TWI623098B - Pixel structure - Google Patents

Pixel structure Download PDF

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TWI623098B
TWI623098B TW106113445A TW106113445A TWI623098B TW I623098 B TWI623098 B TW I623098B TW 106113445 A TW106113445 A TW 106113445A TW 106113445 A TW106113445 A TW 106113445A TW I623098 B TWI623098 B TW I623098B
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sub
pixel
region
pixel structure
light
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TW106113445A
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Chinese (zh)
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TW201839972A (en
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林冠亨
吳忻蕙
陳重嘉
李孟庭
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友達光電股份有限公司
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Priority to TW106113445A priority Critical patent/TWI623098B/en
Priority to CN201710550210.1A priority patent/CN107204358B/en
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Publication of TW201839972A publication Critical patent/TW201839972A/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/35Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/353Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/121Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements

Abstract

一種畫素結構,包括基板、第一子畫素結構、第二子畫素結構及第三子畫素結構。第一子畫素結構、第二子畫素結構及第三子畫素結構配置於基板上,其中第一子畫素結構與第二子畫素結構沿第一方向排列,且第三子畫素結構環繞第一子畫素結構與第二子畫素結構。A pixel structure includes a substrate, a first sub-pixel structure, a second sub-pixel structure, and a third sub-pixel structure. The first sub-pixel structure, the second sub-pixel structure, and the third sub-pixel structure are arranged on the substrate, wherein the first sub-pixel structure and the second sub-pixel structure are arranged in a first direction, and the third sub-pixel structure The pixel structure surrounds the first sub-pixel structure and the second sub-pixel structure.

Description

畫素結構Pixel structure

本發明是有關於一種畫素結構,且特別是有關於一種用於有機發光二極體顯示面板的畫素結構。The invention relates to a pixel structure, and in particular to a pixel structure for an organic light emitting diode display panel.

近年來,由於有機發光二極體顯示器具有自發光、廣視角、省電、程序簡易、低成本、操作溫度廣泛、高應答速度以及全彩化等等的優點,使其具有極大的潛力成為下一代平面顯示器的主流。隨著顯示技術的不斷進步,對於顯示器的顯示品質的要求也越益提高。因此,如何提高有機發光二極體顯示器的顯示品質仍是目前此領域極欲發展的目標。In recent years, organic light-emitting diode displays have great potential because they have the advantages of self-emission, wide viewing angle, power saving, simple procedures, low cost, wide operating temperature, high response speed, and full color. The mainstream of flat-panel displays. With the continuous progress of display technology, the requirements for the display quality of the display are also increasing. Therefore, how to improve the display quality of the organic light emitting diode display is still a very desirable goal in this field.

本發明提供一種畫素結構,其可提高顯示面板的顯示品質。The invention provides a pixel structure, which can improve the display quality of a display panel.

本發明的畫素結構包括基板、第一子畫素結構、第二子畫素結構及第三子畫素結構。第一子畫素結構、第二子畫素結構及第三子畫素結構配置於基板上,其中第一子畫素結構與第二子畫素結構沿第一方向排列,且第三子畫素結構環繞第一子畫素結構與第二子畫素結構。The pixel structure of the present invention includes a substrate, a first sub-pixel structure, a second sub-pixel structure, and a third sub-pixel structure. The first sub-pixel structure, the second sub-pixel structure, and the third sub-pixel structure are arranged on the substrate, wherein the first sub-pixel structure and the second sub-pixel structure are arranged in a first direction, and the third sub-pixel structure The pixel structure surrounds the first sub-pixel structure and the second sub-pixel structure.

基於上述,在本發明的畫素結構中,第一子畫素結構與第二子畫素結構沿一方向排列,且第三子畫素結構環繞第一子畫素結構與第二子畫素結構,藉此包括本發明的畫素結構的顯示面板的顯示品質可被提升。Based on the above, in the pixel structure of the present invention, the first sub-pixel structure and the second sub-pixel structure are arranged in one direction, and the third sub-pixel structure surrounds the first sub-pixel structure and the second sub-pixel structure. With this structure, the display quality of the display panel including the pixel structure of the present invention can be improved.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings.

以下將以圖式揭露本發明的多個實施例,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意地方式為之。Multiple embodiments of the present invention will be disclosed in the following drawings. For the sake of clarity, many practical details will be described in the following description. It should be understood, however, that these practical details should not be used to limit the invention. That is, in some embodiments of the present invention, these practical details are unnecessary. In addition, to simplify the drawings, some conventional structures and elements will be used in the drawings in a simple and schematic manner.

本文使用的「約」或「近似」或「實質上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,「約」可以表示在所述值的一個或多個標準偏差內,或例如±20%、±15%、±10%、±5%內。As used herein, "about" or "approximately" or "substantially" includes the stated value and an average value within an acceptable deviation range of a particular value determined by one of ordinary skill in the art, taking into account the measurements in question and the measurements A specific number of related errors (ie, limitations of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or for example within ± 20%, ± 15%, ± 10%, ± 5%.

在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。在整個說明書中,相同的附圖元件符號表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反地,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。In the drawings, the thicknesses of layers, films, panels, regions, etc. are exaggerated for clarity. Throughout the description, the same drawing element symbols indicate the same elements. It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to a physical and / or electrical connection.

本發明的畫素結構例如可應用於有機發光二極體顯示面板中。基於此,雖然為了詳細地說明本發明的畫素結構的設計,以下是以單一畫素結構為例來作說明,但任何所屬技術領域中具有通常知識者應可以瞭解,有機發光二極體顯示面板一般包括由多個相同或相似的畫素結構陣列排列而成的畫素陣列。因此,任何所屬技術領域中具有通常知識者可以根據以下針對單一畫素結構的說明,而瞭解有機發光二極體顯示面板中之畫素陣列的結構或佈局。The pixel structure of the present invention can be applied to, for example, an organic light emitting diode display panel. Based on this, although in order to explain the design of the pixel structure of the present invention in detail, a single pixel structure is taken as an example below, but anyone with ordinary knowledge in the technical field should understand that organic light emitting diode display The panel generally includes a pixel array arranged by a plurality of identical or similar pixel structure arrays. Therefore, anyone with ordinary knowledge in the technical field can understand the structure or layout of the pixel array in the organic light emitting diode display panel according to the following description of the single pixel structure.

圖1是依照本發明的第一實施例的畫素結構的上視示意圖。圖2是依照本發明的第一實施例的畫素結構沿著圖1中的剖線A-A’的剖面示意圖。請同時參照圖1及圖2,在本實施例中,畫素結構10可包括基板100、元件層110、第一電極層120、第一發光層130、第二發光層132、第三發光層134、隔離層140以及第二電極層150。為了方便說明起見,圖1中省略繪示第三發光層134以及第二電極層150等元件。另外,在本實施例中,畫素結構10的形狀(例如:垂直投影面積的形狀)為正方形或類正方形,但不限於此。於其它實施例中,畫素結構10的形狀亦可為多邊形、弧形、具有曲率或彎折的形狀或其它合適的形狀。FIG. 1 is a schematic top view of a pixel structure according to a first embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of a pixel structure according to a first embodiment of the present invention, taken along a section line A-A 'in FIG. 1. FIG. Please refer to FIG. 1 and FIG. 2 at the same time. In this embodiment, the pixel structure 10 may include a substrate 100, an element layer 110, a first electrode layer 120, a first light emitting layer 130, a second light emitting layer 132, and a third light emitting layer. 134. The isolation layer 140 and the second electrode layer 150. For convenience of description, elements such as the third light emitting layer 134 and the second electrode layer 150 are omitted in FIG. 1. In addition, in this embodiment, the shape of the pixel structure 10 (for example, the shape of the vertical projection area) is a square or a square-like shape, but is not limited thereto. In other embodiments, the shape of the pixel structure 10 may also be a polygon, an arc, a shape having a curvature or a bend, or other suitable shapes.

基板100包括第一子畫素區域100A、第二子畫素區域100B以及第三子畫素區域100C。在本實施例中,基板100的材料例如是玻璃、石英、有機聚合物或是金屬等等。The substrate 100 includes a first sub-pixel region 100A, a second sub-pixel region 100B, and a third sub-pixel region 100C. In this embodiment, the material of the substrate 100 is, for example, glass, quartz, organic polymer, or metal.

在本實施例中,第一子畫素區域100A與第二子畫素區域100B沿方向D1排列,且第三子畫素區域100C環繞第一子畫素區域100A與第二子畫素區域100B。詳細而言,在本實施例中,第一子畫素區域100A與第二子畫素區域100B以並列(side by side)方式排列,且第三子畫素區域100C環繞於第一子畫素區域100A與第二子畫素區域100B之周圍。在本文中,所述並列(side by side)方式排列並不是指二個子畫素區域緊臨而不具備任何的空間或間隔,而是指二個子畫素區域相鄰,且二個子畫素區域之間仍具備有空間或間隔,可容納其它的子畫素區域。另一方面來說,第一子畫素區域100A與第二子畫素區域100B位於第三子畫素區域100C中,即第三子畫素區域100C形成二個封閉的容納區,第一子畫素區域100A位於二個封閉的容納區其中一個中,第二子畫素區域100B位於二個封閉的容納區另一個中。In this embodiment, the first sub-pixel area 100A and the second sub-pixel area 100B are arranged along the direction D1, and the third sub-pixel area 100C surrounds the first sub-pixel area 100A and the second sub-pixel area 100B. . In detail, in this embodiment, the first sub-pixel region 100A and the second sub-pixel region 100B are arranged side by side, and the third sub-pixel region 100C surrounds the first sub-pixel. Area 100A and the periphery of the second sub-pixel area 100B. In this article, the side-by-side arrangement does not mean that the two sub-pixel regions are close to each other without any space or interval, but that the two sub-pixel regions are adjacent and the two sub-pixel regions are adjacent. There is still space or space between them, which can accommodate other sub-pixel regions. On the other hand, the first sub-pixel area 100A and the second sub-pixel area 100B are located in the third sub-pixel area 100C, that is, the third sub-pixel area 100C forms two closed accommodation areas. The pixel area 100A is located in one of the two closed accommodation areas, and the second sub pixel area 100B is located in the other of the two closed accommodation areas.

第一電極層120配置於基板100上。詳細而言,在本實施例中,第一電極層120包括彼此分離的電極圖案120A、電極圖案120B及電極圖案120C,其中電極圖案120A位於第一子畫素區域100A中,則可稱為第一電極圖案120A,電極圖案120B位於第二子畫素區域100B中,則可稱為第二電極圖案120B,而電極圖案120C位於第三子畫素區域100C中,可稱為第三電極圖案120C。也就是說,在本實施例中,第一電極層120為經圖案化的電極層,且第一電極層120位於第一子畫素區域100A、第二子畫素區域100B以及第三子畫素區域100C中。The first electrode layer 120 is disposed on the substrate 100. In detail, in this embodiment, the first electrode layer 120 includes an electrode pattern 120A, an electrode pattern 120B, and an electrode pattern 120C separated from each other. The electrode pattern 120A is located in the first sub-pixel region 100A, and may be referred to as the first An electrode pattern 120A, an electrode pattern 120B located in the second sub-pixel region 100B, may be referred to as a second electrode pattern 120B, and an electrode pattern 120C located in a third sub-pixel region 100C, may be referred to as a third electrode pattern 120C . That is, in this embodiment, the first electrode layer 120 is a patterned electrode layer, and the first electrode layer 120 is located in the first sub-pixel area 100A, the second sub-pixel area 100B, and the third sub-picture. Prime region 100C.

在本實施例中,第一電極層120可利用任何所屬領域中具有通常知識者所周知的任一種製造電極層的方法來形成,例如:薄膜沉積及曝光與蝕刻方法、網版印刷方法、噴墨印刷方法、轉印方式、曝光與蝕刻方法、或其它合適的方法。In this embodiment, the first electrode layer 120 may be formed using any method for manufacturing an electrode layer known to those having ordinary knowledge in the art, such as a thin film deposition and exposure and etching method, a screen printing method, and a spraying method. Ink printing method, transfer method, exposure and etching method, or other suitable methods.

