TWI683168B - Pixel structure and manufacturing method thereof - Google Patents

Pixel structure and manufacturing method thereof Download PDF

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TWI683168B
TWI683168B TW108104827A TW108104827A TWI683168B TW I683168 B TWI683168 B TW I683168B TW 108104827 A TW108104827 A TW 108104827A TW 108104827 A TW108104827 A TW 108104827A TW I683168 B TWI683168 B TW I683168B
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pixel
pixel structure
width
electrode
opening
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TW202001389A (en
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謝宗錞
陳建銓
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友達光電股份有限公司
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Abstract

A pixel structure includes a first electrode and a pixel defining layer disposed on the first electrode. The pixel defining layer has a pixel opening includes a central portion, a first portion and a second portion. The first portion, the central portion and the second portion are sequentially arranged in a first direction. The first portion has a first width W1 in a second direction. The second portion has a second width W2 in the second direction. The central portion has a third width W3 in the second direction. W3<W1 and W3<W2. The first portion has a first length L1 in the first direction. The second portion has a second length L2 in the first direction. The central portion has a third length L3 in the first direction, and 20%
Figure 108104827-A0305-02-0002-14
Figure 108104827-A0305-02-0002-2
× 100%

Description

畫素結構與其製造方法 Pixel structure and its manufacturing method

本發明是有關於一種畫素結構,且特別是有關於一種具有不同寬度的畫素開口的畫素結構。 The invention relates to a pixel structure, and in particular to a pixel structure with pixel openings of different widths.

有機發光二極體(Organic light emitting diode,OLED)具有諸如壽命長、體積小、高抗震性、低熱產生及低功率消耗等優點,因此已被廣泛應用於家用及各種設備中的指示器或光源。 Organic light emitting diode (Organic light emitting diode, OLED) has advantages such as long life, small size, high shock resistance, low heat generation and low power consumption, so it has been widely used as an indicator or light source in households and various devices .

噴墨塗佈技術(Ink Jet Printing,IJP)在OLED的製程上能夠提升材料利用率以降低製程成本,但在進行噴墨塗佈之前需形成對應畫素設置的擋牆(bank),以定義每一畫素的區域。然而在提升解析度時,會縮小畫素結構。如此,除了必須提升噴墨製程對於精度的要求,還會增加混色的機率,降低製造良率。 Ink Jet Printing (IJP) technology can improve the material utilization rate in the OLED process to reduce the process cost, but before the inkjet coating needs to form a corresponding pixel setting bank (bank) to define Each pixel area. However, when increasing the resolution, the pixel structure will be reduced. In this way, in addition to improving the accuracy requirements of the inkjet process, it also increases the probability of color mixing and reduces the manufacturing yield.

本發明提供一種畫素結構,可以達成高解析度需求、提供良好的顯示品質及提升製造良率。 The present invention provides a pixel structure that can meet high-resolution requirements, provide good display quality, and improve manufacturing yield.

本發明的畫素結構,包括第一電極以及畫素定義層設置於第一電極上。畫素定義層具有畫素開口,包括中間部以及第一部及第二部。第一部、中間部及第二部在第一方向上依序排列。第一部在第二方向上具有第一寬度W1,第二部在第二方向上具有第二寬度W2,中間部在第二方向上具有固定的第三寬度W3,W3<W1且W3<W2。第一部在第一方向上具有第一長度L1,第二部在第一方向上具有第二長度L2,中間部在第一方向上具有第三長度L3,20%

Figure 108104827-A0305-02-0005-3
×100%
Figure 108104827-A0305-02-0005-16
70%。 The pixel structure of the present invention includes a first electrode and a pixel definition layer disposed on the first electrode. The pixel definition layer has pixel openings, including an intermediate portion and first and second portions. The first part, the middle part, and the second part are sequentially arranged in the first direction. The first part has a first width W1 in the second direction, the second part has a second width W2 in the second direction, and the middle part has a fixed third width W3 in the second direction, W3<W1 and W3<W2 . The first part has a first length L1 in the first direction, the second part has a second length L2 in the first direction, and the middle part has a third length L3 in the first direction, 20%
Figure 108104827-A0305-02-0005-3
×100%
Figure 108104827-A0305-02-0005-16
70%.

本發明的畫素結構,包括第一電極以及畫素定義層設置於第一電極上。畫素定義層具有多個畫素開口,各畫素開口包括中間部以及第一部及第二部。第一部、中間部及第二部在第一方向上依序排列。第一部在第二方向上具有第一寬度W1,第二部在第二方向上具有第二寬度W2,中間部在第二方向上具有固定的第三寬度W3,W3<W1且W3<W2。第一部在第一方向上具有第一長度L1,第二部在第一方向上具有第二長度L2,中間部在第一方向上具有第三長度L3,20%

Figure 108104827-A0305-02-0005-5
×100%
Figure 108104827-A0305-02-0005-17
70%。這些畫素開口包括第一畫素開口與第二畫素開口在第一方向上依序排列。 The pixel structure of the present invention includes a first electrode and a pixel definition layer disposed on the first electrode. The pixel definition layer has a plurality of pixel openings, and each pixel opening includes an intermediate portion and first and second portions. The first part, the middle part, and the second part are sequentially arranged in the first direction. The first part has a first width W1 in the second direction, the second part has a second width W2 in the second direction, and the middle part has a fixed third width W3 in the second direction, W3<W1 and W3<W2 . The first part has a first length L1 in the first direction, the second part has a second length L2 in the first direction, and the middle part has a third length L3 in the first direction, 20%
Figure 108104827-A0305-02-0005-5
×100%
Figure 108104827-A0305-02-0005-17
70%. The pixel openings include first pixel openings and second pixel openings arranged in sequence in the first direction.

基於上述,本發明一實施例的畫素結構,於俯視的方向下觀察,由於畫素結構的畫素開口的兩端具有較大寬度的第一部及第二部,而中間具有較小的固定寬度的中間部,且中間部的長度為畫素開口的總長的20%至70%之間。如此一來,當發光圖案的液滴透過噴墨塗佈的方式,噴塗於中間部時,發光圖案的液滴的一部 分可以由具有固定寬度的中間部流入第一部及第二部。而發光圖案的液滴的另一部分,則會噴塗於第二擋牆上並流動至液滴中心所對應的畫素,而不會流入相鄰的畫素開口的中間部。藉此,畫素結構可以在不提升噴墨製程對於精度的要求下,減少混色的機率,提升製造良率。此外,於俯視方向下,由於畫素結構的畫素開口的兩端的第一部及第二部具有較大的正投影面積,因此畫素結構可以提升開口率,使畫素結構達成高解析度的需求,提供良好的顯示品質。 Based on the above, the pixel structure of an embodiment of the present invention is viewed from above in a plan view. Since both ends of the pixel opening of the pixel structure have a first portion and a second portion with a larger width, and a smaller portion in the middle The middle part of the fixed width, and the length of the middle part is between 20% and 70% of the total length of the pixel opening. In this way, when the droplets of the light emitting pattern are sprayed on the middle portion by inkjet coating, a part of the droplets of the light emitting pattern The part can flow into the first part and the second part from the middle part having a fixed width. The other part of the droplet of the luminescent pattern is sprayed on the second retaining wall and flows to the pixel corresponding to the center of the droplet, without flowing into the middle of the opening of the adjacent pixel. In this way, the pixel structure can reduce the probability of color mixing and improve the manufacturing yield without increasing the accuracy requirements of the inkjet process. In addition, in a plan view, since the first and second portions of the pixel opening at both ends of the pixel structure have a large orthographic projection area, the pixel structure can increase the aperture ratio and enable the pixel structure to achieve high resolution Demand to provide good display quality.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 In order to make the above-mentioned features and advantages of the present invention more obvious and understandable, the embodiments are specifically described below in conjunction with the accompanying drawings for detailed description as follows.

10、10A、10B、10C、10D、10E、10F、10G‧‧‧畫素結構 10, 10A, 10B, 10C, 10D, 10E, 10F, 10G ‧‧‧ pixel structure

100‧‧‧基板 100‧‧‧ substrate

120‧‧‧第一電極 120‧‧‧First electrode

140‧‧‧畫素定義層 140‧‧‧ pixel definition layer

142‧‧‧第二擋牆 142‧‧‧Second retaining wall

150‧‧‧畫素開口 150‧‧‧ pixel opening

1501‧‧‧第一畫素開口 1501‧‧‧The first pixel opening

1502‧‧‧第二畫素開口 1502‧‧‧Second pixel opening

152、152A、152B‧‧‧第一部 152, 152A, 152B

1521‧‧‧第一外側邊 1521‧‧‧First outer side

1522、1522A‧‧‧第一內側邊 1522, 1522A

154、154A、154B‧‧‧第二部 154, 154A, 154B

1541‧‧‧第二外側邊 1541‧‧‧Second outer side

1542、1542B‧‧‧第二內側邊 1542、1542B‧‧‧Second inner side

156‧‧‧中間部 156‧‧‧Middle

160‧‧‧發光圖案 160‧‧‧Glow pattern

160G‧‧‧第一發光圖案 160G‧‧‧First light pattern

160R‧‧‧第二發光圖案 160R‧‧‧Second light pattern

160B‧‧‧第三發光圖案 160B‧‧‧The third light pattern

180‧‧‧第二電極 180‧‧‧Second electrode

242‧‧‧第一擋牆 242‧‧‧The first retaining wall

A-A’、B-B’、C-C’、D-D’、E-E’、F-F’‧‧‧剖面線 A-A’, B-B’, C-C’, D-D’, E-E’, F-F’

