether solvents such as alkane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane, dipropylene glycol dimethyl ether; methyl acetate, ethyl acetate, n-propyl acetate, acetic acid Ester solvents such as isopropyl ester, n-butyl acetate, cyclohexyl acetate, ethyl lactate, dimethyl succinate, and Texanol; cellosolves such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether Solvents; methanol, ethanol, iso-or n-propanol, iso-or n-butanol, pentanol, diacetone alcohol and other alcoholic solvents; ethylene glycol monoacetate methyl, ethylene glycol monoethyl acetate, propylene glycol-1- Monomethyl ether-2-acetate (PGMEA), dipropylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, ethoxyethyl propionate, 1-tert-butoxy-2-propane Ether ester solvents such as alcohol, 3-methoxybutyl acetate and cyclohexanediol acetate; BTX (Benzene-Toluene-Xylene) solvents such as benzene, toluene, and xylene; hexane , Heptane, octane, cyclohexane and other aliphatic hydrocarbon solvents; turpentine, D-limonene, pinene and other terpene hydrocarbon oils; mineral spirits, Swazol#310 (Kosmo Songshan Petroleum Co., Ltd.), Solvesso #100 (Exxon Chemical (stock)) and other paraffin solvents; halogenated aliphatic hydrocarbon solvents such as carbon tetrachloride, chloroform, trichloroethylene, methylene chloride, 1,2-dichloroethane; halogenated aromatics such as chlorobenzene Group hydrocarbon solvents; Carbitol solvents, aniline, triethylamine, pyridine, acetic acid, acetonitrile, carbon disulfide, N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl Pyrrolidone, dimethyl sulfoxide, water, etc.; these solvents can be used in the form of one kind or a mixed solvent of two or more kinds. Among these, ketones, ether ester solvents, etc., especially propylene glycol-1-monomethyl ether-2-acetate, cyclohexanone, etc., are due to the photoresist and light radical polymerization in the photosensitive composition. The compatibility of the initiator is good, so it is preferred. The photosensitive composition and the colored photosensitive composition may further contain an inorganic compound. Examples of the inorganic compound include metal oxides such as nickel oxide, iron oxide, iridium oxide, titanium oxide, zinc oxide, magnesium oxide, calcium oxide, potassium oxide, silicon oxide, and aluminum oxide; layered clay minerals, Milo Lavender blue, calcium carbonate, magnesium carbonate, cobalt series, manganese series, glass powder, mica, talc, clay, ferrocyanide, various metal sulfates, sulfides, selenides, aluminum silicate, calcium silicate, hydroxide Aluminum, platinum, gold, silver, copper, etc. When using a pigment and/or an inorganic compound in the said photosensitive composition and the said colored photosensitive composition, you may add a dispersing agent. As the dispersant, any dispersant can be used as long as it is capable of dispersing and stabilizing colored materials and inorganic compounds. Commercially available dispersants can be used, such as BYK series manufactured by BYK-Chemie, etc. Suitable for use with alkalis The functional groups include polyester, polyether, polyurethane polymer dispersants; with a nitrogen atom as a basic functional group, and the functional group with a nitrogen atom is an amine and/or its quaternary salt, The amine value is 1-100 mgKOH/g. In addition, to the above-mentioned photosensitive composition and the above-mentioned colored photosensitive composition, the following customary additives may be added as needed: p-anisole, hydroquinone, catechol, tert-butylcatechol, phenanthrene Thio Thermal polymerization inhibitors; plasticizers; adhesion promoters; fillers; defoamers; leveling agents; surface regulators; antioxidants such as phenolic antioxidants, phosphite antioxidants, and thioether antioxidants; Ultraviolet absorbers; dispersing aids; agglomeration inhibitors; catalysts; effect promoters; crosslinking agents; tackifiers, etc. In addition, by using other organic polymers together with the above-mentioned polymerizable compound having an acid value containing an ethylenically unsaturated bond, the characteristics of the cured product of the colored photosensitive composition of the present invention can also be improved. Examples of the above-mentioned organic