TWI613075B - 具有封裝阻隔膜之光伏打裝置 - Google Patents
具有封裝阻隔膜之光伏打裝置 Download PDFInfo
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- TWI613075B TWI613075B TW102128383A TW102128383A TWI613075B TW I613075 B TWI613075 B TW I613075B TW 102128383 A TW102128383 A TW 102128383A TW 102128383 A TW102128383 A TW 102128383A TW I613075 B TWI613075 B TW I613075B
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- MOWNZPNSYMGTMD-UHFFFAOYSA-N oxidoboron Chemical class O=[B] MOWNZPNSYMGTMD-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002577 polybenzoxazole Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000013047 polymeric layer Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 238000013341 scale-up Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 238000005092 sublimation method Methods 0.000 description 1
- 230000000153 supplemental effect Effects 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/80—Encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells
- H10F19/804—Materials of encapsulations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/16—Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/724—Permeability to gases, adsorption
- B32B2307/7242—Non-permeable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Photovoltaic Devices (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261681051P | 2012-08-08 | 2012-08-08 | |
| US61/681,051 | 2012-08-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201408483A TW201408483A (zh) | 2014-03-01 |
| TWI613075B true TWI613075B (zh) | 2018-02-01 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102128383A TWI613075B (zh) | 2012-08-08 | 2013-08-07 | 具有封裝阻隔膜之光伏打裝置 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US20150221797A1 (enExample) |
| EP (1) | EP2883248B1 (enExample) |
| JP (1) | JP6276266B2 (enExample) |
| KR (1) | KR20150042237A (enExample) |
| CN (1) | CN104798211B (enExample) |
| BR (1) | BR112015002836A2 (enExample) |
| SG (1) | SG11201500952VA (enExample) |
| TW (1) | TWI613075B (enExample) |
| WO (1) | WO2014025383A1 (enExample) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014025384A1 (en) | 2012-08-08 | 2014-02-13 | 3M Innovative Properties Company | Urea (multi)-(meth)acrylate (multi)-silane compositions and articles including the same |
| US10522771B2 (en) | 2014-12-01 | 2019-12-31 | Samsung Electronics Co., Ltd. | Composition, electronic device, and thin film transistor |
| KR102407114B1 (ko) | 2015-05-29 | 2022-06-08 | 삼성전자주식회사 | 절연액, 절연체, 박막 트랜지스터 및 전자 소자 |
| KR102380151B1 (ko) | 2015-08-31 | 2022-03-28 | 삼성전자주식회사 | 박막 트랜지스터, 및 이를 포함하는 전자 장치 |
| CN109627977B (zh) * | 2018-11-30 | 2021-10-01 | 乐凯华光印刷科技有限公司 | 一种有机/无机混合涂布液及其应用 |
| EP4244899A1 (en) * | 2020-11-13 | 2023-09-20 | Henkel AG & Co. KGaA | Coating of solar panel backside |
| US12157941B2 (en) | 2021-05-17 | 2024-12-03 | 3M Innovative Properties Company | Ultraviolet radiation and atomic oxygen barrier films and methods of making and using the same |
| CN113402542A (zh) * | 2021-05-25 | 2021-09-17 | 吉林奥来德光电材料股份有限公司 | 一种封装薄膜用化合物、包含其的油墨组合物及薄膜封装结构 |
| CN113838974A (zh) * | 2021-09-24 | 2021-12-24 | 长江先进存储产业创新中心有限责任公司 | 相变存储器及其制备方法 |