D1‧‧‧第一方向 D1‧‧‧First direction

D2‧‧‧第二方向 D2‧‧‧Second direction

H1、H2‧‧‧厚度 H1, H2‧‧‧thickness

L1‧‧‧第一長度 L1‧‧‧ First length

L2‧‧‧第二長度 L2‧‧‧Second length

L3‧‧‧第三長度 L3‧‧‧third length

PX‧‧‧畫素 PX‧‧‧ pixels

PX1、PXA‧‧‧第一子畫素 PX1, PXA‧‧‧The first sub-pixel

PX2、PXB‧‧‧第二子畫素 PX2, PXB‧‧‧Second sub-pixel

PX3‧‧‧第三子畫素 PX3‧‧‧third pixel

PX4‧‧‧第四子畫素 PX4‧‧‧The fourth pixel

W1‧‧‧第一寬度 W1‧‧‧First width

W2‧‧‧第二寬度 W2‧‧‧second width

W3‧‧‧第三寬度 W3‧‧‧third width

W4‧‧‧第四寬度 W4‧‧‧ Fourth width

圖1繪示為本發明一實施例的畫素結構的局部上視示意圖。 FIG. 1 is a schematic partial top view of a pixel structure according to an embodiment of the invention.

圖2A繪示為圖1的畫素結構沿剖面線A-A’的剖面示意圖。 FIG. 2A is a schematic cross-sectional view of the pixel structure of FIG. 1 along section line A-A'.

圖2B繪示為圖1的畫素結構沿剖面線A-A’的剖面示意圖。 FIG. 2B is a schematic cross-sectional view of the pixel structure of FIG. 1 along section line A-A'.

圖3繪示為圖1的畫素結構沿剖面線B-B’的剖面示意圖。 FIG. 3 is a schematic cross-sectional view of the pixel structure of FIG. 1 along section line B-B'.

圖4繪示為圖1的畫素結構沿剖面線C-C’的剖面示意圖。 4 is a schematic cross-sectional view of the pixel structure of FIG. 1 along the cross-sectional line C-C'.

圖5A繪示為本發明另一實施例的畫素結構的局部上視示意圖。 5A is a schematic partial top view of a pixel structure according to another embodiment of the invention.

圖5B繪示為圖5A的畫素結構沿剖面線D-D’的剖面示意圖。 5B is a schematic cross-sectional view of the pixel structure of FIG. 5A along the cross-sectional line D-D'.

圖6繪示為本發明另一實施例的畫素結構的剖面示意圖。 6 is a schematic cross-sectional view of a pixel structure according to another embodiment of the invention.

圖7A繪示為本發明另一實施例的畫素結構的局部上視示意圖。 7A is a schematic partial top view of a pixel structure according to another embodiment of the invention.

圖7B繪示為圖7A的畫素結構沿剖面線E-E’的剖面示意圖。 7B is a schematic cross-sectional view of the pixel structure of FIG. 7A along the cross-sectional line E-E'.

圖8A繪示為本發明又一實施例的畫素結構的局部上視示意圖。 8A is a schematic partial top view of a pixel structure according to another embodiment of the invention.

圖8B繪示為圖8A的畫素結構沿剖面線F-F’的剖面示意圖。 8B is a schematic cross-sectional view of the pixel structure of FIG. 8A along the section line F-F'.

圖9繪示為本發明另一實施例的畫素結構的剖面示意圖。 9 is a schematic cross-sectional view of a pixel structure according to another embodiment of the invention.

圖10A繪示為本發明另一實施例的畫素結構的局部上視示意圖。 FIG. 10A is a schematic partial top view of a pixel structure according to another embodiment of the invention.

圖10B繪示為本發明再一實施例的畫素結構的局部上視示意圖。 10B is a schematic partial top view of a pixel structure according to still another embodiment of the invention.

在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件”上”或”連接到”另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為”直接在另一元件上”或”直接連接到”另一元件時,不存在中間元件。如本文所使用的,”連接”可以指物理及/或電性連接。再者,”電性連接”或”耦合”係可為二元件間存在其它元件。 In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Throughout the specification, the same reference numerals denote the same elements. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being “on” or “connected to” another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connections. Furthermore, "electrical connection" or "coupling" may be that there are other elements between the two elements.

應當理解,儘管術語”第一”、”第二”、”第三”等在本文中 可以用於描述各種元件、部件、區域、層及/或部分,但是這些元件、部件、區域、及/或部分不應受這些術語的限制。這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、區域、層或部分區分開。因此,下面討論的”第一元件”、”部件”、”區域”、”層”或”部分”可以被稱為第二元件、部件、區域、層或部分而不脫離本文的教導。 It should be understood that although the terms "first", "second", "third", etc. are used herein It can be used to describe various elements, components, regions, layers, and/or parts, but these elements, components, regions, and/or parts should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Accordingly, "first element", "component", "region", "layer" or "portion" discussed below may be referred to as a second element, component, region, layer or section without departing from the teachings herein.

除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。 Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having meanings consistent with their meanings in the context of the relevant technology and the present invention, and will not be interpreted as idealized or excessive Formal meaning unless explicitly defined as such in this article.

圖1繪示為本發明一實施例的畫素結構的局部上視示意圖。圖2A繪示為圖1的畫素結構沿剖面線A-A’的剖面示意圖。圖2B繪示為圖1的畫素結構沿剖面線A-A’的剖面示意圖。圖3繪示為圖1的畫素結構沿剖面線B-B’的剖面示意圖。圖4繪示為圖1的畫素結構沿剖面線C-C’的剖面示意圖。圖1、圖2A、圖2B、圖3及圖4為了方便說明及觀察,僅示意性地繪示部分構件。請參考圖1、圖2A、圖2B、圖3及圖4,在本實施例中,畫素結構10包括第一電極120以及畫素定義層140設置於第一電極120上。畫素結構10更包括發光圖案160及第二電極180。 FIG. 1 is a schematic partial top view of a pixel structure according to an embodiment of the invention. FIG. 2A is a schematic cross-sectional view of the pixel structure of FIG. 1 along section line A-A'. FIG. 2B is a schematic cross-sectional view of the pixel structure of FIG. 1 along section line A-A'. FIG. 3 is a schematic cross-sectional view of the pixel structure of FIG. 1 along section line B-B'. 4 is a schematic cross-sectional view of the pixel structure of FIG. 1 along the cross-sectional line C-C'. Fig. 1, Fig. 2A, Fig. 2B, Fig. 3 and Fig. 4 only show some components schematically for the convenience of explanation and observation. Please refer to FIGS. 1, 2A, 2B, 3 and 4. In this embodiment, the pixel structure 10 includes a first electrode 120 and a pixel definition layer 140 disposed on the first electrode 120. The pixel structure 10 further includes a light emitting pattern 160 and a second electrode 180.

舉例而言,畫素結構10設置於基板100上。在本實施例 中,基板100的材料可以是玻璃、石英、有機聚合物、不透光/反射材料(例如:導電材料、金屬、晶圓、陶瓷或其它可適用的材料)或是其它可適用的材料。若使用導電材料或金屬時,則在基板100上覆蓋一層絕緣材料(未繪示),以避免短路問題。 For example, the pixel structure 10 is disposed on the substrate 100. In this embodiment The material of the substrate 100 may be glass, quartz, organic polymer, opaque/reflective material (for example: conductive material, metal, wafer, ceramic, or other applicable materials) or other applicable materials. If conductive materials or metals are used, a layer of insulating material (not shown) is covered on the substrate 100 to avoid short circuit problems.

在一些實施例中,可以設置主動元件層(未繪示)於基板100上。主動元件層例如是主動元件陣列,包括介電層、多個主動元件以及連接這些主動元件的多條訊號線。上述主動元件包括薄膜電晶體(thin film transistor,TFT)。薄膜電晶體例如為低溫多晶矽薄膜電晶體(low temperature poly-Si,LTPS)或非晶矽薄膜電晶體(amorphous Si,a-Si),但本發明不以此為限。 In some embodiments, an active device layer (not shown) may be provided on the substrate 100. The active device layer is, for example, an active device array, including a dielectric layer, a plurality of active devices, and a plurality of signal lines connecting the active devices. The active device includes thin film transistor (TFT). The thin film transistor is, for example, low temperature poly-Si (LTPS) or amorphous silicon thin-film transistor (a-Si), but the invention is not limited thereto.