元件層110配置於基板100上,且位於基板100與第一電極層120之間,用以提供驅動電壓至第一電極層120,以使後續製程的第一發光層130、第二發光層132及/或第三發光層134發光。在本實施例中,元件層110可以是任何所屬領域中具有通常知識者所周知的用於有機發光二極體顯示面板的任一種主動元件層,例如:元件層110可至少包括多條掃描線、多條資料線、多個薄膜電晶體(thin film transistor,TFT)、多個電容器及至少一條電源線(power line,VDD)、或其它合適的電極或線,然而本發明不限於此。舉例而言,在本實施例中,元件層110包含多個薄膜電晶體,第一子畫素區域100A、第二子畫素區100B與第三子畫素區100B中的第一電極圖案120A、第二電極圖案120B與第三電極圖案120C分別與所對應的薄膜電晶體連接,以使得各子畫素分別接收所需要的訊號。The element layer 110 is disposed on the substrate 100 and is located between the substrate 100 and the first electrode layer 120 to provide a driving voltage to the first electrode layer 120 so that the first light-emitting layer 130 and the second light-emitting layer 132 in subsequent processes are provided. And / or the third light emitting layer 134 emits light. In this embodiment, the element layer 110 may be any active element layer for an organic light-emitting diode display panel known to those having ordinary knowledge in the art. For example, the element layer 110 may include at least a plurality of scanning lines. , Multiple data lines, multiple thin film transistors (TFTs), multiple capacitors and at least one power line (VDD), or other suitable electrodes or lines, but the present invention is not limited thereto. For example, in this embodiment, the element layer 110 includes a plurality of thin film transistors. The first electrode pattern 120A in the first sub-pixel region 100A, the second sub-pixel region 100B, and the third sub-pixel region 100B. The second electrode pattern 120B and the third electrode pattern 120C are respectively connected to corresponding thin film transistors, so that each sub-pixel receives the required signal, respectively.

在本實施例中,元件層110可具有2T1C的架構、3T1C的架構、4T2C的架構、6T1C的架構、7T2C的架構、或是任何可做應用於有機發光二極體顯示面板中的其他架構。In this embodiment, the element layer 110 may have a 2T1C structure, a 3T1C structure, a 4T2C structure, a 6T1C structure, a 7T2C structure, or any other structure applicable to an organic light emitting diode display panel.

另外,在本實施例中,第一電極層120可為單層或多層結構,且其材料可包括反射材料,其例如是金屬、合金、金屬氧化物等導電材料,或是金屬與透明導電材料之堆疊層,上述透明導電材料例如是銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、銦鍺鋅氧化物、厚度小於60埃(Å)的金屬及/或合金、奈米碳管/桿、或其它合適的透明導電材料。也就是說,在本實施例中,第一電極層120,較佳地,為反射電極層,則畫素結構10可屬於上發光型(top emission type),但不限於此。於其它實施例中,第一電極層120可為透明導電層,則畫素結構10可屬於底發光型(bottom emission type)或雙面發光型(dual emission type)。In addition, in this embodiment, the first electrode layer 120 may have a single-layer or multi-layer structure, and its material may include a reflective material, such as a conductive material such as a metal, an alloy, a metal oxide, or a metal and a transparent conductive material. For example, the transparent conductive material is indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium zinc oxide, metal and / or alloy with a thickness of less than 60 angstroms (Å), Carbon nanotubes / rods, or other suitable transparent conductive materials. That is, in this embodiment, the first electrode layer 120 is preferably a reflective electrode layer, and the pixel structure 10 may belong to a top emission type, but is not limited thereto. In other embodiments, the first electrode layer 120 may be a transparent conductive layer, and the pixel structure 10 may belong to a bottom emission type or a dual emission type.

第一發光層130、第二發光層132及第三發光層134配置在第一電極層120與第二電極層150之間。舉例而言,第一發光層130可位於第一子畫素區域100A中,第二發光層132可位於第二子畫素區域100B中,第三發光層134可位於第一子畫素區域100A、第二子畫素區域100B及第三子畫素區域100C中。換言之,在第一子畫素區域100A中,第三發光層134覆蓋第一發光層130,以及在第二子畫素區域100B中,第三發光層134覆蓋第二發光層132。於其它實施例中,第一發光層130可僅位於第一子畫素區域100A中,第二發光層132可僅位於第二子畫素區域100B中,而第三發光層134可為一連續結構層,連續分佈於第一子畫素區域100A、第二子畫素區域100B及第三子畫素區域100C中。在本實施例中,第三發光層134,較佳地,需選用電子遷移率(mobility)較快的材料,以使得在第三發光層134覆蓋第一發光層130之第一子畫素區域100A中,電子與電洞較容易於第一發光層130中結合而發光;以及在第三發光層134覆蓋第二發光層132之第二子畫素區域100B中,電子與電洞較容易於第二發光層132中結合而發光。另一方面,在本實施例中,可透過微共振腔效應控制位於第一子畫素區域100A及第二子畫素區域100B中的第三發光層134所發的光無法自畫素結構10發射至外部。The first light emitting layer 130, the second light emitting layer 132, and the third light emitting layer 134 are disposed between the first electrode layer 120 and the second electrode layer 150. For example, the first light-emitting layer 130 may be located in the first sub-pixel region 100A, the second light-emitting layer 132 may be located in the second sub-pixel region 100B, and the third light-emitting layer 134 may be located in the first sub-pixel region 100A. , The second sub-pixel region 100B and the third sub-pixel region 100C. In other words, in the first sub-pixel region 100A, the third light-emitting layer 134 covers the first light-emitting layer 130, and in the second sub-pixel region 100B, the third light-emitting layer 134 covers the second light-emitting layer 132. In other embodiments, the first light-emitting layer 130 may be located only in the first sub-pixel region 100A, the second light-emitting layer 132 may be located only in the second sub-pixel region 100B, and the third light-emitting layer 134 may be a continuous The structure layer is continuously distributed in the first sub-pixel area 100A, the second sub-pixel area 100B, and the third sub-pixel area 100C. In this embodiment, the third light-emitting layer 134 is preferably made of a material having a fast electron mobility so that the third light-emitting layer 134 covers the first sub-pixel region of the first light-emitting layer 130. In 100A, electrons and holes are easier to combine to emit light in the first light-emitting layer 130; and in the second sub-pixel region 100B in which the third light-emitting layer 134 covers the second light-emitting layer 132, electrons and holes are easier to The second light emitting layer 132 is combined to emit light. On the other hand, in this embodiment, the micro-resonant cavity effect can be used to control the light emitted by the third light-emitting layer 134 located in the first sub-pixel region 100A and the second sub-pixel region 100B from the pixel structure 10. Launch to the outside.

在本實施例中,第一發光層130及第二發光層132例如是分別使用蒸鍍製程或噴墨製程,且可選擇性地搭配對應的罩幕,例如:精細(或稱為精密)金屬罩幕(fine metal mask,FMM)來形成。另外,在本實施例中,第三發光層134可為一連續結構層,因此第三發光層134不需使用罩幕,例如:FMM加以形成。詳細而言,在本實施例中,第三發光層134例如是使用蒸鍍製程或噴墨製程,且可選擇性地搭配一般金屬遮罩來形成。值得一提的是,在本實施例中,由於第三發光層134不需使用罩幕,例如:FMM加以形成,因此在畫素結構10的製造過程中可減少FMM的使用次數,從而可降低生產成本與製程難度。In this embodiment, for example, the first light-emitting layer 130 and the second light-emitting layer 132 respectively use an evaporation process or an inkjet process, and can be optionally matched with corresponding masks, for example, fine (or precision) metal Form a fine metal mask (FMM). In addition, in this embodiment, the third light-emitting layer 134 may be a continuous structure layer. Therefore, the third light-emitting layer 134 does not need to use a mask, such as FMM. In detail, in this embodiment, the third light-emitting layer 134 is formed by using, for example, a vapor deposition process or an inkjet process, and may be selectively matched with a general metal mask. It is worth mentioning that in this embodiment, since the third light-emitting layer 134 does not need to use a mask, for example, FMM is formed, the number of times of using the FMM can be reduced during the manufacturing process of the pixel structure 10, which can reduce Production cost and process difficulty.

另外,在本實施例中,第一發光層130、第二發光層132與第三發光層134可分別為不同顏色的發光層,例如:第一發光層130可為紅色發光層、第二發光層132可為綠色發光層及第三發光層134可為藍色發光層,即第一發光層130可包括紅色發光材料、第二發光層132可包括綠色發光材料及第三發光層134可包括藍色發光材料。In addition, in this embodiment, the first light emitting layer 130, the second light emitting layer 132, and the third light emitting layer 134 may be light emitting layers of different colors, for example, the first light emitting layer 130 may be a red light emitting layer and a second light emitting layer. The layer 132 may be a green light emitting layer and the third light emitting layer 134 may be a blue light emitting layer, that is, the first light emitting layer 130 may include a red light emitting material, the second light emitting layer 132 may include a green light emitting material, and the third light emitting layer 134 may include Blue luminescent material.

隔離層140配置於第一電極層120上。舉例而言,隔離層140具有開口V1及開口V2,其中開口V1暴露出第一電極層120的電極圖案120A,即隔離層140未遮蔽第一電極層120的電極圖案120A至少一部份,以及開口V2暴露出第一電極層120的電極圖案120B,即隔離層140未遮蔽第一電極層120的電極圖案120B至少一部份。另外,在本實施例中,第一發光層130至少位於開口V1內並覆蓋被暴露出的電極圖案120A,第二發光層132至少位於開口V2內並覆蓋被暴露出的電極圖案120B。於其它實施例中,隔離層140可封閉環繞第一發光層130及第二發光層132。在本實施例中,隔離層140的材料可為單層或多層結構,較佳地,可包括有機材料,例如:聚醯亞胺(polyimide,PI)、聚醯胺(polyamide,PA)、聚酯(Polyester)、苯並環丁烯(Benzocyclobutene,BCB)、光阻、聚乙烯吡咯烷酮(Polyvinylpyrrolidone,PVP)、對苯二甲酸乙二酯(polyethylene terephthalate,PET)、或其它合適的材料,但不限於此。於其它實施例中,隔離層140的材料也可包含無機材料、無機材料與有機材料之組合、或其它合適的材料,其中無機材料例如是:氧化矽、氮化矽、氮氧化矽、或其它合適的材料。The isolation layer 140 is disposed on the first electrode layer 120. For example, the isolation layer 140 has an opening V1 and an opening V2, wherein the opening V1 exposes the electrode pattern 120A of the first electrode layer 120, that is, the isolation layer 140 does not shield at least a part of the electrode pattern 120A of the first electrode layer 120, and The opening V2 exposes the electrode pattern 120B of the first electrode layer 120, that is, the isolation layer 140 does not cover at least a part of the electrode pattern 120B of the first electrode layer 120. In addition, in this embodiment, the first light-emitting layer 130 is located at least in the opening V1 and covers the exposed electrode pattern 120A, and the second light-emitting layer 132 is located at least in the opening V2 and covers the exposed electrode pattern 120B. In other embodiments, the isolation layer 140 can surround the first light emitting layer 130 and the second light emitting layer 132. In this embodiment, the material of the isolation layer 140 may be a single-layer or multi-layer structure. Preferably, the material may include organic materials, such as polyimide (PI), polyamide (PA), and polyimide. Polyester, Benzocyclobutene (BCB), Photoresist, Polyvinylpyrrolidone (PVP), Polyethylene terephthalate (PET), or other suitable materials, but not Limited to this. In other embodiments, the material of the isolation layer 140 may also include inorganic materials, combinations of inorganic materials and organic materials, or other suitable materials. The inorganic materials are, for example, silicon oxide, silicon nitride, silicon oxynitride, or other materials. The right material.

