SG11201809683PA - Method for recovering au from iodine-based etching waste and recycling etching solution - Google Patents

Method for recovering au from iodine-based etching waste and recycling etching solution

Info

Publication number
SG11201809683PA
SG11201809683PA SG11201809683PA SG11201809683PA SG11201809683PA SG 11201809683P A SG11201809683P A SG 11201809683PA SG 11201809683P A SG11201809683P A SG 11201809683PA SG 11201809683P A SG11201809683P A SG 11201809683PA SG 11201809683P A SG11201809683P A SG 11201809683PA
Authority
SG
Singapore
Prior art keywords
iodine
etching solution
recovering
recycling
based etching
Prior art date
Application number
SG11201809683PA
Inventor
Kengo Sato
Original Assignee
Matsuda Sangyo Company Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsuda Sangyo Company Ltd filed Critical Matsuda Sangyo Company Ltd
Publication of SG11201809683PA publication Critical patent/SG11201809683PA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/30—Acidic compositions for etching other metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/20—Electrolytic production, recovery or refining of metals by electrolysis of solutions of noble metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PCT/JP2018/001580 METHOD FOR RECOVERING AU FROM IODINE-BASED ETCHING WASTE AND RECYCLING ETCHING SOLUTION 5 Provided is a method for electrolytically recovering Au from a spent iodine-based etching solution containing Au and simultaneously recycling the spent etching solution. The method is characterized by setting the cathode potential from 10 -0.75 V to -0.95 V (reference electrode: Ag/AgCI), and a ratio of the current density of the anode relative to the current density of the cathode from 3 to 50, but excluding 3. The present invention aims to provide a method for treating a spent iodine-based etching solution, i.e., a method that enables to recover Au and also to recycle the iodine-based etching solution, in a stable and efficient manner without precise pH 15 control. Fig. 1
SG11201809683PA 2017-02-15 2018-01-19 Method for recovering au from iodine-based etching waste and recycling etching solution SG11201809683PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017025928A JP6167254B1 (en) 2017-02-15 2017-02-15 Method of recovering Au from iodine-based etching waste liquid and regenerating the etching solution
PCT/JP2018/001580 WO2018150811A1 (en) 2017-02-15 2018-01-19 Method for recovering au from iodine etching waste liquid and regenerating etching solution

Publications (1)

Publication Number Publication Date
SG11201809683PA true SG11201809683PA (en) 2018-11-29

Family

ID=59351307

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201809683PA SG11201809683PA (en) 2017-02-15 2018-01-19 Method for recovering au from iodine-based etching waste and recycling etching solution

Country Status (7)

Country Link
JP (1) JP6167254B1 (en)
CN (1) CN109312482B (en)
MY (1) MY188325A (en)
PH (1) PH12018502401A1 (en)
SG (1) SG11201809683PA (en)
TW (1) TWI664320B (en)
WO (1) WO2018150811A1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60177192A (en) * 1984-02-23 1985-09-11 Shinko Electric Ind Co Ltd Method for separating and recovering gold and silver from waste stripping liquid of gold plating containing co-existing gold and silver
JPH01184281A (en) * 1988-01-14 1989-07-21 Tanaka Kikinzoku Kogyo Kk Chemical etching method with iodine
JP2003105570A (en) * 2001-09-28 2003-04-09 Kawasaki Kasei Chem Ltd Recovering method and recovering system for noble metal
WO2014192581A1 (en) * 2013-05-31 2014-12-04 アサヒプリテック株式会社 METHOD AND DEVICE FOR TREATING IODINE-CONTAINING ETCHING SOLUTION WHICH CONTAINS Au

Also Published As

Publication number Publication date
TWI664320B (en) 2019-07-01
MY188325A (en) 2021-11-30
TW201837237A (en) 2018-10-16
PH12018502401B1 (en) 2019-09-23
JP2018131655A (en) 2018-08-23
JP6167254B1 (en) 2017-07-19
CN109312482A (en) 2019-02-05
CN109312482B (en) 2021-01-12
WO2018150811A1 (en) 2018-08-23
PH12018502401A1 (en) 2019-09-23

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