CN208437283U - Substrate cleaning apparatus - Google Patents

Substrate cleaning apparatus Download PDF

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Publication number
CN208437283U
CN208437283U CN201820258913.7U CN201820258913U CN208437283U CN 208437283 U CN208437283 U CN 208437283U CN 201820258913 U CN201820258913 U CN 201820258913U CN 208437283 U CN208437283 U CN 208437283U
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group
substrate
cleaning
touching
wiping
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CN201820258913.7U
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Chinese (zh)
Inventor
陈明生
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Ambrose Ltd By Share Ltd
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Ambrose Ltd By Share Ltd
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Abstract

The utility model discloses a kind of substrate cleaning apparatus, the substrate cleaning apparatus includes a base, one transmitting device, one wet-cleaning group and a dry cleaning group, wherein wet-cleaning group and dry cleaning group are respectively provided with the dustless cloth of continuity, utilize the tug of transmitting device folder and a mobile substrate, enable substrate can be with respect to the wiping group of wet-cleaning group and dry cleaning group, for squirting wiping and wiping respectively with dustless cloth progress substrate surface, so as to the pollutant of rapid and effective removal surface attachment, in addition, the utility model can carry out two stages cleaning, it can dry moisture after squirting cleaning, it therefore will not residual cleaning washmarking, help to promote cleaning quality.

Description

Substrate cleaning apparatus
Technical field
The utility model relates to a kind of cleaning techniques of substrate to use in particular to one kind with substrate cleaning apparatus Energy is quick and effectively clears up substrate surface.
Background technique
Semiconductor substrate, such as wafer, panel, light shield, surface cleanliness directly influence the qualification of processing procedure and product Rate, therefore constantly to check and clean in storage and processing procedure, to keep its cleanliness.For wherein light shield, due to collection 10 nanometers have been developed at the line footpath of circuit hereinafter, therefore any pollutant in processing procedure may all directly influence opposite system The qualification rate of journey or product, and be used to the surface wafer Wafer form the used light shield Mask of integrated circuit to be micro-photographing process In indispensable one of element, from the point of view of 100 sectional view of light shield as shown in Figure 1, which includes a plate 110, one Frame 120 and a protective film 150[Pellicle], wherein plate 110 is light-transmitting materials, such as quartz or glass, and plate 110 There are two the surfaces 111,112 of parallel interval for tool, wherein 111 center of a surface has the graph layer 115 of an integrated circuit [Pattern], but the frame 120 is set to the surface 111 and surrounds the graph layer 115, and the material of general framework 120 is at anode The aluminium alloy managed, the another protective film 150 is fixed on frame 120, and its surface 151 is parallel to each other with 110 surface 111 of plate Interval, the protective film 150 are used to that graph layer 115 is avoided to be scratched or polluted.
However, light shield pollution problem always exists, whether 110 surface 112 of plate in light shield 100 or protection 150 surface 151 of film can adhere to pollutant, these pollutants include to be attached to particle, the chemical substance on surface etc., if contaminated It, can be in generating corresponding defect Defect on wafer when light shield is used for photolithography in semiconductor manufacturing.And 100 plate of traditional light shield The cleaning method [non-150 surface 151 of finger protective film] on 110 surface 112 is directed to the surface of plate 110 with a large amount of cleaning solution 112 make a clean processing, but excessive cleaning solution easily causes personnel uncomfortable due to because of sucking or directly contacting the chemical substance, and Cleaning solution cleaning after when setting dry washmarking easily generated, not only will affect cleaning plate 110 efficiency, can also destroy 110 table of plate The cleanliness in face 112.In addition, viscose used in protective film 150 is esters structure (RCOOR) x, such as the high score of polyacrylate Minor structure, when using the cleaning solution of excessive sulfuric acid and hydrogenperoxide steam generator, (RCOOR) x can be hydrolyzed into flowable but not dissolve in Colloidal materials (RCOOH) x of water, and (RCOOH) x may cause scrapping for defect in mask pattern and light shield 100;
In other words, right there are cleaning effect and the unevident problem of efficiency in the cleaning of existing 100 plate 110 of light shield 110 cleaning of plate greatly perplexs and inconvenience, how to solve foregoing problems, is the important topic of industry.
