TWI683130B - 使用亮視野暗視野物鏡的獨特斜射照明技術及與該技術有關的成像方法 - Google Patents
使用亮視野暗視野物鏡的獨特斜射照明技術及與該技術有關的成像方法 Download PDFInfo
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- TWI683130B TWI683130B TW107123342A TW107123342A TWI683130B TW I683130 B TWI683130 B TW I683130B TW 107123342 A TW107123342 A TW 107123342A TW 107123342 A TW107123342 A TW 107123342A TW I683130 B TWI683130 B TW I683130B
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- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000003384 imaging method Methods 0.000 title abstract description 62
- 238000005286 illumination Methods 0.000 claims description 124
- 230000004888 barrier function Effects 0.000 claims description 63
- 230000008859 change Effects 0.000 claims description 5
- 230000006872 improvement Effects 0.000 claims description 4
- 238000012876 topography Methods 0.000 abstract description 6
- 238000012545 processing Methods 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 description 16
- 238000007493 shaping process Methods 0.000 description 5
- 230000001276 controlling effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000000284 resting effect Effects 0.000 description 2
- 238000010561 standard procedure Methods 0.000 description 2
- 230000005355 Hall effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000009545 invasion Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/082—Condensers for incident illumination only
- G02B21/084—Condensers for incident illumination only having annular illumination around the objective
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/12—Condensers affording bright-field illumination
- G02B21/125—Condensers affording bright-field illumination affording both dark- and bright-field illumination
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
- G02B21/361—Optical details, e.g. image relay to the camera or image sensor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
- G02B21/365—Control or image processing arrangements for digital or video microscopes
- G02B21/367—Control or image processing arrangements for digital or video microscopes providing an output produced by processing a plurality of individual source images, e.g. image tiling, montage, composite images, depth sectioning, image comparison
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/005—Diaphragms
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Microscoopes, Condenser (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462063564P | 2014-10-14 | 2014-10-14 | |
| US62/063,564 | 2014-10-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201908805A TW201908805A (zh) | 2019-03-01 |
| TWI683130B true TWI683130B (zh) | 2020-01-21 |
Family
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Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107123342A TWI683130B (zh) | 2014-10-14 | 2015-10-14 | 使用亮視野暗視野物鏡的獨特斜射照明技術及與該技術有關的成像方法 |
| TW104133705A TWI636281B (zh) | 2014-10-14 | 2015-10-14 | 使用亮視野暗視野物鏡的獨特斜射照明技術及與該技術有關的成像方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104133705A TWI636281B (zh) | 2014-10-14 | 2015-10-14 | 使用亮視野暗視野物鏡的獨特斜射照明技術及與該技術有關的成像方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (4) | US10437034B2 (enExample) |
| EP (2) | EP4030201B1 (enExample) |
| JP (2) | JP6596492B2 (enExample) |
| KR (1) | KR102058453B1 (enExample) |
| CN (1) | CN107250872B (enExample) |
