TWI720466B - 移動體裝置、曝光裝置、以及元件製造方法 - Google Patents

移動體裝置、曝光裝置、以及元件製造方法 Download PDF

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Publication number
TWI720466B
TWI720466B TW108114728A TW108114728A TWI720466B TW I720466 B TWI720466 B TW I720466B TW 108114728 A TW108114728 A TW 108114728A TW 108114728 A TW108114728 A TW 108114728A TW I720466 B TWI720466 B TW I720466B
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Taiwan
Prior art keywords
substrate
holding
axis direction
exposure
pair
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TW108114728A
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English (en)
Chinese (zh)
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TW201932994A (zh
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青木保夫
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日商尼康股份有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H10P76/2041—
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H10P72/0444—
    • H10P72/0451—

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW108114728A 2010-09-07 2011-09-06 移動體裝置、曝光裝置、以及元件製造方法 TWI720466B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US38043310P 2010-09-07 2010-09-07
US61/380,433 2010-09-07
US13/223,970 US20120064460A1 (en) 2010-09-07 2011-09-01 Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US13/223,970 2011-09-01

Publications (2)

Publication Number Publication Date
TW201932994A TW201932994A (zh) 2019-08-16
TWI720466B true TWI720466B (zh) 2021-03-01

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TW108114728A TWI720466B (zh) 2010-09-07 2011-09-06 移動體裝置、曝光裝置、以及元件製造方法
TW107101077A TWI661501B (zh) 2010-09-07 2011-09-06 移動體裝置、曝光裝置、平板顯示器之製造方法、元件製造方法、移動方法及曝光方法
TW105113427A TWI615913B (zh) 2010-09-07 2011-09-06 移動體裝置、物體處理裝置、曝光裝置、平板顯示器之製造方法、及元件製造方法
TW100132051A TWI538078B (zh) 2010-09-07 2011-09-06 移動體裝置、物體處理裝置、曝光裝置、平板顯示器之製造方法、及微型元件製造方法

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TW107101077A TWI661501B (zh) 2010-09-07 2011-09-06 移動體裝置、曝光裝置、平板顯示器之製造方法、元件製造方法、移動方法及曝光方法
TW105113427A TWI615913B (zh) 2010-09-07 2011-09-06 移動體裝置、物體處理裝置、曝光裝置、平板顯示器之製造方法、及元件製造方法
TW100132051A TWI538078B (zh) 2010-09-07 2011-09-06 移動體裝置、物體處理裝置、曝光裝置、平板顯示器之製造方法、及微型元件製造方法

Country Status (7)