Utility model content
Therefore, the main purpose of the utility model is to provide a kind of substrate cleaning apparatus, using can be rapidly and effective Carry out substrate surface cleaning, and cleaning time can be shortened rapidly and effectively.
Also, time main purpose of the utility model is to provide a substrate cleaning apparatus, using water supply wet rubbing with Two stages of xerotripsis are cleaned, can effective cleaning base plate surface, and washmarking will not be remained after cleaning, help to promote cleaning efficiency.
For this purpose, the utility model is mainly by following technological means, come implement above-mentioned projects and efficiency, To clean a substrate, aforesaid substrate includes an at least surface to be cleaned, which includes:
One base;
One transmitting device is set on base, which has a moveable clamping device, the clamping device energy Enough folder tug aforesaid substrates, so that the substrate surface to be cleaned is completely exposed;
One wet-cleaning group is set on base, which includes the wiping group of the continuous dustless cloth of a tool And a water supply pumping, which there is the touching of a control dustless cloth contact aforesaid substrate surface to be cleaned to support element, and give Water is pumped through dustless cloth and contacts substrate regions to touching to element offer cleaning solution, so that substrate is supported with touching, element is opposite to be moved It is dynamic, for squirt wiping to remove pollutant;
One dry cleaning group is set on base, which includes the wiping group of the continuous dustless cloth of a tool, There is the wiping group touching of the dustless cloth contact aforesaid substrate surface to be cleaned of a control to support element, so that element is supported in substrate and touching Relative movement, for being wiped to remove pollutant and washmarking.
Whereby, by the specific implementation of aforementioned techniques means, make the substrate cleaning apparatus of the utility model using transmission dress Folder tug and the mobile substrate are set, enables substrate with respect to the wiping group of wet-cleaning group and dry cleaning group, substrate is carried out respectively and waits for clearly That washes surface squirts wiping and wiping of blowing, practical using this so as to remove the pollutant of surface attachment rapidly and effectively It is novel to carry out two stages clean characteristic, moisture can be dried after squirting cleaning, therefore will not residual cleaning washmarking, help In promoting cleaning quality, it is often more important that since it is to adopt to be impregnated with the wet-cleaning group of cleaning solution to go to decontaminate in a manner of direct wiping Object is contaminated, is without the use of to a large amount of organic cleaning solutions, a large amount of waste liquids to be processed will not be generated, up to maintenance environmental safety, and is dropped The effect of reduction process cost, therefore the practicality can be significantly improved, to can increase its surcharge, and its economy effect can be improved Benefit.
Detailed description of the invention
Fig. 1 is a kind of appearance diagram of the light shield of semiconductor substrate.
Fig. 2 is the three-dimensional appearance schematic diagram of the utility model substrate cleaning apparatus, for illustrating the relativeness of each element.
Fig. 3 is the three-dimensional appearance schematic diagram of wiping group in the utility model substrate cleaning apparatus.
Fig. 4 is the amagnified partial perspective cut-away diagram of wiping group in the utility model substrate cleaning apparatus.
Fig. 5 is the floor map of the utility model substrate cleaning apparatus another preferred embodiment, for illustrating each element Relativeness.
Fig. 6 is the flow chart of the utility model substrate-cleaning method.
Fig. 7 is action schematic diagram of the utility model substrate cleaning apparatus when actually cleaning.
Fig. 8 be the utility model substrate cleaning apparatus when actually cleaning in utilize wet-cleaning group progress water supply wet rubbing Action schematic diagram.
Fig. 9 be the utility model substrate cleaning apparatus when actually cleaning in using dry cleaning group carry out air blowing xerotripsis Action schematic diagram.
Description of symbols: 1- substrate;100- light shield;110- substrate;The surface 111-;The surface 112-;113- blank surface; 115- graph layer;120- frame;150- protective film;The surface 151-;10- base;20- transmitting device;21- driving mechanism;22- is led Rail mechanism;23- elevating mechanism;24- clamping device;25- clamping jaw;30- wet-cleaning group;31- water supply pumping;32- feed water line; 33- nano bubble generator;35- water collection agencies;40- dry cleaning group;41- gas supply device;42- is to airway;50- wiping Group;Element is supported in 51- touching;511- intercommunicating pore;515- squit hole;52- sets material volume wheel;53- rewinding rolling wheel;54- lift drive mechanism; 55- rolls guide wheel group;56- straining pulley group;57- extruding wheel group;The dustless cloth of 58-;60- feeds transmission group;61- driving mechanism; 62- guide rail mechanism;63- microscope carrier mechanism;65- clamping jaw.
