TWI603158B - Exposure device, exposure method - Google Patents
Exposure device, exposure method Download PDFInfo
- Publication number
- TWI603158B TWI603158B TW102120332A TW102120332A TWI603158B TW I603158 B TWI603158 B TW I603158B TW 102120332 A TW102120332 A TW 102120332A TW 102120332 A TW102120332 A TW 102120332A TW I603158 B TWI603158 B TW I603158B
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure
- substrate
- unit
- disposed
- moving
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012132802A JP6082884B2 (ja) | 2012-06-12 | 2012-06-12 | 露光装置、露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201351067A TW201351067A (zh) | 2013-12-16 |
TWI603158B true TWI603158B (zh) | 2017-10-21 |
Family
ID=49828382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102120332A TWI603158B (zh) | 2012-06-12 | 2013-06-07 | Exposure device, exposure method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6082884B2 (ja) |
KR (1) | KR102205976B1 (ja) |
CN (1) | CN103488055A (ja) |
TW (1) | TWI603158B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201643558A (zh) * | 2015-03-31 | 2016-12-16 | 尼康股份有限公司 | 曝光裝置、平面顯示器之製造方法、元件製造方法、及曝光方法 |
CN112162465B (zh) * | 2015-03-31 | 2023-06-20 | 株式会社尼康 | 曝光装置、平面显示器的制造方法、元件制造方法、及曝光方法 |
CN105217311A (zh) * | 2015-09-09 | 2016-01-06 | 合肥芯碁微电子装备有限公司 | 一种ldi单机自动装置 |
JP5997409B1 (ja) * | 2016-05-26 | 2016-09-28 | 株式会社 ベアック | 両面露光装置及び両面露光装置におけるマスクとワークとの位置合わせ方法 |
CN109656104B (zh) * | 2018-12-26 | 2021-03-16 | 深圳市华星光电半导体显示技术有限公司 | 一种基板曝光方法及装置 |
CN110286563A (zh) * | 2019-06-19 | 2019-09-27 | 深圳凯世光研股份有限公司 | 一种循环式扫描曝光机 |
WO2021193494A1 (ja) * | 2020-03-23 | 2021-09-30 | サンエー技研株式会社 | 露光装置及び露光方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005015615A1 (ja) * | 2003-08-07 | 2005-02-17 | Nikon Corporation | 露光方法及び露光装置、ステージ装置、並びにデバイス製造方法 |
JP2006350022A (ja) * | 2005-06-16 | 2006-12-28 | Fujifilm Holdings Corp | 描画装置及び描画方法 |
JP2008046457A (ja) * | 2006-08-18 | 2008-02-28 | Orc Mfg Co Ltd | 描画装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004012900A (ja) * | 2002-06-07 | 2004-01-15 | Fuji Photo Film Co Ltd | 露光装置 |
US7429532B2 (en) | 2005-08-08 | 2008-09-30 | Applied Materials, Inc. | Semiconductor substrate process using an optically writable carbon-containing mask |
JP4887165B2 (ja) * | 2007-02-02 | 2012-02-29 | 富士フイルム株式会社 | 描画装置及び方法 |
US20080187871A1 (en) * | 2007-02-02 | 2008-08-07 | Fujifilm Corporation | Pattern forming apparatus and method |
JP5420942B2 (ja) * | 2009-03-19 | 2014-02-19 | 大日本スクリーン製造株式会社 | パターン描画装置およびパターン描画方法 |
-
2012
- 2012-06-12 JP JP2012132802A patent/JP6082884B2/ja active Active
-
2013
- 2013-06-05 KR KR1020130064595A patent/KR102205976B1/ko active IP Right Grant
- 2013-06-07 TW TW102120332A patent/TWI603158B/zh active
- 2013-06-08 CN CN201310228361.7A patent/CN103488055A/zh active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005015615A1 (ja) * | 2003-08-07 | 2005-02-17 | Nikon Corporation | 露光方法及び露光装置、ステージ装置、並びにデバイス製造方法 |
JP2006350022A (ja) * | 2005-06-16 | 2006-12-28 | Fujifilm Holdings Corp | 描画装置及び描画方法 |
JP2008046457A (ja) * | 2006-08-18 | 2008-02-28 | Orc Mfg Co Ltd | 描画装置 |
Also Published As
Publication number | Publication date |
---|---|
TW201351067A (zh) | 2013-12-16 |
JP6082884B2 (ja) | 2017-02-22 |
KR102205976B1 (ko) | 2021-01-20 |
JP2013257409A (ja) | 2013-12-26 |
KR20130139170A (ko) | 2013-12-20 |
CN103488055A (zh) | 2014-01-01 |
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