TWI574745B - Coating apparatus and coating method for a substrate - Google Patents

Coating apparatus and coating method for a substrate Download PDF

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Publication number
TWI574745B
TWI574745B TW103124124A TW103124124A TWI574745B TW I574745 B TWI574745 B TW I574745B TW 103124124 A TW103124124 A TW 103124124A TW 103124124 A TW103124124 A TW 103124124A TW I574745 B TWI574745 B TW I574745B
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nozzle
coating
substrate
support column
hardening
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TW103124124A
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Chinese (zh)
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TW201544195A (en
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戶內八郎
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中外爐工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/26Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065After-treatment
    • B05D3/067Curing or cross-linking the coating

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Spray Control Apparatus (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)

Description

基板之塗佈裝置及基板之塗佈方法 Substrate coating device and substrate coating method

本發明係關於一種基板之塗佈裝置及基板之塗佈方法,其等係為了使基板之塗膜厚度均勻化,尤其是即便於至少於基板之塗佈終點端使噴嘴朝向上方移動之情形時,亦可使追隨於噴嘴之硬化手段對塗液之硬化處理均質化,並且可提高處理控制之靈活性。 The present invention relates to a substrate coating apparatus and a method of coating a substrate, in order to uniformize the thickness of a coating film of a substrate, in particular, even when the nozzle is moved upward at least at the coating end point of the substrate. It is also possible to homogenize the hardening treatment of the coating liquid by the hardening means following the nozzle, and the flexibility of the treatment control can be improved.

習知,已知有利用自升降自由地支撐於在噴嘴用移行軌道移行之噴嘴用支撐柱之噴嘴吐出之塗液對載置於工作台(平台)之基板進行塗佈的基板之塗佈裝置、所謂之工作台塗佈機。作為於此種基板之塗佈裝置包含用以使塗佈於基板之塗液硬化之硬化手段之塗佈裝置,已知有專利文獻1及2。 Conventionally, there has been known a coating apparatus for a substrate coated on a substrate placed on a table (platform) by a coating liquid which is supported by a nozzle for supporting a nozzle for moving a nozzle for a nozzle by a traveling rail. The so-called workbench coater. Patent Document 1 and 2 are known as a coating device for such a substrate, which includes a coating device for curing a coating liquid applied to a substrate.

專利文獻1之「圖案形成方法及圖案形成裝置」係自吐出噴嘴前端之吐出口朝向基板吐出塗佈液,並且自第1照射光源對剛塗佈於基板後之塗佈液照射波長365nm之紫外線(UV,ultraviolet)光。藉此,塗佈液之表面硬化。接下來,自第2照射光源對接受了先前之UV光之照射之塗佈液照射更長波長(例如385nm或395nm)之UV光。長波長之光滲透至塗佈液之更內部,因此促進內部之硬化。照射光源係經由頭部之基座與注射泵而與吐出噴嘴連結。 In the "pattern forming method and pattern forming apparatus" of the patent document 1, the coating liquid is discharged from the discharge port at the tip end of the discharge nozzle toward the substrate, and the coating liquid immediately after being applied to the substrate is irradiated with ultraviolet rays having a wavelength of 365 nm from the first irradiation light source. (UV, ultraviolet) light. Thereby, the surface of the coating liquid is hardened. Next, the coating liquid that has received the irradiation of the previous UV light is irradiated with UV light of a longer wavelength (for example, 385 nm or 395 nm) from the second irradiation source. The long-wavelength light penetrates into the interior of the coating liquid, thus promoting internal hardening. The illumination source is coupled to the ejection nozzle via a pedestal of the head and a syringe pump.

專利文獻2之「薄膜形成裝置及薄膜形成方法」中之薄 膜形成裝置具備:吸附台,其吸附保持塗佈對象物;數個塗佈頭,其係一方面自噴墨式噴嘴對吸附保持於吸附台之塗佈對象物之表面吐出塗佈材,一方面進行薄膜形成;及支架,其使塗佈頭於塗佈對象物之上方位置移動;且於支架進而包含加熱塗佈對象物之表面之熱源裝置。熱源裝置係經由支架而與塗佈頭連結。 Thin in the "film forming apparatus and film forming method" of Patent Document 2 The film forming apparatus includes a suction stage that adsorbs and holds the object to be coated, and a plurality of coating heads that discharge the coating material from the surface of the object to be coated adsorbed and held on the adsorption stage by the inkjet nozzle. The film is formed; and a holder that moves the coating head above the object to be coated; and the holder further includes a heat source device that heats the surface of the object to be coated. The heat source device is coupled to the coating head via a holder.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2012-143691號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2012-143691

[專利文獻2]日本專利特開2013-000656號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2013-000656

為了以均勻之塗膜厚度塗佈基板,需要將移行之噴嘴與基板之間之間隙間隔保持為固定。根據需要,噴嘴之移行速度亦被加速減速。尤其是,如圖8(a)所示,若於塗佈結束之基板a之塗佈終點端停止自噴嘴b吐出塗液c,則有塗液c隆起等於塗膜厚度產生不規則之傾向。 In order to coat the substrate with a uniform coating thickness, it is necessary to keep the gap between the moving nozzle and the substrate constant. The nozzle travel speed is also accelerated and decelerated as needed. In particular, as shown in Fig. 8(a), when the coating liquid c is discharged from the nozzle b at the application end point of the substrate a after the application is applied, the coating liquid c is swelled to be equal to the thickness of the coating film.

為了防止塗膜厚度之不規則而於塗佈終點端亦確保均勻之塗膜厚度,如圖8(b)所示,進行如下動作:一方面於噴嘴b即將到達塗佈終點端之前停止塗液c之吐出並調整噴嘴b之移行速度,一方面使該噴嘴b向上方緩慢移動(向斜上方移動)。 In order to prevent the irregularity of the thickness of the coating film and to ensure a uniform coating film thickness at the coating end, as shown in FIG. 8(b), the following operation is performed: on the one hand, the coating liquid is stopped before the nozzle b reaches the coating end. The spout of c is adjusted and the moving speed of the nozzle b is adjusted, and on the other hand, the nozzle b is slowly moved upward (moving obliquely upward).

如圖8(c)所示,於包含硬化手段d之情形時,為了使塗佈於基板a之塗液c於基板a整個面均質地硬化(圖中以黑色部分表示),需要將硬化手段d與基板a之間之間隙間隔e保持為固定。於背 景技術所揭示之將硬化手段d連結於噴嘴b之構成中,硬化手段d亦與噴嘴b一起移行,若使噴嘴b於塗佈終點端朝向上方移動,則如圖示般硬化手段d亦追隨噴嘴b而上升。 As shown in FIG. 8(c), in the case where the curing means d is included, in order to uniformly coat the coating liquid c applied to the substrate a on the entire surface of the substrate a (indicated by a black portion in the drawing), it is necessary to use a hardening means. The gap interval e between d and the substrate a is kept constant. Back In the configuration of the nozzle b, the hardening means d is connected to the nozzle b, and the hardening means d also moves together with the nozzle b. When the nozzle b is moved upward at the coating end point, the hardening means d also follows as shown. The nozzle b rises.

若硬化手段d上升,則硬化手段d與基板a之間隙間隔以擴大(圖中以f表示)之方式變化,其結果,有無法於塗佈終點端使塗液c均質地硬化或者硬化變得不充分之問題。 When the hardening means d rises, the gap between the hardening means d and the substrate a is widened (indicated by f in the drawing), and as a result, the coating liquid c cannot be uniformly hardened or hardened at the coating end point. Insufficient problem.

又,亦執行如下方法,即,代替圖8(b)、(c)之動作,一方面與噴嘴b到達塗佈終點端之同時停止塗液c之吐出,一方面使噴嘴b向正上方上升,但於該情形時,有如下問題:在硬化手段d未到達塗佈終點端之期間內,硬化手段d與基板a之間隙間隔擴大,而無法使塗佈終點端正常地硬化。 Further, in place of the operations of Figs. 8(b) and (c), the discharge of the coating liquid c is stopped while the nozzle b reaches the coating end point, and the nozzle b is raised upward. However, in this case, there is a problem that the gap between the hardening means d and the substrate a is widened during the period in which the hardening means d does not reach the coating end point, and the coating end point cannot be normally hardened.

又,噴嘴b之移行速度(塗佈處理速度)與硬化手段d之移行速度(硬化處理速度)分別個別地具有適合之條件。然而,於將硬化手段d連結於噴嘴b之構成中,塗佈處理與硬化處理之速度變得相等。因此,對於塗佈處理及硬化處理之各者,無法進行將速度設為參數之控制。 Further, the moving speed of the nozzle b (coating processing speed) and the moving speed (hardening processing speed) of the curing means d are individually and appropriately set. However, in the configuration in which the hardening means d is coupled to the nozzle b, the speeds of the coating treatment and the hardening treatment become equal. Therefore, it is impossible to control the speed as a parameter for each of the coating treatment and the hardening treatment.

如此,於連結噴嘴b與硬化手段d之構成中,亦存在如下問題:塗佈處理或硬化處理之參數係被限制於以速度以外之,間隙間隔或噴嘴b之塗液吐出量控制、硬化手段d之容量控制等,而缺乏處理控制之靈活性。 As described above, in the configuration of the connection nozzle b and the hardening means d, there is also a problem that the parameters of the coating treatment or the hardening treatment are limited to the gap discharge or the coating liquid discharge amount control of the nozzle b, and the hardening means. The capacity control of d, etc., lacks the flexibility of process control.

本發明係鑒於上述習知之問題而發明者,其目的在於提供一種基板之塗佈裝置及基板之塗佈方法,該基板之塗佈裝置及基板之塗佈方法為了使基板之塗膜厚度均勻化,尤其是即便於基板之塗佈終點端使噴嘴朝向上方移動之情形時,至少亦可使追隨於噴嘴之硬化 手段對塗液之硬化處理均質化,並且可提高處理控制之靈活性。 The present invention has been made in view of the above problems, and an object of the invention is to provide a substrate coating apparatus and a substrate coating method, wherein the substrate coating apparatus and the substrate coating method are used to uniformize the coating film thickness of the substrate. In particular, even if the nozzle is moved upward toward the coating end of the substrate, at least the hardening of the nozzle can be followed. The means homogenizes the hardening treatment of the coating liquid and improves the flexibility of the treatment control.