Country Link
US (1) US20120064460A1 (enExample)
JP (4) JP5909934B2 (enExample)
KR (3) KR102216234B1 (enExample)
CN (2) CN103097957B (enExample)
HK (1) HK1222921A1 (enExample)
TW (4) TWI720466B (enExample)
WO (1) WO2012033212A1 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2954561B2 (ja) 1997-01-20 1999-09-27 松下電子工業株式会社 リードフレーム、リードフレームを用いた樹脂封止半導体装置の成形金型、リードフレームを用いた樹脂封止半導体装置および樹脂封止半導体装置の製造方法
US8699001B2 (en) * 2009-08-20 2014-04-15 Nikon Corporation Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
KR101862234B1 (ko) * 2009-08-20 2018-05-29 가부시키가이샤 니콘 물체 처리 장치, 노광 장치와 노광 방법, 및 디바이스 제조 방법
US20110042874A1 (en) * 2009-08-20 2011-02-24 Nikon Corporation Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
US8598538B2 (en) * 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US8988655B2 (en) 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
US20120064460A1 (en) * 2010-09-07 2012-03-15 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
JP5958692B2 (ja) * 2012-04-04 2016-08-02 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体の駆動方法並びに露光方法
JP6035670B2 (ja) * 2012-08-07 2016-11-30 株式会社ニコン 露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに露光装置
KR102216809B1 (ko) * 2012-08-08 2021-02-17 가부시키가이샤 니콘 물체 교환 방법, 물체 교환 시스템, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
JP6172913B2 (ja) * 2012-10-23 2017-08-02 キヤノン株式会社 ステージ装置、露光装置および物品の製造方法
JP6086299B2 (ja) * 2012-11-13 2017-03-01 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR102373075B1 (ko) 2012-11-30 2022-03-11 가부시키가이샤 니콘 반송 시스템, 노광 장치, 반송 방법, 노광 방법 및 디바이스 제조방법, 및 흡인 장치
US10534277B2 (en) * 2014-03-26 2020-01-14 Nikon Corporation Movable body apparatus, exposure apparatus, manufacturing method of flat panel display, and device manufacturing method
WO2015147319A1 (ja) * 2014-03-28 2015-10-01 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体駆動方法
EP3219412B1 (en) * 2014-11-14 2025-03-19 Nikon Corporation Shaping device and a shaping method
WO2016159062A1 (ja) * 2015-03-30 2016-10-06 株式会社ニコン 物体搬送装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、物体搬送方法、及び露光方法
CN107407893B (zh) * 2015-03-31 2021-06-01 株式会社尼康 曝光装置、平板显示器的制造方法、器件制造方法及曝光方法
WO2017057589A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに物体の移動方法
JP6885336B2 (ja) * 2015-09-30 2021-06-16 株式会社ニコン 露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR102766023B1 (ko) * 2015-09-30 2025-02-10 가부시키가이샤 니콘 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법, 그리고 노광 방법
CN106814551B (zh) * 2015-11-30 2019-04-12 上海微电子装备（集团）股份有限公司 一种基板交接装置及交接方法
JP6874314B2 (ja) * 2016-09-30 2021-05-19 株式会社ニコン 物体保持装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
CN109952537B (zh) 2016-10-20 2021-12-24 分子印记公司 在压印光刻过程中定位基板
CN107193142A (zh) * 2017-07-19 2017-09-22 武汉华星光电技术有限公司 配向膜固化系统
CN107228127B (zh) * 2017-07-21 2023-06-06 天津航天机电设备研究所 一种气浮轴承
KR102481264B1 (ko) * 2018-01-04 2022-12-26 삼성전자주식회사 디스플레이 장치 및 디스플레이 모듈의 힌지 조립체
JP7473195B2 (ja) * 2020-09-14 2024-04-23 株式会社ブイ・テクノロジー 集束荷電粒子ビーム装置
JP2024043963A (ja) * 2022-09-20 2024-04-02 キオクシア株式会社 パターン形成方法、半導体装置の製造方法、及びインプリント装置
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US12090590B1 (en) 2023-10-10 2024-09-17 Wuxi Xivi Science And Technology Co., Ltd. Six-degree-of-freedom air-floating moving apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6084673A (en) * 1996-03-04 2000-07-04 Asm Lithography B.V. Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders
US6445440B1 (en) * 1999-04-19 2002-09-03 Asml Netherlands B.V. Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses
US7193681B2 (en) * 2003-09-29 2007-03-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20100195081A1 (en) * 2009-02-05 2010-08-05 Asml Holding N.V. Reticle Support that Reduces Reticle Slippage

