TWI679765B - Display device and manufacturing method thereof - Google Patents
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Abstract
一種顯示裝置,包括多個子畫素。多個子畫素設置於基板上。每一子畫素包括主動元件、第一電極、第一堤岸層、第二堤岸層、發光層以及第二電極。第一堤岸層設置於第一電極上,且具有與部分之第一電極重疊的第一開口。第二堤岸層設置於第一堤岸層上,且具有與第一開口重疊的第二開口。第一堤岸層具材料區域。材料區域於基板上的垂直投影位於第一開口於基板上的垂直投影與第二開口於基板上的垂直投影之間。材料區域在第一方向上具有第一寬度,材料區域在與第一方向交錯的第二方向上具有第二寬度。多個子畫素之第一子畫素的材料區域的第一寬度不等於第二寬度。此外,上述顯示裝置的製造方法也被提出。A display device includes a plurality of sub pixels. A plurality of sub pixels are disposed on the substrate. Each sub-pixel includes an active element, a first electrode, a first bank layer, a second bank layer, a light emitting layer, and a second electrode. The first bank layer is disposed on the first electrode and has a first opening overlapping a part of the first electrode. The second bank layer is disposed on the first bank layer and has a second opening overlapping the first opening. The first bank layer has a material area. The vertical projection of the material region on the substrate is between the vertical projection of the first opening on the substrate and the vertical projection of the second opening on the substrate. The material region has a first width in a first direction, and the material region has a second width in a second direction that intersects with the first direction. The first width of the material region of the first subpixel of the plurality of subpixels is not equal to the second width. In addition, a method for manufacturing the above display device is also proposed.
Description
本發明是有關於一種顯示裝置及其製造方法。The invention relates to a display device and a manufacturing method thereof.
隨著科技的進步,於有機發光二極體(ORGANIC LIGHT EMITTING DIODE;OLED)顯示裝置的製程中,可使用噴墨印刷製程(Ink Jet Printing;IJP)形成發光層。噴墨印刷製程是將液化的有機發光材料噴射或注入到由堤岸(bank)定義出的開口中,以形成發光層。然而,有機發光材料在開口中形成的發光層的膜厚不均,進而影響顯示面板的顯示品質。舉例來說,發光層在開口邊緣處的膜厚遠大於發光層在開口中心處的膜厚,亦即,發光層在開口邊緣處的膜厚與在開口中心處的膜厚差異極大。With the advancement of science and technology, in the manufacturing process of organic light emitting diode (OLED) display devices, an inkjet printing process (IJP) can be used to form a light emitting layer. The inkjet printing process is to spray or inject a liquefied organic light-emitting material into an opening defined by a bank to form a light-emitting layer. However, the thickness of the light-emitting layer formed by the organic light-emitting material in the opening is uneven, which further affects the display quality of the display panel. For example, the film thickness of the light-emitting layer at the edge of the opening is much larger than the film thickness of the light-emitting layer at the center of the opening, that is, the film thickness of the light-emitting layer at the edge of the opening is greatly different from the film thickness at the center of the opening.
本發明提供一種顯示裝置,性能佳。The invention provides a display device with excellent performance.
本發明提供一種顯示裝置的製造方法,能製造出性能佳的顯示裝置。The invention provides a method for manufacturing a display device, which can manufacture a display device with high performance.
本發明的一種顯示裝置,包括多個子畫素。多個子畫素設置於基板上。每一子畫素包括主動元件、第一電極、第一堤岸層、第二堤岸層、發光層以及第二電極。第一電極與主動元件電性連接。第一堤岸層設置於第一電極上,且具有與部分之第一電極重疊的第一開口。第二堤岸層設置於第一堤岸層上,且具有與第一開口重疊的第二開口。發光層設置於部分的第一電極上,且位於第一堤岸層的第一開口與第二堤岸層的第二開口。第二電極設置於發光層上。第一堤岸層具材料區域,材料區域於基板上的垂直投影位於第一開口於基板上的垂直投影與第二開口於基板上的垂直投影之間。材料區域在第一方向上具有第一寬度,材料區域在與第一方向交錯的第二方向上具有第二寬度。子畫素包括第一子畫素。第一子畫素之材料區域的第一寬度不等於第一子畫素之材料區域的第二寬度。A display device of the present invention includes a plurality of sub-pixels. A plurality of sub pixels are disposed on the substrate. Each sub-pixel includes an active element, a first electrode, a first bank layer, a second bank layer, a light emitting layer, and a second electrode. The first electrode is electrically connected to the active element. The first bank layer is disposed on the first electrode and has a first opening overlapping a part of the first electrode. The second bank layer is disposed on the first bank layer and has a second opening overlapping the first opening. The light emitting layer is disposed on a part of the first electrode, and is located on the first opening of the first bank layer and the second opening of the second bank layer. The second electrode is disposed on the light emitting layer. The first bank layer has a material region, and a vertical projection of the material region on the substrate is located between a vertical projection of the first opening on the substrate and a vertical projection of the second opening on the substrate. The material region has a first width in a first direction, and the material region has a second width in a second direction that intersects with the first direction. The sub-pixel includes a first sub-pixel. The first width of the material region of the first sub-pixel is not equal to the second width of the material region of the first sub-pixel.
本發明的一種顯示裝置的製造方法,包括:提供基板;於基板上形成多個主動元件;形成分別與主動元件電性連接的多個第一電極,第一電極在第一方向上排成多個第一電極行,且在第二方向上排成多個第一電極列,第一方向與第二方向交錯;提供遮罩結構,具有彼此隔開的多個條狀實體部以及多個條狀開口部,其中每一條狀開口部隔開相鄰的條狀實體部;在令遮罩結構的條狀實體部分別遮蔽第一電極列的情況下,令源材料通過遮罩結構的條狀開口部,以於第一電極上形成第一堤岸層,其中第一堤岸層具有多個堤岸條以及多個第一條狀開口,堤岸條在第一方向上彼此隔開,每一第一條狀開口隔開相鄰的堤岸條,且相鄰兩堤岸條分別配置於多個第一電極列之同一第一電極列的每一第一電極的相對兩側;於第一堤岸層上形成第二堤岸層,第二堤岸層具有分別與第一電極重疊的多個開口;注入多個液滴於第一堤岸層的第一條狀開口以及第二堤岸層的開口,以於第一電極、第一堤岸層的第一條狀開口以及第二堤岸層的開口形成多個發光層;形成第二電極,以覆蓋發光層。A method for manufacturing a display device according to the present invention includes: providing a substrate; forming a plurality of active elements on the substrate; forming a plurality of first electrodes electrically connected to the active elements, respectively, and the first electrodes are arranged in a plurality of directions in the first direction. A first electrode row, and a plurality of first electrode columns are arranged in a second direction, the first direction and the second direction are staggered; a mask structure is provided, and a plurality of strip-shaped solid parts and a plurality of strips are separated from each other Each of the strip-shaped openings separates adjacent strip-shaped solid portions; in the case where the strip-shaped solid portions of the masking structure respectively shield the first electrode row, the source material is passed through the stripe-shaped masking structure An opening portion to form a first bank layer on the first electrode, wherein the first bank layer has a plurality of bank strips and a plurality of first strip-shaped openings, and the bank strips are spaced apart from each other in the first direction, and each of the first strips Shaped openings separate adjacent bank strips, and two adjacent bank strips are respectively disposed on opposite sides of each first electrode of the same first electrode row of a plurality of first electrode rows; a first bank layer is formed on the first bank layer; Second bank layer, second bank layer A plurality of openings respectively overlapping the first electrode; a plurality of droplets are injected into the first stripe openings of the first bank layer and the openings of the second bank layer, so that the first electrodes and the first stripe of the first bank layer The opening and the opening of the second bank layer form a plurality of light emitting layers; a second electrode is formed to cover the light emitting layer.
基於上述,本發明一實施例的顯示裝置及其製造方法中,至少一子畫素的第一堤岸層於基板上的垂直投影具有未與第二堤岸層於基板上的垂直投影重疊的材料區域,材料區域在第一方向上具有第一寬度,材料區域在第二方向上具有第二寬度,而第一寬度不等於第二寬度。藉此,能改善顯示裝置之發光層的膜厚不均勻的問題。Based on the above, in a display device and a manufacturing method thereof according to an embodiment of the present invention, the vertical projection of the first bank layer on the substrate of at least one sub-pixel has a material region that does not overlap with the vertical projection of the second bank layer on the substrate. The material region has a first width in a first direction, the material region has a second width in a second direction, and the first width is not equal to the second width. Thereby, the problem of uneven film thickness of the light emitting layer of the display device can be improved.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings.
在下文中將參照附圖更全面地描述本發明,在附圖中示出了本發明的示例性實施例。如本領域技術人員將認識到的,可以以各種不同的方式修改所描述的實施例,而不脫離本發明的精神或範圍。The invention will be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.