本發明之基板之塗佈裝置係一種利用自噴嘴所吐出之塗液對基板進行塗佈處理,並利用硬化手段對塗佈於該基板之塗液進行硬化處理,該噴嘴係以升降自如之方式被支撐於在移行軌道上移行之噴嘴用支撐柱,上述基板之塗佈裝置的特徵在於:具備有硬化手段用支撐柱,該硬化手段用支撐柱係獨立於噴嘴用支撐柱之移行而以單獨之方式在上述移行軌道上移行,並且獨立於上述噴嘴之升降動作而以單獨之方式升降自如地支撐上述硬化手段。 The coating device for a substrate of the present invention is a method of coating a substrate with a coating liquid discharged from a nozzle, and hardening the coating liquid applied to the substrate by a curing means, and the nozzle is lifted and floated freely. A support column for a nozzle that is supported on a travel track, and the coating device for the substrate is characterized in that: a support column for a hardening means is provided, and the support column is separated from the nozzle support column by a support column. The manner of moving on the above-described traveling track and supporting the above-described hardening means in a separate manner independently of the lifting operation of the above nozzle.

本發明之基板之塗佈裝置之特徵在於,上述移行軌道係包含有以接近於上述基板之方式所配置之第1移行軌道構件、及以相較於該第1移行軌道構件而更遠離自該基板之方式所配置之第2移行軌道構件,於上述第1移行軌道構件,供上述噴嘴用支撐柱進行移行,於上述第2移行軌道構件,供上述硬化手段用支撐柱進行移行,且該硬化手段用支撐柱係利用到達至上述噴嘴之上方的升降行程量而以升降自如之方式支撐上述硬化手段。 In the coating apparatus for a substrate according to the present invention, the traveling rail includes a first traveling rail member disposed so as to be close to the substrate, and further away from the first traveling rail member. The second transition rail member disposed on the substrate is configured to move the nozzle support column to the first travel rail member, and the second travel rail member is moved by the support means for the hardening means, and the hardening is performed The means supports the hardening means in a liftable manner by the support column using the amount of lifting stroke reaching the nozzle.

本發明之基板之塗佈裝置之特徵在於,上述移行軌道係包含有以接近於上述基板之方式所配置之第1移行軌道構件、及以相較於該第1移行軌道構件而更遠離自該基板之方式而配置之第2移行軌道構件,於上述第1移行軌道構件,供上述硬化手段用支撐柱進行移行,於上述第2移行軌道構件,供上述噴嘴用支撐柱進行移行,且該噴嘴用支撐柱係利用到達至上述硬化手段之上方的升降行程量而以升降自如之方式支撐上述噴嘴。 In the coating apparatus for a substrate according to the present invention, the traveling rail includes a first traveling rail member disposed so as to be close to the substrate, and further away from the first traveling rail member. The second transition rail member disposed in a manner of the substrate is moved by the support rail for the curing means in the first transition rail member, and the nozzle is supported by the nozzle for the second transition rail member, and the nozzle is moved. The nozzle is supported by the support column in an ascending and descending manner by the amount of the lift stroke reaching the upper side of the hardening means.

本發明之基板之塗佈裝置之特徵在於,上述硬化手段係 為UV照射體、發熱體或者乾燥機。 The coating device for a substrate of the present invention is characterized in that the hardening means is It is a UV irradiator, a heating element or a dryer.

本發明之基板之塗佈方法係為使用上述基板之塗佈裝置而對基板進行塗佈之方法,該上述基板之塗佈裝置係包含有硬化手段用支撐柱,該硬化手段用支撐柱係獨立於噴嘴用支撐柱之移行而以單獨之方式在上述移行軌道上移行,並且獨立於上述噴嘴之升降動作而以單獨之方式升降自如地支撐上述硬化手段,本發明之基板之塗佈方法之特徵在於包括:塗佈處理步驟,其一方面以自位在移行方向前方之上述基板之塗佈開始端而朝向塗佈終點端之方式移行上述噴嘴用支撐柱並利用自上述噴嘴所吐出之塗液對該基板進行塗佈處理,一方面以自噴嘴用支撐柱之移行方向後方而追隨於該噴嘴用支撐柱之方式並以自該基板之塗佈開始端而朝向塗佈終點端之方式使上述硬化手段用支撐柱進行移行,並利用上述硬化手段對塗佈於該基板之塗液進行硬化處理;及塗佈終點端處理步驟,其上述噴嘴用支撐柱係當到達至上述基板之塗佈終點端區域時,使上述噴嘴上升並移行,另一方面,上述硬化手段用支撐柱係一方面將上述硬化手段之高度位置維持為一定而一方面進行移行。 The coating method of the substrate of the present invention is a method of coating a substrate by using a coating device for the substrate, wherein the coating device for the substrate includes a support column for a hardening means, and the curing means is independent of the support column The method of coating the substrate of the present invention is characterized in that the nozzle is moved in a separate manner on the above-mentioned transition rail by the movement of the support column, and the above-mentioned hardening means is supported in a separate manner independently of the lifting operation of the nozzle. The present invention includes a coating treatment step of moving the nozzle support column toward the coating end point and applying the coating liquid discharged from the nozzle from the coating start end of the substrate in front of the traveling direction. The coating treatment is performed on the substrate so as to follow the nozzle support column from the rear of the nozzle support column and to the coating end point from the coating start end of the substrate. The hardening means is carried out by the support column, and the coating liquid applied to the substrate is hardened by the above-mentioned hardening means; and the coating end point In the processing step, when the nozzle supporting column reaches the coating end end region of the substrate, the nozzle is raised and moved. On the other hand, the curing column supports the height position of the hardening means on the one hand. Maintaining a certain and moving on the one hand.

本發明之基板之塗佈方法係為使用上述基板之塗佈裝置而以往返移行上述噴嘴及上述硬化手段之方式對基板進行塗佈之方法,上述基板之塗佈裝置之上述移行軌道係包含有以接近於上述基板之方式所配置之第1移行軌道構件、及以相較於該第1移行軌道構件而更遠離自該基板之方式所配置之第2移行軌道構件,於上述第1移行軌道構件,供上述噴嘴用支撐柱進行移行,於上述第2移行軌道構件,供上述硬化手段用支撐柱進行移行,且該硬化手段用支撐柱係利用到達至上述噴嘴之上方的升降行程量而以升降自如之方式支撐上述 硬化手段,本發明之基板之塗佈方法之特徵在於包括有:塗佈處理步驟,其一方面以自位在移行方向前方之上述基板之塗佈開始端而朝向塗佈終點端之方式移行上述噴嘴用支撐柱並利用自該噴嘴所吐出之塗液對該基板進行塗佈處理,一方面以自噴嘴用支撐柱之移行方向後方而追隨於該噴嘴用支撐柱之方式並以自該基板之塗佈開始端而朝向塗佈終點端之方式使上述硬化手段用支撐柱進行移行,並利用上述硬化手段對塗佈於該基板之塗液進行硬化處理;塗佈終點端處理步驟,其上述噴嘴用支撐柱係當到達至上述基板之塗佈終點端區域時,使上述噴嘴上升並移行,另一方面,上述硬化手段用支撐柱係一方面將上述硬化手段之高度位置維持為一定而一方面進行移行;及位置互換步驟,其至少在結束自上述噴嘴之塗液之吐出且停止上述噴嘴用支撐柱及上述硬化手段用支撐柱之後,執行上述硬化手段之朝向該噴嘴上方之上升、該硬化手段用支撐柱之朝向該硬化手段跨越該噴嘴之位置之移行、以及該硬化手段之下降,且相對於相反方向之移行方向而將該噴嘴與該硬化手段加以重新排列;且以反覆之方式重複進行上述塗佈處理步驟至上述位置互換步驟。 The coating method of the substrate of the present invention is a method of coating a substrate by reciprocating the nozzle and the curing means by using a coating device for the substrate, and the traveling track of the coating device of the substrate includes a first transition rail member disposed so as to be close to the substrate, and a second transition rail member disposed further away from the substrate than the first travel rail member, in the first transition rail The member is moved by the support column for the nozzle, and the second transfer rail member is moved by the support column for the curing means, and the reinforcing member uses the support column to reach the lift stroke amount above the nozzle. Elevating and supporting the above The hardening means, the coating method of the substrate of the present invention is characterized by comprising: a coating treatment step of shifting the above-mentioned manner toward the coating end point by the coating start end of the substrate in front of the traveling direction The nozzle is coated with the coating column and coated with the coating liquid discharged from the nozzle, and follows the nozzle supporting column from the rear of the nozzle supporting column in the traveling direction and from the substrate. The curing means is moved by the support column so as to be applied to the end point of the coating, and the coating liquid applied to the substrate is hardened by the curing means; the end point processing step is applied, and the nozzle is When the support column reaches the coating end point region of the substrate, the nozzle is raised and moved. On the other hand, the reinforcing column support column is used to maintain the height position of the hardening means to a certain extent. Performing a migration; and a position interchange step of discharging the coating liquid from the nozzle at least and stopping the nozzle support column and the hard After the support column is used, the upward movement of the hardening means toward the upper side of the nozzle, the movement of the support column for the hardening means toward the position of the hardening means across the nozzle, and the lowering of the hardening means are performed, and the opposite direction is performed. The nozzle and the hardening means are rearranged in the direction of travel; and the coating process step to the above-described position interchange step are repeated in a repeated manner.

本發明之基板之塗佈方法係為使用上述基板之塗佈裝置而以往返移行上述噴嘴及上述硬化手段之方式對基板進行塗佈之方法,上述基板之塗佈裝置之上述移行軌道係包含有以接近於上述基板之方式所配置之第1移行軌道構件、及以相較於該第1移行軌道構件而更遠離自該基板之方式所配置之第2移行軌道構件,於上述第1移行軌道構件,供上述硬化手段用支撐柱進行移行,於上述第2移行軌道構件,供上述噴嘴用支撐柱進行移行,且該噴嘴用支撐柱係利用到達至上述硬化手段之上方的升降行程量而以升降自如之方式支撐上述 噴嘴,本發明之基板之塗佈方法之特徵在於包括:塗佈處理步驟,其一方面以自位在移行方向前方之上述基板之塗佈開始端而朝向塗佈終點端之方式移行上述噴嘴用支撐柱並利用自該噴嘴所吐出之塗液對該基板進行塗佈處理,一方面以自噴嘴用支撐柱之移行方向後方而追隨於該噴嘴用支撐柱之方式並以自該基板之塗佈開始端而朝向塗佈終點端之方式使上述硬化手段用支撐柱進行移行,並利用上述硬化手段對塗佈於該基板之塗液進行硬化處理;塗佈終點端處理步驟,其上述噴嘴用支撐柱係當到達至上述基板之塗佈終點端區域時,使上述噴嘴上升並移行,另一方面,上述硬化手段用支撐柱係一方面將上述硬化手段之高度位置維持為一定而一方面進行移行;及位置互換步驟,其至少至結束自上述噴嘴之塗液之吐出且停止上述噴嘴用支撐柱及上述硬化手段用支撐柱之後,執行該噴嘴之朝向上述硬化手段上方之上升、該噴嘴用支撐柱之朝向該噴嘴跨越該硬化手段之位置之移行、以及該噴嘴之下降,並相對於相反方向之移行方向將該噴嘴與該硬化手段加以重新排列;且以反覆之方式重複進行上述塗佈處理步驟至上述位置互換步驟。 The coating method of the substrate of the present invention is a method of coating a substrate by reciprocating the nozzle and the curing means by using a coating device for the substrate, and the traveling track of the coating device of the substrate includes a first transition rail member disposed so as to be close to the substrate, and a second transition rail member disposed further away from the substrate than the first travel rail member, in the first transition rail The member is moved by the support column for the hardening means, and the second transfer rail member is moved by the nozzle support column, and the nozzle support column is used by the lift stroke amount reaching the upper side of the hardening means Elevating and supporting the above The nozzle, the coating method of the substrate of the present invention, comprising: a coating treatment step of moving the nozzle toward the coating end point from the coating start end of the substrate in front of the traveling direction. The substrate is coated by the coating liquid discharged from the nozzle, and the substrate is followed by the support column of the nozzle from the rear of the nozzle supporting column and coated from the substrate. Starting at the end of the coating, the curing means is moved by the support column, and the coating liquid applied to the substrate is hardened by the curing means; the coating end treatment step, the nozzle support When the column reaches the coating end point region of the substrate, the nozzle is raised and moved. On the other hand, the reinforcing column supporting column is configured to maintain the height position of the hardening means and to move on the one hand. And a position interchange step of at least ending the discharge of the coating liquid from the nozzle and stopping the nozzle support column and the hardening means After the support column, the upward movement of the nozzle toward the upper side of the hardening means, the movement of the nozzle support column toward the position of the nozzle across the hardening means, and the lowering of the nozzle are performed, and the direction of the opposite direction is The nozzles are rearranged with the hardening means; and the coating process step to the above-described position interchange step is repeated in a repeated manner.