在本實施例中,隔離層140,例如:可用以定義第一子畫素區域100A及第二子畫素區域100B。舉例而言,鄰近第一發光層130之沿方向D2延伸的一側邊的隔離層140的寬度f的中心(或稱為形心)到鄰近前述側邊之對向側邊的隔離層140的寬度f的中心(或稱為形心)之間的距離為第一子畫素區域100A的寬度d,以及鄰近第二發光層132之沿方向D2延伸的一側邊的隔離層140的寬度f的中心(或稱為形心)到鄰近前述側邊之對向側邊的隔離層140的寬度f的中心(或稱為形心)之間的距離為第二子畫素區域100B的寬度d。In this embodiment, for example, the isolation layer 140 can be used to define the first sub-pixel region 100A and the second sub-pixel region 100B. For example, the center (or centroid) of the width f of the isolation layer 140 adjacent to one side of the first light-emitting layer 130 extending in the direction D2 to the center of the isolation layer 140 adjacent to the opposite side of the foregoing side. The distance between the centers (or centroids) of the width f is the width d of the first sub-pixel region 100A, and the width f of the isolation layer 140 adjacent to the side of the second light-emitting layer 132 extending in the direction D2. The distance from the center (or centroid) of the center to the center (or centroid) of the width f of the isolation layer 140 adjacent to the opposite side of the aforementioned side is the width d of the second sub-pixel region 100B .

第二電極層150配置在第一電極層120上。詳細而言,第二電極層150可位於第一子畫素區域100A、第二子畫素區域100B以及第三子畫素區域100C中。在本實施例中,第二電極層150可為單層或多層結構,且其材料包括反射導電材料(可參閱前文中的描述)、透明導電材料(可參閱前文中的描述)、或二者之組合。依照畫素結構10類型可加以選擇第二電極層150的材料,例如:若畫素結構10可為上發光型,則第一電極層120的材料可具有反射性質(即第一電極層120可作為反射電極層),第二電極層150的材料可為透明導電材料(即第二電極層150可作為透明電極層);若畫素結構10可為下發光型,則第一電極層120的材料可為透明導電材料(即第一電極層120可作為透明電極層),第二電極層150的材料可具有反射性質(即第二電極層150可作為反射電極層);若畫素結構10可為雙面發光型,則第一電極層120與第二電極層150的材料皆可為透明導電材料(即第一電極層120與第二電極層150皆可作為透明電極層)。也就是說,第一電極層120與第二電極層150的材料選用可實質上相同或不同。再者,在其他實施例中,依照畫素結構10的類型,例如:上發光型或雙面發光型,第二電極層150也可以是半穿透半反射電極。The second electrode layer 150 is disposed on the first electrode layer 120. In detail, the second electrode layer 150 may be located in the first sub-pixel region 100A, the second sub-pixel region 100B, and the third sub-pixel region 100C. In this embodiment, the second electrode layer 150 may be a single-layer or multi-layer structure, and its material includes a reflective conductive material (see the description above), a transparent conductive material (see the description above), or both. Of combination. The material of the second electrode layer 150 can be selected according to the type of the pixel structure 10, for example, if the pixel structure 10 can be a top-emission type, the material of the first electrode layer 120 can have a reflective property (that is, the first electrode layer 120 can As a reflective electrode layer), the material of the second electrode layer 150 may be a transparent conductive material (that is, the second electrode layer 150 may be used as a transparent electrode layer); if the pixel structure 10 may be a lower emission type, the The material may be a transparent conductive material (ie, the first electrode layer 120 may serve as a transparent electrode layer), and the material of the second electrode layer 150 may have a reflective property (ie, the second electrode layer 150 may serve as a reflective electrode layer); if the pixel structure 10 It can be a double-sided light-emitting type, and the materials of the first electrode layer 120 and the second electrode layer 150 can be transparent conductive materials (that is, both the first electrode layer 120 and the second electrode layer 150 can be used as transparent electrode layers). That is, the material selection of the first electrode layer 120 and the second electrode layer 150 may be substantially the same or different. Furthermore, in other embodiments, according to the type of the pixel structure 10, for example, an upper-emitting type or a double-sided emitting type, the second electrode layer 150 may also be a semi-transmissive and semi-reflective electrode.

另外,在本實施例中,第一電極層120可作為陽極,而第二電極層150可作為陰極。但必需說明的,就以設計上的需求來說,第一電極層120也可能作為陰極,而第二電極層150則可作為陽極。In addition, in this embodiment, the first electrode layer 120 may serve as an anode, and the second electrode layer 150 may serve as a cathode. However, it must be noted that, in terms of design requirements, the first electrode layer 120 may also serve as a cathode, and the second electrode layer 150 may serve as an anode.

在本實施例中,至少位於第一子畫素區域100A中的元件層100、第一電極層120的電極圖案120A、第一發光層130、第三發光層134及第二電極層150構成第一子畫素結構U1;至少位於第二子畫素區域100B中的元件層100、第一電極層120的電極圖案120B、第二發光層132、第三發光層134及第二電極層150構成第二子畫素結構U2;以及至少位於第三子畫素區域100C中的元件層100、第一電極層120的電極圖案120C、第三發光層134及第二電極層150構成第三子畫素結構U3。也就是說,在本實施例中,畫素結構10包括配置於基板100上的第一子畫素結構U1、第二子畫素結構U2及第三子畫素結構U3,其中第一子畫素結構U1位於第一子畫素區域100A中,第二子畫素結構U2位於第二子畫素區域100B中,且第三子畫素結構U3位於第三子畫素區域100C中。In this embodiment, at least the element layer 100, the electrode pattern 120A of the first electrode layer 120, the first light-emitting layer 130, the third light-emitting layer 134, and the second electrode layer 150 located in at least the first sub-pixel region 100A constitute a first A sub-pixel structure U1; at least the element layer 100, the electrode pattern 120B of the first electrode layer 120, the second light-emitting layer 132, the third light-emitting layer 134, and the second electrode layer 150 are located in at least the second sub-pixel region 100B. The second sub-pixel structure U2; and the element layer 100, the electrode pattern 120C of the first electrode layer 120, the third light-emitting layer 134, and the second electrode layer 150 at least in the third sub-pixel region 100C constitute a third sub-picture素 结构 U3. That is, in this embodiment, the pixel structure 10 includes a first sub-pixel structure U1, a second sub-pixel structure U2, and a third sub-pixel structure U3 arranged on the substrate 100. The pixel structure U1 is located in the first sub-pixel area 100A, the second sub-pixel structure U2 is located in the second sub-pixel area 100B, and the third sub-pixel structure U3 is located in the third sub-pixel area 100C.

如前文所述,在本實施例中,第一發光層130可為紅色發光層、第二發光層132可為綠色發光層及第三發光層134可為藍色發光層,藉此第一子畫素結構U1可發出紅光、第二子畫素結構U2可發出綠光及第三子畫素結構U3可發出藍光,即前述子畫素結構U1~U3可分別發出不同顏色的光。換言之,第一子畫素區域100A具有第一發光區(即可發出第一顏色光線的區域,例如:第一發光層130所在的區域)、第二子畫素區域100B具有第二發光區(即可發出第二顏色光線的區域,例如:第二發光層132所在的區域)以及第三子畫素區域100C具有第三發光區(即可發出第三顏色光線的區域,例如:第三發光層134所在的區域),而這三區分別發出不同顏色的光。因此,第三子畫素區域100C之第三發光區環繞於第一子畫素區域100A之第一發光區與第二子畫素區域100B之第二發光區的周圍,即第三子畫素區域100C之第三發光區形成二個封閉的容納區,第一子畫素區域100A之第一發光區位於二個封閉的容納區其中一個中,第二子畫素區域100B之第二發光區位於二個封閉的容納區另一個中。另外,第一發光區的面積實質上等於或小於第一子畫素區域100A的面積,第二發光區的面積實質上等於或小於第二子畫素區域100B的面積,且第三發光區的面積實質上等於或小於第三子畫素區域100C的面積。As described above, in this embodiment, the first light-emitting layer 130 may be a red light-emitting layer, the second light-emitting layer 132 may be a green light-emitting layer, and the third light-emitting layer 134 may be a blue light-emitting layer. The pixel structure U1 can emit red light, the second sub-pixel structure U2 can emit green light, and the third sub-pixel structure U3 can emit blue light, that is, the aforementioned sub-pixel structures U1 to U3 can emit light of different colors, respectively. In other words, the first sub-pixel area 100A has a first light-emitting area (that is, an area that emits light of a first color, for example, the area where the first light-emitting layer 130 is located), and the second sub-pixel area 100B has a second light-emitting area ( That is, an area that emits light of a second color, such as the area where the second light-emitting layer 132 is located, and the third sub-pixel region 100C has a third light-emitting area (area that can emit light of a third color, such as a third light-emitting area) Layer 134), and these three regions emit different colors of light. Therefore, the third light emitting area of the third sub pixel area 100C surrounds the first light emitting area of the first sub pixel area 100A and the second light emitting area of the second sub pixel area 100B, that is, the third sub pixel The third light-emitting area of the area 100C forms two closed accommodation areas. The first light-emitting area of the first sub-pixel area 100A is located in one of the two closed accommodation areas, and the second light-emitting area of the second sub-pixel area 100B. Located in another of two enclosed accommodation areas. In addition, the area of the first light-emitting region is substantially equal to or smaller than the area of the first sub-pixel region 100A, the area of the second light-emitting region is substantially equal to or smaller than the area of the second sub-pixel region 100B, and The area is substantially equal to or smaller than the area of the third sub-pixel area 100C.

如前文所述,在本實施例中,第一子畫素區域100A與第二子畫素區域100B沿方向D1排列,且第三子畫素區域100C環繞第一子畫素區域100A與第二子畫素區域100B,因此第一子畫素結構U1與第二子畫素結構U2會沿方向D1排列,且第三子畫素結構U3會環繞第一子畫素結構U1與第二子畫素結構U2周圍,即第三子畫素結構U3形成二個封閉的容納區,第一子畫素結構U1位於二個封閉的容納區其中一個,第二子畫素結構U2位於二個封閉的容納區另一個。如此一來,包括畫素結構10的顯示面板的顯示品質可被提升。As described above, in this embodiment, the first sub-pixel area 100A and the second sub-pixel area 100B are arranged along the direction D1, and the third sub-pixel area 100C surrounds the first sub-pixel area 100A and the second Sub-pixel area 100B, so the first sub-pixel structure U1 and the second sub-pixel structure U2 will be aligned in the direction D1, and the third sub-pixel structure U3 will surround the first sub-pixel structure U1 and the second sub-picture Around the pixel structure U2, that is, the third sub-pixel structure U3 forms two closed accommodation areas. The first sub-pixel structure U1 is located in one of the two closed accommodation areas, and the second sub-pixel structure U2 is located in the two closed areas. The accommodation area is another. In this way, the display quality of the display panel including the pixel structure 10 can be improved.

