TWI695527B - Display panel - Google Patents

Abstract

A display panel includes a substrate, an active device layer disposed on the substrate, an insulating layer disposed on the active device layer, a first electrode disposed on the insulating layer, an organic light-emitting film, and a second electrode disposed on the organic light-emitting film. The insulating layer has a trench. A first electrode is electrically connected to the active device layer. An organic light-emitting film has a first thickness T1 and a second thickness T2. The thickness of the organic light-emitting film on the first electrode is the second thickness T2, and the thickness of the light-emitting film in the trench of the insulating layer is the first thickness T1. T1 is bigger than T2.

Description

Display panel

The present invention relates to a display panel, and particularly to a display panel having grooves in an insulating layer.

Light emitting diode (LED) has advantages such as long life, small size, high shock resistance, low heat generation, and low power consumption, so it has been widely used as an indicator or light source in homes and various devices.

Ink Jet Printing (IJP) technology can improve the utilization rate of materials in the LED process to reduce the cost of the process, but before the inkjet coating needs to form a corresponding pixel setting bank (bank) to define Each pixel area. However, when the droplets are sprayed into the containing space formed by the retaining wall, the difference in the surface tension of the liquid and the adhesion of the retaining wall leads to the poor uniformity of the thickness of the film formed by the subsequent drying process, resulting in the surrounding pixels The brightness and chroma are significantly different from the center.

The invention provides a display panel, which can improve the uniformity of the film thickness and provide good display quality.

The display panel of the present invention includes a substrate, an active device layer disposed on the substrate, an insulating layer disposed on the active device layer, a first electrode disposed on the insulating layer, an organic light emitting film, and a second electrode disposed on the organic light emitting film. The insulating layer has trenches. The first electrode is electrically connected to the active device layer. The organic light-emitting film has a first thickness T1 and a second thickness T2. The thickness of the organic light-emitting film on the first electrode is the second thickness T2. The thickness of the organic light emitting film in the trench of the insulating layer is the first thickness T1, and T1 is greater than T2.

Based on the above, in the display panel according to an embodiment of the present invention, since the display panel can form the first insulating pattern, the second insulating pattern, and the trench through the patterned insulating layer, the trench can partially surround the second insulating pattern. Under the above-mentioned arrangement, the organic light-emitting film may be provided on the first electrode on the second insulating pattern and have a second thickness. The organic light-emitting film has a portion with a first thickness, which is disposed in the trench due to the non-uniform film thickness due to the proximity to the first insulating pattern. In this way, the uniformity of the film thickness of the organic light-emitting film on the first electrode can be improved to provide uniform brightness and good display quality of the display panel. In addition, grooves can reduce the risk of spillage. In addition, the organic light-emitting film located on the first electrode can be further away from the first insulating pattern through the trench, so it is not easily affected by moisture or oxygen, and the deterioration or shrinkage film can improve the luminous efficiency of the display panel and increase the life .

In order to make the above-mentioned features and advantages of the present invention more obvious and understandable, the embodiments are specifically described below in conjunction with the accompanying drawings for detailed description as follows.

10, 10A, 10B, 10C, 10D, 10E: display panel

100: substrate

120: Active component layer

121: Surface

122: dielectric layer

130, 130A, 130D, 130E: insulating layer

131: first top surface

132: First insulation pattern

133, 133D, 133E: groove

134, 134A, 134D, 134E: second insulation pattern

135: Second top surface

136: Long side

137: Short side

139D: connection structure

140, 140B: the first electrode

150: second electrode

160: protective layer

170: through hole

180: third insulation pattern

200: Organic light-emitting film

200’: Organic light-emitting materials

A-A’, B-B’, C-C’, D-D’: hatching

CH: channel layer

D: Jiji

G: gate

H1: first height

H2: second height

S: source

T: Active component

T1: first thickness

T2: second thickness

W1, W1A: the first width

W2, W2A: second width

FIG. 1A to FIG. 1E are schematic cross-sectional views of a manufacturing process of a display panel according to an embodiment of the invention.

2 is a schematic partial top view of a display panel according to an embodiment of the invention.

FIG. 3 is a schematic partial top view of a display panel according to another embodiment of the invention.