Specific embodiment
The utility model provides a kind of substrate cleaning apparatus, accompanying legend show specific embodiment of the utility model and its In component, it is all about before with after, left and right, top and bottom, top and lower part and level and vertical reference, only use In being conveniently described, the utility model is not limited, it is also non-that its component is limited to any position or direction in space.Schema with Specified size in specification, when can be according to the present utility model in the scope of the claims without departing from the utility model The design of specific embodiment is changed with demand.
The utility model provides a kind of substrate cleaning apparatus for cleaning substrate surface in the way of wiping, and the substrate 1 is outstanding Refer to that wherein Fig. 2 show this different from the cleaning on a surface 112 of protective film 150 in the plate 110 of light shield 100 as shown in Figure 1 Substrate cleaning apparatus, it includes have 40 base 10, a transmitting device 20, a wet-cleaning group 30 and a dry cleaning group groups At;
Wherein transmitting device 20 is set on base 10, as shown in Figure 7 to mobile and clamping substrate 1[].In certain realities It applies in example, which includes a driving mechanism 21, a guide rail mechanism 22, an elevating mechanism 23 and a clamping device 24, Wherein clamping device 24 is set on elevating mechanism 23,21 lifting controllable mechanism 23 of driving mechanism on guide rail mechanism 22 along moving Direction X is mobile, and clamping device 24 can be moved using 23 opposite rail mechanism 22 of elevating mechanism along moving direction Z.In certain realities Apply in example, there are in the clamping device 24 multiple opposing fingers 25, for it is synchronous press from both sides tug 1 opposite edges of substrate or opposite corner and Without departing from etc. surface [surface 112 of such as light shield 100] to be cleaned, enable clamping device 24 that can press from both sides tug substrate 1 synchronous along the side of movement It is mobile to X, Z;
Wet-cleaning group 30 includes a wiping group 50, water supply pumping 31 and a feed water line 32, in some embodiments In, which is equipped with a touching in base 10 and sets material volume wheel 52 and a rewinding rolling wheel 53 to element 51, one, and sets material volume wheel 52, element 51 is supported in touching and rewinding rolling wheel 53 is wound with a successional dustless cloth 58, which supports element 51 1 in touching The base 10 of side is equipped with a lift drive mechanism 54, moves to element 51 along moving direction Z for controlling the touching, and according to Fig. 4 Shown, which supports on element 51 and is formed with an at least intercommunicating pore 511, connects water supply above-mentioned for use by feed water line 32 and pumps 31, the intercommunicating pore 511 of element 51 is supported to convey cleaning solution to touching, and respectively there is the intercommunicating pore 511 multiple perforations touching to support element 51 The squit hole 515 on surface, and multiple squit hole 515 can correspond to the dustless cloth 58 that contact passes through, and enable cleaning solution that can squirt nothing The correspondence range of dirt cloth 58.And the feedstock direction of element 51 is supported in the touching in certain embodiments and discharging direction is arranged with a rolling Guide wheel group 55 is pressed, for keeping planarization of the dustless cloth 58 when 51 surface of element and movement are supported in pile warp touching.Again in certain implementations Touching is supported in the opposite material volume wheel 52 of element 51 and 58 path of dustless cloth of rewinding rolling wheel 53 and is arranged with a straining pulley group 56 in example, Make dustless cloth 58 that can keep smooth, smooth when blowing and rewinding.Separately in certain embodiments, it is equipped in water supply pumping 31 One nano bubble generator 33[Nanobubble Generator], for generating nano bubble in cleaning solution, to improve cleaning Effect.In addition, in some embodiments, as shown in figure 5, the wiping group 50 is supported between 51 two sides of element and rolling guide wheel group 55 in touching It is respectively equipped with an extruding wheel group 57 for supplying dustless 58 drawing-in of cloth, and the respectively extruding height of the relatively dustless cloth 58 of the extruding wheel group 57 Degree supports element 51 and the height of the rolling guide wheel group 55 by the touching lower than dustless cloth 58, makes to be impregnated in dustless cloth 58 clear Washing lotion can be extruded at extruding wheel group 57, so that the rolling guide wheel group 55 of two sides will not be passed to upwards.And in certain implementations In example, which supports in the touching of wiping group 50 and is equipped with a water collection agencies 35 below element 51 and extruding wheel group 57, supplies Collect the cleaning solution of extra drippage;