在本實施例中,畫素結構10的第一電極120設置於基板100上。舉例而言,第一電極120可以設置於主動元件層上,且第一電極120電性連接主動元件層,但本發明不以此為限。第一電極120的材料為導體材料,例如鋁(Al)、銀(Ag)、鉻(Cr)、銅(Cu)、鎳(Ni)、鈦(Ti)、鉬(Mo)、鎂(Mg)、鉑(Pt)、金(Au)或其組合。第一電極120可以是單層、雙層或多層結構。舉例而言,第一電極120可以是由ITO/Ag/ITO所構成的三層結構,但本發明不以此為限。在其他實施例中,第一電極120也可以是Ti/Al/Ti或是由Mo/Al/Mo所構成的三層結構。在一些實施例中,第一電極120還包括反射電極,其材料可以是對可見光具有良好反射率的金屬,例如鋁、鉬、金或其組合。在一些實施例中,第一電極120的形成方法可以是化學氣相沉積(CVD)、物理氣相沉積(PVD)、原 子層沉積(ALD)、蒸鍍(VTE)、濺鍍(SPT)或其組合。在一些實施例中,第一電極120可作為發光圖案160的陽極(anode),但本發明不以此為限。 In this embodiment, the first electrode 120 of the pixel structure 10 is disposed on the substrate 100. For example, the first electrode 120 may be disposed on the active device layer, and the first electrode 120 is electrically connected to the active device layer, but the invention is not limited thereto. The material of the first electrode 120 is a conductor material, such as aluminum (Al), silver (Ag), chromium (Cr), copper (Cu), nickel (Ni), titanium (Ti), molybdenum (Mo), magnesium (Mg) , Platinum (Pt), gold (Au) or a combination thereof. The first electrode 120 may have a single-layer, double-layer or multi-layer structure. For example, the first electrode 120 may be a three-layer structure composed of ITO/Ag/ITO, but the invention is not limited thereto. In other embodiments, the first electrode 120 may also be Ti/Al/Ti or a three-layer structure composed of Mo/Al/Mo. In some embodiments, the first electrode 120 further includes a reflective electrode, the material of which may be a metal that has good reflectivity to visible light, such as aluminum, molybdenum, gold, or a combination thereof. In some embodiments, the forming method of the first electrode 120 may be chemical vapor deposition (CVD), physical vapor deposition (PVD), or Sub-layer deposition (ALD), evaporation (VTE), sputtering (SPT) or a combination thereof. In some embodiments, the first electrode 120 may serve as an anode of the light emitting pattern 160, but the invention is not limited thereto.

畫素定義層140設置並覆蓋於基板100及第一電極120上。舉例而言,畫素定義層140可整面地或部分地設置於第一電極120上,但本發明不以此為限。畫素定義層140具有畫素開口150。舉例而言,畫素開口150於基板100上的正投影重疊第一電極120的部分。從另一角度而言,畫素開口150暴露出部分位於畫素開口150中的第一電極120。畫素定義層140的材料包括無機材料。無機材料包括氮化矽(SiNx)或其他合適材料,本發明不以此為限。在一些實施例中,畫素定義層140的材料也包括光阻材料。畫素開口150的形成方法例如透過黃光微影蝕刻方式,對畫素定義層140進行蝕刻。也就是說,圖案化畫素定義層140所形成之畫素開口150的區域可用於定義出畫素PX。 The pixel definition layer 140 is disposed and covers the substrate 100 and the first electrode 120. For example, the pixel definition layer 140 may be disposed on the first electrode 120 entirely or partially, but the invention is not limited thereto. The pixel definition layer 140 has a pixel opening 150. For example, the orthographic projection of the pixel opening 150 on the substrate 100 overlaps the portion of the first electrode 120. From another perspective, the pixel opening 150 exposes a portion of the first electrode 120 located in the pixel opening 150. The material of the pixel definition layer 140 includes an inorganic material. Inorganic materials include silicon nitride (SiN x ) or other suitable materials, and the invention is not limited thereto. In some embodiments, the material of the pixel definition layer 140 also includes a photoresist material. The method of forming the pixel opening 150 is, for example, etching the pixel definition layer 140 through the yellow light lithography etching method. In other words, the area of the pixel opening 150 formed by the patterned pixel definition layer 140 can be used to define the pixel PX.

在本實施例中,畫素開口150包括中間部156以及第一部152及第二部154。第一部152、中間部156及第二部154在第一方向D1上依序排列。舉例而言,如圖1所示,第一部152及第二部154可以位於畫素開口150的相對兩端,而中間部156位於第一部152與第二部154之間。 In this embodiment, the pixel opening 150 includes an intermediate portion 156 and a first portion 152 and a second portion 154. The first portion 152, the intermediate portion 156, and the second portion 154 are sequentially arranged in the first direction D1. For example, as shown in FIG. 1, the first portion 152 and the second portion 154 may be located at opposite ends of the pixel opening 150, and the middle portion 156 is located between the first portion 152 and the second portion 154.

請參考圖2A及圖2B,發光圖案160設置於畫素開口150中接觸第一電極120。發光圖案160例如為電致發光的有機發光結構,但本發明不以此為限。在本實施例中,為了提升材料的利用率 以降低製造成本,可藉由噴墨塗佈(ink jet printing,IJP)製程來形成發光圖案160。舉例而言,液態的有機發光材料(未繪示)可透過噴墨塗佈製程設置於第一電極120上且位於畫素開口150中,再藉由一乾燥程序形成薄膜的發光圖案160。在一些實施例中,發光圖案160可為多層結構,包括電洞注入層(hole injection layer,HIL)、電洞傳輸層(hole transfer layer,HTL)、發光層(emission layer,EL)和電子傳輸層(electron transfer layer,ETL)。圖2A及圖2B為了方便說明及清楚表示,僅以一層結構表示。在本實施例中,可透過重覆進行噴墨塗佈製程以及固化程序以形成所需厚度的發光圖案160,但本發明不以此為限。 2A and 2B, the light emitting pattern 160 is disposed in the pixel opening 150 to contact the first electrode 120. The light emitting pattern 160 is, for example, an electroluminescent organic light emitting structure, but the invention is not limited thereto. In this embodiment, in order to improve the utilization rate of materials In order to reduce the manufacturing cost, the light emitting pattern 160 can be formed by an ink jet printing (IJP) process. For example, a liquid organic light-emitting material (not shown) can be disposed on the first electrode 120 and located in the pixel opening 150 through an inkjet coating process, and then a thin-film light-emitting pattern 160 is formed by a drying process. In some embodiments, the light emitting pattern 160 may be a multi-layer structure including a hole injection layer (HIL), a hole transfer layer (HTL), an emission layer (EL), and electron transport Layer (electron transfer layer, ETL). 2A and 2B are shown in a one-layer structure for convenience of description and clear display. In this embodiment, the inkjet coating process and the curing process can be repeated to form the light-emitting pattern 160 with a desired thickness, but the invention is not limited thereto.

在一些實施例中,電洞注入層的材料例如是苯二甲藍銅、星狀芳胺類、聚苯胺、聚乙烯二氧噻吩或其他適合的材料。電洞傳輸層的材料例如是三芳香胺類、交叉結構二胺聯苯、二胺聯苯衍生物或其他適合的材料。發光層可以是紅色有機發光層、綠色有機發光層、藍色有機發光層或是混合各頻譜的光產生的不同顏色(例如白、橘、黃等)發光層。電子傳輸層的材料可以是噁唑衍生物及其樹狀物、金屬螯合物(例如Alq3)、唑類化合物、二氮蒽衍生物、含矽雜環化合物或其他適合的材料。 In some embodiments, the material of the hole injection layer is, for example, xylylene copper, star arylamines, polyaniline, polyethylene dioxythiophene, or other suitable materials. The material of the hole transport layer is, for example, triaromatic amines, cross-structured diamine biphenyl, diamine biphenyl derivatives or other suitable materials. The light-emitting layer may be a red organic light-emitting layer, a green organic light-emitting layer, a blue organic light-emitting layer, or a light-emitting layer of different colors (for example, white, orange, yellow, etc.) produced by mixing light of various spectra. The material of the electron transport layer may be an oxazole derivative and its dendrimer, a metal chelate compound (such as Alq3), an azole compound, a diazoanthracene derivative, a silicon-containing heterocyclic compound, or other suitable materials.

基於液體的表面張力與畫素定義層140(作為定義畫素PX的擋牆結構)之吸附力的不同,導致液滴乾燥過程中,使發光圖案160的厚度隨著靠近畫素定義層140漸增。換句話說,發光圖案160於畫素定義層140與第一電極120的交接處的厚度H1大 於發光圖案160於第一電極120上的厚度H2。 The difference between the liquid-based surface tension and the adsorption force of the pixel-defining layer 140 (as a retaining wall structure defining the pixel PX) results in the thickness of the light emitting pattern 160 gradually approaching the pixel-defining layer 140 during the drying of the droplet increase. In other words, the thickness H1 of the light emitting pattern 160 at the junction of the pixel definition layer 140 and the first electrode 120 is large The thickness H2 of the light emitting pattern 160 on the first electrode 120.

