CN106873148B - 光学设备、具有光学设备的曝光装置及物品制造方法 - Google Patents

光学设备、具有光学设备的曝光装置及物品制造方法 Download PDF

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Publication number
CN106873148B
CN106873148B CN201611106037.8A CN201611106037A CN106873148B CN 106873148 B CN106873148 B CN 106873148B CN 201611106037 A CN201611106037 A CN 201611106037A CN 106873148 B CN106873148 B CN 106873148B
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Prior art keywords
coil
heat
cooling
mirror
transfer member
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Chinese (zh)
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CN106873148A (zh
Inventor
西川原朋史
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Canon Inc
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Canon Inc
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0081Mechanical or electrical aspects of the light guide and light source in the lighting device peculiar to the adaptation to planar light guides, e.g. concerning packaging
    • G02B6/0085Means for removing heat created by the light source from the package
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70258Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201611106037.8A 2015-12-10 2016-12-06 光学设备、具有光学设备的曝光装置及物品制造方法 Active CN106873148B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015240736A JP6742717B2 (ja) 2015-12-10 2015-12-10 光学装置、それを備えた露光装置、および物品の製造方法
JP2015-240736 2015-12-10

Publications (2)

Publication Number Publication Date
CN106873148A CN106873148A (zh) 2017-06-20
CN106873148B true CN106873148B (zh) 2020-11-03

Family

ID=59059663

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CN201611106037.8A Active CN106873148B (zh) 2015-12-10 2016-12-06 光学设备、具有光学设备的曝光装置及物品制造方法

Country Status (4)

Country Link
JP (1) JP6742717B2 (https=)
KR (1) KR102111070B1 (https=)
CN (1) CN106873148B (https=)
TW (1) TWI657317B (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102098867B1 (ko) * 2018-09-12 2020-04-09 (주)아이테드 임프린팅 장치 및 임프린팅 방법
CN114924378B (zh) * 2022-05-30 2023-10-27 深圳综合粒子设施研究院 一种反射镜面形控制结构及光束线装置
WO2025143884A1 (ko) * 2023-12-29 2025-07-03 주식회사 기가테라라이팅 조명 장치

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06132567A (ja) * 1992-10-20 1994-05-13 Sumitomo Heavy Ind Ltd 伝導冷却型超電導磁石装置
CN1618114A (zh) * 2002-06-28 2005-05-18 佳能株式会社 反射镜设备、曝光设备以及器件制造方法
TW200807170A (en) * 2006-05-23 2008-02-01 Canon Kk Reflecting apparatus
EP1712955B1 (en) * 2005-04-14 2011-06-15 Canon Kabushiki Kaisha Optical unit and exposure apparatus having the same
CN104749764A (zh) * 2013-12-25 2015-07-01 佳能株式会社 光学装置、投影光学系统、曝光装置和制造物品的方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3870002B2 (ja) * 2000-04-07 2007-01-17 キヤノン株式会社 露光装置
JP2004039862A (ja) * 2002-07-03 2004-02-05 Nikon Corp 光学装置、露光装置、並びにデバイス製造方法
JP4245975B2 (ja) * 2003-05-15 2009-04-02 オリンパス株式会社 可変形状ミラーおよびその駆動方法
US20050236915A1 (en) * 2004-04-23 2005-10-27 Nikon Corporation Electromagnetic force actuator
US8002420B2 (en) * 2008-07-23 2011-08-23 Nikon Corporation Hydrostatic liquid-metal deformable optical elements
US20100033704A1 (en) * 2008-08-11 2010-02-11 Masayuki Shiraishi Deformable mirror, mirror apparatus, and exposure apparatus
JP5142946B2 (ja) * 2008-10-29 2013-02-13 三菱電機株式会社 アクチュエータ
JP2010141071A (ja) * 2008-12-11 2010-06-24 Nikon Corp 光学部材冷却装置、光学系、露光装置及びデバイスの製造方法
DE102011005778A1 (de) * 2011-03-18 2012-09-20 Carl Zeiss Smt Gmbh Optisches Element
JP2015050353A (ja) * 2013-09-02 2015-03-16 キヤノン株式会社 光学装置、投影光学系、露光装置、並びに物品の製造方法
JP6381877B2 (ja) * 2013-09-04 2018-08-29 株式会社ニコン リニアモータ、露光装置、デバイス製造方法、及びコイルユニット
JP2015065246A (ja) * 2013-09-24 2015-04-09 キヤノン株式会社 光学装置、光学系、露光装置及び物品の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06132567A (ja) * 1992-10-20 1994-05-13 Sumitomo Heavy Ind Ltd 伝導冷却型超電導磁石装置
CN1618114A (zh) * 2002-06-28 2005-05-18 佳能株式会社 反射镜设备、曝光设备以及器件制造方法
EP1712955B1 (en) * 2005-04-14 2011-06-15 Canon Kabushiki Kaisha Optical unit and exposure apparatus having the same
TW200807170A (en) * 2006-05-23 2008-02-01 Canon Kk Reflecting apparatus
CN104749764A (zh) * 2013-12-25 2015-07-01 佳能株式会社 光学装置、投影光学系统、曝光装置和制造物品的方法

Also Published As

Publication number Publication date
JP6742717B2 (ja) 2020-08-19
TW201734652A (zh) 2017-10-01
JP2017107070A (ja) 2017-06-15
KR20170069146A (ko) 2017-06-20
KR102111070B1 (ko) 2020-05-15
CN106873148A (zh) 2017-06-20
TWI657317B (zh) 2019-04-21

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