| CN115148860B (zh) * | 2022-09-07 | 2022-11-22 | 华中科技大学 | 一种光伏组件的封装方法及光伏器件 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060251901A1 (en) * | 2005-05-09 | 2006-11-09 | Armstrong Sean E | Curable composition and substrates possessing protective layer obtained therefrom |
| US20100036054A1 (en) * | 2005-05-21 | 2010-02-11 | University Of Durham | Novel surface active polymeric systems |
| WO2011093286A1 (ja) * | 2010-01-27 | 2011-08-04 | ダイセル化学工業株式会社 | ガスバリアフィルムとその製造方法、およびそれを用いたデバイス |
Family Cites Families (114)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3600216A (en) | 1968-09-06 | 1971-08-17 | Union Carbide Corp | Process for adhering poly-p-xylylene to substrates using silane primers and articles obtained thereby |
| US3748300A (en) * | 1971-07-02 | 1973-07-24 | Univ Sherbrooke | Polyhydroxysilicate-polymer reaction product |
| US4378250A (en) | 1981-07-31 | 1983-03-29 | Treadway Gerald D | Organosilicone coating compositions |
| US5018048A (en) | 1983-12-19 | 1991-05-21 | Spectrum Control, Inc. | Miniaturized monolithic multi-layer capacitor and apparatus and method for making |
| US5125138A (en) | 1983-12-19 | 1992-06-30 | Spectrum Control, Inc. | Miniaturized monolithic multi-layer capacitor and apparatus and method for making same |
| US5032461A (en) | 1983-12-19 | 1991-07-16 | Spectrum Control, Inc. | Method of making a multi-layered article |
| US5097800A (en) | 1983-12-19 | 1992-03-24 | Spectrum Control, Inc. | High speed apparatus for forming capacitors |
| US4842893A (en) | 1983-12-19 | 1989-06-27 | Spectrum Control, Inc. | High speed process for coating substrates |
| US4722515A (en) | 1984-11-06 | 1988-02-02 | Spectrum Control, Inc. | Atomizing device for vaporization |
| EP0242460A1 (en) | 1985-01-18 | 1987-10-28 | SPECTRUM CONTROL, INC. (a Pennsylvania corporation) | Monomer atomizer for vaporization |
| US4650889A (en) | 1985-11-29 | 1987-03-17 | Dow Corning Corporation | Silane coupling agents |
| JPS62249992A (ja) | 1986-04-24 | 1987-10-30 | Nippon Kayaku Co Ltd | 新規なシリコンウレタン（メタ）アクリレ−ト，これを用いた樹脂組成物およびコ−テイング剤 |
| US4954371A (en) | 1986-06-23 | 1990-09-04 | Spectrum Control, Inc. | Flash evaporation of monomer fluids |
| JPH0653860B2 (ja) * | 1987-10-26 | 1994-07-20 | 昭和高分子株式会社 | プライマー |
| JPH0627162B2 (ja) | 1988-05-31 | 1994-04-13 | 信越化学工業株式会社 | 光硬化性オルガノポリシロキサン組成物 |
| JP2711456B2 (ja) | 1988-08-08 | 1998-02-10 | 鐘淵化学工業株式会社 | 硬化性樹脂及びその製造法 |
| JPH02133338A (ja) | 1988-11-11 | 1990-05-22 | Nippon Kayaku Co Ltd | 光学ガラスファイバ用コーテイング剤 |
| JPH02130139A (ja) | 1988-11-11 | 1990-05-18 | Unitika Ltd | 蒸着フィルム |
| US4983737A (en) | 1989-03-21 | 1991-01-08 | Ciba-Geigy Corporation | Ethylenically unsaturated compounds containing 1-hydrocarbyloxy-2,2,6,6-tetramethylpiperidine moieties, and polymers, copolymers and stabilized compositions |
| US5359069A (en) | 1989-03-21 | 1994-10-25 | Ciba-Geigy Corporation | Non-migrating 1-hydrocarbyloxy hindered amine derivatives as polymer stabilizers |
| DE4011044A1 (de) | 1990-04-05 | 1991-10-10 | Fraunhofer Ges Forschung | Silane, verfahren zu ihrer herstellung und ihre verwendung zur herstellung von polymerisaten und polykondensaten |
| JP2825736B2 (ja) | 1993-07-30 | 1998-11-18 | 京セラ株式会社 | 誘電体磁器組成物および半導体素子収容用パッケージ |
| US5384342A (en) | 1993-08-30 | 1995-01-24 | Dsm Desotech, Inc. | Vinyl ether urethane silanes |