在本實施例中,設置有第一子畫素結構U1的第一子畫素區域100A、設置有第二子畫素結構U2的第二子畫素區域100B與第三子畫素結構U3的第三子畫素區域100C的形狀(例如:垂直投影面積的形狀)可為矩形或類矩形為範例,但不限於此。於其它實施例中,設置有第一子畫素結構U1的第一子畫素區域100A、設置有第二子畫素結構U2的第二子畫素區域100B與第三子畫素結構U3的第三子畫素區域100C的形狀為多邊形、弧形、具有曲率或彎折的形狀、或其它合適的形狀。舉例而言,設置有第三子畫素結構U3的第三子畫素區域100C可具有沿方向D1延伸的第一矩形區域(或稱為第一區域)C1和第二矩形區域(或稱為第二區域)C2,以及沿與方向D1相垂直的方向D2延伸的第三矩形區域(或稱為第三區域)C3、第四矩形區域(或稱為第四區域)C4、第五矩形區域(或稱為第五區域)C5和第六矩形區域(或稱為第六區域)C6,其中第三矩形區域C3、第四矩形區域C4、第五矩形區域C5和第六矩形區域C6介於第一矩形區域C1與第二矩形區域C2之間。一般而言,第三子畫素區域100C中前述各區域C1~C6可分別具有次發光區,例如:第一區域C1具有第一次發光區,且第一次發光區的面積實質上等於或小於第一區域C1,而其餘各區域C2~C6中的次發光區(例如:第二次發光區~第六次發光區)可依此類推。因此,本實施例的第三發光區至少包含第一至第六次發光區。In this embodiment, a first sub-pixel region 100A provided with a first sub-pixel structure U1, a second sub-pixel region 100B provided with a second sub-pixel structure U2, and a third sub-pixel structure U3 The shape of the third sub-pixel region 100C (for example, the shape of the vertical projection area) may be a rectangle or a rectangle-like shape as an example, but it is not limited thereto. In other embodiments, the first sub-pixel area 100A of the first sub-pixel structure U1, the second sub-pixel area 100B of the second sub-pixel structure U2, and the third sub-pixel structure U3 are provided. The shape of the third sub-pixel region 100C is a polygon, an arc, a shape having a curvature or a bend, or another suitable shape. For example, the third sub-pixel region 100C provided with the third sub-pixel structure U3 may have a first rectangular region (or referred to as a first region) C1 and a second rectangular region (or referred to as a first region) extending in the direction D1. Second region) C2, and a third rectangular region (or third region) C3, a fourth rectangular region (or fourth region) C4, and a fifth rectangular region extending in a direction D2 perpendicular to the direction D1 (Or fifth region) C5 and sixth rectangular region (or sixth region) C6, where the third rectangular region C3, the fourth rectangular region C4, the fifth rectangular region C5, and the sixth rectangular region C6 are between Between the first rectangular region C1 and the second rectangular region C2. Generally speaking, each of the foregoing regions C1 to C6 in the third sub-pixel region 100C may have a sub-light-emitting region, for example, the first region C1 has a first-light-emitting region, and the area of the first-light-emitting region is substantially equal to or It is smaller than the first region C1, and the sub-light-emitting regions (for example, the second-light-emitting region to the sixth-light-emitting region) in the remaining regions C2 to C6 can be deduced by analogy. Therefore, the third light-emitting region in this embodiment includes at least the first to sixth light-emitting regions.

在本實施例中,第一矩形區域C1、第二矩形區域C2、第三矩形區域C3和第四矩形區域C4共同環繞第一子畫素區域100A;以及第一矩形區域C1、第二矩形區域C2、第五矩形區域C5和第六矩形區域C6共同環繞第二子畫素區域100B。如前文所述,在本實施例中,由於第三子畫素區域100C封閉環繞第一子畫素區域100A與第二子畫素區域100B,故第一矩形區域C1、第二矩形區域C2、第三矩形區域C3和第四矩形區域C4共同地封閉環繞第一子畫素區域100A;且第一矩形區域C1、第二矩形區域C2、第五矩形區域C5和第六矩形區域C6共同地封閉環繞第二子畫素區域100B。舉例而言,第三矩形區域C3、第四矩形區域C4、第五矩形區域C5和第六矩形區域C6分別連接第一矩形區域C1與第二矩形區域C2。換句話說,第三區域C3的第三次發光區連接第一區域C1的第一次發光區與第二區域C2的第二次發光區,第四區域C4的第四次發光區連接第一區域C1的第一次發光區與第二區域C2的第二次發光區,以形成環繞第一子畫素區域100A的容納區來容納第一子畫素區域100A的第一發光區。第五區域C5的第五次發光區連接第一區域C1的第一次發光區與第二區域C2的第二次發光區,第六區域C6的第六次發光區連接第一區域C1的第一次發光區與第二區域C2的第二次發光區,以形成環繞第二子畫素區域100B的容納區來容納第二子畫素區域100B的第二發光區。另外,第四區域C4的第四次發光區鄰接於第五區域C5的第五次發光區,但不限於此。在其他實施例中,第三矩形區域C3、第四矩形區域C4、第五矩形區域C5和第六矩形區域C6也可以分別不連接第一矩形區域C1與第二矩形區域C2,即第三子畫素區域100C具有非連續的輪廓。換句話說,在第三子畫素區域100C中,第三矩形區域C3的第三次發光區、第四矩形區域C4的第四次發光區、第五矩形區域C5的第五次發光區和第六矩形區域C6的第六次發光區也可以分別不連接第一矩形區域C1的第一次發光區與第二矩形區域C2的第二次發光區。In this embodiment, the first rectangular region C1, the second rectangular region C2, the third rectangular region C3, and the fourth rectangular region C4 collectively surround the first sub-pixel region 100A; and the first rectangular region C1 and the second rectangular region C2, the fifth rectangular region C5 and the sixth rectangular region C6 collectively surround the second sub-pixel region 100B. As mentioned above, in this embodiment, since the third sub-pixel region 100C is enclosed and surrounds the first sub-pixel region 100A and the second sub-pixel region 100B, the first rectangular region C1, the second rectangular region C2, The third rectangular area C3 and the fourth rectangular area C4 are collectively closed and surround the first sub-pixel area 100A; and the first rectangular area C1, the second rectangular area C2, the fifth rectangular area C5, and the sixth rectangular area C6 are collectively closed. Surround the second sub-pixel area 100B. For example, the third rectangular region C3, the fourth rectangular region C4, the fifth rectangular region C5, and the sixth rectangular region C6 connect the first rectangular region C1 and the second rectangular region C2, respectively. In other words, the third light emitting region of the third region C3 connects the first light emitting region of the first region C1 and the second light emitting region of the second region C2, and the fourth light emitting region of the fourth region C4 connects the first The first light-emitting region of the region C1 and the second light-emitting region of the second region C2 form a receiving region surrounding the first sub-pixel region 100A to receive the first light-emitting region of the first sub-pixel region 100A. The fifth emission region of the fifth region C5 connects the first emission region of the first region C1 and the second emission region of the second region C2, and the sixth emission region of the sixth region C6 connects the first emission region of the first region C1. The first light-emitting area and the second light-emitting area of the second area C2 form a receiving area surrounding the second sub-pixel area 100B to receive the second light-emitting area of the second sub-pixel area 100B. In addition, the fourth light emitting region of the fourth region C4 is adjacent to the fifth light emitting region of the fifth region C5, but is not limited thereto. In other embodiments, the third rectangular region C3, the fourth rectangular region C4, the fifth rectangular region C5, and the sixth rectangular region C6 may not respectively connect the first rectangular region C1 and the second rectangular region C2, that is, the third sub-region. The pixel area 100C has a discontinuous outline. In other words, in the third sub-pixel area 100C, the third light-emitting area of the third rectangular area C3, the fourth light-emitting area of the fourth rectangular area C4, the fifth light-emitting area of the fifth rectangular area C5, and The sixth light emitting area of the sixth rectangular area C6 may not be connected to the first light emitting area of the first rectangular area C1 and the second light emitting area of the second rectangular area C2, respectively.

值得一提的是,與第三矩形區域C3、第四矩形區域C4、第五矩形區域C5和第六矩形區域C6可分別不連接第一矩形區域C1與第二矩形區域C2的實施例相比,第三矩形區域C3、第四矩形區域C4、第五矩形區域C5和第六矩形區域C6分別連接第一矩形區域C1與第二矩形區域C2的實施例可具有最大發光區域。It is worth mentioning that compared with the embodiments in which the third rectangular area C3, the fourth rectangular area C4, the fifth rectangular area C5, and the sixth rectangular area C6 may not respectively connect the first rectangular area C1 and the second rectangular area C2, The embodiment in which the third rectangular area C3, the fourth rectangular area C4, the fifth rectangular area C5, and the sixth rectangular area C6 respectively connect the first rectangular area C1 and the second rectangular area C2 may have a maximum light emitting area.

另一方面,在本實施例中,第一子畫素區域100A和第二子畫素區域100B的寬度d與第三子畫素區域100C中的第一矩形區域C1、第二矩形區域C2、第三矩形區域C3、第四矩形區域C4、第五矩形區域C5和第六矩形區域C6的寬度b滿足以下特定關係式:b<0.25d。值得一提的是,畫素結構10透過設置有第一子畫素結構U1的第一子畫素區域100A與設置有第二子畫素結構U2的第二子畫素區域100B沿方向D1排列,設置有第三子畫素結構U3的第三子畫素區域100C環繞第一子畫素區域100A與第二子畫素區域100B,且b<0.25d,使得與包括各自尺寸為3d×d(或稱為條狀)之RGB子畫素結構以依序且緊鄰地方式排列(即依序的子畫素結構之間,不存在可容納其它子畫素結構的空間)的習知畫素結構的顯示面板相比,包括畫素結構10的顯示面板可在實質上相同的畫素密度下具有提高的開口率,以及可在實質上相同的開口率下具有提高的畫素密度。也就是說,與包括各自尺寸為3d×d(或稱為條狀)之RGB子畫素結構以依序且緊鄰地方式排列的習知畫素結構的顯示面板相比,包括畫素結構10的顯示面板可具有提升的解析度。On the other hand, in this embodiment, the width d of the first and second sub-pixel regions 100A and 100B and the first and second rectangular regions C1, C2, and C2 of the third and second sub-pixel regions 100C. The width b of the third rectangular area C3, the fourth rectangular area C4, the fifth rectangular area C5, and the sixth rectangular area C6 satisfies the following specific relationship: b <0.25d. It is worth mentioning that the pixel structure 10 is arranged along the direction D1 through the first sub-pixel area 100A provided with the first sub-pixel structure U1 and the second sub-pixel area 100B provided with the second sub-pixel structure U2. , A third sub-pixel region 100C provided with a third sub-pixel structure U3 surrounds the first sub-pixel region 100A and the second sub-pixel region 100B, and b <0.25d, so that the respective sizes are 3d × d The RGB sub-pixel structure (or strip) is arranged in a sequential and close manner (that is, there is no space that can accommodate other sub-pixel structures between the sequential sub-pixel structures) The display panel including the pixel structure 10 may have an increased aperture ratio at substantially the same pixel density, and may have an increased pixel density at substantially the same aperture ratio compared to a display panel having a structure. That is, compared with a display panel including a conventional pixel structure in which the RGB sub-pixel structures each having a size of 3d × d (or a stripe) are arranged in order and in close proximity, the pixel panel includes a pixel structure 10 The display panel may have improved resolution.

另外,在本實施例中,在第一子畫素結構U1、第二子畫素結構U2及第三子畫素結構U3中,第一電極層120與第二電極層150之間至少設置有一發光層130、第二發光層132及第三發光層134,但不限於此。在其他實施例中,在第一子畫素結構U1、第二子畫素結構U2及第三子畫素結構U3中,第一電極層120與第二電極層150之間可更設置有以下膜層中的至少一者:電洞注入層(hole injection layer,HIL)、電洞傳輸層(hole transport layer,HTL)、電子注入層(electron injection layer,EIL)、電子傳輸層(electron transport layer,ETL)、或其它合適的膜層。In addition, in this embodiment, at least one of the first sub-pixel structure U1, the second sub-pixel structure U2, and the third sub-pixel structure U3 is provided between the first electrode layer 120 and the second electrode layer 150. The light emitting layer 130, the second light emitting layer 132, and the third light emitting layer 134 are not limited thereto. In other embodiments, in the first sub-pixel structure U1, the second sub-pixel structure U2, and the third sub-pixel structure U3, the following may be further provided between the first electrode layer 120 and the second electrode layer 150: At least one of the film layers: a hole injection layer (HIL), a hole transport layer (HTL), an electron injection layer (EIL), an electron transport layer , ETL), or other suitable coatings.