在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」或「耦合」係可為二元件間存在其它元件。In the drawings, the thicknesses of layers, films, panels, regions, etc. are exaggerated for clarity. Throughout the description, the same reference numerals denote the same elements. It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to a physical and / or electrical connection. Furthermore, "electrically connected" or "coupled" can mean that there are other components between the two components.
此外,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其它元件的「下」側的元件將被定向在其它元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件「下方」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「上面」或「下面」可以包括上方和下方的取向。In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship of one element to another element, as shown. It should be understood that relative terms are intended to include different orientations of the device in addition to the orientation shown in the figures. For example, if the device in one of the figures is turned over, elements described as being on the "lower" side of other elements would then be oriented on "upper" sides of the other elements. Thus, the exemplary term "down" may include orientations of "down" and "up", depending on the particular orientation of the drawings. Similarly, if the device in one of the figures is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "above" or "below" may include orientations above and below.
本文使用的「約」、「近似」、或「實質上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,「約」可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。再者,本文使用的「約」、「近似」或「實質上」可依光學性質、蝕刻性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。As used herein, "about," "approximately," or "substantially" includes the stated value and an average value within an acceptable deviation range of a particular value determined by one of ordinary skill in the art, taking into account the measurements and A specific number of measurement-related errors (ie, limitations of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within ± 30%, ± 20%, ± 10%, ± 5%. Furthermore, the terms "about", "approximately" or "substantially" used herein may select a more acceptable range of deviations or standard deviations based on optical properties, etching properties, or other properties, and all properties can be applied without one standard deviation. .
本文參考作為理想化實施例的示意圖的截面圖來描述示例性實施例。因此,可以預期到作為例如製造技術及/或(and/or)公差的結果的圖示的形狀變化。因此,本文所述的實施例不應被解釋為限於如本文所示的區域的特定形狀,而是包括例如由製造導致的形狀偏差。例如,示出或描述為平坦的區域通常可以具有粗糙及/或非線性特徵。此外,所示的銳角可以是圓的。因此,圖中所示的區域本質上是示意性的,並且它們的形狀不是旨在示出區域的精確形狀,並且不是旨在限制權利要求的範圍。Exemplary embodiments are described herein with reference to cross-sectional views that are schematic views of idealized embodiments. Accordingly, variations in the shapes of the illustrations as a result of, for example, manufacturing techniques and / or tolerances can be expected. Therefore, the embodiments described herein should not be construed as limited to the particular shape of the area as shown herein, but include shape deviations caused by, for example, manufacturing. For example, a region shown or described as flat may generally have rough and / or non-linear characteristics. Furthermore, the acute angles shown may be round. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the precise shape of a region and are not intended to limit the scope of the claims.
除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted to have meanings consistent with their meanings in the context of the related art and the present invention, and will not be interpreted as idealized or excessive Formal meaning unless explicitly defined as such in this article.
圖1A是依照本發明一實施例的顯示裝置的部分元件的上視示意圖。圖1B是根據圖1A的剖線A-A’繪示的顯示裝置的子畫素的剖面示意圖。圖1A省略圖1B之基板100、主動元件110、平坦層120、電洞注入層160、電洞傳輸層170、發光層180、電子傳輸層190、電子注入層200及第二電極210的繪示。FIG. 1A is a schematic top view of some elements of a display device according to an embodiment of the invention. FIG. 1B is a schematic cross-sectional view of a sub-pixel of the display device shown according to the section line A-A 'of FIG. 1A. FIG. 1A omits the drawing of the substrate 100, the active device 110, the flat layer 120, the hole injection layer 160, the hole transmission layer 170, the light emitting layer 180, the electron transmission layer 190, the electron injection layer 200, and the second electrode 210 of FIG. .
請參考圖1A及圖1B,本實施例的顯示裝置10包括多個子畫素10A。子畫素10A設置於基板100上。在本實施例中,基板100例如為硬質基板(rigid substrate)。然而,本發明不限於此,在其它實施例中,基板100也可以是可撓式基板(flexible substrate)。舉例而言,上述之硬質基板的材質可為玻璃、石英或其它適當材料;上述之可撓式基板的材質可以是塑膠或其它適當材料。Please refer to FIGS. 1A and 1B. The display device 10 of this embodiment includes a plurality of sub-pixels 10A. The sub-pixel 10A is disposed on the substrate 100. In this embodiment, the substrate 100 is, for example, a rigid substrate. However, the present invention is not limited thereto. In other embodiments, the substrate 100 may be a flexible substrate. For example, the material of the aforementioned rigid substrate may be glass, quartz, or other appropriate materials; the material of the aforementioned flexible substrate may be plastic or other appropriate materials.
本實施例的每一子畫素10A包括主動元件110、第一電極130、第一堤岸層140、第二堤岸層150、發光層180以及第二電極210。在本實施例中,每一子畫素10A還可包括平坦層120、電洞注入層160、電洞傳輸層170、電子傳輸層190以及電子注入層200,但本發明不以此為限。Each sub-pixel 10A of this embodiment includes an active device 110, a first electrode 130, a first bank layer 140, a second bank layer 150, a light emitting layer 180, and a second electrode 210. In this embodiment, each sub-pixel 10A may further include a flat layer 120, a hole injection layer 160, a hole transmission layer 170, an electron transmission layer 190, and an electron injection layer 200, but the invention is not limited thereto.
主動元件110設置於基板100上。舉例而言,在本實施例中,主動元件110包括至少一薄膜電晶體,具有閘極、半導體圖案、汲極與源極,其中汲極與第一電極130(或稱,畫素電極)電性連接,但本發明不以此為限。The active device 110 is disposed on the substrate 100. For example, in this embodiment, the active device 110 includes at least one thin film transistor having a gate electrode, a semiconductor pattern, a drain electrode, and a source electrode. The drain electrode is electrically connected to the first electrode 130 (or pixel electrode). Sexual connection, but the invention is not limited to this.
在本實施例中,平坦層120設置於基板100上,且覆蓋主動元件110。平坦層120為一層未圖案化的膜層,但不以此為限。平坦層120的材料包含無機材料(例如:氧化矽、氮化矽、氮氧化矽、其它合適的材料或上述至少二種材料的堆疊層)、有機材料(例如:聚酯類(PET)、聚烯類、聚丙醯類、聚碳酸酯類、聚環氧烷類、聚苯烯類、聚醚類、聚酮類、聚醇類、聚醛類、其它合適的材料或上述之組合)、其它合適的材料或上述之組合。In this embodiment, the flat layer 120 is disposed on the substrate 100 and covers the active device 110. The flat layer 120 is an unpatterned film layer, but is not limited thereto. The material of the flat layer 120 includes an inorganic material (for example, silicon oxide, silicon nitride, silicon oxynitride, other suitable materials, or a stacked layer of at least two of the foregoing materials), an organic material (for example, polyester (PET), polymer Olefins, polypropylenes, polycarbonates, polyalkylene oxides, polystyrenes, polyethers, polyketones, polyalcohols, polyaldehydes, other suitable materials or combinations thereof), others Suitable materials or combinations of the above.
在本實施例中,第一電極130設置於平坦層120上。第一電極130與主動元件110電性連接。舉例而言,本實施例的第一電極130例如為畫素電極,電性連接於主動元件110之至少一薄膜電晶體的汲極。In this embodiment, the first electrode 130 is disposed on the flat layer 120. The first electrode 130 is electrically connected to the active device 110. For example, the first electrode 130 in this embodiment is, for example, a pixel electrode, and is electrically connected to the drain of at least one thin-film transistor of the active device 110.
第一堤岸層140設置於第一電極130上。第一堤岸層140具有與部分之第一電極130重疊的第一開口140a。第一堤岸層140的材料包含氧化矽、氮化矽或其它合適的材料。The first bank layer 140 is disposed on the first electrode 130. The first bank layer 140 has a first opening 140 a that overlaps a portion of the first electrode 130. The material of the first bank layer 140 includes silicon oxide, silicon nitride, or other suitable materials.
第二堤岸層150設置於第一堤岸層140上。第二堤岸層150具有與第一開口140a重疊的第二開口150a。在本實施例中,第二堤岸層150的材質與第一堤岸層140的材質可以不相同;舉例來說,對同一有機發光材料而言(例如簡稱為墨),第一堤岸層140例如為親墨性,而第二堤岸層150例如為疏墨性,但本發明不限於此。在本實施例中,第二堤岸層150的材料例如是光阻,但本發明不限於此。第一堤岸層140具材料區域145,材料區域145於基板100上的垂直投影位於第一開口140a於基板100上的垂直投影與第二開口150a於基板100上的垂直投影之間。材料區域145在第一方向y上具有第一寬度W1,材料區域145在第二方向x上具有第二寬度W2。部分之第一電極130與第一堤岸層140的第一開口140a及第二堤岸層150的第二開口150a重疊,第一方向y係指由所述部分之第一電極130的正上方指向定義第二開口150a之第二堤岸層150的側壁150s,而第一方向y與第二方向x交錯。The second bank layer 150 is disposed on the first bank layer 140. The second bank layer 150 has a second opening 150a overlapping the first opening 140a. In this embodiment, the material of the second bank layer 150 and the material of the first bank layer 140 may be different; for example, for the same organic light-emitting material (such as ink for short), the first bank layer 140 is, for example, Ink affinity, and the second bank layer 150 is, for example, ink repellent, but the present invention is not limited thereto. In this embodiment, the material of the second bank layer 150 is, for example, a photoresist, but the present invention is not limited thereto. The first bank layer 140 has a material region 145. The vertical projection of the material region 145 on the substrate 100 is between the vertical projection of the first opening 140a on the substrate 100 and the vertical projection of the second opening 150a on the substrate 100. The material region 145 has a first width W1 in the first direction y, and the material region 145 has a second width W2 in the second direction x. Part of the first electrode 130 overlaps with the first opening 140a of the first bank layer 140 and the second opening 150a of the second bank layer 150. The first direction y is defined by the direction directly above the first electrode 130 of the part. The side wall 150s of the second bank layer 150 of the second opening 150a is intersected with the first direction y and the second direction x.
