CN1695822A - Coating equipment - Google Patents

Coating equipment Download PDF

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Publication number
CN1695822A
CN1695822A CN 200410027228 CN200410027228A CN1695822A CN 1695822 A CN1695822 A CN 1695822A CN 200410027228 CN200410027228 CN 200410027228 CN 200410027228 A CN200410027228 A CN 200410027228A CN 1695822 A CN1695822 A CN 1695822A
Authority
CN
China
Prior art keywords
coating
support
platform
scraper type
type nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN 200410027228
Other languages
Chinese (zh)
Other versions
CN100467140C (en
Inventor
邓振坤
王敬龙
许文诚
詹育颖
曾增魁
谢和利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hongfujin Precision Industry Shenzhen Co Ltd
Innolux Corp
Original Assignee
Hongfujin Precision Industry Shenzhen Co Ltd
Innolux Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hongfujin Precision Industry Shenzhen Co Ltd, Innolux Corp filed Critical Hongfujin Precision Industry Shenzhen Co Ltd
Priority to CNB2004100272286A priority Critical patent/CN100467140C/en
Publication of CN1695822A publication Critical patent/CN1695822A/en
Application granted granted Critical
Publication of CN100467140C publication Critical patent/CN100467140C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Coating Apparatus (AREA)

Abstract

A photoresist coating process is composed of a platform for supporting a substrate, a coating unit above said platform for coating photoresist on said substrate, and an ultrasonic cleaner for removing dust from said substrate before coated.

Description

Apparatus for coating
[technical field]
The invention relates to a kind of apparatus for coating, particularly about a kind of apparatus for coating that is used to be coated with photoresist.
[background technology]
In liquid crystal indicator processing procedure operation, need on glass substrate, evenly be coated with the photoresist of last layer specific thicknesses.
A kind of prior art apparatus for coating is to adopt the mode of scraper coating that photoresist is applied on the glass substrate.Be the schematic diagram of prior art scraper type apparatus for coating as shown in Figure 1.This scraper type apparatus for coating 10 comprises a platform 16, a scraper type nozzle 11, a photoresist feeding mechanism 12 and a nozzle cleaning groove 15.This platform 16 is used for supporting and fixing substrate 13 to be coated.This scraper type nozzle 11 is located at platform 16 tops and is linked to each other with photoresist feeding mechanism 12.This nozzle cleaning groove 15 is located at platform 16 rear ends and is used for cleaning scraper knife-type nozzle 11.As shown in Figures 2 and 3, be the work schematic diagram of scraper type apparatus for coating 10.Scraper type nozzle 11 moves to second place B from primary importance A, and the photoresist 14 of the no given shape that photoresist feeding mechanism 12 provides was transformed into band shape by scraper type nozzle 11 and was applied on the substrate 13 this moment.After finishing once coating action, scraper type nozzle 11 needs to immerse nozzle cleaning groove 15 and cleans, and prepares to be coated with action next time.
But; when the scraper type apparatus for coating 10 of employing the prior art was done the photoresist coating, because of the influence of factors such as apparatus for coating 10 place working environments, may there be some particulates in substrate 13 surfaces; these particulates can cause substrate 13 surface coatings unusual, the quality of influence back processing procedure.Simultaneously, these particulates also may make the 11 impaired scratches of scraper type nozzle.
[summary of the invention]
Apparatus for coating can cause substrate surface to be coated with the shortcoming of unusual and the impaired scratch of scraper type nozzle because of the particulate that exists on the substrate to be coated in the prior art coating process in order to overcome, and the invention provides a kind of apparatus for coating that can remove particulate on the substrate to be coated in coating process.
The technical scheme that technical solution problem of the present invention is adopted is: a kind of apparatus for coating is provided, comprise a platform, a coating mechanism and a dust arrester, this platform is in order to support and fixing substrate to be coated, this coating mechanism is positioned at the platform top, this dust arrester is provided with a supersonic dust remover, and it is located at the platform top and places coating mechanism the place ahead.
The invention has the beneficial effects as follows: compared with prior art, apparatus for coating of the present invention is provided with a supersonic dust remover before coating mechanism, this supersonic dust remover can carry out before the photoresistance coating particulate on the substrate being removed at this coating mechanism, avoid particulate damage scraper type nozzle, and it is unusual to reduce coating.
[description of drawings]
Fig. 1 is the floor map of prior art apparatus for coating.
Fig. 2 and Fig. 3 are the work schematic diagrames of apparatus for coating shown in Figure 1.
Fig. 4 is the schematic perspective view of apparatus for coating of the present invention.
Fig. 5 is the work schematic diagram of apparatus for coating of the present invention.
[specific embodiment]
Seeing also Fig. 4, is the schematic diagram of apparatus for coating 20 of the present invention.This apparatus for coating 20 comprises a platform 30, a nozzle cleaning groove (figure does not show), a coating mechanism 40 and a dust arrester 50.
This platform 30 utilizes the fixing substrate 21 to be coated of vacuum adsorption principle absorption.This nozzle cleaning groove is located at the end of platform 30.
This coating mechanism 40 comprises a scraper type nozzle 41, a photoresist feeding mechanism 42, a pair of first support 43 and a drive unit (figure does not show).Should be arranged on the both sides of platform 30 to first support 43, this scraper type nozzle 41 is across above this platform 30, and its two ends are erected on first support 43.This photoresist feeding mechanism 42 links to each other with scraper type nozzle 41 and provides photoresist to be coated to it.This drive unit is to be used for driving this scraper type nozzle to make it reciprocating on first support 43.
This dust arrester 50 comprises a supersonic dust remover 51 and a pair of second support 53.Should be arranged side by side in platform 30 both sides second support 53 and first support 43.This supersonic dust remover 51 places scraper type nozzle 41 the place aheads, and across above platform 30, its two ends are erected on second support 53.This supersonic dust remover 51 utilizes ultrasonic wave principle and air knife effect to remove particulate, it is provided with a control device 511 and a drive unit (figure does not show), this control device 511 is the switches that are used for controlling supersonic dust remover 51, and this drive unit is used for driving this supersonic dust remover 51 makes it reciprocating on second support 53.
Please consulting Fig. 5 together, is the work schematic diagram of apparatus for coating 20 of the present invention.When utilizing this apparatus for coating 20 to carry out the photoresist coating, substrate to be coated 21 is adsorbed on the platform 30, make supersonic dust remover 51 under the driving of drive unit, move to position B from position A, utilize control device 511 to open this supersonic dust remover 51 simultaneously, make it in running order, the particulate on the substrate 21 is removed.Scraper type nozzle 41 also moves to position B from position A under the driving of drive unit subsequently, in the process that it moves, the photoresist that is provided by photoresist feeding mechanism 42 is uniformly coated on the substrate 21.After this coating action was finished, scraper type nozzle 41 and supersonic dust remover 51 returned, and with cleaning in the scraper type nozzle 41 immersion nozzle cleaning grooves, prepared coating action next time.
Apparatus for coating 20 of the present invention is provided with a supersonic dust remover 51 before scraper type nozzle 41, therefore can carry out before the photoresistance coating particulate on the substrate 21 being removed at this apparatus for coating 20, so just can avoid particulate damage scraper, and it is unusual to reduce coating simultaneously.