在本實施例中,於垂直基板100的方向上,相鄰的不同畫素開口150中的發光圖案160的高度(例如為厚度H2)可以彼此相同或不同。以下以不同發光圖案160的高度不相同為例進行說明。由於不同畫素開口150的區域可定義出不同畫素PX(標示於圖1),因此不同畫素開口150中的發光圖案160可包括第一發光圖案160G、第二發光圖案160R以及第三發光圖案160B。第一發光圖案160G、第二發光圖案160R以及第三發光圖案160B可以分別發出不同波長的第一色光、第二色光及第三色光(未繪示)。舉例而言,第一色光例如為綠色光,第二色光例如為紅色光,第三色光例如為藍色光,但本發明不以此為限。使用者可依色光的需求,選擇性地調整第一發光圖案160G、第二發光圖案160R以及第三發光圖案160B的高度。舉例而言,如圖2A所示,第二發光圖案160R的高度大於第一發光圖案160G的高度大於第三發光圖案160B的高度,但本發明不以此為限。在一些實施例中,第一發光圖案160G、第二發光圖案160R以及第三發光圖案160B的高度也可以至少任二者相同或全部相同。 In this embodiment, in the direction perpendicular to the substrate 100, the heights (for example, the thickness H2) of the light emitting patterns 160 in the adjacent different pixel openings 150 may be the same as or different from each other. The following uses an example in which the heights of different light emitting patterns 160 are different. Since the areas of different pixel openings 150 can define different pixel PX (marked in FIG. 1), the light emitting patterns 160 in the different pixel openings 150 can include a first light emitting pattern 160G, a second light emitting pattern 160R, and a third light emitting Pattern 160B. The first light-emitting pattern 160G, the second light-emitting pattern 160R, and the third light-emitting pattern 160B can respectively emit first color light, second color light, and third color light of different wavelengths (not shown). For example, the first color light is green light, the second color light is red light, and the third color light is blue light, but the invention is not limited thereto. The user can selectively adjust the heights of the first light-emitting pattern 160G, the second light-emitting pattern 160R, and the third light-emitting pattern 160B according to the needs of the colored light. For example, as shown in FIG. 2A, the height of the second light emitting pattern 160R is greater than the height of the first light emitting pattern 160G than the height of the third light emitting pattern 160B, but the invention is not limited thereto. In some embodiments, the heights of the first light emitting pattern 160G, the second light emitting pattern 160R, and the third light emitting pattern 160B may also be the same or all the same for at least any two of them.

請參考圖2B,畫素結構10更包括第二電極180設置於畫素定義層140上。舉例而言,第二電極180可以整面的方式設置在畫素定義層140及發光圖案160上並重疊第一電極120以及畫素開口150,但本發明不以此為限。第二電極180的材料可為透明的導體材料,例如銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅 氧化物或銦鍺鋅氧化物等金屬氧化物。在一些實施例中,第二電極180的形成方法可以是化學氣相沉積(CVD)、物理氣相沉積(PVD)、原子層沉積(ALD)、蒸鍍(VTE)、濺鍍(SPT)或其組合。在一些實施例中,第二電極180可作為發光圖案160的陰極(cathode)。 2B, the pixel structure 10 further includes a second electrode 180 disposed on the pixel definition layer 140. For example, the second electrode 180 may be disposed on the pixel definition layer 140 and the light emitting pattern 160 over the entire surface and overlap the first electrode 120 and the pixel opening 150, but the invention is not limited thereto. The material of the second electrode 180 may be a transparent conductive material, such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc Oxides or metal oxides such as indium germanium zinc oxide. In some embodiments, the forming method of the second electrode 180 may be chemical vapor deposition (CVD), physical vapor deposition (PVD), atomic layer deposition (ALD), vapor deposition (VTE), sputtering (SPT), or Its combination. In some embodiments, the second electrode 180 may serve as a cathode of the light emitting pattern 160.

在一些實施例中,還可以選擇性地設置保護層、平坦層、阻水氧層(未繪示)或其他合適的膜層於第二電極180上,本發明不以此為限。 In some embodiments, a protective layer, a flat layer, a water-blocking oxygen layer (not shown), or other suitable film layers may be selectively disposed on the second electrode 180. The present invention is not limited thereto.

值得注意的是,請參考圖1、圖2A、圖3及圖4,第一方向D1的延伸方向垂直於第二方向D2的延伸方向。畫素開口150的第一部152在第二方向D2上具有第一寬度W1,第二部154在第二方向D2上具有第二寬度W2,中間部156在第二方向D2上具有固定的第三寬度W3,其中W3<W1且W3<W2。在一些實施例中,第一寬度W1與第二寬度W2可以相同或不同。也就是說,第一寬度W1可等於、大於或小於第二寬度W2,本發明不以此為限。在上述的設置下,於第二方向D2上,相鄰兩個畫素開口150的中間部156之間的距離可以固定並大於相鄰的第一部152(或第二部154)之間的距離。詳細而言,畫素定義層140更包括多個第二擋牆142。第二擋牆142例如為分別設置於中間部156兩側的畫素定義層140。具體而言,第二擋牆142分別設置於中間部156的兩個側邊,以用於定義出中間部156的區域。每一第二擋牆142(例如:位於相鄰兩個中間部156之間的第二擋牆142)在第二方向D2上具有第四寬度W4。在本實施例中,W3=2W1-X,而W4= X-W1,且X為發光圖案160的液滴直徑及機械精度的寬度。如此一來,當發光圖案160的液滴透過噴墨塗佈的方式,噴塗於中間部156時,固定的第三寬度W3可以確保發光圖案160的液滴的一部分可以由中間部156流入第一部152及第二部154。此外,由於中間部156兩側的第二擋牆142具有足夠的第四寬度W4(例如相鄰中間部156之間的距離),因此噴塗於第二擋牆142上的發光圖案160的另一部分液滴(包括部分的液滴直徑及機械精度所導致不重疊中間部156的液滴)則會噴塗於第二擋牆142上,並流動至液滴中心所對應的畫素PX(例如:圖1左方畫素開口150的中間部156),而不會流入相鄰畫素之畫素開口150的中間部156(例如:圖1中間畫素之中間部156)。藉此,畫素結構10可以在不提升噴墨製程對於精度的要求下,減少混色的機率,提升製造良率。 It is worth noting that, referring to FIGS. 1, 2A, 3 and 4, the extending direction of the first direction D1 is perpendicular to the extending direction of the second direction D2. The first portion 152 of the pixel opening 150 has a first width W1 in the second direction D2, the second portion 154 has a second width W2 in the second direction D2, and the middle portion 156 has a fixed first width in the second direction D2 Three widths W3, where W3<W1 and W3<W2. In some embodiments, the first width W1 and the second width W2 may be the same or different. In other words, the first width W1 may be equal to, greater than or less than the second width W2, and the invention is not limited thereto. Under the above arrangement, in the second direction D2, the distance between the middle portions 156 of two adjacent pixel openings 150 may be fixed and greater than the distance between the adjacent first portions 152 (or second portions 154) distance. In detail, the pixel definition layer 140 further includes a plurality of second retaining walls 142. The second blocking wall 142 is, for example, a pixel definition layer 140 disposed on both sides of the middle portion 156. Specifically, the second retaining walls 142 are respectively disposed on the two sides of the middle portion 156 to define the area of the middle portion 156. Each second retaining wall 142 (for example, the second retaining wall 142 between two adjacent middle portions 156) has a fourth width W4 in the second direction D2. In this embodiment, W3=2W1-X, and W4= X-W1, and X is the droplet diameter of the light emitting pattern 160 and the width of the mechanical precision. In this way, when the droplets of the light emitting pattern 160 are sprayed on the middle portion 156 by inkjet coating, the fixed third width W3 can ensure that part of the droplets of the light emitting pattern 160 can flow into the first from the middle portion 156部152 and second part 154. In addition, since the second retaining walls 142 on both sides of the intermediate portion 156 have a sufficient fourth width W4 (eg, the distance between adjacent intermediate portions 156), another portion of the light emitting pattern 160 sprayed on the second retaining wall 142 The droplets (including droplets that do not overlap the middle portion 156 due to part of the droplet diameter and mechanical accuracy) are sprayed on the second retaining wall 142 and flow to the pixel PX corresponding to the droplet center (for example: 1 the middle portion 156 of the left pixel opening 150) without flowing into the middle portion 156 of the pixel opening 150 of the adjacent pixel (for example: the middle portion 156 of the middle pixel of FIG. 1). In this way, the pixel structure 10 can reduce the probability of color mixing and improve the manufacturing yield without increasing the accuracy requirements of the inkjet process.

此外,由於相鄰的第一部152的第一寬度W1(或第二部154的第二寬度W2)可以大於中間部156的第三寬度W3,因此畫素開口150的面積可以提升。藉此,發光圖案160的發光面積可以增加,提升開口率,使畫素結構10達成高解析度的需求,提供良好的顯示品質。 In addition, since the first width W1 of the adjacent first portion 152 (or the second width W2 of the second portion 154) may be greater than the third width W3 of the middle portion 156, the area of the pixel opening 150 may be increased. Thereby, the light-emitting area of the light-emitting pattern 160 can be increased, the aperture ratio can be improved, the pixel structure 10 can meet the high-resolution requirement, and good display quality can be provided.

另外,第一部152在第一方向D1上具有第一長度L1,第二部154在第一方向D1具有第二長度L2,中間部156在第一方向D1上具有第三長度L3,其中20%

Figure 108104827-A0305-02-0014-6
×100%
Figure 108104827-A0305-02-0014-18
70%。換句話說,中間部156的第三長度L3為畫素開口150的總長 (L1+L2+L3)的20%至70%之間。在上述的設置下,使用者可依需求,調整第三長度L3與第一長度L1及第二長度L2的關係。如此,可以同時增加第一部152及第二部154的面積並減少混色的機率。因此,發光圖案160的發光面積可以增加,提升開口率,使畫素結構10達成高解析度的需求,提供良好的顯示品質,還可以提升製造良率。 In addition, the first portion 152 has a first length L1 in the first direction D1, the second portion 154 has a second length L2 in the first direction D1, and the middle portion 156 has a third length L3 in the first direction D1, of which 20 %
Figure 108104827-A0305-02-0014-6
×100%
Figure 108104827-A0305-02-0014-18
70%. In other words, the third length L3 of the middle portion 156 is between 20% and 70% of the total length (L1+L2+L3) of the pixel opening 150. Under the above configuration, the user can adjust the relationship between the third length L3 and the first length L1 and the second length L2 according to requirements. In this way, the area of the first portion 152 and the second portion 154 can be increased at the same time and the probability of color mixing can be reduced. Therefore, the light-emitting area of the light-emitting pattern 160 can be increased, the aperture ratio can be increased, the pixel structure 10 can achieve high-resolution requirements, provide good display quality, and can also improve the manufacturing yield.