顯示裝置10的多個子畫素10A包括第一子畫素10a。第一子畫素10a之材料區域145的第一寬度W1不等於第一子畫素10a之材料區域145的第二寬度W2。舉例而言,在本實施例中,第一子畫素10a之第一開口140a在第一方向y上的寬度140y大於第一子畫素10a之第一開口140a在第二方向x上的寬度140x,而第一子畫素10a之第一寬度W1可選擇性地大於第一子畫素10a之第二寬度W2。The plurality of sub-pixels 10A of the display device 10 include a first sub-pixel 10a. The first width W1 of the material region 145 of the first sub-pixel 10a is not equal to the second width W2 of the material region 145 of the first sub-pixel 10a. For example, in this embodiment, the width 140y of the first opening 140a of the first sub-pixel 10a in the first direction y is greater than the width of the first opening 140a of the first sub-pixel 10a in the second direction x 140x, and the first width W1 of the first sub-pixel 10a may be selectively larger than the second width W2 of the first sub-pixel 10a.
發光層180設置於部分的第一電極130上,且位於第一堤岸層140的第一開口140a與第二堤岸層150的第二開口150a。舉例而言,在本實施例中,電洞注入層160、電洞傳輸層170與發光層180依序設置於所述部分的第一電極130上。電洞注入層160、電洞傳輸層170與發光層180位於第一堤岸層140的第一開口140a與第二堤岸層150的第二開口150a中。舉例而言,在本實施例中,電洞注入層160、電洞傳輸層170與發光層180依序設置於部分的第一電極130上的方法例如是利用噴墨印刷製程(Ink Jet Printing;IJP),但本發明不限於此。在本實施例中,發光層180的材料例如是有機電致發光材料,但本發明不限於此。在本實施例中,藉由第一寬度W1不等於第二寬度W2的設計,能改善發光層180的膜厚不均的問題。The light emitting layer 180 is disposed on a part of the first electrode 130 and is located on the first opening 140 a of the first bank layer 140 and the second opening 150 a of the second bank layer 150. For example, in this embodiment, the hole injection layer 160, the hole transmission layer 170, and the light emitting layer 180 are sequentially disposed on the first electrode 130 in the portion. The hole injection layer 160, the hole transmission layer 170, and the light emitting layer 180 are located in the first opening 140a of the first bank layer 140 and the second opening 150a of the second bank layer 150. For example, in this embodiment, a method of sequentially injecting the hole injection layer 160, the hole transmission layer 170, and the light emitting layer 180 on a part of the first electrode 130 is, for example, using an inkjet printing process (Ink Jet Printing; IJP), but the present invention is not limited to this. In this embodiment, the material of the light emitting layer 180 is, for example, an organic electroluminescent material, but the present invention is not limited thereto. In this embodiment, by designing that the first width W1 is not equal to the second width W2, the problem of uneven film thickness of the light emitting layer 180 can be improved.
於垂直基板100的第三方向z上,發光層180的頂面182具有與第二開口150a之中心重疊的一點182a。發光層180的頂面182上的一點182a至第一電極130的頂面130t的距離為第一距離T1。發光層180的頂面182與第二堤岸層150的交界邊180a至第一堤岸層140的頂面140t的距離為第二距離T2。在本實施例中,第一距離T1小於或等於第二距離T2。舉例而言,第二距離T2小於或等於20倍的第一距離T1,即T1 ≤ T2 ≤ 20´T1,但本發明不以此為限。In the third direction z of the vertical substrate 100, the top surface 182 of the light emitting layer 180 has a point 182a overlapping the center of the second opening 150a. The distance from a point 182a on the top surface 182 of the light emitting layer 180 to the top surface 130t of the first electrode 130 is a first distance T1. The distance from the top edge 182 of the light emitting layer 180 to the top surface 140t of the first bank layer 140 to the second bank layer 150 is a second distance T2. In this embodiment, the first distance T1 is less than or equal to the second distance T2. For example, the second distance T2 is less than or equal to 20 times the first distance T1, that is, T1 ≤ T2 ≤ 20 ´T1, but the present invention is not limited thereto.
在本實施例中,電子傳輸層190與電子注入層200依序設置於發光層180與第二堤岸層150上。舉例而言,在本實施例中,電子傳輸層190與電子注入層200的形成方式例如是利用蒸鍍製程,但本發明不限於此。In this embodiment, the electron transport layer 190 and the electron injection layer 200 are sequentially disposed on the light emitting layer 180 and the second bank layer 150. For example, in this embodiment, the formation method of the electron transport layer 190 and the electron injection layer 200 is, for example, a vapor deposition process, but the present invention is not limited thereto.
第二電極210設置於發光層180上。舉例而言,在本實施例中,第二電極210設置於電子注入層200上。在本實施例中,於垂直基板100的第三方向z上,第二電極210可具有大致上相同的膜厚。也就是說,於垂直基板100的第三方向z上,發光層180的頂面182具有與第二開口150a之中心重疊的一點182a,第二電極210的頂面212具有與第二開口150a之中心重疊的一點212a。發光層180的頂面182上的一點182a位於與第一開口140a及第二開口150a重疊之部分的第一電極130的上方,第二電極210的頂面212上的一點212a位於一點182a的正上方,一點182a至一點212a在第三方向z上的距離為第一距離H1。第二堤岸層150的頂面150t與第二電極210的頂面212在第三方向z上的距離為第二距離H2,第一距離H1約等於第二距離H2。也就是說,在本實施例中,由電子傳輸層190、電子注入層200及第二電極210構成的複合層具有大致上相同的膜厚,但本發明不以此為限。The second electrode 210 is disposed on the light emitting layer 180. For example, in this embodiment, the second electrode 210 is disposed on the electron injection layer 200. In the present embodiment, the second electrode 210 may have substantially the same film thickness in the third direction z of the vertical substrate 100. That is, in the third direction z of the vertical substrate 100, the top surface 182 of the light emitting layer 180 has a point 182a that overlaps the center of the second opening 150a, and the top surface 212 of the second electrode 210 has a distance from the second opening 150a. The center overlaps a point 212a. A point 182a on the top surface 182 of the light-emitting layer 180 is located above the first electrode 130 in a portion overlapping the first opening 140a and the second opening 150a, and a point 212a on the top surface 212 of the second electrode 210 is located directly on the point 182a Above, the distance in the third direction z from the point 182a to the point 212a is the first distance H1. The distance between the top surface 150t of the second bank layer 150 and the top surface 212 of the second electrode 210 in the third direction z is a second distance H2, and the first distance H1 is approximately equal to the second distance H2. That is, in this embodiment, the composite layer composed of the electron transport layer 190, the electron injection layer 200, and the second electrode 210 has substantially the same film thickness, but the present invention is not limited thereto.
基於上述,在本發明一實施例的顯示裝置10中,第一堤岸層140的第一開口140a在第一方向y上的寬度140y大於第一開口140a在第二方向x上的寬度140x,而第一寬度W1大於第二寬度W2。藉此,可以改善發光層180的厚度不均勻的問題,進而改善顯示裝置10的顯示品質。Based on the above, in the display device 10 according to an embodiment of the present invention, the width 140y of the first opening 140a of the first bank layer 140 in the first direction y is greater than the width 140x of the first opening 140a in the second direction x, and The first width W1 is larger than the second width W2. Thereby, the problem of uneven thickness of the light emitting layer 180 can be improved, and the display quality of the display device 10 can be improved.
圖2是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。在此必須說明的是,圖2的實施例沿用圖1A的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。FIG. 2 is a schematic top view of some elements of a display device according to another embodiment of the present invention. It must be noted here that the embodiment of FIG. 2 follows the component numbers and parts of the embodiment of FIG. 1A, in which the same or similar reference numerals are used to indicate the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
圖2的實施例與圖1A的實施例的主要差異在於:第一寬度W1與第二寬度W2的大小關係不同。The main difference between the embodiment in FIG. 2 and the embodiment in FIG. 1A is that the magnitude relationship between the first width W1 and the second width W2 is different.