本發明之基板之塗佈裝置及基板之塗佈方法係為了使基板之塗膜厚度均勻化,尤其是即便於至少於基板之塗佈終點端使噴嘴朝向上方移動之情形時,亦可使追隨於噴嘴之硬化手段對塗液之硬化處理均質化,並且可提高處理控制之靈活性。 The coating apparatus of the substrate of the present invention and the method of coating the substrate are designed to make the thickness of the coating film of the substrate uniform, in particular, even if the nozzle is moved upward at least at the coating end point of the substrate. The hardening means of the nozzle homogenizes the hardening treatment of the coating liquid, and the flexibility of the treatment control can be improved.

1‧‧‧基板之塗佈裝置 1‧‧‧Substrate coating device

2‧‧‧基板 2‧‧‧Substrate

3‧‧‧工作台 3‧‧‧Workbench

4‧‧‧基台 4‧‧‧Abutment

5‧‧‧移行軌道 5‧‧‧Move track

5a‧‧‧第1移行軌道構件 5a‧‧‧1st moving track member

5b‧‧‧第2移行軌道構件 5b‧‧‧2nd moving rail member

6、6A、6B‧‧‧噴嘴用支撐柱 6, 6A, 6B‧‧‧ nozzle support column

7、7A、7B‧‧‧噴嘴 7, 7A, 7B‧‧‧ nozzle

8‧‧‧硬化手段用支撐柱 8‧‧‧Support column for hardening means

9‧‧‧硬化手段 9‧‧‧hardening means

a‧‧‧基板 A‧‧‧substrate

b‧‧‧噴嘴 B‧‧‧Nozzle

c‧‧‧塗液 C‧‧‧coating solution

d‧‧‧硬化手段 D‧‧‧hardening means

D‧‧‧塗液 D‧‧‧coating solution

e‧‧‧間隙間隔 E‧‧‧ gap interval

f‧‧‧擴大 f‧‧‧Expand

g1‧‧‧間隙間隔 G1‧‧‧ gap interval

g2‧‧‧間隙間隔 G2‧‧‧ gap interval

H‧‧‧升降行程量 H‧‧‧ Lifting stroke

L‧‧‧UV光 L‧‧‧UV light

s1‧‧‧硬化手段之向噴嘴上方之上升 S1‧‧‧The rise of the hardening means above the nozzle

s2‧‧‧硬化手段用支撐柱之向硬化手段跨越噴嘴之位置之移行 S2‧‧‧hardening means the movement of the support column to the position of the nozzle across the hardening means

s3‧‧‧硬化手段之下降 S3‧‧‧The decline in hardening means

v1‧‧‧移行速度 V1‧‧‧Transition speed

v2‧‧‧移行速度 V2‧‧‧Transition speed

x1‧‧‧噴嘴之升降動作 X1‧‧‧ nozzle lifting action

x2‧‧‧硬化手段之升降動作 X2‧‧‧ Lifting action of hardening means

y、y1、y2‧‧‧噴嘴與硬化手段之距離 Y, y1, y2‧‧‧ distance between nozzle and hardening means

Z‧‧‧塗佈終點端區域 Z‧‧‧ Coating end zone

圖1係表示本發明之基板之塗佈裝置之較佳之一實施形態之立體 圖。 1 is a perspective view showing a preferred embodiment of a coating apparatus for a substrate of the present invention; Figure.

圖2係圖1所示之基板之塗佈裝置之側視圖。 Figure 2 is a side elevational view of the coating apparatus of the substrate shown in Figure 1.

圖3係說明本發明之基板之塗佈方法之較佳之一實施形態之說明圖,且關於「使噴嘴上升並移行」之一態樣,圖3(a)係表示塗佈處理步驟之圖,圖3(b)係表示塗佈終點端處理步驟之前半部分之圖,圖3(c)係表示塗佈終點端處理步驟之後半部分之圖。 Fig. 3 is an explanatory view showing a preferred embodiment of a method for coating a substrate of the present invention, and Fig. 3(a) is a view showing a step of a coating process, with respect to one aspect of "moving and moving the nozzle". Fig. 3(b) is a view showing a half before the coating end treatment step, and Fig. 3(c) is a view showing a half after the coating end treatment step.

圖4係說明本發明之基板之塗佈方法之另一實施形態之說明圖,且關於「使噴嘴上升並移行」之另一態樣,圖4(a)係表示塗佈處理步驟之圖,圖4(b)係表示塗佈終點端處理步驟之第1階段之圖,圖4(c)係表示塗佈終點端處理步驟之第2階段之圖,圖4(d)係表示塗佈終點端處理步驟之第3階段之圖。 4 is an explanatory view showing another embodiment of a method of coating a substrate of the present invention, and FIG. 4(a) is a view showing a coating processing step, in another aspect of "moving and moving the nozzle". Fig. 4(b) is a view showing a first stage of the coating end treatment step, Fig. 4(c) is a view showing a second stage of the coating end treatment step, and Fig. 4(d) is a coating end point. Diagram of the third stage of the end processing step.

圖5係表示本發明之基板之塗佈方法之變形例。圖5(a)係表示位置互換步驟之前半部分、圖5(b)係表示位置互換步驟之後半部分、圖5(c)係表示位置互換步驟後之塗佈處理步驟之圖。 Fig. 5 is a view showing a modification of the coating method of the substrate of the present invention. Fig. 5(a) shows the first half of the position interchange step, Fig. 5(b) shows the second half of the position interchange step, and Fig. 5(c) shows the coating process step after the position interchange step.

圖6係表示本發明之基板之塗佈裝置之變形例之側視圖。 Fig. 6 is a side view showing a modification of the coating apparatus for a substrate of the present invention.

圖7係表示本發明之基板之塗佈裝置之另一變形例之側視圖。 Fig. 7 is a side view showing another modification of the coating apparatus for a substrate of the present invention.

圖8係用以說明習知技術之問題之說明圖,圖8(a)係表示於塗膜厚度產生不規則之情況之圖,圖8(b)係表示使噴嘴向斜上方移動之情況之圖,圖8(c)係表示硬化手段與基板之間之間隙間隔擴大之情況之圖。 Fig. 8 is an explanatory view for explaining a problem of the prior art, wherein Fig. 8(a) shows a case where the thickness of the coating film is irregular, and Fig. 8(b) shows a case where the nozzle is moved obliquely upward. Fig. 8(c) is a view showing a state in which the gap between the hardening means and the substrate is widened.

以下,參照隨附圖式對本發明之基板之塗佈裝置及基板之塗佈方法之較佳之實施形態進行詳細說明。圖1係表示本發明之基板之塗佈裝置之較佳之一實施形態之立體圖,圖2係圖1所示之基板 之塗佈裝置之側視圖,圖3係說明本發明之基板之塗佈方法之較佳之一實施形態之說明圖。圖3(a)表示塗佈處理步驟,圖3(b)表示塗佈終點端處理步驟之前半部分,圖3(c)表示塗佈終點端處理步驟之後半部分。 Hereinafter, preferred embodiments of the substrate coating apparatus and the substrate coating method of the present invention will be described in detail with reference to the accompanying drawings. 1 is a perspective view showing a preferred embodiment of a coating apparatus for a substrate of the present invention, and FIG. 2 is a substrate shown in FIG. Fig. 3 is a side view showing a preferred embodiment of the coating method of the substrate of the present invention. Fig. 3(a) shows the coating treatment step, Fig. 3(b) shows the first half of the coating end treatment step, and Fig. 3(c) shows the second half of the coating end treatment step.

如圖1及圖2所示,本實施形態之基板之塗佈裝置1主要具備如下構件而構成,即:工作台(平台)3,其供載置作為塗佈對象之基板2;移行軌道5,其係於工作台3外側之基台4上以自左右寬度方向夾住基板2之配置配設有左右一對;左右一對噴嘴用支撐柱6,其等沿著移行軌道5移行;噴嘴7,其架設於該等噴嘴用支撐柱6之間而設置;左右一對硬化手段用支撐柱8,其等自噴嘴用支撐柱6錯開位置並沿著移行軌道5移行;及硬化手段9,其架設於該等硬化手段用支撐柱8之間而設置。 As shown in FIG. 1 and FIG. 2, the substrate coating apparatus 1 of the present embodiment mainly includes a table (platform) 3 on which a substrate 2 to be coated is placed, and a traveling track 5; A pair of left and right pairs are disposed on the base 4 outside the table 3 so as to sandwich the substrate 2 from the left-right width direction; a pair of left and right nozzle support columns 6 are moved along the travel track 5; 7. The yoke is disposed between the nozzle support columns 6; the left and right pair of hardening means support columns 8 are displaced from the nozzle support column 6 and moved along the travel track 5; and the hardening means 9, It is installed between the support columns 8 for hardening means.

於本實施形態中,左右一對移行軌道5係分別具備左右各2條之第1移行軌道構件5a及第2移行軌道構件5b而構成。第1移行軌道構件5a係接近基板2而配置。第2移行軌道構件5b係較第1移行軌道構件5a更自基板2遠離而配置。 In the present embodiment, the pair of right and left travel rails 5 are provided with two first and second transfer rail members 5a and two second travel rail members 5b. The first transfer rail member 5a is disposed close to the substrate 2. The second travel rail member 5b is disposed farther from the substrate 2 than the first travel rail member 5a.