請參考圖1及圖4,在本實施例中,第一部152具有第一內側邊1522及第一外側邊1521,第二部154具有第二內側邊1542及第二外側邊1541。從另一角度而言,第一內側邊1522與第一外側邊1521可用於定義畫素定義層140於第一部152在第一方向D1上的側壁及第一部152的第一長度L1。第二內側邊1542與第二外側邊1541可用於定義畫素定義層140於第二部154在第一方向D1上的側壁及第二部154的第二長度L2。發光圖案160可自第一部152經由中間部156延伸至第二部154,且發光圖案160位於第一外側邊1521與第二外側邊1541之間。在本實施例中,第一內側邊1522及第一外側邊1521平行第二方向D2,第二內側邊1542及第二外側邊1541平行第二方向D2,但本發明不以此為限。 Please refer to FIGS. 1 and 4. In this embodiment, the first part 152 has a first inner side 1522 and a first outer side 1521, and the second part 154 has a second inner side 1542 and a second outer side 1541. From another perspective, the first inner side 1522 and the first outer side 1521 can be used to define the side wall of the pixel defining layer 140 on the first portion 152 in the first direction D1 and the first length of the first portion 152 L1. The second inner side 1542 and the second outer side 1541 can be used to define the side wall of the pixel defining layer 140 on the second portion 154 in the first direction D1 and the second length L2 of the second portion 154. The light emitting pattern 160 may extend from the first portion 152 to the second portion 154 through the middle portion 156, and the light emitting pattern 160 is located between the first outer side 1521 and the second outer side 1541. In this embodiment, the first inner side 1522 and the first outer side 1521 are parallel to the second direction D2, and the second inner side 1542 and the second outer side 1541 are parallel to the second direction D2, but the present invention does not use this Limited.

簡言之,使用者於俯視的方向下觀察畫素開口150,由於本發明的畫素結構10的畫素開口150可為兩端具有較大寬度,而中間具有較小的固定寬度的工字形或I字型。藉此,可以提升開口率,使畫素結構10達成高解析度的需求,提供良好的顯示品質還可以減少混色的機率,提升製造良率。 In short, the user looks at the pixel opening 150 in a top view. Since the pixel opening 150 of the pixel structure 10 of the present invention can be I-shaped with a larger width at both ends and a smaller fixed width in the middle Or I shape. In this way, the aperture ratio can be increased, so that the pixel structure 10 can meet the high-resolution requirements, providing good display quality can also reduce the chance of color mixing, and improve the manufacturing yield.

下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,關於省略了相同技術內容的部分說明可參考前述實施例,下述實施例中不再重複贅述。 The following embodiments continue to use the element numbers and partial contents of the previous embodiments, wherein the same reference numerals are used to denote the same or similar elements. For the description of the parts that omit the same technical content, please refer to the previous embodiments. Repeat the details.

圖5A繪示為本發明另一實施例的畫素結構的局部上視示意圖。圖5B繪示為圖5A的畫素結構沿剖面線D-D’的剖面示意圖。圖5A及圖5B為了方便說明及觀察,僅示意性地繪示部分構件。本實施例所示的畫素結構10A與圖1及圖4所示的畫素結構10類似,主要的差異在於:畫素結構10A更包括第一擋牆242設置於中間部156。舉例而言,第一擋牆242設置於畫素開口150中,以將畫素開口150的區域定義為第一子畫素PX1及第二子畫素PX2。具體而言,於第一方向D1上,第一電極120及發光圖案160位於第一擋牆242與畫素定義層140之間的區域。藉此,相較於圖1的畫素結構10,畫素結構10A可透過第一擋牆242,將一個畫素開口150定義出兩個子畫素PX1、PX2。在一些實施例中,第一擋牆242還可以將畫素開口150定義出三個、四個或更多個子畫素,但本發明不以此為限。因此,畫素結構10A可以進一步提升解析度,提供良好的顯示品質。此外,畫素結構10A還可獲致與上述實施例類似的技術功效。 5A is a schematic partial top view of a pixel structure according to another embodiment of the invention. 5B is a schematic cross-sectional view of the pixel structure of FIG. 5A along the cross-sectional line D-D'. FIGS. 5A and 5B only schematically show some components for convenience of explanation and observation. The pixel structure 10A shown in this embodiment is similar to the pixel structure 10 shown in FIGS. 1 and 4. The main difference is that the pixel structure 10A further includes a first retaining wall 242 disposed in the middle portion 156. For example, the first blocking wall 242 is disposed in the pixel opening 150 to define the area of the pixel opening 150 as the first sub-pixel PX1 and the second sub-pixel PX2. Specifically, in the first direction D1, the first electrode 120 and the light emitting pattern 160 are located in the area between the first blocking wall 242 and the pixel definition layer 140. In this way, compared to the pixel structure 10 of FIG. 1, the pixel structure 10A can pass through the first retaining wall 242 to define one pixel opening 150 to define two sub-pixels PX1 and PX2. In some embodiments, the first blocking wall 242 can also define the pixel opening 150 as three, four or more sub-pixels, but the invention is not limited thereto. Therefore, the pixel structure 10A can further improve the resolution and provide good display quality. In addition, the pixel structure 10A can also obtain technical effects similar to those of the foregoing embodiments.

在本實施例中,第一擋牆242的材質可以包括無機材料,例如氧化矽(SiO2)或其他合適材料,本發明不以此為限。 In this embodiment, the material of the first retaining wall 242 may include inorganic materials, such as silicon oxide (SiO 2 ) or other suitable materials, and the invention is not limited thereto.

圖6繪示為本發明另一實施例的畫素結構的剖面示意圖, 圖6為了方便說明及觀察,僅示意性地繪示部分構件。本實施例所示的畫素結構10B與圖4所示的畫素結構10類似,主要的差異在於:畫素結構10B更包括多個第一擋牆242。這些第一擋牆242中的一者對應第一部152的第一外側邊1521設置,這些第一擋牆242中的一者對應第二部154的第二外側邊1541設置。換句話說,相較於圖4所示的畫素結構10,本實施例的畫素結構10B是以第一擋牆242取代定義出第一部152的第一外側邊1521的部分畫素定義層140,並以另一第一擋牆242取代定義出第二部154的第二外側邊1541的部分畫素定義層140。簡言之,第一擋牆242可以設置於鄰近第一部152的一端以及鄰近第二部154的一端,以同時與畫素定義層140定義出畫素開口150(標示於圖1)。如此,於第二方向D2上,畫素結構10B可進一步縮減相鄰畫素開口150之間的距離,提升解析度,提供良好的顯示品質。此外,畫素結構10B還可獲致與上述實施例類似的技術功效。 6 is a schematic cross-sectional view of a pixel structure according to another embodiment of the invention, For convenience of description and observation, FIG. 6 only schematically shows some components. The pixel structure 10B shown in this embodiment is similar to the pixel structure 10 shown in FIG. 4, the main difference is that the pixel structure 10B further includes a plurality of first retaining walls 242. One of the first retaining walls 242 is disposed corresponding to the first outer side 1521 of the first portion 152, and one of the first retaining walls 242 is disposed corresponding to the second outer side 1541 of the second portion 154. In other words, compared to the pixel structure 10 shown in FIG. 4, the pixel structure 10B of this embodiment replaces a portion of the pixels defining the first outer side 1521 of the first portion 152 with the first retaining wall 242 The layer 140 is defined, and a part of the pixel definition layer 140 defining the second outer side 1541 of the second portion 154 is replaced by another first retaining wall 242. In short, the first blocking wall 242 may be disposed at an end adjacent to the first portion 152 and an end adjacent to the second portion 154 to define the pixel opening 150 (marked in FIG. 1) together with the pixel definition layer 140. In this way, in the second direction D2, the pixel structure 10B can further reduce the distance between adjacent pixel openings 150, improve resolution, and provide good display quality. In addition, the pixel structure 10B can also obtain technical effects similar to those of the foregoing embodiments.