4A is a schematic partial top view of a display panel according to still another embodiment of the invention.

4B is a schematic cross-sectional view of the display panel of FIG. 4A along the cross-sectional line B-B'.

5A is a schematic partial top view of a display panel according to still another embodiment of the invention.

5B is a schematic cross-sectional view of the display panel of FIG. 5A along the cross-sectional line C-C'.

6A is a schematic partial top view of a display panel according to still another embodiment of the invention.

6B is a schematic cross-sectional view of the display panel of FIG. 6A along the cross-sectional line D-D'.

7 is a schematic partial top view of a display panel according to still another embodiment of the invention.

In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Throughout the specification, the same reference numerals denote the same elements. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being “on” or “connected to” another element, it can be directly on the other element or be connected to the other element Pieces, or intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connections. Furthermore, "electrical connection" or "coupling" may be that there are other elements between the two elements.

It should be understood that although the terms "first", "second", "third", etc. may be used herein to describe various elements, components, regions, layers, and/or sections, these elements, components, regions, and/or Or part should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Accordingly, "first element", "component", "region", "layer" or "portion" discussed below may be referred to as a second element, component, region, layer or section without departing from the teachings herein.

Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having meanings consistent with their meanings in the context of the relevant technology and the present invention, and will not be interpreted as idealized or excessive Formal meaning unless explicitly defined as such in this article.

FIG. 1A to FIG. 1E are schematic cross-sectional views of a manufacturing process of a display panel according to an embodiment of the invention. FIG. 2 is a schematic partial top view of a display panel according to an embodiment of the present invention. For convenience of description and observation, FIG. 2 only schematically shows some components. In this embodiment, the display panel 10 (shown in FIG. 1E) includes a substrate 100, an active device layer 120 disposed on the substrate 100, and an insulating layer 130 disposed on the active device The layer 120 has a trench 133, the first electrode 140 is disposed on the insulating layer 130 and is electrically connected to the active device layer 120, and the organic light emitting film 200 and the second electrode 150 are disposed on the organic light emitting film 200. In some embodiments, a protective layer 160 may also be provided on the second electrode 150, but the invention is not limited thereto. In the following, a manufacturing method of the display panel 10 will be briefly described with an embodiment.

Please refer to FIG. 1A. In this embodiment, the substrate 100 is first provided. The material of the substrate 100 may be glass, quartz, organic polymer, opaque/reflective material (for example: conductive material, metal, wafer, ceramic or other applicable materials) or other applicable materials. If conductive materials or metals are used, a layer of insulating material (not shown) is covered on the substrate 100 to avoid short circuit problems.

Next, the active device layer 120 is provided on the substrate 100. The active device layer 120 may be, for example, an active device array (not shown), wherein the active device array described above includes a dielectric layer 122 and a plurality of active devices T (shown in FIG. 4B). The active device T includes a thin film transistor (TFT). The thin film transistor is, for example, low temperature poly-Si (LTPS) or amorphous silicon thin-film transistor (a-Si), but the invention is not limited thereto.

Next, an insulating layer 130 is provided on the active device layer 120. In this embodiment, the material of the insulating layer 130 includes an inorganic material. Inorganic materials include silicon nitride (SiN _x ) or other suitable materials, and the invention is not limited thereto. The insulating layer 130 includes a first insulating pattern 132 and a second insulating pattern 134. In this embodiment, the first insulating pattern 132, the second insulating pattern 134, and the trench 133 are formed by etching the insulating layer 130 to form the first layer by, for example, yellow photolithography or a half-tone mask An insulating pattern 132 surrounds the second insulating pattern 134, and the trench 133 is disposed between the first insulating pattern 132 and the second insulating pattern 134. In this embodiment, the patterned insulating layer 130 can be formed to form a first insulating pattern 132 that defines a pixel wall. In this way, a layer of insulating layer 130 can omit the conventional steps of separately forming an insulating layer, a flat layer and a retaining wall, so as to simplify the manufacturing process and save costs.