| ATE218398T1 (de) | 1993-10-04 | 2002-06-15 | 3M Innovative Properties Co | Verfahren zur herstellung einer acrylatbeschichtung |
| US5440446A (en) | 1993-10-04 | 1995-08-08 | Catalina Coatings, Inc. | Acrylate coating material |
| US5888491A (en) * | 1993-12-06 | 1999-03-30 | Minnesota Mining And Manufacturing Company | Optionally crosslinkable coatings, compositions and methods of use |
| US5654084A (en) | 1994-07-22 | 1997-08-05 | Martin Marietta Energy Systems, Inc. | Protective coatings for sensitive materials |
| US5696179A (en) | 1994-10-19 | 1997-12-09 | Dsm, N.V. | Silane oligomer and radiation curable coating composition containing the oligomer |
| US6083628A (en) | 1994-11-04 | 2000-07-04 | Sigma Laboratories Of Arizona, Inc. | Hybrid polymer film |
| EP0760283A4 (en) * | 1995-03-14 | 1998-12-16 | Daicel Chem | COMPOSITE BARRIER FILM AND PROCESS FOR PRODUCING THE SAME |
| US5877895A (en) | 1995-03-20 | 1999-03-02 | Catalina Coatings, Inc. | Multicolor interference coating |
| GB9507910D0 (en) | 1995-04-13 | 1995-05-31 | Minnesota Mining & Mfg | Adhesion promotion of orthopaedic implants |
| EP0775735A4 (en) | 1995-05-11 | 1998-11-18 | Kanegafuchi Chemical Ind | HARDENABLE COMPOSITION FOR COVER COATING AND ITEM COATED WITH IT |
| US5866651A (en) | 1996-10-31 | 1999-02-02 | Minnesota Mining And Manufacturing Company | Hydroxycarbamoylalkoxysilane-based poly(ether-urethane) sealants having improved paint adhesion and laminates prepared therefrom |
| US6045864A (en) | 1997-12-01 | 2000-04-04 | 3M Innovative Properties Company | Vapor coating method |
| AU3870899A (en) | 1998-05-01 | 1999-11-23 | Seshu B. Desu | Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition |
| ATE409215T1 (de) | 1998-05-05 | 2008-10-15 | Massachusetts Inst Technology | Emittierende polymere und vorrichtungen diese polymere enthaltend |
| US6335479B1 (en) | 1998-10-13 | 2002-01-01 | Dai Nippon Printing Co., Ltd. | Protective sheet for solar battery module, method of fabricating the same and solar battery module |
| CA2353506A1 (en) | 1998-11-02 | 2000-05-11 | 3M Innovative Properties Company | Transparent conductive oxides for plastic flat panel displays |
| US6268695B1 (en) | 1998-12-16 | 2001-07-31 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
| US6503564B1 (en) | 1999-02-26 | 2003-01-07 | 3M Innovative Properties Company | Method of coating microstructured substrates with polymeric layer(s), allowing preservation of surface feature profile |
| US6169140B1 (en) | 1999-04-28 | 2001-01-02 | Bayer Corporation | Moisture-curable compositions containing polyisocyanates and polyacrylates having alkoxysilane groups |
| CA2384441C (en) | 1999-09-30 | 2008-01-29 | Basf Corporation | Carbamate-functional resins having improved adhesion, method of making the same, and method of improving intercoat adhesion |
| US6573652B1 (en) | 1999-10-25 | 2003-06-03 | Battelle Memorial Institute | Encapsulated display devices |
| US6413645B1 (en) | 2000-04-20 | 2002-07-02 | Battelle Memorial Institute | Ultrabarrier substrates |
| US6548912B1 (en) | 1999-10-25 | 2003-04-15 | Battelle Memorial Institute | Semicoductor passivation using barrier coatings |
| US6866901B2 (en) | 1999-10-25 | 2005-03-15 | Vitex Systems, Inc. | Method for edge sealing barrier films |