圖7A繪示為本發明另一實施例的畫素結構的局部上視示意圖,圖7A為了方便說明及觀察,僅示意性地繪示部分構件。圖7B繪示為圖7A的畫素結構沿剖面線E-E’的剖面示意圖。本實施例所示的畫素結構10C與圖1及圖4所示的畫素結構10類似,主要的差異在於:畫素定義層140包括多個畫素開口150。這些畫素開口150包括至少一個第一畫素開口1501與至少一個第二畫素開口1502在第一方向D1上依序排列。舉例而言,畫素結構10C更包括第一擋牆242設置於第一畫素開口1501與第二畫素開口 1502之間,以將第一畫素開口1501的區域定義為第一子畫素PXA,將第二畫素開口1502的區域定義為第二子畫素PXB。具體而言,於第一方向D1上,第一電極120及發光圖案160位於第一擋牆242與畫素定義層140之間的區域。藉此,相較於圖1的畫素結構10,畫素結構10C的第一畫素開口1501與第二畫素開口1502可透過第一擋牆242,在第二方向D2上分離。在上述的設置下,畫素結構10C可透過第一擋牆242取代使用畫素定義層140定義出第一畫素開口1501的第二部154以及第二畫素開口1502的第一部152。如此,於第二方向D2上,第一子畫素PXA與第二子畫素PXB之間的距離可進一步地縮減,進而提升解析度,並提供良好的顯示品質。此外,畫素結構10C還可獲致與上述實施例類似的技術功效。 FIG. 7A is a partial schematic top view of a pixel structure according to another embodiment of the present invention. For convenience of description and observation, FIG. 7A only schematically shows some components. 7B is a schematic cross-sectional view of the pixel structure of FIG. 7A along the cross-sectional line E-E'. The pixel structure 10C shown in this embodiment is similar to the pixel structure 10 shown in FIGS. 1 and 4. The main difference is that the pixel definition layer 140 includes a plurality of pixel openings 150. The pixel openings 150 include at least one first pixel opening 1501 and at least one second pixel opening 1502 arranged in sequence in the first direction D1. For example, the pixel structure 10C further includes a first blocking wall 242 disposed in the first pixel opening 1501 and the second pixel opening Between 1502, the area of the first pixel opening 1501 is defined as the first sub-pixel PXA, and the area of the second pixel opening 1502 is defined as the second sub-pixel PXB. Specifically, in the first direction D1, the first electrode 120 and the light emitting pattern 160 are located in the area between the first blocking wall 242 and the pixel definition layer 140. In this way, compared to the pixel structure 10 of FIG. 1, the first pixel opening 1501 and the second pixel opening 1502 of the pixel structure 10C can penetrate the first blocking wall 242 and separate in the second direction D2. Under the above arrangement, the pixel structure 10C can define the second portion 154 of the first pixel opening 1501 and the first portion 152 of the second pixel opening 1502 through the first blocking wall 242 instead of using the pixel definition layer 140 to define the second portion 154 of the first pixel opening 1501. In this way, in the second direction D2, the distance between the first sub-pixel PXA and the second sub-pixel PXB can be further reduced, thereby improving the resolution and providing good display quality. In addition, the pixel structure 10C can also obtain technical effects similar to those of the foregoing embodiments.

請參考圖7B,畫素結構10C更包括第二電極180設置於畫素定義層140上並重疊第一畫素開口1501以及第二畫素開口1502,但本發明不以此為限。此外,基於液體的表面張力與畫素定義層140(作為定義第一子畫素PXA及第二子畫素PXB的擋牆結構)之吸附力的不同,故發光圖案160於畫素定義層140與第一電極120的交接處的厚度H1大於發光圖案160於第一電極120上的厚度H2。 Referring to FIG. 7B, the pixel structure 10C further includes a second electrode 180 disposed on the pixel definition layer 140 and overlapping the first pixel opening 1501 and the second pixel opening 1502, but the invention is not limited thereto. In addition, due to the difference between the surface tension of the liquid and the adsorption force of the pixel definition layer 140 (as a barrier structure defining the first sub-pixel PXA and the second sub-pixel PXB), the light emitting pattern 160 is on the pixel definition layer 140 The thickness H1 at the junction with the first electrode 120 is greater than the thickness H2 of the light emitting pattern 160 on the first electrode 120.

圖8A繪示為本發明又一實施例的畫素結構的局部上視示意圖。圖8B繪示為圖8A的畫素結構沿剖面線F-F’的剖面示意圖。圖8A及圖8B為了方便說明及觀察,僅示意性地繪示部分構 件。本實施例所示的畫素結構10D與圖7A及圖7B所示的畫素結構10C類似,主要的差異在於:畫素結構10D更包括多個第一擋牆242設置於第一畫素開口1501的中間部156、第二畫素開口1502的中間部156以及第一畫素開口1501與第二畫素開口1502之間。在本實施例中,這些第一擋牆242將第一畫素開口1501的區域定義為第一子畫素PX1及第二子畫素PX2,並將第二畫素開口1502的區域定義為第三子畫素PX3及第四子畫素PX4。藉此,相較於圖7A及圖7B的畫素結構10C,畫素結構10D可透過多個第一擋牆242,定義出多個畫素開口1501、1502以及多個子畫素PX1、PX2、PX3、PX4。因此,除了第一畫素開口1501與第二畫素開口1502之間的距離可進一步地縮減外,還可以增加子畫素的數量(例如兩個、三個、四個或更多個),以進一步提升解析度,提供良好的顯示品質。此外,畫素結構10D還可獲致與上述實施例類似的技術功效。 8A is a schematic partial top view of a pixel structure according to another embodiment of the invention. 8B is a schematic cross-sectional view of the pixel structure of FIG. 8A along the section line F-F'. 8A and 8B for convenience of explanation and observation, only a part of the structure is schematically shown Pieces. The pixel structure 10D shown in this embodiment is similar to the pixel structure 10C shown in FIGS. 7A and 7B. The main difference is that the pixel structure 10D further includes a plurality of first retaining walls 242 disposed in the first pixel opening The middle portion 156 of 1501, the middle portion 156 of the second pixel opening 1502, and between the first pixel opening 1501 and the second pixel opening 1502. In this embodiment, the first blocking walls 242 define the area of the first pixel opening 1501 as the first sub-pixel PX1 and the second sub-pixel PX2, and define the area of the second pixel opening 1502 as the first Three sub-pixels PX3 and fourth sub-pixel PX4. In this way, compared to the pixel structure 10C of FIGS. 7A and 7B, the pixel structure 10D can define a plurality of pixel openings 1501 and 1502 and a plurality of sub-pixels PX1 and PX2 through a plurality of first retaining walls 242. PX3, PX4. Therefore, in addition to the distance between the first pixel opening 1501 and the second pixel opening 1502 can be further reduced, the number of sub-pixels (eg, two, three, four or more) can also be increased, To further improve the resolution and provide good display quality. In addition, the pixel structure 10D can also obtain technical effects similar to those of the foregoing embodiments.

圖9繪示為本發明另一實施例的畫素結構的剖面示意圖,圖9為了方便說明及觀察,僅示意性地繪示部分構件。本實施例所示的畫素結構10E與圖8B所示的畫素結構10D類似,主要的差異在於:畫素結構10E的多個第一擋牆242中的一者對應第一部152(標示於圖8A)的第一外側邊1521設置,這些第一擋牆242中的一者對應第二部154(標示於圖8A)的第二外側邊1541設置。換句話說,相較於圖8B所示的畫素結構10D,本實施例的畫素結構10E是以第一擋牆242取代定義出第一部152的第一外 側邊1521的部分畫素定義層140,並以另一第一擋牆242取代定義出第二部154的第二外側邊1541的部分畫素定義層140。如此,畫素結構10E可獲致與上述實施例類似的技術功效。 FIG. 9 is a schematic cross-sectional view of a pixel structure according to another embodiment of the present invention. For convenience of description and observation, FIG. 9 only schematically shows some components. The pixel structure 10E shown in this embodiment is similar to the pixel structure 10D shown in FIG. 8B. The main difference is that one of the plurality of first retaining walls 242 of the pixel structure 10E corresponds to the first portion 152 (labeled The first outer side 1521 of FIG. 8A) is provided, and one of the first retaining walls 242 corresponds to the second outer side 1541 of the second portion 154 (labeled in FIG. 8A). In other words, compared to the pixel structure 10D shown in FIG. 8B, the pixel structure 10E of the present embodiment replaces the first outer wall defining the first portion 152 with the first retaining wall 242. The partial pixel definition layer 140 of the side 1521 is replaced by another first retaining wall 242 that defines the partial pixel definition layer 140 of the second outer side 1541 of the second portion 154. In this way, the pixel structure 10E can obtain similar technical effects as the above-mentioned embodiment.

圖10A繪示為本發明另一實施例的畫素結構的局部上視示意圖,圖10A為了方便說明及觀察,僅示意性地繪示部分構件。本實施例所示的畫素結構10F與圖1所示的畫素結構10類似,主要的差異在於:第一部152A的第一內側邊1522A相對第二部154A的第二內側邊1542A設置。第一內側邊1522A的延伸方向交錯第二內側邊1542A的延伸方向。舉例而言,於第一方向D1上,第一內側邊1522A與中間部156的交接處至第一外側邊1521之間的距離,可以沿著第二方向D2往遠離中間部156的方向漸增。第二內側邊1542A與中間部156的交接處至第二外側邊1541之間的距離,可以沿著第二方向D2往遠離中間部156的方向漸增。也就是說,第一內側邊1522A和第二內側邊1542A是沿著斜角延伸而不平行於第二方向D2,且第一內側邊1522A與第二內側邊1542A彼此不平行。在上述的設置下,相較於圖1所示的畫素結構10,於俯視方向上,畫素結構10F的第一部152A及第二部154A的正投影面積可以增加。如此,第一部152A及第二部154A中的發光圖案(未繪示)的發光面積可以增加,提升開口率,使畫素結構10F達成高解析度的需求,提供良好的顯示品質。此外,畫素結構10F還可獲致與上述實施例類似的技術功效。 FIG. 10A is a schematic partial top view of a pixel structure according to another embodiment of the present invention. For convenience of description and observation, FIG. 10A only schematically shows some components. The pixel structure 10F shown in this embodiment is similar to the pixel structure 10 shown in FIG. 1, the main difference is that the first inner side 1522A of the first portion 152A is opposite to the second inner side 1542A of the second portion 154A Settings. The extending direction of the first inner side 1522A crosses the extending direction of the second inner side 1542A. For example, in the first direction D1, the distance from the junction of the first inner side 1522A and the middle portion 156 to the first outer side 1521 may be away from the middle portion 156 along the second direction D2 Gradually increase. The distance from the junction of the second inner side 1542A and the middle portion 156 to the second outer side 1541 may gradually increase in a direction away from the middle portion 156 along the second direction D2. That is, the first inner side 1522A and the second inner side 1542A extend along the oblique angle and are not parallel to the second direction D2, and the first inner side 1522A and the second inner side 1542A are not parallel to each other. Under the above arrangement, compared to the pixel structure 10 shown in FIG. 1, the orthographic projection areas of the first portion 152A and the second portion 154A of the pixel structure 10F can be increased in a plan view. In this way, the light emitting area of the light emitting patterns (not shown) in the first portion 152A and the second portion 154A can be increased, increasing the aperture ratio, enabling the pixel structure 10F to meet the high-resolution requirements, and providing good display quality. In addition, the pixel structure 10F can also obtain technical effects similar to those of the foregoing embodiments.

