JP7436176B2 - Composition, solder resist composition, cured product, and method for producing cured product - Google Patents

Description

The present disclosure relates to a composition that can form a cured product with excellent durability.

A printed wiring board is usually provided with a solder resist to prevent solder from adhering to unnecessary parts and to protect the printed wiring board from external environments such as high temperature and high humidity.
Solder resist compositions used to form such solder resists include photosensitive resin compositions that form an image by developing after irradiation with ultraviolet rays, and finish curing (main curing) with heat and/or light irradiation. Negative compositions are known (Patent Documents 1 to 3).
Furthermore, as a solder resist composition, a positive composition containing a resin that is decomposed by light etc. is known (Patent Document 3).

For example, Patent Documents 1 to 3 disclose compositions containing a photosensitive resin in which an acid anhydride is added to a reaction product of an epoxy compound and an unsaturated carboxylic acid, a photopolymerization initiator, a diluent, and an epoxy compound. There is.

JP 2018-53215 Publication JP 2017-111453 Publication Japanese Patent Application Publication No. 2016-139832

Solder resists may be exposed to high-temperature conditions during heat treatment during solder resist formation, heat treatment for forming members other than solder resist on printed wiring boards, and soldering during mounting.
In addition, solder resist may be exposed to light such as ultraviolet rays during light irradiation treatment during solder resist formation, light irradiation treatment for forming components other than solder resist on printed wiring boards, and when using printed wiring boards. be.
However, conventional solder resists have insufficient durability and, for example, cracks occur in the solder resists under high-temperature conditions such as those described above, resulting in insufficient protection of printed wiring boards.

The present disclosure has been made in view of the above problems, and its main purpose is to provide a composition that can form a cured product with excellent durability.

The present inventors conducted intensive studies to solve the above problems, and as a result, they considered adding an antioxidant to improve durability. However, even when an antioxidant was added, sufficient durability, especially heat resistance, could not be obtained.
On the other hand, the antioxidant ability is suppressed before heat treatment, and when a latent antioxidant that exhibits antioxidant ability is added after heat treatment, even when exposed to high temperature conditions, It has been found that the occurrence of cracks in the cured product is suppressed.
The present inventors have completed the present invention based on these findings.

That is, the present disclosure provides a composition characterized by containing a compound represented by the following general formula (A) (hereinafter sometimes referred to as compound A) and a curable component.

(In the formula, ring ^A1 represents a ring consisting of at least one of a five-membered or six-membered hydrocarbon ring and a five-membered or six-membered heterocycle,
R ¹⁰¹ each independently has a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an aliphatic group having 1 to 40 carbon atoms that may have a substituent, and a substituent. represents an aromatic hydrocarbon ring-containing group having from 6 to 35 carbon atoms or a heterocycle-containing group having from 2 to 35 carbon atoms, which may have a substituent;
R ¹⁰² is an aliphatic group having 1 to 40 carbon atoms which may have a substituent, an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent, Represents a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent or a silyl group having 0 to 40 carbon atoms which may have a substituent,
Aliphatic group having 1 to 40 carbon atoms which may have a substituent used in R ¹⁰¹ and R ¹⁰² , aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent Heterocycle-containing groups having 2 to 35 carbon atoms which may have ring-containing groups and substituents, and silyl groups having 0 to 40 carbon atoms which may have substituents used in R ¹⁰² One or more of the methylene groups in the carbon-carbon double bond, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O -, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, It may be replaced with a group selected from -NH-CO-O-, -NR'-, -SS-, or -SO ₂ -, or a group in which these groups are not adjacent to each other,
A plurality of R ^101s may be combined to form a benzene ring or a naphthalene ring,
The plurality of R ¹⁰¹ and R ¹⁰² may be the same or different,
n represents an integer from 1 to 10,
d represents an integer from 0 to 4,
k represents an integer of 1 or more, the sum of d and k is less than the number of substituents that ring A ¹ can have,
X represents an n-valent group. )

According to the present disclosure, since the compound A is included, a cured product with excellent durability can be formed.

In the present disclosure, R ¹⁰² is an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, in which the methylene group at the terminal on the oxygen atom side is substituted with -CO-O-. It is preferable. This is because when R ¹⁰² is the above-mentioned group, the composition can easily form a cured product with excellent durability.

In the present disclosure, it is preferable that the curable component includes at least one of a photocurable component and a thermosetting component. This is because, by containing each of the above components, the composition can easily form a cured product with excellent durability.

The present disclosure provides a solder resist composition comprising the above composition.

According to the present disclosure, a solder resist with excellent durability can be formed by using the above-described composition.

The present disclosure provides a cured product of the above composition.

According to the present disclosure, the cured product of the above composition has excellent durability.

The present disclosure provides a method for producing a cured product, which includes a step of polymerizing the curable components contained in the composition or the solder resist composition.

According to the present disclosure, since the compound A is included, the polymerization step can be easily carried out.

The present disclosure has the effect of providing a composition that can form a cured product with excellent durability.

The present disclosure relates to a composition, a solder resist composition comprising the same, a cured product, and a method for producing the cured product.
Hereinafter, the composition of the present disclosure, a solder resist composition comprising the same, a cured product, and a method for producing the cured product will be described in detail.

A. Composition First, the composition of the present disclosure will be described.
The composition of the present disclosure is characterized by containing a compound represented by the following general formula (A) and a curable component.

(In the formula, ring ^A1 represents a ring consisting of at least one of a five-membered or six-membered hydrocarbon ring and a five-membered or six-membered heterocycle,
R ¹⁰¹ each independently has a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an aliphatic group having 1 to 40 carbon atoms that may have a substituent, and a substituent. represents an aromatic hydrocarbon ring-containing group having from 6 to 35 carbon atoms or a heterocycle-containing group having from 2 to 35 carbon atoms, which may have a substituent;
R ¹⁰² is an aliphatic group having 1 to 40 carbon atoms which may have a substituent, an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent, Represents a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent or a silyl group having 0 to 40 carbon atoms which may have a substituent,
Aliphatic group having 1 to 40 carbon atoms which may have a substituent used in R ¹⁰¹ and R ¹⁰² , aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent Heterocycle-containing groups having 2 to 35 carbon atoms which may have ring-containing groups and substituents, and silyl groups having 0 to 40 carbon atoms which may have substituents used in R ¹⁰² One or more of the methylene groups in the carbon-carbon double bond, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O -, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, It may be replaced with a group selected from -NH-CO-O-, -NR'-, -SS-, or -SO ₂ -, or a group in which these groups are not adjacent to each other,
A plurality of R ^101s may be combined to form a benzene ring or a naphthalene ring,
The plurality of R ¹⁰¹ and R ¹⁰² may be the same or different,
n represents an integer from 1 to 10,
d represents an integer from 0 to 4,
k represents an integer of 1 or more, the sum of d and k is less than the number of substituents that ring A ¹ can have,
X represents an n-valent group. )

According to the present disclosure, by including the compound A, it is possible to form a cured product with excellent durability.
Here, the reason why a cured product with excellent durability can be obtained by including the above-mentioned compound A is surmised as follows.
That is, the above compound A functions as, for example, an ultraviolet absorber and an antioxidant by eliminating the protective group R ¹⁰² and producing a phenolic hydroxyl group.
Therefore, the cured product can easily have ultraviolet absorbing ability and antioxidant ability. As a result, the cured product has excellent durability.
Further, in the above compound A, since the phenolic hydroxyl group is protected with the protective group ^R102 , inhibition of curing of a curable component such as a photocurable component can be suppressed.
Therefore, with the above composition, a cured product in which the curable components are sufficiently cured can be obtained. As a result, the cured product has excellent durability.
Moreover, as mentioned above, since the curing inhibition of the compound A is suppressed, it becomes easy to increase the amount added without inhibiting the curing of the curable components. Also from this point of view, it becomes easy to improve the durability of the cured product.
From the above, a cured product with excellent durability can be easily obtained from a composition containing the above-mentioned components.
In addition, when a cured product with such excellent durability is used, for example, as a solder resist to protect wiring on a printed wiring board, it can stably protect the printed wiring board and improve reliability. can.

The composition of the present disclosure contains the above-mentioned compound A and a curable component.
Each component of the composition of the present disclosure will be described in detail below.

1. Compound A
The above compound A is represented by the following general formula (A).

(In the formula, ring ^A1 represents a ring consisting of at least one of a five-membered or six-membered hydrocarbon ring and a five-membered or six-membered heterocycle,
R ¹⁰¹ each independently has a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an aliphatic group having 1 to 40 carbon atoms that may have a substituent, and a substituent. represents an aromatic hydrocarbon ring-containing group having from 6 to 35 carbon atoms or a heterocycle-containing group having from 2 to 35 carbon atoms, which may have a substituent;
R ¹⁰² is an aliphatic group having 1 to 40 carbon atoms which may have a substituent, an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent, Represents a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent or a silyl group having 0 to 40 carbon atoms which may have a substituent,
Aliphatic group having 1 to 40 carbon atoms which may have a substituent used in R ¹⁰¹ and R ¹⁰² , aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent Heterocycle-containing groups having 2 to 35 carbon atoms which may have ring-containing groups and substituents, and silyl groups having 0 to 40 carbon atoms which may have substituents used in R ¹⁰² One or more of the methylene groups in the carbon-carbon double bond, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O -, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, It may be replaced with a group selected from -NH-CO-O-, -NR'-, -SS-, or -SO ₂ -, or a group in which these groups are not adjacent to each other,
A plurality of R ^101s may be combined to form a benzene ring or a naphthalene ring,
The plurality of R ¹⁰¹ and R ¹⁰² may be the same or different,
n represents an integer from 1 to 10,
d represents an integer from 0 to 4,
k represents an integer of 1 or more, the sum of d and k is less than the number of substituents that ring A ¹ can have,
X represents an n-valent group. )

The compound represented by the above general formula (A) has a structure in which n specific groups are bonded to an n-valent specific atom or group represented by X. These n groups are the same or different from each other. The value of n is 1 to 10, preferably 1 to 6, more preferably 1 to 4, from the viewpoint of ease of synthesis.

The ring represented by A ¹ in the above general formula (A) represents a ring consisting of at least one of a five- or six-membered hydrocarbon ring and a five- or six-membered heterocycle.
Therefore, the ring ^A1 may be composed of only one six-membered hydrocarbon ring such as a benzene ring, or may be composed of two or more six-membered hydrocarbon rings such as a naphthalene ring. It may be a condensed ring, or a condensed ring consisting of one six-membered hydrocarbon ring and one five-membered heterocycle, such as an indole ring.
Examples of the five-membered hydrocarbon ring include five-membered aromatic hydrocarbon rings such as cyclopentadiene and ferrocene.
Examples of the five-membered heterocycle include furan, thiophene, pyrrole, pyrrolidine, pyrazolidine, pyrazole, imidazole, imidazolidine, oxazole, isoxazole, isoxazolidine, thiazole, isothiazole, and isothiazolidine.
Examples of the six-membered hydrocarbon ring include six-membered aromatic hydrocarbon rings such as benzene, naphthalene, anthracene, perylene, and pyrene.
Examples of the six-membered heterocycle include piperidine, piperazine, morpholine, thiomorpholine, pyridine, pyrazine, pyrimidine, pyridazine, and triazine.
Among the above rings ^A1 , examples of fused rings of five-membered rings and six-membered rings, fused rings of hydrocarbon rings, and heterocyclic rings include fluorene, quinoline, isoquinoline, indole, eurolidine, benzoxazole, benzotriazole, and azulene. , carbazole and the like.

Examples of the halogen atom represented by R ¹⁰¹ above include fluorine, chlorine, bromine, and iodine.

The aliphatic group having 1 to 40 carbon atoms, which may have a substituent, used in R ¹⁰¹ and R ¹⁰² above may be one that does not contain an aromatic hydrocarbon ring or a heterocycle, such as , an alkyl group having 1 to 40 carbon atoms, an alkenyl group having 2 to 40 carbon atoms, a cycloalkyl group having 3 to 40 carbon atoms, a cycloalkylalkyl group having 4 to 40 carbon atoms, and hydrogen atoms of these groups. Examples include groups in which one or more of the following are substituted with substituents described below.

The alkyl group having 1 to 40 carbon atoms used for R ¹⁰¹ and R ¹⁰² above includes methyl, ethyl, propyl, iso-propyl, butyl, sec-butyl, tert-butyl, iso-butyl, amyl, iso-pentyl. , tert-pentyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, iso-heptyl, tert-heptyl, 1-octyl, iso-octyl, Examples include tert-octyl and adamantyl.

Examples of the alkenyl group having 2 to 40 carbon atoms used for R ¹⁰¹ and R ¹⁰² above include vinyl, ethylene, 2-propenyl, 3-butenyl, 2-butenyl, 4-pentenyl, 3-pentenyl, 2-hexenyl. , 3-hexenyl, 5-hexenyl, 2-heptenyl, 3-heptenyl, 4-heptenyl, 3-octenyl, 3-nonenyl, 4-decenyl, 3-undecenyl, 4-dodecenyl and 4,8,12-tetradecatri Examples include enylallyl.
The cycloalkyl group having 3 to 40 carbon atoms used for R ¹⁰¹ and R ¹⁰² means a saturated monocyclic or saturated polycyclic alkyl group having 3 to 40 carbon atoms. Examples of the above-mentioned cycloalkyl group having 3 to 40 carbon atoms include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl, adamantyl, decahydronaphthyl, octahydropentalene, and bicyclo[1. 1.1] pentanyl and the like.

The cycloalkylalkyl group having 4 to 40 carbon atoms used for R ¹⁰¹ and R ¹⁰² above means a group having 4 to 40 carbon atoms in which the hydrogen atom of the alkyl group is substituted with a cycloalkyl group. Examples of the cycloalkylalkyl group having 4 to 40 carbon atoms include cyclopropylmethyl, 2-cyclobutylethyl, 3-cyclopentylpropyl, 4-cyclohexylbutyl, cycloheptylmethyl, cyclooctylmethyl, and 2-cyclononylethyl. , 2-cyclodecylethyl, 3-3-adamantylpropyl and decahydronaphthylpropyl.

As the aliphatic group used for R ¹⁰¹ and the like above, an alkoxy group in which the terminal methylene group of an alkyl group is replaced with -O- can also be used.
Examples of the alkoxy groups include methyloxy, ethyloxy, iso-propyloxy, butyloxy, sec-butyloxy, tert-butyloxy, iso-butyloxy, amyloxy, iso-amyloxy, tert-amyloxy, hexyloxy, 2-hexyloxy, 3-hexyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, heptyloxy, 2-heptyloxy, 3-heptyloxy, iso-heptyloxy, tert-heptyloxy, 1-octyloxy, iso-octyloxy, tert-octyl Examples include oxy.

The aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms and which may have a substituent used in R ¹⁰¹ and R ¹⁰² above may be any group containing an aromatic hydrocarbon ring, such as , an aryl group having 6 to 35 carbon atoms, an arylalkyl group having 7 to 35 carbon atoms, and a group in which one or more of the hydrogen atoms of these groups is substituted with a substituent described below.

Examples of the aryl group having 6 to 35 carbon atoms used for R ¹⁰¹ and R ¹⁰² include phenyl, naphthyl, anthracenyl, and the like.

Examples of the arylalkyl group having 7 to 35 carbon atoms used for R ¹⁰¹ and R ¹⁰² include benzyl, fluorenyl, indenyl, 9-fluorenylmethyl groups, and the like.

The heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent, used for R ¹⁰¹ and R ¹⁰² above may be any group containing a heterocycle, such as pyridyl, pyrimidyl, pyridazyl. , piperidyl, pyranyl, pyrazolyl, triazyl, pyrrolyl, quinolyl, isoquinolyl, imidazolyl, benzimidazolyl, triazolyl, furyl, furanyl, benzofuranyl, thienyl, thiophenyl, benzothiophenyl, thiadiazolyl, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, isoxazolyl, indolyl, 2-pyrrolidinon-1-yl, 2-piperidon-1-yl, 2,4-dioxyimidazolidin-3-yl, 2,4-dioxyoxazolidin-3-yl and hydrogen of these groups Examples include groups in which one or more of the atoms are substituted with substituents described below.

Examples of the silyl group having 0 to 40 carbon atoms that may have a substituent used for R ¹⁰² above include a silyl group in which the hydrogen atom is unsubstituted, and a substituted silyl group in which the hydrogen atom is substituted with another substituent. Examples include groups and groups in which one or more of the hydrogen atoms of these groups are substituted with substituents described below.
Examples of the substituted silyl groups include silyl groups such as a monoalkylsilyl group, a monoarylsilyl group, a dialkylsilyl group, a diarylsilyl group, a trialkylsilyl group, a triarylsilyl group, a monoalkyldiarylsilyl group, and a dialkylmonoarylsilyl group. Can be mentioned.
Examples of the monoalkylsilyl group include a monomethylsilyl group, a monoethylsilyl group, a monobutylsilyl group, a monoisopropylsilyl group, a monodecanesilyl group, a monoicosanesilyl group, a monotriacontanesilyl group, and the like.
Examples of the monoarylsilyl group include a monophenylsilyl group, a monotolylsilyl group, a mononaphthylsilyl group, and a monoanthrylsilyl group.
Examples of the dialkylsilyl group include dimethylsilyl group, diethylsilyl group, dimethylethylsilyl group, diisopropylsilyl group, dibutylsilyl group, dioctylsilyl group, didecanesilyl group, and the like.
Examples of the diarylsilyl group include diphenylsilyl group and ditolylsilyl group.
Examples of the trialkylsilyl group include trimethylsilyl group, triethylsilyl group, dimethylethylsilyl group, triisopropylsilyl group, tributylsilyl group, trioctylsilyl group, and the like.
Examples of the triarylsilyl group include a triphenylsilyl group and a tritolylsilyl group.
Examples of the monoalkyldiarylsilyl group include a methyldiphenylsilyl group and an ethyldiphenylsilyl group.
Examples of the dialkylmonoarylsilyl group include a dimethylphenylsilyl group and a methylethylphenyl group.

One or more methylene groups in the aliphatic group, aromatic hydrocarbon ring-containing group, heterocycle-containing group, and silyl group used in R ¹⁰¹ and R ¹⁰² above are carbon-carbon double bonds, -O -, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -S-S- or -SO ₂ - may be substituted with a group in which groups selected from - are not adjacent to each other, or may not be substituted. Further, R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
Note that the combination under the condition that they are not adjacent to each other is not limited to the case where adjacent methylene groups are replaced with the above groups, and two non-adjacent methylene groups are replaced by -O-CO- and -CO, respectively. This also includes cases where it is replaced with a different group such as -O-.
As the alkyl group having 1 to 8 carbon atoms used for R', those having a predetermined number of carbon atoms among the alkyl groups used for R ¹ above can be used.
In addition, the number of carbon atoms when the methylene group in the aliphatic group having 1 to 40 carbon atoms is substituted refers to the number of carbon atoms after the methylene group is substituted, and the methylene group is substituted. It does not refer to the previous number of carbon atoms. The same applies to cases where methylene groups in other groups are substituted.
In addition, the number of carbon atoms when the hydrogen atoms of the aliphatic group having 1 to 40 carbon atoms are substituted refers to the number of carbon atoms after the hydrogen atoms are substituted, and before the hydrogen atoms are substituted. It does not refer to the number of carbon atoms in The same applies to cases where hydrogen atoms in other groups are substituted.

Unless otherwise specified, each functional group used in R ¹⁰¹ and R ¹⁰² , such as an aliphatic group, an aromatic hydrocarbon ring-containing group, a heterocycle-containing group, and a silyl group, is an unsubstituted group that does not have a substituent. It is a group having a group or a substituent.
A substituent that substitutes one or more hydrogen atoms in the aliphatic group, aromatic hydrocarbon ring-containing group, heterocycle-containing group, and silyl group, more specifically, the alkyl group and alkenyl group described above. , a cycloalkyl group, a cycloalkylalkyl group, an aryl group, an arylalkyl group, a heterocycle-containing group, and a silyl group. Examples of substituents that replace one or more hydrogen atoms include fluorine, chlorine, bromine, and iodine. Halogen atoms such as acetyl, 2-chloroacetyl, propionyl, octanoyl, phenylcarbonyl (benzoyl), phthaloyl, 4-trifluoromethylbenzoyl, pivaloyl, salicyloyl, oxaloyl, stearoyl, methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, Acyl groups such as n-octadecyloxycarbonyl and carbamoyl; Acyloxy groups such as acetyloxy and benzoyloxy; amino, ethylamino, dimethylamino, diethylamino, butylamino, cyclopentylamino, 2-ethylhexylamino, dodecylamino, anilino, chlorophenylamino , toluidino, anisidino, N-methyl-anilino, diphenylamino, naphthylamino, 2-pyridylamino, methoxycarbonylamino, phenoxycarbonylamino, acetylamino, benzoylamino, formylamino, pivaloylamino, lauroylamino, carbamoylamino, N,N- Dimethylaminocarbonylamino, N,N-diethylaminocarbonylamino, morpholinocarbonylamino, methoxycarbonylamino, ethoxycarbonylamino, t-butoxycarbonylamino, n-octadecyloxycarbonylamino, N-methyl-methoxycarbonylamino, phenoxycarbonylamino, Substituted amino groups such as sulfamoylamino, N,N-dimethylaminosulfonylamino, methylsulfonylamino, butylsulfonylamino, phenylsulfonylamino; sulfonamido group, sulfonyl group, carboxyl group, cyano group, sulfo group, hydroxyl group, nitro group Examples include salts of groups, imido groups, carbamoyl groups, sulfonamide groups, phosphonic acid groups, phosphoric acid groups, carboxyl groups, sulfo groups, phosphonic acid groups, and phosphoric acid groups.

