CN100467140C - Coating equipment - Google Patents
Coating equipment Download PDFInfo
- Publication number
- CN100467140C CN100467140C CNB2004100272286A CN200410027228A CN100467140C CN 100467140 C CN100467140 C CN 100467140C CN B2004100272286 A CNB2004100272286 A CN B2004100272286A CN 200410027228 A CN200410027228 A CN 200410027228A CN 100467140 C CN100467140 C CN 100467140C
- Authority
- CN
- China
- Prior art keywords
- coating
- support
- platform
- dust remover
- scraper type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Abstract
A photoresist coating process is composed of a platform for supporting a substrate, a coating unit above said platform for coating photoresist on said substrate, and an ultrasonic cleaner for removing dust from said substrate before coated.
Description
[technical field]
The invention relates to a kind of apparatus for coating, particularly about a kind of apparatus for coating that is used to be coated with photoresist.
[background technology]
In liquid crystal indicator processing procedure operation, need on glass substrate, evenly be coated with the photoresist of last layer specific thicknesses.
A kind of prior art apparatus for coating is to adopt the mode of scraper coating that photoresist is applied on the glass substrate.Be the schematic diagram of prior art scraper type apparatus for coating as shown in Figure 1.This scraper type apparatus for coating 10 comprises a platform 16, a scraper type nozzle 11, a photoresist feeding mechanism 12 and a nozzle cleaning groove 15.This platform 16 is used for supporting and fixing substrate 13 to be coated.This scraper type nozzle 11 is located at platform 16 tops and is linked to each other with photoresist feeding mechanism 12.This nozzle cleaning groove 15 is located at platform 16 rear ends and is used for cleaning scraper knife-type nozzle 11.As shown in Figures 2 and 3, be the work schematic diagram of scraper type apparatus for coating 10.Scraper type nozzle 11 moves to second place B from primary importance A, and the photoresist 14 of the no given shape that photoresist feeding mechanism 12 provides was transformed into band shape by scraper type nozzle 11 and was applied on the substrate 13 this moment.After finishing once coating action, scraper type nozzle 11 needs to immerse nozzle cleaning groove 15 and cleans, and prepares to be coated with action next time.
But; when the scraper type apparatus for coating 10 of employing the prior art was done the photoresist coating, because of the influence of factors such as apparatus for coating 10 place working environments, may there be some particulates in substrate 13 surfaces; these particulates can cause substrate 13 surface coatings unusual, the quality of influence back processing procedure.Simultaneously, these particulates also may make the 11 impaired scratches of scraper type nozzle.
[summary of the invention]
Apparatus for coating can cause substrate surface to be coated with the shortcoming of unusual and the impaired scratch of scraper type nozzle because of the particulate that exists on the substrate to be coated in the prior art coating process in order to overcome, and the invention provides a kind of apparatus for coating that can remove particulate on the substrate to be coated in coating process.
The technical scheme that technical solution problem of the present invention is adopted is: a kind of apparatus for coating is provided, comprise a platform, a coating mechanism and a dust arrester, this platform is in order to support and fixing substrate to be coated, this coating mechanism is positioned at the platform top, this dust arrester is provided with a supersonic dust remover, it is located at the platform top and places coating mechanism the place ahead, and this supersonic dust remover and this coating mechanism move along equidirectional sequencing.
The invention has the beneficial effects as follows: compared with prior art, apparatus for coating of the present invention is provided with a supersonic dust remover before coating mechanism, this supersonic dust remover and this coating mechanism move along equidirectional sequencing, this supersonic dust remover can carry out before the photoresistance coating particulate on the substrate being removed at this coating mechanism, avoid particulate damage scraper type nozzle, and this supersonic dust remover is to the interference of coating mechanism, and it is unusual to reduce coating.
[description of drawings]
Fig. 1 is the floor map of prior art apparatus for coating.
Fig. 2 and Fig. 3 are the work schematic diagrames of apparatus for coating shown in Figure 1.
Fig. 4 is the schematic perspective view of apparatus for coating of the present invention.
Fig. 5 is the work schematic diagram of apparatus for coating of the present invention.
[specific embodiment]
Seeing also Fig. 4, is the schematic diagram of apparatus for coating 20 of the present invention.This apparatus for coating 20 comprises a platform 30, a nozzle cleaning groove (figure does not show), a coating mechanism 40 and a dust arrester 50.
This platform 30 utilizes the fixing substrate 21 to be coated of vacuum adsorption principle absorption.This nozzle cleaning groove is located at the end of platform 30.
This coating mechanism 40 comprises a scraper type nozzle 41, a photoresist feeding mechanism 42, a pair of first support 43 and a drive unit (figure does not show).Should be arranged on the both sides of platform 30 to first support 43, this scraper type nozzle 41 is across above this platform 30, and its two ends are erected on first support 43.This photoresist feeding mechanism 42 links to each other with scraper type nozzle 41 and provides photoresist to be coated to it.This drive unit is to be used for driving this scraper type nozzle to make it reciprocating on first support 43.