圖10B繪示為本發明另一實施例的畫素結構的局部上視 示意圖,圖10B為了方便說明及觀察,僅示意性地繪示部分構件。本實施例所示的畫素結構10G與圖1所示的畫素結構10類似,主要的差異在於:第一部152B與第二部154B的四個邊角為弧形。如此,畫素結構10G可獲致與上述實施例類似的技術功效。 10B is a partial top view of a pixel structure according to another embodiment of the invention Schematic diagram, FIG. 10B only schematically illustrates some components for convenience of explanation and observation. The pixel structure 10G shown in this embodiment is similar to the pixel structure 10 shown in FIG. 1, the main difference is that the four corners of the first portion 152B and the second portion 154B are curved. In this way, the pixel structure 10G can obtain technical effects similar to those of the foregoing embodiments.

綜上所述,本發明一實施例的畫素結構,於俯視的方向下觀察,由於畫素結構的畫素開口的兩端具有較大寬度的第一部及第二部,而中間具有較小的固定寬度的中間部,且中間部的長度為畫素開口的總長的20%至70%之間。如此一來,當發光圖案的液滴透過噴墨塗佈的方式,噴塗於中間部時,發光圖案的液滴的一部分可以由具有固定寬度的中間部流入第一部及第二部。而發光圖案的液滴的另一部分,則因液滴的直徑及機械精度,故會噴塗於第二擋牆上並流動至液滴中心所對應的畫素的畫素開口之中間部,而不會流入相鄰的畫素之畫素開口的中間部。藉此,畫素結構可以在不提升噴墨製程對於精度的要求下,減少混色的機率,提升製造良率。此外,於俯視方向下,由於畫素結構的畫素開口的兩端的第一部及第二部具有較大的正投影面積,因此畫素結構可以提升開口率,使畫素結構達成高解析度的需求,提供良好的顯示品質。 In summary, the pixel structure of an embodiment of the present invention is viewed in a plan view. Since the pixel opening of the pixel structure has a first portion and a second portion with a larger width at both ends, the middle portion has a larger width. The middle part of the small fixed width, and the length of the middle part is between 20% and 70% of the total length of the pixel opening. In this way, when the droplets of the light-emitting pattern are sprayed on the middle portion by inkjet coating, a part of the droplets of the light-emitting pattern may flow into the first portion and the second portion from the middle portion having a fixed width. The other part of the droplet of the light-emitting pattern is sprayed on the second retaining wall and flows to the middle of the pixel opening of the pixel corresponding to the center of the droplet due to the diameter and mechanical accuracy of the droplet. It will flow into the middle of the pixel opening of adjacent pixels. In this way, the pixel structure can reduce the probability of color mixing and improve the manufacturing yield without increasing the accuracy requirements of the inkjet process. In addition, in a plan view, since the first and second portions of the pixel opening at both ends of the pixel structure have a large orthographic projection area, the pixel structure can increase the aperture ratio and enable the pixel structure to achieve high resolution Demand to provide good display quality.

另外,畫素結構還可以包括第一擋牆設置於中間部以定義出更多個子畫素,進一步提升解析度,提供良好的顯示品質。此外,第一擋牆也可以對應第一外側邊及第二外側邊設置,以同時與畫素定義層定義出畫素開口。如此,畫素結構可進一步縮減相鄰畫素開口之間的距離,提升解析度,提供良好的顯示品質。更進一步 而言,第一內側邊的延伸方向還可以交錯第二內側邊的延伸方向。如此,第一部及第二部的正投影面積可以增加,以進一步地增加發光面積,提升開口率,使畫素結構達成高解析度的需求,提供良好的顯示品質。 In addition, the pixel structure may also include a first retaining wall disposed in the middle to define more sub-pixels, further improve resolution, and provide good display quality. In addition, the first retaining wall may also be provided corresponding to the first outer side and the second outer side, so as to define a pixel opening together with the pixel definition layer. In this way, the pixel structure can further reduce the distance between adjacent pixel openings, improve resolution, and provide good display quality. Go further In other words, the extending direction of the first inner side may also intersect the extending direction of the second inner side. In this way, the orthographic projection areas of the first part and the second part can be increased to further increase the light-emitting area, improve the aperture ratio, enable the pixel structure to meet the requirements of high resolution, and provide good display quality.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed as above with examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be subject to the scope defined in the appended patent application.

10‧‧‧畫素結構 10‧‧‧ pixel structure

140‧‧‧畫素定義層 140‧‧‧ pixel definition layer

142‧‧‧第二擋牆 142‧‧‧Second retaining wall

150‧‧‧畫素開口 150‧‧‧ pixel opening

152‧‧‧第一部 152‧‧‧Part 1

1521‧‧‧第一外側邊 1521‧‧‧First outer side

1522‧‧‧第一內側邊 1522‧‧‧Inner side

154‧‧‧第二部 154‧‧‧Part 2

1541‧‧‧第二外側邊 1541‧‧‧Second outer side

1542‧‧‧第二內側邊 1542‧‧‧Second inner side

156‧‧‧中間部 156‧‧‧Middle

A-A’、B-B’、C-C’‧‧‧剖面線 A-A’, B-B’, C-C’ ‧‧‧ hatch

D1‧‧‧第一方向 D1‧‧‧First direction

D2‧‧‧第二方向 D2‧‧‧Second direction

L1‧‧‧第一長度 L1‧‧‧ First length

L2‧‧‧第二長度 L2‧‧‧Second length

L3‧‧‧第三長度 L3‧‧‧third length

PX‧‧‧畫素 PX‧‧‧ pixels

W1‧‧‧第一寬度 W1‧‧‧First width

W2‧‧‧第二寬度 W2‧‧‧second width

W3‧‧‧第三寬度 W3‧‧‧third width

W4‧‧‧第四寬度 W4‧‧‧ Fourth width

Claims (17)