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2812785B2 (ja) * 1990-06-02 1998-10-22 株式会社日立製作所 試料位置決め装置
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
US6089525A (en) * 1997-10-07 2000-07-18 Ultratech Stepper, Inc. Six axis active vibration isolation and payload reaction force compensation system
US6654095B1 (en) * 1999-10-18 2003-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2001215718A (ja) 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
JP2002252166A (ja) * 2001-02-27 2002-09-06 Canon Inc ステージ装置、露光装置およびデバイス製造方法ならびに移動案内方法
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US6888620B2 (en) * 2001-11-29 2005-05-03 Nikon Corporation System and method for holding a device with minimal deformation
JP2004063790A (ja) * 2002-07-29 2004-02-26 Nikon Corp 露光装置及びデバイス製造方法
TWI338323B (en) * 2003-02-17 2011-03-01 Nikon Corp Stage device, exposure device and manufacguring method of devices
JP2005317916A (ja) * 2004-03-30 2005-11-10 Canon Inc 露光装置及びデバイス製造方法
KR101195628B1 (ko) * 2004-04-14 2012-10-30 코레플로우 사이언티픽 솔루션스 리미티드 편평한 물체의 대향면상에 광학 장치를 포커싱하는 방법
US20080192226A1 (en) * 2004-06-07 2008-08-14 Nikon Corporation Stage Unit, Exposure Apparatus, and Exposure Method
JP2006086442A (ja) * 2004-09-17 2006-03-30 Nikon Corp ステージ装置及び露光装置
EP1840943A4 (en) * 2004-11-25 2010-04-21 Nikon Corp MOBILE BODY SYSTEM, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
JP4793851B2 (ja) * 2005-05-31 2011-10-12 レーザーテック株式会社 カラーフィルタ基板のステージ装置及び検査装置
JP4917780B2 (ja) * 2005-09-08 2012-04-18 住友化学株式会社 露光装置
WO2007049603A1 (ja) * 2005-10-24 2007-05-03 Nikon Corporation ステージ装置とその座標補正方法、露光装置、並びにデバイス製造方法
JP2007150280A (ja) * 2005-11-04 2007-06-14 Dainippon Printing Co Ltd 基板支持装置、基板支持方法、基板加工装置、基板加工方法、表示装置構成部材の製造方法
JP4545697B2 (ja) * 2006-02-17 2010-09-15 住友重機械工業株式会社 ステージ装置
KR101452524B1 (ko) * 2006-09-01 2014-10-21 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
EP2993524B1 (en) * 2006-09-01 2017-10-25 Nikon Corporation Exposure method and apparatus and device manufacturing method
JP5448070B2 (ja) 2007-03-05 2014-03-19 株式会社ニコン 移動体装置、パターン形成装置及びパターン形成方法、デバイス製造方法、並びに移動体駆動方法
US7607647B2 (en) 2007-03-20 2009-10-27 Kla-Tencor Technologies Corporation Stabilizing a substrate using a vacuum preload air bearing chuck
US8937706B2 (en) * 2007-03-30 2015-01-20 Asml Netherlands B.V. Lithographic apparatus and method
JP5279207B2 (ja) * 2007-06-11 2013-09-04 Ｎｓｋテクノロジー株式会社 露光装置用基板搬送機構
JP5056339B2 (ja) * 2007-10-18 2012-10-24 凸版印刷株式会社 基板搬送装置用基板把持機構
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8237916B2 (en) * 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
US8269945B2 (en) * 2007-12-28 2012-09-18 Nikon Corporation Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
CN101796614B (zh) * 2008-02-08 2012-01-18 株式会社尼康 位置测量系统及位置测量方法、移动体装置、移动体驱动方法、曝光装置及曝光方法、图案形成装置、以及组件制造方法
NL1036511A1 (nl) * 2008-02-13 2009-08-14 Asml Netherlands Bv Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object.
JP2009210295A (ja) * 2008-02-29 2009-09-17 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
JP5117243B2 (ja) * 2008-03-27 2013-01-16 株式会社オーク製作所 露光装置
CN101598900B (zh) * 2008-06-05 2012-03-07 四川虹欧显示器件有限公司 等离子显示屏的曝光方法
KR100977466B1 (ko) * 2008-07-04 2010-08-23 한국전기연구원 원통형 자기부상 스테이지
KR20100018950A (ko) 2008-08-08 2010-02-18 하명찬 타이어 가황기용 단열판
JP5254073B2 (ja) * 2008-08-21 2013-08-07 Ｎｓｋテクノロジー株式会社 スキャン露光装置およびスキャン露光装置の基板搬送方法
JP2010060990A (ja) * 2008-09-05 2010-03-18 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
JP4787872B2 (ja) * 2008-10-16 2011-10-05 東京エレクトロン株式会社 基板搬送処理装置
US8760629B2 (en) * 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US20100195083A1 (en) * 2009-02-03 2010-08-05 Wkk Distribution, Ltd. Automatic substrate transport system
CN101551599B (zh) * 2009-04-03 2011-07-20 清华大学 一种光刻机硅片台双台交换系统
CN101551593A (zh) * 2009-04-24 2009-10-07 上海微电子装备有限公司 用于光刻装置的对准系统、光刻装置及其对准方法
JP2011192332A (ja) * 2010-03-12 2011-09-29 Panasonic Corp メモリオーディオ再生装置
US20120064460A1 (en) * 2010-09-07 2012-03-15 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6084673A (en) * 1996-03-04 2000-07-04 Asm Lithography B.V. Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders
US6445440B1 (en) * 1999-04-19 2002-09-03 Asml Netherlands B.V. Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses
US20020180946A1 (en) * 1999-04-19 2002-12-05 Asml Netherlands B.V. Motion feed-through into a vacuum chamber and its application in lithographic projection apparatus
US7193681B2 (en) * 2003-09-29 2007-03-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20100195081A1 (en) * 2009-02-05 2010-08-05 Asml Holding N.V. Reticle Support that Reduces Reticle Slippage

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Publication number Publication date
KR102216234B1 (ko) 2021-02-16
CN103097957B (zh) 2015-11-25
JP6881537B2 (ja) 2021-06-02
JP2018142023A (ja) 2018-09-13
TW201932994A (zh) 2019-08-16
JP2016157131A (ja) 2016-09-01
WO2012033212A1 (en) 2012-03-15
US20120064460A1 (en) 2012-03-15
JP2012060118A (ja) 2012-03-22
HK1222921A1 (zh) 2017-07-14
CN105404097A (zh) 2016-03-16
KR20130114123A (ko) 2013-10-16
KR101911724B1 (ko) 2018-10-29
TWI538078B (zh) 2016-06-11
TW201220419A (en) 2012-05-16
KR20200012034A (ko) 2020-02-04
TWI615913B (zh) 2018-02-21
JP6593662B2 (ja) 2019-10-23
JP5909934B2 (ja) 2016-04-27
JP2020021085A (ja) 2020-02-06
HK1179356A1 (zh) 2013-09-27
CN103097957A (zh) 2013-05-08
TW201631687A (zh) 2016-09-01
CN105404097B (zh) 2019-06-21
KR102072074B1 (ko) 2020-01-31
TW201820510A (zh) 2018-06-01
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