| JP4505698B2 (ja) | 2000-01-17 | 2010-07-21 | 日油株式会社 | ビニル基含有アルコキシアミン、その用途および製造方法 |
| FR2806076B1 (fr) | 2000-03-08 | 2002-09-20 | Saint Gobain Vitrage | Substrat transparent revetu d'une couche polymere |
| JP2001284610A (ja) * | 2000-03-29 | 2001-10-12 | Dainippon Printing Co Ltd | 太陽電池モジュ−ル用保護シ−トおよびそれを使用した太陽電池モジュ−ル |
| WO2001098393A1 (en) | 2000-06-22 | 2001-12-27 | Basf Corporation | Coating compositions having improved adhesion to aluminum substrates |
| US20020090901A1 (en) | 2000-11-03 | 2002-07-11 | 3M Innovative Properties Company | Flexible abrasive product and method of making and using the same |
| CA2443114C (en) | 2001-04-09 | 2009-06-16 | Toppan Printing Co., Ltd. | Laminated material |
| WO2002102812A1 (fr) | 2001-06-13 | 2002-12-27 | Konishi Co., Ltd. | Composes organiques insatures comprenant des groupes contenant du silicium hydrolysable, procede de production correspondant, polymeres contenant du silicium et emulsions |
| US7068902B2 (en) | 2001-08-17 | 2006-06-27 | Alcatel | Radiation-curable coating composition for optical fibers comprising all-in-one oligomeric system |
| KR100905478B1 (ko) | 2001-10-05 | 2009-07-02 | 가부시키가이샤 브리지스톤 | 투명 전도성 필름 및 터치패널 |
| DE10201703A1 (de) | 2002-01-17 | 2003-08-07 | Consortium Elektrochem Ind | Alkoxysilanterminierte Polymere enthaltende vernetzbare Polymerabmischungen |
| JP3313360B1 (ja) | 2002-02-14 | 2002-08-12 | コニシ株式会社 | 硬化性樹脂組成物とその製造方法並びにそれを用いた接着方法 |
| DE10213036A1 (de) | 2002-03-22 | 2003-10-02 | Clariant Gmbh | Kunststofffolie mit Mehrschicht-Interferenzbeschichtung |
| US6835950B2 (en) | 2002-04-12 | 2004-12-28 | Universal Display Corporation | Organic electronic devices with pressure sensitive adhesive layer |
| US20030203210A1 (en) * | 2002-04-30 | 2003-10-30 | Vitex Systems, Inc. | Barrier coatings and methods of making same |
| JP4076378B2 (ja) | 2002-06-28 | 2008-04-16 | コニシ株式会社 | 硬化性樹脂組成物とその製造方法並びにそれを用いた接着方法 |
| US7215473B2 (en) | 2002-08-17 | 2007-05-08 | 3M Innovative Properties Company | Enhanced heat mirror films |
| US20040185269A1 (en) * | 2003-03-18 | 2004-09-23 | Loper Scott W. | Scratch and mar resistant low VOC coating composition |
| US7018713B2 (en) | 2003-04-02 | 2006-03-28 | 3M Innovative Properties Company | Flexible high-temperature ultrabarrier |
| WO2005007751A1 (ja) | 2003-07-18 | 2005-01-27 | Konishi Co., Ltd. | 硬化性樹脂組成物及び常温硬化接着剤 |
| JP2005122147A (ja) | 2003-09-24 | 2005-05-12 | Fuji Photo Film Co Ltd | 反射防止フィルム、その製造方法、偏光板および画像表示装置 |
| DE10349766A1 (de) | 2003-10-24 | 2005-06-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Kieselsäurepolykondensate mit verzweigtkettigen, urethan-, säureamid- und/oder carbonsäureestergruppenhaltigen Resten |
| US7122398B1 (en) * | 2004-03-25 | 2006-10-17 | Nanosolar, Inc. | Manufacturing of optoelectronic devices |
| DE102004024429A1 (de) | 2004-05-14 | 2005-12-08 | Röhm GmbH & Co. KG | Formkörper, enthaltend eine Polymermischung aus schlagzähmodifizierten Poly(meth)-acrylat und Fluorpolymer |
| US20060063015A1 (en) * | 2004-09-23 | 2006-03-23 | 3M Innovative Properties Company | Protected polymeric film |
| KR101298381B1 (ko) | 2005-04-06 | 2013-08-20 | 제이에스알 가부시끼가이샤 | 방사선 경화성 수지 조성물 및 반사 방지막 |