Please refer to FIGS. 1B and 2. Then, a plurality of first electrodes 140 are disposed on the insulating layer 130. For example, the first electrode 140 is disposed on the second insulating pattern 134. In this embodiment, the material of the first electrode 140 is a conductor material, such as aluminum (Al), silver (Ag), chromium (Cr), copper (Cu), nickel (Ni), titanium (Ti), molybdenum (Mo ), magnesium (Mg), platinum (Pt), gold (Au) or a combination thereof. The first electrode 140 may have a single-layer, double-layer, or multilayer structure. For example, the first electrode 140 may be a three-layer structure composed of ITO/Ag/ITO, but the invention is not limited thereto. In other embodiments, the first electrode 140 may also be Ti/Al/Ti or a three-layer structure composed of Mo/Al/Mo. In some embodiments, the first electrode 140 further includes a reflective electrode, the material of which may be a metal having good reflectivity for visible light, such as aluminum, molybdenum, gold, or a combination thereof. In some embodiments, the forming method of the first electrode 140 may be chemical vapor deposition (CVD), physical vapor deposition (PVD), atomic layer deposition (ALD), vapor deposition (VTE), sputtering (SPT), or Its combination. In some embodiments, the first electrode 140 may serve as an anode of the organic light-emitting film 200, but the invention is not limited thereto.

Please refer to FIGS. 1C and 1D. Next, the organic light emitting film 200 is disposed on the first electrode 140 and in the trench 133. Please refer to FIG. 1C first. In this embodiment, in order to increase the utilization rate of materials to reduce the manufacturing cost of the display panel 10, inkjet An organic jet film 200 is formed by an ink jet printing (IJP) process. For example, the liquid organic light-emitting material 200' can be disposed on the first electrode 140 and located in the trench 133 by an inkjet coating process. The organic light emitting material 200' is, for example, a liquid material of the organic light emitting film 200 as a pixel.

Then, referring to FIG. 1D, through a curing process (not shown), the liquid organic light emitting material 200' is dried to form a solid organic light emitting film 200. In some embodiments, the organic light-emitting film 200 may have a multi-layer structure, including a hole injection layer (HIL), a hole transfer layer (HTL), an emission layer (EL), and electrons Transport layer (electron transfer layer, ETL). For convenience of description and clear representation, FIG. 1D is represented by only one layer structure. In this embodiment, the inkjet coating process and the curing process can be repeated to form the organic light-emitting film 200 with a desired thickness, but the invention is not limited thereto.

In some embodiments, the material of the hole injection layer is, for example, xylylene copper, star arylamines, polyaniline, polyethylene dioxythiophene, or other suitable materials. The material of the hole transport layer is, for example, triaromatic amines, cross-structured diamine biphenyl, diamine biphenyl derivatives or other suitable materials. The light-emitting layer may be a red organic light-emitting layer, a green organic light-emitting layer, a blue organic light-emitting layer, or a light-emitting layer of different colors (for example, white, orange, yellow, etc.) produced by mixing light of various spectra. The material of the electron transport layer may be an oxazole derivative and its dendrimer, a metal chelate compound (such as Alq3), an azole compound, a diazoanthracene derivative, a silicon-containing heterocyclic compound, or other suitable materials.

Please refer to FIGS. 1E and 2. FIG. 1E is a schematic cross-sectional view of the display panel 10 of FIG. 2 along the cross-sectional line A-A'. Next, the second electrode 150 is provided on the organic On the light emitting film 200. In this embodiment, the second electrode 150 may be disposed on the organic light emitting film 200 and the insulating layer 130 over the entire surface and overlap the first electrode 140 and the trench 133, but the invention is not limited thereto. The material of the second electrode 150 may be a transparent conductive material, such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, or indium germanium zinc oxide. In some embodiments, the formation method of the second electrode 150 may be chemical vapor deposition (CVD), physical vapor deposition (PVD), atomic layer deposition (ALD), vapor deposition (VTE), sputtering (SPT), or Its combination. In some embodiments, the second electrode 150 may serve as a cathode of the organic light emitting film 200.

Finally, a protective layer 160 is provided on the second electrode 150. In this embodiment, the material of the protective layer 160 includes an inorganic material. The inorganic material includes silicon nitride (SiNx) or other suitable materials, and the invention is not limited thereto.