Also, as shown in Figure 3, Figure 4, dry cleaning group 40 includes a wiping group 50 above-mentioned.And in certain embodiments, The dry cleaning group 40 further includes a gas supply device 41 and one to airway 42, and element 51 is supported in the touching of the wiping group 50 Intercommunicating pore 511 can support element 51 by connecting gas supply device 41 above-mentioned to airway 42 to convey clean gas to touching Intercommunicating pore 511, and the squit hole 515 that respectively there is the intercommunicating pore 511 multiple perforation touchings to support 51 surface of element, and multiple squit hole 515 can correspond to the dustless cloth 58 that contact passes through, and enable clean gas that can dry up moisture by dustless cloth 58;
In addition, as shown in Fig. 2, the utility model substrate cleaning apparatus is on base 10 transmitting device in some embodiments 20 one end are equipped with an opposite charging transmission group 60, feed to moving substrate 1.In certain embodiments, which transmits Group 60 includes a driving mechanism 61, a guide rail mechanism 62, a microscope carrier mechanism 63, and wherein microscope carrier mechanism 63 is set on guide rail mechanism 62 It is moved along moving direction X.In certain embodiments, microscope carrier mechanism 63 and can on guide rail mechanism 62 along direction of rotation θ rotation [such as Shown in Fig. 2], for cooperating the clamping device 24 of aforementioned transmission device 20 in the orientation that folder tug substrate 1 is cleaned.Again in certain realities It applies in example, there are multiple opposing fingers 65 in the microscope carrier mechanism 63, for supporting and pressing from both sides tug substrate 1, enable microscope carrier mechanism 63 that can press from both sides tug The synchronization of substrate 1 is moved along moving direction X or direction of rotation θ rotation, and the clamping device 24 of transmitting device 20 is corresponded to for movement, with Reach automatically feed purpose.In certain embodiments, the another end of the charging transmission group 60 is that connection one checks equipment [in figure not Show], such as the optical checking equipment for detecting 1 surface contaminant of substrate, after the detection of 1 surface contaminant of completing substrate, The substrate 1 of below standard standard can be fed into immediately in the substrate cleaning apparatus of the utility model and clean movement, and cleans The detection of the surface contaminant of substrate 1 can also be carried out, immediately afterwards to be confirmed whether to complete cleaning;
Whereby, group constitutes an energy rapidly and effective clean substrate cleaning apparatus.
As also shown in fig. 6 is the flow chart according to the substrate-cleaning method of some embodiments.And shown in Fig. 7, Fig. 8 and Fig. 9 It is the action schematic diagram in substrate-cleaning method in accordance with some embodiments.The substrate is found after range estimation or detection device detection 1 surface, such as when there is pollutant on the surface 112 of a light shield 100, substrate 1 can be sent to the microscope carrier mechanism of charging transmission group 60 63, and enable 1 surface to be cleaned of substrate downward, for carrying out cleaning process.The cleaning process step includes:
In step s101, one substrate of clamping makes surface to be cleaned beyond clamping range: when the clamping machine of transmitting device 20 When the folder tug of structure 24 is placed in the substrate 1 in the microscope carrier mechanism 63 of charging transmission group 60, which can be half and leads Body equipment.In certain embodiments, the light shield which can be detection pollutant checks that equipment, light shield storage are set Standby, lithography apparatus makes the surface to be cleaned of the substrate 1 exceed the clamping range of clamping device 24, enables the table to be cleaned of the substrate 1 Face can complete to be cleaned;
In step s 102, the wet-cleaning group that mobile aforesaid substrate has continuous dustless cloth to one: as shown in fig. 7, root According to some embodiments, the clamping device 24 of the transmitting device 20 is moved along moving direction X, Z, and aforesaid substrate 1 is moved to one The top of wet-cleaning group 30;