| TW (2) | TWI683130B (enExample) |
| WO (1) | WO2016061070A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10169852B1 (en) * | 2018-07-03 | 2019-01-01 | Nanotronics Imaging, Inc. | Systems, devices, and methods for providing feedback on and improving the accuracy of super-resolution imaging |
| US10295476B1 (en) * | 2018-08-14 | 2019-05-21 | Applied Materials Israel Ltd. | System and method for multiple mode inspection of a sample |
| DE102018128083A1 (de) * | 2018-11-09 | 2020-05-14 | Leica Microsystems Cms Gmbh | Mikroskopisches Durchlichtkontrastierverfahren |
| MX2021007139A (es) * | 2018-12-18 | 2021-09-10 | Pathware Inc | Sistema basado en microscopía computacional y método para imagenología automatizada y análisis de especímenes patológicos. |
| US10901327B2 (en) | 2018-12-20 | 2021-01-26 | Canon Kabushiki Kaisha | Automatic defect analyzer for nanoimprint lithography using image analysis |
| US11294162B2 (en) | 2019-02-07 | 2022-04-05 | Nanotronics Imaging, Inc. | Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel |
| CN109884082B (zh) * | 2019-03-27 | 2020-04-03 | 爱丁堡(南京)光电设备有限公司 | 一种光滑表面缺陷的检测方法 |
| CN110609039B (zh) * | 2019-09-23 | 2021-09-28 | 上海御微半导体技术有限公司 | 一种光学检测装置及其方法 |
| CN110926429A (zh) * | 2019-12-23 | 2020-03-27 | 中芯长电半导体(江阴)有限公司 | 一种光源识别设备 |
| WO2021158703A1 (en) | 2020-02-03 | 2021-08-12 | Nanotronics Imaging, Inc. | Deep photometric learning (dpl) systems, apparatus and methods |
| KR102315010B1 (ko) * | 2020-02-19 | 2021-10-21 | 한국표준과학연구원 | 파라볼릭 미러를 이용한 반사형 fpm |
| US11733172B2 (en) * | 2020-05-15 | 2023-08-22 | Kla Corporation | Apparatus and method for rotating an optical objective |
| US11689821B2 (en) * | 2020-08-07 | 2023-06-27 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Incoherent Fourier ptychographic super-resolution imaging system with priors |
| CN113092415A (zh) * | 2021-03-09 | 2021-07-09 | 中国科学院苏州生物医学工程技术研究所 | 用于无标记生物样品的相衬成像装置 |
| KR102786752B1 (ko) * | 2022-09-29 | 2025-03-28 | 한국표준과학연구원 | Duv 반사형 fpm |
| CN116990320B (zh) * | 2023-09-27 | 2023-12-19 | 江西驰宇光电科技发展有限公司 | 一种用于疵病检测的暗场成像方法及装置 |
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| CN100445794C (zh) * | 2004-11-24 | 2008-12-24 | 吉峰贵司 | 物镜和聚光镜 |
| WO2011004714A1 (ja) * | 2009-07-06 | 2011-01-13 | 株式会社ニコン | 顕微鏡装置 |
| JP2011027782A (ja) * | 2009-07-21 | 2011-02-10 | Nikon Corp | 対物レンズ、顕微鏡 |
| CN103091840A (zh) * | 2011-10-28 | 2013-05-08 | 佳能株式会社 | 光学设备、位置检测设备、显微镜设备以及曝光设备 |
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| AT126714B (de) * | 1930-03-24 | 1932-02-10 | Zeiss Carl Fa | Vorrichtung zur Erzielung verschiedenfarbiger Beleuchtung mikroskopischer Objekte. |
| DE2331750C3 (de) | 1973-06-22 | 1978-04-20 | Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar | Auflicht-Beleuchtungseinrichtung für wahlweise Hell- und Dunkelfeldbeleuchtung |
| DE2542075A1 (de) * | 1975-09-20 | 1977-07-21 | Leitz Ernst Gmbh | Auflicht-beleuchtungseinrichtung fuer hell- und dunkelfeldbeleuchtung |
| JPS6063514A (ja) | 1983-09-17 | 1985-04-11 | Nippon Kogaku Kk <Nikon> | 暗視野用落射顕微鏡 |
| JPS6063514U (ja) | 1983-10-07 | 1985-05-04 | 株式会社クシタニ | オ−トバイライダ−用膝保護用プロテクタ− |
| DE3409657A1 (de) * | 1984-03-16 | 1985-09-19 | Fa. Carl Zeiss, 7920 Heidenheim | Dunkelfeldbeleuchtungseinrichtung fuer mikroskope |