This dust arrester 50 comprises a supersonic dust remover 51 and a pair of second support 53.Should be arranged side by side in platform 30 both sides second support 53 and first support 43.This supersonic dust remover 51 places scraper type nozzle 41 the place aheads, and across above platform 30, its two ends are erected on second support 53.This supersonic dust remover 51 utilizes ultrasonic wave principle and air knife effect to remove particulate, it is provided with a control device 511 and a drive unit (figure does not show), this control device 511 is the switches that are used for controlling supersonic dust remover 51, and this drive unit is used for driving this supersonic dust remover 51 makes it reciprocating on second support 53.
Please consulting Fig. 5 together, is the work schematic diagram of apparatus for coating 20 of the present invention.When utilizing this apparatus for coating 20 to carry out the photoresist coating, substrate to be coated 21 is adsorbed on the platform 30, make supersonic dust remover 51 under the driving of drive unit, move to position B from position A, utilize control device 511 to open this supersonic dust remover 51 simultaneously, make it in running order, the particulate on the substrate 21 is removed.Scraper type nozzle 41 also moves to position B from position A under the driving of drive unit subsequently, in the process that it moves, the photoresist that is provided by photoresist feeding mechanism 42 is uniformly coated on the substrate 21.After this coating action was finished, scraper type nozzle 41 and supersonic dust remover 51 returned, and with cleaning in the scraper type nozzle 41 immersion nozzle cleaning grooves, prepared coating action next time.
Apparatus for coating 20 of the present invention is provided with a supersonic dust remover 51 before scraper type nozzle 41, therefore can carry out before the photoresistance coating particulate on the substrate 21 being removed at this apparatus for coating 20, so just can avoid particulate damage scraper, and it is unusual to reduce coating simultaneously.
Claims (7)
1. apparatus for coating, comprise a platform and a coating mechanism, this platform is in order to support and fixing substrate to be coated, this coating mechanism is positioned at the platform top, it is characterized in that: further comprise a dust arrester, it is provided with a supersonic dust remover, and this supersonic dust remover is located at the platform top and is placed coating mechanism the place ahead, and this supersonic dust remover and this coating mechanism move along equidirectional sequencing.
2. apparatus for coating as claimed in claim 1 is characterized in that: this coating mechanism comprises a scraper type nozzle and a photoresist feeding mechanism, and this scraper type nozzle is positioned at the platform top, and this photoresist feeding mechanism links to each other with the scraper type nozzle.
3. apparatus for coating as claimed in claim 1 is characterized in that: this supersonic dust remover is provided with a control device.
4. apparatus for coating as claimed in claim 1 is characterized in that: this coating mechanism further comprises a pair of first support, and this is set up in the platform both sides to first, and this nozzle ends is set up in this on first support, and this nozzle is the scraper type nozzle.
5. apparatus for coating as claimed in claim 1 is characterized in that: this dust arrester further comprises a pair of second support, and this second support and first support are arranged side by side in the platform both sides, and the two ends of this supersonic dust remover are set up on second support.
6. apparatus for coating as claimed in claim 4 is characterized in that: this apparatus for coating is provided with a drive unit, and it is reciprocating on first support to drive the scraper type nozzle.
7. apparatus for coating as claimed in claim 5 is characterized in that: this supersonic dust remover is provided with a drive unit, and it is reciprocating on second support to drive supersonic dust remover.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100272286A CN100467140C (en) | 2004-05-10 | 2004-05-10 | Coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100272286A CN100467140C (en) | 2004-05-10 | 2004-05-10 | Coating equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1695822A CN1695822A (en) | 2005-11-16 |
| CN100467140C true CN100467140C (en) | 2009-03-11 |
Family
ID=35348805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100272286A Expired - Fee Related CN100467140C (en) | 2004-05-10 | 2004-05-10 | Coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100467140C (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1885164B (en) * | 2005-06-24 | 2010-04-07 | 友达光电股份有限公司 | Photoresist coating method and photoresist coating apparatus |
