TWI657317B - 光學裝置、具有此光學裝置的曝光設備以及物品製造方法 - Google Patents
光學裝置、具有此光學裝置的曝光設備以及物品製造方法 Download PDFInfo
- Publication number
- TWI657317B TWI657317B TW105137666A TW105137666A TWI657317B TW I657317 B TWI657317 B TW I657317B TW 105137666 A TW105137666 A TW 105137666A TW 105137666 A TW105137666 A TW 105137666A TW I657317 B TWI657317 B TW I657317B
- Authority
- TW
- Taiwan
- Prior art keywords
- coil
- optical device
- heat
- mirror
- heat transfer
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 98
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000001816 cooling Methods 0.000 claims abstract description 71
- 238000012546 transfer Methods 0.000 claims description 54
- 239000000758 substrate Substances 0.000 claims description 16
- 239000002826 coolant Substances 0.000 claims description 13
- 238000005259 measurement Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 8
- 238000005286 illumination Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000004075 alteration Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910001172 neodymium magnet Inorganic materials 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0081—Mechanical or electrical aspects of the light guide and light source in the lighting device peculiar to the adaptation to planar light guides, e.g. concerning packaging
- G02B6/0085—Means for removing heat created by the light source from the package
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015240736A JP6742717B2 (ja) | 2015-12-10 | 2015-12-10 | 光学装置、それを備えた露光装置、および物品の製造方法 |
| JP2015-240736 | 2015-12-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201734652A TW201734652A (zh) | 2017-10-01 |
| TWI657317B true TWI657317B (zh) | 2019-04-21 |
Family
ID=59059663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW105137666A TWI657317B (zh) | 2015-12-10 | 2016-11-17 | 光學裝置、具有此光學裝置的曝光設備以及物品製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6742717B2 (https=) |
| KR (1) | KR102111070B1 (https=) |
| CN (1) | CN106873148B (https=) |
| TW (1) | TWI657317B (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102098867B1 (ko) * | 2018-09-12 | 2020-04-09 | (주)아이테드 | 임프린팅 장치 및 임프린팅 방법 |
| CN114924378B (zh) * | 2022-05-30 | 2023-10-27 | 深圳综合粒子设施研究院 | 一种反射镜面形控制结构及光束线装置 |
| WO2025143884A1 (ko) * | 2023-12-29 | 2025-07-03 | 주식회사 기가테라라이팅 | 조명 장치 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004039696A (ja) * | 2002-06-28 | 2004-02-05 | Canon Inc | 反射ミラー装置及び露光装置及びデバイス製造方法 |
| JP2007316132A (ja) * | 2006-05-23 | 2007-12-06 | Canon Inc | 反射装置 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2756551B2 (ja) * | 1992-10-20 | 1998-05-25 | 住友重機械工業株式会社 | 伝導冷却型超電導磁石装置 |
| JP3870002B2 (ja) * | 2000-04-07 | 2007-01-17 | キヤノン株式会社 | 露光装置 |
| JP2004039862A (ja) * | 2002-07-03 | 2004-02-05 | Nikon Corp | 光学装置、露光装置、並びにデバイス製造方法 |
| JP4245975B2 (ja) * | 2003-05-15 | 2009-04-02 | オリンパス株式会社 | 可変形状ミラーおよびその駆動方法 |
| US20050236915A1 (en) * | 2004-04-23 | 2005-10-27 | Nikon Corporation | Electromagnetic force actuator |
| JP4817702B2 (ja) * | 2005-04-14 | 2011-11-16 | キヤノン株式会社 | 光学装置及びそれを備えた露光装置 |
| US8002420B2 (en) * | 2008-07-23 | 2011-08-23 | Nikon Corporation | Hydrostatic liquid-metal deformable optical elements |
| US20100033704A1 (en) * | 2008-08-11 | 2010-02-11 | Masayuki Shiraishi | Deformable mirror, mirror apparatus, and exposure apparatus |
| JP5142946B2 (ja) * | 2008-10-29 | 2013-02-13 | 三菱電機株式会社 | アクチュエータ |
| JP2010141071A (ja) * | 2008-12-11 | 2010-06-24 | Nikon Corp | 光学部材冷却装置、光学系、露光装置及びデバイスの製造方法 |
| DE102011005778A1 (de) * | 2011-03-18 | 2012-09-20 | Carl Zeiss Smt Gmbh | Optisches Element |
| JP2015050353A (ja) * | 2013-09-02 | 2015-03-16 | キヤノン株式会社 | 光学装置、投影光学系、露光装置、並びに物品の製造方法 |
| JP6381877B2 (ja) * | 2013-09-04 | 2018-08-29 | 株式会社ニコン | リニアモータ、露光装置、デバイス製造方法、及びコイルユニット |
| JP2015065246A (ja) * | 2013-09-24 | 2015-04-09 | キヤノン株式会社 | 光学装置、光学系、露光装置及び物品の製造方法 |
| JP6336274B2 (ja) * | 2013-12-25 | 2018-06-06 | キヤノン株式会社 | 光学装置、投影光学系、露光装置、および物品の製造方法 |
-
2015
- 2015-12-10 JP JP2015240736A patent/JP6742717B2/ja active Active
-
2016
- 2016-11-17 TW TW105137666A patent/TWI657317B/zh active
- 2016-12-01 KR KR1020160162575A patent/KR102111070B1/ko active Active
- 2016-12-06 CN CN201611106037.8A patent/CN106873148B/zh active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004039696A (ja) * | 2002-06-28 | 2004-02-05 | Canon Inc | 反射ミラー装置及び露光装置及びデバイス製造方法 |
| JP2007316132A (ja) * | 2006-05-23 | 2007-12-06 | Canon Inc | 反射装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6742717B2 (ja) | 2020-08-19 |
| TW201734652A (zh) | 2017-10-01 |
| JP2017107070A (ja) | 2017-06-15 |
| KR20170069146A (ko) | 2017-06-20 |
| KR102111070B1 (ko) | 2020-05-15 |
| CN106873148A (zh) | 2017-06-20 |
| CN106873148B (zh) | 2020-11-03 |
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