請參考圖2,在本實施例的顯示裝置20中,子畫素20A的第一子畫素20a的第一堤岸層140的第一開口140a在第一方向y上的寬度140y大於第一開口140a在第二方向x上的寬度140x,而第一寬度W1小於第二寬度W2。Please refer to FIG. 2. In the display device 20 of this embodiment, the width 140y of the first opening 140a of the first bank layer 140 of the first subpixel 20a of the subpixel 20A in the first direction y is greater than the first opening. 140a has a width 140x in the second direction x, and the first width W1 is smaller than the second width W2.
類似地,在本發明一實施例的顯示裝置20中,第一寬度W1小於第二寬度W2。藉此,可以改善發光層180的厚度不均勻的問題,進而改善顯示裝置20的顯示品質。Similarly, in the display device 20 according to an embodiment of the present invention, the first width W1 is smaller than the second width W2. Thereby, the problem of uneven thickness of the light emitting layer 180 can be improved, and the display quality of the display device 20 can be improved.
圖3是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。在此必須說明的是,圖3的實施例沿用圖1A的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。FIG. 3 is a schematic top view of some elements of a display device according to another embodiment of the present invention. It must be noted here that the embodiment of FIG. 3 inherits the component numbers and parts of the embodiment of FIG. 1A, in which the same or similar reference numerals are used to represent the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
圖3的實施例與圖1A的實施例的主要差異在於:第一堤岸層140的第一開口140a具有多個彎曲段140b。The main difference between the embodiment of FIG. 3 and the embodiment of FIG. 1A is that the first opening 140a of the first bank layer 140 has a plurality of curved sections 140b.
請參考圖3,在本實施例的顯示裝置30中,子畫素30A的第一子畫素30a的第一堤岸層140的第一開口140a具有多個彎曲段140b。在本實施例中,多個彎曲段140b在第一方向y上排列。多個彎曲段140b連接成波浪線段140b’。藉此,可以增加顯示裝置30的開口率。Referring to FIG. 3, in the display device 30 of this embodiment, the first opening 140a of the first bank layer 140 of the first subpixel 30a of the subpixel 30A has a plurality of curved sections 140b. In the present embodiment, the plurality of curved sections 140b are aligned in the first direction y. The plurality of curved sections 140b are connected into a wavy line section 140b '. Thereby, the aperture ratio of the display device 30 can be increased.
在本實施例中,第一堤岸層140具有材料區域145,材料區域145在第一方向y上具有第一寬度W1,材料區域145在第二方向x上的最小寬度為第二寬度W2,材料區域145在第二方向x上的最大寬度為寬度W2’。在本實施例中,第一開口140a在第二方向x上具有最大寬度140x,第一開口140a在第一方向y上的寬度140y大於寬度140x,而第一寬度W1大於第二寬度W2。在本實施例中,寬度W2’可以等於第一寬度W1,但本發明不限於此。舉例而言,在本實施例中,寬度W2’與第二寬度W2的大小關係可以是0.2´W2’ ≤ W2 ≤ 0.8´W2’,但本發明不限於此。In this embodiment, the first bank layer 140 has a material region 145 having a first width W1 in the first direction y, and a minimum width of the material region 145 in the second direction x is the second width W2. The maximum width of the region 145 in the second direction x is a width W2 '. In this embodiment, the first opening 140a has a maximum width 140x in the second direction x, the width 140y of the first opening 140a in the first direction y is larger than the width 140x, and the first width W1 is larger than the second width W2. In this embodiment, the width W2 'may be equal to the first width W1, but the present invention is not limited thereto. For example, in this embodiment, the magnitude relationship between the width W2 'and the second width W2 may be 0.2´W2' ≤ W2 ≤ 0.8´W2 ', but the present invention is not limited thereto.
圖4是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。在此必須說明的是,圖4的實施例沿用圖3的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。FIG. 4 is a schematic top view of some elements of a display device according to another embodiment of the present invention. It must be noted here that the embodiment of FIG. 4 follows the component numbers and parts of the embodiment of FIG. 3, wherein the same or similar reference numerals are used to indicate the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
圖4的實施例與圖3的實施例的主要差異在於:波浪線段140b’的形成位置不同。The main difference between the embodiment of FIG. 4 and the embodiment of FIG. 3 is that the formation positions of the wavy line segments 140b 'are different.
請參考圖4,在本實施例的顯示裝置40中,子畫素40A的第一子畫素40a的第一堤岸層140的第一開口140a的多個彎曲段140b在第二方向x上排列。多個彎曲段140b連接為波浪線段140b’。藉此,可以增加顯示裝置40的開口率。Referring to FIG. 4, in the display device 40 of this embodiment, a plurality of curved segments 140 b of the first opening 140 a of the first bank layer 140 of the first sub-pixel 40 a of the sub-pixel 40A are arranged in the second direction x. . The plurality of curved sections 140b are connected as wavy line sections 140b '. Thereby, the aperture ratio of the display device 40 can be increased.
第一堤岸層140具有材料區域145。在本實施例中,材料區域145在第一方向y上的最小寬度為第一寬度W1,材料區域145在第二方向x上具有第二寬度W2。在本實施例中,第一開口140a在第一方向y上具有最大寬度140y,寬度140y大於第一開口140a在第二方向x上的寬度140x,而第一寬度W1小於第二寬度W2。在本實施例中,寬度W1’可以等於第二寬度W2,但本發明不限於此。舉例而言,在本實施例中,寬度W1’與第一寬度W1的大小關係可以是0.2´W1’ ≤ W1 ≤ 0.8´W1’,但本發明不限於此。The first bank layer 140 has a material region 145. In this embodiment, the minimum width of the material region 145 in the first direction y is a first width W1, and the material region 145 has a second width W2 in the second direction x. In this embodiment, the first opening 140a has a maximum width 140y in the first direction y, the width 140y is larger than the width 140x of the first opening 140a in the second direction x, and the first width W1 is smaller than the second width W2. In this embodiment, the width W1 'may be equal to the second width W2, but the present invention is not limited thereto. For example, in this embodiment, the magnitude relationship between the width W1 'and the first width W1 may be 0.2´W1' ≤ W1 ≤ 0.8´W1 ', but the present invention is not limited thereto.
圖5A是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。圖5B是根據圖5A的剖線B-B’繪示的顯示裝置的子畫素的剖面示意圖。圖6A至圖6D是圖5A之顯示裝置的部分元件的製造流程剖面示意圖。圖5A省略圖5B之基板100、主動元件110、平坦層120、電洞注入層160、電洞傳輸層170、發光層180、電子傳輸層190、電子注入層200及第二電極210的繪示。在此必須說明的是,圖5A~5B的實施例沿用圖1A~1B的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。5A is a schematic top view of some elements of a display device according to another embodiment of the present invention. Fig. 5B is a schematic cross-sectional view of a sub-pixel of the display device shown according to the section line B-B 'of Fig. 5A. 6A to 6D are schematic cross-sectional views illustrating a manufacturing process of some components of the display device of FIG. 5A. FIG. 5A omits the drawing of the substrate 100, the active device 110, the planarization layer 120, the hole injection layer 160, the hole transmission layer 170, the light emitting layer 180, the electron transmission layer 190, the electron injection layer 200, and the second electrode 210 of FIG. 5B. . It must be explained here that the embodiments of FIGS. 5A to 5B follow the component numbers and parts of the embodiments of FIGS. 1A to 1B. The same or similar symbols are used to indicate the same or similar components, and the same technical content is omitted. instruction of. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
圖5A~圖5B的實施例與圖1A~圖1B的實施例的主要差異在於:第一寬度W1與第二寬度W2的大小關係不同。The main difference between the embodiment of FIGS. 5A to 5B and the embodiment of FIGS. 1A to 1B is that the magnitude relationship between the first width W1 and the second width W2 is different.
請參考圖5A及圖5B,在本實施例的顯示裝置50中,子畫素50A的第一子畫素50a的第一堤岸層140的第一開口140a在第一方向y上的寬度140y大於第一開口140a在第二方向x上的寬度140x,第一寬度W1不為零,而第二寬度W2為零。藉此,可以增加顯示裝置50的開口率。Please refer to FIG. 5A and FIG. 5B. In the display device 50 of this embodiment, the width 140y of the first opening 140a of the first bank layer 140 of the first subpixel 50a of the subpixel 50A in the first direction y is greater than The width 140x of the first opening 140a in the second direction x, the first width W1 is not zero, and the second width W2 is zero. Thereby, the aperture ratio of the display device 50 can be increased.
