TWI574745B - 基板之塗佈裝置及基板之塗佈方法 - Google Patents

基板之塗佈裝置及基板之塗佈方法 Download PDF

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Publication number
TWI574745B
TWI574745B TW103124124A TW103124124A TWI574745B TW I574745 B TWI574745 B TW I574745B TW 103124124 A TW103124124 A TW 103124124A TW 103124124 A TW103124124 A TW 103124124A TW I574745 B TWI574745 B TW I574745B
Authority
TW
Taiwan
Prior art keywords
nozzle
coating
substrate
support column
hardening
Prior art date
Application number
TW103124124A
Other languages
English (en)
Chinese (zh)
Other versions
TW201544195A (zh
Inventor
戶內八郎
Original Assignee
中外爐工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 中外爐工業股份有限公司 filed Critical 中外爐工業股份有限公司
Publication of TW201544195A publication Critical patent/TW201544195A/zh
Application granted granted Critical
Publication of TWI574745B publication Critical patent/TWI574745B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Spray Control Apparatus (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
TW103124124A 2014-05-20 2014-07-14 基板之塗佈裝置及基板之塗佈方法 TWI574745B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014104103A JP6452318B2 (ja) 2014-05-20 2014-05-20 基板の塗布装置及び基板の塗布方法

Publications (2)

Publication Number Publication Date
TW201544195A TW201544195A (zh) 2015-12-01
TWI574745B true TWI574745B (zh) 2017-03-21

Family

ID=54562623

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103124124A TWI574745B (zh) 2014-05-20 2014-07-14 基板之塗佈裝置及基板之塗佈方法

Country Status (4)

Country Link
JP (1) JP6452318B2 (ko)
KR (1) KR101651007B1 (ko)
CN (1) CN105080766B (ko)
TW (1) TWI574745B (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106622793B (zh) * 2016-12-13 2023-02-03 彭亮 一种桥式自动喷涂设备
CN106622794B (zh) * 2016-12-13 2023-02-03 彭亮 一种平面喷涂装置
JP6786162B2 (ja) * 2016-12-20 2020-11-18 東京応化工業株式会社 塗布装置、及び塗布方法
CN107214019A (zh) * 2017-07-31 2017-09-29 望江县精美欣钢构有限公司 一种双执行机构钢板表面自动喷胶设备
CN108789791A (zh) * 2018-08-06 2018-11-13 江西佳宇陶瓷有限公司 一种具有烘干功能的直角瓦生产用染色装置
CN108943333B (zh) * 2018-09-12 2020-11-03 浙江南洋水泥制品有限公司 一种玻璃纤维增强水泥制品成型用喷射车
CN109870880A (zh) * 2019-04-09 2019-06-11 合肥京东方显示技术有限公司 涂胶设备及涂胶方法
CN114798277B (zh) * 2022-04-21 2024-04-26 宁夏众源建材有限公司 一种建筑用铝合金型材处理方法及其生产线
CN115971003A (zh) * 2022-12-29 2023-04-18 王道胜 一种光伏薄膜组件涂覆工艺
CN115921168B (zh) * 2023-02-10 2023-10-03 东莞市华纬涂装设备有限公司 一种多工位喷涂机械手
CN117920534B (zh) * 2024-03-25 2024-06-18 武汉驿路通科技股份有限公司 一种fbg光栅自动点胶设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201106108A (en) * 2009-03-13 2011-02-16 Tokyo Electron Ltd Coating and developing apparatus, coating and developing method and storage medium
TW201236774A (en) * 2011-03-07 2012-09-16 Toray Eng Co Ltd Sweeping member, sweeping method of coater, and manufacturing method of sweeping device and display member
JP2013232611A (ja) * 2012-04-02 2013-11-14 Sokudo Co Ltd 露光装置、基板処理装置、基板の露光方法および基板処理方法