另外,在圖1、2的實施例中,第三發光層134不需使用罩幕,例如:FMM加以形成,但不限於此。在其他實施例中,第三發光層134也可搭配使用罩幕,例如:FMM來形成。以下,將參照圖3、4針對其他的實施型態進行說明。在此必須說明的是,下述實施例沿用了前述實施例的元件符號與部分內容,其中採用相同或相似的符號來表示相同或相似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參照前述實施例,下述實施例不再重複贅述。In addition, in the embodiment of FIGS. 1 and 2, the third light-emitting layer 134 does not need to use a mask, such as FMM, but is not limited thereto. In other embodiments, the third light-emitting layer 134 can also be formed by using a mask, such as FMM. Hereinafter, other embodiments will be described with reference to FIGS. 3 and 4. It must be noted here that the following embodiments use the component symbols and part of the content of the foregoing embodiments, in which the same or similar symbols are used to represent the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.

圖3是依照本發明的第二實施例的畫素結構的上視示意圖。圖4是沿著圖3中的剖線B-B’的剖面示意圖。請同時參照圖3、4及圖1、2,本實施例的畫素結構20與第一實施例的畫素結構10相似,差異主要在於發光層的佈置方式,因此以下將針對兩者之間的差異處進行說明,且其餘可參閱前述,並不再贅述。另外,為了方便說明起見,圖3中省略繪示第二電極層150。3 is a schematic top view of a pixel structure according to a second embodiment of the present invention. Fig. 4 is a schematic cross-sectional view taken along the line B-B 'in Fig. 3. Please refer to FIGS. 3 and 4 and FIGS. 1 and 2 at the same time. The pixel structure 20 of this embodiment is similar to the pixel structure 10 of the first embodiment. The difference is mainly in the arrangement of the light-emitting layers. The differences are described, and the rest can be referred to above, and will not be described again. In addition, for convenience of explanation, the second electrode layer 150 is not shown in FIG. 3.

請同時參照圖3、4,在本實施例中,配置在第一電極層120與第二電極層150之間的第三發光層234可僅位於第三子畫素區域100C中。也就是說,在本實施例中,第一發光層130、第二發光層132及第三發光層234彼此之間不相重疊。Please refer to FIGS. 3 and 4 at the same time. In this embodiment, the third light emitting layer 234 disposed between the first electrode layer 120 and the second electrode layer 150 may be located only in the third sub-pixel region 100C. That is, in this embodiment, the first light emitting layer 130, the second light emitting layer 132, and the third light emitting layer 234 do not overlap each other.

在本實施例中,第三發光層234例如是使用蒸鍍製程或噴墨製程並搭配對應的罩幕,例如:精細金屬罩幕(fine metal mask,FMM)來形成。詳細而言,在本實施例中,製備第三發光層234的方法例如包括:使用蒸鍍製程或噴墨製程並搭配具有沿方向D1延伸的多個開口的罩幕,例如:FMM來形成位於第一矩形區域C1和第二矩形區域C2中的第三發光層234,以及使用蒸鍍製程或噴墨製程並搭配具有沿方向D2延伸的多個開口的罩幕,例如:FMM來形成位於第三矩形區域C3、第四矩形區域C4、第五矩形區域C5和第六矩形區域C6中的第三發光層234。也就是說,在本實施例中,製備第三發光層234至少需要兩道罩幕,例如:FMM。另外,在本實施例中,第三發光層234可為藍色發光層。也就是說,在本實施例中,第三發光層234可包括藍色發光材料。In this embodiment, the third light-emitting layer 234 is formed using, for example, an evaporation process or an inkjet process and a corresponding mask, such as a fine metal mask (FMM). In detail, in this embodiment, the method for preparing the third light-emitting layer 234 includes, for example, using a vapor deposition process or an inkjet process and a mask with a plurality of openings extending in the direction D1, for example, FMM to form a substrate. The third light-emitting layer 234 in the first rectangular area C1 and the second rectangular area C2, and a mask using a vapor deposition process or an inkjet process with a plurality of openings extending in the direction D2, for example, FMM to form The third light emitting layer 234 in the three rectangular regions C3, the fourth rectangular region C4, the fifth rectangular region C5, and the sixth rectangular region C6. That is, in this embodiment, at least two masks are required to prepare the third light-emitting layer 234, for example, FMM. In addition, in this embodiment, the third light emitting layer 234 may be a blue light emitting layer. That is, in this embodiment, the third light emitting layer 234 may include a blue light emitting material.

在本實施例中,位於第一子畫素區域100A中的元件層100、第一電極層120的電極圖案120A、第一發光層130、及第二電極層150構成第一子畫素結構2U1;位於第二子畫素區域100B中的元件層100、第一電極層120的電極圖案120B、第二發光層132、及第二電極層150構成第二子畫素結構2U2;以及位於第三子畫素區域100C中的元件層100、第一電極層120的電極圖案120C、第三發光層234及第二電極層150構成第三子畫素結構2U3。也就是說,畫素結構20包括配置於基板100上的第一子畫素結構2U1、第二子畫素結構2U2及第三子畫素結構2U3,其中第一子畫素結構2U1位於第一子畫素區域100A中,第二子畫素結構2U2位於第二子畫素區域100B中,且第三子畫素結構2U3位於第三子畫素區域100C中。In this embodiment, the element layer 100 located in the first sub-pixel region 100A, the electrode pattern 120A of the first electrode layer 120, the first light-emitting layer 130, and the second electrode layer 150 constitute a first sub-pixel structure 2U1. ; The element layer 100 located in the second sub-pixel region 100B, the electrode pattern 120B of the first electrode layer 120, the second light-emitting layer 132, and the second electrode layer 150 constitute a second sub-pixel structure 2U2; and The element layer 100 in the sub-pixel region 100C, the electrode pattern 120C of the first electrode layer 120, the third light-emitting layer 234, and the second electrode layer 150 constitute a third sub-pixel structure 2U3. That is, the pixel structure 20 includes a first sub-pixel structure 2U1, a second sub-pixel structure 2U2, and a third sub-pixel structure 2U3 arranged on the substrate 100, where the first sub-pixel structure 2U1 is located at the first In the sub-pixel area 100A, the second sub-pixel structure 2U2 is located in the second sub-pixel area 100B, and the third sub-pixel structure 2U3 is located in the third sub-pixel area 100C.

如前文所述,在本實施例中,第一發光層130可為紅色發光層、第二發光層132可為綠色發光層及第三發光層234可為藍色發光層,藉此第一子畫素結構2U1可用於發出紅光、第二子畫素結構2U2可用於發出綠光及第三子畫素結構2U3可用於發出藍光,即前述子畫素結構2U1~2U3可分別發光不同顏色的光。As described above, in this embodiment, the first light-emitting layer 130 may be a red light-emitting layer, the second light-emitting layer 132 may be a green light-emitting layer, and the third light-emitting layer 234 may be a blue light-emitting layer. The pixel structure 2U1 can be used to emit red light, the second sub-pixel structure 2U2 can be used to emit green light, and the third sub-pixel structure 2U3 can be used to emit blue light, that is, the aforementioned sub-pixel structures 2U1 to 2U3 can respectively emit different colors. Light.

如前文所述,在本實施例中,第一子畫素區域100A與第二子畫素區域100B沿方向D1排列,且第三子畫素區域100C環繞第一子畫素區域100A與第二子畫素區域100B,因此第一子畫素結構2U1與第二子畫素結構2U2會沿方向D1排列,且第三子畫素結構2U3會環繞第一子畫素結構2U1與第二子畫素結構2U2周圍。如此一來,包括畫素結構20的顯示面板的顯示品質可被提升。As described above, in this embodiment, the first sub-pixel area 100A and the second sub-pixel area 100B are arranged along the direction D1, and the third sub-pixel area 100C surrounds the first sub-pixel area 100A and the second Sub-pixel area 100B, so the first sub-pixel structure 2U1 and the second sub-pixel structure 2U2 will be aligned in the direction D1, and the third sub-pixel structure 2U3 will surround the first sub-pixel structure 2U1 and the second sub-picture Prime structure around 2U2. In this way, the display quality of the display panel including the pixel structure 20 can be improved.

畫素結構20透過設置有第一子畫素結構2U1的第一子畫素區域100A與設置有第二子畫素結構2U2的第二子畫素區域100B沿方向D1排列,設置有第三子畫素結構2U3的第三子畫素區域100C環繞第一子畫素區域100A與第二子畫素區域100B,且b<0.25d,使得與包括各自尺寸為3d×d(或稱為條狀)之RGB子畫素結構以依序且緊鄰地方式排列(即依序的子畫素結構之間,不存在可容納其它子畫素結構的空間)的習知畫素結構的顯示面板相比,包括畫素結構20的顯示面板可在實質上相同的畫素密度下具有提高的開口率,以及可在實質上相同的開口率下具有提高的畫素密度。也就是說,與包括各自尺寸為3d×d(或稱為條狀)之RGB子畫素結構以依序且緊鄰地方式排列的習知畫素結構的顯示面板相比,包括畫素結構20的顯示面板可具有提升的解析度。The pixel structure 20 is arranged in the direction D1 through a first sub-pixel area 100A provided with a first sub-pixel structure 2U1 and a second sub-pixel area 100B provided with a second sub-pixel structure 2U2, and a third sub-pixel is provided. The third sub-pixel area 100C of the pixel structure 2U3 surrounds the first sub-pixel area 100A and the second sub-pixel area 100B, and b <0.25d, so that the size of the sub-pixel area is 3d × d (or a stripe). ) The RGB sub-pixel structure is arranged in a sequential and close manner (that is, there is no space to accommodate other sub-pixel structures between the ordered sub-pixel structures) The display panel including the pixel structure 20 may have an increased aperture ratio at substantially the same pixel density, and may have an increased pixel density at substantially the same aperture ratio. That is, compared with a display panel including a conventional pixel structure in which the RGB sub-pixel structures each having a size of 3d × d (or a stripe) are arranged in a sequential and close manner, the pixel panel includes a pixel structure 20 The display panel may have improved resolution.

另外,在圖1、2的實施例中,雖然第三矩形區域C3和C4第四矩形區域分別位於第一子畫素區域100A的相對兩側,且第五矩形區域C5和第六矩形區域C6分別位於第二子畫素區域100B的相對兩側,但本發明並不限於此。以下,將參照圖5、6針對其他的實施型態進行說明。在此必須說明的是,下述實施例沿用了前述實施例的元件符號與部分內容,其中採用相同或相似的符號來表示相同或相似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參照前述實施例,下述實施方式不再重複贅述。In addition, in the embodiments of FIGS. 1 and 2, although the third rectangular regions C3 and C4 are located on opposite sides of the first sub-pixel region 100A, and the fifth rectangular region C5 and the sixth rectangular region C6 are located, respectively. They are respectively located on opposite sides of the second sub-pixel region 100B, but the present invention is not limited thereto. Hereinafter, other embodiments will be described with reference to FIGS. 5 and 6. It must be noted here that the following embodiments use the component symbols and part of the content of the foregoing embodiments, in which the same or similar symbols are used to represent the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following implementation manners are not repeated.

圖5是依照本發明的第三實施例的畫素結構的上視示意圖。圖6是沿著圖5中的剖線C-C’的剖面示意圖。請同時參照圖5、6及圖1、2,本實施例的畫素結構30與第一實施例的畫素結構10相似,差異主要在於子畫素區域的佈置方式,因此以下將針對兩者之間的差異處進行說明,且其餘可參閱前述,並不再贅述。另外,為了方便說明起見,圖5中省略繪示第三發光層134以及第二電極層150。5 is a schematic top view of a pixel structure according to a third embodiment of the present invention. Fig. 6 is a schematic cross-sectional view taken along the line C-C 'in Fig. 5. Please refer to FIGS. 5 and 6 and FIGS. 1 and 2 at the same time. The pixel structure 30 of this embodiment is similar to the pixel structure 10 of the first embodiment. The difference lies mainly in the arrangement of the sub-pixel regions. The differences are explained, and the rest can be referred to above and will not be described again. In addition, for convenience of explanation, the third light-emitting layer 134 and the second electrode layer 150 are not shown in FIG. 5.

