TWI644342B - 熱處理裝置及熱處理方法 - Google Patents

熱處理裝置及熱處理方法 Download PDF

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Publication number
TWI644342B
TWI644342B TW105101214A TW105101214A TWI644342B TW I644342 B TWI644342 B TW I644342B TW 105101214 A TW105101214 A TW 105101214A TW 105101214 A TW105101214 A TW 105101214A TW I644342 B TWI644342 B TW I644342B
Authority
TW
Taiwan
Prior art keywords
control
temperature
value
heat treatment
temperature adjustment
Prior art date
Application number
TW105101214A
Other languages
English (en)
Chinese (zh)
Other versions
TW201637077A (zh
Inventor
門間徹
Toru MOMMA
福本靖博
Yasuhiro Fukumoto
西幸治
Koji Nishi
後藤茂宏
Shigehiro Goto
城憲一郎
Kenichiro JO
田中淳
Atsushi Tanaka
Original Assignee
日商思可林集團股份有限公司
Screen Holdings Co,. Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商思可林集團股份有限公司, Screen Holdings Co,. Ltd. filed Critical 日商思可林集團股份有限公司
Publication of TW201637077A publication Critical patent/TW201637077A/zh
Application granted granted Critical
Publication of TWI644342B publication Critical patent/TWI644342B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B21/00—Machines, plants or systems, using electric or magnetic effects
    • F25B21/02—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect
    • F25B21/04—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect reversible
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0432—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B2321/00—Details of machines, plants or systems, using electric or magnetic effects
    • F25B2321/02—Details of machines, plants or systems, using electric or magnetic effects using Peltier effects; using Nernst-Ettinghausen effects
    • F25B2321/021—Control thereof
    • F25B2321/0212—Control thereof of electric power, current or voltage

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Temperature (AREA)
TW105101214A 2015-03-26 2016-01-15 熱處理裝置及熱處理方法 TWI644342B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-063949 2015-03-26
JP2015063949A JP6442339B2 (ja) 2015-03-26 2015-03-26 熱処理装置および熱処理方法

Publications (2)

Publication Number Publication Date
TW201637077A TW201637077A (zh) 2016-10-16
TWI644342B true TWI644342B (zh) 2018-12-11

Family

ID=56977144

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105101214A TWI644342B (zh) 2015-03-26 2016-01-15 熱處理裝置及熱處理方法

Country Status (6)

Country Link
US (1) US10629463B2 (https=)
JP (1) JP6442339B2 (https=)
KR (1) KR101994570B1 (https=)
CN (1) CN107430985B (https=)
TW (1) TWI644342B (https=)
WO (1) WO2016151651A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10908195B2 (en) 2016-06-15 2021-02-02 Watlow Electric Manufacturing Company System and method for controlling power to a heater
JP6872914B2 (ja) * 2017-01-30 2021-05-19 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および熱処理方法
CN111226498B (zh) * 2017-08-10 2022-04-12 沃特洛电气制造公司 用于控制给加热器的功率的系统和方法
IT201800020272A1 (it) * 2018-12-20 2020-06-20 Amx Automatrix S R L Pressa di sinterizzazione per sinterizzare componenti elettronici su un substrato
JP7256034B2 (ja) * 2019-03-04 2023-04-11 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および熱処理方法
JP7198718B2 (ja) * 2019-04-26 2023-01-04 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および熱処理方法
JP2022125685A (ja) * 2021-02-17 2022-08-29 株式会社Kelk 半導体ウエハの温度制御装置及び半導体ウエハの温度制御方法
JP2025132352A (ja) 2024-02-29 2025-09-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Citations (3)

* Cited by examiner, † Cited by third party
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US6080969A (en) * 1997-05-29 2000-06-27 Smc Corporation Apparatus for and method of thermally processing substrate
TW201342473A (zh) * 2011-09-13 2013-10-16 東京威力科創股份有限公司 熱處理裝置、溫度控制系統、熱處理方法、溫度控制方法以及記錄有用以執行該熱處理方法或該溫度控制方法的程式之記錄媒體
TW201415556A (zh) * 2012-10-05 2014-04-16 光洋熱系統股份有限公司 熱處理裝置