From the viewpoint of making the above compound A into a compound in which R ¹⁰² is easily eliminated by heat treatment, the above R ¹⁰² is an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, or a substituent. Aromatic hydrocarbon ring-containing groups having 6 to 35 carbon atoms, which may have 6 to 35 carbon atoms, heterocyclic ring-containing groups having 2 to 35 carbon atoms, which may have substituents, and substituents. In some cases, the methylene group on the oxygen atom side of a silyl group having 0 to 40 carbon atoms is replaced with -CO-O-, that is, the oxygen atom side terminal is substituted with -CO-O-. , an aliphatic group having 1 to 40 carbon atoms which may have a substituent, an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent, and a substituent. Preferably, it is a heterocycle-containing group having 2 to 35 carbon atoms, which may have 2 to 35 carbon atoms, and a silyl group having 0 to 40 carbon atoms, which may have substituents.
More specifically, the above R ¹⁰² is an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, and whose terminal end on the oxygen atom side is substituted with -CO-O-. Preferably, in particular, an alkyl group having 1 to 40 carbon atoms, which may have a substituent, whose terminal end on the oxygen atom side is substituted with -CO-O-, that is, -CO-O-R''( R'' is preferably a group represented by an alkyl group having 1 to 39 carbon atoms, which may have a substituent.
In the present disclosure, the above R'' is preferably an alkyl group having 1 to 20 carbon atoms that may have a substituent, particularly a carbon atom that may have a substituent. It is preferably an alkyl group having 1 to 8 carbon atoms, particularly preferably an unsubstituted alkyl group having 1 to 8 carbon atoms, and especially an unsubstituted alkyl group having 3 to 6 carbon atoms. Among them, iso-propyl, n-butyl, sec-butyl, tert-butyl, iso-butyl, n-pentyl, iso-pentyl, and tert-pentyl are particularly preferable. n-butyl, sec-butyl, tert-butyl, iso-butyl, tert-butyl, that is, R ¹⁰² is preferably a group represented by -CO-O-C ₄ H ₉ , especially R It is preferred that '' is tert-butyl, that is, R ¹⁰² is a -CO-O-tert-butyl group.
This is because when R ¹⁰² is the group described above, compound A can easily control the elimination of R ¹⁰² by heat treatment.

The temperature at which the protecting group R ¹⁰² contained in the compound A is eliminated by heat treatment is appropriately set depending on the use of the composition, and is, for example, 80°C or more and 300°C or less. The temperature is preferably 100°C or more and 290°C or less, particularly preferably 120°C or more and 280°C or less, particularly preferably 150°C or more and 250°C or less, and 180°C It is preferable that the temperature is above 240°C or below.
The desorption temperature can be a temperature at which a thermal loss of 5% by mass is shown by differential thermal analysis.
The measurement method is, for example, using STA (differential thermogravimetry simultaneous measurement apparatus), using approximately 5 mg of sample, under a nitrogen atmosphere of 200 mL/min, heating start temperature 30°C, heating end temperature 500°C, heating rate 10°C. The desorption temperature can be determined by measuring the thermal loss of the sample when the temperature is raised at a rate of /min, and the temperature at which the sample weight is reduced by 5% by mass with respect to the weight of the sample at 30°C.
As the simultaneous differential thermogravimetric measurement device, STA7000 (manufactured by Hitachi High-Tech Science Co., Ltd.) can be used.

From the viewpoint of making the above compound A a compound in which R ¹⁰² is easily eliminated by light irradiation, the above R ¹⁰² has the following general formulas (C-1), (C-2), (C-3), (C- 4), (C-5), (C-6) (C-7), (C-8), (C-9) and (C-10) are preferable, and among them , the following general formulas (C-1-a), (C-2-a), (C-3-a), (C-4), (C-5), (C-6), (C-7 -a), (C-7-b), (C-8-a), (C-9) and (C-10-a) are preferable, and in particular, groups represented by the following general formula ( A group represented by C-1-a) is preferred.
This is because when R ¹⁰² is the group described above, compound A can easily control the elimination of R ¹⁰² by light irradiation treatment.

(In the formula, R ¹¹¹ , R ¹¹³ , R ¹¹⁶ , R ¹¹⁸ , R ¹¹⁹ , R ¹²⁰ , R ¹²³ , R ¹²⁶ , R ¹²⁸ , R ¹³¹ and R ¹³³ are each independently a halogen atom, a cyano group, a hydroxyl group, Nitro group, carboxyl group, aliphatic group having 1 to 40 carbon atoms which may have a substituent, aromatic hydrocarbon ring having 6 to 35 carbon atoms which may have a substituent Represents a heterocycle-containing group having 2 to 35 carbon atoms, which may have a group or a substituent,
R ¹¹² , R ¹¹⁴ , R ¹¹⁷ , R ¹²¹ , R ¹²² , R ¹²⁴ , R ¹²⁵ , R ¹²⁷ , R ¹²⁹ , R ¹³⁰ , R ¹³² , R ¹³⁴ and R ¹³⁵ each independently represent a hydrogen atom, a halogen atom, Cyano group, hydroxyl group, nitro group, carboxyl group, aliphatic group having 1 to 40 carbon atoms which may have a substituent, aromatic group having 6 to 35 carbon atoms which may have a substituent Represents a group hydrocarbon ring-containing group or a heterocycle-containing group having 2 to 35 carbon atoms that may have a substituent,
R ¹¹⁵ is an aliphatic group having 1 to 40 carbon atoms which may have a substituent, an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent, or Represents a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
R ¹¹¹ , R ¹¹² , R ¹¹³ , R ¹¹⁴ , R 115 , R ¹¹⁶ , R ^{117 , R 118 ,} R ¹¹⁹ , R ¹²⁰ , R ¹²¹ , R ¹²² , R ¹²³ , R ¹²⁴ , R ¹²⁵ , ^{R 126 ,} R ¹²⁷ , R ¹²⁸ , R ¹²⁹ , R ¹³⁰ , R ¹³¹ , R ¹³² , R ¹³³ , R ¹³⁴ and R ¹³⁵ which may have substituents, aliphatic groups having 1 to 40 carbon atoms, substituents One of the methylene groups in the aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent, and the heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a substituent. one or more of -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S- CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, It may be replaced with a group selected from -S-S- or -SO ₂ - or a group in which these groups are not adjacent to each other,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
A plurality of R ^111s , a plurality of R ^113s , a plurality of R ^116s , a plurality of R 118s, a plurality of R ^119s , a plurality of R ^120s , a plurality of R ^123s , a plurality of R ^126s , a plurality of R ^126s , R ^128s , multiple R ^131s , and multiple R ^133s may be bonded to each other to form a benzene ring or a naphthalene ring,
A plurality of R ¹¹¹ , R ¹¹² , R ¹¹³ , R ¹¹⁴ , R 116 , R ¹¹⁷ , R ¹¹⁸ , R ¹¹⁹ , R ¹²⁰ , R ¹²³ , R ¹²⁵ , R ¹²⁶ , R ¹²⁷ , R ¹²⁸ , ^{R 129 ,} R ¹³⁰ , R ¹³¹ , R ¹³² , R ¹³³ , R ¹³⁴ and R ¹³⁵ may each be the same or different;
b11, b12, b13, b16, b17, b18, b19 and b21 each independently represent an integer from 0 to 4,
b14, b15 and b20 each independently represent an integer from 0 to 5,
* represents a joint location. )

The wavelength of the light from which R ¹⁰² desorbs from compound A can include, for example, a wavelength of 365 nm, and more specifically, can include light with a wavelength of 250 nm or more and 450 nm or less, preferably It can include light with a wavelength of 280 nm or more and 380 nm or less.
The cumulative amount of light irradiated to desorb R ¹⁰² from the compound A can be, for example, 1000 mJ/cm ² or more and 10000 mJ/cm ^{2 or less, and 1000 mJ/cm 2 or} more and 5000 mJ/cm ² or less. It is preferably 2000 mJ/cm ² or more and 4000 mJ/cm ² or less.
The cumulative amount of light irradiated for curing a composition containing a photocurable component made of a radically polymerizable compound can generally be less than 1000 mJ/cm ² . Therefore, when the cumulative light amount is within the above range, it becomes easy to apply the composition to, for example, a photocurable composition.
On the other hand, in the above-mentioned compound A, the cumulative amount of light that suppresses the desorption of R ¹⁰² due to the light irradiation treatment may be any amount that can provide the desired curing inhibition suppressing effect, and can be less than 1000 mJ/cm ² .

Note that R ¹⁰² is desorbed as long as it can impart desired durability to the cured product, and for example, it may mean that the desorption rate of R ¹⁰² is 50% or more. , preferably 80% or more.
The following method can be used to measure the above-mentioned desorption rate.
(1) Prepare a 0.01% by mass acetonitrile solution of Compound A.
(2) Fill a 1 cm square quartz cell with the above solution.
(3) A high-pressure mercury lamp UL750 (manufactured by HOYA) was adjusted to 20 mW/ ^cm2 , and the quartz cell filled with the solution was subjected to desorption treatment (heat treatment of heating the solution to a predetermined temperature or predetermined integration). (light irradiation process) to determine the amount of light.
(4) The solution after the desorption treatment is subjected to high performance liquid chromatography (HPLC), and the calculation is performed assuming that 100% desorption has occurred when all the 230 nm peaks derived from Compound A have disappeared.

The above R ¹¹¹ , R ¹¹² , R ¹¹³ , R ¹¹⁴ , R 116 , R ¹¹⁷ , R ¹¹⁸ , R ¹¹⁹ , R ¹²⁰ , R ¹²³ , R ¹²⁵ , R ¹²⁶ , R ¹²⁷ , R ¹²⁸ , ^{R 129 ,} R ¹³⁰ , R ¹³¹ , R ¹³² , R ¹³³ , R ¹³⁴ and R ¹³⁵ (hereinafter, these functional groups may be collectively referred to as R ¹¹¹ etc.) having a carbon atom number of 1 ~40 aliphatic groups, aromatic hydrocarbon ring-containing groups of 6 to 35 carbon atoms that may have substituents, or heterocyclic groups of 2 to 35 carbon atoms that may have substituents As the ring-containing group, an aliphatic group having 1 to 40 carbon atoms which may have a substituent such as those used in R ¹⁰¹ above, and an aliphatic group having 6 to 35 carbon atoms which may have a substituent Examples include aromatic hydrocarbon ring-containing groups and groups similar to heterocycle-containing groups having 2 to 35 carbon atoms which may have substituents.

The above R ¹¹¹ , R ¹¹³ , R ¹¹⁶ , R ¹¹⁸ , R ¹¹⁹ , R ¹²⁰ , R ¹²³ , R ¹²⁶ , R ¹²⁸ , R ¹³¹ and R ¹³³ are preferably groups other than a hydroxyl group, such as a halogen atom or a cyano group. , nitro group, carboxyl group, aliphatic group having 1 to 40 carbon atoms which may have a substituent, aromatic hydrocarbon ring having 6 to 35 carbon atoms which may have a substituent A heterocyclic ring-containing group having 2 to 35 carbon atoms, which may have a containing group and a substituent, is preferable. This is because by using a group other than a hydroxyl group, R ¹⁰² can be easily eliminated from the compound A, and the synthesis of the compound A can be facilitated.
The above R ¹¹¹ and R ¹²³ are particularly preferably an alkoxy group such as a nitro group or a methoxy group, or an alkyl group having 1 to 40 carbon atoms such as a methyl group. This is because the above R ¹⁰² is easily eliminated from Compound A, and the synthesis of Compound A is facilitated.
The above R ¹¹³ , R ¹¹⁶ , R ¹¹⁸ , R ¹¹⁹ , R ¹²⁰ , R ¹²⁶ , R ¹²⁸ , R ¹³¹ and R ¹³³ are aliphatic groups having 1 to 40 carbon atoms that may have a substituent. It is preferable that there be. This is because the above R ¹⁰² is easily eliminated from Compound A, and the synthesis of Compound A is facilitated.
It is preferable that two adjacent R ^116s bond to each other to form ^a benzene ring. This is because the above R ¹⁰² is easily eliminated from Compound A, and the synthesis of Compound A is facilitated.

An aliphatic group having 1 to 40 carbon atoms which may have a substituent represented by R ¹¹⁸ and R ¹¹⁹ above or an aromatic group having 6 to 35 carbon atoms which may have a substituent When the methylene group in the hydrocarbon ring-containing group is replaced with -O-, the -O- replacing the methylene group is included to interrupt an alkyl group and an arylalkyl group, respectively, that is, an aliphatic group and an aliphatic group. Methylene groups other than the ends of the aromatic hydrocarbon ring-containing group may be substituted.

The above R ¹¹² is preferably a hydrogen atom, a carboxyl group, or an alkyl group having 1 to 5 carbon atoms, and particularly preferably a hydrogen atom or a methyl group. This is because the protecting group R ¹⁰² is easily removed from the compound A, and the synthesis of the compound A is facilitated.
Above all, R ¹¹⁴ , R ¹¹⁷ , R ¹²¹ , R ¹²⁴ , R ¹²⁵ , R ¹²⁷ , R ¹²⁹ and R ¹³⁰ are preferably a hydrogen atom or an alkyl group having 1 to 40 carbon atoms; It is particularly preferable that there be. This is because the above R ¹⁰² is easily eliminated from Compound A, and the synthesis of Compound A is facilitated.
The above R ¹¹⁵ and R ¹²² are preferably an alkyl group having 1 to 5 carbon atoms, and particularly preferably a methyl group.

The above b11, b12, b13, b16, b17, b18, b19, b20 and b21 can each independently be an integer of 0 to 4, but from the viewpoint of ease of synthesis, they are integers of 0 to 3. It is preferably an integer of 0 to 2, more preferably 0 to 1, and particularly preferably 0.
The above b4 and b5 can each independently be an integer of 0 to 5, but from the viewpoint of ease of synthesis, they are preferably integers of 0 to 3, more preferably integers of 0 to 2. It is preferably 0 to 1, more preferably 0, and particularly preferably 0.

When k is 2 or more, the type of R ¹⁰² contained in the compound A of the present disclosure may be one type per compound A, or may be two or more types, but From the viewpoint of

The above d is an integer from 0 to 4.
The above d indicates the number of bonds of R ¹⁰¹ bonded to ring A ¹ and can be set as appropriate depending on ring A ¹ . For example, if ring A ¹ is a ring consisting of only one five-membered ring, it can be an integer from 0 to 3, and if ring A ¹ is a ring consisting only of one six-membered ring, , can be an integer from 0 to 4.
From the viewpoint of ease of synthesis, d can be an integer of 0 to 3, preferably 0 to 2.
The sum of d and k is less than the number of substituents that ring ^A1 can have. Here, "less than the number of substituents that ring A ¹ can have" means that it is an integer less than or equal to the number of substituents that ring A ¹ can have minus 1, taking into account that X is bonded. For example, when A ¹ is a ring consisting of one five-membered ring, it can be an integer from 1 to 4, and when ring A ¹ is a ring consisting of one six-membered ring, , can be an integer from 1 to 5.
The above k represents an integer of 1 or more, and the total of d and k is less than the number of substituents that ring ^A1 can have. For example, when ring A ¹ is a ring consisting of one five-membered ring, k can be an integer from 1 to 4, and when ring A ¹ is a ring consisting of one six-membered ring, k can be an integer of 1 to 4. can be an integer from 1 to 5.
The above k can be an integer of 1 to 3, and is preferably 1 to 2 from the viewpoint of ease of synthesis.

The above X is n groups, and when n is an integer of 2 or more, it is used as a linking group that connects n specific groups whose phenolic hydroxyl groups are protected by ^R102 .
The above X group specifically includes a direct bond, a hydrogen atom, a nitrogen atom, an oxygen atom, a sulfur atom, a phosphorus atom, a group represented by (II-a) or (II-b) below, >C= O, >NR ⁵³ , -OR ⁵³ , -SR ⁵³ , -NR ⁵³ R ⁵⁴ or an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, and having the same number of valences as n; Represents an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent, or a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
R ⁵³ and R ⁵⁴ are a hydrogen atom, an aliphatic group having 1 to 40 carbon atoms which may have a substituent, and an aromatic group having 6 to 35 carbon atoms which may have a substituent. Represents a hydrocarbon ring-containing group or a heterocycle containing 2 to 35 carbon atoms, which may have a substituent,
One or more of the methylene groups of the aliphatic group, aromatic hydrocarbon ring-containing group, and heterocycle-containing group used for X, R ⁵³ and R ⁵⁴ are -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O -CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NH-CO-O-, -NR ^' -, -S-S-, -SO ₂ - or In some cases, the nitrogen atom or these groups are replaced by a group in which they are not adjacent to each other, and in some cases, the aromatic hydrocarbon ring and the heterocycle are each fused with another ring.
However, when the X group is a nitrogen atom, a phosphorus atom, or a bonding group represented by (II-a) or (II-b) below, n is 3, and the X group is an oxygen atom or a sulfur atom, >C= In the case of a bonding group represented by O, -NH-CO-, -CO-NH- or >NR ⁵³ , n is 2 and the X group is a hydrogen atom, -OR ⁵³ , -SR ⁵³ or -NR ⁵³ R In the case of ⁵⁴ , n is 1 and the X group may form a ring together with the benzene ring.

(* indicates the joint location.)

The structure of the aliphatic group having 1 to 40 carbon atoms and having the same number of valences as n used in the above X and which may have a substituent is appropriately set according to the use of the above compound A, etc. be able to.
The above aliphatic group may be linear, branched, cyclic (alicyclic hydrocarbon), or a combination thereof.
Furthermore, one or more methylene groups in the aliphatic group are -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O- , -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, - Replaced with NH-CO-O-, -NH-CO-O-, ^-NR'- , -S-S-, -SO ₂ -, or a nitrogen atom, or a group in which these groups are combined under the condition that they are not adjacent to each other. In some cases.
When the above n is 1, the aliphatic group having 1 to 40 carbon atoms which may have the above substituent is a carbon atom which may have a substituent used in R ¹⁰¹ etc. above. Groups similar to the number 1 to 40 aliphatic groups can be used.
When n is 2 or more, the above aliphatic group is a group in which some of the hydrogen atoms are removed from the aliphatic group having 1 to 40 carbon atoms, which may have a substituent as used in R ¹⁰¹ , etc. It can be a structure.
Examples of the aliphatic group having 1 to 40 carbon atoms, in which n may have 2 substituents, used for X above include alkylene such as methylene, ethylene, propylene, butylene, and butyldiyl; Those in which the methylene chain of the above alkylene is replaced with -O-, -S-, -CO-O-, -O-CO-; residues of diols such as ethanediol, propanediol, butanediol, pentanediol, hexanediol, etc. Groups include residues of dithiols such as ethanedithiol, propanedithiol, butanedithiol, pentanedithiol, and hexanedithiol, and groups in which these groups are substituted with substituents described below.
Examples of the aliphatic group having 1 to 40 carbon atoms, in which n may have a substituent of 3, used in the above X include alkylidine such as propyridine and 1,1,3-butyridine. and groups in which these groups are substituted with substituents described below.

The structure of the aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms and having the same valence as n used for X above, and which may have a substituent, will depend on the use of the compound A above. It can be set as appropriate.
Furthermore, one or more methylene groups in the aromatic hydrocarbon ring-containing group are -O-, -S-, -CO-, -O-CO-, -CO-O-, -O- CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH- CO-, -NH-CO-O-, -NH-CO-O-, ^-NR'- , -S-S-, -SO ₂ -, or a nitrogen atom, or a group in which these groups are combined under the condition that they are not adjacent to each other. Sometimes it is replaced by .
The aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent and having the same number of valences as n used in the above X, when n is 1, the above R A group similar to the aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent as used in ¹⁰¹ and the like can be used.
When n is 2 or more, the aromatic hydrocarbon ring-containing group is selected from an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent as used in R ¹⁰¹ , etc. It can have a structure in which some of the hydrogen atoms are removed.
Examples of aromatic hydrocarbon ring-containing groups having 6 to 35 carbon atoms, in which n may have 2 substituents, used for X above include arylene groups such as phenylene and naphthylene; catechol , residues of bifunctional phenols such as bisphenol; 2,4,8,10-tetraoxaspiro[5,5]undecane, etc., and groups in which these groups are substituted with substituents described below.
Specifically, the aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, in which n may have a substituent of 3, is phenyl-1,3,5-trimethylene. and groups in which these groups are substituted with substituents described below.

The structure of the heterocycle-containing group having the same number of valences as n used for the above X and having 2 to 35 carbon atoms, which may have a substituent, is appropriately set according to the use of the above compound A, etc. can do.
Furthermore, one or more of the methylene groups in the above heterocycle-containing group is -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O -, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NH-CO-O-, ^-NR'- , -S-S-, -SO ₂ - or nitrogen atoms, or a group in which these groups are combined under the condition that they are not adjacent to each other. Sometimes there are.
As for the heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent and having the same number of valences as n used in the above X, when n is 1, the above R ¹⁰¹ , etc. Groups similar to the C2-35 heterocycle-containing groups optionally having substituents can be used.
As for the heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent and having the same number of valences as n used in the above X, when n is 1, the above R ¹⁰¹ , etc. Groups similar to the C2-35 heterocycle-containing groups optionally having substituents can be used.
When n is 2 or more, the above heterocycle-containing group includes a portion of hydrogen atoms from a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent as used in R ¹⁰¹ , etc. It is possible to have a structure in which the
Examples of the heterocyclic ring-containing group having 2 to 35 carbon atoms, in which n may have 2 substituents, used for X above include a pyridine ring, a pyrimidine ring, a piperidine ring, a piperazine ring, Examples thereof include groups having a triazine ring, a furan ring, a thiophene ring, an indole ring, etc., and groups in which these groups are substituted with substituents described below.
Specifically, the heterocycle-containing group having 2 to 35 carbon atoms, in which n may have 3 substituents, used for X above, includes a group having an isocyanuric ring, a group having a triazine ring, and a group having a triazine ring. Examples include groups in which one or more of the hydrogen atoms of these groups are substituted with substituents described below.

