KR102212855B1 - 조명 광학계, 리소그래피 장치, 및 물품 제조 방법 - Google Patents

조명 광학계, 리소그래피 장치, 및 물품 제조 방법 Download PDF

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KR102212855B1
KR102212855B1 KR1020197008164A KR20197008164A KR102212855B1 KR 102212855 B1 KR102212855 B1 KR 102212855B1 KR 1020197008164 A KR1020197008164 A KR 1020197008164A KR 20197008164 A KR20197008164 A KR 20197008164A KR 102212855 B1 KR102212855 B1 KR 102212855B1
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South Korea
Prior art keywords
light
optical
regions
optical system
illuminated
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English (en)
Korean (ko)
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KR20190040294A (ko
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히로미 스다
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020197008164A 2016-08-30 2017-08-28 조명 광학계, 리소그래피 장치, 및 물품 제조 방법 Active KR102212855B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2016-168546 2016-08-30
JP2016168546A JP6761306B2 (ja) 2016-08-30 2016-08-30 照明光学系、リソグラフィ装置、及び物品製造方法
PCT/JP2017/030779 WO2018043423A1 (ja) 2016-08-30 2017-08-28 照明光学系、リソグラフィ装置、及び物品製造方法

Publications (2)

Publication Number Publication Date
KR20190040294A KR20190040294A (ko) 2019-04-17
KR102212855B1 true KR102212855B1 (ko) 2021-02-05

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KR1020197008164A Active KR102212855B1 (ko) 2016-08-30 2017-08-28 조명 광학계, 리소그래피 장치, 및 물품 제조 방법

Country Status (5)

Country Link
JP (1) JP6761306B2 (enrdf_load_stackoverflow)
KR (1) KR102212855B1 (enrdf_load_stackoverflow)
CN (1) CN109643069B (enrdf_load_stackoverflow)
TW (1) TWI645261B (enrdf_load_stackoverflow)
WO (1) WO2018043423A1 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7148268B2 (ja) * 2018-05-01 2022-10-05 キヤノン株式会社 制御装置、リソグラフィ装置、および物品の製造方法
JP7533445B2 (ja) * 2019-03-29 2024-08-14 株式会社ニコン 露光装置、照明光学系、およびデバイス製造方法
TWI700960B (zh) * 2019-05-29 2020-08-01 財團法人國家實驗研究院 光源調控方法、光源系統以及電腦程式產品
JP7446096B2 (ja) * 2019-12-04 2024-03-08 キヤノン株式会社 照明光学系、および物品製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001135564A (ja) * 1999-11-05 2001-05-18 Canon Inc 投影露光装置
US20010046039A1 (en) * 1999-03-16 2001-11-29 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3440458B2 (ja) * 1993-06-18 2003-08-25 株式会社ニコン 照明装置、パターン投影方法及び半導体素子の製造方法
JP4310816B2 (ja) * 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
JP3259657B2 (ja) * 1997-04-30 2002-02-25 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
WO1999036832A1 (fr) * 1998-01-19 1999-07-22 Nikon Corporation Dispositif d'eclairement et appareil de sensibilisation
JP2000269114A (ja) 1999-03-16 2000-09-29 Nikon Corp 照明装置、露光装置及び露光方法
AU2940600A (en) * 1999-03-24 2000-10-09 Nikon Corporation Exposure method and apparatus
JP2001135560A (ja) * 1999-11-04 2001-05-18 Nikon Corp 照明光学装置、該照明光学装置を備えた露光装置、および該露光装置を用いたマイクロデバイス製造方法
DE60217771T3 (de) * 2001-07-27 2012-02-09 Canon K.K. Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels
TW200625027A (en) * 2005-01-14 2006-07-16 Zeiss Carl Smt Ag Illumination system for a microlithographic projection exposure apparatus
JP2010097975A (ja) * 2008-10-14 2010-04-30 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010046039A1 (en) * 1999-03-16 2001-11-29 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method
JP2001135564A (ja) * 1999-11-05 2001-05-18 Canon Inc 投影露光装置

Also Published As

Publication number Publication date
CN109643069B (zh) 2021-07-27
TW201820045A (zh) 2018-06-01
WO2018043423A1 (ja) 2018-03-08
TWI645261B (zh) 2018-12-21
CN109643069A (zh) 2019-04-16
JP6761306B2 (ja) 2020-09-23
KR20190040294A (ko) 2019-04-17
JP2018036425A (ja) 2018-03-08

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