TWI664320B - 自碘類蝕刻廢液回收Ａｕ與重製蝕刻溶液之方法 - Google Patents

自碘類蝕刻廢液回收Ａｕ與重製蝕刻溶液之方法 Download PDF

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Publication number
TWI664320B
TWI664320B TW107103638A TW107103638A TWI664320B TW I664320 B TWI664320 B TW I664320B TW 107103638 A TW107103638 A TW 107103638A TW 107103638 A TW107103638 A TW 107103638A TW I664320 B TWI664320 B TW I664320B
Authority
TW
Taiwan
Prior art keywords
etching solution
iodine
cathode
electrolysis
etching
Prior art date
Application number
TW107103638A
Other languages
English (en)
Chinese (zh)
Other versions
TW201837237A (zh
Inventor
佐藤賢吾
Original Assignee
日商松田產業股份有限公司
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Application filed by 日商松田產業股份有限公司 filed Critical 日商松田產業股份有限公司
Publication of TW201837237A publication Critical patent/TW201837237A/zh
Application granted granted Critical
Publication of TWI664320B publication Critical patent/TWI664320B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/30—Acidic compositions for etching other metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/20—Electrolytic production, recovery or refining of metals by electrolysis of solutions of noble metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • ing And Chemical Polishing (AREA)
TW107103638A 2017-02-15 2018-02-01 自碘類蝕刻廢液回收Ａｕ與重製蝕刻溶液之方法 TWI664320B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017025928A JP6167254B1 (ja) 2017-02-15 2017-02-15 ヨウ素系エッチング廃液からのＡｕ回収とエッチング溶液を再生する方法
JPJP2017-025928 2017-02-15

Publications (2)

Publication Number Publication Date
TW201837237A TW201837237A (zh) 2018-10-16
TWI664320B true TWI664320B (zh) 2019-07-01

Family

ID=59351307

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107103638A TWI664320B (zh) 2017-02-15 2018-02-01 自碘類蝕刻廢液回收Ａｕ與重製蝕刻溶液之方法

Country Status (7)

Country Link
JP (1) JP6167254B1 (ja)
CN (1) CN109312482B (ja)
MY (1) MY188325A (ja)
PH (1) PH12018502401A1 (ja)
SG (1) SG11201809683PA (ja)
TW (1) TWI664320B (ja)
WO (1) WO2018150811A1 (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201512104A (zh) * 2013-05-31 2015-04-01 Asahipretec Corp 含金的碘系蝕刻液的處理方法及處理裝置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60177192A (ja) * 1984-02-23 1985-09-11 Shinko Electric Ind Co Ltd 金および銀が共存する金めつき剥離廃液からの金および銀の分離回収方法
JPH01184281A (ja) * 1988-01-14 1989-07-21 Tanaka Kikinzoku Kogyo Kk ヨウ素による化学エッチング方法
JP2003105570A (ja) * 2001-09-28 2003-04-09 Kawasaki Kasei Chem Ltd 貴金属の回収方法ならび回収装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201512104A (zh) * 2013-05-31 2015-04-01 Asahipretec Corp 含金的碘系蝕刻液的處理方法及處理裝置

Also Published As

Publication number Publication date
PH12018502401B1 (en) 2019-09-23
MY188325A (en) 2021-11-30
JP2018131655A (ja) 2018-08-23
SG11201809683PA (en) 2018-11-29
CN109312482B (zh) 2021-01-12
WO2018150811A1 (ja) 2018-08-23
JP6167254B1 (ja) 2017-07-19
TW201837237A (zh) 2018-10-16
CN109312482A (zh) 2019-02-05
PH12018502401A1 (en) 2019-09-23

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