CN2763835Y - Coating device - Google Patents

Coating device Download PDF

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Publication number
CN2763835Y
CN2763835Y CN 200420103129 CN200420103129U CN2763835Y CN 2763835 Y CN2763835 Y CN 2763835Y CN 200420103129 CN200420103129 CN 200420103129 CN 200420103129 U CN200420103129 U CN 200420103129U CN 2763835 Y CN2763835 Y CN 2763835Y
Authority
CN
China
Prior art keywords
coating
nozzle
workbench
photoresist
photoresistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN 200420103129
Other languages
Chinese (zh)
Inventor
孙鲁男
王敬龙
许文诚
詹育颖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hongfujin Precision Industry Shenzhen Co Ltd
Innolux Corp
Original Assignee
Hongfujin Precision Industry Shenzhen Co Ltd
Innolux Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hongfujin Precision Industry Shenzhen Co Ltd, Innolux Corp filed Critical Hongfujin Precision Industry Shenzhen Co Ltd
Priority to CN 200420103129 priority Critical patent/CN2763835Y/en
Application granted granted Critical
Publication of CN2763835Y publication Critical patent/CN2763835Y/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The utility model relates to a coating device, which comprises a working platform and a coating unit of a spraying nozzle, wherein the coating unit of a spraying nozzle comprises a photoresistive coating spraying nozzle and a supplying device of photoresist, wherein the photoresistive coating spraying nozzle is arranged above the working platform and the supplying device of photoresist and the photoresistive coating spraying nozzle are connected to provide the photoresist. The utility model is characterized in that the working platform comprises a supporting device which can cause an element which needs to be coated to be suspended on the upper part of the working platform. Accordingly, static electricity can be prevented from being generated and an uneven coating phenomenon by bulging of a partial region of a base plate caused by fine particles which are dropped on the working platform can be effectively solved.