Aliphatic group having 1 to 40 carbon atoms which may have a substituent used in R ⁵³ and R ⁵⁴ , aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent The heterocycle containing a ring-containing group and a carbon atom number of 2 to 35 which may have a substituent includes a carbon atom number of 1 to 40 which may have a substituent as used in R ¹⁰¹ etc. above. aliphatic groups, aromatic hydrocarbon ring-containing groups having 6 to 35 carbon atoms which may have substituents, and heterocyclic groups having 2 to 35 carbon atoms which may have substituents; Examples include groups similar to .

As the X group, when n is 2, a group represented by the following general formula (1) can be used.
When n is 3, a group represented by the following general formula (2) can be used as the X group.
As the X group, when n is 4, a group represented by the following general formula (3) can be used.
As the X group, when n is 5, a group represented by the following general formula (4) can be used.
As the X group, when n is 6, a group represented by the following general formula (5) can be used.

(Chem.7)
*-Z ¹ -Y ¹ -Z ² -* (1)

(In the above general formula (1), Y ¹ is a single bond, -NR ⁵⁷ -, an aliphatic group having 1 to 40 carbon atoms which may have a divalent substituent, or a substituent) an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent; Represents any substituent represented by ~(1-3),
Contains an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, and an aromatic hydrocarbon ring having 6 to 35 carbon atoms, which may have a substituent, as used in Y ¹ above. One or more of the methylene groups in the heterocycle-containing group having 2 to 35 carbon atoms, which may have a group and a substituent, is -O-, -S-, -CO-, -COO -, -OCO-, -NH-, or a group in which these groups are not adjacent to each other may be substituted,
Z ¹ and Z ² each independently represent a direct bond, -O-, -S-, >CO, -CO-O-, -O-CO-, -SO ₂ -, -SS-, -SO-, >NR ⁵⁸ or >PR ⁵⁸ ,
R ⁵⁷ and R ⁵⁸ are a hydrogen atom, an aliphatic group having 1 to 40 carbon atoms which may have a substituent, and an aromatic group having 6 to 35 carbon atoms which may have a substituent. Represents a hydrocarbon ring-containing group or a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
* represents a joint location. )

(In the above formula, R ⁵⁹ represents a hydrogen atom, a phenyl group that may have a substituent, or a cycloalkyl group having 3 to 10 carbon atoms,
R ⁶⁰ represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a halogen atom;
c1 is an integer from 0 to 5,
* represents a joint location. )

(In the above formula, * represents the bonding point.)

(In the above formula, R ⁶¹ and R ⁶² each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, or an aryloxy group having 6 to 20 carbon atoms. represents an arylthio group having 6 to 20 carbon atoms, an arylalkenyl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocycle-containing group having 2 to 20 carbon atoms, or a halogen atom,
The methylene group in the alkyl group and arylalkyl group used for R ⁶¹ and R ⁶² above may be replaced with a carbon-carbon double bond, -O- or -S-,
R ⁶¹ may form a ring with adjacent R ^61s ,
c2 represents a number from 0 to 4,
c3 represents a number from 0 to 8,
c4 represents a number from 0 to 4,
c5 represents a number from 0 to 4,
The total number of c4 and c5 is 2 to 4,
* represents a joint location. )

(In the above general formula (2), Y ¹¹ is an aliphatic group having 1 to 40 carbon atoms that may have a trivalent substituent, or an aliphatic group having a carbon number of 1 to 40 that may have a substituent) Represents a heterocycle-containing group having 2 to 35 carbon atoms, which may have a 6 to 35 aromatic hydrocarbon ring-containing group or a substituent,
Z ¹ , Z ² and Z ³ each independently represent a direct bond, -O-, -S-, >CO, -CO-O-, -O-CO-, -SO ₂ -, -SS-, - SO-, >NR ⁶² , PR ⁶² , aliphatic group having 1 to 40 carbon atoms which may have a substituent, aromatic group having 6 to 35 carbon atoms which may have a substituent Represents a hydrocarbon ring-containing group or a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
R ⁶² is a hydrogen atom, an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or an aromatic hydrocarbon ring having 6 to 35 carbon atoms which may have a substituent. Represents a heterocycle-containing group having 2 to 35 carbon atoms, which may have a containing group or a substituent,
An aliphatic group having 1 to 40 carbon atoms which may have a substituent used in Y ¹¹ , Z ¹ , Z ² , Z ³ and R ⁶² , a carbon atom which may have a substituent The methylene group in the heterocyclic ring-containing group having 6 to 35 aromatic hydrocarbon rings and the heterocyclic group having 2 to 35 carbon atoms, which may have a substituent, is a carbon-carbon double bond, -O- , -CO-, -O-CO-, -CO-O- or -SO ₂ -,
* represents a joint location. )

(In the above general formula (3), Y ¹² may have a carbon atom or a tetravalent substituent, or an aliphatic group having 1 to 40 carbon atoms, or a substituent. Represents an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms or a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
Aliphatic group having 1 to 40 carbon atoms which may have a substituent used for Y ¹² , aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent and a methylene group in a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent, -COO-, -O-, -OCO-, -NHCO-, -NH- or -CONH - may be replaced with
Z ¹ to Z ⁴ are each independently a group within the same range as the group represented by Z ¹ to Z ³ in the above general formula (2),
* represents a joint location. )

(In the above general formula (4), Y ¹³ is an aliphatic group having 1 to 40 carbon atoms that may have a pentavalent substituent, or a carbon atom number that may have a substituent. Represents a heterocycle-containing group having 2 to 35 carbon atoms, which may have a 6 to 35 aromatic hydrocarbon ring-containing group or a substituent,
Aliphatic group having 1 to 40 carbon atoms which may have a substituent used for Y ¹³ , aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent and a methylene group in a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent, -COO-, -O-, -OCO-, -NHCO-, -NH- or -CONH - may be replaced with
Z ¹ to Z ⁵ are each independently a group within the same range as the group represented by Z ¹ to Z ³ in the above general formula (2),
* represents a joint location. )

(In the above general formula (5), Y ¹⁴ may have a single bond or a hexavalent substituent, or an aliphatic group having 1 to 40 carbon atoms, or a substituent. Represents an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms or a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
Aliphatic group having 1 to 40 carbon atoms which may have a substituent used for Y ¹⁴ , aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent and a methylene group in a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent, -COO-, -O-, -OCO-, -NHCO-, -NH- or -CONH - may be replaced with
Z ¹ to Z ⁶ are each independently a group within the same range as the group represented by Z ¹ to Z ³ in the above general formula (2),
* represents a joint location. )

In the above general formula (1), the aliphatic group having 1 to 40 carbon atoms which may have a divalent substituent is used for Y ¹ when n is 1 and used for X above. It can have a structure in which one hydrogen atom is removed from an aliphatic group having 1 to 40 carbon atoms which may have a substituent.
More specifically, the aliphatic groups having 1 to 40 carbon atoms which may have a divalent substituent include methane, ethane, propane, iso-propane, butane, sec-butane, tert -butane, iso-butane, hexane, 2-methylhexane, 3-methylhexane, heptane, 2-methylheptane, 3-methylheptane, iso-heptane, tert-heptane, 1-methyloctane, iso-octane, tert- Two hydrogen atoms of aliphatic compounds such as octane, cyclopropane, ^cyclobutane , cyclopentane, cyclohexane, cycloheptane, 2,4-dimethylcyclobutane, 4-methylcyclohexane, cyclooctane, cyclodecane, adamantane, norbornene, etc. Divalent groups substituted with Z ² are mentioned.
One or more of the methylene groups in these groups are -O-, -S-, -CO-, -COO-, -OCO-, -NH-, or a combination under the condition that these groups are not adjacent to each other. may be replaced with a group.

In the above general formula (1), the aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms that may have a divalent substituent used in Y ¹ is It can have a structure in which one hydrogen atom is removed from an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent when the number is 1.
More specifically, the aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a divalent substituent, includes aromatic hydrocarbon ring-containing groups such as benzene, naphthalene, and biphenyl. Examples include divalent groups in which the compound is substituted with Z ¹ and Z ² .

In the above general formula (1), the heterocycle-containing group having 2 to 35 carbon atoms, which may have a divalent substituent, is used for Y ¹ , and n used for the above X is 1. It can have a structure in which one hydrogen atom is removed from a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent.
More specifically, the heterocycle-containing group having 2 to 35 carbon atoms, which may have a divalent substituent, includes pyridine, pyrazine, piperidine, piperazine, pyrimidine, pyridazine, triazine, hexahydro Examples include divalent groups in which a heterocycle-containing compound such as triazine, furan, tetrahydrofuran, chroman, xanthene, thiophene, and thiolane is substituted with Z ¹ and Z ² .

In the above general formula (1), an aliphatic group having 1 to 40 carbon atoms which may have a substituent used in Y ¹ , and an aliphatic group having 6 to 35 carbon atoms which may have a substituent The hydrogen atom of the heterocycle-containing group having 2 to 35 carbon atoms, which may have an aromatic hydrocarbon ring-containing group and a substituent, is a halogen atom, a cyano group, a nitro group, or a group having 1 to 8 carbon atoms. may be substituted with an alkoxy group.

In the above general formula (1), an aliphatic group having 1 to 40 carbon atoms that may have a substituent and a carbon atom number that may have a substituent is used for R ⁵⁷ and R ⁵⁸ The aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms and the heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent are the same as those exemplified as R ⁵³ and R ⁵⁴ above. be able to.

In the above general formula (1), Z ¹ and Z ² may be the same or different.

In the above general formula (1-1), the cycloalkyl group having 3 to 10 carbon atoms used for R ⁵⁹ includes cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohebutyl group, cyclooctyl group, etc. Examples include groups in which the group is substituted with an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms.

In the above general formula (1-1), the alkyl group having 1 to 10 carbon atoms and the alkoxy group having 1 to 10 carbon atoms used for R ⁶⁰ may be selected from among the contents exemplified as R ¹⁰¹ , etc. Examples include those satisfying the number of carbon atoms.
In the group represented by the above general formula (1-1), the alkenyl group having 2 to 10 carbon atoms used for R ⁶⁰ is one satisfying the specified number of carbon atoms among those exemplified as R ¹⁰¹ etc. above. can be mentioned.
The alkyl group, alkoxy group and alkenyl group in R ⁶⁰ above may be substituted with a halogen atom, and the substitution position is not limited.
In addition, each functional group such as the phenyl group, cycloalkyl group, alkyl group, alkoxy group, and alkenyl group may have a substituent, and unless otherwise specified, the functional groups such as the phenyl group, cycloalkyl group, alkyl group, alkoxy group, and alkenyl group may have a substituent. It is unsubstituted or has a substituent.
Substituents for hydrogen atoms such as phenyl groups, cycloalkyl groups, alkyl groups, alkoxy groups, and alkenyl groups include the same substituents for hydrogen atoms such as aliphatic groups used in R ¹⁰¹ , etc. The content can be

In the above general formula (1-3), as an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an arylalkyl group having 7 to 20 carbon atoms used in R ⁶¹ and R ⁶² Among the contents exemplified as R ¹⁰¹ and the like above, examples thereof include those satisfying a predetermined number of carbon atoms.
In the above general formula (1-3), the aryloxy group having 6 to 20 carbon atoms used for R ⁶¹ and R ⁶² includes phenyloxy, naphthyloxy, 2-methylphenyloxy, 3-methylphenyloxy, 4 -Methylphenyloxy, 4-vinylphenyldioxy, 3-iso-propylphenyloxy, 4-iso-propylphenyloxy, 4-butylphenyloxy, 4-tert-butylphenyloxy, 4-hexylphenyloxy, 4 -Cyclohexylphenyloxy, 4-octylphenyloxy, 4-(2-ethylhexyl)phenyloxy, 2,3-dimethylphenyloxy, 2,4-dimethylphenyloxy, 2,5-dimethylphenyloxy, 2,6-dimethyl Phenyloxy, 3.4-dimethylphenyloxy, 3.5-dimethylphenyloxy, 2,4-di-tert-butylphenyloxy, 2,5-di-tert-butylphenyloxy, 2,6-di-tert-butylphenyl groups such as oxy, 2,4-di-tert-pentylphenyloxy, 2,5-tert-amylphenyloxy, 4-cyclohexylphenyloxy, 2,4,5-trimethylphenyloxy, ferrocenyloxy; Examples include groups in which the group is substituted with a halogen atom.

In the above general formula (1-3), the arylthio group having 6 to 20 carbon atoms used for R ⁶¹ and R ⁶² is an aryloxy group having 6 to 20 carbon atoms which may be substituted with the above halogen atom. Examples include groups in which the oxygen atom of the group is replaced with a sulfur atom.

In the above general formula (1-3), the arylalkenyl group having 8 to 20 carbon atoms used for R ⁶¹ and R ⁶² is the aryl alkenyl group having 6 to 20 carbon atoms, which may be substituted with the above halogen atom. Examples include groups in which the oxygen atom of an oxy group is substituted with an alkenyl group such as vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2-pentenyl, and 2-octenyl.

In the above general formula (1-3), the heterocycle-containing group having 2 to 20 carbon atoms used for R ⁶¹ and R ⁶² includes pyridine, pyrazine, piperidine, piperazine, pyrimidine, pyridazine, triazine, hexahydrotriazine, Examples include groups such as furan, tetrahydrofuran, chroman, xanthene, thiophene, and thiofuran, and groups in which these groups are substituted with halogen atoms.
In addition, each functional group such as the above-mentioned alkyl group, arylalkyl group, aryloxy group, arylthio group, arylalkenyl group, heterocycle-containing group, etc. may have a substituent, and unless otherwise specified. As long as it has no substituent, it is unsubstituted or has a substituent.
Examples of substituents for hydrogen atoms in such alkyl groups, arylalkyl groups, aryloxy groups, arylthio groups, arylalkenyl groups, and heterocycle-containing groups include hydrogen atoms in aliphatic groups used in R ¹⁰¹ , etc. The content can be the same as that of the substituent for substituting .

In the above general formula (2), trivalent aliphatic hydrocarbon groups having 3 to 35 carbon atoms, aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms, and 2 to 35 carbon atoms are used for Y ^11. The heterocycle-containing group may have a substituent when n used for the above X is 1. It may also have an aliphatic group having 1 to 40 carbon atoms or a substituent. It can have a structure in which two hydrogen atoms are removed from an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms and a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent. .
More specifically, the aliphatic group, aromatic hydrocarbon ring-containing group, and heterocycle-containing group used for Y ¹¹ above each independently include the aliphatic groups exemplified in the explanation of Y ¹ in general formula (1) above. Examples include trivalent groups in which a group compound, an aromatic hydrocarbon ring-containing compound, and a heterocycle-containing compound are substituted with Z ¹ , Z ² , and Z ³ , respectively.
One or more of the methylene groups in these groups are -O-, -S-, -CO-, -COO-, -OCO-, -NH-, or a combination under the condition that these groups are not adjacent to each other. may be replaced with a group.

In the above general formula (2), Z ¹ , Z ² and Z ³ may have a substituent or an aliphatic group having 1 to 40 carbon atoms or a substituent. The aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms and the heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent may be divalent, for example, When n is 2, an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, or an aliphatic group having 6 to 35 carbon atoms, which may have a substituent, is used for X. It can be the same as those listed as the aromatic hydrocarbon ring-containing group and the heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent.
In the above general formula (2), Z ¹ , Z ² and Z ³ may be the same or different.

In the above general formula (3), an aliphatic group having 1 to 40 carbon atoms which may have a tetravalent substituent used for Y ¹² , and a carbon atom number which may have a substituent As the heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a 6 to 35 aromatic hydrocarbon ring-containing group and a substituent, the substituent when n used for X above is 1; an aliphatic group having 1 to 40 carbon atoms, which may have a substituent; an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent; It can have a structure in which three hydrogen atoms are removed from a heterocycle-containing group having 2 to 35 carbon atoms, which may be present.
More specifically, as the aliphatic group, aromatic hydrocarbon ring-containing group, and heterocycle-containing group used for Y ¹² above, each independently includes the aliphatic group exemplified in the explanation of Y ¹ in the above general formula (1). Examples include tetravalent groups in which a group compound, an aromatic hydrocarbon ring-containing compound, and a heterocycle-containing compound are substituted with Z ¹ , Z ² , Z ³ , and Z ⁴ , respectively.
One or more methylene groups in these groups are -O-, -S-, -CO-, -COO-, -OCO-, -NH-, or combined under the condition that these groups are not adjacent to each other. may be replaced with a group.

In the above general formula (3), Z ¹ , Z ² , Z ³ and Z ⁴ may be the same or different.

In the above general formula (4), an aliphatic group having 1 to 40 carbon atoms which may have a pentavalent substituent used for Y ¹³ , or an aliphatic group having a carbon number of 1 to 40 which may have a substituent As the heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a 6 to 35 aromatic hydrocarbon ring-containing group and a substituent, the substituent when n used for the above X is 1; an aliphatic group having 1 to 40 carbon atoms, which may have a substituent; an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent; It can have a structure in which four hydrogen atoms are removed from a heterocycle-containing group having 2 to 35 carbon atoms, which may be present.
More specifically, as the aliphatic group, aromatic hydrocarbon ring-containing group, and heterocycle-containing group used for Y ¹³ above, each independently includes the aliphatic group exemplified in the explanation of Y ¹ in the above general formula (1). Examples include pentavalent groups in which group compounds, aromatic hydrocarbon ring-containing compounds, and heterocycle-containing compounds are substituted with Z ¹ , Z ² , Z ³ , Z ⁴ and Z ⁵ .
One or more of the methylene groups in these groups are -O-, -S-, -CO-, -COO-, -OCO-, -NH-, or a combination under the condition that these groups are not adjacent to each other. may be replaced with a group.

In the above general formula (4), Z ¹ , Z ² , Z ³ , Z ⁴ and Z ⁵ may be the same or different.

In the above general formula (5), an aliphatic group having 1 to 40 carbon atoms which may have a hexavalent substituent used for Y ¹⁴ , and a carbon atom number which may have a substituent As the heterocycle-containing group having 6 to 35 aromatic hydrocarbon rings and the heterocycle having 2 to 35 carbon atoms which may have a substituent, n used for the above X is 1. aliphatic groups having 1 to 40 carbon atoms, which may have substituents, aromatic hydrocarbon ring-containing groups having 6 to 35 carbon atoms, which may have substituents, and substituents; It can have a structure in which five hydrogen atoms are removed from a heterocycle-containing group having 2 to 35 carbon atoms, which may have .
More specifically, the aliphatic group, aromatic hydrocarbon ring-containing group, and heterocycle-containing group used for Y ¹⁴ above each independently include the aliphatic groups exemplified in the explanation of Y ¹ in general formula (1) above. Examples include hexavalent groups in which a group compound, an aromatic hydrocarbon ring-containing compound, and a heterocycle-containing compound are substituted with Z ¹ , Z ² , Z ³ , Z ⁴ , Z ⁵ and Z ⁶ .
One or more of the methylene groups in these groups are -O-, -S-, -CO-, -COO-, -OCO-, -NH-, or a combination under the condition that these groups are not adjacent to each other. may be replaced with a group.

In the above general formula (5), Z ¹ , Z ² , Z ³ , Z ⁴ , Z ⁵ and Z ⁶ may be the same or different.

In the present disclosure, the above X is (1) when n is 2, a substituent represented by the following general formula (101) or (102) or a group selected from the following group 1, (2) when n is 3 , a group selected from the following group 2, (3) when n is 4, a group selected from the following group 3, (4) when n is 5, a group selected from the following group 4, (5) when n is 6, In this case, a group selected from Group 5 below is preferred because it is easy to obtain raw materials and manufacture.