Please refer to FIGS. 1E and 2. In structure, the orthographic projection of the first electrode 140 on the substrate 100 is in the orthographic projection of the organic light-emitting film 200 on the substrate 100. In addition, the orthographic projection of the second insulating pattern 134 on the substrate 100 overlaps or is within the orthographic projection of the first electrode 140 on the substrate 100. This embodiment is described by taking the orthographic projection of the second insulating pattern 134 on the substrate 100 in the orthographic projection of the first electrode 140 on the substrate 100 as an example, but the invention is not limited thereto. In this embodiment, the first electrode 140 covers the second insulating pattern 134, and a portion of the first electrode 140 extends from the second top surface 135 of the second insulating pattern 134 to the sidewall of the second insulating pattern 134 and enters the trench 133 is in contact with the active device layer 120.

In this embodiment, the display panel 10 further includes a through hole 170, and the through hole 170 The orthographic projection on the substrate 100 overlaps the orthographic projection of the groove 133 on the substrate 100. More specifically, the orthographic projection of the through hole 170 on the substrate 100 may be within the orthographic projection of the trench 133 on the substrate 100, but the invention is not limited thereto. In this embodiment, the through hole 170 overlaps the trench 133 and is close to the short side 137 of the second insulating pattern 134, but the invention is not limited thereto. The first electrode 140 is electrically connected to the active device layer 120 through the through hole 170. In this embodiment, the diameter of the through hole 170 is, for example, equal to or greater than 3 microns, but the invention is not limited thereto.

It is worth noting that in this embodiment, the height H1 of the first insulating pattern 132 is greater than the height H2 of the second insulating pattern 134. The height H1 is the height from the first top surface 131 of the first insulating pattern 132 to the surface 121 of the active device layer 120. The height H2 is the height from the second top surface 135 of the second insulating pattern 134 to the surface 121 of the active device layer 120. The first insulating pattern 132 and the second insulating pattern 134 have a height difference (for example: H1-H2). The above-mentioned height difference is 0.5 to 1.5 microns. Under the above arrangement, the first insulating pattern 132 can serve as a barrier wall defining pixels to accommodate the liquid organic light-emitting material 200 in the inkjet coating process (shown in FIG. 1C). In addition, in the present embodiment, the trench 133 is disposed between the first insulating pattern 132 and the second insulating pattern 134 and surrounds the second insulating pattern 134 on four sides. In this way, the excess organic light-emitting material 200' can flow into the trench 133 to be accommodated to reduce the risk of overflow.

In addition, the difference between the surface tension of the liquid and the adsorption force of the first insulating pattern 132 (as a retaining wall structure) may cause the film thickness to be uneven during the droplet drying process, so the thickness of the organic light emitting film 200 increases as it approaches the first The insulation pattern 132 gradually increases, This results in uneven film thickness. Since the display panel 10 of the present invention is provided with a trench 133 between the first insulating pattern 132 and the second insulating pattern 134, the organic light emitting film 200 contacts the insulating layer 130 in the trench 133 in the direction perpendicular to the substrate 100 ( For example, the thickness of the first insulating pattern 132 is greater than the thickness of the organic light emitting film 200 at the center point of the trench 133 (for example, the point of the trench 133 farthest from the first insulating pattern 132 and the second insulating pattern 134). In this way, the organic light-emitting film 200 can form a uniform film thickness on the first electrode 140 in the light-emitting region, and the uneven film thickness portion is disposed in the groove 133 in the non-light-emitting region to provide uniform brightness and good Display quality.

In this embodiment, the organic light emitting film 200 may have a first thickness T1 and a second thickness T2. The thickness of the organic light-emitting film 200 on the first electrode 140 is the second thickness T2, and the thickness of the organic light-emitting film 200 in the trench 133 of the insulating layer 130 is the first thickness T1. As described above and shown in FIG. 1E, the uneven thickness of the organic light-emitting film 200 is provided in the trench 133, and the first thickness T1 can be defined as approaching the first insulating pattern 132 from the center point of the trench 133 And the increasing thickness. That is, the first thickness T1 may be the maximum thickness of the first thickness T1 where the organic light emitting film 200 contacts the first insulating pattern 132, and the first thickness T1 may be the first thickness where the organic light emitting film 200 is located at the center point of the trench 133 A minimum thickness of T1, but the invention is not limited thereto. In this embodiment, the first thickness T1 is greater than the second thickness T2. In this way, in addition to improving the thickness uniformity of the organic light-emitting film 200 on the first electrode 140, the thickness of the organic light-emitting film 200 can be controlled by the arrangement of the groove 133 to provide uniform brightness and good display quality .