請同時參照圖5、6,在本實施例中,設置有第三子畫素結構U3的第三子畫素區域100C具有沿方向D1延伸的第一矩形區域(或稱為第一區域)C1和第二矩形區域(或稱為第二區域)C2,以及沿方向D2延伸的第三矩形區域(或稱為第三區域)3C3、第四矩形區域(或稱為第四區域)3C4、第五矩形區域(或稱為第五區域)3C5和第六矩形區域(或稱為第六區域)3C6,其中第三矩形區域3C3、第四矩形區域3C4、第五矩形區域3C5和第六矩形區域3C6介於第一矩形區域C1與第二矩形區域C2之間。Please refer to FIGS. 5 and 6 at the same time. In this embodiment, the third sub-pixel region 100C provided with the third sub-pixel structure U3 has a first rectangular region (or first region) C1 extending in the direction D1. And a second rectangular area (or second area) C2, and a third rectangular area (or third area) 3C3, a fourth rectangular area (or fourth area) 3C4, Five rectangular regions (or fifth regions) 3C5 and sixth rectangular regions (or sixth regions) 3C6, where the third rectangular region 3C3, the fourth rectangular region 3C4, the fifth rectangular region 3C5, and the sixth rectangular region 3C6 is between the first rectangular region C1 and the second rectangular region C2.

詳細而言,在本實施例中,第三矩形區域3C3和第四矩形區域3C4位於第一子畫素區域100A的一側(例如:畫素結構30的第一側),而第五矩形區域3C5和第六矩形區域3C6位於第一子畫素區域100A的另一側(例如:畫素結構30的第二側),此也可視為第五矩形區域3C5和第六矩形區域3C6位於第二子畫素區域100B之遠離第一子畫素區域100A的一側(例如:畫素結構30的第二側),即第二子畫素區域100B位於第一子畫素區域100A與第五矩形區域3C5和第六矩形區域3C6之間。也就是說,第一子畫素區域100A與第二子畫素區域100B彼此相緊鄰,即第一子畫素區域100A與第二子畫素區域100B之間不存在容納其它子畫素區域的空間(例如:不存在第三子畫素區域100C一部份),而第三矩形區域3C3和第四矩形區域3C4彼此相緊鄰位於第一子畫素區域100A一側(例如:畫素結構30的第一側),且第五矩形區域3C5和第六矩形區域3C6彼此相緊鄰位於第一子畫素區域100A的另一側(例如:畫素結構30的第二側)。In detail, in this embodiment, the third rectangular region 3C3 and the fourth rectangular region 3C4 are located on one side of the first sub-pixel region 100A (eg, the first side of the pixel structure 30), and the fifth rectangular region is 3C5 and the sixth rectangular region 3C6 are located on the other side of the first sub-pixel region 100A (eg, the second side of the pixel structure 30). This can also be regarded as the fifth rectangular region 3C5 and the sixth rectangular region 3C6 on the second The side of the sub-pixel region 100B far from the first sub-pixel region 100A (eg, the second side of the pixel structure 30), that is, the second sub-pixel region 100B is located in the first sub-pixel region 100A and the fifth rectangle. Between the region 3C5 and the sixth rectangular region 3C6. That is, the first sub-pixel area 100A and the second sub-pixel area 100B are close to each other, that is, there is no accommodating other sub-pixel areas between the first sub-pixel area 100A and the second sub-pixel area 100B. Space (for example: there is no part of the third sub-pixel area 100C), and the third rectangular area 3C3 and the fourth rectangular area 3C4 are located next to each other on the side of the first sub-pixel area 100A (eg, the pixel structure 30 (The first side of the pixel structure), and the fifth rectangular region 3C5 and the sixth rectangular region 3C6 are located next to each other on the other side of the first sub-pixel region 100A (eg, the second side of the pixel structure 30).

進一步而言,在本實施例中,第一矩形區域C1、第二矩形區域C2、第三矩形區域3C3、第四矩形區域3C4、第五矩形區域3C5和第六矩形區域3C6共同環繞第一子畫素區域100A及第二子畫素區100B。如前文所述,在本實施例中,由於第三子畫素區域100C封閉環繞第一子畫素區域100A與第二子畫素區域100B,故第一矩形區域C1、第二矩形區域C2、第三矩形區域3C3、第四矩形區域3C4、第五矩形區域3C5和第六矩形區域3C6共同地封閉環繞第一子畫素區域100A及第二子畫素區域100B。也就是說,在本實施例中,第三矩形區域3C3、第四矩形區域3C4、第五矩形區域3C5和第六矩形區域3C6分別連接第一矩形區域C1與第二矩形區域C2。然而,本發明並不限於此。在其他實施例中,第三矩形區域3C3、第四矩形區域3C4、第五矩形區域3C5和第六矩形區域3C6也可以分別不連接第一矩形區域C1與第二矩形區域C2。也就是說,第三子畫素區域100C具有非連續的輪廓。在本實施例中,與第三矩形區域3C3、第四矩形區域3C4、第五矩形區域3C5和第六矩形區域3C6可分別不連接第一矩形區域C1與第二矩形區域C2的實施例相比,第三矩形區域3C3、第四矩形區域3C4、第五矩形區域3C5和第六矩形區域3C6分別連接第一矩形區域C1與第二矩形區域C2的實施例可具有最大發光區域。Further, in this embodiment, the first rectangular region C1, the second rectangular region C2, the third rectangular region 3C3, the fourth rectangular region 3C4, the fifth rectangular region 3C5, and the sixth rectangular region 3C6 collectively surround the first sub-region. The pixel area 100A and the second sub-pixel area 100B. As mentioned above, in this embodiment, since the third sub-pixel region 100C is enclosed and surrounds the first sub-pixel region 100A and the second sub-pixel region 100B, the first rectangular region C1, the second rectangular region C2, The third rectangular region 3C3, the fourth rectangular region 3C4, the fifth rectangular region 3C5, and the sixth rectangular region 3C6 collectively enclose the first sub-pixel region 100A and the second sub-pixel region 100B. That is, in this embodiment, the third rectangular region 3C3, the fourth rectangular region 3C4, the fifth rectangular region 3C5, and the sixth rectangular region 3C6 connect the first rectangular region C1 and the second rectangular region C2, respectively. However, the present invention is not limited to this. In other embodiments, the third rectangular region 3C3, the fourth rectangular region 3C4, the fifth rectangular region 3C5, and the sixth rectangular region 3C6 may not connect the first rectangular region C1 and the second rectangular region C2, respectively. That is, the third sub-pixel region 100C has a discontinuous outline. In this embodiment, compared with the third rectangular area 3C3, the fourth rectangular area 3C4, the fifth rectangular area 3C5, and the sixth rectangular area 3C6, the first rectangular area C1 and the second rectangular area C2 may not be connected respectively. The embodiment in which the third rectangular region 3C3, the fourth rectangular region 3C4, the fifth rectangular region 3C5, and the sixth rectangular region 3C6 respectively connect the first rectangular region C1 and the second rectangular region C2 may have a maximum light emitting region.

另一方面,在本實施例中,第一子畫素區域100A和第二子畫素區域100B的寬度d與第三子畫素區域100C中的第一矩形區域C1、第二矩形區域C2、第三矩形區域3C3、第四矩形區域3C4、第五矩形區域3C5和第六矩形區域3C6的寬度b滿足以下特定關係式:b<0.25d。值得一提的是,畫素結構30透過設置有第一子畫素結構U1的第一子畫素區域100A與設置有第二子畫素結構U2的第二子畫素區域100B沿方向D1排列,設置有第三子畫素結構U3的第三子畫素區域100C環繞第一子畫素區域100A與第二子畫素區域100B,且b<0.25d,使得與包括各自尺寸為3d×d(或稱為條狀)之RGB子畫素結構以依序且緊鄰地方式排列(即依序的子畫素結構之間,不存在可容納其它子畫素結構的空間)的習知畫素結構的顯示面板相比,包括畫素結構30的顯示面板可在實質上相同的畫素密度下具有提高的開口率,以及可在實質上相同的開口率下具有提高的畫素密度。也就是說,與包括各自尺寸為3d×d(或稱為條狀)之RGB子畫素結構以依序且緊鄰地方式排列的習知畫素結構的顯示面板相比,包括畫素結構30的顯示面板可具有提升的解析度。On the other hand, in this embodiment, the width d of the first and second sub-pixel regions 100A and 100B and the first and second rectangular regions C1, C2, and C2 of the third and second sub-pixel regions 100C. The width b of the third rectangular region 3C3, the fourth rectangular region 3C4, the fifth rectangular region 3C5, and the sixth rectangular region 3C6 satisfies the following specific relationship: b <0.25d. It is worth mentioning that the pixel structure 30 is arranged in the direction D1 through the first sub-pixel area 100A provided with the first sub-pixel structure U1 and the second sub-pixel area 100B provided with the second sub-pixel structure U2. , A third sub-pixel region 100C provided with a third sub-pixel structure U3 surrounds the first sub-pixel region 100A and the second sub-pixel region 100B, and b <0.25d, so that the respective sizes are 3d × d The RGB sub-pixel structure (or strip) is arranged in a sequential and close manner (that is, there is no space that can accommodate other sub-pixel structures between the sequential sub-pixel structures) Compared with a structured display panel, a display panel including the pixel structure 30 may have an increased aperture ratio at substantially the same pixel density, and may have an increased pixel density at substantially the same aperture ratio. That is, compared with a display panel including a conventional pixel structure in which the RGB sub-pixel structures each having a size of 3d × d (or a stripe) are arranged in order and in close proximity, the pixel panel includes a pixel structure 30 The display panel may have improved resolution.

基於第一實施例可知,畫素結構30透過第一子畫素結構U1與第二子畫素結構U2會沿方向D1排列,且第三子畫素結構U3會環繞第一子畫素結構U1與第二子畫素結構U2,使得包括畫素結構30的顯示面板的顯示品質可被提升。Based on the first embodiment, it is known that the pixel structure 30 is arranged along the direction D1 through the first sub-pixel structure U1 and the second sub-pixel structure U2, and the third sub-pixel structure U3 surrounds the first sub-pixel structure U1. With the second sub-pixel structure U2, the display quality of the display panel including the pixel structure 30 can be improved.

另外,基於第一實施例可知,在圖5、6的實施方式中,雖然第三發光層134不需使用罩幕,例如:FMM加以形成,但本發明並不限於此。在其他實施例中,第三發光層134也可搭配使用罩幕,例如:FMM來形成。以下,將參照圖7、8針對其他的實施型態進行說明。在此必須說明的是,下述實施例沿用了前述實施例的元件符號與部分內容,其中採用相同或相似的符號來表示相同或相似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參照前述實施例,下述實施例不再重複贅述。In addition, based on the first embodiment, it can be known that, in the embodiment of FIGS. 5 and 6, although the third light-emitting layer 134 does not need to be formed with a mask, such as FMM, the present invention is not limited thereto. In other embodiments, the third light-emitting layer 134 can also be formed by using a mask, such as FMM. Hereinafter, other embodiments will be described with reference to FIGS. 7 and 8. It must be noted here that the following embodiments use the component symbols and part of the content of the foregoing embodiments, in which the same or similar symbols are used to represent the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.