因此,第1移行軌道構件5a係配置於第2移行軌道構件5b與基板2之間。於本實施形態中,於第1移行軌道構件5a,供噴嘴用支撐柱6移行,且於第2移行軌道構件5b,供硬化手段用支撐柱8移行。 Therefore, the first traveling rail member 5a is disposed between the second traveling rail member 5b and the substrate 2. In the present embodiment, the first travel rail member 5a is moved by the nozzle support column 6, and the second travel rail member 5b is moved by the support means 8 for the hardening means.

於本實施形態中,移行軌道5使用有左右各2條之第1及第2移行軌道構件5a、5b,由4條軌道構件構成,但亦可使用兼具第1及第2移行軌道構件5a、5b之左右各1條之軌道構件而構成。即,亦可為於基板2之左右兩側各配置1條軌道構件之構成。於此情形時, 噴嘴用支撐柱6及硬化手段用支撐柱8係沿著同一軌道構件移行。 In the present embodiment, the first and second traveling rail members 5a and 5b having two left and right rails are used in the traveling rail 5, and are composed of four rail members. However, the first and second traveling rail members 5a may be used. And one or two rail members of each of 5b. In other words, one rail member may be disposed on each of the right and left sides of the substrate 2. In this case, The nozzle support column 6 and the hardening means support column 8 are moved along the same rail member.

於使用4條軌道構件之情形或使用2條軌道構件之情形時,均係以於噴嘴用支撐柱6、硬化手段用支撐柱8移行時架設於各噴嘴用支撐柱6、硬化手段用支撐柱8之間之噴嘴7與硬化手段9不干涉之方式,噴嘴用支撐柱6與硬化手段用支撐柱8於移行方向上錯開位置而配置。因此,例如於噴嘴7於前進方向(塗佈處理方向)上先行而硬化手段9追隨之情形時,於後退方向(返回方向)上,硬化手段9先行而噴嘴7追隨。 In the case of using four rail members or in the case of using two rail members, the nozzle support column 6 and the hardening means support column 8 are erected on each nozzle support column 6 and the hardening means support column. The nozzle 7 between the 8 and the hardening means 9 do not interfere with each other, and the nozzle support column 6 and the hardening means support column 8 are arranged at positions shifted in the traveling direction. Therefore, for example, when the nozzle 7 is advanced in the advancing direction (coating processing direction) and the curing means 9 is followed, the curing means 9 is advanced in the backward direction (returning direction) and the nozzle 7 follows.

工作台3具有以較高之平面度形成之上表面,且於該上表面上可更換地配置平板狀之基板2。 The table 3 has an upper surface formed with a high degree of flatness, and a flat substrate 2 is replaceably disposed on the upper surface.

於左右一對第1移行軌道構件5a移行之噴嘴用支撐柱6係由周知之線性馬達或滾珠螺桿機構移行驅動。噴嘴用支撐柱6係於基板2之長度方向上自該基板2之一端(塗佈開始端)側向另一端(塗佈終點端)側沿著第1移行軌道構件5a移行。左右一對噴嘴用支撐柱6與架設於該等之間之噴嘴7係將噴嘴用支撐柱6作為左右之柱,將噴嘴7作為橫跨基板2之寬度方向之橫向之橫架材,而以門型形態構成。 The nozzle support column 6 that moves to the left and right pair of first transfer rail members 5a is driven by a known linear motor or a ball screw mechanism. The nozzle support column 6 is moved along the first transfer rail member 5a from the one end (application start end) side to the other end (coating end end) side of the substrate 2 in the longitudinal direction of the substrate 2. The pair of right and left nozzle support columns 6 and the nozzles 7 that are placed between the nozzles 7 are used as the left and right columns, and the nozzles 7 are transversely transverse frames that straddle the width direction of the substrate 2, and The shape of the door is formed.

噴嘴7係其左右兩端升降自由地支撐於該等噴嘴用支撐柱6之各者,且於工作台3或基板2上升降。噴嘴7係藉由升降而被調整與基板2之上下方向間隙間隔g1(參照圖3)。設置於各噴嘴用支撐柱6且使噴嘴7升降之機構亦由周知之滾珠螺桿機構或線性馬達等構成。 The nozzles 7 are supported by the left and right ends of the nozzle support column 6 so as to be lifted and lowered, and are lifted and lowered on the table 3 or the substrate 2. The nozzle 7 is adjusted to be spaced apart from the upper and lower gaps g1 of the substrate 2 by raising and lowering (see FIG. 3). The mechanism provided for each nozzle support column 6 and raising and lowering the nozzle 7 is also constituted by a well-known ball screw mechanism, a linear motor or the like.

為了將塗液D供給至噴嘴7而於噴嘴7連接有未圖示之塗液供給手段。藉由自塗液供給手段將塗液D供給至噴嘴7,噴嘴7朝向基板2吐出塗液D。藉由自支撐於在第1移行軌道構件5a移行之噴嘴用支撐柱6之噴嘴7吐出塗液D,基板2被塗佈處理。 In order to supply the coating liquid D to the nozzle 7, a coating liquid supply means (not shown) is connected to the nozzle 7. The coating liquid D is supplied to the nozzle 7 by the coating liquid supply means, and the nozzle 7 discharges the coating liquid D toward the substrate 2. The coating liquid D is discharged by the nozzle 7 supported by the nozzle supporting column 6 that is moved by the first traveling rail member 5a, and the substrate 2 is coated.

於左右一對第2移行軌道構件5b移行之硬化手段用支撐柱8係藉由周知之線性馬達或滾珠螺桿機構而追隨在第1移行軌道構件5a移行之噴嘴用支撐柱6移行驅動。 The support means 8 for the hardening means for moving the pair of left and right second travel rail members 5b is driven by the nozzle support column 6 which is moved by the first travel rail member 5a by a known linear motor or ball screw mechanism.

硬化手段用支撐柱8係於基板2之長度方向上自該基板2之一端(塗佈開始端)側向另一端(塗佈終點端)側沿著第2移行軌道構件5b移行。左右一對硬化手段用支撐柱8與架設於該等之間之硬化手段9係將硬化手段用支撐柱8作為左右之柱,將硬化手段9作為橫跨基板2之寬度方向之橫向之橫架材,而以門型形態構成。 The curing means is supported by the support post 8 in the longitudinal direction of the substrate 2 from the one end (application start end) side of the substrate 2 to the other end (coating end end) side along the second transfer rail member 5b. The pair of right and left hardening means support posts 8 and the hardening means 9 mounted between them are used as the left and right pillars for the hardening means, and the hardening means 9 is used as the transverse cross frame across the width direction of the substrate 2. Material, but in the form of a door.

硬化手段9係其左右兩端升降自由地支撐於該等硬化手段用支撐柱8之各者,且於工作台3或基板2上升降。硬化手段9係藉由升降而被調整與基板2之上下方向間隙間隔g2(參照圖3)。設置於各硬化手段用支撐柱8且使硬化手段9升降之機構亦由滾珠螺桿機構或線性馬達等構成。 The curing means 9 is configured such that the left and right ends thereof are supported by the support columns 8 for the hardening means, and are lifted and lowered on the table 3 or the substrate 2. The hardening means 9 is adjusted to be spaced apart from the upper and lower gaps of the substrate 2 by g2 (see FIG. 3) by raising and lowering. The mechanism provided in each of the hardening means support columns 8 and the lifting means 9 is also raised and lowered by a ball screw mechanism or a linear motor.

作為硬化手段9,若塗液D為UV硬化型,則使用UV照射體,若塗液D為熱硬化型,則使用發熱體,若為自然乾燥型,則使用吐出空氣等乾燥用氣體之乾燥機。硬化手段9係藉由經由連接於其之未圖示之電氣配線供給之電力而朝向基板2發出UV光L,或經發熱而朝向基板2散熱,或朝向基板2噴射乾燥用氣體。 As the curing means 9, when the coating liquid D is of a UV curing type, a UV irradiation body is used, and if the coating liquid D is a thermosetting type, a heating element is used, and if it is a natural drying type, drying of a drying gas such as a discharge air is used. machine. The curing means 9 emits the UV light L toward the substrate 2 via the electric power supplied via the electric wiring (not shown) connected thereto, or radiates heat toward the substrate 2 by heat generation, or ejects the drying gas toward the substrate 2.

藉由自支撐於在第2移行軌道構件5b移行之硬化手段用支撐柱8之硬化手段9發出UV光L等,塗液D被硬化處理(圖中以黑色部分表示)。作為硬化手段9,當然可根據塗液D之種類採用各種硬化手段。 The coating liquid D is hardened (indicated by a black portion in the drawing) by emitting the UV light L or the like by the curing means 9 for supporting the column 8 by the hardening means for moving the second traveling rail member 5b. As the curing means 9, it is of course possible to employ various curing means depending on the type of the coating liquid D.

尤其是,於第2移行軌道構件5b移行之硬化手段用支撐柱8係與於第1移行軌道構件5a移行之噴嘴用支撐柱6之移行獨立而單獨移行。即,沿基板2之長度方向移行之噴嘴7與硬化手段9未 相互連結,而係個別地以獨自之移行速度移行。具體而言,硬化手段用支撐柱8及硬化手段9之移行速度v2只要為噴嘴用支撐柱6及噴嘴7之移行速度v1以下,則可根據硬化處理控制而設定為各種速度(參照圖2等)。 In particular, the reinforcing means for supporting the second traveling rail member 5b is independently moved by the support column 8 and the nozzle supporting column 6 which is moved by the first traveling rail member 5a. That is, the nozzle 7 and the hardening means 9 which are moved along the longitudinal direction of the substrate 2 are not Interconnected, and individually moved at their own speed. Specifically, the transfer speed v2 of the support means 8 and the curing means 9 for the curing means can be set to various speeds according to the curing process control as long as the transfer speed v1 of the nozzle support column 6 and the nozzle 7 is equal to or less (see FIG. 2, etc.) ).

又,升降自由地支撐於硬化手段用支撐柱8之硬化手段9係與升降自由地支撐於噴嘴用支撐柱6之噴嘴7獨立而單獨進行升降動作。即,噴嘴7與硬化手段9未相互連結,而係各自個別地進行升降動作(x1、x2)(參照圖2等)。 Further, the curing means 9 that is supported by the support means 8 for the hardening means is lifted and lowered independently from the nozzle 7 which is supported by the nozzle support column 6 so as to be lifted and lowered independently. In other words, the nozzle 7 and the curing means 9 are not connected to each other, and the lifting operation (x1, x2) is performed individually (see Fig. 2 and the like).