Claims (7)

1. apparatus for coating, comprise a platform and a coating mechanism, this platform is in order to support and fixing substrate to be coated, this coating mechanism is positioned at the platform top, it is characterized in that: further comprise a dust arrester, it is provided with a supersonic dust remover, and this supersonic dust remover is located at the platform top and is placed coating mechanism the place ahead.
2. apparatus for coating as claimed in claim 1 is characterized in that: this coating mechanism comprises a scraper type nozzle and a photoresist feeding mechanism, and this scraper type nozzle is positioned at the platform top, and this photoresist feeding mechanism links to each other with the scraper type nozzle.
3. apparatus for coating as claimed in claim 1 is characterized in that: this supersonic dust remover is provided with a control device.
4. apparatus for coating as claimed in claim 1 is characterized in that: this coating mechanism further comprises a pair of first support, and this is set up in the platform both sides to first, and this scraper type nozzle ends is set up in this on first support.
5. apparatus for coating as claimed in claim 1 is characterized in that: this dust arrester further comprises a pair of second support, and this second support and first support are arranged side by side in the platform both sides, and the two ends of this supersonic dust remover are set up on second support.
6. apparatus for coating as claimed in claim 4 is characterized in that: this apparatus for coating is provided with a drive unit, and it is reciprocating on first support to drive the scraper type nozzle.
7. apparatus for coating as claimed in claim 5 is characterized in that: this supersonic dust remover is provided with a drive unit, and it is reciprocating on second support to drive supersonic dust remover.
CNB2004100272286A 2004-05-10 2004-05-10 Coating equipment Expired - Fee Related CN100467140C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2004100272286A CN100467140C (en) 2004-05-10 2004-05-10 Coating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2004100272286A CN100467140C (en) 2004-05-10 2004-05-10 Coating equipment

Publications (2)

Publication Number Publication Date
CN1695822A true CN1695822A (en) 2005-11-16
CN100467140C CN100467140C (en) 2009-03-11