一種畫素結構,包括:一第一電極;以及一畫素定義層設置於該第一電極上,具有一畫素開口,該畫素開口包括:一中間部;以及一第一部及一第二部,該第一部、該中間部及該第二部在一第一方向上依序排列,其中該第一部在一第二方向上具有一第一寬度W1,該第二部在該第二方向上具有一第二寬度W2,該中間部在該第二方向上具有固定的第三寬度W3,W3<W1且W3<W2,其中該第一部在該第一方向上具有一第一長度L1,該第二部在該第一方向上具有一第二長度L2,該中間部在該第一方向上具有一第三長度L3,20%
Figure 108104827-A0305-02-0025-7
×100%
Figure 108104827-A0305-02-0025-19
70%。
A pixel structure, including: a first electrode; and a pixel definition layer disposed on the first electrode, having a pixel opening, the pixel opening includes: a middle portion; and a first portion and a first Two parts, the first part, the middle part and the second part are sequentially arranged in a first direction, wherein the first part has a first width W1 in a second direction, and the second part is in the The second direction has a second width W2, the middle portion has a fixed third width W3 in the second direction, W3<W1 and W3<W2, wherein the first portion has a first width in the first direction A length L1, the second portion has a second length L2 in the first direction, and the middle portion has a third length L3 in the first direction, 20%
Figure 108104827-A0305-02-0025-7
×100%
Figure 108104827-A0305-02-0025-19
70%.
如申請專利範圍第1項所述的畫素結構,更包括一發光圖案,該發光圖案設置於該畫素開口中,其中該發光圖案於該畫素定義層與該第一電極的交接處的厚度H1大於該發光圖案於該第一電極上的厚度H2。 The pixel structure as described in item 1 of the patent application scope further includes a light emitting pattern disposed in the pixel opening, wherein the light emitting pattern is located at the junction of the pixel defining layer and the first electrode The thickness H1 is greater than the thickness H2 of the light emitting pattern on the first electrode. 如申請專利範圍第1項所述的畫素結構,更包括一第一擋牆設置於該中間部,以將該畫素開口的區域定義為一第一子畫素及一第二子畫素。 The pixel structure as described in item 1 of the patent application scope further includes a first retaining wall disposed in the middle portion to define the area of the pixel opening as a first sub-pixel and a second sub-pixel . 如申請專利範圍第1項所述的畫素結構,其中該畫素定義層更包括多個第二擋牆,該些第二擋牆分別設置於該中間部的兩個側邊,其中每一該第二擋牆在該第二方向上具有一第四寬度W4。 The pixel structure as described in item 1 of the patent application scope, wherein the pixel definition layer further includes a plurality of second retaining walls, which are respectively disposed on two sides of the middle portion, each of which The second retaining wall has a fourth width W4 in the second direction. 如申請專利範圍第1項所述的畫素結構,其中該第一部具有一第一內側邊及一第一外側邊,該第一內側邊及該第一外側邊平行該第二方向,該第二部具有一第二內側邊及一第二外側邊,該第二內側邊及該第二外側邊平行該第二方向。 The pixel structure as described in item 1 of the patent application, wherein the first part has a first inner side and a first outer side, the first inner side and the first outer side are parallel to the first In two directions, the second portion has a second inner side and a second outer side, and the second inner side and the second outer side are parallel to the second direction. 如申請專利範圍第5項所述的畫素結構,更包括多個第一擋牆,該些第一擋牆中的一者對應該第一部的該第一外側邊設置,該些第一擋牆中的另一者對應該第二部的該第二外側邊設置。 The pixel structure as described in item 5 of the patent application scope further includes a plurality of first retaining walls, one of the first retaining walls is disposed corresponding to the first outer side of the first part, and the The other one of the retaining walls corresponds to the second outer side of the second part. 如申請專利範圍第1項所述的畫素結構,其中該第一部的一第一內側邊相對該第二部的一第二內側邊,該第一內側邊的延伸方向交錯該第二內側邊的延伸方向。 The pixel structure as described in item 1 of the patent application scope, wherein a first inner side of the first part is opposite to a second inner side of the second part, and the extending direction of the first inner side is staggered by the The extending direction of the second inner side. 如申請專利範圍第1項所述的畫素結構,更包括一第二電極,該第二電極設置於該畫素定義層上。 The pixel structure as described in item 1 of the patent application further includes a second electrode, which is disposed on the pixel definition layer. 一種畫素結構,包括:一第一電極;以及一畫素定義層設置於該第一電極上,具有多個畫素開口,各該畫素開口包括:一中間部;以及一第一部及一第二部,該第一部、該中間部及該第二部在 一第一方向上依序排列,其中該第一部在一第二方向上具有一第一寬度W1,該第二部在該第二方向上具有一第二寬度W2,該中間部在該第二方向上具有固定的第三寬度W3,W3<W1且W3<W2,其中該第一部在該第一方向上具有一第一長度L1,該第二部在該第一方向上具有一第二長度L2,該中間部在該第一方向上具有一第三長度L3,20%
Figure 108104827-A0305-02-0027-11
×100%
Figure 108104827-A0305-02-0027-20
70%,其中該些畫素開口包括一第一畫素開口與一第二畫素開口在該第一方向上依序排列。
A pixel structure includes: a first electrode; and a pixel definition layer disposed on the first electrode and having a plurality of pixel openings, each of the pixel openings includes: a middle portion; and a first portion and A second part, the first part, the middle part and the second part are sequentially arranged in a first direction, wherein the first part has a first width W1 in a second direction, the second part Has a second width W2 in the second direction, the middle portion has a fixed third width W3 in the second direction, W3<W1 and W3<W2, wherein the first portion has in the first direction A first length L1, the second portion has a second length L2 in the first direction, and the middle portion has a third length L3 in the first direction, 20%
Figure 108104827-A0305-02-0027-11
×100%
Figure 108104827-A0305-02-0027-20
70%, wherein the pixel openings include a first pixel opening and a second pixel opening sequentially arranged in the first direction.
如申請專利範圍第9項所述的畫素結構,更包括一第一擋牆設置於該第一畫素開口與該第二畫素開口之間,以將該第一畫素開口的區域定義為一第一子畫素,該第二畫素開口的區域定義為一第二子畫素。 The pixel structure described in item 9 of the patent application scope further includes a first retaining wall disposed between the first pixel opening and the second pixel opening to define the area of the first pixel opening It is a first sub-pixel, and the area where the second pixel is opened is defined as a second sub-pixel. 如申請專利範圍第9項所述的畫素結構,更包括多個第一擋牆設置於該第一畫素開口的該中間部、該第二畫素開口的該中間部以及該第一畫素開口與該第二畫素開口之間,以將該第一畫素開口的區域定義為一第一子畫素及一第二子畫素,該第二畫素開口的區域定義為一第三子畫素及一第四子畫素。 The pixel structure described in item 9 of the patent application scope further includes a plurality of first retaining walls disposed at the middle portion of the first pixel opening, the middle portion of the second pixel opening, and the first picture Between the pixel opening and the second pixel opening, the area of the first pixel opening is defined as a first sub-pixel and a second sub-pixel, and the area of the second pixel opening is defined as a first Three sub-pixels and a fourth sub-pixel. 如申請專利範圍第9項所述的畫素結構,更包括多個發光圖案,每一該發光圖案設置於每一該畫素開口中,其中每一該發光圖案於該畫素定義層與該第一電極的交接處的厚度H1大於每一該發光圖案於該第一電極上的厚度H2。 The pixel structure as described in item 9 of the patent application scope further includes a plurality of light emitting patterns, each of the light emitting patterns is disposed in each of the pixel openings, wherein each of the light emitting patterns is in the pixel definition layer and the The thickness H1 of the junction of the first electrodes is greater than the thickness H2 of each light-emitting pattern on the first electrode. 如申請專利範圍第9項所述的畫素結構,其中該第一部具有一第一內側邊及一第一外側邊,該第一內側邊及該第一外側邊平行該第二方向,該第二部具有一第二內側邊及一第二外側邊,該第二內側邊及該第二外側邊平行該第二方向。 The pixel structure as described in item 9 of the patent application scope, wherein the first part has a first inner side and a first outer side, the first inner side and the first outer side are parallel to the first In two directions, the second portion has a second inner side and a second outer side, and the second inner side and the second outer side are parallel to the second direction. 如申請專利範圍第13項所述的畫素結構,更包括多個第一擋牆,該些第一擋牆中的一者對應該第一部的該第一外側邊設置,該些第一擋牆中的另一者對應該第二部的該第二外側邊設置。 The pixel structure as described in item 13 of the patent application scope further includes a plurality of first retaining walls, one of the first retaining walls is disposed corresponding to the first outer side of the first part, and the The other one of the retaining walls corresponds to the second outer side of the second part. 如申請專利範圍第9項所述的畫素結構,其中該第一部的一第一內側邊相對該第二部的一第二內側邊,該第一內側邊的延伸方向交錯該第二內側邊的延伸方向。 The pixel structure as described in item 9 of the patent application scope, wherein a first inner side of the first part is opposite to a second inner side of the second part, and the extending direction of the first inner side staggers the The extending direction of the second inner side. 如申請專利範圍第9項所述的畫素結構,更包括一第二電極,該第二電極設置於該畫素定義層上。 The pixel structure described in item 9 of the patent application scope further includes a second electrode disposed on the pixel definition layer. 一種畫素結構的製造方法,包括:形成一第一電極於一基板上;設置一畫素定義層於該第一電極上,具有一畫素開口,該畫素開口包括:一中間部;以及一第一部及一第二部,該第一部、該中間部及該第二部在一第一方向上依序排列;以及設置一發光圖案於該畫素開口中,其中該第一部在一第二方向上具有一第一寬度W1,該第二 部在該第二方向上具有一第二寬度W2,該中間部在該第二方向上具有固定的第三寬度W3,W3<W1且W3<W2,其中該畫素定義層更包括多個第二擋牆,該些第二擋牆分別設置於該中間部的兩個側邊,其中每一該第二擋牆在該第二方向上具有一第四寬度W4,且W4=X-W1,其中X為所述發光圖案的液滴直徑及機械精度的寬度,其中該第一部在該第一方向上具有一第一長度L1,該第二部在該第一方向上具有一第二長度L2,該中間部在該第一方向上具有一第三長度L3,20%
Figure 108104827-A0305-02-0029-12
×100%
Figure 108104827-A0305-02-0029-21
70%。
A method for manufacturing a pixel structure includes: forming a first electrode on a substrate; disposing a pixel definition layer on the first electrode, having a pixel opening, the pixel opening including: a middle portion; and A first part and a second part, the first part, the middle part and the second part are sequentially arranged in a first direction; and a light emitting pattern is provided in the pixel opening, wherein the first part It has a first width W1 in a second direction, the second portion has a second width W2 in the second direction, and the middle portion has a fixed third width W3 in the second direction, W3<W1 And W3<W2, wherein the pixel definition layer further includes a plurality of second retaining walls, the second retaining walls are respectively disposed on two sides of the middle portion, and each of the second retaining walls is located in the second The direction has a fourth width W4, and W4=X-W1, where X is the width of the droplet diameter and mechanical precision of the light emitting pattern, wherein the first portion has a first length L1 in the first direction , The second part has a second length L2 in the first direction, and the middle part has a third length L3 in the first direction, 20%
Figure 108104827-A0305-02-0029-12
×100%
Figure 108104827-A0305-02-0029-21
70%.
TW108104827A 2018-06-22 2019-02-13 Pixel structure and manufacturing method thereof TWI683168B (en)

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