polymer include polystyrene, polymethyl methacrylate, methyl methacrylate-ethyl acrylate copolymer, poly(meth)acrylic acid, and styrene-(meth)acrylic acid copolymer. , (Meth) acrylic acid-methyl methacrylate copolymer, ethylene-vinyl chloride copolymer, ethylene-vinyl copolymer, polyvinyl chloride resin, ABS (Acrylonitrile-Butadiene-Styrene, acrylonitrile-butadiene-benzene Ethylene) resin, nylon 6, nylon 66, nylon 12, urethane resin, polycarbonate polyvinyl butyral, cellulose ester, polyacrylamide, saturated polyester, phenolic resin, phenoxy resin, Polyamide resin, polyamide resin, epoxy resin, etc., among them, polystyrene, (meth)acrylic acid-methyl methacrylate copolymer, and epoxy resin are preferred. In the photosensitive composition and the colored photosensitive composition, a chain transfer agent, a sensitizer, a surfactant, a silane coupling agent, melamine, etc. can be further used in combination. As the above-mentioned chain transfer agent and sensitizer, compounds containing sulfur atoms are generally used. Examples include: thioglycolic acid, thiomalic acid, thiosalicylic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, N-(2-mercaptopropionyl)glycamine Acid, 2-mercaptonicotinic acid, 3-[N-(2-mercaptoethyl)aminomethanyl]propionic acid, 3-[N-(2-mercaptoethyl)amino]propionic acid, N-( 3-mercaptopropionyl) alanine, 2-mercaptoethanesulfonic acid, 3-mercaptopropanesulfonic acid, 4-mercaptobutanesulfonic acid, dodecyl(4-methylthio)phenyl ether, 2-mercaptoethanol, 3-mercapto-1,2-propanediol, 1-mercapto-2-propanol, 3-mercapto-2-butanol, mercaptophenol, 2-mercaptoethylamine, 2-mercaptoimidazole, 2-mercaptobenzimidazole, Mercapto compounds such as 2-mercapto-3-hydroxypyridine, 2-mercaptobenzothiazole, thioglycolic acid, trimethylolpropane tris(3-mercaptopropionate), and pentaerythritol tetra(3-mercaptopropionate); Disulfide compounds obtained by oxidation of mercapto compounds, iodoacetic acid, iodopropionic acid, 2-iodoethanol, 2-iodoethanesulfonic acid, 3-iodopropanesulfonic acid and other iodinated alkyl compounds; trimethylolpropane tri( 3-mercaptoisobutyrate), butanediol bis(3-mercaptoisobutyrate), hexamethylene dithiol, decane dithiol, 1,4-dimethylmercaptobenzene, butanediol dithiopropane Ester, butanediol dithioacetate, ethylene glycol dithioacetate, trimethylolpropane trithioacetate, butanediol dithiopropionate, trimethylolpropane Trithiopropionate, trimethylolpropane trithioacetate, pentaerythritol tetrathiopropionate, pentaerythritol tetrathioacetate, trihydroxyethyl trithiopropionate, the following compound No .C1, trimercaptopropionic acid tris(2-hydroxyethyl) isocyanurate and other aliphatic polyfunctional thiol compounds; Karenz MT BD1, PE1, NR1, etc. manufactured by Showa Denko Corporation. [化14] As the above-mentioned surfactants, fluorosurfactants such as perfluoroalkyl phosphoric acid esters and perfluoroalkyl carboxylates; anionic surfactants such as alkali salts of higher fatty acids, alkane sulfonates, and alkyl sulfates can be used ; Cationic surfactants such as higher amine hydrohalides and quaternary ammonium salts; non-ionic interfaces such as polyethylene glycol alkyl ethers, polyethylene glycol fatty acid esters, sorbitan fatty acid esters, and fatty acid monoglycerides Active agents; amphoteric surfactants; surfactants such as silicone-based surfactants, which can be used in combination. As the above-mentioned silane coupling agent, for example, silane coupling agents manufactured by Shin-Etsu Chemical Co., Ltd. can be used. Among them, silane coupling agents having isocyanate groups, methacrylic groups, and epoxy groups such as KBE-9007, KBM-502, and KBE-403 are suitably used. mixture. Examples of the above-mentioned melamine compounds include: (poly)methylol melamine, (poly)methylol glycoluril, (poly)methylol benzoguanamine, (poly)methylolurea, and other nitrogen compounds including active methylol A compound in which all or part (at least 2) of the group (CH 2 OH group) is etherified with an alkyl group. Here, examples of the alkyl group constituting the alkyl ether include a methyl group, an ethyl group, or a butyl group, and they may be the same as or different from each other. In addition, the methylol group that has not been etherified with the alkyl group