| WO2006132180A1 (ja) | 2005-06-09 | 2006-12-14 | Jsr Corporation | 反射防止積層体 |
| US7781493B2 (en) * | 2005-06-20 | 2010-08-24 | Dow Global Technologies Inc. | Protective coating for window glass |
| US20070020451A1 (en) | 2005-07-20 | 2007-01-25 | 3M Innovative Properties Company | Moisture barrier coatings |
| US7867619B2 (en) | 2006-01-26 | 2011-01-11 | Sika Technology Ag | Moisture-curing compositions containing silane-functional polymers with good adhesive properties |
| EP1849845A1 (de) | 2006-04-26 | 2007-10-31 | Sika Technology AG | Feuchtigkeitshärtende Zusammensetzungen enthaltend silanfunktionelle Polymere und Aminosilan-Addukte |
| US7615283B2 (en) | 2006-06-13 | 2009-11-10 | 3M Innovative Properties Company | Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film |
| JPWO2007148684A1 (ja) | 2006-06-20 | 2009-11-19 | 日油株式会社 | 無機・有機ハイブリッド組成物及びその用途 |
| CN101522417B (zh) | 2006-10-04 | 2013-05-22 | 3M创新有限公司 | 制备多层聚氨酯保护膜的方法 |
| JP2008111025A (ja) | 2006-10-30 | 2008-05-15 | Nof Corp | ガスバリヤー材およびガスバリヤー性包装用フィルム |
| KR101274699B1 (ko) | 2006-12-22 | 2013-06-12 | 엘지디스플레이 주식회사 | 유기 발광 소자 |
| US8241713B2 (en) | 2007-02-21 | 2012-08-14 | 3M Innovative Properties Company | Moisture barrier coatings for organic light emitting diode devices |
| WO2008122292A1 (en) | 2007-04-04 | 2008-10-16 | Ecole Polytechnique Federale De Lausanne (Epfl) | Diffusion-barrier coating for protection of moisture and oxygen sensitive devices |
| JP5469837B2 (ja) | 2007-09-12 | 2014-04-16 | 富士フイルム株式会社 | 親水性組成物 |
| JP5346629B2 (ja) * | 2008-03-13 | 2013-11-20 | 株式会社日本触媒 | 太陽電池モジュール用バックシート |
| JP5344843B2 (ja) | 2008-03-31 | 2013-11-20 | 富士フイルム株式会社 | 重合性組成物および固体撮像素子 |
| US10103359B2 (en) * | 2008-04-09 | 2018-10-16 | Agency For Science, Technology And Research | Multilayer film for encapsulating oxygen and/or moisture sensitive electronic devices |
| KR100929547B1 (ko) | 2008-04-28 | 2009-12-03 | 한국과학기술원 | 올리고실록산 하이브리드 코팅을 이용한 가스 차단막 |
| JP5326341B2 (ja) * | 2008-04-28 | 2013-10-30 | 凸版印刷株式会社 | ガスバリア性積層フィルム |
| US9481927B2 (en) | 2008-06-30 | 2016-11-01 | 3M Innovative Properties Company | Method of making inorganic or inorganic/organic hybrid barrier films |
| JP2010023234A (ja) | 2008-07-15 | 2010-02-04 | Jsr Corp | 積層フィルムおよびその製造方法 |
| JP2010044981A (ja) | 2008-08-15 | 2010-02-25 | Fujifilm Corp | 表示装置 |
| JP5577635B2 (ja) * | 2008-10-09 | 2014-08-27 | 日立化成株式会社 | 接着剤組成物、回路接続用接着剤及び回路接続体 |
| US8575383B2 (en) | 2008-10-15 | 2013-11-05 | Kansai Paint Co., Ltd. | Silsesquioxane compound having polymerizable functional group |
| EP2358529A4 (en) * | 2008-11-17 | 2013-08-28 | 3M Innovative Properties Co | BARRIER WITH A GRADIENT COMPOSITION |
| JP5713528B2 (ja) | 2008-11-18 | 2015-05-07 | 三菱化学株式会社 | 活性エネルギー線硬化性樹脂組成物、ハードコート用硬化膜及び積層体 |
| JP2010189294A (ja) * | 2009-02-17 | 2010-09-02 | Shin-Etsu Chemical Co Ltd | 光重合性官能基含有有機ケイ素化合物及びその製造方法 |
| JP5366854B2 (ja) | 2009-02-19 | 2013-12-11 | 三菱レイヨン株式会社 | （メタ）アクリル酸エステル |
| EP2437939B1 (en) | 2009-06-02 | 2016-09-28 | Agency For Science, Technology And Research | Multilayer barrier film |
| KR101072153B1 (ko) * | 2009-06-30 | 2011-10-10 | 엘지이노텍 주식회사 | 태양전지 및 이의 제조방법 |
| JP5316348B2 (ja) * | 2009-10-06 | 2013-10-16 | 信越化学工業株式会社 | 光硬化性コーティング剤組成物及びその硬化皮膜を有する物品 |