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JP3366630B2 (ja) * 2000-10-04 2003-01-14 大日本スクリーン製造株式会社 平面表示装置用の隔壁形成方法及びその装置
JP4183122B2 (ja) * 2003-04-21 2008-11-19 東京エレクトロン株式会社 現像処理方法及び現像処理装置
JP4183121B2 (ja) * 2003-04-14 2008-11-19 東京エレクトロン株式会社 現像処理方法及び現像処理装置
JP2004321980A (ja) * 2003-04-25 2004-11-18 Seiko Epson Corp 液滴吐出装置、及び液滴吐出方法
CN100467140C (zh) * 2004-05-10 2009-03-11 鸿富锦精密工业（深圳）有限公司 涂布装置
KR100643754B1 (ko) * 2004-11-26 2006-11-10 주식회사 엘지화학 2차원 또는 3차원 압출형재의 코팅장치 및 이를 이용한코팅방법
JP3836119B2 (ja) * 2004-11-29 2006-10-18 東京応化工業株式会社 塗布装置
JP4634265B2 (ja) * 2005-09-27 2011-02-16 東京エレクトロン株式会社 塗布方法及び塗布装置
JP2008012389A (ja) * 2006-07-03 2008-01-24 Dainippon Screen Mfg Co Ltd リブ形成装置
JP4738319B2 (ja) * 2006-11-15 2011-08-03 大日本スクリーン製造株式会社 パターン形成装置
JP4884991B2 (ja) * 2007-01-19 2012-02-29 東京エレクトロン株式会社 塗布処理装置
JP5244445B2 (ja) * 2008-04-24 2013-07-24 東京応化工業株式会社 塗布装置
CN102369572A (zh) * 2009-03-30 2012-03-07 芝浦机械电子装置股份有限公司 薄膜形成装置及薄膜形成方法
KR101182226B1 (ko) * 2009-10-28 2012-09-12 삼성디스플레이 주식회사 도포 장치, 이의 도포 방법 및 이를 이용한 유기막 형성 방법
JP5343030B2 (ja) * 2010-03-26 2013-11-13 大日本スクリーン製造株式会社 パターン形成装置
EA022794B1 (ru) * 2010-08-31 2016-03-31 Ниппон Стил Энд Сумитомо Метал Корпорейшн Устройство для нанесения покрытия для нанесения уф-отверждаемой смолы на резьбовой конец стальной трубы
JP5558993B2 (ja) * 2010-09-29 2014-07-23 芝浦メカトロニクス株式会社 接着剤供給装置及び接着剤供給方法
JP2012143691A (ja) * 2011-01-11 2012-08-02 Dainippon Screen Mfg Co Ltd パターン形成方法およびパターン形成装置
JP5741078B2 (ja) * 2011-03-09 2015-07-01 セイコーエプソン株式会社 印刷装置
JP5819621B2 (ja) * 2011-03-25 2015-11-24 株式会社Ｓｃｒｅｅｎホールディングス パターン形成方法およびパターン形成装置
JP2012217884A (ja) * 2011-04-05 2012-11-12 Olympus Corp 接着剤塗布装置および接着剤塗布方法
JP5771432B2 (ja) * 2011-04-13 2015-08-26 東京応化工業株式会社 塗布装置
JP5864141B2 (ja) * 2011-06-16 2016-02-17 株式会社日立製作所 薄膜形成装置および薄膜形成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201106108A (en) * 2009-03-13 2011-02-16 Tokyo Electron Ltd Coating and developing apparatus, coating and developing method and storage medium
TW201236774A (en) * 2011-03-07 2012-09-16 Toray Eng Co Ltd Sweeping member, sweeping method of coater, and manufacturing method of sweeping device and display member
JP2013232611A (ja) * 2012-04-02 2013-11-14 Sokudo Co Ltd 露光装置、基板処理装置、基板の露光方法および基板処理方法

Also Published As

Publication number Publication date
KR101651007B1 (ko) 2016-08-24
JP6452318B2 (ja) 2019-01-16
JP2015217362A (ja) 2015-12-07
CN105080766A (zh) 2015-11-25
CN105080766B (zh) 2017-08-11
TW201544195A (zh) 2015-12-01
KR20150133623A (ko) 2015-11-30

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