| US4585315A (en) | 1984-11-13 | 1986-04-29 | International Business Machines Corporation | Brightfield/darkfield microscope illuminator |
| DE3442218A1 (de) | 1984-11-19 | 1986-05-28 | Fa. Carl Zeiss, 7920 Heidenheim | Auflichtbeleuchtungsapparat fuer mikroskope |
| JP2892132B2 (ja) | 1990-09-26 | 1999-05-17 | 株式会社和廣武 | 疑似太陽光照射装置 |
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| US5867312A (en) * | 1991-04-19 | 1999-02-02 | Edge Scientific Instrument Company Llc | Illumination system and method for a 3-D high definition light microscope |
| JPH04133017U (ja) | 1991-05-31 | 1992-12-10 | 武蔵精密工業株式会社 | ボールジヨイント |
| JPH07294822A (ja) * | 1994-04-28 | 1995-11-10 | Olympus Optical Co Ltd | 顕微鏡の落射暗視野照明装置 |
| US5831736A (en) * | 1996-08-29 | 1998-11-03 | Washington University | Method and apparatus for generating a three-dimensional topographical image of a microscopic specimen |
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| JP2000227557A (ja) * | 1999-02-04 | 2000-08-15 | Hideaki Ishizuki | 暗視野照明を用いた液中微粒子、濁度観察方法 |
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2015
- 2015-10-13 EP EP22160787.2A patent/EP4030201B1/en active Active
- 2015-10-13 JP JP2017520494A patent/JP6596492B2/ja active Active
- 2015-10-13 EP EP15787799.4A patent/EP3207409B1/en active Active
- 2015-10-13 KR KR1020177012920A patent/KR102058453B1/ko active Active
- 2015-10-13 WO PCT/US2015/055283 patent/WO2016061070A1/en not_active Ceased
- 2015-10-13 CN CN201580063408.6A patent/CN107250872B/zh active Active
- 2015-10-13 US US15/518,937 patent/US10437034B2/en active Active
- 2015-10-14 TW TW107123342A patent/TWI683130B/zh active
- 2015-10-14 TW TW104133705A patent/TWI636281B/zh active
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2019
- 2019-09-05 US US16/561,541 patent/US10955651B2/en active Active
- 2019-09-30 JP JP2019178985A patent/JP7072892B2/ja active Active
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2021
- 2021-03-22 US US17/208,222 patent/US11561383B2/en active Active
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2023
- 2023-01-23 US US18/158,277 patent/US11846765B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100445794C (zh) * | 2004-11-24 | 2008-12-24 | 吉峰贵司 | 物镜和聚光镜 |
| WO2011004714A1 (ja) * | 2009-07-06 | 2011-01-13 | 株式会社ニコン | 顕微鏡装置 |
| JP2011027782A (ja) * | 2009-07-21 | 2011-02-10 | Nikon Corp | 対物レンズ、顕微鏡 |
| CN103091840A (zh) * | 2011-10-28 | 2013-05-08 | 佳能株式会社 | 光学设备、位置检测设备、显微镜设备以及曝光设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2016061070A1 (en) | 2016-04-21 |
| US10437034B2 (en) | 2019-10-08 |
| US20210208377A1 (en) | 2021-07-08 |
| KR102058453B1 (ko) | 2019-12-23 |
| US20200026053A1 (en) | 2020-01-23 |
| US10955651B2 (en) | 2021-03-23 |
| US11846765B2 (en) | 2023-12-19 |
| US11561383B2 (en) | 2023-01-24 |
| JP2017532561A (ja) | 2017-11-02 |
| CN107250872A (zh) | 2017-10-13 |
| CN107250872B (zh) | 2020-09-08 |
| EP3207409B1 (en) | 2022-04-13 |
| EP4030201B1 (en) | 2024-12-04 |
| EP3207409A1 (en) | 2017-08-23 |
| TWI636281B (zh) | 2018-09-21 |
| JP2020079927A (ja) | 2020-05-28 |
| US20170235117A1 (en) | 2017-08-17 |
| TW201617681A (zh) | 2016-05-16 |
| TW201908805A (zh) | 2019-03-01 |
| JP6596492B2 (ja) | 2019-10-23 |
| EP4030201A1 (en) | 2022-07-20 |
| KR20170091089A (ko) | 2017-08-08 |
| US20230161144A1 (en) | 2023-05-25 |
| JP7072892B2 (ja) | 2022-05-23 |
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