can be self-condensed in one molecule or can be condensed between two molecules, resulting in the formation of an oligomer component. Specifically, hexamethoxymethyl melamine, hexabutoxymethyl melamine, tetramethoxymethyl glycoluril, tetrabutoxymethyl glycoluril, etc. can be used. Among them, preferred are melamine etherified with alkyl groups such as hexamethoxymethyl melamine and hexabutoxymethyl melamine. The above-mentioned photosensitive composition and coloring photosensitive composition can be used with spin coaters, roll coaters, bar coaters, die nozzle coaters, curtain coaters, various types of printing, dipping, etc. The method is applied to support substrates such as soda glass, quartz glass, semiconductor substrate, metal, paper, and plastic. In addition, it may be implemented temporarily on a supporting substrate such as a film, and then transferred to another supporting substrate, and the application method is not limited. In addition, as the light source of the active light used when curing the above-mentioned photosensitive composition and coloring photosensitive composition, one that emits light with a wavelength of 300 to 450 nm can be used. For example, ultra-high pressure mercury, mercury vapor arc, and carbon arc can be used. , Xenon arc, etc. Furthermore, the direct laser engraving method of forming a direct image based on digital information from a computer by using laser light instead of a photomask by the exposure light source not only improves productivity, but also improves resolution or position accuracy. It is useful. As the laser light, it is suitable to use light with a wavelength of 340-430 nm. Argon ion lasers, helium-neon lasers, YAG (Yttrium Aluminum Garnet, yttrium aluminum garnet) lasers, semiconductor lasers, etc. can also be used Those who emit light that can be seen in the infrared region. In the case of using these lasers, a sensitizing dye that absorbs the region visible to infrared is added to the above-mentioned photosensitive composition and coloring photosensitive composition. The photosensitive composition and colored photosensitive composition of the present invention can also be patterned through a double patterning process. The double patterning process uses two kinds of photosensitive compositions or colored photosensitive compositions to be divided into two patterns.化. The above-mentioned photosensitive composition and coloring photosensitive composition (or its cured product) can be used for various applications: photocurable paint or varnish, photocurable adhesive, printed circuit board, or color television, PC (Personal Computer, personal computer) Computer) monitors, portable information terminals, digital cameras and other color display liquid crystal display panels in the color filter, CCD (Charge Coupled Device, charge coupled device) image sensor color filter, photosensitive spacer, Black column spacers, electrode materials for plasma display panels, touch panels, touch sensors, powder coatings, printing inks, printing plates, adhesives, dental compositions, photo-forming resins, gels Coating, photoresist for electronic engineering, electroplating resist, etching resist, both liquid and dry film, solder resist ink, used to make color filters for various display purposes or used in Plasma display panels, electroluminescent display devices, and LCD (Liquid Crystal Display, liquid crystal display devices) in the manufacturing process of the structure forming photoresist, the composition used to encapsulate electrical and electronic parts, solder resist, magnetic recording Materials, micro mechanical parts, waveguides, optical switches, plating masks, etching masks, color test systems, glass fiber cable coatings, templates for screen printing, materials used to create three-dimensional objects using stereolithography , Holographic recording materials, image recording materials, micro electronic circuits, decolorizing materials, decolorizing materials for image recording materials, decolorizing materials for image recording materials using microcapsules, and photoresist materials for printed wiring boards , UV (Ultraviolet, ultraviolet light) and visible light laser direct imaging of photoresist materials, used for the formation of the