Description

Apparatus for coating
[technical field]
The utility model is about a kind of apparatus for coating, is meant a kind of apparatus for coating that is used to be coated with photoresist especially.
[background technology]
In liquid crystal indicator processing procedure operation, need on glass substrate, evenly be coated with the last layer specific thicknesses photoresist.
A kind of prior art scraper type apparatus for coating as shown in Figure 1.This scraper type apparatus for coating 10 comprises a workbench 16, photoresistance coating nozzle 11, a photoresist feeding mechanism 12, a nozzle cleaning groove 15 and two stands 17.This workbench 16 is in order to support and fixing substrate 13 to be coated.This two stands 17 is arranged at workbench 16 both sides respectively, this photoresistance coating nozzle 11 is arranged on workbench 16 tops, its two ends are erected on this two stands 17 and with photoresist feeding mechanism 12 and link to each other, and the photoresist of no given shape in the photoresist feeding mechanism 12 can be transformed into banded photoresist.This nozzle cleaning groove 15 is arranged at workbench 16 rear ends in order to clean photoresistance coating nozzle 11.
As shown in Figures 2 and 3, be the work synoptic diagram of scraper type apparatus for coating 10.External force promotes down, and this photoresistance coating nozzle 11 moves to second place B from primary importance A on this two stands 17, to be coated on the substrate 13 by photoresistance coating nozzle 11 by the photoresist 14 that photoresist feeding mechanism 12 provides simultaneously, after finishing once coating action, photoresistance coating nozzle 11 needs to immerse nozzle cleaning groove 15 and cleans, and prepares coating action next time.
But, when scraper type apparatus for coating 10 coating photoresists, influence because of factors such as its working environments of living in, may there be some particulates in workbench 16 surfaces or substrate 13 surfaces, these particulates will cause substrate 13 coatings unusual, influence the postorder processing procedure, simultaneously, if the particulate of substrate surface is excessive, also may make the impaired scratch of photoresistance coating nozzle; Because of contacting also with workbench 16, substrate 13 may produce static.In addition, other mechanism of workbench 16 can make the photoresist crawling even when producing vibrations, thus the quality of influence coating.
[utility model content]
For the apparatus for coating that overcomes prior art is coated with unusually and is easy to generate static; thereby cause being coated with inferior defective; the utility model provides a kind of can the minimizing in the photoresist coating process to be coated with unusually and can to prevent to produce static, thereby improves the apparatus for coating that is coated with quality and protects nozzle.
The technical scheme that the utility model technical solution problem is adopted is: a kind of apparatus for coating is provided, it comprises a workbench and a nozzle coater unit, this workbench comprises that one makes element to be coated be suspended in the bracing or strutting arrangement of workbench top, this nozzle coater unit comprises a photoresistance coating nozzle and a photoresist feeding mechanism, this photoresistance coating nozzle is positioned at the workbench top, and this photoresist feeding mechanism links to each other so that photoresist to be provided with photoresistance coating nozzle.
Compared with prior art, apparatus for coating of the present utility model is provided with a plurality of gas holes at workbench, blow substrate floating by these a plurality of gas holes, because substrate is in floating state in the coating process, promptly do not contact with workbench, thereby can prevent to produce static, also can effectively solve the particulate that drops on workbench causes substrate portion zone protuberance to cause crawling even, and the crawling that other mechanism that can avoid workbench occurs when vibrations take place is even, also can blow, can remove the particulate of substrate back in passing because of these a plurality of gas holes.
[description of drawings]
Fig. 1 is a kind of schematic perspective view of prior art apparatus for coating.
Fig. 2 and Fig. 3 are the work synoptic diagram of apparatus for coating shown in Figure 1.
Fig. 4 is the schematic perspective view of the utility model apparatus for coating first embodiment.
Fig. 5 is the work synoptic diagram of apparatus for coating shown in Figure 4.
Fig. 6 is the schematic perspective view of the utility model apparatus for coating second embodiment.
Fig. 7 is the work synoptic diagram of apparatus for coating shown in Figure 6.
Fig. 8 is the schematic perspective view of the utility model apparatus for coating the 3rd embodiment.
[embodiment]
Seeing also Fig. 4, is the synoptic diagram of the utility model apparatus for coating first embodiment.This apparatus for coating 2 comprises that a workbench 20, a nozzle cleaning groove (figure does not show), a nozzle coater unit 22 and an absorption pull device 24.This workbench 20 comprises a plurality of gas holes 201 and a plurality of adsorption hole 202, and this nozzle coater unit 22 comprises a photoresistance coating nozzle 222 and a photoresist feeding mechanism 224.
A plurality of gas holes 201 air blowings by this workbench 20 are floated substrate to be coated 200.The gas that is blown out by these a plurality of gas holes 201 utilizes gas flow-disturbing principle to make substrate to be coated 200 held stationary state in whole coating process, these a plurality of adsorption holes 202 utilize the degree of stability that vacuum adsorption principle can more accurate control basal plate 200, and these a plurality of gas holes 201 and a plurality of adsorption hole 202 equidistant intervals distribute.This nozzle cleaning groove is arranged on the end of this workbench 20.This photoresistance coating nozzle 222 is across above this workbench 20, workbench 20 is fixed at its two ends, this photoresist feeding mechanism 224 links to each other with photoresistance coating nozzle 222 and provides photoresist to it, and this photoresistance coating nozzle 222 can be transformed into the photoresist of no given shape in the photoresist feeding mechanism 224 banded photoresist and be coated on the substrate.This photoresistance coating nozzle 222 is the scraper type nozzle.
Seeing also Fig. 5, is the work synoptic diagram of this apparatus for coating 2.When utilizing apparatus for coating 2 to carry out the photoresist coating, blow a suction by these a plurality of gas holes 201 and a plurality of adsorption hole 202 1, make substrate to be coated 200 floating and be stabilized in the workbench top, utilize absorption to pull device 24 substrate 200 subsequently and move to position B from position A by the mode that absorption pulls, in its moving process, the photoresist that is provided by photoresist feeding mechanism 224 is uniformly coated on the substrate 200 by photoresistance coating nozzle 222.After this coating action is finished, photoresistance is coated with nozzle 222 and immerses the cleaning of nozzle cleaning groove, prepare the work that next time is coated with.
Apparatus for coating 2 of the present utility model is provided with a plurality of gas holes 201 and a plurality of adsorption hole 202 at workbench 20, by these a plurality of gas holes 201 air blowings substrate 200 is floated, the degree of stability of these a plurality of adsorption hole 202 more accurate control basal plate, because of substrate in the coating process 200 is in suspended state, promptly do not contact with workbench 20, so can prevent to produce static, also can effectively solve the particulate that drops at workbench 20 causes substrate 200 subregions protuberance to cause crawling even, avoid particulate damage scraper, and the crawling that other mechanism that can avoid workbench 20 occurs when producing vibrations is even, one of these a plurality of gas holes 201 and a plurality of adsorption hole 202 blows a suction, can remove the particulate of substrate back.
Seeing also Fig. 6, is the synoptic diagram of the utility model apparatus for coating second embodiment.This apparatus for coating 4 comprises a workbench 40, a nozzle cleaning groove (figure does not show) and a nozzle coater unit 42.This workbench 40 comprises a plurality of gas holes 401 and a plurality of adsorption hole 402, and this nozzle coater unit 42 comprises photoresistance coating nozzle 422, a photoresist feeding mechanism 424, two stands 426 and a drive unit (figure does not show).This photoresistance coating nozzle 422 is the scraper type nozzle, and this two stands 426 is separately positioned on workbench 40 both sides, and this photoresistance coating nozzle 422 is across above this workbench 40, and its two ends are erected on this two stands 426.
Seeing also Fig. 7, is the work synoptic diagram of this apparatus for coating 4.When utilizing apparatus for coating 4 of the present utility model to carry out the photoresist coating, blow a suction by these a plurality of gas holes 401 and a plurality of adsorption hole 402 1, make substrate to be coated 400 suspensions and be stabilized in the workbench top, the nozzle 422 of photoresistance coating subsequently moves to position B from position A under the driving of drive unit, in its moving process, the photoresist that is provided by photoresist feeding mechanism 424 is uniformly coated on the substrate 400 by photoresistance coating nozzle 422.After this coating action is finished, photoresistance is coated with nozzle 422 and immerses nozzle cleaning groove (figure does not show) cleaning, prepare the work that next time is coated with.
Seeing also Fig. 8, is the synoptic diagram of the utility model apparatus for coating the 3rd embodiment.This embodiment is different with second embodiment be in: this apparatus for coating 6 further comprises a dust arrester 64.This dust arrester 64 comprises a ultrasonic dust arrester 642 and two stands 644.This two stands 644 is arranged on workbench 60 both sides.This ultrasonic dust arrester 642 is arranged on scraper type nozzle 622 the place aheads, and across above platform 60, its two ends are to be erected on this two stands 646.This ultrasonic dust arrester 642 is to utilize ultrasonic principle and air knife effect to remove particulate, it is provided with a control device 6420 and a drive unit (figure does not show), this control device 6420 is that this drive unit makes it reciprocating on this two stands 644 in order to drive this ultrasonic dust arrester 642 in order to the switch of control ultrasonic dust arrester.
This apparatus for coating 6 except that can reach with apparatus for coating 2 same effect because this dedusting acting device 64 can remove substrate 600 surface particle, avoid particulate damage nozzle, it is unusual to reduce the substrate surface coating simultaneously.
In addition, it is described that apparatus for coating of the present utility model is not limited to above-mentioned embodiment, and for example: photoresistance coating nozzle can be the nozzle of other type outside the scraper type nozzle; Workbench also can only be provided with a plurality of gas holes, with substrate floating to be coated and be stabilized in workbench top; The ultrasonic dust arrester also can be put the front end at photoresistance coating nozzle; This pulls device can be pincers, tweezer etc. also, and parallel the dragging of substrate to be coated got final product; Can adopt other method except that gas hole is blown, the substrate for the treatment of cloth is suspended above workbench.