具體而言,噴嘴7係相對於基板2以塗膜厚度均勻化之方式進行升降動作並設定高度位置,另一方面,硬化手段9係相對於基板2以塗佈於基板2之塗液D之硬化處理均質化之方式進行升降動作並設定高度位置。 Specifically, the nozzle 7 is moved up and down with respect to the substrate 2 so that the thickness of the coating film is uniformized, and the height position is set. On the other hand, the curing means 9 is applied to the coating liquid D of the substrate 2 with respect to the substrate 2. The hardening treatment is performed in a manner of lifting and setting the height position.

繼而,對本實施形態之基板之塗佈方法進行說明。如圖1及圖2所示,於對基板2進行塗佈時,首先使噴嘴用支撐柱6、硬化手段用支撐柱8移行而將噴嘴7及硬化手段9移動至基台4之一端,而設為待機狀態。 Next, a method of applying the substrate of the present embodiment will be described. As shown in FIG. 1 and FIG. 2, when the substrate 2 is applied, the nozzle support column 6 and the curing means support column 8 are first moved to move the nozzle 7 and the curing means 9 to one end of the base 4, and Set to standby.

於待機狀態下,為了以設定之塗膜厚度對基板2進行塗佈,設定對於噴嘴7之塗佈處理條件。作為塗佈處理條件,具體而言可列舉:藉由使噴嘴7升降(x1)而調整之噴嘴7與基板2之間隙間隔g1或噴嘴7之移行速度v1、每單位時間之塗液吐出量等。 In the standby state, in order to apply the substrate 2 with the set coating film thickness, the coating processing conditions for the nozzles 7 are set. Specific examples of the coating treatment conditions include a gap gap g1 between the nozzle 7 and the substrate 2 which is adjusted by raising and lowering the nozzle 7 (x1), a moving speed v1 of the nozzle 7, a coating liquid discharge amount per unit time, and the like. .

並且,為了使塗佈於基板2之塗液D按照設定般硬化,設定對於硬化手段9之硬化處理條件。作為硬化處理條件,具體而言可列舉藉由使硬化手段9升降(x2)而調整之硬化手段9與基板2之間隙間隔g2或硬化手段9之移行速度v2,並且例如於UV照射體之情形時可列舉照度,於發熱體之情形時可列舉發熱量等。 Further, in order to cure the coating liquid D applied to the substrate 2 as set, the curing treatment conditions for the curing means 9 are set. Specific examples of the hardening treatment conditions include a gap gap g2 between the hardening means 9 and the substrate 2 which is adjusted by raising and lowering the hardening means 9 (x2), or a moving speed v2 of the hardening means 9, and for example, in the case of a UV irradiated body. The illuminance can be enumerated in the case of a heating element, and calorific value etc. are mentioned.

設定對於噴嘴7及硬化手段9之處理條件,並且將基板2載置於工作台3上,藉此,塗佈準備步驟結束。 The processing conditions for the nozzle 7 and the hardening means 9 are set, and the substrate 2 is placed on the table 3, whereby the coating preparation step is completed.

繼而,執行一面對基板2進行塗佈處理一面對塗佈於基板2之塗液D進行硬化處理之塗佈處理步驟。於塗佈處理步驟中,於基板2之長度方向上,自基板2之塗佈開始端至即將到達塗佈終點端區域Z(參照圖3)之位置為止,一面對基板2進行塗佈處理,一面進行塗佈於基板2之塗液D之硬化處理。 Then, a coating treatment step of applying a coating treatment to the substrate 2 and performing a hardening treatment on the substrate 2 is performed. In the coating treatment step, in the longitudinal direction of the substrate 2, coating treatment is performed on the substrate 2 from the application start end of the substrate 2 to the position of the coating end end region Z (refer to FIG. 3). The hardening treatment of the coating liquid D applied to the substrate 2 is performed.

所謂塗佈終點端區域Z係指如下區域,即:如上述背景技術所說明般,為了防止因停止自噴嘴7吐出塗液D而產生之塗膜厚度之不規則,而一面調整噴嘴7之移行速度v1,一面使該噴嘴7向上方緩慢移動,將噴嘴7與基板2之間隙間隔擴大後停止塗液D之吐出。 The coating end point region Z is a region in which the movement of the nozzle 7 is adjusted while preventing the irregularity of the thickness of the coating film caused by stopping the discharge of the coating liquid D from the nozzle 7 as described in the background art. At the speed v1, the nozzle 7 is gradually moved upward, and the gap between the nozzle 7 and the substrate 2 is widened, and the discharge of the coating liquid D is stopped.

圖3係表示以擴大與基板2之間隙間隔之方式「使噴嘴7上升並移行」之一態樣、即使噴嘴7向斜上方移動之態樣。 FIG. 3 shows an aspect in which the nozzle 7 is moved upward and upward by expanding the gap between the substrate 2 and the gap between the nozzles.

於塗佈處理步驟中,如圖3(a)所示,一方面使噴嘴用支撐柱6自位於移行方向前方之基板2之塗佈開始端朝向塗佈終點端移行,並利用自噴嘴7吐出之塗液D對基板2進行塗佈處理,一方面使硬化手段用支撐柱8自噴嘴用支撐柱6之移行方向後方追隨於噴嘴用支撐柱6而自基板2之塗佈開始端朝向塗佈終點端移行,並利用硬化手段9對塗佈於基板2之塗液D進行硬化處理。 In the coating treatment step, as shown in FIG. 3(a), the nozzle support column 6 is moved from the coating start end of the substrate 2 located in the front of the traveling direction toward the coating end end, and is discharged from the nozzle 7. The coating liquid D applies a coating treatment to the substrate 2, and the curing column support column 8 follows the nozzle support column 6 from the nozzle support column 6 in the traveling direction of the nozzle support column 6 from the coating start end of the substrate 2 toward the coating. The end point is moved, and the coating liquid D applied to the substrate 2 is hardened by the curing means 9.

此時,噴嘴7係與根據硬化處理條件而設定之硬化手段9之移行獨立,而以經調整之間隙間隔g1及移行速度v1等單獨移行。同樣地,硬化手段9亦與根據塗佈處理條件而設定之噴嘴7之移行獨立,而以經調整之間隙間隔g2及移行速度v2等單獨移行。 At this time, the nozzle 7 is independently driven by the movement of the hardening means 9 set according to the hardening processing conditions, and is separately moved by the adjusted gap interval g1, the traveling speed v1, and the like. Similarly, the hardening means 9 is also independent of the movement of the nozzles 7 set according to the coating processing conditions, and is separately moved by the adjusted gap interval g2 and the traveling speed v2.

其後,若噴嘴7及硬化手段9到達基板2之塗佈終點端 區域Z,則執行塗佈終點端處理步驟。塗佈終點端處理步驟係如圖3(b)所示,噴嘴用支撐柱6一方面使噴嘴7緩慢上升一方面移行,另一方面,硬化手段用支撐柱8一方面將硬化手段9之高度位置維持為固定一方面移行,如圖3(c)所示,與以上升移動之狀態自基板2之塗佈終點端脫離之噴嘴7無關,硬化手段9相對於基板2水平地平行移動,其後,與噴嘴7同樣地自基板2之塗佈終點端向基板2外側脫離。 Thereafter, if the nozzle 7 and the hardening means 9 reach the coating end point of the substrate 2 For zone Z, the coating end point processing step is performed. The coating end treatment step is as shown in FIG. 3(b), and the nozzle support column 6 on the one hand causes the nozzle 7 to slowly rise on the one hand, and on the other hand, the hardening means uses the support column 8 to fix the height of the hardening means 9 on the one hand. The position is maintained to be fixed on the one hand, and as shown in FIG. 3(c), the hardening means 9 is horizontally moved parallel with respect to the substrate 2 irrespective of the nozzle 7 which is separated from the coating end end of the substrate 2 in the state of ascending movement. Thereafter, similarly to the nozzle 7, the coating end point of the substrate 2 is separated from the outside of the substrate 2.

以上說明之本實施形態之基板之塗佈裝置1具備硬化手段用支撐柱8,該硬化手段用支撐柱8係與噴嘴用支撐柱6之移行獨立而於移行軌道5、具體而言第2移行軌道構件5b單獨移行,並且與噴嘴7之升降動作獨立而單獨升降自由地支撐硬化手段9,而且,又,本實施形態之基板之塗佈方法包括塗佈終點端處理步驟,該塗佈終點端處理步驟係於到達基板2之塗佈終點端區域Z時,噴嘴用支撐柱6一方面使噴嘴7上升一方面移行,另一方面,硬化手段用支撐柱8一方面將硬化手段9之高度位置維持為固定一方面移行。 The coating apparatus 1 for a substrate according to the present embodiment described above includes a support column 8 for a curing means, and the support column 8 for the curing means is independent of the movement of the nozzle support column 6 to the traveling rail 5, specifically, the second transition. The rail member 5b is separately moved, and the hardening means 9 is independently supported by the lifting and lowering of the nozzle 7, and the coating method of the substrate of the present embodiment includes a coating end point processing step, and the coating end point When the processing step is to reach the coating end end region Z of the substrate 2, the nozzle support column 6 moves the nozzle 7 on the one hand and moves on the one hand. On the other hand, the hardening means supports the column 8 on the one hand to set the height position of the hardening means 9. Maintain a fixed move on the one hand.

藉此,為了防止塗膜厚度之不規則,即便使移行之噴嘴7向上方移動而擴大噴嘴7與基板2之間隙間隔後停止塗液D之吐出,亦可將使硬化手段9進行升降動作(x2)之硬化手段用支撐柱8與使噴嘴7進行升降動作(x1)之噴嘴用支撐柱6分開而使其獨立地單獨移行,且可將硬化手段9與基板2之間隙間隔g2保持為固定,從而可使塗佈於基板2之塗液D均質地硬化。 Therefore, in order to prevent the irregularity of the coating film thickness, even if the moving nozzle 7 is moved upward to widen the gap between the nozzle 7 and the substrate 2, the discharge of the coating liquid D is stopped, and the curing means 9 can be moved up and down ( The hardening means of x2) is separated from the support column 6 for causing the nozzle 7 to perform the lifting operation (x1) by the support column 8, and is independently moved independently, and the gap gap g2 between the hardening means 9 and the substrate 2 can be kept fixed. Thus, the coating liquid D applied to the substrate 2 can be uniformly hardened.