dielectric layer in the successive build-up of printed circuit boards, photoresist materials or protective films for 3D mounting, etc. , Its use is not particularly limited. The photosensitive composition of the present invention can be used for transparent conductive films, reflective films, polarizing plates, protective films, etc. by curing, and can be used as a transparent laminate formed by laminating the above-mentioned layers in sequence It is laid on a transparent substrate, irradiates active light through a photomask with a specific pattern shape, develops the exposed film with a developer, and heats the developed film. As a transparent laminate, for example, a transparent thin film layer containing a composite oxide of indium oxide and cerium oxide and a metal thin film layer are alternately formed on a transparent substrate. A photosensitive composition containing the compound of the present invention as a latent additive may be used in each of the above-mentioned layers, or the photosensitive composition may be used in any or more layers. The transparent laminate of the present invention is suitably used for display devices. The photosensitive composition of the present invention can be used as a transparent structure by curing. Examples of the transparent structure include: cylindrical objects called photosensitive spacers (PS) and columnar spacers (CS); (nano) imprinted fine patterns; used in the manufacture of large billboards, etc. Or inkjet receiving layers made by electronic devices such as the printing of color filters or alignment films for liquid crystal displays. The transparent structure of the present invention is suitably used for display devices. The above-mentioned colored photosensitive composition is used for forming pixels of a color filter, and is particularly useful as a photosensitive composition for forming a color filter for a display device for use in image display devices such as liquid crystal display panels. The color filter for the display device is preferably formed by the following steps: (1) forming a coating film of the colored photosensitive composition on a substrate; (2) interposing light having a specific pattern shape on the coating film The cover is irradiated with active light; (3) the film after exposure is developed with a developing solution; (4) the film after development is heated. In addition, the colored photosensitive composition of the present invention is also useful as a colored photosensitive composition of an inkjet method without a development step. As the above-mentioned mask, a multi-level mask such as a halftone mask or a grayscale mask may also be used. [Examples] Hereinafter, the present invention will be explained in more detail with examples and the like, but the present invention is not limited to these examples and the like. [Examples 1-1 to 1-3] Synthesis of Compounds No. 1 to No. 3 To 1 equivalent of a phenol compound in ethyl acetate solution (3 times the theoretical yield) was added 4-dimethylamine at room temperature 0.2 equivalent of pyridine, 5 equivalents of di-tert-butyl dicarbonate was added dropwise below 10°C, and stirred at room temperature for 2 hours under a nitrogen atmosphere. After the oil and water are separated and the organic layer is dried with anhydrous sodium sulfate, the solvent is distilled off, the unnecessary components are removed with silica gel, and then crystallization is performed. The obtained solids were dried under reduced pressure at 60° C. for 3 hours to obtain target products, respectively. The obtained solid was confirmed by 1 H-NMR and IR as the target system. The results are shown in [Table 1] to [Table 2]. [化15] [Table 1] [Table 2] [Examples 2-1 to 2-3 and Comparative Examples 2-1 to 2-2] Preparation of photosensitive composition No. 1 to No. 3 and comparative photosensitive composition No. 1 to No. 2 50.9 g SPC-1000 (manufactured by Showa Denko Corporation, PGMEA solution with 29% solid content), 11.9 g of ARONIX M-450 (manufactured by Toagosei Co., Ltd.), 1.04 g of OXE-01 (manufactured by BASF), 34.0 g of PGMEA , 2.9 g of FZ2122 (manufactured by Toray Dow Corning, 1% solid content PGMEA solution) and 0.81 g of the compounds described in [Table 3] were mixed, and stirred until the