TWI604493B - 帶電粒子微影系統和射束產生器 - Google Patents

帶電粒子微影系統和射束產生器 Download PDF

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Publication number
TWI604493B
TWI604493B TW102117163A TW102117163A TWI604493B TW I604493 B TWI604493 B TW I604493B TW 102117163 A TW102117163 A TW 102117163A TW 102117163 A TW102117163 A TW 102117163A TW I604493 B TWI604493 B TW I604493B
Authority
TW
Taiwan
Prior art keywords
charged particle
chamber
lithography system
vacuum chamber
cooling
Prior art date
Application number
TW102117163A
Other languages
English (en)
Chinese (zh)
Other versions
TW201401331A (zh
Inventor
賓 艾利克山德 亨卓克 文森 凡
威稜 漢克 爾本尼斯
Original Assignee
瑪波微影Ｉｐ公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 瑪波微影Ｉｐ公司 filed Critical 瑪波微影Ｉｐ公司
Publication of TW201401331A publication Critical patent/TW201401331A/zh
Application granted granted Critical
Publication of TWI604493B publication Critical patent/TWI604493B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0262—Shields electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0264—Shields magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Sources, Ion Sources (AREA)
TW102117163A 2012-05-14 2013-05-14 帶電粒子微影系統和射束產生器 TWI604493B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201261646839P 2012-05-14 2012-05-14

Publications (2)

Publication Number Publication Date
TW201401331A TW201401331A (zh) 2014-01-01
TWI604493B true TWI604493B (zh) 2017-11-01

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
TW102117163A TWI604493B (zh) 2012-05-14 2013-05-14 帶電粒子微影系統和射束產生器
TW102117161A TW201401330A (zh) 2012-05-14 2013-05-14 帶電粒子微影系統和射束產生器

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW102117161A TW201401330A (zh) 2012-05-14 2013-05-14 帶電粒子微影系統和射束產生器

Country Status (8)

Country Link
US (2) US9653261B2 (cg-RX-API-DMAC10.html)
EP (1) EP2852966A1 (cg-RX-API-DMAC10.html)
JP (3) JP6219374B2 (cg-RX-API-DMAC10.html)
KR (2) KR102023056B1 (cg-RX-API-DMAC10.html)
CN (3) CN104428866A (cg-RX-API-DMAC10.html)
NL (4) NL2010797C2 (cg-RX-API-DMAC10.html)
TW (2) TWI604493B (cg-RX-API-DMAC10.html)
WO (2) WO2013171229A1 (cg-RX-API-DMAC10.html)

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Also Published As

Publication number Publication date
CN107359101B (zh) 2019-07-12
EP2852966A1 (en) 2015-04-01
CN104520968A (zh) 2015-04-15
JP6430606B2 (ja) 2018-11-28
JP6239596B2 (ja) 2017-11-29
KR102023056B1 (ko) 2019-09-20
US20150124229A1 (en) 2015-05-07
WO2013171214A1 (en) 2013-11-21
NL2010802C2 (en) 2014-08-25
US20170250053A1 (en) 2017-08-31
CN104520968B (zh) 2017-07-07
JP2015517735A (ja) 2015-06-22
JP6219374B2 (ja) 2017-10-25
NL2010797C2 (en) 2014-08-21
NL2013320A (en) 2014-11-24
US9653261B2 (en) 2017-05-16
NL2013321C2 (en) 2015-05-07
TW201401331A (zh) 2014-01-01
NL2013321A (en) 2014-11-06
TW201401330A (zh) 2014-01-01
JP2015516690A (ja) 2015-06-11
CN104428866A (zh) 2015-03-18
CN107359101A (zh) 2017-11-17
NL2013320C2 (en) 2015-06-15
NL2010797A (en) 2013-11-18
JP2018041964A (ja) 2018-03-15
KR20150010993A (ko) 2015-01-29
KR20150010994A (ko) 2015-01-29
US10037864B2 (en) 2018-07-31
NL2010802A (en) 2013-11-18
KR101961914B1 (ko) 2019-03-25
WO2013171229A1 (en) 2013-11-21

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