其結果,可藉由噴嘴7使塗佈於基板2整個面之塗膜厚度均勻化,與此同時,對塗佈於基板2整個面之塗液D之藉由硬化手段9之硬化處理亦可均質化。即,藉由上述構成,當然可遍及基板2整個面確保塗膜厚度之均勻化及硬化處理之均質化,尤其是即便於在 基板2之塗佈終點端區域Z使噴嘴7朝向上方移動之情形時,亦可將追隨於噴嘴7之硬化手段9之高度位置維持為固定而使塗佈終點端區域Z之硬化處理均質化。 As a result, the thickness of the coating film applied to the entire surface of the substrate 2 can be made uniform by the nozzle 7, and at the same time, the coating liquid D applied to the entire surface of the substrate 2 can be hardened by the curing means 9. Homogenization. That is, according to the above configuration, it is of course possible to ensure the uniformity of the coating film thickness and the homogenization of the hardening treatment over the entire surface of the substrate 2, especially even in the case of When the coating end point region Z of the substrate 2 moves the nozzle 7 upward, the height position of the curing means 9 following the nozzle 7 can be maintained constant, and the hardening treatment of the coating end point region Z can be homogenized.

又,自一連串之塗佈處理步驟至塗佈終點端處理步驟,即便於進行噴嘴7之移行速度調整之情形時,只要不干涉噴嘴7,亦可自由地設定硬化手段9之移行速度v2,因此即便於在塗佈終點端區域Z等變更噴嘴7之移行速度v1之情形時,亦可使硬化手段9以設定之固定之移行速度v2移行,從而可使硬化處理均質化。 Further, from the series of coating treatment steps to the coating end treatment step, even when the movement speed of the nozzle 7 is adjusted, the movement speed v2 of the curing means 9 can be freely set as long as the nozzle 7 is not interfered. In other words, when the application of the end point region Z or the like to change the moving speed v1 of the nozzle 7, the curing means 9 can be moved at the set fixed moving speed v2, and the hardening treatment can be homogenized.

進而,由於包含與噴嘴用支撐柱6之移行獨立而於移行軌道5、具體而言第2移行軌道構件5b單獨移行之硬化手段用支撐柱8,故而與連結噴嘴7與硬化手段9之構成不同,可將噴嘴7及硬化手段9之移行速度v1、v2自由地設定為適於塗佈處理及硬化處理之移行速度,而可執行將速度設為參數之塗佈控制,從而可提高處理控制之靈活性。 Further, since the support post 8 for the hardening means, which is independent of the movement of the support column 6 for the nozzle, and the travel track 5, specifically the second travel rail member 5b, is separately provided, the configuration of the connection nozzle 7 and the hardening means 9 is different. The travel speeds v1 and v2 of the nozzle 7 and the hardening means 9 can be freely set to a travel speed suitable for the coating process and the hardening process, and the coating control can be performed by setting the speed as a parameter, thereby improving the process control. flexibility.

於上述說明中係以噴嘴7及硬化手段9之移行速度v1、v2不同之情形為例,但當然該等移行速度v1、v2亦可相同(v1=v2)。若如此,則可使噴嘴7與硬化手段9之距離y固定而移行,因此可使塗佈塗液D後至開始硬化處理前之時間固定,並可使塗液D之硬化均勻。 In the above description, the case where the moving speeds v1 and v2 of the nozzle 7 and the curing means 9 are different is taken as an example. However, the moving speeds v1 and v2 may be the same (v1=v2). If so, the distance y between the nozzle 7 and the hardening means 9 can be fixed and moved, so that the time from the application of the coating liquid D to the start of the hardening treatment can be fixed, and the curing of the coating liquid D can be made uniform.

於將移行速度v1、v2設為相同之情形時,為了變更塗佈塗液D後至開始硬化處理前之時間,只要變更開始噴嘴7之移行後至開始硬化手段9之移行前之時間間隔即可。 When the transition speeds v1 and v2 are set to be the same, in order to change the time from the application of the coating liquid D to the start of the hardening treatment, the time interval from the start of the movement of the start nozzle 7 to the start of the start of the hardening means 9 is changed. can.

另一方面,於與噴嘴到達塗佈終點端同時停止自噴嘴吐出塗液並使噴嘴向正上方上升之情形時,亦能夠以如圖4所示之方式, 執行塗佈處理步驟及塗佈終點端處理步驟。 On the other hand, when the nozzle reaches the coating end point and stops the application of the coating liquid from the nozzle and raises the nozzle upward, it can also be as shown in FIG. The coating treatment step and the coating end treatment step are performed.

圖4係說明本發明之基板之塗佈方法之另一實施形態之說明圖,且表示以擴大與基板2之間隙間隔之方式「使噴嘴7上升並移行」之另一態樣,即暫時停止噴嘴7之水平移行並使其上升,且於上升結束後重新開始水平移行而使其移動之態樣。圖4(a)表示塗佈處理步驟,圖4(b)表示塗佈終點端處理步驟之第1階段,圖4(c)表示塗佈終點端處理步驟之第2階段,圖4(d)表示塗佈終點端處理步驟之第3階段。 Fig. 4 is an explanatory view showing another embodiment of the method of coating a substrate of the present invention, and shows another aspect of "moving and moving the nozzle 7" so as to widen the gap with the substrate 2, that is, temporarily stopping The nozzle 7 is horizontally moved and raised, and after the end of the rise, the horizontal movement is resumed to move it. Fig. 4(a) shows the coating treatment step, Fig. 4(b) shows the first stage of the coating end treatment step, and Fig. 4(c) shows the second stage of the coating end treatment step, Fig. 4(d) Indicates the third stage of the coating end treatment step.

塗佈處理步驟係如圖4(a)所示,噴嘴7與硬化手段9隔著固定之距離y1以相同速度(v1=v2)移行,且如圖4(b)所示,至噴嘴7於塗佈終點端停止(v1=0)前保持相同距離y1。並且,如圖4(c)所示,於噴嘴7向正上方上升之期間,亦係硬化手段9將移行速度v2保持為固定而繼續移行。藉此,噴嘴7與硬化手段9之距離變窄(y1→y2)。若噴嘴7之上升結束,則如圖4(d)所示,噴嘴7再次以移行速度v1開始移行,並於保持距離y2之狀態下,硬化手段9移行至塗佈終點端。即便為此種態樣,亦可獲得與上述實施形態大致相同之作用效果。 The coating processing step is as shown in Fig. 4(a), and the nozzle 7 and the hardening means 9 are moved at the same speed (v1 = v2) by a fixed distance y1, and as shown in Fig. 4(b), the nozzle 7 is The same distance y1 is maintained before the coating end stop (v1 = 0). Further, as shown in FIG. 4(c), while the nozzle 7 is rising straight upward, the curing means 9 keeps the traveling speed v2 constant and continues to move. Thereby, the distance between the nozzle 7 and the hardening means 9 is narrowed (y1 → y2). When the rise of the nozzle 7 is completed, as shown in Fig. 4(d), the nozzle 7 starts moving again at the traveling speed v1, and the curing means 9 moves to the coating end point while maintaining the distance y2. Even in such a manner, substantially the same operational effects as those of the above embodiment can be obtained.

於本實施形態中,雖係由第1移行軌道構件5a及第2移行軌道構件5b構成移行軌道5,並使噴嘴用支撐柱6沿第1移行軌道構件5a移行,使硬化手段用支撐柱8沿第2移行軌道構件5b移行,但即便於使該等噴嘴用支撐柱6、硬化手段用支撐柱8於同一移行軌道構件上移行之情形時,亦可取得相同之作用效果。 In the present embodiment, the first traveling rail member 5a and the second traveling rail member 5b constitute the traveling rail 5, and the nozzle supporting column 6 is moved along the first traveling rail member 5a, and the reinforcing member support column 8 is provided. The second traveling rail member 5b is moved. However, even when the nozzle supporting column 6 and the curing means supporting column 8 are moved on the same traveling rail member, the same operational effects can be obtained.

又,即便使噴嘴用支撐柱6沿第2移行軌道構件5b移行並使硬化手段用支撐柱8沿第1移行軌道構件5a移行,亦可取得相同之作用效果。 Further, even if the nozzle support column 6 is moved along the second travel rail member 5b and the hardening means support column 8 is moved along the first travel rail member 5a, the same operational effects can be obtained.

圖5係表示本發明之基板之塗佈方法之變形例。圖5係說明本變形例之塗佈方法之說明圖。圖5(a)表示位置互換步驟之前半部分,圖5(b)表示位置互換步驟之後半部分,圖5(c)表示位置互換步驟後之塗佈處理步驟。 Fig. 5 is a view showing a modification of the coating method of the substrate of the present invention. Fig. 5 is an explanatory view for explaining a coating method of the present modification. Fig. 5(a) shows the first half of the position interchange step, Fig. 5(b) shows the second half of the position interchange step, and Fig. 5(c) shows the coating process step after the position interchange step.

於上述實施形態中,噴嘴用支撐柱6移行之第1移行軌道構件5a配置於硬化手段用支撐柱8移行之第2移行軌道構件5b與基板2之間。於該變形例中係以成為門型形態之橫架材之硬化手段9越過同樣成為門型形態之橫架材之噴嘴7之方式,硬化手段用支撐柱8以到達噴嘴7之上方之升降行程量H(參照圖1)升降自由地支撐硬化手段9。 In the above embodiment, the first travel rail member 5a in which the nozzle support column 6 travels is disposed between the second travel rail member 5b on which the reinforcing means support column 8 travels and the substrate 2. In this modification, the curing means 9 of the cross-frame material in the gate type is passed over the nozzle 7 of the cross-frame material which is also in the gate type, and the lifting column for the curing means reaches the upper portion of the nozzle 7 The amount H (see Fig. 1) supports the hardening means 9 in a freely rising manner.

噴嘴7係沿著噴嘴用支撐柱6之高度方向而被升降自由地支撐,因此升降行程量H將最大限度較長地設定至較噴嘴7之上升限度更高之位置。然而,若以噴嘴7下降至下降限度之位置為基準,則到達噴嘴7之上方之升降行程量H亦可設定得較短。 Since the nozzle 7 is supported up and down along the height direction of the nozzle support column 6, the lift stroke amount H is set to a position which is higher than the rise limit of the nozzle 7 as long as possible. However, if the position at which the nozzle 7 is lowered to the lower limit is used as a reference, the amount of lifting stroke H that reaches above the nozzle 7 can also be set to be short.

本變形例之塗佈方法係應用於使噴嘴7及硬化手段9往返移行而對基板2進行塗佈之情形。藉由往返移行之塗佈既可應用於對基板2進行重疊塗佈之情形,亦可應用於在去路與返路對更換之各基板2進行塗佈之情形。 The coating method of this modification is applied to the case where the nozzle 7 and the curing means 9 are moved back and forth to apply the substrate 2. The coating by the round-trip migration can be applied to the case where the substrate 2 is over-coated, and can also be applied to the case where the substrate 2 to be replaced is applied by the outward path and the return path.

於該變形例之情形時,去路及返路上之利用噴嘴7及硬化手段9之處理亦如圖1~圖4所示,依序執行塗佈準備步驟、塗佈處理步驟、以及塗佈終點端處理步驟。與上述實施形態之不同點在於包含位置互換步驟。位置互換步驟係為了往返移行而將噴嘴7與硬化手段9之位置互換之步驟。 In the case of this modification, the treatment of the nozzle 7 and the hardening means 9 for the outward and return paths is also performed as shown in FIGS. 1 to 4, and the coating preparation step, the coating treatment step, and the coating end point are sequentially performed. Processing steps. The difference from the above embodiment is that it includes a position interchange step. The position interchange step is a step of exchanging the positions of the nozzle 7 and the hardening means 9 for the purpose of reciprocating the travel.

圖5表示噴嘴用支撐柱6於第1移行軌道構件5a移行 且硬化手段用支撐柱8於第2移行軌道構件5b移行之情形。 Figure 5 shows the nozzle support column 6 moving on the first travel rail member 5a. Further, the hardening means is moved by the support post 8 to the second transfer rail member 5b.

該情形時之位置互換步驟係於至少結束自噴嘴7之塗液D之吐出且噴嘴用支撐柱6及硬化手段用支撐柱8於基板2之外側停止後之待機狀態下,如圖5(a)所示,執行硬化手段9向噴嘴7上方之上升(圖中以箭頭s1表示),如圖5(a)~圖5(b)所示,執行硬化手段用支撐柱8向硬化手段9跨越噴嘴7之位置之移行(圖中以箭頭s2表示),以及,如圖5(b)所示,執行硬化手段9之下降(圖中以箭頭s3表示),並相對於成為返路之相反方向之移行方向將噴嘴7與硬化手段9進行重新排列。 In this case, the position interchange step is in a standby state in which at least the discharge of the coating liquid D from the nozzle 7 is completed and the nozzle support column 6 and the hardening means support column 8 are stopped on the outer side of the substrate 2, as shown in Fig. 5 (a). As shown in the figure, the hardening means 9 is raised above the nozzle 7 (indicated by an arrow s1 in the figure), and as shown in Figs. 5(a) to 5(b), the hardening means is supported by the support column 8 to the hardening means 9. The position of the nozzle 7 is shifted (indicated by the arrow s2 in the figure), and as shown in Fig. 5(b), the lowering of the hardening means 9 (indicated by the arrow s3 in the figure) is performed, and the direction opposite to the return path is made. The direction of travel realigns the nozzle 7 and the hardening means 9.

所謂「至少結束自噴嘴7之塗液D之吐出」係指硬化手段9可繼續作動,即可發出UV光L或發熱。 The "discharge of at least the coating liquid D from the nozzle 7" means that the curing means 9 can continue to operate, and the UV light L or heat can be emitted.

於本變形例中,包括以上述方式將噴嘴7與硬化手段9進行重新排列之位置互換步驟,並反覆地重複塗佈處理步驟至位置互換步驟,因此可使噴嘴7及硬化手段9於往返方向移行。 In the present modification, the positional interchange step of rearranging the nozzle 7 and the hardening means 9 in the above-described manner is repeated, and the coating processing step to the position interchange step are repeated repeatedly, so that the nozzle 7 and the hardening means 9 can be reciprocated. Move.

於圖1~4所示之實施形態中,僅可沿一方向塗佈,而必須將噴嘴用支撐柱6、硬化手段用支撐柱8等返回原本之位置後進行再次塗佈,但本變形例可往返移行,因此能夠以一次往返處理2片基板2或進行重疊塗佈,而可提高生產效率。 In the embodiment shown in FIGS. 1 to 4, the nozzle support column 6, the curing means support column 8 and the like must be returned to the original position and then recoated, but the present modification is required. Since it can be moved back and forth, the two substrates 2 can be processed in one round trip or overlap coating can be performed, and the production efficiency can be improved.

又,於連結噴嘴7與硬化手段9之構成中,由於無法將其等之位置互換,故而為了可往返移行,需要於噴嘴7之往返方向兩側設置硬化手段9而導致成本增高,但於本變形例中,僅將噴嘴7及硬化手段9各設置一個便可往返移行而進行塗佈、硬化處理。 Further, in the configuration of the connection nozzle 7 and the curing means 9, since the positions of the nozzles 7 and the curing means 9 cannot be interchanged, it is necessary to provide the curing means 9 on both sides of the nozzle 7 in the reciprocating direction in order to increase the cost, but the cost is increased. In the modified example, only the nozzle 7 and the curing means 9 are provided one by one, and the coating and hardening treatment can be performed by reciprocating.

又,可將噴嘴7與硬化手段9之排列自由地互換,因此亦可於使硬化手段9以面向基板2之方式移動至噴嘴7前方後,僅使 硬化手段用支撐柱8移行,並進行各種處理,例如執行塗佈前之UV活性化處理等。 Moreover, since the arrangement of the nozzle 7 and the hardening means 9 can be freely interchanged, the curing means 9 can be moved to the front side of the nozzle 7 so as to face the substrate 2, and only The hardening means is moved by the support column 8, and various treatments are performed, for example, UV activation treatment before coating, and the like.

於代替上述變形例,噴嘴用支撐柱6於第2移行軌道構件5b移行且硬化手段用支撐柱8於第1移行軌道構件5a移行之情形時之位置互換步驟中,雖未圖示,但顯而易見,於至少結束自噴嘴7之塗液D之吐出且噴嘴用支撐柱6及硬化手段用支撐柱8於基板2之外側停止之後之待機狀態下,執行噴嘴7向硬化手段9上方之上升、噴嘴用支撐柱6向噴嘴7跨越硬化手段9之位置之移行、以及噴嘴7之下降,並相對於成為返路之相反方向之移行方向將噴嘴7與硬化手段9進行重新排列。 In place of the above-described modification, in the position interchange step in the case where the nozzle support column 6 is moved by the second travel rail member 5b and the hardening means support column 8 is moved to the first travel rail member 5a, it is obvious that it is not shown. When the discharge of the coating liquid D from the nozzle 7 is completed and the nozzle support column 6 and the hardening means support column 8 are stopped on the outer side of the substrate 2, the nozzle 7 is lifted upward above the hardening means 9, and the nozzle is opened. The support column 6 is moved toward the position of the nozzle 7 across the hardening means 9, and the nozzle 7 is lowered, and the nozzle 7 and the hardening means 9 are rearranged with respect to the direction of travel in the opposite direction to the return path.

僅為噴嘴7跨越硬化手段9或是硬化手段9跨越噴嘴7之差異,可獲得相同之作用效果。 The same effect can be obtained only by the difference between the nozzle 7 across the hardening means 9 or the hardening means 9 across the nozzle 7.

圖6係表示本發明之基板之塗佈裝置1之變形例之側視圖。於本變形例中,硬化手段用支撐柱8移行之第2移行軌道構件5b係配設於工作台3之上方,且硬化手段用支撐柱8懸掛並移行自由地設置於第2移行軌道構件5b。亦可為,代替第2移行軌道構件5b,將第1移行軌道構件5a配設於工作台3之上方,且將噴嘴用支撐柱6懸掛並移行自由地設置於該第1移行軌道構件5a。 Fig. 6 is a side view showing a modification of the coating apparatus 1 for a substrate of the present invention. In the present modification, the second travel rail member 5b, which is moved by the support column 8, is disposed above the table 3, and the hardening means is suspended by the support column 8 and is freely disposed on the second travel track member 5b. . Instead of the second transition rail member 5b, the first travel rail member 5a may be disposed above the table 3, and the nozzle support column 6 may be suspended and movably provided on the first travel rail member 5a.

於該情形時,亦可具備噴嘴7及硬化手段9之任一者跨越另一者之構成。即便為此種變形例,取得上述之作用效果亦為理所當然。 In this case, any one of the nozzle 7 and the curing means 9 may be provided to span the other. Even in such a modification, it is a matter of course to obtain the above-described effects.

圖7係表示本發明之基板之塗佈裝置1之另一變形例之側視圖。該變形例係由1台懸掛於第2移行軌道構件5b之硬化手段用支撐柱8與2台支撐噴嘴7之噴嘴用支撐柱6A、6B所構成之情形。2 台噴嘴用支撐柱6A、6B於同一第1移行軌道構件5a移行。 Fig. 7 is a side view showing another modification of the coating apparatus 1 for a substrate of the present invention. This modification is composed of one support column 8 for the hardening means suspended by the second transfer rail member 5b and the nozzle support columns 6A, 6B for the two support nozzles 7. 2 The stage nozzle support columns 6A, 6B are moved on the same first travel track member 5a.

若如此般構成,則於一方面利用右側之噴嘴用支撐柱6A之噴嘴7A進行塗佈處理,一方面利用追隨於該右側之噴嘴7A之硬化手段9進行硬化處理之後,將右側之噴嘴7A返回至原本之位置時,將硬化手段9移動至左側之噴嘴用支撐柱6B之左側,藉此,其後,一方面利用左側之噴嘴7B進行塗佈處理,一方面使硬化手段9追隨於該左側之噴嘴7B並進行硬化處理,而可利用1台硬化手段9之移行移動而高效率地進行相對於藉由2台噴嘴7A、7B之塗佈處理之硬化處理,從而可提高設備效率及生產效率。又,只要使塗液D不同,則亦可利用右側之噴嘴7A與左側之噴嘴7B進行不同種類之塗液之重疊塗佈。 In this case, the coating process is performed by the nozzle 7A of the nozzle supporting column 6A on the right side, and the curing process is performed by the curing means 9 following the nozzle 7A on the right side, and then the nozzle 7A on the right side is returned. At the original position, the curing means 9 is moved to the left side of the nozzle support column 6B on the left side, and thereafter, the coating process is performed by the nozzle 7B on the left side, and the hardening means 9 follows the left side. The nozzle 7B is subjected to a hardening treatment, and the hardening treatment by the coating treatment by the two nozzles 7A and 7B can be efficiently performed by the movement of the one curing means 9, thereby improving the equipment efficiency and the production efficiency. . Moreover, as long as the coating liquid D is different, the coating of different types of coating liquids can be performed by the nozzle 7A on the right side and the nozzle 7B on the left side.

1‧‧‧基板之塗佈裝置 1‧‧‧Substrate coating device

2‧‧‧基板 2‧‧‧Substrate

3‧‧‧工作台 3‧‧‧Workbench

4‧‧‧基台 4‧‧‧Abutment

5‧‧‧移行軌道 5‧‧‧Move track

5a‧‧‧第1移行軌道構件 5a‧‧‧1st moving track member

5b‧‧‧第2移行軌道構件 5b‧‧‧2nd moving rail member

6‧‧‧噴嘴用支撐柱 6‧‧‧ nozzle support column

7‧‧‧噴嘴 7‧‧‧ nozzle

8‧‧‧硬化手段用支撐柱 8‧‧‧Support column for hardening means

9‧‧‧硬化手段 9‧‧‧hardening means

H‧‧‧升降行程量 H‧‧‧ Lifting stroke

Claims (7)

一種基板之塗佈裝置,其利用自噴嘴所吐出之塗液對基板進行塗佈處理,並利用硬化手段對塗佈於該基板之塗液進行硬化處理,該噴嘴係以升降自如之方式被支撐於在移行軌道上移行之噴嘴用支撐柱,上述基板之塗佈裝置的特徵在於:具備有硬化手段用支撐柱,該硬化手段用支撐柱係獨立於噴嘴用支撐柱之移行而以單獨之方式在上述移行軌道上移行,並且獨立於上述噴嘴之升降動作而以單獨之方式升降自如地支撐上述硬化手段。 A substrate coating apparatus which coats a substrate with a coating liquid discharged from a nozzle, and hardens a coating liquid applied to the substrate by a curing means, and the nozzle is supported by a liftable manner In the nozzle supporting column for moving on the traveling track, the coating device for the substrate is characterized in that it has a support column for the hardening means, and the support column is independent of the movement of the support column for the nozzle in a separate manner The above-described moving track is moved, and the above-described hardening means is supported in a separate manner independently of the lifting operation of the above nozzle. 如申請專利範圍第1項之基板之塗佈裝置,其中,上述移行軌道係包含有以接近於上述基板之方式所配置之第1移行軌道構件、及以相較於該第1移行軌道構件而更遠離自該基板之方式所配置之第2移行軌道構件,於上述第1移行軌道構件,供上述噴嘴用支撐柱進行移行,於上述第2移行軌道構件,供上述硬化手段用支撐柱進行移行,且該硬化手段用支撐柱係利用到達至上述噴嘴之上方的升降行程量而以升降自如之方式支撐上述硬化手段。 The coating device for a substrate according to claim 1, wherein the traveling track includes a first traveling rail member disposed to be close to the substrate, and the first traveling rail member is disposed in comparison with the first traveling rail member The second transition rail member disposed further away from the substrate, the first travel rail member is moved by the nozzle support column, and the second travel rail member is moved by the support means for the hardening means And the hardening means supports the hardening means in a liftable manner by the support column using the amount of the lift stroke reaching the nozzle. 如申請專利範圍第1項之基板之塗佈裝置,其中,上述移行軌道係包含有以接近於上述基板之方式所配置之第1移行軌道構件、及以相較於該第1移行軌道構件而更遠離自該基板之方式所配置之第2移行軌道構件,於上述第1移行軌道構件,供上述硬化手段用支撐柱進行移行,於上述第2移行軌道構件,供上述噴嘴用支撐柱進行移行,且該噴嘴用支撐柱係利用到達至上述硬化手段之上方的升降行程量而以升降自如之方式支撐上述噴嘴。 The coating device for a substrate according to claim 1, wherein the traveling track includes a first traveling rail member disposed to be close to the substrate, and the first traveling rail member is disposed in comparison with the first traveling rail member Further, the second transfer rail member disposed away from the substrate is moved by the support column for the curing means in the first transfer rail member, and the support column for the nozzle is moved to the second transfer rail member. Further, the nozzle support column supports the nozzle in an ascending and descending manner by the amount of the lift stroke reaching the upper side of the hardening means. 如申請專利範圍第1至3項中任一項之基板之塗佈裝置,其 中,上述硬化手段係為UV照射體、發熱體或者乾燥機。 A coating device for a substrate according to any one of claims 1 to 3, wherein In the above, the curing means is a UV irradiator, a heating element, or a dryer. 一種基板之塗佈方法,其為使用申請專利範圍第1項之基板之塗佈裝置而對基板進行塗佈之方法,其特徵在於包括有:塗佈處理步驟,其一方面以自位在移行方向前方之上述基板之塗佈開始端而朝向塗佈終點端之方式移行上述噴嘴用支撐柱並利用自上述噴嘴所吐出之塗液對該基板進行塗佈處理,一方面以自噴嘴用支撐柱之移行方向後方而追隨於該噴嘴用支撐柱之方式並以自該基板之塗佈開始端而朝向塗佈終點端之方式使上述硬化手段用支撐柱進行移行,並利用上述硬化手段對塗佈於該基板之塗液進行硬化處理;及塗佈終點端處理步驟,其上述噴嘴用支撐柱係當到達至上述基板之塗佈終點端區域時,使上述噴嘴上升並移行,另一方面,上述硬化手段用支撐柱係一方面將上述硬化手段之高度位置維持為一定而一方面進行移行。 A method for coating a substrate, which is a method for coating a substrate by using a coating device for a substrate according to claim 1, characterized in that it comprises: a coating treatment step, which is on the one hand The nozzle supporting column is moved toward the coating end point in the direction of the coating start end of the front side, and the substrate is coated by the coating liquid discharged from the nozzle, and the self-nozzle supporting column is used. The curing direction is followed by the support column of the nozzle, and the curing means is moved by the support column so as to be toward the coating end from the coating start end of the substrate, and is coated by the hardening means. The coating liquid on the substrate is subjected to a curing treatment; and the coating end treatment step is performed, wherein the nozzle support column is raised and moved when the coating end point region reaches the coating end end region of the substrate; The hardening means supports the column on the one hand to maintain the height position of the above-mentioned hardening means and to move on the one hand. 一種基板之塗佈方法,其為使用申請專利範圍第2項之基板之塗佈裝置而以往返移行上述噴嘴及上述硬化手段之方式對基板進行塗佈之方法,其特徵在於包括有:塗佈處理步驟,其一方面以自位在移行方向前方之上述基板之塗佈開始端而朝向塗佈終點端之方式移行上述噴嘴用支撐柱並利用自該噴嘴所吐出之塗液對該基板進行塗佈處理,一方面以自噴嘴用支撐柱之移行方向後方而追隨於該噴嘴用支撐柱之方式並以自該基板之塗佈開始端而朝向塗佈終點端之方式使上述硬化手段用支撐柱進行移行,並利用上述硬化手段對塗佈於該基板之塗液進行硬化處理; 塗佈終點端處理步驟,其上述噴嘴用支撐柱係當到達至上述基板之塗佈終點端區域時,使上述噴嘴上升並移行,另一方面,上述硬化手段用支撐柱係一方面將上述硬化手段之高度位置維持為一定而一方面進行移行;及位置互換步驟,其至少在結束自上述噴嘴之塗液之吐出且停止上述噴嘴用支撐柱及上述硬化手段用支撐柱之後,執行上述硬化手段之朝向該噴嘴上方之上升、該硬化手段用支撐柱之朝向該硬化手段跨越該噴嘴之位置之移行、以及該硬化手段之下降,且相對於相反方向之移行方向而將該噴嘴與該硬化手段加以重新排列;且以反覆之方式重複進行上述塗佈處理步驟至上述位置互換步驟。 A method for coating a substrate, which is a method for coating a substrate by reciprocating the nozzle and the curing means by using a coating device for a substrate of the second application of the patent application, characterized in that it comprises: coating a processing step of moving the substrate support column by using a coating liquid discharged from the nozzle by moving the coating support column toward the coating end point from the coating start end of the substrate in front of the traveling direction. In the cloth treatment, the support column for the hardening means is applied so as to follow the nozzle support column from the rear of the nozzle support column and toward the coating end point from the coating start end of the substrate. Performing a migration, and hardening the coating liquid applied to the substrate by the above-mentioned hardening means; a coating end treatment step, wherein the nozzle support column lifts and moves the nozzle when reaching the coating end end region of the substrate, and the hardening means supports the hardening on the one hand And the positional exchange step of performing the hardening means at least after the discharge of the coating liquid from the nozzle is completed and the support column for the nozzle and the support column for the hardening means are stopped. The upward movement toward the nozzle, the movement of the support column toward the position of the hardening means across the nozzle, and the lowering of the hardening means, and the nozzle and the hardening means with respect to the direction of travel in the opposite direction The steps are rearranged; and the above-described coating treatment step to the above-described positional exchange step is repeated in a repeated manner. 一種基板之塗佈方法,其使用申請專利範圍第3項之基板之塗佈裝置而以往返移行上述噴嘴及上述硬化手段之方式對基板進行塗佈者,其特徵在於包括有:塗佈處理步驟,其一方面以自位在移行方向前方之上述基板之塗佈開始端而朝向塗佈終點端之方式移行上述噴嘴用支撐柱並利用自該噴嘴所吐出之塗液對該基板進行塗佈處理,一方面以自噴嘴用支撐柱之移行方向後方而追隨於該噴嘴用支撐柱之方式並以自該基板之塗佈開始端而朝向塗佈終點端之方式使上述硬化手段用支撐柱進行移行,並利用上述硬化手段對塗佈於該基板之塗液進行硬化處理;塗佈終點端處理步驟,其上述噴嘴用支撐柱係當到達至上述基板之塗佈終點端區域時,使上述噴嘴上升並移行,另一方面,上述硬化手段用支撐柱係一方面將上述硬化手段之高度位置維持為一定而一方面進行移行;及 位置互換步驟,其至少在結束自上述噴嘴之塗液之吐出且停止上述噴嘴用支撐柱及上述硬化手段用支撐柱之後,執行該噴嘴之朝向上述硬化手段上方之上升、該噴嘴用支撐柱之朝向該噴嘴跨越該硬化手段之位置之移行、以及該噴嘴之下降,且相對於相反方向之移行方向將該噴嘴與該硬化手段加以重新排列;且以反覆之方式重複進行上述塗佈處理步驟至上述位置互換步驟。 A method for coating a substrate, which comprises coating a substrate by reciprocating the nozzle and the curing means by using a coating device for a substrate of the third application of the patent application, comprising: a coating treatment step On the other hand, the nozzle supporting column is moved toward the coating end point so as to be self-aligned at the coating start end of the substrate in front of the traveling direction, and the substrate is coated by the coating liquid discharged from the nozzle. On the other hand, the hardening means is moved by the support column so as to follow the nozzle support column from the rear of the nozzle support column and to the coating end point from the coating start end of the substrate. And applying a hardening treatment to the coating liquid applied to the substrate; and applying a finishing end treatment step, wherein the nozzle supporting column reaches the coating end point region of the substrate to raise the nozzle And moving, on the other hand, the above-mentioned hardening means uses a supporting column to maintain the height position of the hardening means on the one hand and to move on the one hand. OK; and a position-interchange step of performing the nozzle-supporting column and the support column for the curing means at least after the discharge of the coating liquid from the nozzle is stopped, and then the nozzle is raised toward the upper portion of the curing means, and the nozzle supporting column is Moving toward the position of the nozzle across the hardening means, and descending of the nozzle, and rearranging the nozzle and the hardening means with respect to the direction of travel in the opposite direction; and repeating the coating processing step in a repeated manner to The above position swapping step.
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