在本實施例中,由於第二寬度W2為零,顯示裝置50的製造方法可以與前述之顯示裝置的實施例10~40的製造方法不相同。以下配合圖6A至圖6D及圖7A至圖7B,舉例說明本發明另一實施例之顯示裝置50的製造流程。圖7A及圖7B分別是圖6B及圖6D的顯示裝置的製造步驟的上視示意圖。特別是,圖6B對應圖7A的剖線C-C’,圖6D對應圖7B的剖線D-D’。In this embodiment, since the second width W2 is zero, the manufacturing method of the display device 50 may be different from the manufacturing methods of the foregoing embodiments 10 to 40 of the display device. The manufacturing process of the display device 50 according to another embodiment of the present invention will be described below with reference to FIGS. 6A to 6D and FIGS. 7A to 7B. 7A and 7B are schematic top views of manufacturing steps of the display device of FIGS. 6B and 6D, respectively. In particular, Fig. 6B corresponds to the section line C-C 'of Fig. 7A, and Fig. 6D corresponds to the section line D-D' of Fig. 7B.
請參考圖6A,首先,提供基板100。接著,於基板100上形成多個主動元件110。然後,形成分別與多個主動元件110電性連接的多個第一電極130。在本實施例中,形成第一電極130之前,還可選擇性地於主動元件110上形成平坦層120,平坦層120覆蓋主動元件110以及基板110,但本發明不限於此。多個第一電極130在第一方向y上排成多個第一電極行130y(如圖7A所示),且在第二方向x上排成多個第一電極列130x(如圖7A所示)。第一方向y與第二方向x交錯。Referring to FIG. 6A, first, a substrate 100 is provided. Next, a plurality of active devices 110 are formed on the substrate 100. Then, a plurality of first electrodes 130 electrically connected to the plurality of active devices 110 are formed. In this embodiment, before the first electrode 130 is formed, a flat layer 120 may be selectively formed on the active device 110, and the flat layer 120 covers the active device 110 and the substrate 110, but the present invention is not limited thereto. The plurality of first electrodes 130 are arranged in a plurality of first electrode rows 130y in the first direction y (as shown in FIG. 7A), and the plurality of first electrodes 130 are arranged in the second direction x (as shown in FIG. 7A). Show). The first direction y intersects the second direction x.
請參考圖6B及圖7A,接著,提供遮罩結構300。遮罩結構300具有彼此隔開的多個條狀實體部310以及多個條狀開口部320。每一條狀開口部320隔開相鄰的條狀實體部310。多個條狀實體部310分別遮蔽多個第一電極列130x,舉例來說,每一條狀實體部310遮蔽對應之一個第一電極列130x的各第一電極130的中間部分,相鄰條狀開口部320露出對應之一個第一電極列130x的各第一電極130在第一方向y上的相對兩側。Please refer to FIG. 6B and FIG. 7A. Next, a mask structure 300 is provided. The mask structure 300 has a plurality of strip-shaped solid portions 310 and a plurality of strip-shaped opening portions 320 spaced apart from each other. Each strip-shaped opening portion 320 separates an adjacent strip-shaped solid portion 310. The plurality of strip-shaped solid portions 310 respectively shield a plurality of first electrode rows 130x. For example, each strip-shaped solid portion 310 covers a middle portion of each first electrode 130 of a corresponding one of the first electrode rows 130x, and adjacent strips The openings 320 expose opposite sides of each first electrode 130 corresponding to the first electrode row 130x in the first direction y.
請參考圖6C,然後,在令遮罩結構300的條狀實體部310分別遮蔽第一電極列130x的情況下,令源材料410通過遮罩結構300的條狀開口部320,以於第一電極130上形成第一堤岸層140(如圖6D所示)。舉例而言,在本實施例中,利用部件400提供源材料410,使源材料410通過遮罩結構300的條狀開口部320並沉積在條狀開口部320中,以於第一電極130上形成第一堤岸層140。然而,本發明不限於此。在其他實施例中,也可以利用蒸鍍等物理氣相沉積工序來形成第一堤岸層140。Please refer to FIG. 6C. Then, in a case where the strip-shaped solid portions 310 of the masking structure 300 respectively shield the first electrode row 130x, the source material 410 is passed through the strip-shaped openings 320 of the masking structure 300 so that the first A first bank layer 140 is formed on the electrode 130 (as shown in FIG. 6D). For example, in this embodiment, the source material 410 is provided by using the component 400, and the source material 410 passes through the strip-shaped openings 320 of the mask structure 300 and is deposited in the strip-shaped openings 320 to be on the first electrode 130. A first bank layer 140 is formed. However, the present invention is not limited to this. In other embodiments, the first bank layer 140 may be formed by a physical vapor deposition process such as evaporation.
值得一提的是,由於第一寬度W1與第二寬度W2的一者為零,因此能使用遮罩結構300進行物理氣相沉積工序,以形成第一堤岸層140。相較於利用微影、蝕刻等製程,利用前述物理氣相沉積工序來形成第一堤岸層140較為簡單且省時,有助於降低顯示裝置50的製造成本。It is worth mentioning that, since one of the first width W1 and the second width W2 is zero, a physical vapor deposition process can be performed using the mask structure 300 to form the first bank layer 140. Compared with the use of processes such as lithography and etching, forming the first bank layer 140 by using the foregoing physical vapor deposition process is simpler and saves time, which helps to reduce the manufacturing cost of the display device 50.
請參考圖6D及圖7B,本實施例的第一堤岸層140具有多個堤岸條140’以及多個第一條狀開口140a’。在本實施例中,堤岸條140’在第一方向y上彼此隔開。每一第一條狀開口140a’隔開相鄰的堤岸條140’。相鄰兩堤岸條140’分別配置於同一第一電極列130x之每一第一電極130的相對兩側。Referring to FIG. 6D and FIG. 7B, the first bank layer 140 in this embodiment has a plurality of bank strips 140 'and a plurality of first strip-shaped openings 140a'. In the present embodiment, the bank strips 140 'are spaced from each other in the first direction y. Each first strip-shaped opening 140a 'separates an adjacent bank strip 140'. Two adjacent bank strips 140 'are respectively disposed on opposite sides of each first electrode 130 of the same first electrode row 130x.
請參照圖5B,接著,於第一堤岸層140上形成第二堤岸層150。第二堤岸層150具有分別與第一電極130重疊的多個第二開口150a。Referring to FIG. 5B, a second bank layer 150 is formed on the first bank layer 140. The second bank layer 150 has a plurality of second openings 150 a that respectively overlap the first electrode 130.
然後,注入多個液滴於第一堤岸層140的第一條狀開口140a’以及第二堤岸層150的多個第二開口150a中,以於多個第一電極130、第一堤岸層140的多個第一條狀開口140a’以及第二堤岸層150的多個第二開口150a中形成多個發光層180。舉例而言,在本實施例中,可以在第一條狀開口140a’以及多個第二開口150a中形成電洞注入層160、電洞傳輸層170與發光層180(如圖5B所示)。Then, a plurality of liquid droplets are injected into the first stripe openings 140 a ′ of the first bank layer 140 and the plurality of second openings 150 a of the second bank layer 150 so that the first electrodes 130 and the first bank layer 140 A plurality of light emitting layers 180 are formed in the plurality of first strip-shaped openings 140 a ′ and the plurality of second openings 150 a of the second bank layer 150. For example, in this embodiment, a hole injection layer 160, a hole transmission layer 170, and a light emitting layer 180 may be formed in the first strip-shaped opening 140a 'and the plurality of second openings 150a (as shown in FIG. 5B). .
之後,形成第二電極210,以覆蓋發光層180。舉例而言,在本實施例中,電子傳輸層190、電子注入層200以及第二電極210依序設置於發光層180與第二堤岸層150上。於此,便完成顯示裝置50。After that, a second electrode 210 is formed to cover the light emitting layer 180. For example, in this embodiment, the electron transport layer 190, the electron injection layer 200, and the second electrode 210 are sequentially disposed on the light emitting layer 180 and the second bank layer 150. At this point, the display device 50 is completed.
圖8是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。在此必須說明的是,圖8的實施例沿用圖5A的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。FIG. 8 is a schematic top view of some elements of a display device according to another embodiment of the present invention. It must be noted here that the embodiment of FIG. 8 inherits the component numbers and parts of the embodiment of FIG. 5A, in which the same or similar reference numerals are used to indicate the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
圖8的實施例與圖5A的實施例的主要差異在於:第一寬度W1與第二寬度W2的大小關係不同。The main difference between the embodiment in FIG. 8 and the embodiment in FIG. 5A is that the magnitude relationship between the first width W1 and the second width W2 is different.
請參考圖8,在本實施例的顯示裝置60中,子畫素60A的第一子畫素60a的第一堤岸層140的第一開口140a在第一方向y上的寬度140y大於第一開口140a在第二方向x上的寬度140x,第一寬度W1為零,而第二寬度W2不為零。藉此,可以增加顯示裝置60的開口率。Referring to FIG. 8, in the display device 60 of this embodiment, the width 140y of the first opening 140a of the first bank layer 140 of the first subpixel 60a of the subpixel 60A in the first direction y is greater than the first opening. 140a has a width 140x in the second direction x, the first width W1 is zero, and the second width W2 is not zero. Thereby, the aperture ratio of the display device 60 can be increased.