| CN103331276B (en) * | 2013-07-12 | 2016-05-18 | 深圳市华星光电技术有限公司 | Ultrasonic cleaning equipment and the coating machine with this ultrasonic cleaning equipment |
| CN103521479B (en) * | 2013-09-27 | 2016-03-30 | 京东方科技集团股份有限公司 | Cleaning device and linear coater |
| CN103711037B (en) * | 2014-01-06 | 2015-08-05 | 西安航天华阳印刷包装设备有限公司 | Wallpaper coating adsorbing mechanism |
| JP6452318B2 (en) * | 2014-05-20 | 2019-01-16 | 中外炉工業株式会社 | Substrate coating apparatus and substrate coating method |
| CN104635692B (en) * | 2014-12-31 | 2018-02-13 | 深圳市华星光电技术有限公司 | It is coated with the method for photoresistance film and the coating apparatus using this method |
| CN107199188B (en) | 2017-06-12 | 2020-03-27 | 京东方科技集团股份有限公司 | Coating machine, coating system and coating machine cleaning method |
| CN108983502A (en) * | 2018-09-27 | 2018-12-11 | 武汉华星光电技术有限公司 | Alignment Coating Equipment |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1531321A (en) * | 1975-01-13 | 1978-11-08 | Nat Steel Corp | Coating weight-control methods and apparatus |
| DE4025663A1 (en) * | 1990-08-14 | 1991-10-24 | Bayerische Motoren Werke Ag | Applying consistent coating to substrate - cleaning the substrate in front of the coating head by using spring-loaded block with doctoring edge set at acute angle |
| JP2000237666A (en) * | 1999-02-18 | 2000-09-05 | Dainippon Printing Co Ltd | Apparatus and method for planar coating of viscous liquid |
| JP2002166239A (en) * | 2000-11-30 | 2002-06-11 | Optrex Corp | Method for cleaning substrate |
| JP2003200121A (en) * | 2002-01-11 | 2003-07-15 | Ricoh Microelectronics Co Ltd | Air cleaning apparatus |
| JP2003211053A (en) * | 2002-01-28 | 2003-07-29 | Hirata Corp | Maintenance mechanism for coating head in liquid coater |
| CN1548247A (en) * | 2003-05-19 | 2004-11-24 | 乐金电子（沈阳）有限公司 | Ink jetting coating unit for making display board |
-
2004
- 2004-05-10 CN CNB2004100272286A patent/CN100467140C/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1531321A (en) * | 1975-01-13 | 1978-11-08 | Nat Steel Corp | Coating weight-control methods and apparatus |
| DE4025663A1 (en) * | 1990-08-14 | 1991-10-24 | Bayerische Motoren Werke Ag | Applying consistent coating to substrate - cleaning the substrate in front of the coating head by using spring-loaded block with doctoring edge set at acute angle |
| JP2000237666A (en) * | 1999-02-18 | 2000-09-05 | Dainippon Printing Co Ltd | Apparatus and method for planar coating of viscous liquid |
| JP2002166239A (en) * | 2000-11-30 | 2002-06-11 | Optrex Corp | Method for cleaning substrate |
| JP2003200121A (en) * | 2002-01-11 | 2003-07-15 | Ricoh Microelectronics Co Ltd | Air cleaning apparatus |
| JP2003211053A (en) * | 2002-01-28 | 2003-07-29 | Hirata Corp | Maintenance mechanism for coating head in liquid coater |
| CN1548247A (en) * | 2003-05-19 | 2004-11-24 | 乐金电子（沈阳）有限公司 | Ink jetting coating unit for making display board |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1695822A (en) | 2005-11-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20050235910A1 (en) | Coating apparatus with substrate cleaner | |
| JP6474239B2 (en) | Work surface wiping device and work surface wiping method | |
| CN100467140C (en) | Coating equipment | |
| CN105607414B (en) | Mask plate cleaning device and cleaning method | |
| CN104858094A (en) | Full-automatic resin lens coating spraying machine | |
| CN106583346B (en) | Conductive film minimizing technology and device | |
| WO2019019254A1 (en) | Display module terminal cleaning device and cleaning method | |
| TWI380856B (en) | Glass substrate cleaning apparatus and method | |
| CN110291014A (en) | Apparatus for film adhesion and method for adhesion of film | |
| CN111468364B (en) | Power distribution cabinet sealing gluing treatment device and treatment process | |
| CN210816367U (en) | Mobile phone film screen cleaning device | |
| JP2016140816A (en) | Transparent plate cleaning system | |
| CN208427505U (en) | A kind of cleaning jig facilitating medium and small planar optics | |
| CN112547598B (en) | Cleaning device and cleaning method | |
| CN100396387C (en) | Coating device | |
| WO2014015602A1 (en) | Equipment for washing transfer-printing plate | |
| KR980001775A (en) | Method and apparatus for cleaning and peeling off the wiper | |
| KR0186043B1 (en) | Method for scrubbing and cleaning substrate | |
| WO2018058506A1 (en) | Flexible touch panel cleaning apparatus | |
| JPH0810721A (en) | Cleaner | |
| JP2004039730A (en) | Device and method for cleaning end face of substrate and method of manufacturing semiconductor device | |
| CN211937994U (en) | Workpiece wiping device and workpiece cleaning equipment | |
| JP2002166239A (en) | Method for cleaning substrate | |
| CN209410549U (en) | A kind of membrane removal mechanism | |
| CN2763835Y (en) | Coating device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090311 Termination date: 20160510 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |