TWI645261B - Illumination optical system, lithography apparatus, and article manufacturing method - Google Patents
Illumination optical system, lithography apparatus, and article manufacturing method Download PDFInfo
- Publication number
- TWI645261B TWI645261B TW106129100A TW106129100A TWI645261B TW I645261 B TWI645261 B TW I645261B TW 106129100 A TW106129100 A TW 106129100A TW 106129100 A TW106129100 A TW 106129100A TW I645261 B TWI645261 B TW I645261B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- optical system
- optical integrator
- illumination
- regions
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 192
- 238000005286 illumination Methods 0.000 title claims abstract description 63
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 238000001459 lithography Methods 0.000 title claims description 3
- 238000009826 distribution Methods 0.000 claims description 47
- 238000005259 measurement Methods 0.000 claims description 15
- 230000008859 change Effects 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 11
- 238000012545 processing Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 description 19
- 230000000694 effects Effects 0.000 description 17
- 238000012937 correction Methods 0.000 description 10
- 230000002093 peripheral effect Effects 0.000 description 10
- 230000009471 action Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- Microscoopes, Condenser (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-168546 | 2016-08-30 | ||
| JP2016168546A JP6761306B2 (ja) | 2016-08-30 | 2016-08-30 | 照明光学系、リソグラフィ装置、及び物品製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201820045A TW201820045A (zh) | 2018-06-01 |
| TWI645261B true TWI645261B (zh) | 2018-12-21 |
Family
ID=61300901
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106129100A TWI645261B (zh) | 2016-08-30 | 2017-08-28 | Illumination optical system, lithography apparatus, and article manufacturing method |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6761306B2 (enrdf_load_stackoverflow) |
| KR (1) | KR102212855B1 (enrdf_load_stackoverflow) |
| CN (1) | CN109643069B (enrdf_load_stackoverflow) |
| TW (1) | TWI645261B (enrdf_load_stackoverflow) |
| WO (1) | WO2018043423A1 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI700960B (zh) * | 2019-05-29 | 2020-08-01 | 財團法人國家實驗研究院 | 光源調控方法、光源系統以及電腦程式產品 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7148268B2 (ja) * | 2018-05-01 | 2022-10-05 | キヤノン株式会社 | 制御装置、リソグラフィ装置、および物品の製造方法 |
| JP7533445B2 (ja) * | 2019-03-29 | 2024-08-14 | 株式会社ニコン | 露光装置、照明光学系、およびデバイス製造方法 |
| JP7446096B2 (ja) * | 2019-12-04 | 2024-03-08 | キヤノン株式会社 | 照明光学系、および物品製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001135564A (ja) * | 1999-11-05 | 2001-05-18 | Canon Inc | 投影露光装置 |
| US20010046039A1 (en) * | 1999-03-16 | 2001-11-29 | Nikon Corporation | Illumination apparatus, exposure apparatus and exposure method |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3440458B2 (ja) * | 1993-06-18 | 2003-08-25 | 株式会社ニコン | 照明装置、パターン投影方法及び半導体素子の製造方法 |
| JP4310816B2 (ja) * | 1997-03-14 | 2009-08-12 | 株式会社ニコン | 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法 |
| JP3259657B2 (ja) * | 1997-04-30 | 2002-02-25 | キヤノン株式会社 | 投影露光装置及びそれを用いたデバイスの製造方法 |
| WO1999036832A1 (fr) * | 1998-01-19 | 1999-07-22 | Nikon Corporation | Dispositif d'eclairement et appareil de sensibilisation |
| JP2000269114A (ja) | 1999-03-16 | 2000-09-29 | Nikon Corp | 照明装置、露光装置及び露光方法 |
| AU2940600A (en) * | 1999-03-24 | 2000-10-09 | Nikon Corporation | Exposure method and apparatus |
| JP2001135560A (ja) * | 1999-11-04 | 2001-05-18 | Nikon Corp | 照明光学装置、該照明光学装置を備えた露光装置、および該露光装置を用いたマイクロデバイス製造方法 |
| DE60217771T3 (de) * | 2001-07-27 | 2012-02-09 | Canon K.K. | Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels |
| TW200625027A (en) * | 2005-01-14 | 2006-07-16 | Zeiss Carl Smt Ag | Illumination system for a microlithographic projection exposure apparatus |
| JP2010097975A (ja) * | 2008-10-14 | 2010-04-30 | Nikon Corp | 補正ユニット、照明光学系、露光装置、およびデバイス製造方法 |
-
2016
- 2016-08-30 JP JP2016168546A patent/JP6761306B2/ja active Active
-
2017
- 2017-08-28 TW TW106129100A patent/TWI645261B/zh active
- 2017-08-28 CN CN201780051936.9A patent/CN109643069B/zh active Active
- 2017-08-28 KR KR1020197008164A patent/KR102212855B1/ko active Active
- 2017-08-28 WO PCT/JP2017/030779 patent/WO2018043423A1/ja active Application Filing
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010046039A1 (en) * | 1999-03-16 | 2001-11-29 | Nikon Corporation | Illumination apparatus, exposure apparatus and exposure method |
| JP2001135564A (ja) * | 1999-11-05 | 2001-05-18 | Canon Inc | 投影露光装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI700960B (zh) * | 2019-05-29 | 2020-08-01 | 財團法人國家實驗研究院 | 光源調控方法、光源系統以及電腦程式產品 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109643069B (zh) | 2021-07-27 |
| TW201820045A (zh) | 2018-06-01 |
| KR102212855B1 (ko) | 2021-02-05 |
| WO2018043423A1 (ja) | 2018-03-08 |
| CN109643069A (zh) | 2019-04-16 |
| JP6761306B2 (ja) | 2020-09-23 |
| KR20190040294A (ko) | 2019-04-17 |
| JP2018036425A (ja) | 2018-03-08 |
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