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JPH07115058A (ja) 1993-10-18 1995-05-02 Dainippon Screen Mfg Co Ltd 基板冷却装置
US5638687A (en) 1994-11-21 1997-06-17 Dainippon Screen Mfg. Co., Ltd. Substrate cooling method and apparatus
JPH08148421A (ja) 1994-11-21 1996-06-07 Dainippon Screen Mfg Co Ltd 基板冷却装置
JPH08203796A (ja) 1995-01-30 1996-08-09 Dainippon Screen Mfg Co Ltd 基板冷却装置
JPH08236414A (ja) 1995-02-27 1996-09-13 Dainippon Screen Mfg Co Ltd 基板冷却装置
JP3504018B2 (ja) * 1995-03-31 2004-03-08 大日本スクリーン製造株式会社 基板冷却装置
US6230497B1 (en) * 1999-12-06 2001-05-15 Motorola, Inc. Semiconductor circuit temperature monitoring and controlling apparatus and method
US6191399B1 (en) * 2000-02-01 2001-02-20 Asm America, Inc. System of controlling the temperature of a processing chamber
CN100367458C (zh) * 2002-10-25 2008-02-06 东京毅力科创株式会社 热处理装置和热处理方法
JP4384538B2 (ja) * 2003-06-16 2009-12-16 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP5040213B2 (ja) 2006-08-15 2012-10-03 東京エレクトロン株式会社 熱処理装置、熱処理方法及び記憶媒体
JP5041016B2 (ja) 2010-03-01 2012-10-03 東京エレクトロン株式会社 熱処理装置、熱処理方法及び記憶媒体
JP5048810B2 (ja) * 2010-06-23 2012-10-17 東京エレクトロン株式会社 熱処理装置及び熱処理方法
KR101512874B1 (ko) * 2010-09-07 2015-04-16 도쿄엘렉트론가부시키가이샤 종형 열처리 장치 및 그 제어 방법
JP2012080080A (ja) 2010-09-07 2012-04-19 Tokyo Electron Ltd 縦型熱処理装置及びその制御方法
US9845981B2 (en) 2011-04-19 2017-12-19 Liebert Corporation Load estimator for control of vapor compression cooling system with pumped refrigerant economization
US9038404B2 (en) 2011-04-19 2015-05-26 Liebert Corporation High efficiency cooling system
US9316424B2 (en) 2011-04-19 2016-04-19 Liebert Corporation Multi-stage cooling system with tandem compressors and optimized control of sensible cooling and dehumidification
JP5708310B2 (ja) * 2011-07-01 2015-04-30 東京エレクトロン株式会社 基板処理装置
JP6064613B2 (ja) * 2013-01-18 2017-01-25 株式会社ノーリツ 給湯装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6080969A (en) * 1997-05-29 2000-06-27 Smc Corporation Apparatus for and method of thermally processing substrate
TW201342473A (zh) * 2011-09-13 2013-10-16 東京威力科創股份有限公司 熱處理裝置、溫度控制系統、熱處理方法、溫度控制方法以及記錄有用以執行該熱處理方法或該溫度控制方法的程式之記錄媒體
TW201415556A (zh) * 2012-10-05 2014-04-16 光洋熱系統股份有限公司 熱處理裝置

Also Published As

Publication number Publication date
TW201637077A (zh) 2016-10-16
US10629463B2 (en) 2020-04-21
US20180033660A1 (en) 2018-02-01
JP6442339B2 (ja) 2018-12-19
CN107430985B (zh) 2020-10-30
WO2016151651A1 (ja) 2016-09-29
KR20170120151A (ko) 2017-10-30
KR101994570B1 (ko) 2019-06-28
CN107430985A (zh) 2017-12-01
JP2016183815A (ja) 2016-10-20

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