在本實施例中,由於第一寬度W1為零,顯示裝置60的製造方法可以與前述之顯示裝置50的實施例的製造方法相同,以下便不再重複贅述。In this embodiment, since the first width W1 is zero, the manufacturing method of the display device 60 may be the same as the manufacturing method of the foregoing embodiment of the display device 50, which will not be repeated hereafter.
圖9A是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。圖9B是根據圖9A的剖線E-E’繪示的顯示裝置的子畫素的剖面示意圖。圖9C是根據圖9A的剖線F-F’繪示的顯示裝置的子畫素的剖面示意圖。圖9A省略圖9B之基板100、主動元件110及平坦層120的繪示。在此必須說明的是,圖9A~圖9C的實施例沿用圖1A~圖1B的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。9A is a schematic top view of some elements of a display device according to another embodiment of the present invention. FIG. 9B is a schematic cross-sectional view of a sub-pixel of the display device shown according to a section line E-E 'of FIG. 9A. FIG. 9C is a schematic cross-sectional view of a sub-pixel of the display device shown according to the section line F-F 'of FIG. 9A. FIG. 9A omits the illustration of the substrate 100, the active device 110, and the flat layer 120 of FIG. 9B. It must be explained here that the embodiment of FIGS. 9A to 9C follows the component numbers and parts of the embodiments of FIGS. 1A to 1B, in which the same or similar reference numerals are used to indicate the same or similar components, and the same components are omitted. Description of technical content. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
圖9A~圖9C的實施例與圖1A~圖1B的實施例的主要差異在於:在圖9A~圖9C的實施例中,相鄰的兩子畫素72a、74a的第二開口1502、1504相通。The main difference between the embodiment of FIGS. 9A to 9C and the embodiment of FIGS. 1A to 1B is that in the embodiment of FIGS. 9A to 9C, the second openings 1502 and 1504 of the adjacent two sub-pixels 72a and 74a Communicate.
請參考圖9A至圖9C,在本實施例的顯示裝置70中,子畫素70A包括相鄰的第四子畫素72a與第五子畫素74a。第四子畫素72a與第五子畫素74a用以顯示相同的顏色。在本實施例中,第四子畫素72a的第一開口1402與第五子畫素74a的第一開口1404相分離,而第四子畫素72a的第二開口1502與第五子畫素74a的第二開口1504相通。由於第四子畫素72a的第二開口1502與第五子畫素74a的第二開口1504相通,因此第四子畫素72a與第五子畫素74a的發光層180可利用分佈於第四子畫素72a之第一開口1402與第五子畫素74a之第一開口1404的同一液滴形成。Please refer to FIG. 9A to FIG. 9C. In the display device 70 of this embodiment, the sub-pixel 70A includes adjacent fourth and fifth sub-pixels 72a and 74a. The fourth sub-pixel 72a and the fifth sub-pixel 74a are used to display the same color. In this embodiment, the first opening 1402 of the fourth sub-pixel 72a is separated from the first opening 1404 of the fifth sub-pixel 74a, and the second opening 1502 of the fourth sub-pixel 72a and the fifth sub-pixel The second opening 1504 of 74a communicates. Since the second opening 1502 of the fourth sub-pixel 72a is in communication with the second opening 1504 of the fifth sub-pixel 74a, the light-emitting layer 180 of the fourth sub-pixel 72a and the fifth sub-pixel 74a can be distributed in the fourth The first droplet 1402 of the sub-pixel 72a is formed with the same droplet as the first opening 1404 of the fifth sub-pixel 74a.
第一堤岸層140具有材料區域145。在本實施例中,材料區域145具有位於第四子畫素72a的第一開口1402與第五子畫素74a的第一開口1404之間的部分的材料區域1451。在本實施例中,材料區域145在第一方向y上具有第一寬度W1,材料區域145相鄰於第二堤岸層150的部分在第二方向x上具有第二寬度W2,部分材料區域1451在第二方向x上具有寬度W3。在本實施例中,第一開口1402、1404在第一方向y上的寬度140y大於第一開口1402、1404在第二方向x上的寬度140x,而第一寬度W1小於第二寬度W2。The first bank layer 140 has a material region 145. In this embodiment, the material region 145 has a material region 1451 in a portion between the first opening 1402 of the fourth sub-pixel 72a and the first opening 1404 of the fifth sub-pixel 74a. In this embodiment, the material region 145 has a first width W1 in the first direction y, a portion of the material region 145 adjacent to the second bank layer 150 has a second width W2 in the second direction x, and a portion of the material region 1451 It has a width W3 in the second direction x. In this embodiment, the width 140y of the first openings 1402 and 1404 in the first direction y is larger than the width 140x of the first openings 1402 and 1404 in the second direction x, and the first width W1 is smaller than the second width W2.
發光層180設置於第四子畫素72a的部分第一電極130上與第五子畫素74a的部分第一電極130上,且位於第四子畫素72a的第一開口1402、第五子畫素74a的第一開口1404、第四子畫素72a的第二開口1502以及第五子畫素74a的第二開口1504中。舉例而言,在本實施例中,由於第四子畫素72a的第二開口1502與第五子畫素74a的第二開口1504相通,因此第四子畫素72a與第五子畫素74a的電洞注入層160、電洞傳輸層170與發光層180可分別利用分佈於第四子畫素72a之第一開口1402與第五子畫素74a之第一開口1404的液滴,形成電洞注入層160、電洞傳輸層170與發光層180,形成於第四子畫素72a與第五子畫素74a的多個第一電極130上。電洞注入層160、電洞傳輸層170與發光層180位於第四子畫素72a的第一開口1402、第五子畫素74a的第一開口1404、第四子畫素72a的第二開口1502以及第五子畫素74a的第二開口1504中。The light emitting layer 180 is disposed on a portion of the first electrode 130 of the fourth sub-pixel 72a and a portion of the first electrode 130 of the fifth sub-pixel 74a, and is located on the first opening 1402 of the fourth sub-pixel 72a and the fifth sub-pixel 72a. The first opening 1404 of the pixel 74a, the second opening 1502 of the fourth sub-pixel 72a, and the second opening 1504 of the fifth sub-pixel 74a. For example, in this embodiment, since the second opening 1502 of the fourth sub-pixel 72a is in communication with the second opening 1504 of the fifth sub-pixel 74a, the fourth sub-pixel 72a and the fifth sub-pixel 74a The hole injection layer 160, the hole transmission layer 170, and the light emitting layer 180 can form droplets of electricity using the droplets distributed in the first opening 1402 of the fourth sub-pixel 72a and the first opening 1404 of the fifth sub-pixel 74a, respectively. The hole injection layer 160, the hole transport layer 170, and the light emitting layer 180 are formed on the plurality of first electrodes 130 of the fourth sub-pixel 72a and the fifth sub-pixel 74a. The hole injection layer 160, the hole transmission layer 170, and the light emitting layer 180 are located at the first opening 1402 of the fourth sub-pixel 72a, the first opening 1404 of the fifth sub-pixel 74a, and the second opening of the fourth sub-pixel 72a. 1502 and the second opening 1504 of the fifth sub-pixel 74a.
在本實施例中,電洞注入層160、電洞傳輸層170與發光層180還可形成於位於部分材料區域1451的第一堤岸層142上。於垂直基板100的第三方向z上,發光層180的頂面182具有與第二開口之中心重疊的一點182a以及與第一堤岸層142之中心重疊的一點182b。發光層180的頂面182上的一點182a至第一電極130的頂面130t的距離為第一距離T1。發光層180的頂面182上的一點182b至第一堤岸層142的頂面142t具有距離T1’。在本實施例中,第一距離T1約等於距離T1’。In this embodiment, the hole injection layer 160, the hole transmission layer 170, and the light emitting layer 180 may be further formed on the first bank layer 142 located in the partial material region 1451. In the third direction z of the vertical substrate 100, the top surface 182 of the light emitting layer 180 has a point 182a overlapping the center of the second opening and a point 182b overlapping the center of the first bank layer 142. The distance from a point 182a on the top surface 182 of the light emitting layer 180 to the top surface 130t of the first electrode 130 is a first distance T1. A point 182b on the top surface 182 of the light emitting layer 180 to the top surface 142t of the first bank layer 142 has a distance T1 '. In this embodiment, the first distance T1 is approximately equal to the distance T1 '.
電子傳輸層190、電子注入層200與第二電極210依序設置於發光層180與第二堤岸層150上。舉例而言,在本實施例中,電子傳輸層190、電子注入層200與第二電極210的每一者可以具有大致上相同的膜厚,但本發明不限於此。The electron transport layer 190, the electron injection layer 200, and the second electrode 210 are sequentially disposed on the light emitting layer 180 and the second bank layer 150. For example, in this embodiment, each of the electron transport layer 190, the electron injection layer 200, and the second electrode 210 may have substantially the same film thickness, but the present invention is not limited thereto.
類似地,在本發明一實施例的顯示裝置70中,第一寬度W1小於第二寬度W2。藉此,可以改善發光層180的膜厚不勻的問題,進而改善顯示裝置70的顯示品質。Similarly, in the display device 70 according to an embodiment of the present invention, the first width W1 is smaller than the second width W2. Accordingly, the problem of uneven film thickness of the light emitting layer 180 can be improved, and the display quality of the display device 70 can be improved.
