JP6219374B2 - 荷電粒子リソグラフィシステムおよびビーム発生器 - Google Patents

荷電粒子リソグラフィシステムおよびビーム発生器 Download PDF

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Publication number
JP6219374B2
JP6219374B2 JP2015512040A JP2015512040A JP6219374B2 JP 6219374 B2 JP6219374 B2 JP 6219374B2 JP 2015512040 A JP2015512040 A JP 2015512040A JP 2015512040 A JP2015512040 A JP 2015512040A JP 6219374 B2 JP6219374 B2 JP 6219374B2
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Prior art keywords
charged particle
particle beam
cooling
beam generator
chamber
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Japanese (ja)
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JP2015517735A (ja
Inventor
ファン・フェーン、アレクサンダー・ヘンドリク・ビンセント
ウルバヌス、ウィレム・ヘンク
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マッパー・リソグラフィー・アイピー・ビー．ブイ．
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0262—Shields electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0264—Shields magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2015512040A 2012-05-14 2013-05-14 荷電粒子リソグラフィシステムおよびビーム発生器 Active JP6219374B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261646839P 2012-05-14 2012-05-14
US61/646,839 2012-05-14
PCT/EP2013/059963 WO2013171229A1 (en) 2012-05-14 2013-05-14 Charged particle lithography system and beam generator

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017184957A Division JP6430606B2 (ja) 2012-05-14 2017-09-26 荷電粒子ビーム発生器の高電圧シールド及び冷却

Publications (2)

Publication Number Publication Date
JP2015517735A JP2015517735A (ja) 2015-06-22
JP6219374B2 true JP6219374B2 (ja) 2017-10-25

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JP2015512040A Active JP6219374B2 (ja) 2012-05-14 2013-05-14 荷電粒子リソグラフィシステムおよびビーム発生器
JP2015512032A Active JP6239596B2 (ja) 2012-05-14 2013-05-14 荷電粒子リソグラフィシステムおよびビーム発生器
JP2017184957A Active JP6430606B2 (ja) 2012-05-14 2017-09-26 荷電粒子ビーム発生器の高電圧シールド及び冷却

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JP2017184957A Active JP6430606B2 (ja) 2012-05-14 2017-09-26 荷電粒子ビーム発生器の高電圧シールド及び冷却

Country Status (8)

Country Link
US (2) US9653261B2 (cg-RX-API-DMAC10.html)
EP (1) EP2852966A1 (cg-RX-API-DMAC10.html)
JP (3) JP6219374B2 (cg-RX-API-DMAC10.html)
KR (2) KR102023056B1 (cg-RX-API-DMAC10.html)
CN (3) CN104428866A (cg-RX-API-DMAC10.html)
NL (4) NL2010797C2 (cg-RX-API-DMAC10.html)
TW (2) TWI604493B (cg-RX-API-DMAC10.html)
WO (2) WO2013171229A1 (cg-RX-API-DMAC10.html)

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Publication number Publication date
CN107359101B (zh) 2019-07-12
EP2852966A1 (en) 2015-04-01
CN104520968A (zh) 2015-04-15
JP6430606B2 (ja) 2018-11-28
JP6239596B2 (ja) 2017-11-29
KR102023056B1 (ko) 2019-09-20
US20150124229A1 (en) 2015-05-07
WO2013171214A1 (en) 2013-11-21
NL2010802C2 (en) 2014-08-25
US20170250053A1 (en) 2017-08-31
CN104520968B (zh) 2017-07-07
JP2015517735A (ja) 2015-06-22
NL2010797C2 (en) 2014-08-21
NL2013320A (en) 2014-11-24
US9653261B2 (en) 2017-05-16
NL2013321C2 (en) 2015-05-07
TW201401331A (zh) 2014-01-01
NL2013321A (en) 2014-11-06
TW201401330A (zh) 2014-01-01
TWI604493B (zh) 2017-11-01
JP2015516690A (ja) 2015-06-11
CN104428866A (zh) 2015-03-18
CN107359101A (zh) 2017-11-17
NL2013320C2 (en) 2015-06-15
NL2010797A (en) 2013-11-18
JP2018041964A (ja) 2018-03-15
KR20150010993A (ko) 2015-01-29
KR20150010994A (ko) 2015-01-29
US10037864B2 (en) 2018-07-31
NL2010802A (en) 2013-11-18
KR101961914B1 (ko) 2019-03-25
WO2013171229A1 (en) 2013-11-21

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