圖7是依照本發明的第四實施例的畫素結構的上視示意圖。圖8是沿著圖7中的剖線D-D’的剖面示意圖。請同時參照圖7、8及圖5、6,本實施例的畫素結構40與第三實施例的畫素結構30相似,差異主要在於發光層的佈置方式,因此以下將針對兩者之間的差異處進行說明,且其餘可參閱前述,並不再贅述。另外,為了方便說明起見,圖7中省略繪示第二電極層150。FIG. 7 is a schematic top view of a pixel structure according to a fourth embodiment of the present invention. Fig. 8 is a schematic cross-sectional view taken along a section line D-D 'in Fig. 7. Please refer to FIGS. 7 and 8 and FIGS. 5 and 6 at the same time. The pixel structure 40 of this embodiment is similar to the pixel structure 30 of the third embodiment. The difference lies mainly in the arrangement of the light-emitting layers. The differences are described, and the rest can be referred to above, and will not be described again. In addition, for convenience of explanation, the second electrode layer 150 is not shown in FIG. 7.

請同時參照圖7、8,在本實施例中,配置在第一電極層120與第二電極層150之間的第三發光層434可僅位於第三子畫素區域100C中。也就是說,在本實施例中,第一發光層130、第二發光層132及第三發光層434彼此之間不相重疊。Please refer to FIGS. 7 and 8 at the same time. In this embodiment, the third light-emitting layer 434 disposed between the first electrode layer 120 and the second electrode layer 150 may be located only in the third sub-pixel region 100C. That is, in this embodiment, the first light emitting layer 130, the second light emitting layer 132, and the third light emitting layer 434 do not overlap each other.

在本實施例中,第三發光層434例如是使用蒸鍍製程或噴墨製程並搭配對應的罩幕,例如:精細金屬罩幕(fine metal mask,FMM)來形成。詳細而言,在本實施例中,製備第三發光層434的方法例如包括:使用蒸鍍製程或噴墨製程並搭配具有沿方向D1延伸的多個開口的罩幕,例如:FMM來形成位於第一矩形區域C1和第二矩形區域C2中的第三發光層434,以及使用蒸鍍製程或噴墨製程並搭配具有沿方向D2延伸的多個開口的罩幕,例如:FMM來形成位於第三矩形區域3C3、第四矩形區域3C4、第五矩形區域3C5和第六矩形區域3C6中的第三發光層434。也就是說,在本實施例中,製備第三發光層434至少需要兩道罩幕,例如:FMM。另外,在本實施例中,第三發光層434可為藍色發光層。也就是說,在本實施例中,第三發光層434包括藍色發光材料。In this embodiment, the third light-emitting layer 434 is formed using, for example, an evaporation process or an inkjet process and a corresponding mask, such as a fine metal mask (FMM). In detail, in this embodiment, the method for preparing the third light-emitting layer 434 includes, for example, using a vapor deposition process or an inkjet process and a mask having a plurality of openings extending in the direction D1, for example, FMM to form a substrate. The third light-emitting layer 434 in the first rectangular region C1 and the second rectangular region C2, and a mask using a vapor deposition process or an inkjet process with a plurality of openings extending in the direction D2, for example, FMM to form The third light emitting layer 434 in the three rectangular regions 3C3, the fourth rectangular region 3C4, the fifth rectangular region 3C5, and the sixth rectangular region 3C6. That is, in this embodiment, at least two masks are required to prepare the third light-emitting layer 434, for example, FMM. In addition, in this embodiment, the third light emitting layer 434 may be a blue light emitting layer. That is, in this embodiment, the third light emitting layer 434 includes a blue light emitting material.

進一步而言,在本實施例中,位於第一子畫素區域100A中的元件層100、第一電極層120的電極圖案120A、第一發光層130、及第二電極層150構成第一子畫素結構4U1;位於第二子畫素區域100B中的元件層100、第一電極層120的電極圖案120B、第二發光層132、及第二電極層150構成第二子畫素結構4U2;以及位於第三子畫素區域100C中的元件層100、第一電極層120的電極圖案120C、第三發光層234及第二電極層150構成第三子畫素結構4U3。也就是說,在本實施例中,畫素結構40包括配置於基板100上的第一子畫素結構4U1、第二子畫素結構4U2及第三子畫素結構4U3,其中第一子畫素結構4U1位於第一子畫素區域100A中,第二子畫素結構4U2位於第二子畫素區域100B中,且第三子畫素結構4U3位於第三子畫素區域100C中。Further, in this embodiment, the element layer 100 located in the first sub-pixel region 100A, the electrode pattern 120A of the first electrode layer 120, the first light-emitting layer 130, and the second electrode layer 150 constitute a first sub-pixel. The pixel structure 4U1; the element layer 100, the electrode pattern 120B of the first electrode layer 120, the second light emitting layer 132, and the second electrode layer 150 in the second sub-pixel region 100B constitute a second sub-pixel structure 4U2; The element layer 100, the electrode pattern 120C of the first electrode layer 120, the third light-emitting layer 234, and the second electrode layer 150 in the third sub-pixel region 100C constitute a third sub-pixel structure 4U3. That is, in this embodiment, the pixel structure 40 includes a first sub-pixel structure 4U1, a second sub-pixel structure 4U2, and a third sub-pixel structure 4U3 arranged on the substrate 100. The pixel structure 4U1 is located in the first sub-pixel area 100A, the second sub-pixel structure 4U2 is located in the second sub-pixel area 100B, and the third sub-pixel structure 4U3 is located in the third sub-pixel area 100C.

如前文所述,在本實施例中,第一發光層130可為紅色發光層、第二發光層132可為綠色發光層及第三發光層434可為藍色發光層,藉此第一子畫素結構4U1可用於發出紅光、第二子畫素結構4U2可用於發出綠光及第三子畫素結構4U3可用於發出藍光,即前述子畫素結構4U1~4U3可分別發光不同顏色的光。As described above, in this embodiment, the first light-emitting layer 130 may be a red light-emitting layer, the second light-emitting layer 132 may be a green light-emitting layer, and the third light-emitting layer 434 may be a blue light-emitting layer. The pixel structure 4U1 can be used to emit red light, the second sub-pixel structure 4U2 can be used to emit green light, and the third sub-pixel structure 4U3 can be used to emit blue light, that is, the aforementioned sub-pixel structures 4U1 to 4U3 can respectively emit different colors. Light.

如前文所述,在本實施例中,第一子畫素區域100A與第二子畫素區域100B沿方向D1排列,且第三子畫素區域100C環繞第一子畫素區域100A與第二子畫素區域100B,因此第一子畫素結構4U1與第二子畫素結構4U2會沿方向D1排列,且第三子畫素結構4U3會環繞第一子畫素結構4U1與第二子畫素結構4U2。如此一來,包括畫素結構40的顯示面板的顯示品質可被提升。As described above, in this embodiment, the first sub-pixel area 100A and the second sub-pixel area 100B are arranged along the direction D1, and the third sub-pixel area 100C surrounds the first sub-pixel area 100A and the second Sub-pixel area 100B, so the first sub-pixel structure 4U1 and the second sub-pixel structure 4U2 will be aligned in the direction D1, and the third sub-pixel structure 4U3 will surround the first sub-pixel structure 4U1 and the second sub-picture素 结构 4U2. In this way, the display quality of the display panel including the pixel structure 40 can be improved.

另一方面,如前文所述,畫素結構40透過設置有第一子畫素結構4U1的第一子畫素區域100A與設置有第二子畫素結構4U2的第二子畫素區域100B沿方向D1排列,設置有第三子畫素結構4U3的第三子畫素區域100C環繞第一子畫素區域100A與第二子畫素區域100B,且b<0.25d,使得與包括各自尺寸為3d×d(或稱為條狀)之RGB子畫素結構以依序且緊鄰地方式排列(即依序的子畫素結構之間,不存在可容納其它子畫素結構的空間)的習知畫素結構的顯示面板相比,包括畫素結構40的顯示面板可在實質上相同的畫素密度下具有提高的開口率,以及可在實質上相同的開口率下具有提高的畫素密度。也就是說,與包括各自尺寸為3d×d(或稱為條狀)之RGB子畫素結構以依序且緊鄰地方式排列的習知畫素結構的顯示面板相比,包括畫素結構40的顯示面板可具有提升的解析度。On the other hand, as described above, the pixel structure 40 passes along the first sub-pixel area 100A provided with the first sub-pixel structure 4U1 and the second sub-pixel area 100B provided with the second sub-pixel structure 4U2. Arranged in the direction D1, a third sub-pixel region 100C provided with a third sub-pixel structure 4U3 surrounds the first sub-pixel region 100A and the second sub-pixel region 100B, and b <0.25d, so that The 3D × d (or stripe) RGB sub-pixel structure is arranged in a sequential and close manner (that is, there is no space to accommodate other sub-pixel structures between sequential sub-pixel structures) Compared with a display panel with a known pixel structure, a display panel including the pixel structure 40 may have an increased aperture ratio at substantially the same pixel density, and may have an increased pixel density at substantially the same aperture ratio. . That is, compared with a display panel including a conventional pixel structure in which the RGB sub-pixel structures each having a size of 3d × d (or a stripe) are arranged in order and in close proximity, the pixel panel includes a pixel structure 40 The display panel may have improved resolution.

再者,前述實施例中,較佳地,第一子畫素區域100A中的第一電極圖案120A、第二子畫素區100B中的第二電極圖案120B與第三子畫素區100B中的第三電極圖案120C所分別連接之對應的薄膜電晶體是不同的,但不限於此。於其它實施例中,任二相鄰的第一子畫素區域100A中的第一電極圖案120A、第二子畫素區100B中的第二電極圖案120B與第三子畫素區100B中的第三電極圖案120C可連接於相同的薄膜電晶體。另外,薄膜電晶體的類型可為底閘型、頂閘型、或其它合適的類型。元件層110至少所包含的薄膜電晶體、電容器或其它合適的元件可分別位於對應的第一子畫素區域100A、第二子畫素區100B與第三子畫素區100C,但不限於此。於其它實施例中,元件層110所包含的薄膜電晶體、電容器或其它合適的元件也可僅位於三個子畫素區域100A~100C中的其中一者,或者也可位於三個子畫素區域100A~100C中的其中二者。此外,在前述各實施例中,各個子畫素結構(即第一子畫素結構U1、2U1、4U1、第二子畫素結構U2、2U2、4U2、或第三子畫素結構U3、2U3、4U3)、各個子畫素區域(即第一子畫素區域100A、第二子畫素區域100B或第三子畫素區域100C)、前述各子畫素區域的發光區、各個區域C1~C6與各區域C1~C6的次發光區其中至少一者的形狀(例如:垂直投影面積的形狀)係以矩形或類矩形為範例,但不限於此。於其它實施例中,前述各實施例的各個子畫素結構、各個子畫素區域、前述各子畫素區域的發光區、各個區域C1~C6與各區域C1~C6的次發光區其中至少一者的形狀(例如:垂直投影面積的形狀)也可為多邊形、弧形、具有曲率或彎折的形狀、或其它合適的形狀。Furthermore, in the foregoing embodiment, preferably, the first electrode pattern 120A in the first sub-pixel region 100A, the second electrode pattern 120B in the second sub-pixel region 100B, and the third sub-pixel region 100B The corresponding thin-film transistors to which the third electrode pattern 120C is connected are different, but are not limited thereto. In other embodiments, the first electrode pattern 120A in any two adjacent first sub-pixel regions 100A, the second electrode pattern 120B in the second sub-pixel region 100B, and the third electrode sub-pixel region 100B The third electrode pattern 120C may be connected to the same thin film transistor. In addition, the type of the thin film transistor can be a bottom gate type, a top gate type, or other suitable types. The thin film transistor, capacitor, or other suitable components included in the element layer 110 may be located in the corresponding first sub-pixel area 100A, the second sub-pixel area 100B, and the third sub-pixel area 100C, respectively, but it is not limited thereto . In other embodiments, the thin film transistor, capacitor, or other suitable components included in the element layer 110 may be located in only one of the three sub-pixel regions 100A to 100C, or may be located in the three sub-pixel regions 100A. Two of ~ 100C. In addition, in the foregoing embodiments, each sub-pixel structure (that is, the first sub-pixel structure U1, 2U1, 4U1, the second sub-pixel structure U2, 2U2, 4U2, or the third sub-pixel structure U3, 2U3 , 4U3), each sub-pixel area (ie, the first sub-pixel area 100A, the second sub-pixel area 100B, or the third sub-pixel area 100C), the light-emitting area of each of the aforementioned sub-pixel areas, and each area C1 ~ The shape (for example, the shape of the vertical projection area) of at least one of C6 and the sub-light-emitting areas of each of the areas C1 to C6 is exemplified by a rectangle or a rectangle-like shape, but is not limited thereto. In other embodiments, at least each of the sub-pixel structure, each sub-pixel region, the aforementioned light-emitting region of each of the sub-pixel regions, each of the regions C1 to C6, and the sub-light-emitting regions of each of the regions C1 to C6 is at least The shape of one (for example, the shape of the vertical projection area) may also be a polygon, an arc, a shape having a curvature or a bend, or other suitable shapes.