圖10A是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。圖10B是根據圖10A的剖線G-G’繪示的顯示裝置的子畫素的剖面示意圖。圖10C是根據圖10A的剖線H-H’繪示的顯示裝置的子畫素的剖面示意圖。圖10A省略圖10B之基板100、主動元件110及平坦層120的繪示。在此必須說明的是,圖10A~圖10C的實施例沿用圖9A~圖9C的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。FIG. 10A is a schematic top view of some elements of a display device according to another embodiment of the present invention. FIG. 10B is a schematic cross-sectional view of a sub-pixel of the display device shown according to the section line G-G 'of FIG. 10A. FIG. 10C is a schematic cross-sectional view of a sub-pixel of the display device according to the section line H-H 'of FIG. 10A. FIG. 10A omits the illustration of the substrate 100, the active device 110, and the flat layer 120 of FIG. 10B. It must be explained here that the embodiment of FIGS. 10A to 10C inherits the component numbers and parts of the embodiments of FIGS. 9A to 9C. The same or similar reference numerals are used to indicate the same or similar components, and the same components are omitted. Description of technical content. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
圖10A~圖10C的實施例與圖9A~圖9C的實施例的主要差異在於:第一寬度W1與第二寬度W2的大小關係不同。The main difference between the embodiment of FIGS. 10A to 10C and the embodiment of FIGS. 9A to 9C is that the magnitude relationship between the first width W1 and the second width W2 is different.
請參考圖10A至圖10C,在本實施例的顯示裝置80中,子畫素80A包括相鄰的第四子畫素82a與第五子畫素84a。第四子畫素82a與第五子畫素84a用以顯示相同的顏色。在本實施例中,第四子畫素82a的第一開口1402與第五子畫素84a的第一開口1404相分離,而第四子畫素82a的第二開口1502與第五子畫素84a的第二開口1504相通。Please refer to FIGS. 10A to 10C. In the display device 80 of this embodiment, the sub-pixel 80A includes a fourth sub-pixel 82a and a fifth sub-pixel 84a adjacent to each other. The fourth sub-pixel 82a and the fifth sub-pixel 84a are used to display the same color. In this embodiment, the first opening 1402 of the fourth sub-pixel 82a is separated from the first opening 1404 of the fifth sub-pixel 84a, and the second opening 1502 of the fourth sub-pixel 82a and the fifth sub-pixel The second opening 1504 of 84a communicates.
第一堤岸層140具有材料區域145。在本實施例中,材料區域145具有位於第四子畫素82a的第一開口1402與第五子畫素84a的第一開口1404之間的部分材料區域1451。在本實施例中,材料區域145在第一方向y上具有第一寬度W1,材料區域145相鄰於第二堤岸層150的部分在第二方向x上具有第二寬度W2,部分材料區域1451在第二方向x上具有寬度W3。在本實施例中,第一開口1402、1404在第一方向y上的寬度140y大於第一開口1402、1404在第二方向x上的寬度140x,而第一寬度W1大於第二寬度W2。The first bank layer 140 has a material region 145. In this embodiment, the material region 145 has a partial material region 1451 located between the first opening 1402 of the fourth sub-pixel 82a and the first opening 1404 of the fifth sub-pixel 84a. In this embodiment, the material region 145 has a first width W1 in the first direction y, a portion of the material region 145 adjacent to the second bank layer 150 has a second width W2 in the second direction x, and a portion of the material region 1451 It has a width W3 in the second direction x. In this embodiment, the width 140y of the first openings 1402, 1404 in the first direction y is larger than the width 140x of the first openings 1402, 1404 in the second direction x, and the first width W1 is larger than the second width W2.
類似地,在本發明一實施例的顯示裝置80中,第一寬度W1大於第二寬度W2。藉此,可以改善發光層180的膜厚不勻的問題,進而改善顯示裝置80的顯示品質。Similarly, in the display device 80 according to an embodiment of the present invention, the first width W1 is larger than the second width W2. Thereby, the problem of uneven film thickness of the light emitting layer 180 can be improved, and the display quality of the display device 80 can be improved.
圖11是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。在此必須說明的是,圖11的實施例沿用圖1A的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。11 is a schematic top view of some elements of a display device according to another embodiment of the present invention. It must be noted here that the embodiment of FIG. 11 inherits the component numbers and parts of the embodiment of FIG. 1A, in which the same or similar reference numerals are used to represent the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
圖11的實施例與圖1A的實施例的主要差異在於:顯示裝置90的多個子畫素92a、94b、96a可不相同。The main difference between the embodiment in FIG. 11 and the embodiment in FIG. 1A is that the multiple sub-pixels 92a, 94b, and 96a of the display device 90 may be different.
請參考圖11,在本實施例的顯示裝置90中,子畫素90A包括第一子畫素92a與第二子畫素94a。在本實施例中,子畫素90A還可包括第三子畫素96a,但本發明不限於此。在本實施例中,第一子畫素92a的第一開口1402在第一方向y上的寬度140y大於第一開口1402在第二方向x上的寬度140x,而第一子畫素92a的材料區域1452的第一寬度W1大於第二寬度W2。第二子畫素94a的第一開口1404在第一方向y上的寬度140y大於第一開口1404在第二方向x上的寬度140x,而第二子畫素94a的材料區域1454的第一寬度W1小於第二寬度W2。也就是說,本實施例的第一子畫素92a的材料區域1452的第一寬度W1和第二寬度W2的大小關係與第二子畫素94a的材料區域1454的第一寬度W1和第二寬度W2的大小關係不相同。Please refer to FIG. 11. In the display device 90 of this embodiment, the sub-pixel 90A includes a first sub-pixel 92a and a second sub-pixel 94a. In this embodiment, the sub-pixel 90A may further include a third sub-pixel 96a, but the present invention is not limited thereto. In this embodiment, the width 140y of the first opening 1402 of the first sub-pixel 92a in the first direction y is greater than the width 140x of the first opening 1402 in the second direction x, and the material of the first sub-pixel 92a is The first width W1 of the region 1452 is larger than the second width W2. The width 140y of the first opening 1404 of the second sub-pixel 94a in the first direction y is greater than the width 140x of the first opening 1404 in the second direction x, and the first width of the material region 1454 of the second sub-pixel 94a W1 is smaller than the second width W2. That is, the magnitude relationship between the first width W1 and the second width W2 of the material region 1452 of the first sub-pixel 92a and the first width W1 and the second width of the material region 1454 of the second sub-pixel 94a in this embodiment. The size W2 has a different relationship.
在本實施例中,第三子畫素96a相鄰於第二子畫素94a,第二子畫素94a設置於第一子畫素92a與第三子畫素96a之間。第三子畫素96a的第一開口1406在第一方向y上的寬度140y大於第一開口1406在第二方向x上的寬度140x,而第三子畫素96a的材料區域1456的第一寬度W1等於第二寬度W2。也就是說,本實施例的第一子畫素92a的材料區域1452、第二子畫素94a的材料區域1454與第三子畫素96a的材料區域1456各自具有第一寬度W1和第二寬度W2,且不同子畫素中的第一寬度W1和第二寬度W2的大小關係都不相同。然而,本發明不限於此。在其他實施例中,也可以選擇性地將其中兩個子畫素設置為具有相同的第一寬度W1和第二寬度W2的大小關係。In this embodiment, the third sub-pixel 96a is adjacent to the second sub-pixel 94a, and the second sub-pixel 94a is disposed between the first sub-pixel 92a and the third sub-pixel 96a. The width 140y of the first opening 1406 of the third sub-pixel 96a in the first direction y is greater than the width 140x of the first opening 1406 in the second direction x, and the first width of the material region 1456 of the third sub-pixel 96a W1 is equal to the second width W2. That is, the material region 1452 of the first sub-pixel 92a, the material region 1454 of the second sub-pixel 94a, and the material region 1456 of the third sub-pixel 96a each have a first width W1 and a second width W2, and the size relationship between the first width W1 and the second width W2 in different sub-pixels is different. However, the present invention is not limited to this. In other embodiments, the two sub-pixels may also be selectively set to have the same size relationship between the first width W1 and the second width W2.
在本實施例中,第一子畫素92a、第二子畫素94a及第三子畫素96a可分別顯示互不相同的顏色,但本發明不限於此。在本實施例中,第一子畫素92a、第二子畫素94a及第三子畫素96a可分別顯示紅色、綠色和藍色,但本發明不限於此。In this embodiment, the first sub-pixel 92a, the second sub-pixel 94a, and the third sub-pixel 96a may display different colors from each other, but the present invention is not limited thereto. In this embodiment, the first sub-pixel 92a, the second sub-pixel 94a, and the third sub-pixel 96a can display red, green, and blue, respectively, but the present invention is not limited thereto.