In the present embodiment, the width of the trench 133 is 1.5 microns to 200 microns. For example, the distance between the short side 137 of the second insulating pattern 134 and the first insulating pattern 132 defines the first width W1 of the trench 133. The distance between the long side 136 of the second insulating pattern 134 and the first insulating pattern 132 defines the second width W2 of the trench 133. In this embodiment, the first width W1 is equal to the second width W2, which is respectively 1.5 micrometers to 200 micrometers, but the invention is not limited thereto. In some embodiments, the first width W1 and the second width W2 can be adjusted differently according to user needs. Under the above arrangement, the trench 133 can accommodate the organic light-emitting film 200, and the organic light-emitting film 200 on the first electrode 140 can also pass through the trench 133 and away from the first insulating pattern 132. As such, the organic light-emitting film 200 located on the first electrode 140 is not easily affected by moisture or oxygen from the first insulating pattern 132, but is deteriorated or shrunk to improve the light-emitting efficiency and increase the lifespan.

In short, the display panel 10 according to an embodiment of the present invention can form the first insulating pattern 132, the second insulating pattern 134, and the trench 133 through the patterned insulating layer 130, and the trench 133 is disposed on the first insulating pattern 132 Between the second insulating pattern 134 and partially surrounding the second insulating pattern 134. Under the above-described arrangement, the organic light-emitting film 200 may be provided on the first electrode 140 on the second insulating pattern 134 and have the second thickness T2. The organic light-emitting film 200 has a portion with a first thickness T1, which is disposed in the trench 133 due to the non-uniform film thickness due to the proximity to the first insulating pattern 132. In this way, the uniformity of the film thickness of the organic light-emitting film 200 on the first electrode 140 can be improved to provide uniform brightness and good display quality of the display panel 10. In addition, during the inkjet coating process, the excess organic light-emitting film 200 can be accommodated in the trench 133 to Reduce the risk of overflow. In addition, the organic light-emitting film 200 located on the first electrode 140 can be further away from the first insulating pattern 132 through the arrangement of the trench 133, so it is not easily affected by moisture or oxygen from the first insulating pattern 132, and deteriorate or Shrinking the film can improve the luminous efficiency of the display panel 10 and increase the lifespan.

The following embodiments continue to use the element numbers and partial contents of the previous embodiments, wherein the same reference numerals are used to denote the same or similar elements. For the description of the parts that omit the same technical content, please refer to the previous embodiments. Repeat the details.

FIG. 3 is a schematic partial top view of a display panel according to another embodiment of the invention. The display panel 10A shown in this embodiment is similar to the display panel 10 shown in FIG. 2, the main difference is that the first width W1A of the trench 133 between the second insulating pattern 134A and the first insulating pattern 132 is different from the first Two width W2A. In this embodiment, the insulating layer 130A includes a first insulating pattern 132 and a second insulating pattern 134A. Compared to the embodiment of FIG. 2, the first width W1A of the display panel 10A is larger than the first width W1 of the display panel 10, and the second width W2A is smaller than the second width W2. Under the above configuration, the width of the groove 133 can be adjusted according to the needs of users without sacrificing the aperture ratio of the display panel 10A, which can improve the display quality of the display panel 10A.

In this embodiment, the first width W1A is larger than the second width W2A. The through hole 170 may be provided in a portion of the trench 133 having the first width W1A. As such, compared to the second width W2A having a smaller width, the through hole 170 may be disposed in the trench 133 having the first width W1A having a larger width, so as to reduce the difficulty of the process of providing the through hole 170. In this way, the area where the first electrode 140 is in contact with the through hole 170 can be further increased to reduce the probability of disconnection. In addition, the display panel 10A can also obtain technical effects similar to those of the foregoing embodiments.

4A is a schematic partial top view of a display panel according to still another embodiment of the invention. 4B is a schematic cross-sectional view of the display panel of FIG. 4A along the cross-sectional line B-B'. 4A and 4B only schematically illustrate some components for convenience of explanation and observation. The display panel 10B shown in this embodiment is similar to the display panel 10 shown in FIG. 2, the main difference is that the orthographic projection of the first electrode 140B on the substrate 100 is in the orthographic projection of the second insulating pattern 134 on the substrate 100 . 4A and 4B, in this embodiment, the first electrode 140B may not overlap the edges of the second insulating pattern 134 (such as the long side 136 or the short side 137) but only overlap the second insulating pattern at the overlapping through-hole 170 The short side of 134 is 137. In this way, the organic light-emitting film 200 on the first electrode 140B can be further away from the trench 133, reducing the influence of the uneven thickness of the organic light-emitting film 200 in the trench 133, further improving the uniformity of the film thickness of the organic light-emitting film 200, and providing a display The panel 10B has good display quality.

In this embodiment, the first electrode 140B is electrically connected to the active device T in the active device layer 120 through the through hole 170. For example, the active device layer 120 includes a dielectric layer 122 and an active device T. In this embodiment, the active element T is, for example, a thin film transistor, which may include a channel layer CH, a gate G, a source S, and a drain D. The source electrode S and the drain electrode D are electrically connected to the channel layer CH, respectively. In some embodiments, the gate G may be electrically connected to the corresponding scan line (not shown), the source S may be electrically connected to the corresponding data line (not shown), and the drain D may pass through the corresponding through hole 170 with electricity Connected to the first electrode 140B. In this embodiment, the active element T is a top-gate transistor, but the invention is not limited to this. In other embodiments, the active device T may also be a bottom gate transistor, a three-dimensional transistor, or other suitable transistors. The channel layer CH can be a single-layer or multi-layer structure, and its materials include amorphous silicon, microcrystalline silicon, nanocrystalline silicon, polycrystalline silicon, monocrystalline silicon, organic semiconductor materials, oxide semiconductor materials, carbon nanotubes/rods, Other suitable materials, or combinations of the foregoing. In this way, the first electrode 140B can conduct the signal provided by the active device T to the organic light-emitting film 200 and the second electrode 150 to make the organic light-emitting film 200 emit light.

5A is a schematic partial top view of a display panel according to still another embodiment of the invention. FIG. 5B is a schematic cross-sectional view of the display panel of FIG. 5A along the section line CC′. 5A and 5B only schematically show some components for convenience of explanation and observation. The display panel 10C shown in this embodiment is similar to the display panel 10 shown in FIG. 2, the main difference is that the display panel 10C further includes a third insulating pattern 180 disposed on the active device layer 120 and the first insulating pattern 132 and the second Between the insulating patterns 134. In other words, the third insulating pattern 180 is disposed between the insulating layer 130 and the active device layer 120. The material of the third insulating pattern 180 includes an inorganic material. Inorganic materials include silicon nitride (SiN _x ) or other suitable materials, and the invention is not limited thereto. In this embodiment, after the active device layer 120 is provided, the third insulating pattern 180 may be provided as a flat layer first, and then the insulating layer 130 may be provided. In this way, the surfaces of the first insulating pattern 132 and the second insulating pattern 134 (such as the first top surface 131 or the second top surface 135) can be more flat to improve the uniformity of the film thickness of the organic light-emitting film 200 and provide the display panel 10C Good display quality.

In this embodiment, the orthographic projection of the second insulating pattern 134 on the substrate 100 can be completely located in the orthographic projection of the first electrode 140 on the substrate 100 so that the first electrode 140 completely covers the second insulating pattern 134. For example, the first electrode 140 may extend into the trench 133 and contact the third insulating pattern 180 and a portion of the through hole 170 exposed by the third insulating pattern 180. In this way, the size of the first electrode 140 can be further improved, and can be electrically connected to the active device layer 120 through the through hole 170, and a technical effect similar to that of the above-mentioned embodiment can be obtained. .

6A is a schematic partial top view of a display panel according to still another embodiment of the invention. 6B is a schematic cross-sectional view of the display panel of FIG. 6A along the cross-sectional line D-D'. For convenience of description and observation, FIGS. 6A and 6B only schematically show some components. The display panel 10D shown in this embodiment is similar to the display panel 10C shown in FIG. 5A, and the main difference is that the trench 133D surrounds a portion of the second insulating pattern 134D. 6A and 6B, for example, the insulating layer 130D includes a first insulating pattern 132 and a second insulating pattern 134D. The second insulating pattern 134D extends along the long side 136 direction, and the short side 137 of the second insulating pattern 134D is connected to the first insulating pattern 132. Specifically, the trench 133D substantially surrounds the second insulating pattern 134D, and in the trench 133D near the short side 137, a portion of the second insulating pattern 134D extends along the direction of the long side 136 to extend on the short side 137 The connection structure 139D is connected to connect the short side 137 to the first insulating pattern 132. In this embodiment, the connection structure 139D and the second insulating pattern 134D belong to the same film layer. Under the above arrangement, the second electrode 150 may extend from the second insulating pattern 134D along the connection structure 139D to the first insulating pattern 132 to reduce the second electrode 150 in a direction perpendicular to the substrate 100 The probability of disconnection due to the height difference between the trench 133D and the second insulating pattern 134D improves the yield and performance of the display panel 10D.

In the present embodiment, the connection structure 139D is extended on the short side 137 and the short side 137 is connected to the first insulating pattern 132 as an example for description. In some embodiments, the connection structure 139D may also extend from the long side 136 to connect the long side 136 of the second insulating pattern 134D to the first insulating pattern 132, which is not limited in the present invention. In addition, in some embodiments, a plurality of connection structures 139D may be extended on the short side 137 and the long side 136 at the same time to connect to the first insulating pattern 132 as required. In this way, the display panel 10D can obtain technical effects similar to those of the foregoing embodiments.

7 is a schematic partial top view of a display panel according to still another embodiment of the invention. The display panel 10E shown in this embodiment is similar to the display panel 10D shown in FIG. 6A, and the main difference is that the short side 137 of the second insulating pattern 134E is connected to the first insulating pattern 132. In this embodiment, the insulating layer 130E includes a first insulating pattern 132 and a second insulating pattern 134E. The trench 133E surrounds a part of the edge of the second insulating pattern 134E, for example, a part of the long side 136 or the short side 137 of the second insulating pattern 134E. Compared with the display panel 10C of FIG. 5A or the display panel 10D of FIG. 6A, the short side 137 of the second insulating pattern 134E of the display panel 10E of this embodiment is directly connected to the first insulating pattern 132. For example, the trench 133E of the display panel 10E only surrounds three sides of the second insulating pattern 134E. That is, one side (for example, short side 137) or multiple sides (for example, any two sides or any three sides) of the second insulating pattern 134E may be close to and contact the first insulating pattern 132. Thereby, the width and position of the groove 133E can be adjusted according to the needs of users without sacrificing the aperture ratio of the display panel 10E.

In this embodiment, since the short side 137 can integrally connect the first insulating pattern 132, the ratio of the second electrode 150 not overlapping the trench 133E can be increased to further reduce the second electrode 150 in the direction perpendicular to the substrate 100 The probability of disconnection due to the height difference between the trench 133E and the second insulating pattern 134E. In this way, the display panel 10E can obtain technical effects similar to those of the foregoing embodiments.

In this embodiment, the through hole 170 is provided in the trench 133E near the long side 136, but the invention is not limited to this. In some embodiments, the through hole 170 may also be provided in the trench 133E near the short side 137. In addition, in this embodiment, the short side 137 is connected to the first insulating pattern 132 as an example for description. In some embodiments, the second insulating pattern 134E may also be connected to the first insulating pattern 132 by the long side 136, which is not limited in the present invention. In addition, in some embodiments, the short side 137 and the long side 136 can be connected to the first insulating pattern 132 at the same time as needed.

In summary, in the display panel according to an embodiment of the invention, the display panel can form the first insulating pattern, the second insulating pattern, and the trench through the patterned insulating layer, and the trench can partially surround the second insulating pattern. Under the above-mentioned arrangement, the organic light-emitting film may be provided on the first electrode on the second insulating pattern and have a second thickness. The organic light-emitting film has a portion with a first thickness, which is disposed in the trench due to the non-uniform film thickness due to the proximity to the first insulating pattern. In this way, the uniformity of the film thickness of the organic light-emitting film on the first electrode can be improved to provide uniform brightness and good display quality of the display panel. In addition, excess organic light-emitting film can be accommodated in the trench to reduce the risk of spillage. In addition, the organic light-emitting film located on the first electrode can pass through the trench and away from the first insulating pattern, so it is not susceptible to moisture from the first insulating pattern Or the influence of oxygen, and deterioration or shrinkage, can improve the luminous efficiency of the display panel and increase the life. In addition, the width of the groove can also be adjusted according to the needs of users without sacrificing the aperture ratio of the display panel, which can improve the display quality of the display panel. In addition, the short side of the second insulating pattern can be further connected to the first insulating pattern to reduce the probability of disconnection of the second electrode due to the height difference between the trench and the second insulating pattern, thereby improving the yield of the display panel And performance.

Although the present invention has been disclosed as above with examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be subject to the scope defined in the appended patent application.

10‧‧‧Display panel

100‧‧‧ substrate

120‧‧‧Active component layer

121‧‧‧Surface

130‧‧‧Insulation

131‧‧‧ First top

132‧‧‧First insulation pattern

133‧‧‧Groove

134‧‧‧Second insulation pattern

135‧‧‧Second top surface

140‧‧‧First electrode

150‧‧‧Second electrode

160‧‧‧Protective layer

200‧‧‧ organic light-emitting film

A-A’‧‧‧hatching

H1‧‧‧ First height

H2‧‧‧second height

T1‧‧‧ First thickness

T2‧‧‧Second thickness

W1‧‧‧First width

Claims (11)

A display panel includes: a substrate; an active element layer disposed on the substrate; an insulating layer disposed on the active element layer, and the insulating layer includes a first insulating pattern, a second insulating pattern and a A trench, the first insulating pattern surrounds the second insulating pattern, and the trench is disposed between the first insulating pattern and the second insulating pattern; a first electrode is disposed on the second insulating pattern, and Electrically connected to the active device layer; an organic light emitting film having a first thickness T1 and a second thickness T2, wherein the thickness of the organic light emitting film on the first electrode is the second thickness T2, the organic light emitting The thickness of the film in the trench of the insulating layer is the first thickness T1, and T1 is greater than T2; and a second electrode is disposed on the organic light-emitting films and the first insulating pattern. The display panel as described in item 1 of the patent application range, wherein the orthographic projection of the first electrode on the substrate is in the orthographic projection of the organic light-emitting film on the substrate. The display panel as described in item 1 of the patent application scope further includes a third insulating pattern disposed between the active device layer and the first insulating pattern and the second insulating pattern. The display panel of claim 3, wherein the orthographic projection of the second insulating pattern on the substrate overlaps or is within the orthographic projection of the first electrode on the substrate. The display panel according to item 1 of the patent application scope, wherein the height of the first insulation pattern is greater than the height of the second insulation pattern, and there is a height difference between the first insulation pattern and the second insulation pattern, the The difference in height is 0.5 to 1.5 microns. The display panel as described in item 1 of the patent application range, wherein the trench surrounds a portion of the second insulating pattern. The display panel as described in Item 6 of the patent application range, wherein the second insulating pattern extends along a long side direction, and a short side of the second insulating pattern is connected to the first insulating pattern. The display panel as described in item 1 of the patent application further includes a through hole, the orthographic projection of the through hole on the substrate overlaps the orthographic projection of the trench on the substrate, and the first electrode is electrically conductive through the through hole Connect to the active device layer. The display panel according to item 1 of the patent application scope further includes a through hole, the orthographic projection of the through hole on the substrate is within the orthographic projection of the groove on the substrate, and the first electrode passes through the through hole It is electrically connected to the active device layer. The display panel as described in item 1 of the patent application range, wherein the width of the groove is 1.5 μm to 200 μm. The display panel as claimed in item 1 of the patent application range, wherein the thickness of the organic light emitting film contacting the insulating layer in the trench is greater than the thickness of the organic light emitting film at the center of the trench in a direction perpendicular to the substrate thickness.

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