insoluble matter disappeared to obtain photosensitive composition No. 1 to No. 3 and comparative photosensitive composition No. 1 to No. 2. Comparative compound No. 1 used in comparative photosensitive composition No. 1 represents the following comparative compound No. 1. [table 3] [化16] [Examples 3-1 to 3-3 and Comparative Examples 3-1 to 3-2] Preparation of colored photosensitive composition No. 1 to No. 3 and comparative colored photosensitive composition No. 1 to No. 3 1.26 g of SPC-1000 (manufactured by Showa Denko Corporation, PGMEA solution with 29% solid content), 0.30 g of ARONIX M-450 (manufactured by Toagosei Corporation), 0.03 g of OXE-01 (manufactured by BASF), 0.85 g PGMEA, 0.08 g of FZ2122 (made by Toray Dow Corning, 1% solid content PGMEA solution) and 0.02 g of the latent additives described in [Table 3A] were mixed, and stirred until the insoluble matter disappeared. Furthermore, 0.95 g of PGMEA was added to the 0.05 g of coloring agent described in [Table 3A] and stirred to dissolve the resulting coloring agent solution, and stirred until it became uniform, to obtain colored photosensitive composition No. 1 to No. .3 and comparative colored photosensitive composition No.1 to No.3. [Table 3A] Compounds A to C in [Table 3A] represent the following compounds A to C, respectively. [化17] [Evaluation Examples 1-1 to 1-3 and Comparative Evaluation Examples 1-1 to 1-2] Heat resistance evaluation by firing was prepared in Examples 2-1 to 2-3 under the condition of 410 rpm×7 sec The photosensitive composition No.1～No.3 and the comparative photosensitive composition No.1～No.2 prepared in Comparative Examples 2-1～2-2 were respectively coated on a glass substrate and dried on a hot plate (90°C, 90 sec). Expose the obtained coating film with an ultra-high pressure mercury lamp (150 mJ/cm 2 ). The coating film after exposure is baked at 230℃×30 min. Measure and evaluate the transmittance of the coating film at 400 nm after firing. The results are shown in [Table 4]. [Table 4] Based on the above results, it can be considered that the photosensitive composition containing the compound of the present invention as a latent additive has higher transparency after firing, and the heat resistance is lower than that of the comparative photosensitive composition containing the comparative compound as the latent additive. Comparative compound No. 1 is equivalent and superior to comparative compound No. 2. [Evaluation Examples 2-1 to 2-3 and Comparative Evaluation Example 2-1] The solubility measurement was performed on propylene glycol-1-monomethyl ether-2-ethyl for compound No.1 to No.3 and comparative compound No.1 Determination of solubility in acid esters (PGMEA). The results are shown in [Table 5]. [table 5] From the above results, it can be seen that the compound of the present invention has high solubility, and when used in a photosensitive composition, it has good handling properties. [Evaluation Examples 3-1 to 3-3 and Comparative Evaluation Examples 3-1 to 3-3] The heat resistance of the colored photosensitive composition based on firing was evaluated under the conditions of 410 rpm×7 sec. Examples 3-1 to 3 The colored photosensitive composition No.1 to No.3 prepared in -3 and the comparative colored photosensitive composition No.1 to No.3 prepared in Comparative Examples 3-1 to 3-3 were respectively applied to a glass substrate, Use a hot plate to dry it (90°C, 90 sec). Expose the obtained coating film with an ultra-high pressure mercury lamp (150 mJ/cm 2 ). Bake the exposed coating film at 230℃×30 min, and check the color difference (ΔE ab* ) before and after baking. The results are shown in [Table 6]. [Table 6] Based on the above results, it can be seen that the colored photosensitive composition containing the compound of the present invention as a latent additive has less chromaticity change after firing than a comparative photosensitive composition containing the same colorant, and the heat resistance of the colorant is maintained Higher. Based on the above results, it can be seen that the compound of the present invention has high solubility, and the photosensitive composition using the compound as a latent additive has excellent heat resistance and is more useful as a latent additive.