綜上所述,在本發明的畫素結構中,第一子畫素結構與第二子畫素結構沿一方向排列,且第三子畫素結構環繞第一子畫素結構與第二子畫素結構,藉此包括本發明的畫素結構的顯示面板的顯示品質可被提升。另外,在本發明的畫素結構中,設置有第一子畫素結構的第一子畫素區域與設置有第二子畫素結構的第二子畫素區域沿一方向排列,設置有第三子畫素結構的第三子畫素區域環繞第一子畫素區域與第二子畫素區域,且第一子畫素區域和第二子畫素區域的寬度d與第三子畫素區域中的第一矩形區域、第二矩形區域、第三矩形區域、第四矩形區域、第五矩形區域和第六矩形區域的寬度b滿足以下特定關係式:b<0.25d,藉此包括本發明的畫素結構的顯示面板可具有提升的解析度。In summary, in the pixel structure of the present invention, the first sub-pixel structure and the second sub-pixel structure are arranged in a direction, and the third sub-pixel structure surrounds the first sub-pixel structure and the second sub-pixel structure. The pixel structure, thereby improving the display quality of the display panel including the pixel structure of the present invention. In addition, in the pixel structure of the present invention, a first sub-pixel area provided with a first sub-pixel structure and a second sub-pixel area provided with a second sub-pixel structure are aligned in one direction, and a first The third sub pixel region of the three sub pixel structure surrounds the first sub pixel region and the second sub pixel region, and the width d of the first sub pixel region and the second sub pixel region and the third sub pixel region The width b of the first rectangular region, the second rectangular region, the third rectangular region, the fourth rectangular region, the fifth rectangular region, and the sixth rectangular region of the regions satisfies the following specific relationship: b <0.25d, thereby including the present The display panel with the pixel structure of the invention can have improved resolution.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application.

10、20、30、40‧‧‧畫素結構10, 20, 30, 40‧‧‧ pixel structure

100‧‧‧基板100‧‧‧ substrate

100A‧‧‧第一子畫素區域100A‧‧‧first sub pixel area

100B‧‧‧第二子畫素區域100B‧‧‧second sub pixel area

100C‧‧‧第三子畫素區域100C‧‧‧third sub pixel area

110‧‧‧元件層110‧‧‧component layer

120‧‧‧第一電極層120‧‧‧first electrode layer

120A、120B、120C‧‧‧電極圖案120A, 120B, 120C‧‧‧ electrode pattern

130‧‧‧第一發光層130‧‧‧first luminescent layer

132‧‧‧第二發光層132‧‧‧Second luminous layer

134、234、434‧‧‧第三發光層134, 234, 434‧‧‧ third light emitting layer

140‧‧‧隔離層140‧‧‧Isolation layer

150‧‧‧第二電極層150‧‧‧second electrode layer

b、d、f‧‧‧寬度b, d, f‧‧‧width

C1、C2、C3、3C3、C4、3C4、C5、3C5、C6、3C6‧‧‧區域C1, C2, C3, 3C3, C4, 3C4, C5, 3C5, C6, 3C6

D1、D2‧‧‧方向D1, D2‧‧‧ direction

V1、V2‧‧‧開口V1, V2‧‧‧ opening

U1、2U1、4U1‧‧‧第一子畫素結構U1, 2U1, 4U1‧‧‧ the first sub pixel structure

U2、2U2、4U2‧‧‧第二子畫素結構 U2, 2U2, 4U2‧‧‧ second sub-pixel structure

U3、2U3、4U3‧‧‧第三子畫素結構 U3, 2U3, 4U3 ‧‧‧ third sub pixel structure

圖1是依照本發明的第一實施例的畫素結構的上視示意圖。 圖2是沿著圖1中的剖線A-A’的剖面示意圖。 圖3是依照本發明的第二實施例的畫素結構的上視示意圖。 圖4是沿著圖3中的剖線B-B’的剖面示意圖。 圖5是依照本發明的第三實施例的畫素結構的上視示意圖。 圖6是沿著圖5中的剖線C-C’的剖面示意圖。 圖7是依照本發明的第四實施例的畫素結構的上視示意圖。 圖8是沿著圖7中的剖線D-D’的剖面示意圖。FIG. 1 is a schematic top view of a pixel structure according to a first embodiment of the present invention. Fig. 2 is a schematic cross-sectional view taken along the line A-A 'in Fig. 1. 3 is a schematic top view of a pixel structure according to a second embodiment of the present invention. Fig. 4 is a schematic cross-sectional view taken along the line B-B 'in Fig. 3. 5 is a schematic top view of a pixel structure according to a third embodiment of the present invention. Fig. 6 is a schematic cross-sectional view taken along the line C-C 'in Fig. 5. FIG. 7 is a schematic top view of a pixel structure according to a fourth embodiment of the present invention. Fig. 8 is a schematic cross-sectional view taken along a section line D-D 'in Fig. 7.

Claims (10)

一種畫素結構,包括:一基板;以及一第一子畫素結構、一第二子畫素結構及一第三子畫素結構,配置於該基板上,其中該第一子畫素結構與該第二子畫素結構沿一第一方向排列,且該第三子畫素結構環繞該第一子畫素結構與該第二子畫素結構,其中該基板包括一第一子畫素區域、一第二子畫素區域以及一第三子畫素區域,其中該第一子畫素結構位於該第一子畫素區域中,該第二子畫素結構位於該第二子畫素區域中,且該第三子畫素結構位於該第三子畫素區域中,以及其中該第一子畫素結構包括一第一發光層,該第二子畫素結構包括一第二發光層,該第三子畫素結構包括一第三發光層。A pixel structure includes: a substrate; and a first sub-pixel structure, a second sub-pixel structure, and a third sub-pixel structure, which are arranged on the substrate, wherein the first sub-pixel structure and The second sub-pixel structure is arranged along a first direction, and the third sub-pixel structure surrounds the first sub-pixel structure and the second sub-pixel structure, wherein the substrate includes a first sub-pixel region A second sub-pixel region and a third sub-pixel region, wherein the first sub-pixel structure is located in the first sub-pixel region and the second sub-pixel structure is located in the second sub-pixel region And the third sub-pixel structure is located in the third sub-pixel region, and wherein the first sub-pixel structure includes a first light-emitting layer, and the second sub-pixel structure includes a second light-emitting layer, The third sub-pixel structure includes a third light-emitting layer. 如申請專利範圍第1項所述的畫素結構,其中該第一子畫素區域及該第二子畫素區域的形狀為矩形,該第三子畫素區域具有沿該第一方向延伸的一第一矩形區域和一第二矩形區域,以及沿一第二方向延伸的一第三矩形區域、一第四矩形區域、一第五矩形區域和一第六矩形區域,其中該第一方向與該第二方向相垂直,且該第三矩形區域、該第四矩形區域、該第五矩形區域和該第六矩形區域介於該第一矩形區域與該第二矩形區域之間。The pixel structure according to item 1 of the scope of patent application, wherein the shape of the first sub-pixel area and the second sub-pixel area are rectangular, and the third sub-pixel area has a shape extending along the first direction. A first rectangular area and a second rectangular area, and a third rectangular area, a fourth rectangular area, a fifth rectangular area, and a sixth rectangular area extending along a second direction, wherein the first direction and The second direction is perpendicular, and the third rectangular region, the fourth rectangular region, the fifth rectangular region, and the sixth rectangular region are interposed between the first rectangular region and the second rectangular region. 如申請專利範圍第2項所述的畫素結構,其中該第一子畫素區域和該第二子畫素區域分別具有寬度d,該第一矩形區域、該第二矩形區域、該第三矩形區域、該第四矩形區域、該第五矩形區域和該第六矩形區域分別具有寬度b,且b<0.25d。The pixel structure according to item 2 of the scope of the patent application, wherein the first sub pixel region and the second sub pixel region each have a width d, the first rectangular region, the second rectangular region, and the third The rectangular region, the fourth rectangular region, the fifth rectangular region, and the sixth rectangular region have a width b, and b <0.25d. 如申請專利範圍第2項所述的畫素結構,其中:該第一矩形區域、該第二矩形區域、該第三矩形區域和該第四矩形區域共同環繞該第一子畫素區域;以及該第一矩形區域、該第二矩形區域、該第五矩形區域和該第六矩形區域共同環繞該第二子畫素區域。The pixel structure according to item 2 of the scope of patent application, wherein: the first rectangular region, the second rectangular region, the third rectangular region, and the fourth rectangular region jointly surround the first sub pixel region; and The first rectangular region, the second rectangular region, the fifth rectangular region, and the sixth rectangular region collectively surround the second sub-pixel region. 如申請專利範圍第2項所述的畫素結構,其中該第三矩形區域和該第四矩形區域位於該第一子畫素區域的一側,該第五矩形區域和該第六矩形區域位於該第一子畫素區域的另一側,且該第一矩形區域、該第二矩形區域、該第三矩形區域、該第四矩形區域、該第五矩形區域和該第六矩形區域共同環繞該第一子畫素區域及該第二子畫素區域。The pixel structure according to item 2 of the scope of patent application, wherein the third rectangular region and the fourth rectangular region are located on one side of the first sub pixel region, and the fifth rectangular region and the sixth rectangular region are located The other side of the first sub-pixel region, and the first rectangular region, the second rectangular region, the third rectangular region, the fourth rectangular region, the fifth rectangular region, and the sixth rectangular region are all surrounded together The first sub-pixel region and the second sub-pixel region. 如申請專利範圍第2項所述的畫素結構,其中該第三矩形區域、該第四矩形區域、該第五矩形區域和該第六矩形區域分別連接該第一矩形區域與該第二矩形區域。The pixel structure according to item 2 of the scope of patent application, wherein the third rectangular region, the fourth rectangular region, the fifth rectangular region, and the sixth rectangular region connect the first rectangular region and the second rectangular region, respectively. region. 如申請專利範圍第1項所述的畫素結構,其中該第三發光層更覆蓋該第一發光層及該第二發光層。The pixel structure according to item 1 of the application, wherein the third light-emitting layer further covers the first light-emitting layer and the second light-emitting layer. 如申請專利範圍第1項所述的畫素結構,其中該第一發光層僅位於該第一子畫素區域中,該第二發光層僅位於該第二子畫素區域中,該第三發光層僅位於該第三子畫素區域中。The pixel structure according to item 1 of the patent application scope, wherein the first light-emitting layer is located only in the first sub-pixel area, the second light-emitting layer is located only in the second sub-pixel area, and the third The light emitting layer is located only in the third sub-pixel region. 如申請專利範圍第1項所述的畫素結構,其中該第一發光層為紅色發光層,該第二發光層為綠色發光層,且該第三發光層為藍色發光層。The pixel structure according to item 1 of the application, wherein the first light-emitting layer is a red light-emitting layer, the second light-emitting layer is a green light-emitting layer, and the third light-emitting layer is a blue light-emitting layer. 如申請專利範圍第1項所述的畫素結構,其中所述畫素結構的形狀為正方形。The pixel structure according to item 1 of the scope of patent application, wherein the shape of the pixel structure is a square.
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