(In the formula, Y ¹¹¹ and Y ¹¹⁵ each independently represent an aliphatic group having 1 to 8 carbon atoms, which may have a substituent,
Y ¹¹² and Y ¹¹⁴ are each independently -O-, -CO-, -CO-O-, -O-CO-, -NR ²¹³ -, -CO-NR ²¹³ - or -NR ²¹³ -CO- represents the group represented,
R ²¹³ represents a hydrogen atom or an aliphatic group having 1 to 40 carbon atoms that may have a substituent,
Y ¹¹³ is -CR ²¹⁴ R ²¹⁵ -, -NR ²¹⁶ -, an aliphatic group having 1 to 40 carbon atoms, which may have a divalent substituent, or a substituent. Represents an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms or a substituent represented by the following general formula (103),
R ²¹⁴ and R ²¹⁵ each independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an arylalkyl group having 7 to 20 carbon atoms,
R ²¹⁶ is a hydrogen atom, an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or an aromatic hydrocarbon ring having 6 to 35 carbon atoms which may have a substituent. Represents a heterocycle-containing group having 2 to 35 carbon atoms, which may have a containing group or a substituent,
One or more methylene groups in the aliphatic group, aromatic hydrocarbon ring-containing group, and heterocycle-containing group used for Y ¹¹¹ , Y ¹¹⁵ , R ¹³ , Y ¹¹³ and R ²¹⁶ are -COO-, -O-, -OCO-, -NHCO-, -NH- or -CONH- may be substituted,
* represents a joint location. )

(In the formula, Y ¹¹⁶ and Y ¹¹⁸ each independently represent -NR ²¹⁷ - or an aliphatic group having 1 to 8 carbon atoms in which the methylene group may be replaced with an oxygen atom,
Y ¹¹⁷ is a direct bond, -O-, -S-, -SO ₂ -, -CR ²¹⁸ R ²¹⁹ -, or represented by the above (1-1), (1-2) or (1-3) represents any substituent,
R ²¹⁷ represents a hydrogen atom or an aliphatic group having 1 to 40 carbon atoms that may have a substituent,
R ²¹⁸ and R ²¹⁹ each independently represent an alkyl group having 1 to 8 carbon atoms, which may be substituted with a hydrogen atom or a halogen atom,
* represents a joint location. )

<Group 1>

(In the formula, R ³¹ is a hydrogen atom, an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or an aromatic group having 6 to 35 carbon atoms which may have a substituent) Represents a group hydrocarbon ring-containing group or a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
* represents a joint location. )

（式中、Ｙ^１１９及びＹ^１２０は、それぞれ独立に、置換基を有している場合もある炭素原子数１～８の脂肪族基を表し、
＊は、結合箇所を表す。）

(In the formula, Y ¹¹⁹ and Y ¹²⁰ each independently represent an aliphatic group having 1 to 8 carbon atoms, which may have a substituent,
* represents a joint location. )

<Group 2>

(In the formula, R ³² is the same group as R ⁵⁷ in the above general formula (1), and when there are two or more in the group, they may be the same or different, and Z ¹¹ is the same group as R 57 in the above general formula (2). ) represents a group in the same range as the group represented by Z ¹ to Z ³ in
* represents a joint location. )

<Group 3>

(In the formula, R ³² is the same group as R ⁵⁷ in the above general formula (1), and when there are two or more in the group, they may be the same or different, and Z ¹¹ is the same group as R 57 in the above general formula (1). ) represents a group in the same range as the group represented by Z ¹ to Z ³ in
* represents a joint location. )

<Group 4>

(In the formula, Z ¹⁰ , Z ¹¹ , Z ¹² , Z ¹³ and Z ¹⁴ represent groups within the same range as the groups represented by Z ¹ to Z ³ in the above general formula (2),
* represents a joint location. )

<Group 5>

(In the above formula, Z ¹⁰ , Z ¹¹ , Z ¹² , Z ¹³ , Z ¹⁴ and Z ¹⁵ represent groups in the same range as the groups represented by Z ¹ to Z ³ in the above general formula (2),
* represents a joint location. )

In addition, the aliphatic group having 1 to 8 carbon atoms which may have a substituent and used in Y ¹¹¹ , Y ¹¹⁵ , Y ¹¹⁶ , Y ¹¹⁸ , Y ¹¹⁹ and Y ¹²⁰ is used in Y ¹ etc. Of the aliphatic groups having 1 to 40 carbon atoms which may have a divalent substituent, those satisfying a predetermined number of carbon atoms can be mentioned.
In the above formula (101), Y ¹¹¹ and Y ¹¹⁵ may be the same or different.
Similarly, Y ¹¹⁶ and Y ¹¹⁸ in the above formula (102) and Y ¹¹⁹ and Y ¹²⁰ in the above formula (103) may be the same or different.
Aliphatic group having 1 to 40 carbon atoms that may have a divalent substituent, carbonized aromatic group having 6 to 35 carbon atoms that may have a substituent, used in Y ¹¹³ Examples of hydrogen ring-containing groups include aliphatic groups with 1 to 40 carbon atoms that may have divalent substituents, such as those used in Y ¹ , and carbon atoms that may have substituents. It can have the same content as the aromatic hydrocarbon ring-containing group of 6 to 35.
R ²¹³ , R ²¹⁶ , R ²¹⁷ and R ³¹ are aliphatic groups having 1 to 40 carbon atoms which may have substituents, and aliphatic groups having 6 to 40 carbon atoms which may have substituents. Examples of heterocyclic ring-containing groups having 2 to 35 carbon atoms, which may have 35 aromatic hydrocarbon ring-containing groups and substituents, include substituents used in R ⁵³ and R ⁵⁴ , etc. aliphatic groups having 1 to 40 carbon atoms, aromatic hydrocarbon ring-containing groups having 6 to 35 carbon atoms, which may have substituents, and carbon, which may have substituents; It can have the same content as the heterocycle-containing group having 2 to 35 atoms.
Examples of the alkyl group having 1 to 8 carbon atoms, aryl group having 6 to 20 carbon atoms, and arylalkyl group having 7 to 20 carbon atoms used for R ²¹⁴ , R ²¹⁵ , R ²¹⁸ and R ²¹⁹ include R ¹⁰¹ , etc. The content shall be the same as that of an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 35 carbon atoms, and an arylalkyl group having 7 to 35 carbon atoms that satisfy the specified number of carbon atoms used in Can be done.
A plurality of Z ^11s included in each formula of Group 2 and Group 3 above, Z ¹⁰ to ¹⁴ included in each formula of Group 4 above, and Z ¹⁰ to Z ¹⁵ included in each formula of Group 5 above are , may be the same or different.

Among the above compounds A, from the viewpoint that it can be easily used as a latent antioxidant that exhibits antioxidant ability by removing the protecting group R ¹⁰² , the following general formula (A1) is preferred. A compound (hereinafter sometimes referred to as compound A1) can be preferably used.
By including the compound A1, the composition has, for example, better heat resistance.

(In the formula, R ¹⁰² is an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or an aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent) Represents a ring-containing group, a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent, or a silyl group having 0 to 40 carbon atoms which may have a substituent,
R ¹² and R ¹³ represent a hydrogen atom or an aliphatic group having 1 to 40 carbon atoms that may have a substituent,
R ¹⁴ each independently has a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an aliphatic group having 1 to 40 carbon atoms that may have a substituent, or a substituent. represents an aromatic hydrocarbon ring-containing group having from 6 to 35 carbon atoms or a heterocycle-containing group having from 2 to 35 carbon atoms, which may have a substituent;
R ¹⁰² , R ¹² , R ¹³ and R ¹⁴ are aliphatic groups having 1 to 40 carbon atoms which may have substituents, and aliphatic groups having 6 to 40 carbon atoms which may have substituents. 35 aromatic hydrocarbon ring-containing groups and heterocycle-containing groups of 2 to 35 carbon atoms optionally bearing substituents and carbon atoms optionally bearing substituents used in R ¹⁰² One or more methylene groups in the 0 to 40 silyl groups are carbon-carbon double bonds, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, Replaced with a group selected from -NH-CO-, -NH-CO-O-, -NR'-, -S-S- or -SO ₂ -, or a group in which these groups are combined under the condition that they are not adjacent to each other. There may be cases where
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
A plurality of R ^14s may be bonded to each other to form a benzene ring or a naphthalene ring,
The plurality of R ^14s may be the same or different,
n1 represents an integer from 1 to 10,
a1 represents an integer from 0 to 2,
X ^a represents an n1-valent group. )

An aliphatic group having from 1 to 40 carbon atoms which may have a substituent as used for R ¹⁰² , R ¹² , R ¹³ and R ¹⁴ above, and an aliphatic group having 6 carbon atoms which may have a substituent ~35 aromatic hydrocarbon ring-containing groups and heterocycle-containing groups having from 2 to 35 carbon atoms optionally bearing substituents, carbon atoms optionally bearing substituents used in R ¹⁰² Examples of the silyl group of 0 to 40 and the alkyl group used for R' include those exemplified as ^R101 and R' used in the above general formula (A) that satisfy the specified number of carbon atoms. be able to.

The above R ¹⁰² protects the phenolic hydroxyl group.
R ¹⁰² in such general formula (A1) can be the same as R ¹⁰² in the above general formula (A).

The above R ¹² and R ¹³ are preferably a hydrogen atom or an aliphatic group having 1 to 10 carbon atoms which may have a substituent, and especially an unsubstituted aliphatic group having no substituent. It is preferably an alkyl group having 1 to 10 carbon atoms, particularly preferably an alkyl group having 4 carbon atoms represented by -C ₄ H ₉ , and especially preferably a tert-butyl group. preferable.
At least one of the above R ¹² and R ¹³ is preferably an alkyl group having 1 to 40 carbon atoms, and in particular, both R ¹² and R ¹³ are an alkyl group having 1 to 40 carbon atoms. It is preferable.
Both R ¹² and R ¹³ are preferably unsubstituted alkyl groups having 1 to 10 carbon atoms and having no substituent such as a tert-butyl group.
This is because the above-mentioned R ¹² and R ¹³ are the above-mentioned groups, and the above-mentioned compound A1 has a large change in antioxidant ability before and after the removal of the protecting group R ¹⁰² . Further, the above compound A1 can suppress the occurrence of curing inhibition. Furthermore, this is because synthesis becomes easier.

The above R ¹⁴ is preferably an aliphatic group having 1 to 40 carbon atoms, which may have a substituent.
This is because the above R ¹⁴ is the above-mentioned group, so that the antioxidant ability of the compound A1 changes greatly before and after the removal of the protecting group R ¹⁰² . Further, the above compound A1 can suppress the occurrence of curing inhibition. Furthermore, this is because synthesis becomes easier.

The above n1 is an integer from 1 to 10, but such n1 can be the same as the above n. This is because it becomes easy to obtain a cured product with excellent heat resistance.

The above a1 is an integer of 0 to 2, but from the viewpoint of ease of synthesis, it is preferably 0 to 1, and preferably 0.

The above X ^a group represents an n1-valent group.
Such X ^a group can have the same content as the above-mentioned X group.
In the present disclosure, when n1 is 2, the X ^a group is preferably a group represented by the above general formula (101).
In the above general formula (101), Y ¹¹¹ is preferably an aliphatic group having 1 to 3 carbon atoms that may have a substituent, and especially an unsubstituted aliphatic group having 1 to 3 carbon atoms. is preferably an alkylene group.
In the above general formula (101), Y ¹¹² and Y ¹¹⁴ are preferably -O-.
In the above general formula (101), Y ¹¹³ is preferably a group represented by general formula (103).
In the above general formula (103), Y ¹¹⁹ and Y ¹²⁰ are preferably aliphatic groups having 1 to 5 carbon atoms, which may have a substituent, and particularly, 2 to 5 carbon atoms. is preferably a straight-chain or branched alkyl group.

In the present disclosure, when n1 is 2, a group represented by the above general formula (102) can also be preferably used as the X ^a group.
In the above general formula (102), Y ¹¹⁷ is preferably -CR ¹⁸ R ¹⁹ -, and especially R ¹⁸ and R ¹⁹ are a hydrogen atom or an aliphatic group having 1 to 4 carbon atoms. Preferably, R ¹⁸ is a hydrogen atom and R ¹⁹ is an aliphatic group having 1 to 4 carbon atoms.
In the present disclosure, when n1 is 3, the X ^a group is preferably a group represented by (II-2), (II-3), or (II-6) in Group 2.
In general formulas (II-2), (II-3) and (II-6), Z ¹¹ is an aliphatic group having 1 to 40 carbon atoms, which may have a direct bond or a substituent. A direct bond or an unsubstituted alkylene group having 1 to 5 carbon atoms is preferred.
In general formulas (II-2), (II-3) and (II-6), a plurality of Z ^11s included in each formula may be the same or different.
In particular, in the present disclosure, at least one of the three Z ^11s in general formula (II-2) is a direct bond, and at least one is an unsubstituted alkylene group having 1 to 5 carbon atoms. preferable. Further, in the general formulas (II-3) and (II-6), all Z ¹¹ are preferably unsubstituted alkyl groups having 1 to 5 carbon atoms.
In general formula (II-2), R ³² is preferably a hydrogen atom or an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, and especially a hydrogen atom or a substituent. An aliphatic group having 1 to 5 carbon atoms is preferred, and a hydrogen atom is particularly preferred.
In the present disclosure, when n is 4, the X ^a group is preferably a group represented by (III-1) in Group 3. In general formula (III-1), Z ¹¹ may have a substituent, and the methylene group is a carbon-carbon double bond, -O-, -CO-, -O-CO-, -CO Preferably, it is an aliphatic group having 1 to 40 carbon atoms, which may be substituted with -O- or -SO ₂ -, and the methylene group is replaced with -O-CO- or -CO-O-. Preferably, it is an alkylene group having 1 to 5 carbon atoms.
In the present disclosure, when n is 1, the X ^a group is preferably a hydrogen atom or a group similar to R ¹⁴ .
This is because when the X ^a group is the above-mentioned group, the compound A1 can stably exhibit antioxidant ability after the protective group R ¹⁰² is removed.

The bonding position of the X ^a group to the benzene ring may be any bondable position within the benzene ring, but for example, it should be at the para position with respect to the bonding position of R ¹⁰² -O-. is preferred.
This is because the above-mentioned bonding position is the above-mentioned position, and the above-mentioned compound A1 has a large change in antioxidant ability before and after the removal of the protecting group R ¹⁰² .

Specific examples of compound A1 include compounds specifically described in International Publication No. 2014/021023.

The method for producing the compound A1 is not particularly limited as long as the desired structure can be obtained, and for example, it can be a method similar to the method described in International Publication No. 2014/021023.
Specific examples of the case where R ¹⁰² in the above compound A1 is (C-1) to (C-10) include the compounds shown below.

Among the compounds represented by the above general formula (A), from the viewpoint that they can be easily used as latent ultraviolet absorbers that exhibit ultraviolet absorbing ability by removing the protecting group ^R102 , Compounds represented by the following general formulas (B1), (B2), or (B3) (hereinafter sometimes referred to as compound B1, compound B2, and compound B3, respectively) can be preferably used.
By containing the compounds B1 to B3, the composition has, for example, better light resistance.

(In the formula, R ^1-1 and R ^1-2 each independently have a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, and a carbon atom number that may have a substituent. ~40 aliphatic groups, aromatic hydrocarbon ring-containing groups with 6 to 35 carbon atoms that may have substituents, heterogeneous groups with 2 to 35 carbon atoms that may have substituents represents a ring-containing group or -O-R ¹⁰² ,
At least one of R ^1-1 and R ^1-2 is the above -OR ¹⁰² ,
R ³ and R ⁴ each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or a substituent. represents an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent, and a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent;
R ¹⁰² is each independently an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or an aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent; Represents a ring-containing group, a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent, or a silyl group having 0 to 40 carbon atoms which may have a substituent,
A plurality of ^R3s and a plurality of ^R4s may be bonded to each other to form a benzene ring or a naphthalene ring,
A plurality of R ³ and R ⁴ may be the same or different,
An aliphatic group having 1 to 40 carbon atoms, which may have a substituent used in R ^1-1 , R ^1-2 , R ³ , R ⁴ and R ¹⁰² , when having a substituent Aromatic hydrocarbon ring-containing groups having 6 to 35 carbon atoms and heterocycle-containing groups having 2 to 35 carbon atoms optionally having substituents and substituents used in R ¹⁰² One or more of the methylene groups in the silyl group having 0 to 40 carbon atoms may be a carbon-carbon double bond, -O-, -S-, -CO-, -O-CO- , -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S- , -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -S-S-, or -SO ₂ -, or conditions where these groups are not adjacent to each other. may be replaced by a group combined with
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
m1 represents an integer from 1 to 10,
b1 represents an integer from 0 to 4,
b2 represents an integer from 0 to 2,
X ^b1 represents an m1-valent group. )

(In the formula, R ^2-1 and R ^2-2 each independently have a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, and a carbon atom number that may have a substituent. ~40 aliphatic groups, aromatic hydrocarbon ring-containing groups with 6 to 35 carbon atoms that may have substituents, heterogeneous groups with 2 to 35 carbon atoms that may have substituents represents a ring-containing group or -O-R ¹⁰² ,
At least one of R ^2-1 and R ^2-2 is the above -OR ¹⁰² ,
R ⁵ and R ⁶ each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or a substituent. represents an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent, and a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent;
R ¹⁰² is each independently an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or an aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent; Represents a ring-containing group, a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent, or a silyl group having 0 to 40 carbon atoms which may have a substituent,
A plurality of R ^5s and a plurality of R ^6s may be bonded to each other to form a benzene ring or a naphthalene ring,
The plurality of R ⁵ and R ⁶ may be the same or different,
An aliphatic group having 1 to 40 carbon atoms, which may have a substituent used in R ^2-1 , R ^2-2 , R ⁵ , R ⁶ and R ¹⁰² , when having a substituent Aromatic hydrocarbon ring-containing groups having 6 to 35 carbon atoms and heterocycle-containing groups having 2 to 35 carbon atoms optionally having substituents and substituents used in R ¹⁰² One or more of the methylene groups in the silyl group having 0 to 40 carbon atoms may be a carbon-carbon double bond, -O-, -S-, -CO-, -O-CO- , -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S- , -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -S-S-, or -SO ₂ -, or conditions where these groups are not adjacent to each other. may be replaced by a group combined with
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
m2 represents an integer from 1 to 10,
b3 represents an integer from 0 to 4,
b4 represents an integer from 0 to 3,
X ^b2 represents an m2-valent group. )

(In the formula, R ^3-1 , R ^3-2 , R ^3-3 and R ^3-4 each independently have a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, or a substituent. An aliphatic group having 1 to 40 carbon atoms, which may have a substituent, an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, or a substituent. also represents a heterocycle-containing group having 2 to 35 carbon atoms or -O-R ¹⁰² ,
At least one of R ^3-1 and R ^3-2 is the above -OR ¹⁰² ,
At least one of R ^3-3 and R ^3-4 is the above -OR ¹⁰² ,
R ⁷ , R ⁸ and R ⁹ each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an aliphatic group having 1 to 40 carbon atoms which may have a substituent, a substituted Represents an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a group, and a heterocyclic ring-containing group having 2 to 35 carbon atoms, which may have a substituent,
R ¹⁰² is each independently an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or an aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent; Represents a ring-containing group, a heterocycle-containing group having 2 to 35 carbon atoms which may have a substituent, or a silyl group having 0 to 40 carbon atoms which may have a substituent,
A plurality of R ^7s and a plurality of R ^8s may be bonded to each other to form a benzene ring or a naphthalene ring,
A plurality of R ⁷ and R ⁸ may be the same or different,
1 to 40 carbon atoms, which may have substituents used in R ^3-1 , R ^3-2 , R ^3-3 , R ^3-4 , R ⁷ , R ⁸ , R ⁹ and R ¹⁰² aliphatic groups, aromatic hydrocarbon ring-containing groups having 6 to 35 carbon atoms which may have substituents, and heterocyclic groups having 2 to 35 carbon atoms which may have substituents; One or more of the methylene groups in the silyl group having 0 to 40 carbon atoms, which may have substituents used in the group and R ¹⁰² , are carbon-carbon double bonds, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S -CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -S-S- or -SO ₂ - In some cases, the selected group or a group in which these groups are combined without adjacency may be substituted,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
m3 represents an integer from 1 to 10,
m31 represents an integer of 1,
m32 represents an integer from 0 to 2,
The sum of m31 and m32 represents an integer from 1 to 3,
b5 represents an integer from 0 to 2,
b6 represents an integer from 0 to 3,
b7 represents an integer from 0 to [3-(m31+m32)],
X ^b3 represents an m3-valent group. )

The above R ^1-1 , R ^1-2 , R ^2-1 , R ^2-2 , R ^3-1 , R ^3-2 , R ^3-3 and R ^3-4 , R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ , R ⁸ , R ⁹ and R ¹⁰² (hereinafter these functional groups may be collectively referred to as R ¹ etc.) may have a halogen atom or a substituent. Certain aliphatic groups having 1 to 40 carbon atoms, aromatic hydrocarbon ring-containing groups having 6 to 35 carbon atoms which may have substituents, and carbon atoms which may have substituents. As the heterocycle-containing group having 2 to 35 carbon atoms, the silyl group having 0 to 40 carbon atoms which may have a substituent used in R ¹⁰² , and the alkyl group used in R', the above general formula (A) is used. Among the contents exemplified as R ¹⁰¹ , R ¹⁰² and R' used therein, those satisfying a predetermined number of carbon atoms can be mentioned.

In general formula (B1), at least one of R ^1-1 and R ^1-2 is -OR ¹⁰² .
From the viewpoint of ease of synthesis, one of the above R ^1-1 and R ^1-2 is preferably -O-R ¹⁰² .
It is preferable that both R ^1-1 and ^{R 1-2 are -O} -R ¹⁰² from the viewpoint of increasing the change in ultraviolet absorption ability.
When only one of R ^1-1 and R ^1-2 is -O-R ¹⁰² , the other is an aliphatic group having 1 to 40 carbon atoms that may have a hydrogen atom, a hydroxyl group, or a substituent. group, an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent, or a heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a substituent. Among them, an aliphatic group having 1 to 5 carbon atoms which may have a hydrogen atom or a substituent is particularly preferable, and in particular an aliphatic group having a hydrogen atom or a substituent may have An alkyl group having 1 to 5 carbon atoms is preferable, and an unsubstituted alkyl group having 1 to 5 carbon atoms having no hydrogen atom or substituent group is particularly preferable. This is because the other of the above R ^1-1 and R ^1-2 is the above functional group, and the above compound B1 has a large change in ultraviolet absorption ability before and after the removal of the protective group R ¹⁰² . . Further, the above compound B1 can suppress the occurrence of curing inhibition.
In general formula (B2), at least one of R ^2-1 and R ^2-2 is -O-R ¹⁰² .
Furthermore, in the general formula (B3), at least one of R ^3-1 and R ^3-2 is -O-R ¹⁰² , and at least one of R ^3-3 and R ^3-4 is -OR ¹⁰² above.
The contents of R ^2-1 and R ^2-2 , R ^3-1 and R ^3-2 , and R ^3-3 and R ^3-4 may be the same as R ¹ and R ² above. can.

The above R ¹⁰² protects the phenolic hydroxyl group.
R ¹⁰² in such general formulas (B1) to (B3) can be the same as R ¹⁰² in the above general formula (A).