In step S103, a cleaning solution is provided different from aforesaid substrate side to the dustless cloth of above-mentioned wet-cleaning group, with The mode of squirting contacts the surface to be cleaned of wiping aforesaid substrate: as shown in Figure 7, Figure 8, according to some embodiments, above-mentioned wet type is clear Wiping group 50 in clean group 30 can support element 51 using the control touching of lift drive mechanism 54 and move along moving direction Z, by non-dust cloth The surface to be cleaned of 58 conflicting contact substrate 1 of item, while the water supply pumping 31 of wet-cleaning group 30 is supported by feed water line 32, touching The intercommunicating pore 511 and squit hole 515 of element 51 provide cleaning solution and squirt dustless cloth 58 from bottom to top, then by clamping device 24 It drives substrate 1 to move along moving direction X, achievees the purpose that the wiped clean in the way of squirting.According to some embodiments, the water supply Nano bubble is generated in cleaning solution using nano bubble generator 33 in pumping 31, to improve the removing rate of pollutant, from And promote cleaning effect;
In step S104, mobile aforesaid substrate to one has the dry cleaning group of continuous dustless cloth: as shown in fig. 7, according to The clamping device 24 of some embodiments, the transmitting device 20 is moved along moving direction X, Z, and it is dry that aforesaid substrate 1 is moved to one The top of formula cleaning group 40;
In step S105, the dustless cloth of above-mentioned dry cleaning group is set to contact the surface to be cleaned of wiping aforesaid substrate: such as Shown in Fig. 7, Fig. 9, according to some embodiments, the wiping group 50 in above-mentioned dry cleaning group 40 can be controlled using lift drive mechanism 54 System touching is supported element 51 and is moved along moving direction Z, then will clamping by the surface to be cleaned of dustless 58 conflicting contact substrate 1 of cloth Mechanism 24 drives substrate 1 to move along moving direction X, reaches and carries out clean purpose in the way of wiping.And according to certain implementations Example, can further the dustless cloth 58 to above-mentioned dry cleaning group 40 different from aforesaid substrate side provide a clean gas, It is mentioned by the intercommunicating pore 511 for supporting element 51 to airway 42, touching with squit hole 515 by the gas supply device 41 of dry cleaning group 40 Pass through dustless cloth 58 from bottom to top for clean gas and blow to substrate 1, then drives substrate 1 along moving direction clamping device 24 X is mobile, for the wiped clean in the way of drying;
In step S106, aforesaid substrate is sent to semiconductor equipment: squirting wiping and dry type air blowing completing wet type After wiping aforesaid substrate 1, substrate 1 is placed in the microscope carrier mechanism of charging transmission group 60 by the clamping device 24 of transmitting device 20 again 63, tug substrate 1 is pressed from both sides for microscope carrier mechanism 63 and removes substrate cleaning apparatus, to be sent in semiconductor equipment.In certain implementations In example, the light shield which can be detection pollutant checks equipment, light shield storage facilities, lithography apparatus.
Again in certain embodiments, when the surface to be cleaned dustiness of substrate 1 is higher, step S102~step can be repeated Rapid S105, to improve its cleaning effect.
Via above-mentioned explanation, the setting of the utility model base-plate cleaning presss from both sides tug base using the clamping device 24 of transmitting device 20 Plate 1 enables substrate 1 with respect to the wiping group 50 of wet-cleaning group 30 and dry cleaning group 40, for carrying out 1 surface to be cleaned of substrate respectively Squirt wiping and wiping of blowing, so as to the pollutant of rapid and effective removal surface attachment, the utility model can be carried out Two stages cleaning can dry moisture after squirting cleaning, thus will not residual cleaning washmarking, help to promote cleaning quality, More importantly since it is to remove pollutant in a manner of the direct wiping of wet-cleaning group 30 for being impregnated with cleaning solution, without the use of arriving A large amount of organic cleaning solutions will not generate a large amount of waste liquids to be processed, up to maintenance environmental safety, and reduce the function of processing cost Effect, therefore the practicality can be significantly improved.