| JP5656878B2 (ja) | 2010-01-14 | 2015-01-21 | 関西ペイント株式会社 | 活性エネルギー線硬化性組成物、及び塗装物品 |
| US8129205B2 (en) | 2010-01-25 | 2012-03-06 | Micron Technology, Inc. | Solid state lighting devices and associated methods of manufacturing |
| US20120301635A1 (en) | 2010-02-17 | 2012-11-29 | Fukuvi Chemical Industry Co., Ltd. | Transparent protective plate for display panels and display device |
| US9138778B2 (en) | 2010-04-14 | 2015-09-22 | Kansai Paint Co., Ltd. | Method for formation of multi-layered coating film, and coated article |
| CN103079816B (zh) * | 2010-07-02 | 2018-01-02 | 3M创新有限公司 | 具有包封剂和光伏电池的阻挡组件 |
| US9254506B2 (en) | 2010-07-02 | 2016-02-09 | 3M Innovative Properties Company | Moisture resistant coating for barrier films |
| JP4734468B1 (ja) * | 2010-09-13 | 2011-07-27 | 日本発條株式会社 | 太陽電池モジュール用基材及びその製造方法 |
| EP2647500B1 (en) | 2010-12-01 | 2021-07-07 | Toyobo Co., Ltd. | Multilayer film |
| US20130323519A1 (en) | 2011-01-31 | 2013-12-05 | 3M Innovative Properties Company | Coatings for barrier films and methods of making and using the same |
| US20130302627A1 (en) | 2011-01-31 | 2013-11-14 | 3M Innovative Properties Company | Vapor-deposited coating for barrier films and methods of making and using the same |
| JP6045096B2 (ja) | 2011-07-13 | 2016-12-14 | 関西ペイント株式会社 | 積層体及び積層体の製造方法 |
| WO2014025384A1 (en) | 2012-08-08 | 2014-02-13 | 3M Innovative Properties Company | Urea (multi)-(meth)acrylate (multi)-silane compositions and articles including the same |
-
2013
- 2013-03-01 SG SG11201500952VA patent/SG11201500952VA/en unknown
- 2013-03-01 KR KR1020157005805A patent/KR20150042237A/ko not_active Withdrawn
- 2013-03-01 EP EP13828752.9A patent/EP2883248B1/en active Active
- 2013-03-01 CN CN201380042036.XA patent/CN104798211B/zh active Active
- 2013-03-01 JP JP2015526515A patent/JP6276266B2/ja active Active
- 2013-03-01 US US14/419,534 patent/US20150221797A1/en not_active Abandoned
- 2013-03-01 BR BR112015002836A patent/BR112015002836A2/pt not_active IP Right Cessation
- 2013-03-01 WO PCT/US2013/028499 patent/WO2014025383A1/en not_active Ceased
- 2013-08-07 TW TW102128383A patent/TWI613075B/zh not_active IP Right Cessation
-
2018
- 2018-01-15 US US15/871,508 patent/US10804419B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060251901A1 (en) * | 2005-05-09 | 2006-11-09 | Armstrong Sean E | Curable composition and substrates possessing protective layer obtained therefrom |
| US20100036054A1 (en) * | 2005-05-21 | 2010-02-11 | University Of Durham | Novel surface active polymeric systems |
| WO2011093286A1 (ja) * | 2010-01-27 | 2011-08-04 | ダイセル化学工業株式会社 | ガスバリアフィルムとその製造方法、およびそれを用いたデバイス |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2883248B1 (en) | 2017-07-19 |
| TW201408483A (zh) | 2014-03-01 |
| CN104798211B (zh) | 2017-04-12 |
| US10804419B2 (en) | 2020-10-13 |
| CN104798211A (zh) | 2015-07-22 |
| WO2014025383A1 (en) | 2014-02-13 |
| EP2883248A1 (en) | 2015-06-17 |
| US20150221797A1 (en) | 2015-08-06 |
| KR20150042237A (ko) | 2015-04-20 |
| SG11201500952VA (en) | 2015-03-30 |
| JP2015531999A (ja) | 2015-11-05 |
| EP2883248A4 (en) | 2016-04-13 |
| BR112015002836A2 (pt) | 2018-04-24 |
| US20180138339A1 (en) | 2018-05-17 |
| JP6276266B2 (ja) | 2018-02-07 |
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