綜上所述,本發明一實施例的顯示裝置,包括多個子畫素。多個子畫素設置於基板上。每一子畫素包括主動元件、第一電極、第一堤岸層、第二堤岸層、發光層以及第二電極。第一電極與主動元件電性連接。第一堤岸層設置於第一電極上,且具有與部分之第一電極重疊的第一開口。第二堤岸層設置於第一堤岸層上,且具有與第一開口重疊的第二開口。發光層設置於部分的第一電極上,且位於第一堤岸層的第一開口與第二堤岸層的第二開口。第二電極設置於發光層上。第一堤岸層具材料區域。材料區域於基板上的垂直投影位於第一開口於基板上的垂直投影與第二開口於基板上的垂直投影之間。材料區域在第一方向上具有第一寬度,材料區域在第二方向上具有第二寬度。多個子畫素包括第一子畫素。特別是,第一子畫素之材料區域的第一寬度不等於第一子畫素之材料區域的第二寬度。藉此,能改善本發明一實施例的顯示裝置之發光層的膜厚度不均勻的問題。In summary, a display device according to an embodiment of the present invention includes a plurality of sub pixels. A plurality of sub pixels are disposed on the substrate. Each sub-pixel includes an active element, a first electrode, a first bank layer, a second bank layer, a light emitting layer, and a second electrode. The first electrode is electrically connected to the active element. The first bank layer is disposed on the first electrode and has a first opening overlapping a part of the first electrode. The second bank layer is disposed on the first bank layer and has a second opening overlapping the first opening. The light emitting layer is disposed on a part of the first electrode, and is located on the first opening of the first bank layer and the second opening of the second bank layer. The second electrode is disposed on the light emitting layer. The first bank layer has a material area. The vertical projection of the material region on the substrate is between the vertical projection of the first opening on the substrate and the vertical projection of the second opening on the substrate. The material region has a first width in a first direction, and the material region has a second width in a second direction. The plurality of sub pixels include a first sub pixel. In particular, the first width of the material region of the first sub-pixel is not equal to the second width of the material region of the first sub-pixel. Thereby, the problem of uneven film thickness of the light emitting layer of the display device according to an embodiment of the present invention can be improved.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application.
10、20、30、40、50、60、70、80、90‧‧‧顯示裝置10, 20, 30, 40, 50, 60, 70, 80, 90‧‧‧ display devices
10A、20A、30A、40A、50A、60A、70A、80A、90A‧‧‧子畫素10A, 20A, 30A, 40A, 50A, 60A, 70A, 80A, 90A ‧‧‧ sub pixels
10a、20a、30a、40a、50a、60a、92a‧‧‧第一子畫素10a, 20a, 30a, 40a, 50a, 60a, 92a
94a‧‧‧第二子畫素94a‧‧‧ second sub-pixel
96a‧‧‧第三子畫素96a‧‧‧ third sub pixel
72a、82a‧‧‧第四子畫素72a, 82a ‧‧‧ fourth sub pixel
74a、84a‧‧‧第五子畫素74a, 84a‧‧‧ fifth sub-pixel
100‧‧‧基板100‧‧‧ substrate
110‧‧‧主動元件110‧‧‧active element
120‧‧‧平坦層120‧‧‧ flat layer
130‧‧‧第一電極130‧‧‧first electrode
130t‧‧‧頂面130t‧‧‧Top
130x‧‧‧第一電極列130x‧‧‧first electrode row
130y‧‧‧第一電極行130y‧‧‧First electrode row
140、142‧‧‧第一堤岸層140, 142‧‧‧ first bank layer
140’‧‧‧堤岸條140’‧‧‧ Embankment
140t、142t‧‧‧頂面140t, 142t‧‧‧Top
140x、140y‧‧‧寬度140x, 140y‧‧‧Width
140a、1402、1404、1406‧‧‧第一開口140a, 1402, 1404, 1406‧‧‧ First opening
140a’‧‧‧第一條狀開口140a’‧‧‧ first strip opening
140b‧‧‧彎曲段140b‧‧‧curved section
140b’‧‧‧波浪線段140b’‧‧‧ wave segment
145、1451、1452、1454、1456‧‧‧材料區域145, 1451, 1452, 1454, 1456‧‧‧ materials area
150‧‧‧第二堤岸層150‧‧‧ second bank layer
150a、1502、1504‧‧‧第二開口150a, 1502, 1504‧‧‧Second opening
150s‧‧‧側壁150s‧‧‧ sidewall
150t‧‧‧頂面150t‧‧‧Top
160‧‧‧電洞注入層160‧‧‧ Hole injection layer
170‧‧‧電洞傳輸層170‧‧‧ Hole Transmission Layer
180‧‧‧發光層180‧‧‧Light-emitting layer
180a‧‧‧交界邊180a‧‧‧junction
182‧‧‧頂面182‧‧‧Top
182a、182b‧‧‧點182a, 182b‧‧‧ points
190‧‧‧電子傳輸層190‧‧‧ electron transmission layer
200‧‧‧電子注入層200‧‧‧ electron injection layer
210‧‧‧第二電極210‧‧‧Second electrode
212‧‧‧頂面212‧‧‧Top
212a‧‧‧點212a‧‧‧points
300‧‧‧遮罩結構300‧‧‧Mask structure
310‧‧‧實體部310‧‧‧Entity
320‧‧‧開口部320‧‧‧ opening
400‧‧‧部件400‧‧‧ parts
410‧‧‧源材料410‧‧‧source material
A-A’、B-B’、C-C’、D-D’、E-E’、F-F’、G-G’、H-H’‧‧‧剖線A-A ’, B-B’, C-C ’, D-D’, E-E ’, F-F’, G-G ’, H-H’‧‧‧ hatched
H1、T1‧‧‧第一距離H1, T1‧‧‧First distance
H2、T2‧‧‧第二距離H2, T2‧‧‧‧Second Distance
T1’‧‧‧距離T1’‧‧‧distance
W1‧‧‧第一寬度W1‧‧‧first width
W2‧‧‧第二寬度W2‧‧‧Second width
W1’、W2’、W3‧‧‧寬度W1 ’, W2’, W3‧‧‧Width
x‧‧‧第二方向x‧‧‧ second direction
y‧‧‧第一方向y‧‧‧first direction
z‧‧‧第三方向z‧‧‧ third direction
圖1A是依照本發明一實施例的顯示裝置的部分元件的上視示意圖。 圖1B是根據圖1A的剖線A-A’繪示的顯示裝置的子畫素的剖面示意圖。 圖2是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。 圖3是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。 圖4是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。 圖5A是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。 圖5B是根據圖5A的剖線B-B’繪示的顯示裝置的子畫素的剖面示意圖。 圖6A至圖6D是圖5A之顯示裝置的部分元件的製造流程剖面示意圖。 圖7A及圖7B分別是圖6B及圖6D的顯示裝置的製造步驟的上視示意圖。 圖8是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。 圖9A是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。 圖9B是根據圖9A的剖線E-E’繪示的顯示裝置的子畫素的剖面示意圖。 圖9C是根據圖9A的剖線F-F’繪示的顯示裝置的子畫素的剖面示意圖。 圖10A是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。 圖10B是根據圖10A的剖線G-G’繪示的顯示裝置的子畫素的剖面示意圖。 圖10C是根據圖10A的剖線H-H’繪示的顯示裝置的子畫素的剖面示意圖。 圖11是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。FIG. 1A is a schematic top view of some elements of a display device according to an embodiment of the invention. FIG. 1B is a schematic cross-sectional view of a sub-pixel of the display device shown according to the section line A-A 'of FIG. 1A. FIG. 2 is a schematic top view of some elements of a display device according to another embodiment of the present invention. FIG. 3 is a schematic top view of some elements of a display device according to another embodiment of the present invention. FIG. 4 is a schematic top view of some elements of a display device according to another embodiment of the present invention. 5A is a schematic top view of some elements of a display device according to another embodiment of the present invention. Fig. 5B is a schematic cross-sectional view of a sub-pixel of the display device shown according to the section line B-B 'of Fig. 5A. 6A to 6D are schematic cross-sectional views illustrating a manufacturing process of some components of the display device of FIG. 5A. 7A and 7B are schematic top views of manufacturing steps of the display device of FIGS. 6B and 6D, respectively. FIG. 8 is a schematic top view of some elements of a display device according to another embodiment of the present invention. 9A is a schematic top view of some elements of a display device according to another embodiment of the present invention. FIG. 9B is a schematic cross-sectional view of a sub-pixel of the display device shown according to a section line E-E 'of FIG. 9A. FIG. 9C is a schematic cross-sectional view of a sub-pixel of the display device shown according to the section line F-F 'of FIG. 9A. FIG. 10A is a schematic top view of some elements of a display device according to another embodiment of the present invention. FIG. 10B is a schematic cross-sectional view of a sub-pixel of the display device shown according to the section line G-G 'of FIG. 10A. FIG. 10C is a schematic cross-sectional view of a sub-pixel of the display device according to the section line H-H 'of FIG. 10A. 11 is a schematic top view of some elements of a display device according to another embodiment of the present invention.
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