Claims (8)

1. a kind of substrate cleaning apparatus, to clean a substrate, aforesaid substrate includes that an at least surface to be cleaned, feature exists In the substrate cleaning apparatus includes:
One base;
One transmitting device is set on base, which has a moveable clamping device, which can press from both sides Tug aforesaid substrate, so that the substrate surface to be cleaned is completely exposed;
One wet-cleaning group is set on base, which includes the wiping group and one of the continuous dustless cloth of a tool There is the touching of the dustless cloth contact aforesaid substrate surface to be cleaned of a control to support element, and feed pump for water supply pumping, the wiping group Pu contacts substrate regions by dustless cloth and supports element offer cleaning solution to touching, relatively moves so that element is supported in substrate and touching, confession Wiping squirt to remove pollutant;
One dry cleaning group is set on base, which includes the wiping group of the continuous dustless cloth of a tool, the wiping It wipes group and supports element with the touching of the dustless cloth contact aforesaid substrate surface to be cleaned of a control, so that substrate is opposite to element with touching It is mobile, for being wiped to remove pollutant and washmarking.
2. substrate cleaning apparatus as described in claim 1, which is characterized in that the transmitting device transmitting device further includes One driving mechanism, a guide rail mechanism and an elevating mechanism, clamping device are set on elevating mechanism, driving mechanisms control elevating mechanism In moving on guide rail mechanism, and clamping device utilizes elevating mechanism opposite rail mechanism mobile.
3. substrate cleaning apparatus as described in claim 1, which is characterized in that be equipped with one in the water supply pumping of the wet-cleaning group Nano bubble generator.
4. substrate cleaning apparatus as described in claim 1, which is characterized in that the dry cleaning group includes gas supply Device, and the gas supply device blows to contact substrate regions by dustless cloth and supports element offer clean gas to touching, for being blown Gas is wiped to remove pollutant and washmarking.
5. substrate cleaning apparatus as described in claim 1, which is characterized in that the wiping of the wet-cleaning group and the dry cleaning group Group touching is wiped to an at least intercommunicating pore is formed on element, for use by feed water line connection water supply pumping or airway is given to connect gas Power supply unit, and the squit hole that respectively there is the intercommunicating pore multiple perforation touchings to support element surface, and multiple squit hole correspondence passes through touching Dustless cloth to element surface.
6. substrate cleaning apparatus as claimed in claim 1 or 5, which is characterized in that the wet-cleaning group and the dry cleaning group Wiping group support elements on either side in touching and be respectively equipped with and put the one of the dustless cloth of continuity for volume and set material volume wheel and a rewinding rolling wheel, and The feedstock direction of element is supported in the touching and discharging direction is respectively equipped with a rolling guide wheel group, but the touching support the opposite material volume wheel of element with It is arranged with a straining pulley group in the non-dust cloth paths of rewinding rolling wheel, is able to maintain dustless cloth when blowing and rewinding flat It is whole, smooth.
7. substrate cleaning apparatus as claimed in claim 6, which is characterized in that the wiping group of the wet-cleaning group supports element in touching Two sides and rolling guide wheel group between be respectively equipped with one for dustless cloth drawing-in extruding wheel group, and respectively the extruding wheel group with respect to non-dust cloth The extruding height of item supports the height of element and the rolling guide wheel group lower than dustless cloth by the touching, makes to be impregnated in dustless cloth Cleaning solution can be extruded at extruding wheel group, so that the rolling guide wheel group of two sides will not be passed to upwards.
8. substrate cleaning apparatus as claimed in claim 7, which is characterized in that the wet-cleaning group is equipped with one below wiping group Water collection agencies, for collecting the cleaning solution of extra drippage.
CN201820258913.7U 2018-02-14 2018-02-14 Substrate cleaning apparatus Active CN208437283U (en)

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Application Number Priority Date Filing Date Title
CN201820258913.7U CN208437283U (en) 2018-02-14 2018-02-14 Substrate cleaning apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111774344A (en) * 2020-06-05 2020-10-16 湖北德道汽车科技有限公司 Metal material belt conveying device, cleaning mechanism, cleaning system and cleaning method thereof
CN113319017A (en) * 2021-04-27 2021-08-31 李玉良 Device for quickly cleaning memory bank mirror plate of computer and detecting powder

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111774344A (en) * 2020-06-05 2020-10-16 湖北德道汽车科技有限公司 Metal material belt conveying device, cleaning mechanism, cleaning system and cleaning method thereof
CN113319017A (en) * 2021-04-27 2021-08-31 李玉良 Device for quickly cleaning memory bank mirror plate of computer and detecting powder

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