Claims (10)

1. apparatus for coating, comprise a workbench and a nozzle coater unit, this nozzle coater unit comprises a photoresistance coating nozzle and a photoresist feeding mechanism, this photoresistance coating nozzle is positioned at the workbench top, this photoresist feeding mechanism links to each other so that photoresist to be provided with photoresistance coating nozzle, it is characterized in that: this workbench comprises that one makes element to be coated be suspended in the bracing or strutting arrangement of workbench top.
2. apparatus for coating as claimed in claim 1 is characterized in that: this bracing or strutting arrangement is meant a plurality of gas holes that are provided with on this workbench, and it realizes supporting role by blowing.
3. apparatus for coating as claimed in claim 2 is characterized in that: this workbench further comprises a plurality of adsorption holes.
4. apparatus for coating as claimed in claim 3 is characterized in that: these a plurality of gas holes and a plurality of adsorption hole equidistant intervals distribute.
5. apparatus for coating as claimed in claim 1 is characterized in that: this photoresistance coating nozzle is fixed on the workbench top.
6. apparatus for coating as claimed in claim 5 is characterized in that: further comprise pulling device.
7. apparatus for coating as claimed in claim 6 is characterized in that: this pulls device is that absorption pulls device, pincers or tweezer.
8. apparatus for coating as claimed in claim 1 is characterized in that: this nozzle coater unit further comprises two stands, and this two stands is arranged on the workbench both sides, and this photoresistance coating nozzle ends is erected on this two stands.
9. apparatus for coating as claimed in claim 8 is characterized in that: this nozzle coater unit is provided with a drive unit, and it is reciprocating in two stands side to drive photoresistance coating nozzle.
10. apparatus for coating as claimed in claim 1 is characterized in that: further comprise a dust arrester, this dust arrester is positioned at the coating spray nozzle front end.
CN 200420103129 2004-12-16 2004-12-16 Coating device Expired - Lifetime CN2763835Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200420103129 CN2763835Y (en) 2004-12-16 2004-12-16 Coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200420103129 CN2763835Y (en) 2004-12-16 2004-12-16 Coating device

Publications (1)

Publication Number Publication Date
CN2763835Y true CN2763835Y (en) 2006-03-08

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200420103129 Expired - Lifetime CN2763835Y (en) 2004-12-16 2004-12-16 Coating device

Country Status (1)

Country Link
CN (1) CN2763835Y (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105271805A (en) * 2014-06-20 2016-01-27 麒麟电子(深圳)有限公司 Plastic particle spraying equipment of glass substrates, and plastic particle spraying method thereof
CN106186717A (en) * 2016-08-04 2016-12-07 武汉华星光电技术有限公司 Glass substrate apparatus for coating

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105271805A (en) * 2014-06-20 2016-01-27 麒麟电子(深圳)有限公司 Plastic particle spraying equipment of glass substrates, and plastic particle spraying method thereof
CN105271805B (en) * 2014-06-20 2018-01-16 麒麟电子(深圳)有限公司 The particles spray appliance and its particles spray method of glass substrate
CN106186717A (en) * 2016-08-04 2016-12-07 武汉华星光电技术有限公司 Glass substrate apparatus for coating
CN106186717B (en) * 2016-08-04 2018-11-23 武汉华星光电技术有限公司 Glass substrate apparatus for coating

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Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CX01 Expiry of patent term

Expiration termination date: 20141216

Granted publication date: 20060308