The above R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ⁸ are preferably a halogen atom or an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, among others. However, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 1 to 40 carbon atoms having an ethylenically unsaturated group as a substituent for a hydrogen atom, and a methylene group at the end are replaced with -O-. an alkyl group having 1 to 40 carbon atoms (alkoxy group having 1 to 40 carbon atoms), an alkyl group having 1 to 40 carbon atoms in which one or more methylene groups are replaced with -O-CO-; or an alkyl group having 1 to 40 carbon atoms (an alkoxy group having 1 to 39 carbon atoms) in which the methylene group at the end is replaced with -O-, and the methylene group in the chain is replaced with -O-CO- ) is preferable, especially an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or an alkyl group having 1 to 10 carbon atoms, which has at least an ethylenically unsaturated group as a substituent for a hydrogen atom. 10 alkoxy group, an alkyl group having 1 to 10 carbon atoms in which the methylene group is replaced with -O-CO-, or an alkoxy group having 1 to 10 carbon atoms in which the methylene group is replaced with -O-CO- It is preferable that there be.
Above all, R ⁴ is preferably an alkyl group having 1 to 10 carbon atoms, particularly preferably an alkyl group having 4 to 10 carbon atoms.
Above all, R ⁵ is preferably an alkyl group having 1 to 40 carbon atoms (alkoxy group having 1 to 40 carbon atoms) in which the methylene group at the end is replaced with -O-, particularly It is preferable that the methylene group at the end is an alkyl group having 1 to 10 carbon atoms (alkoxy group having 1 to 10 carbon atoms) substituted with -O-, and especially when the methylene group at the end is -O- It is preferably a substituted alkyl group having 1 to 5 carbon atoms (alkoxy group having 1 to 5 carbon atoms).
The above R ⁷ and R ⁸ are, among others, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 1 to 40 carbon atoms in which the methylene group at the end is replaced with -O- (1 to 40 carbon atoms) alkoxy group), the methylene group at the end is replaced with -O-, and the methylene group in the chain is replaced with -O-CO-, an alkyl group with 1 to 40 carbon atoms (with 1 to 4 carbon atoms) 39 alkoxy groups), particularly an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and an alkoxy group having 1 to 10 carbon atoms having at least an ethylenically unsaturated group as a substituent. is preferably an alkoxy group having 1 to 20 carbon atoms, in which the methylene group is replaced with -O-CO-, particularly an alkyl group having 1 to 5 carbon atoms, or an alkyl group having 5 to 5 carbon atoms. 15 alkoxy group, an alkoxy group having 1 to 5 carbon atoms having at least an ethylenically unsaturated group as a substituent, and an alkoxy group having 5 to 15 carbon atoms in which the methylene group is replaced with -O-CO-. is preferred.
The above R ⁹ is preferably an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, which may have a substituent, and in particular, a group having a substituent such as a phenyl group Preferably, it is an aromatic hydrocarbon ring-containing group having 6 to 12 carbon atoms.
Since the above R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ , R ⁸ and R ⁹ are the above groups, the above compounds B1 to B3 have UV absorption properties before and after the removal of the protecting group R ¹⁰² . This is because the changes in Noh will be large. Further, the above compounds B1 to B3 can suppress the occurrence of curing inhibition. Furthermore, this is because synthesis becomes easier.

The above b1 is an integer of 0 to 4, but from the viewpoint of ease of synthesis, each independently preferably is an integer of 0 to 3, particularly preferably an integer of 0 to 2. , particularly preferably from 0 to 1.
The above b2 is an integer of 0 to 2, but from the viewpoint of solubility, it is preferably 1 to 2.
The above b3 is an integer of 0 to 4, but from the viewpoint of ease of synthesis, each independently preferably is an integer of 0 to 3, particularly preferably an integer of 0 to 2. , particularly preferably from 0 to 1.
The above b4 is an integer of 0 to 3, but from the viewpoint of ease of synthesis, it is preferably an integer of 0 to 2, particularly preferably 1 to 2.
The above b5 is an integer of 0 to 2, and from the viewpoint of ease of synthesis, it is particularly preferably an integer of 1 to 2.
The above b6 is an integer of 0 to 3, but from the viewpoint of ease of synthesis, it is preferably an integer of 0 to 1, and preferably 0.
The above b7 represents an integer from 0 to [3-(m31+m32)], but from the viewpoint of ease of synthesis, it is preferably an integer from 0 to 1, and preferably 0.

The above m1 is an integer of 1 to 10, but from the viewpoint of obtaining a cured product with excellent light resistance, it is preferably 2 or more, and particularly preferably an integer of 2 to 6. In particular, it is preferably an integer of 2 to 4.
The above m2 is an integer of 1 to 10, but from the viewpoint of obtaining a cured product with excellent light resistance, it is preferably an integer of 1 to 5, particularly an integer of 1 to 2. preferable.
The above m3 is an integer of 1 to 10, but from the viewpoint of obtaining a cured product with excellent light resistance, it is preferably an integer of 1 to 5, particularly an integer of 1 to 2. preferable.
The above m31 represents an integer of 1, m32 represents an integer of 0 to 2, and the sum of m31 and m32 represents an integer of 1 to 3.
From the viewpoint of a large change in the ultraviolet absorbing ability of Compound B before and after the release of latency, the sum of m31 and m32 is preferably an integer of 2 to 3, and particularly preferably 3.

Compounds B1 to B3 represented by the above general formulas (B1), (B2) and (B3) are X ^b1 , X ^b2 and X ^b3 (hereinafter, these may be collectively referred to as X ^b ). Based on the expressed m1 valence, m2 valence, or m3 valence (hereinafter sometimes referred to as m valence), m1, m2, or m3 (hereinafter sometimes referred to as m) specific It has a structure in which groups are bonded. The m specific groups are the same or different from each other.

The above X ^b represents an m-valent group.
Such an X ^b group can have the same content as the above-mentioned X group.

For the X ^b group, when m is 2, an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, can be preferably used.
Among these, in the present disclosure, an unsubstituted alkylene group having 1 to 10 carbon atoms is preferred, and an unsubstituted alkylene group having 1 to 5 carbon atoms is particularly preferred.
Further, when m is 2, a group represented by the above general formula (101) can also be preferably used as the X ^b group.
In the above general formula (101), Y ¹¹¹ and Y ¹¹⁵ are preferably aliphatic groups having 1 to 4 carbon atoms, which may have a substituent, and in particular, unsubstituted aliphatic groups having 1 to 4 carbon atoms. One to four alkylene groups are preferred.
In addition, in Y ¹¹¹ and Y ¹¹⁵ , the methylene group at the side end of the bonding site of the aliphatic group having 1 to 8 carbon atoms, which may have a substituent, is -COO-, -O-, -OCO -, -NHCO-, -NH- or -CONH- is preferred, and -O- is particularly preferred.
In the above general formula (101), Y ¹¹² and Y ¹¹³ are preferably groups represented by -CO-, -CO-O-, -O-CO-, especially -CO-O-, - A group represented by O--CO- is preferred.
In the above general formula (101), Y ¹¹³ is preferably an aliphatic group having 1 to 40 carbon atoms that may have a divalent substituent, and in particular, An aliphatic group having 1 to 20 carbon atoms is preferred, and a divalent unsubstituted alkylene group having 4 to 15 carbon atoms is particularly preferred. Further, when Y ¹¹³ is an aliphatic group having 1 to 40 carbon atoms, either a straight chain or a branched alkylene group can be used, and among them, a branched alkylene group is preferable.
In the present disclosure, when m1=1, X ^b1 is preferably a hydrogen atom or a group similar to R4.
When m2=1, the above X ^b2 is preferably a hydrogen atom or a group similar to R6.
When m3=1, the above X ^b3 is preferably a hydrogen atom or a group similar to R7.
This is because when the X ^b group is the above-mentioned group, the compounds B1 to B3 can stably exhibit ultraviolet absorbing ability after the protective group R ¹⁰² is removed.

The bonding position of the X ^b group to the benzene ring may be any bondable position within the benzene ring, but for example, the ortho position or meta position with respect to the bonding position of -O-R ¹⁰² . It is preferable that

Specific examples of the above compounds B1 to B3 include compounds specifically described in International Publication No. 2014/021023.

Regarding the above compound B3, the compounds represented below can also be mentioned.

In the above compounds B1 to B3, specific examples of R ¹⁰² being (C-1) to (C-10) include the compounds shown below.

The method for producing the above compounds B1 to B3 is not particularly limited as long as the desired structure can be obtained, but for example, it can be a method similar to the method described in International Publication No. 2014/021023.

(3) Compound A
The molecular weight of the above compound may be any molecular weight as long as it can function as a latent additive, and is preferably, for example, 200 or more and 3,000 or less, and particularly preferably 500 or more and 2,000 or less. This is because when the molecular weight is within the above range, the dispersion stability is excellent.

As for the type of compound A, there may be only one type in the composition, or there may be two or more types. The above composition can contain, for example, two or more and five or less types of compound A.
For example, as the compound A, the compound A1 and the compounds B1 to B3 may be used in combination. In this case, it becomes easy to obtain a cured product excellent in both ultraviolet absorbing ability and antioxidant ability.

The content of the compound A may be any content that can impart desired durability to the cured product, and is appropriately set depending on the type of compound A to be added.
The content of the compound A may be, for example, 0.01 parts by mass or more and 20 parts by mass or less, and 0.05 parts by mass or more and 10 parts by mass or less in 100 parts by mass of the solid content of the composition. The content is preferably 0.1 parts by mass or more and 5 parts by mass or less. This is because when the content is within the above range, the composition can stably form a cured product with excellent ultraviolet absorption ability, antioxidant ability, etc. and excellent durability.
Note that the solid content includes all components other than the solvent.
The content of the compound A varies depending on the content of the solvent, etc., but can be, for example, 0.001 parts by mass or more and 20 parts by mass or less in 100 parts by mass of the composition. It is preferably .005 parts by mass or more and 10 parts by mass or less. This is because a cured product with excellent durability can be stably formed.
The content of the compound A can be 0.01 parts by mass or more and 20 parts by mass or less, and 0.05 parts by mass or more and 15 parts by mass in 100 parts by mass in total of the compound A and the curable component. The content is preferably at least 0.1 parts by mass or more and 10 parts by mass or less. This is because when the content is within the above range, the composition can stably form a cured product with excellent ultraviolet absorption ability, antioxidant ability, etc. and excellent durability.

2. Curable Component The above-mentioned curable component may be any one that can form a cured product with excellent durability, and at least one of a photocurable component and a thermosetting component can be used.
In the present disclosure, from the viewpoint of facilitating patterning, it is preferable to include a photocurable component, and from the viewpoint of providing excellent durability, the composition preferably contains both a photocurable component and a thermosetting component. It is preferable.

(1) Photocurable component The photocurable component may be a radically polymerizable compound that is cured by a photoradical initiator.
Examples of the above-mentioned radically polymerizable compounds include compounds having one or more ethylenically unsaturated bonds in the molecule, such as an acrylic group, a methacrylic group, and a vinyl group.
The radically polymerizable compound may be a compound having a carboxyl group or a compound having no carboxyl group.
The composition preferably contains a compound having a carboxyl group from the viewpoint of facilitating patterning.

(a) Compound having a carboxyl group The compound having a carboxyl group may be any compound having a carboxyl group and an ethylenically unsaturated group and capable of imparting desired alkali developability.
Specifically, the carboxyl group-containing resins shown in (1-1) to (1-7) below can be preferably used as the carboxyl group-containing compound.
(1) Esterification reaction (total esterification or partial esterification, preferably total esterification) of the epoxy group of a polyfunctional epoxy compound having at least two epoxy groups in one molecule and the carboxyl group of an unsaturated carboxylic acid , a carboxyl group-containing photosensitive resin obtained by further reacting the generated hydroxyl group with a saturated or unsaturated polybasic acid or polybasic acid anhydride.
(2) After reacting an unsaturated carboxylic acid with a copolymer consisting of an unsaturated group-containing compound and a compound having one cyclic ether group and one or more (meth)acryloyl groups in one molecule, further saturated or A carboxyl group-containing photosensitive resin obtained by reacting an unsaturated polybasic acid or polybasic acid anhydride.
(3) Compounds having a hydroxyl group and one or more (meth)acryloyl groups in one molecule, compounds containing unsaturated groups, and compounds having one cyclic ether group and one or more (meth)acryloyl groups in one molecule A carboxyl group-containing photosensitive resin obtained by reacting a copolymer with an unsaturated carboxylic acid and then reacting a saturated or unsaturated polybasic acid or polybasic acid anhydride.
(4) A carboxyl group-containing photosensitive material obtained by partially reacting a copolymer of an unsaturated group-containing compound and an unsaturated carboxylic acid with a compound having a hydroxyl group and one or more (meth)acryloyl groups in one molecule. sex resin.
(5) A copolymer of an unsaturated polybasic acid anhydride such as maleic anhydride and an aromatic hydrocarbon having a vinyl group such as styrene has a hydroxyl group and one or more (meth)acryloyl groups in one molecule. A carboxyl group-containing photosensitive resin obtained by reacting a compound containing a carboxyl group.
(6) A polyfunctional oxetane compound having at least two oxetane rings in one molecule is reacted with an unsaturated carboxylic acid, and a saturated or unsaturated polybasic acid or A carboxyl group-containing photosensitive resin obtained by reacting polybasic acid anhydrides.
(7) A product obtained by reacting a reaction product between a novolac type phenol resin and an alkylene oxide with an unsaturated carboxylic acid, and reacting the resulting reaction product with a saturated or unsaturated polybasic acid or polybasic acid anhydride. Carboxyl group-containing photosensitive resin.

The polyfunctional epoxy compound may be any compound having at least two epoxy groups in one molecule.
Examples of the polyfunctional epoxy compounds include rubber-modified epoxy resins such as biphenyl-type epoxy resins, naphthalene-type epoxy resins, dicyclopentadiene-type epoxy resins, and silicone-modified epoxy resins, ε-caprolactone-modified epoxy resins, bisphenol A type, and bisphenol. Phenol novolac type epoxy resins such as F type and bisphenol A D type, cresol novolac type epoxy resins such as о-cresol novolac type, bisphenol A novolac type epoxy resin, cycloaliphatic polyfunctional epoxy resin, glycidyl ester type polyfunctional epoxy resin , glycidylamine type polyfunctional epoxy resin, heterocyclic polyfunctional epoxy resin, bisphenol modified novolac type epoxy resin, polyfunctional modified novolac type epoxy resin, condensate type epoxy resin of phenols and aromatic aldehyde having a phenolic hydroxyl group etc. can be mentioned.
Further, resins having halogen atoms such as Br and Cl introduced into these resins can also be used.
These polyfunctional epoxy compounds may be used alone or in combination of two or more.

Examples of the unsaturated carboxylic acid include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, and cinnamic acid, with acrylic acid and methacrylic acid being preferred.
The method for reacting the polyfunctional epoxy compound and the unsaturated monocarboxylic acid is not particularly limited, and for example, the polyfunctional epoxy compound and the unsaturated monocarboxylic acid can be reacted by heating in an appropriate solvent.

As the polybasic acid or its anhydride, both polysaturated and unsaturated acids can be used.
Examples of the polybasic acids include succinic acid, maleic acid, adipic acid, citric acid, phthalic acid, tetrahydrophthalic acid, 3-methyltetrahydrophthalic acid, 4-methyltetrahydrophthalic acid, 3-ethyltetrahydrophthalic acid, and 4-ethyltetrahydrophthalic acid. - Ethyltetrahydrophthalic acid, hexahydrophthalic acid, 3 - methylhexahydrophthalic acid, 4 - methylhexahydrophthalic acid, 3 - ethylhexahydrophthalic acid, 4 - ethylhexahydrophthalic acid, methyltetrahydrophthalic acid, methylhexahydrophthalic acid Examples include hydrophthalic acid, endomethylenetetrahydrophthalic acid, methylendomethylenetetrahydrophthalic acid, trimellitic acid, pyromellitic acid, and diglycolic acid.
Examples of the above-mentioned polybasic acid anhydrides include anhydrides of the above-mentioned polybasic acids.

Examples of the unsaturated group-containing compound include styrene, α-methylstyrene, lower alkyl (meth)acrylate, and isobutylene. Further, compounds having no carboxyl group, which will be described later, can also be used.
Examples of the above-mentioned compounds having one cyclic ether and one or more (meth)acryloyl groups in one molecule include glycidyl (meth)acrylate, α-methylglycidyl (meth)acrylate, and pentaerythritol tri(meth)acrylate monoglycidyl ether. , 3,4-epoxycyclohexylmethyl methacrylate, and the like.
Examples of the compound having a hydroxyl group and one or more (meth)acryloyl groups in one molecule and the unsaturated group-containing compound include hydroxyalkyl (meth)acrylate.
Examples of the alkylene oxide include ethylene oxide and propylene oxide.

Note that the (meth)acrylic group includes both an acrylic group and a methacryl group.
Moreover, (meth)acrylate includes both acrylate and methacrylate.

As the above-mentioned carboxyl group-containing resin, among the polymers described in "7. Polymers having carboxyl groups" described below, those having ethylenically unsaturated groups such as methacryloyl groups, acryloyl groups, and vinyl groups can also be used. can.

Commercially available carboxyl group-containing resins include, for example, ZAR-2000, ZFR-1122, FLX-2089, ZCR-1601H (manufactured by Nippon Kayaku Co., Ltd.), Cyclomer P (ACA) Z-250 ( (manufactured by Daicel Chemical Industries, Ltd.), Ripoxy SP-4621 (manufactured by Showa Kobunshi Co., Ltd.), and the like.

The acid value of the carboxyl group-containing resin may be any value as long as it can form a cured product with excellent durability. For example, it is preferably 40 mgKOH/g or more and 150 mgKOH/g or less, particularly 50 mgKOH/g. It is preferable that it is 130 mgKOH/g or less.
This is because when the acid value is within the above range, the composition can easily form a cured product with excellent durability. Further, the above composition can be easily patterned.

The weight average molecular weight of the carboxyl group-containing resin may be any weight average molecular weight as long as a cured product with excellent durability can be obtained, but from the viewpoint of facilitating patterning, it is preferably 2,000 or more and 150,000 or less, for example. Among these, it is preferably 5,000 or more and 100,000 or less.
This is because when the weight average molecular weight is within the above range, the composition can easily form a cured product with excellent durability. Further, the above composition can be easily patterned.
The above weight average molecular weight Mw is determined by using, for example, HLC-8120GPC manufactured by Tosoh Corporation, using N-methylpyrrolidone with 0.01 mol/liter of lithium bromide added as the elution solvent, and using a polystyrene standard for the calibration curve. Mw377400, 210500, 96000, 50400, 20650, 10850, 5460, 2930, 1300, 580 (Easi PS-2 series manufactured by Polymer Laboratories) and Mw1090000 (manufactured by Tosoh Corporation), and the measurement column was TSK- GEL It can be obtained by measuring 2 pieces of ALPHA-M (manufactured by Tosoh Corporation).
Further, the measurement temperature can be 40° C., and the flow rate can be 1.0 mL/min.

The content of the compound having a carboxyl group may be any compound that can form a cured product with excellent durability, for example, 5 parts by mass or more and 85 parts by mass in 100 parts by mass of the solid content of the composition. It is preferably at least 20 parts by mass or more and at most 70 parts by mass. This is because the above composition can easily form a cured product with excellent durability. Further, the above composition can be easily patterned.

(b) Compounds without carboxyl groups The above-mentioned compounds without carboxyl groups may have one or more ethylenically unsaturated groups and no carboxyl groups, such as acrylic acid-2 -Hydroxyethyl, 2-hydroxypropyl acrylate, isobutyl acrylate, n-octyl acrylate, isooctyl acrylate, isononyl acrylate, stearyl acrylate, methoxyethyl acrylate, dimethylaminoethyl acrylate, zinc acrylate, 1 , 4-butanediol diacrylate, neopentyl glycol diacrylate, 1,6-hexanediol diacrylate, trimethylolpropane triacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, butyl methacrylate, methacrylate Tert-butyl acid, cyclohexyl methacrylate, 1,4-butanediol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, polyethylene glycol di(meth)acrylate, isocyanurate di(meth)acrylate, dipentaerythritol penta Acrylate, dipentaerythritol hexaacrylate, pentaerythritol tetraacrylate, pentaerythritol triacrylate, caprolactone-modified dipentaerythritol hexa(meth)acrylate, bisphenol A diglycidyl ether (meth)acrylate, bisphenol F diglycidyl ether (meth)acrylate, bisphenol Examples include Z diglycidyl ether (meth)acrylate, tripropylene glycol di(meth)acrylate, and the like.
As the above-mentioned compound having no carboxyl group, (meth)acrylate having a phosphate ester structure such as mono(2-acryloyloxyethyl) acid phosphate can also be used.
As the above-mentioned compound having no carboxyl group, urethane acrylate, polyester acrylate, epoxy acrylate, etc. can also be used. As commercially available products of such urethane acrylate, polyester acrylate, and epoxy acrylate, those described in JP-A-2018-53215 can be used, for example.

Among the compounds without a carboxyl group, those that are liquid at room temperature may be used as a diluent for dissolving the carboxyl group-containing resin and the like.

The content of the compound having no carboxyl group may be any compound that can form a cured product with excellent durability, for example, 1 part by mass or more and 85 parts by mass in 100 parts by mass of the solid content of the composition. It is preferable that the amount is less than 1 part.
The content of the compound not having a carboxyl group may be any content as long as it can form a cured product with excellent durability. When the composition contains the compound having a carboxyl group, for example, the content of the compound not having a carboxyl group may be It is preferably 5 parts by mass or more and 100 parts by mass or less, more preferably 5 parts by mass or more and 70 parts by mass or less, based on 100 parts by mass of the group-containing compound.
This is because when the content is within the above range, the composition can easily form a cured product with excellent durability. Further, the above composition can be easily patterned.

(c) Others The content of the photocurable component may be any content as long as it can form a cured product with excellent durability, for example, 5 parts by mass or more in 100 parts by mass of the solid content of the composition. The content is preferably 85 parts by mass or less, particularly preferably 20 parts by mass or more and 70 parts by mass or less, and particularly preferably 30 parts by mass or more and 60 parts by mass or less. This is because the above composition can easily form a cured product with excellent durability. Further, the above composition can be easily patterned.
Further, from the viewpoint of providing excellent patterning properties, the content of the photocurable component is preferably 10 parts by mass or more in 100 parts by mass of the curable component, and especially 30 parts by mass. It is preferably at least 50 parts by mass, particularly preferably at least 50 parts by mass.
The content of the photocurable component can be set as appropriate depending on the use of the composition, and for example, it can be 1 part by mass or more and 99 parts by mass or less, and 10 parts by mass or less in 100 parts by mass of the composition. Parts by weight or more and 90 parts by weight or less, particularly preferably 20 parts by weight or more and 80 parts by weight or less, particularly preferably 30 parts by weight or more and 60 parts by weight or less. This is because, for example, when the content is within the above range, the composition can form a cured product with excellent durability.
The content of the photocurable component may be such that the composition can be used as a curable composition. .9 parts by mass or less, preferably 50 parts by mass or more and 99.8 parts by mass or less, particularly preferably 80 parts by mass or more and 99.5 parts by mass or less, and 90 parts by mass or more. It is preferably 99.2 parts by mass or less. This is because when the content is within the above range, the composition can form a cured product with excellent durability.
Further, the content of the compound A and the photocurable component can be set as appropriate depending on the use of the composition, etc., but for example, it should be 1 part by mass or more and 99 parts by mass or less in 100 parts by mass of the composition. It is preferably 10 parts by mass or more and 75 parts by mass or less, particularly preferably 20 parts by mass or more and 60 parts by mass or less. This is because, for example, when the content is within the above range, the composition can form a cured product with excellent durability.

(2) Thermosetting component The above-mentioned thermosetting component includes phenol resin, urea resin, amino resin, polyfunctional epoxy compound, unsaturated polyester resin, benzoguanamine derivative, isocyanate compound, blocked isocyanate compound, maleimide compound, benzoxazine compound, Examples include oxazoline compounds, carbodiimide compounds, cyclocarbonate compounds, polyfunctional oxetane compounds, and episulfide resins.
As the polyfunctional epoxy compound, the polyfunctional epoxy compound described in the section of "(a) Compound having a carboxyl group" in "(1) Photocurable component" can be used.
As a commercially available product of the polyfunctional epoxy compound, for example, those described in JP-A-2018-53215 can be used.
As the isocyanate compound, blocked isocyanate compound, and polyfunctional oxetane compound, for example, a compound having an isocyanate group or a blocked isocyanate group and a polyfunctional oxetane compound described in JP 2017-111453 A can be used.
As the amino resin, for example, melamine derivatives, benzoguanamine derivatives, etc. described in JP-A-2017-111453 can be used.
As the thermosetting component, polymers having an epoxy group, an oxetanyl group, a vinyl ether group, a mercapto group, an isocyanate group, etc. may also be used among the polymers described in "7. Polymers having a carboxyl group" described below. can.

The content of the thermosetting component may be one that can form a cured product with excellent durability, for example, 5 parts by mass or more and 85 parts by mass or less in 100 parts by mass of the solid content of the composition. The content is preferably 10 parts by mass or more and 60 parts by mass or less.
The content of the thermosetting component can be set as appropriate depending on the use of the composition, etc., but for example, it can be 1 part by mass or more and 99 parts by mass or less, 2 parts by mass or less in 100 parts by mass of the composition. Parts by weight or more and 50 parts by weight or less, particularly preferably 3 parts by weight or more and 30 parts by weight or less, particularly preferably 5 parts by weight or more and 20 parts by weight or less. This is because, for example, when the content is within the above range, the composition can form a cured product with excellent durability.
The content of the thermosetting component may be such that the composition can be used as a curable composition. .9 parts by mass or less, preferably 50 parts by mass or more and 99.8 parts by mass or less, particularly preferably 80 parts by mass or more and 99 parts by mass or less, 90 parts by mass or more and 98 parts by mass. It is preferable that the amount is less than 100%. This is because when the content is within the above range, the composition can form a cured product with excellent durability.
In addition, the content of the above-mentioned compound A and thermosetting component can be set as appropriate depending on the use of the composition, etc., but for example, it should be 1 part by mass or more and 99 parts by mass or less in 100 parts by mass of the composition. It is preferably 3 parts by mass or more and 50 parts by mass or less, particularly preferably 5 parts by mass or more and 25 parts by mass or less. This is because, for example, when the content is within the above range, the composition can form a cured product with excellent durability.

(3) Curable component The content of the above-mentioned curable component may be any content as long as it can form a cured product with excellent durability, for example, 5 parts by mass in 100 parts by mass of the solid content of the composition. It is preferably at least 85 parts by mass, particularly preferably at least 20 parts by mass and at most 70 parts by mass, particularly preferably at least 30 parts by mass and at most 65 parts by mass. This is because the above composition can easily form a cured product with excellent durability.
The content of the above-mentioned curable component varies depending on the use of the composition, etc., but it should be 1 part by mass or more and 99.9 parts by mass or less in the total of 100 parts by mass of compound A and the curable component. It is preferably 50 parts by mass or more and 99.8 parts by mass or less, particularly preferably 90 parts by mass or more and 99.5 parts by mass or less, and 95 parts by mass or more and 99.3 parts by mass or less. It is preferable. This is because when the content is within the above range, the composition can easily impart ultraviolet absorption ability and the like to a cured product.
Further, the content of the compound A and the curable component can be set as appropriate depending on the use of the composition, etc., but for example, the content may be 1 part by mass or more and 99 parts by mass or less in 100 parts by mass of the composition. It is preferably 20 parts by mass or more and 85 parts by mass or less, particularly preferably 40 parts by mass or more and 65 parts by mass or less. This is because, when the content is within the above range, the composition can be used as a negative composition with excellent sensitivity, for example. Further, it is possible to provide a composition that has little curing inhibition and can easily impart ultraviolet absorbing ability and the like to a cured product.

3. Radical Photopolymerization Initiator When the composition includes a photocurable component as a curable component, it is preferable that the composition contains a radical photopolymerization initiator.
The photoradical polymerization initiator may be any compound that generates radicals when irradiated with light, such as an oxime ester photopolymerization initiator having an oxime ester group, an alkylphenone photopolymerization initiator, and α-aminoacetophenone. A type photopolymerization initiator, an acylphosphine oxide type photopolymerization initiator, a titanocene type photopolymerization initiator, etc. can be used.
Examples of such oxime ester photopolymerization initiators, alkylphenone photopolymerization initiators, α-aminoacetophenone photopolymerization initiators, acylphosphine oxide photopolymerization initiators, and titanocene photopolymerization initiators include: The one described in JP-A No. 2018-053215 can be used.

The content of the photoradical polymerization initiator may be any content as long as the desired curability can be obtained, for example, 0.1 parts by mass or more and 30 parts by mass or less based on 100 parts by mass of the photocurable component. The content is preferably 1 part by mass or more and 20 parts by mass or less. This is because when the content is within the above range, the curability is excellent.

4. Thermosetting Catalyst When the composition contains a compound having a cyclic ether group or a cyclic thioether group, such as a polyfunctional epoxy compound or a polyfunctional oxetane compound, as a curable component, it preferably contains a thermosetting catalyst.
Examples of the thermosetting catalyst include imidazole derivatives, amine compounds such as dicyandiamide, hydrazine compounds, phosphorus compounds, and S-triazine derivatives.
As such a thermosetting catalyst and its commercially available products, for example, those described in JP-A-2017-11143 can be used.
The content of the thermosetting catalyst may be any content as long as the desired curability can be obtained, for example, 0.1 part by mass or more based on 100 parts by mass of the above-mentioned compound having a cyclic ether group or cyclic thioether group. It can be 50 parts by mass or less.

5. Filler The above composition may contain a filler from the viewpoint of facilitating the formation of a cured product with better durability.
As the filler, an inorganic filler or an organic filler can be used.
As the above-mentioned inorganic filler, those blended into sealing materials such as silicone resin compositions and epoxy resin compositions can be used. For example, silicas such as fused silica, fused spherical silica, crystalline silica, colloidal silica, fumed silica, and silica gel; Metal oxides such as alumina, iron oxide, and antimony trioxide; silicon nitride, aluminum nitride, boron nitride, and carbide. Ceramics such as silicon; Minerals such as mica and montmorillonite; Metal hydroxides such as aluminum hydroxide and magnesium hydroxide, or those modified by organic modification treatment; Calcium carbonate, calcium silicate, magnesium carbonate, barium carbonate metal carbonates such as, or those modified by organic modification treatment; pigments such as metal borates and carbon black; carbon fibers, graphite, whiskers, kaolin, talc, glass fibers, glass beads, glass microspheres, Examples include silica glass, layered clay minerals, clay, silicon carbide, quartz, aluminum, and zinc.
Examples of the organic filler include acrylic beads, polymer particles, transparent resin beads, wood flour, pulp, and cotton chips.

In the present disclosure, silicas, metal oxides, and metal acid salts are particularly preferred, and crystalline silica, talc, barium sulfate, and titanium oxide are particularly preferred.
The average particle size of the filler may be any size as long as the desired durability can be obtained, and it may vary depending on the use of the composition. It is preferable to do so.
Note that a laser diffraction/scattering method can be used as a method for measuring the average particle size. Specifically, a laser diffraction particle size distribution analyzer (SALD-2000J manufactured by Shimadzu Corporation) or the like can be used. The average particle size can be set to a particle size (median diameter) that is cumulatively 50% from the fine particle side of the cumulative particle size distribution.

The content of the filler may be one that can form a cured product with excellent durability; for example, the content of the filler should be 5 parts by mass or more and 500 parts by mass or less based on 100 parts by mass of the curable component. is preferable, and especially preferably 5 parts by mass or more and 200 parts by mass or less.

6. Coloring Material The above composition may contain a coloring material, if necessary.
Examples of the coloring materials include pigments, dyes, natural pigments, and the like.
Examples of the pigments include nitroso compounds; nitro compounds; azo compounds; diazo compounds; xanthene compounds; quinoline compounds; anthraquinone compounds; coumarin compounds; phthalocyanine compounds; isoindolinone compounds; isoindoline compounds; quinacridone compounds; antanthrone compounds; Compound; perylene compound; diketopyrrolopyrrole compound; thioindigo compound; dioxazine compound; triphenylmethane compound; quinophthalone compound; naphthalenetetracarboxylic acid; metal complex compound of azo dye, cyanine dye; lake pigment; furnace method, channel method or thermal Carbon black obtained by the method, or carbon black such as acetylene black, Ketjen black or lamp black; The above carbon black is prepared or coated with an epoxy resin, the above carbon black is predispersed with a resin in a solvent, and 20 ~200mg/g of resin adsorbed, carbon black with acidic or alkaline surface treatment, average particle size of 8 nm or more and DBP oil absorption of 90ml/100g or less, CO in volatile matter at 950°C Graphite, graphitized carbon black, activated carbon, carbon fiber, carbon nanotube, carbon microcoil, carbon nanohorn, carbon aerogel ^, fullerene; Aniline black, pigment black 7, titanium black; chromium oxide green, miloli blue, cobalt green, cobalt blue, manganese, ferrocyanide, phosphate ultramarine, navy blue, ultramarine, cerulean blue, pyridian, emerald green, lead sulfate, Organic or inorganic pigments such as yellow lead, zinc yellow, red iron oxide (red iron (III) oxide), cadmium red, synthetic iron black, amber, and extender pigments can be used. These pigments can be used alone or in combination.

As the pigment, commercially available pigments can also be used, such as Pigment Red 1, 2, 3, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48, 49, 88, 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 254; Pigment Orange 13, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 65, 71; Pigment Yellow 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109, 110, Pigment green 7, 10, 36; Pigment blue 15, 15:1, 15:2, 15:3, 15:4, 15:5, 15:6, 22, 24, 56, 60, 61, 62, 64; Pigment violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 50, etc.

The above dyes include azo dyes, anthraquinone dyes, indigoid dyes, triarylmethane dyes, xanthene dyes, alizarin dyes, acridine dyes, stilbene dyes, thiazole dyes, naphthol dyes, quinoline dyes, nitro dyes, indamine dyes, oxazine dyes, and phthalocyanine dyes. , cyanine dye, etc., and a plurality of these may be used in combination.

The content of the above-mentioned coloring material may be any content as long as it can obtain the desired appearance, etc., and is preferably 0.01 parts by mass or more and 10 parts by mass or less, more preferably is 0.1 parts by mass or more and 5 parts by mass or less.

7. Polymer Having a Carboxyl Group The composition preferably contains a polymer having a carboxyl group from the viewpoint of facilitating patterning. This is because, by including the polymer, the composition can be easily patterned.

The above carboxyl group-containing polymer may be any polymer having a carboxyl group-containing structural unit (hereinafter referred to as "structural unit (U1)"), and is not particularly limited, but may include methacryloyl group, acryloyl group, vinyl group. , a structural unit having a crosslinkable group such as an epoxy group, an oxetanyl group, a vinyl ether group, a mercapto group, an isocyanate group (hereinafter referred to as "structural unit (U2)"), a structural unit having a silyl group (hereinafter referred to as "structural unit (U2)"), It is preferable to have U3).
The carboxyl group-containing polymer may have a structural unit (hereinafter referred to as "structural unit (U4)") other than the structural units (U1) to (U3).

The above structural unit (U1) is a structural unit derived from at least one type selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides (hereinafter referred to as "compound (u1)"). is preferred.
Examples of the compound (u1) include monocarboxylic acids, dicarboxylic acids, dicarboxylic acid anhydrides, and the like. Examples of the above-mentioned monocarboxylic acids include acrylic acid, methacrylic acid, crotonic acid, 2-acryloyloxyethylsuccinic acid, 2-methacryloyloxyethylsuccinic acid, 2-acryloyloxyethylhexahydrophthalic acid, 2-methacryloyloxyethylhexahydrophthalic acid, and 2-methacryloyloxyethylsuccinic acid. Hydrophthalic acid etc.;
Examples of the dicarboxylic acids include maleic acid, fumaric acid, citraconic acid, etc.;
Examples of the dicarboxylic acid anhydrides include the dicarboxylic acid anhydrides described above.

Among these, acrylic acid, methacrylic acid, 2-acryloyloxyethylsuccinic acid, 2-methacryloyloxyethylsuccinic acid, or maleic anhydride is preferred in terms of copolymerization reactivity and solubility of the resulting copolymer in a developer. preferable.
Compound (u1) can be used alone or in combination of two or more.

The structural unit (U2) is preferably a structural unit derived from a polymerizable unsaturated compound having an epoxy group or an oxetanyl group (hereinafter referred to as "compound (u2)").
The compound (u2) is preferably at least one selected from the group consisting of a polymerizable unsaturated compound having an epoxy group and a polymerizable unsaturated compound having an oxetanyl group.

As a polymerizable unsaturated compound having an epoxy group, for example, (meth)acrylic acid oxiranyl (cyclo)alkyl ester, α-alkylacrylic acid oxiranyl (cyclo)alkyl ester, glycidyl ether compound having a polymerizable unsaturated bond, etc.;
Examples of the polymerizable unsaturated compound having an oxetanyl group include (meth)acrylic esters having an oxetanyl group.

Regarding the above compound (u2), specific examples thereof include:
Examples of the (meth)acrylic acid oxiranyl (cyclo)alkyl ester include glycidyl (meth)acrylate, 2-methylglycidyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate glycidyl ether, (meth)acrylic acid 3, 4-Epoxybutyl, 6,7-epoxyheptyl (meth)acrylate, 3,4-epoxycyclohexyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, 3,4-epoxytricyclo[ 5.2.1.0 ^2.6 ] decyl (meth)acrylate, etc.;
Examples of the α-alkyl acrylic acid oxiranyl (cyclo)alkyl ester include α-ethylacrylate glycidyl, α-n-propylacrylate glycidyl, α-n-butylacrylate glycidyl, α-ethylacrylate 6,7-epoxy heptyl, 3,4-epoxycyclohexyl α-ethyl acrylate, etc.;
Examples of glycidyl ether compounds having a polymerizable unsaturated bond include o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, etc.;
Examples of (meth)acrylic acid esters having an oxetanyl group include 3-((meth)acryloyloxymethyl)oxetane, 3-((meth)acryloyloxymethyl)-3-ethyloxetane, 3-((meth)acryloyloxy methyl)-2-methyloxetane, 3-((meth)acryloyloxyethyl)-3-ethyloxetane, 2-ethyl-3-((meth)acryloyloxyethyl)oxetane, 3-methyl-3-(meth)acryloyl Examples include oxymethyloxetane, 3-ethyl-3-(meth)acryloyloxymethyloxetane, and the like.

Among these specific examples, in particular, glycidyl methacrylate, 2-methylglycidyl methacrylate, 3,4-epoxycyclohexyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate, 3,4-epoxytricyclo[5.2. 1.0 ^2.6 ]decyl methacrylate, 3,4-epoxytricyclo[5.2.1.0 ^2.6 ]decyl acrylate, 3-methacryloyloxymethyl-3-ethyloxetane, 3-methyl-3- Methacryloyloxymethyloxetane or 3-ethyl-3-methacryloyloxymethyloxetane is preferred from the viewpoint of polymerizability.

The above-mentioned compound (u2) can be used alone or in combination of two or more.

Among the structural units (U2), as the structural unit having a methacryloyl group or an acryloyl group as a crosslinkable group, a structural unit having a (meth)acryloyloxy group can be preferably used.
The above structural unit having a (meth)acryloyloxy group is obtained by reacting a (meth)acrylic acid ester having an epoxy group with a carboxyl group in a polymer. The structural unit having a (meth)acryloyloxy group after the reaction is preferably a structural unit represented by the following formula (U).

（式中、Ｒ^１０００およびＲ^１００１は、それぞれ独立して水素原子またはメチル基である。ｃは、１～６の整数である。Ｒ^１００２は、下記式（Ｕα）または下記式（Ｕβ）で表される２価の基であり、＊は結合手を表す。）

(In the formula, R ¹⁰⁰⁰ and R ¹⁰⁰¹ are each independently a hydrogen atom or a methyl group. c is an integer of 1 to 6. R ¹⁰⁰² is the following formula (Uα) or the following formula (Uβ). It is a divalent group expressed, and * represents a bond.)

（式（Ｕα）中、Ｒ^１００３は、水素原子またはメチル基である。上記式（Ｕα）および上記式（Ｕβ）中、＊は、結合手を示す。）

(In the formula (Uα), R ¹⁰⁰³ is a hydrogen atom or a methyl group. In the above formula (Uα) and the above formula (Uβ), * indicates a bond.)

Regarding the structural unit represented by the above formula (U), for example, when a copolymer having a carboxyl group is reacted with a compound such as glycidyl methacrylate or 2-methylglycidyl methacrylate, R in formula (U) ¹⁰⁰² becomes equation (Uα). On the other hand, when a copolymer having a carboxyl group is reacted with a compound such as 3,4-epoxycyclohexylmethyl methacrylate, R ¹⁰⁰² in formula (U) becomes formula (Uβ).

In the reaction between the carboxyl group in the above-mentioned polymer and an unsaturated compound such as (meth)acrylic acid ester having an epoxy group, a polymer containing a polymerization inhibitor is preferably used in the presence of an appropriate catalyst as necessary. An unsaturated compound having an epoxy group is added to the combined solution, and the mixture is stirred for a predetermined period of time under heating. Examples of the above-mentioned catalyst include tetrabutylammonium bromide and the like. Examples of the polymerization inhibitor include p-methoxyphenol. The reaction temperature is preferably 70°C to 100°C. The reaction time is preferably 8 hours to 12 hours.

In the structural unit ratio of the polymer having a carboxyl group, the content ratio of the structural unit having a (meth)acryloyloxy group as a crosslinkable group is 10 mol% to 70 mol of the total structural units of the polymer having a carboxyl group. %, more preferably 20 mol% to 50 mol%.

When the ratio of structural units having (meth)acryloyloxy groups is within the above range, heat resistance and development defects during development are reduced, and generation of development residues can be suppressed.

The structural unit (U3) is preferably a structural unit derived from a polymerizable unsaturated compound having a silyl group (hereinafter referred to as "compound (u3)").

Examples of the compound (u3) include 3-(meth)acryloyloxypropylmethyldimethoxysilane, 3-(meth)acryloyloxypropylethyldimethoxysilane, 3-(meth)acryloyloxypropyltrimethoxysilane, and 3-(meth)acryloyloxypropyltrimethoxysilane. ) acryloyloxypropyltriethoxysilane and the like.

The above-mentioned compound (u3) can be used alone or in combination of two or more.

The above structural unit (U4) is a structural unit other than the above (U1) to (U3), and is a polymerizable unsaturated compound other than the above (u1) to (u3) (hereinafter referred to as "compound (u4)"). It is preferable that it is a structural unit derived from.
Examples of the compound (u4) include (meth)acrylic acid alkyl ester, (meth)acrylic acid cycloalkyl ester, (meth)acrylic acid aryl ester, (meth)acrylic acid aralkyl ester, unsaturated dicarboxylic acid dialkyl ester, Examples include (meth)acrylic acid esters, vinyl aromatic compounds, conjugated diene compounds, and other polymerizable unsaturated compounds having a 5-membered oxygen-containing heterocycle or a 6-membered oxygen-containing heterocycle. Specific examples of these include (meth)acrylic acid alkyl esters such as methyl acrylate, n-propyl (meth)acrylate, i-propyl (meth)acrylate, n-butyl (meth)acrylate, ( sec-butyl meth)acrylate, t-butyl (meth)acrylate, etc.;
Examples of the (meth)acrylic acid cycloalkyl ester include cyclohexyl (meth)acrylate, 2-methylcyclohexyl (meth)acrylate, and tricyclo[5.2.1.0 ^2,6 ]decane-8 (meth)acrylate. -yl, 2-(tricyclo[5.2.1.0 ^2,6 ]decane-8-yloxy)ethyl (meth)acrylate, isobornyl (meth)acrylate, etc.;
As the (meth)acrylic acid aryl ester, for example, phenyl acrylate, etc.;
As the (meth)acrylic acid aralkyl ester, for example, benzyl (meth)acrylate, etc.;
Examples of unsaturated dicarboxylic acid dialkyl esters include diethyl maleate, diethyl fumarate, etc.;
Examples of (meth)acrylic acid esters having an oxygen-containing 5-membered heterocycle or an oxygen-containing 6-membered heterocycle include tetrahydrofuran-2-yl (meth)acrylate, tetrahydropyran-2-yl (meth)acrylate, and (meth)acrylate. ) 2-methyltetrahydropyran-2-yl acrylate, etc.;
As a vinyl aromatic compound, for example, styrene, α-methylstyrene, etc.;
As a conjugated diene compound, for example, 1,3-butadiene, isoprene, etc.;
Examples of other polymerizable unsaturated compounds include 2-hydroxyethyl (meth)acrylate, acrylonitrile, methacrylonitrile, acrylamide, and methacrylamide.

Among the compounds (u4) mentioned above, in terms of copolymerization reactivity, n-butyl methacrylate, 2-methylglycidyl methacrylate, benzyl methacrylate, tricyclo[5.2.1.0 ^2,6 methacrylate] ] Decane-8-yl, styrene, p-methoxystyrene, tetrahydrofuran-2-yl methacrylate, 1,3-butadiene and the like are preferred.

Compound (u4) can be used alone or in combination of two or more.

The preferable polymer having a carboxyl group in this embodiment is synthesized by copolymerizing a mixture of polymerizable unsaturated compounds containing the above compounds (u1) to (u4) in the following proportions. be able to.
In addition, by reacting a (meth)acrylic acid ester having an epoxy group with the carboxyl group in the structural unit derived from compound (u1) in the obtained copolymer, a (meth)acryloyloxy group can be formed. It can have a structural unit having the following structure.

Compound (u1): preferably 0.1 mol% to 30 mol%, more preferably 1 mol% to 20 mol%, even more preferably 5 mol% to 15 mol%
Compound (u2): preferably 1 mol% to 95 mol%, more preferably 10 mol% to 60 mol%, even more preferably 20 mol% to 30 mol%
Compound (u3): preferably 50 mol% or less, more preferably 1 mol% to 40 mol%, even more preferably 10 mol% to 30 mol%
Compound (u4): preferably 80 mol% or less, more preferably 1 mol% to 60 mol%, even more preferably 25 mol% to 50 mol%
It is preferable to use it within the range of .

A polymerizable composition containing a polymer having a carboxyl group obtained by copolymerizing a mixture of polymerizable unsaturated compounds containing compounds (u1) to (u4) in the above range has good coating properties. This method is preferable because high resolution can be achieved without impairing the image quality, and a cured film with highly balanced properties can be provided even with a high-definition pattern.

The weight average molecular weight (Mw) of the polymer having a carboxyl group may be one that facilitates patterning, for example, the weight average molecular weight (Mw) described in "(1) Photocurable component" in "2. It can be the same as the carboxyl group-containing resin. By using the above polymer, high resolution can be achieved without sacrificing good coating properties, so even with a high-definition pattern, a cured film with highly balanced properties can be provided. becomes.

A polymer having a carboxyl group can be produced by polymerizing a mixture of the above polymerizable unsaturated compounds, preferably in a suitable solvent, preferably in the presence of a radical polymerization initiator.

Examples of the solvent used in the above polymerization include diethylene glycol monoethyl ether acetate, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol dimethyl ether, propylene glycol monomethyl ether, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl Examples include ether acetate, 3-methoxybutyl acetate, cyclohexanol acetate, benzyl alcohol, and 3-methoxybutanol. These solvents can be used alone or in combination of two or more.

The radical polymerization initiator is not particularly limited, and examples thereof include 2,2'-azobisisobutyronitrile, 2,2'-azobis-(2,4-dimethylvaleronitrile), 2,2 '-Azobis-(4-methoxy-2,4-dimethylvaleronitrile), 4,4'-azobis(4-cyanovaleric acid), dimethyl-2,2'-azobis(2-methylpropionate), 2, Examples include azo compounds such as 2'-azobis(4-methoxy-2,4-dimethylvaleronitrile). These radical polymerization initiators can be used alone or in combination of two or more.

Preferred examples of the above carboxyl group-containing polymer include the following [Compound U1] and [Compound U2].

[Polymer U1]
A flask equipped with a cooling tube and a stirrer was charged with 4 parts by mass of 2,2'-azobisisobutyronitrile and 190 parts by mass of propylene glycol monomethyl ether acetate, followed by 55 parts by mass of methacrylic acid and 45 parts by mass of benzyl methacrylate. , and 2 parts by mass of α-methylstyrene dimer as a molecular weight modifier, the temperature of the solution was raised to 80°C while stirring gently, this temperature was maintained for 4 hours, and then raised to 100°C. A solution containing the copolymer is obtained by polymerizing while maintaining the temperature for 1 hour.
Next, 1.1 parts by mass of tetrabutylammonium bromide and 0.05 parts by mass of 4-methoxyphenol as a polymerization inhibitor were added to the solution containing this copolymer, and after stirring at 90°C for 30 minutes in an air atmosphere, methacrylic One example is a polymer U1 having a weight average molecular weight Mw of 9000 obtained by adding 74 parts by mass of glycidyl acid and reacting at 90° C. for 10 hours.
The polymer U1 has a structural unit (U1), a structural unit (U2), and a structural unit (U4).

[Polymer U2]
A flask equipped with a cooling tube and a stirrer was charged with 5 parts by mass of 2,2'-azobisisobutyronitrile and 250 parts by mass of 3-methoxybutyl acetate, and further 18 parts by mass of methacrylic acid and 5.2 parts by mass of tricyclo methacrylate. .1.0 ^2.6 ] 25 parts by mass of decane-8-yl, 5 parts of styrene, 20 parts by mass of 3-acryloxypropyltrimethoxysilane, and 32 parts by mass of glycidyl methacrylate were charged, the mixture was purged with nitrogen, and then gently stirred. while increasing the temperature of the solution to 80°C. A polymer U2 having a weight average molecular weight Mw of 12,000 obtained by polymerizing while maintaining this temperature for 5 hours can be mentioned.
The polymer U2 has a structural unit (U1), a structural unit (U2), a structural unit (U3), and a structural unit (U4).

8. Additives The above composition may be used, as necessary, with an organic solvent for dissolving or dispersing each of the above components, a solvent such as water, a dispersant for dispersing the coloring material, a thermal polymerization inhibitor; a plasticizer; an adhesion promoter; an antifoaming agent. agent; leveling agent; surface conditioner; antioxidant; ultraviolet absorber; dispersion aid; anti-aggregation agent; adhesion promoter; crosslinking agent; thickener, organic polymer such as elastomer, chain transfer agent, sensitizer , surfactants, silane coupling agents, and other conventional additives can be added.
As the silane coupling agent, elastomer, ultraviolet absorber, antioxidant, organic solvent, thermal polymerization inhibitor, etc., those described in JP-A-2017-111453 can be used, for example.

9. Composition The composition may be manufactured by any method that allows mixing of the components described above, and any known mixing means may be used.

The composition is preferably used in applications that require curing by at least one of light and heat, such as thermosetting paints, photocurable paints or varnishes, thermosetting adhesives, and photocurable coatings. Curable adhesives, printed circuit boards, color filters for color LCD panels for color televisions, PC monitors, personal digital assistants, digital cameras, etc., color filters for CCD image sensors, photo spacers, black column spacers, plasma display panels. Electrode materials for touch panels, touch sensors, powder coatings, printing inks, printing plates, adhesives, dental compositions, stereolithography resins, gel coats, photoresists for electronics, electroplating resists, etching resists, liquid and Both dry films, solder resists, resists for producing color filters for various display applications or for forming structures in the manufacturing process of plasma display panels, electroluminescent displays, and LCDs, electrical and electronic components. Compositions for encapsulation, solder resists, magnetic recording materials, micromechanical components, waveguides, optical switches, plating masks, etching masks, color test systems, glass fiber cable coatings, screen printing stencils, tertiary by stereolithography Materials for producing original objects, materials for holographic recording, image recording materials, microelectronic circuits, bleaching materials, bleaching materials for image recording materials, bleaching materials for image recording materials using microcapsules, printed wiring boards Various applications such as photoresist materials for UV and visible laser direct imaging systems, photoresist materials used for dielectric layer formation in sequential lamination of printed circuit boards, photoresist materials for 3D mounting or protective films, etc. There are no particular restrictions on its use.
In the present disclosure, among others, applications that require a cured product with excellent durability are preferred, such as color filters, photo spacers, black column spacers, electrode materials, photoresists, solder resists, overcoats, and insulating films. , a black matrix, a partition material, etc., and particularly, a solder resist.

B. Solder Resist Composition Next, the solder resist composition of the present disclosure will be described.
The solder resist composition of the present disclosure is characterized by comprising the above-mentioned composition.

According to the present disclosure, a solder resist with excellent durability can be formed by using the above-described composition.
Note that the contents of the composition are the same as those described in the section "A. Composition" above, so a description thereof will be omitted here.

The solder resist composition, which is composed of the above composition, may be in a liquid form or in a dry film form.
As for the liquid composition, the above composition itself can be used.
The dry film may be solid at 25° C., and a dried coating film of a liquid composition may be used.
A dry film-like solder resist composition may be used, for example, as a laminate formed on a carrier film.
In the laminate, a cover film that can be peeled from the dry film solder resist composition may be laminated on the dry film solder resist composition, if necessary.
The method for forming such a laminate is to form a dry film solder resist composition consisting of a dry coating film of the above composition on a carrier film, and then laminate a cover film thereon, or to coat the cover film with a similar coating. A method of forming a dry film solder resist composition by a method and then laminating this laminate on a carrier film to obtain a dry film solder resist composition is exemplified.
As the carrier film, a thermoplastic film such as a polyester film having a thickness of 2 to 150 μm is used.
As the cover film, polyethylene film, polypropylene film, etc. can be used, but it is preferable that the adhesive strength of the above-mentioned composition to the dry coating film is smaller than that of the carrier film.
As a method for forming a solder resist on a printed wiring board using the above laminate, the cover film is peeled off from the laminate, the dry film solder resist composition and the circuit-formed base material are stacked, and a laminator or the like is used to and laminated together to form a dry film-like solder resist composition on the circuit-formed base material. Examples of the step of polymerizing the curable components of the formed dry film solder resist composition include a method of subjecting the formed dry film solder resist composition to light irradiation treatment, heat treatment, and the like.

C. Cured Product Next, the cured product of the present disclosure will be described.
The cured product of the present disclosure is characterized by being a cured product of the above-mentioned composition or the above-described solder resist composition.

According to the present disclosure, by using the above-described composition, excellent durability can be achieved.

The cured product of the present disclosure uses the above-mentioned composition.
Hereinafter, the cured product of the present disclosure will be explained in detail.
Note that the contents of the composition can be the same as those described in the sections "A. Composition" and "B. Solder resist composition" above, so a description thereof will be omitted here.

The cured product has a polymer in which curable components are polymerized with each other.

Even if the phenolic hydroxyl group of Compound A contained in the cured product is protected by the protecting group R ¹⁰² and its ultraviolet absorbing ability, antioxidant ability, etc. are inactivated, the protecting group R ^{102 is removed and the phenolic hydroxyl group is protected by the protecting group R 102} . Hydroxyl groups may be generated and ultraviolet absorbing ability, antioxidant ability, etc. may be in an active state, but from the viewpoint of providing excellent durability, it is preferable to be in an active state.

The planar shape of the cured product can be appropriately set depending on the use of the cured product, and is preferably in a pattern such as a dot shape or a line shape. This is because the cured product can be easily used as a patterned film such as a solder resist.

The use of the cured product can be the same as described in the section "A. Composition" above.

The method for producing the cured product is not particularly limited as long as it is a method that can form the cured product of the composition into a desired shape.
As such a manufacturing method, for example, the manufacturing method described in the section "D. Manufacturing method of cured product" described below can be used.

D. Method for manufacturing a cured product Next, a method for manufacturing a cured product of the present disclosure will be described.
The method for producing a cured product of the present disclosure is characterized by including a step of polymerizing curable components contained in the above-mentioned composition or the above-mentioned solder resist composition.

According to the present disclosure, since the compound A is included, the polymerization step can be easily carried out.

The manufacturing method of the present disclosure includes a step of polymerizing.
Each step of the manufacturing method of the present disclosure will be described in detail below.

1. Step of Polymerizing The step of polymerizing in the production method of the present disclosure is to polymerize the above-mentioned curable components.
Here, the method for polymerizing the curable components differs depending on the type of the curable component, but when the curable component includes a photocurable component, a mask having a desired pattern shape is used. A method in which the composition is irradiated with light via a light source, etc. can be used.
The light irradiated onto the composition may include light with a wavelength of 300 nm to 450 nm.
Examples of the light source for the light irradiation include low-pressure mercury, medium-pressure mercury, high-pressure mercury, ultra-high-pressure mercury, mercury vapor arc, carbon arc, xenon arc, and light-emitting diode.
Laser light may be used as the irradiated light. As the laser light, one containing light with a wavelength of 340 to 430 nm can be used.
As the laser light source, those that emit light in the visible to infrared region, such as argon ion laser, helium neon laser, YAG laser, and semiconductor laser, can also be used.
In addition, when using these lasers, the said composition can contain the sensitizing dye which absorbs the said range from visible to infrared.

In the above polymerization method, for example, when the composition contains a thermosetting component as a curable component, the composition can be subjected to a heat treatment.
The heating temperature may be any temperature as long as it can stably cure the above composition, and may be from 140°C to 180°C.
The heating time can be about 10 seconds to 3 hours.

The types of polymerization methods described above may include only one type, or may include two or more types.
For example, when the curable component contains both a photocurable component and a thermosetting component, the heat treatment can be performed after the light irradiation treatment.

2. Step of Eliminating The above production method can include a step of eliminating the protecting group R ¹⁰² from the compound A.
This is because by including such a step, a cured product with excellent durability can be easily formed.

Examples of the method for removing the protecting group R ¹⁰² in this step include a method of heat-treating the compound A, a method of subjecting the compound A to light irradiation, and the like.
Examples of the method for heat-treating the compound A include a method of heating a coating film of the composition using a hot plate, an oven, or the like.
The heating temperature for the compound A may be a temperature higher than the temperature at which the protecting group R ¹⁰² is eliminated.
In addition, when the composition contains an acid catalyst, a base catalyst, etc., the heating temperature can be set to be equal to or lower than the desorption temperature observed for the protecting group R ¹⁰² alone.
The heating temperature may be the same as described in the section "1. Compound A" of "A. Composition" above.
The heating time can be 5 minutes or more and 3 hours or less.

As a method for irradiating the compound A with light, for example, a method of irradiating a composition or a cured product with light can be used.
The wavelength of the light irradiated to the composition or cured product can be the same as described in the section "1. Compound A" of "A. Composition" above.
As the light source for the light irradiation, the light source described in the above "1. Polymerization step" can be used.
The cumulative amount of light for the compound A can be equal to or greater than the cumulative amount of light that causes the protective group R ¹⁰² to be removed.
The cumulative amount of light can be, for example, the same as described in the section "1. Compound A" of "A. Composition" above.

The timing for carrying out this step may be any timing as long as a cured product having desired durability can be obtained.
For example, the above-mentioned implementation timing may be carried out simultaneously with the above-mentioned polymerization step when this step is a step of light irradiation treatment and the above-mentioned composition contains a photocurable component as a curable component.
In addition, the above implementation timing is a heat treatment step, and when the composition includes a photocurable component as a curable component, in the polymerization step, a light irradiation treatment is performed to polymerize the photocurable components together. Preferably after.
If this step is a step of heat treatment, the timing of implementation of this step may be the same time as the heat treatment for curing the thermosetting components together in the polymerization step or the post-bake step described below. good.

3. Other Steps The method for producing the cured product may include other steps as necessary in addition to the polymerization step and desorption step.
The other steps include, after the polymerization step, a development step of removing the uncured portion in the coating film of the composition to obtain a patterned cured product, and after the polymerization step, heat-treating the cured product. A post-bake step to improve the physical strength, a pre-bake step to heat-treat the composition to remove the solvent in the composition before the polymerization step, and a coating film of the composition before the polymerization step. Examples include a step of forming.

An example of a method for removing the unpolymerized portion in the development step is a method of applying an alkaline developer to the unpolymerized portion.
As the alkaline developer, commonly used alkaline developers such as a tetramethylammonium hydroxide (TMAH) aqueous solution and a potassium hydroxide aqueous solution can be used.
The development step may be performed after the polymerization step, but from the viewpoint of producing a patterned cured product with good patterning accuracy, it is preferably before the desorption step. .
The heating conditions in the post-baking step may be any conditions as long as they can improve the strength etc. of the cured product obtained in the polymerization step, and may be, for example, at 130° C. or higher and 250° C. or lower for 20 minutes to 90 minutes. .
The heating conditions in the pre-baking step may be any conditions as long as they can remove the solvent in the composition and form a dry coating film of the composition, for example, at 70°C or higher and 150°C or lower for 30 seconds to 300 seconds. be able to.
In the step of forming the coating film, the coating film of the composition may be formed using known methods such as spin coater, roll coater, bar coater, die coater, curtain coater, various printing, dipping, etc. A method of applying the above composition may be mentioned.
The above-mentioned coating film can be formed on a base material.
The above-mentioned base material can be selected as appropriate depending on the intended use of the cured product, and includes, for example, a printed wiring board with a circuit formed in advance, a flexible printed wiring board, paper-phenol resin, paper-epoxy resin, glass Composite materials such as cloth-epoxy resin, glass-polyimide, glass cloth/non-woven fabric-epoxy resin, glass cloth/paper-epoxy resin, synthetic fiber-epoxy resin, fluororesin/polyethylene/polyphenylene ether, polyphenylene oxide/cyanate ester, etc. Copper-clad laminates, polyimide films, PET films, glass substrates, ceramic substrates, wafer plates, etc. of all the grades used (FR-4, etc.) can be used.
Moreover, after the cured product is formed on a base material, it may be peeled off from the base material and used, or it may be used after being transferred from the base material to another adherend.
Moreover, the above-mentioned carrier film, cover film, etc. can also be used as the above-mentioned base material.

4. Others Regarding the cured product produced by the above production method and its uses, etc., the contents can be the same as those described in the section of "C. Composition" above.

E. Laminate The laminate of the present disclosure is characterized by having a circuit board and a solder resist made of a cured product of the above-mentioned composition.

According to the present disclosure, since the solder resist is formed using the above-described composition, the circuit board has excellent stability.

The solder resist is made of a cured product of the above-mentioned composition.
Here, the composition may be the same as described in "A. Composition" and "B. Solder resist composition" above.
The cured product may be the same as described in the section "C. Cured product" above.
The shape of the solder resist in plan view may be any shape that covers areas that require prevention of solder adhesion and protection from external environments such as high temperature and high humidity, and may be set as appropriate depending on the type of circuit board, etc. It is something.
As the circuit board, a known printed wiring board, flexible printed wiring board, or the like, which has an insulating substrate and a patterned wiring layer formed on the insulating substrate, can be used.

F. Composition 2
Composition 2 of the present disclosure is characterized by containing the above compound A and a positive resin.
Here, the above Compound A can be the same as described in the section "1. Compound A" of the above "A. Composition".
Further, as the positive resin, a known positive resin can be used.
Examples of such positive resins include alkali-soluble resins having phenolic hydroxyl groups.
Furthermore, examples of the dissolution inhibitor used with the positive resin include quinonediazide compounds.

According to the present disclosure, since the compound A is contained, for example, after the exposed portion is developed and removed and patterned, ultraviolet absorbing ability and antioxidant ability can be developed by heat treatment or the like. Furthermore, functions such as ultraviolet absorption ability are inactivated before patterning.
Therefore, with the composition 2, patterning is easy and a composition with excellent durability can be easily obtained.

The present disclosure is not limited to the above embodiments. The above-mentioned embodiments are illustrative, and any embodiment that has substantially the same configuration as the technical idea stated in the claims of the present disclosure and provides similar effects is the present invention. within the technical scope of the disclosure.

Hereinafter, the present disclosure will be described in more detail with reference to Examples, but the present disclosure is not limited to these Examples.

[Manufacture example 1-1]
Mix 0.01 mol of a phenol compound (compound A1'-1 below), 0.05 mol of di-tert-butyl dicarbonate, and 30 g of pyridine, add 0.025 mol of 4-dimethylaminopyridine at room temperature under a nitrogen atmosphere, and heat at 60°C. The mixture was stirred for 3 hours. After cooling to room temperature, the reaction solution was poured into 150 g of ion-exchanged water, and 200 g of chloroform was added to perform oil-water separation. After drying the organic layer over anhydrous sodium sulfate, the solvent was distilled off, and 100 g of methanol was added to the residue for crystallization. The obtained white powdery crystals were dried under reduced pressure at 60° C. for 3 hours to obtain the desired product (the following general formula (A1-1)). It was confirmed by ¹ H-NMR that the obtained white powdery crystals were the desired product. The results are shown in Table 1 below.
Note that the obtained compound can be activated by heat treatment.

[Production Examples 1-2 to 1-8]
In the same manner as in Production Example 1-1, the following general formulas A1-2 and A1-3 were synthesized using the following general formula phenol compounds A1'-2 and A1'-3.
In addition, in the same manner as in Production Example 1-1, using the following general formula phenol compounds B1'-1, B2'-1, B3'-1, B3'-2 and B3'-3, the following general formula B1- 1, B2-1, B3-1, B3-2 and B3-3 were synthesized.
It was confirmed by ¹ H-NMR that the obtained compound was the target compound. The results are shown in Table 1 below.
Note that all of the obtained compounds can be activated by heat treatment.

[Production example 2-1]
0.003 mol of the phenol compound (A1'-4) in the following formula (S1), 0.0062 mol of potassium carbonate, and 10 g of DMF were mixed, and 0.0075 mol of o-nitrobenzyl chloride was added dropwise at room temperature under a nitrogen atmosphere for 10 hours. The mixture was stirred and subjected to the following reaction to obtain a compound I-1-151 represented by the following general formula (I-1-151) corresponding to compound A (compound A1). 50 g of ethyl acetate and 50 g of ion-exchanged water were added to the reaction solution to separate oil and water. After drying the organic layer over anhydrous sodium sulfate, the solvent was distilled off and separated using a silica column (hexane:ethyl acetate=9:1). After separation, the resulting white solid was washed with methanol and dried under reduced pressure at 40°C for 2 hours to obtain the desired product. It was confirmed by ¹ H-NMR that the obtained white solid was the desired product. It is shown in Table 1 below.
Note that the obtained compound can be activated by light irradiation treatment.

[Manufacture example 3-1]
0.005 mol of the phenol compound (B1'-2) in the following formula (S2), 0.005 mol of potassium carbonate, and 12 g of DMF were mixed, and 0.0075 mol of o-nitrobenzyl chloride was added dropwise at room temperature under a nitrogen atmosphere at 80°C. The mixture was stirred for 2 hours, and Compound II-1-2 corresponding to Compound A (Compound B1) was obtained by the following reaction. 50 g of ethyl acetate and 50 g of ion-exchanged water were added to the reaction solution to separate oil and water. After drying the organic layer over anhydrous sodium sulfate, the solvent was distilled off, and crystallization was performed with methanol. The obtained white solid was dried under reduced pressure at 45° C. for 2 hours to obtain the target product (Compound II-1-2). It was confirmed by ¹ H-NMR and IR that the obtained white solid was the desired product. The NMR results are shown in Table 1 below.
Note that the obtained compound can be activated by light irradiation treatment.

[Production Examples 3-2 to 3-7]
The following compounds II-1-3, II-1-8, II-1-33, II-1-36, II-1- were prepared in the same manner as in Production Example 3-1 except that o-nitrobenzyl chloride was changed. 29, II-1-35 was obtained.
Specifically, for compound II-1-3, 1.1 equivalents of N-bromosuccinimide and 0.01 equivalents of AIBN were heated and stirred at 90°C for 4 hours in a chlorobenzene solvent with respect to 2-ethylnitrobenzene. . Oil and water were separated using ethyl acetate, washed with water, and purified using a silica column to obtain the corresponding benzyl bromide compound. This benzyl bromide compound was used in place of o-nitrobenzyl chloride to obtain compound II-1-3.
In compound II-1-8, 4-chloro-2-nitrotoluene was used instead of 2-ethylnitrobenzene.
In compounds II-1-33, II-1-36, II-1-29, and II-1-35, 4'-methoxyphenacyl bromide and 2-bromo-2- were used instead of o-nitrobenzyl chloride, respectively. It was obtained using phenylacetophenone, 2-bromo-2'-nitroacetophenone, and 4-bromomethyl-7-methoxycoumarin.
Furthermore, it was confirmed by ¹ H-NMR that the obtained white solid was the desired product. The results are shown in Table 1 below.
Note that all of the obtained compounds can be activated by light irradiation treatment.

[Production Examples 3-8 to 3-12]
The following compounds II-1-41 to II-1-45 were obtained in the same manner as in Production Example 3-1 except that o-nitrobenzyl chloride was changed.
Specifically, for compound II-1-41, 1.1 equivalents of N-bromosuccinimide and 0.01 equivalents of AIBN were added to 4-methoxy-2-nitrotoluene at 90°C for 4 hours in a chlorobenzene solvent. The mixture was heated and stirred. Oil and water were separated using ethyl acetate, washed with water, and purified using a silica column to obtain the corresponding benzyl bromide compound. This benzyl bromide compound was used in place of o-nitrobenzyl chloride to obtain compound II-1-41.
In compounds II-1-42 to II-1-44, 3-chloro-2-nitrotoluene, 3-methoxy-2-nitrotoluene and 3-methoxy-2-nitrotoluene were used instead of 4-methoxy-2-nitrotoluene, respectively. -6-bromotoluene was used.
Compound II-1-45 was obtained by using 2-bromo-2'-methylacetophenone in place of o-nitrobenzyl chloride.
Furthermore, it was confirmed by H-NMR that the obtained white solid was the desired product.
[Manufacturing example 3-13]
An intermediate compound was obtained in the same manner as in Production Example 3-1 except that o-nitrobenzyl chloride was replaced with 4-(2-bromoacetyl)phenyl t-butyl carbonate. Thereafter, 0.0035 mol of the intermediate compound was dissolved in 5 ml of ethyl acetate, 5 ml of a 4M HCl ethyl acetate solution was added, and the mixture was heated and stirred at 50° C. for 10 hours. The solvent of the reaction solution was distilled off and isolated using a silica column (ethyl acetate:hexane=1:2) to obtain the target product (compound II-1-46). It was confirmed by H-NMR that the obtained white solid was the desired product.

[Manufacture example 3-14]
0.004 mol of the phenol compound (formula (B1'-2) above) was dissolved in 40 mL of pyridine, and 0.006 mol of NPPOC-Cl (2-(2-nitrophenyl)propyl chloroformate) was added dropwise for 6 hours. Stir at room temperature. 200 g of ethyl acetate and 50 g of ion-exchanged water were added to the reaction solution to separate oil and water. The organic layer was washed twice with diluted hydrochloric acid and three times with ion-exchanged water, the solvent was distilled off, and the layer was isolated using a silica column (ethyl acetate:hexane=1:4). The obtained white solid was dispersed in hexane and then dried under reduced pressure at 45° C. for 2 hours to obtain the target product (Compound II-1-47). It was confirmed by H-NMR that the obtained white solid was the desired product.

[Manufacturing examples 3-15 to 3-17]
The following compounds II-1-48 to II were prepared in the same manner as in Example 1, except that the phenol compound was changed to the above formula (B1'-1), the above formula (B3'-3), and the following formula (B2'-2). -1-50 was obtained.

[Manufacture example 4-1]
A resin solution of a carboxyl group-containing resin with a solid content other than the solvent having an acid value of 88 mgKOH/g and a solid content concentration of 71% was obtained by a method similar to Synthesis Example 1 of JP 2017-111453A.

[Production example 4-2]
A resin solution of a carboxyl group-containing resin with a solid content other than the solvent having an acid value of 89 mgKOH/g and a solid content concentration of 65% was obtained by a method similar to Synthesis Example 2 of JP 2017-111453A.

[Examples 1 to 58, Comparative Examples 1 to 13]
Compound A, antioxidant, ultraviolet absorber, curable component (photocurable component, thermosetting component), photoradical polymerization initiator, curing catalyst, and other additives according to the formulations listed in Tables 4 to 10 below. A composition was obtained by blending the following.
In addition, the following materials were used for each component.
Note that the blending amounts in the table represent parts by mass of each component.

(latent antioxidant)
A1: Compound A1-1 produced in Production Example 1-1 (latent antioxidant, thermal leaving group)
A2: Compound A1-2 produced in Production Example 1-2 (latent antioxidant, thermal leaving group)
A3: Compound A1-3 produced in Production Example 1-3 (latent antioxidant, thermal leaving group)
A4: Compound B1-1 produced in Production Example 1-4 (latent ultraviolet absorber, thermal leaving group)
A5: Compound B2-1 produced in Production Example 1-5 (latent ultraviolet absorber, thermal leaving group)
A6: Compound B3-1 produced in Production Example 1-6 (latent ultraviolet absorber, thermal leaving group)
A7: Compound B3-2 produced in Production Example 1-7 (latent ultraviolet absorber, thermal leaving group)
A8: Compound B3-3 produced in Production Example 1-8 (latent ultraviolet absorber, thermal leaving group)
A9: Compound I-1-151 produced in Production Example 2-1 (latent antioxidant, photoleaving group)
A10: Compound II-1-2 produced in Production Example 3-1 (latent ultraviolet absorber, photoleaving group)
A11: Compound II-1-3 produced in Production Example 3-2 (latent ultraviolet absorber, photoleaving group)
A12: Compound II-1-8 produced in Production Example 3-3 (latent ultraviolet absorber, photoleaving group)
A13: Compound II-1-33 produced in Production Example 3-4 (latent ultraviolet absorber, photoleaving group)
A14: Compound II-1-36 produced in Production Example 3-5 (latent ultraviolet absorber, photoleaving group)
A15: Compound II-1-29 produced in Production Example 3-6 (latent ultraviolet absorber, photoleaving group)
A16: Compound II-1-35 produced in Production Example 3-7 (latent ultraviolet absorber, photoleaving group)
A17: Compound II-1-41 produced in Production Example 3-8 (latent ultraviolet absorber, photoleaving group)
A18: Compound II-1-42 produced in Production Example 3-9 (latent ultraviolet absorber, photoleaving group)
A19: Compound II-1-43 produced in Production Example 3-10 (latent ultraviolet absorber, photoleaving group)
A20: Compound II-1-44 produced in Production Example 3-11 (latent ultraviolet absorber, photoleaving group)
A21: Compound II-1-45 produced in Production Example 3-12 (latent ultraviolet absorber, photoleaving group)
A22: Compound II-1-46 produced in Production Example 3-13 (latent ultraviolet absorber, photoleaving group)
A23: Compound II-1-47 produced in Production Example 3-14 (latent ultraviolet absorber, photoleaving group)
A24: Compound II-1-48 produced in Production Example 3-15 (latent ultraviolet absorber, photoleaving group)
A25: Compound II-1-49 produced in Production Example 3-16 (latent ultraviolet absorber, photoleaving group)
A26: Compound II-1-50 produced in Production Example 3-17 (latent ultraviolet absorber, photoleaving group)

(Antioxidant)
B1: Compound A1'-1 (antioxidant) used in Production Example 1-1
B2: Compound A1'-2 (antioxidant) used in Production Example 1-2
B3: Compound A1'-3 (antioxidant) used in Production Example 1-3
B4: Compound A1'-4 (antioxidant) used in Production Example 2-1
(UV absorber)
B5: Compound B1'-1 (ultraviolet absorber) used in Production Example 1-4
B6: Compound B2'-1 (ultraviolet absorber) used in Production Example 1-5
B7: Compound B3'-1 (ultraviolet absorber) used in Production Example 1-6
B8: Compound B3'-2 (ultraviolet absorber) used in Production Example 1-7
B9: Compound B3'-3 (ultraviolet absorber) used in Production Example 1-8
B10: Compound B1'-2 (ultraviolet absorber) used in Production Example 3-1
B11: Compound B2'-2 (ultraviolet absorber) used in Production Example 3-17

(Photocurable component: compound containing carboxyl group)
C1: Resin solution of carboxyl group-containing resin produced in Production Example 4-1 (solid content acid value 88 mgKOH/g, solid content concentration 71%)
C2: Resin solution of carboxyl group-containing resin produced in Production Example 4-2 (solid content acid value 89 mgKOH/g, solid content concentration 65%)
C3: Acid anhydride additive of bisphenol F type epoxy acrylate (ZFR-1122 manufactured by Nippon Kayaku Co., Ltd., solid content 65% by mass).
C4: Acid anhydride additive of bisphenol A type epoxy acrylate (ZAR-2000 manufactured by Nippon Kayaku Co., Ltd., solid content 65% by mass).
C5: Acid-modified urethanized epoxy methacrylate resin (FLX-2089 manufactured by Nippon Kayaku Co., Ltd., solid content 65% by mass).
C6: Carboxyl group-containing resin having a polyfunctional epoxy with a bisphenol novolak structure (ZCR-1601H manufactured by Nippon Kayaku Co., Ltd., solid content 65% by mass).

(Photocurable component: compound that does not contain carboxyl groups)
D1: dipentaerythritol hexaacrylate D2: EBECRYL8402 manufactured by Daicel Cytec, bifunctional urethane acrylate D3: Aronix M-6200 manufactured by Toagosei Co., Ltd., bifunctional polyester acrylate D4: Kayamer PM-2 manufactured by Nippon Kayaku Co., Ltd., Bis(2) -Methacryloyloxyethyl) acid phosphate, methacrylate monomer having phosphate ester structure D5: Trimethylolpropane triacrylate D6: 1,6-hexanediol diacrylate D7: 4HBA, 4-hydroxybutyl acrylate manufactured by Nippon Kasei Co., Ltd.

(thermosetting component)
E1: Biphenyl type epoxy resin (NC3000 manufactured by Nippon Kayaku Co., Ltd.)
E2: Biphenyl type epoxy resin (YX-4000 manufactured by Mitsubishi Chemical Corporation)
E3: Bisphenol A epoxy resin (Epicron 860 manufactured by DIC)
E4: Cresol novolac type epoxy resin (Epicron N-660 manufactured by DIC)
E5: Phenol novolac type epoxy resin (Epicron N770 manufactured by DIC)
E6: Bisphenol F type epoxy resin (YDF-2004 manufactured by Toto Kasei Co., Ltd.)
E7: Methylated melamine resin (Mw-100LM: manufactured by Sanwa Chemical Co., Ltd.)

(Photoradical polymerization initiator)
F1: IRGACURE TPO (manufactured by BASF Japan)
F2: IRGACURE OXE02 (manufactured by BASF Japan)

(curing catalyst)
G1: Dicyandiamide (curing catalyst)
G2: Imidazole curing catalyst (curing catalyst, 2PHZ manufactured by Shikoku Kasei Kogyo Co., Ltd.)

(filler)
H1: Silica (filler, SO-E5 manufactured by Admatex)
H2: Barium sulfate (filler, B-30 manufactured by Sakai Chemical Co., Ltd.)
H3: Talc (filler, LMS200 manufactured by Fuji Talc Co., Ltd.)
H4: Titanium oxide (filler, TIPAQUE R-820 manufactured by Ishihara Sangyo Co., Ltd.)
(Other additives)
I1: pigment blue 15 (color material)
I2: pigment yellow 14 (color material)
J1: Dipropylene glycol monomethyl ether (solvent)

[evaluation]
The following heat shock test was conducted for Examples and Comparative Examples.

1. Sample for evaluation Each composition obtained in Examples and Comparative Examples was applied to a 1.6 mm thick FR-4 copper clad laminate so that the film thickness after curing would be 30 μm, and then heated at 80°C. and dried for 30 minutes.
Next, it was exposed to ultraviolet light at an integrated light intensity of 3000 mJ/cm ² .
Next, a heat treatment was performed at 230° C. for 90 minutes to obtain a sample for evaluation.

2. Heat resistance test A heat shock test was conducted on 100 evaluation samples, in which one cycle consisted of holding at -30°C for 1 hour, then increasing the temperature to 80°C and holding for 1 hour, and repeating this for a total of 100 cycles. .
This test was conducted on 100 evaluation samples for each, and the evaluation samples after the test were visually observed to confirm the presence or absence of cracks that had occurred in the cured product. The results are shown in Tables 4 to 10 below.
Note that the number of cracks indicates the number of evaluation samples in which cracks have occurred among the 100 evaluation samples.
〇: 10 sheets or less △: More than 10 sheets and 30 sheets or less ×: More than 30 sheets and 50 sheets or less

3. Light resistance test The evaluation sample was irradiated with light using a metal halide lamp so that the cumulative amount of light at a wavelength of 350 nm was 150 J/cm ² .
Next, according to the test method of JIS-D0202, 100 grids of 1 mm x 1 mm in size were carved into the coating film of the evaluation sample, and the state of peeling was visually observed after a peeling test with cellophane tape. It was evaluated based on the criteria. The results are shown in Tables 4 to 10 below.
It is expressed by the number of remaining grid squares, and the larger the number, the better the adhesion.
〇: 90 or more pieces △: 50 or more but less than 90 pieces ×: Less than 50 pieces

4. Photolithographic evaluation The compositions of Examples and Comparative Examples were spin-coated onto glass substrates, prebaked at 90°C for 120 seconds using a hot plate, and then cooled at 23°C for 60 seconds.
Thereafter, exposure was performed using an ultra-high pressure mercury lamp through a photomask (mask opening 50 μm) (exposure gap 300 μm, exposure amount 500 mJ/cm ² ).
After developing for 60 seconds using a 0.04% by mass KOH aqueous solution as a developer, it was thoroughly washed with water, and post-baked for 60 minutes at 150° C. using a clean oven to fix the pattern and obtain a sample for evaluation.
The obtained pattern was observed with an optical microscope, and the line width of the portion corresponding to the mask opening was measured. The obtained line width is within the range of ±2.5 μm based on the mask opening of 50 μm as a reference, ○, the line width exceeding ±2.5 μm and within the range of ±5 μm is △, and the line width exceeding ±5 μm is ×. And so. The results are shown in Tables 4 to 10 below.
Note that the line width is so controlled that there is no difference from the set line width, and it can be judged that the photolithography properties are good.

[summary]
From the Examples and Comparative Examples, it was confirmed that by using Compound A, the heat resistance evaluation and light resistance evaluation were better than when using an antioxidant or ultraviolet absorber having a phenolic hydroxyl group. did it.
Furthermore, when Comparative Example 2 and Comparative Example 3 were compared, an increase in the number of evaluation samples with cracks was observed in Comparative Example 3 than in Comparative Example 2.
On the other hand, when Example 1, Example 9, and Example 10 were compared, it was observed that the number of evaluation samples with cracks decreased in the order of Example 1, Example 9, and Example 10.
From this result, Compound A has little inhibition of polymerization between curable components, so even if the amount added is increased, it is possible to form a cured product with sufficient curing, and the heat resistance can be improved depending on the amount added. It is presumed that this was because they were able to achieve this goal.

Claims (4)

A compound represented by the following general formula (A),
a photoradical polymerization initiator including an oxime ester photopolymerization initiator and an acylphosphine polymerization initiator;
a curable component including a photocurable component;
and at least one filler selected from silica or titanium oxide,
A solder resist composition characterized in that the content of the filler is 5 parts by mass or more and 200 parts by mass or less based on 100 parts by mass of the curable component.

(In the formula, ring ^A1 represents a benzene ring,
R ¹⁰¹ each independently represents an aliphatic group having 1 to 40 carbon atoms which may have a substituent, or an aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent; Represents a ring-containing group or a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
R ¹⁰² is an aliphatic group having 1 to 40 carbon atoms, which may have a substituent, in which the methylene group at the terminal on the oxygen atom side is substituted with -CO-O-, or the following general group. Formulas (C-1), (C-2), (C-3), (C-4), (C-5), (C-6), (C-7), (C-8), ( A group represented by a formula selected from C-9) and (C-10),
An aliphatic group having 1 to 40 carbon atoms which may have a substituent used in R ¹⁰¹ , an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent and one or more of the methylene groups in the heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent, is a carbon-carbon double bond, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O -, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -S-S- or -SO ₂ - Or these groups may be replaced with groups that are combined under conditions that they are not adjacent to each other,
A plurality of R ^101s may be combined to form a benzene ring or a naphthalene ring,
The plurality of R ¹⁰¹ and R ¹⁰² may be the same or different, n represents an integer of 1 to 10, d represents an integer of 0 to 4, and k represents an integer of 1 or more. , d and k are less than the number of substituents that ring A ¹ can have,
X represents an n-valent group. )

(In the formula, R ¹¹¹ , R ¹¹³ , R ¹¹⁶ , R ¹¹⁸ , R ¹¹⁹ , R ¹²⁰ , R ¹²³ , R ¹²⁶ , R ¹²⁸ , R ¹³¹ and R ¹³³ are each independently a halogen atom, a cyano group, a hydroxyl group, Contains a nitro group, a carboxyl group, an aliphatic group having 1 to 40 carbon atoms which may have a substituent, and an aromatic hydrocarbon ring having 6 to 35 carbon atoms which may have a substituent. Represents a heterocycle-containing group having 2 to 35 carbon atoms, which may have a group or a substituent,
R ¹¹² , R ¹¹⁴ , R ¹¹⁷ , R ¹²¹ , R ¹²² , R ¹²⁴ , R ¹²⁵ , R ¹²⁷ , R ¹²⁹ , R ¹³⁰ , R ¹³² , R ¹³⁴ and R ¹³⁵ each independently represent a hydrogen atom, a halogen atom, Cyano group, hydroxyl group, nitro group, carboxyl group, aliphatic group having 1 to 40 carbon atoms which may have a substituent, aromatic group having 6 to 35 carbon atoms which may have a substituent Represents a group hydrocarbon ring-containing group or a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
R ¹¹⁵ is an aliphatic group having 1 to 40 carbon atoms which may have a substituent, an aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent, or Represents a heterocycle-containing group having 2 to 35 carbon atoms, which may have a substituent,
R ¹¹¹ , R ¹¹² , R ¹¹³ , R ¹¹⁴ , R 115 , R ¹¹⁶ , R ^{117 , R 118 ,} R ¹¹⁹ , R ¹²⁰ , R ¹²¹ , R ¹²² , R ¹²³ , R ¹²⁴ , R ¹²⁵ , ^{R 126 ,} R ¹²⁷ , R ¹²⁸ , R ¹²⁹ , R ¹³⁰ , R ¹³¹ , R ¹³² , R ¹³³ , R ¹³⁴ and R ¹³⁵ which may have substituents, aliphatic groups having 1 to 40 carbon atoms, substituents One of the methylene groups in the aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms which may have a substituent, and the heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a substituent. one or more of -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S- CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, It may be replaced with a group selected from -S-S- or -SO ₂ - or a group in which these groups are not adjacent to each other,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
A plurality of R ^111s , a plurality of R ^113s , a plurality of R ^116s , a plurality of R 118s, a plurality of R ^119s , a plurality of R ^120s , a plurality of R ^123s , a plurality of R ^126s , a plurality of R ^126s , R ^128s , multiple R ^131s , and multiple R ^133s may be bonded to each other to form a benzene ring or a naphthalene ring,
A plurality of R ¹¹¹ , R ¹¹² , R ¹¹³ , R ¹¹⁴ , R 116 , R ¹¹⁷ , R ¹¹⁸ , R ¹¹⁹ , R ¹²⁰ , R ¹²³ , R ¹²⁵ , R ¹²⁶ , R ¹²⁷ , R ¹²⁸ , ^{R 129 ,} R ¹³⁰ , R ¹³¹ , R ¹³² , R ¹³³ , R ¹³⁴ and R ¹³⁵ may each be the same or different;
b11, b12, b13, b16, b17, b18, b19 and b21 each independently represent an integer from 0 to 4,
b14, b15 and b20 each independently represent an integer from 0 to 5,
* represents a joint location. ) The solder resist composition according to claim 1, wherein the curable component further includes a thermosetting component. A cured product of the solder resist composition according to claim 1 or 2. A method for producing a cured product, comprising a step of polymerizing the curable components contained in the solder resist composition according to claim 1 or 2.