Family

ID=35348805

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004100272286A Expired - Fee Related CN100467140C (en) 2004-05-10 2004-05-10 Coating equipment

Country Status (1)

Country Link
CN (1) CN100467140C (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1885164B (en) * 2005-06-24 2010-04-07 友达光电股份有限公司 Photoresist coating method and photoresist coating apparatus
CN103331276A (en) * 2013-07-12 2013-10-02 深圳市华星光电技术有限公司 Ultrasonic cleaning device and coating machine with ultrasonic cleaning device
CN103521479A (en) * 2013-09-27 2014-01-22 京东方科技集团股份有限公司 Cleaning device and linear coater
CN103711037A (en) * 2014-01-06 2014-04-09 西安航天华阳印刷包装设备有限公司 Wallpaper coating adsorption mechanism
CN104635692A (en) * 2014-12-31 2015-05-20 深圳市华星光电技术有限公司 Method for coating photoresist film and coating equipment using method
CN105080766A (en) * 2014-05-20 2015-11-25 中外炉工业株式会社 Substrate coating apparatus and substrate coating method
CN107199188A (en) * 2017-06-12 2017-09-26 京东方科技集团股份有限公司 Coating machine, coating system and coating machine clean method
WO2020062836A1 (en) * 2018-09-27 2020-04-02 武汉华星光电技术有限公司 Alignment film coating device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NZ179743A (en) * 1975-01-13 1979-01-11 Nat Steel Corp Coating sheet material reducing edge affect impinging jets
DE4025663A1 (en) * 1990-08-14 1991-10-24 Bayerische Motoren Werke Ag Applying consistent coating to substrate - cleaning the substrate in front of the coating head by using spring-loaded block with doctoring edge set at acute angle
JP2000237666A (en) * 1999-02-18 2000-09-05 Dainippon Printing Co Ltd Apparatus and method for planar coating of viscous liquid
JP2002166239A (en) * 2000-11-30 2002-06-11 Optrex Corp Method for cleaning substrate
JP2003200121A (en) * 2002-01-11 2003-07-15 Ricoh Microelectronics Co Ltd Air cleaning apparatus
JP4053777B2 (en) * 2002-01-28 2008-02-27 平田機工株式会社 Maintenance mechanism of coating head in liquid coating equipment
CN1261230C (en) * 2003-05-19 2006-06-28 乐金电子(沈阳)有限公司 Ink jetting coating unit for making display board

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1885164B (en) * 2005-06-24 2010-04-07 友达光电股份有限公司 Photoresist coating method and photoresist coating apparatus
CN103331276B (en) * 2013-07-12 2016-05-18 深圳市华星光电技术有限公司 Ultrasonic cleaning equipment and the coating machine with this ultrasonic cleaning equipment
CN103331276A (en) * 2013-07-12 2013-10-02 深圳市华星光电技术有限公司 Ultrasonic cleaning device and coating machine with ultrasonic cleaning device
WO2015003417A1 (en) * 2013-07-12 2015-01-15 深圳市华星光电技术有限公司 Ultrasonic cleaning device and coating machine with ultrasonic cleaning device
CN103521479A (en) * 2013-09-27 2014-01-22 京东方科技集团股份有限公司 Cleaning device and linear coater
US9529262B2 (en) 2013-09-27 2016-12-27 Boe Technology Group Co., Ltd. Cleaning device and linear coating machine
CN103711037A (en) * 2014-01-06 2014-04-09 西安航天华阳印刷包装设备有限公司 Wallpaper coating adsorption mechanism
CN103711037B (en) * 2014-01-06 2015-08-05 西安航天华阳印刷包装设备有限公司 Wallpaper coating adsorbing mechanism
CN105080766A (en) * 2014-05-20 2015-11-25 中外炉工业株式会社 Substrate coating apparatus and substrate coating method
CN105080766B (en) * 2014-05-20 2017-08-11 中外炉工业株式会社 The applying device of substrate and the coating method of substrate
CN104635692A (en) * 2014-12-31 2015-05-20 深圳市华星光电技术有限公司 Method for coating photoresist film and coating equipment using method
CN107199188A (en) * 2017-06-12 2017-09-26 京东方科技集团股份有限公司 Coating machine, coating system and coating machine clean method
US11338336B2 (en) 2017-06-12 2022-05-24 Hefei Xinsheng Optoelectronics Technology Co., Ltd. Coating machine, coating system and cleaning method for coating machine
WO2020062836A1 (en) * 2018-09-27 2020-04-02 武汉华星光电技术有限公司 Alignment film coating device

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Granted publication date: 20090311

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