CN1885164B - Photoresist coating method and photoresist coating apparatus - Google Patents
Photoresist coating method and photoresist coating apparatus Download PDFInfo
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- CN1885164B CN1885164B CN200510079116XA CN200510079116A CN1885164B CN 1885164 B CN1885164 B CN 1885164B CN 200510079116X A CN200510079116X A CN 200510079116XA CN 200510079116 A CN200510079116 A CN 200510079116A CN 1885164 B CN1885164 B CN 1885164B
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- photoresistance
- coating
- substrate
- cleaning device
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Abstract
The invention relates to a photo resist coating device, which comprises photo resist element, a cleaning element and a platform, wherein the base plate is arranged on the platform; when coating photo resist, the cleaning device first clean the particle on the surface of base plate; then the photo resist coating element uniformly sprays the photo resist on the surface of base plate.
Description
Invention field
The present invention relates to a kind of photoresistance coating apparatus and method, particularly, relate to a kind of photoresistance coating apparatus and method of may command particle number.
Technical background
Generally being applied at present the photoresistance coating apparatus of large scale liquid crystal panel manufacturing process, as shown in Fig. 1 a, is to utilize a photoresistance apparatus for coating 10, move towards a first direction x in the mode of scanning, with photoresistance 2 even spray coating in the surface of substrate 1.With reference to Fig. 1 b, photoresistance apparatus for coating 10 comprises shower nozzle 11, and shower nozzle 11 central authorities have a slit 12, and photoresistance (agent) 2 promptly sprays out between this slit 12.Such design has seen Tokyo and has answered among the chemical industry photoresistance coating apparatus that company provided such as (TOK).
In photoresistance coating manufacturing process, the particulate that substrate and transmission equipment are entrained, and the particulate that produced of photoresistance coating apparatus itself all can be along with the time be accumulated in the photoresistance coating apparatus gradually, and may pollute substrate, the quality of reduction product.
Summary of the invention
The present invention promptly solves above-mentioned prior art problems for desire, and a kind of photoresistance coating apparatus is provided, and comprises a photoresistance apparatus for coating, a cleaning device and a platform.Wherein, this cleaning device comprises an insufflation unit and a suction unit, and this insufflation unit blows out a gas towards this substrate, so that described a plurality of particulate breaks away from this substrate, this suction unit is removed described a plurality of particulates of this substrate surface with pull of vacuum.Wherein, this insufflation unit comprises an inflatable mouth, and this inflatable mouth is a slit, and the width of this inflatable mouth is about 1～2 millimeter.Substrate is placed on the platform.When the coating photoresistance, cleaning device is removed the particulate of substrate surface earlier, and then, the photoresistance apparatus for coating evenly is sprayed on photoresistance the surface of substrate.
The present invention can clean substrate before the photoresistance coating in advance, therefore can reduce the particulate of substrate surface, promoted the quality of product.In addition, the present invention cleans the platform that is used to put substrate simultaneously, with the particulate in the further removing photoresistance coating apparatus, therefore, can effectively control the particle number within the photoresistance coating apparatus.
The accompanying drawing summary
Fig. 1 a is the synoptic diagram that shows the photoresistance coating apparatus of prior art;
Fig. 1 b is the synoptic diagram that shows the thin portion structure of photoresistance apparatus for coating;
Fig. 2 is the synoptic diagram that shows photoresistance coating apparatus of the present invention;
Fig. 3 a is the A-A direction sectional view of cleaning device in the displayed map 2;
Fig. 3 b is the upward view that shows cleaning device;
Fig. 3 c is the synoptic diagram that shows the cleaning situation of cleaning device;
Fig. 3 d is the synoptic diagram that shows the variation of cleaning device of the present invention;
Fig. 3 e is the synoptic diagram of the cleaning situation of the cleaning device among the displayed map 3d; And
Fig. 4 a, 4b, 4c and 4d are the synoptic diagram that shows cleaning of the present invention.
Symbol description
1～substrate, 2～photoresistance
3～particulate, 10～photoresistance apparatus for coating
11～shower nozzle, 12～slit
20～cleaning device 21,21 '～suction unit
22,22 '～insufflation unit, 23～air entry
24～inflatable mouth, 30～platform
40～manufacturing process cavity, 100～photoresistance coating apparatus
Detailed Description Of The Invention
With reference to Fig. 2, it has shown photoresistance coating apparatus 100 of the present invention, comprises a photoresistance apparatus for coating 10, a cleaning device 20, a platform 30 and a manufacturing process cavity 40.Photoresistance apparatus for coating 10, cleaning device 20 and platform 30 all are located among the manufacturing process cavity 40.Substrate 1 is placed on the platform 30.When coating photoresistance 2, cleaning device 20 is removed the particulate on substrate 1 surface earlier, and then, photoresistance apparatus for coating 10 evenly is sprayed on photoresistance 2 surface of substrate 1.
With reference to Fig. 3 a, it has shown the A-A direction sectional view of cleaning device 20 among Fig. 2.Cleaning device 20 comprises 21 and two insufflation unit of a suction unit (air-breathing cavity) (air blowing cavity) 22, and insufflation unit 22 is positioned at the both sides of suction unit 21.Suction unit 21 has air entry 23, and insufflation unit 22 has inflatable mouth 24.With reference to Fig. 3 b, it has shown the upward view of cleaning device 20, and air entry 23 and inflatable mouth 24 are the slit of strip, and its width is about 1～2 millimeter.With reference to Fig. 3 c, insufflation unit 22 connects an air blowing pipeline (not shown), when cleaning, insufflation unit 22 is from suction unit 21 both sides, blow out a gas (air) towards substrate 1, so that the particulate 3 on substrate 1 surface breaks away from these substrates 1, simultaneously, suction unit 21 with pull of vacuum with among the particulate 3 inhale unit 21.Suction unit 21 connects a vacuum line (not icon), and particulate 3 enters after the suction unit 21, can discharge this photoresistance coating apparatus 100 by this vacuum line.The blow gas pressure of this insufflation unit 22 is about 12～14 kPas.The pressure of inspiration(Pi) of this suction unit 21 is about-12～-14 kPas.Do the time spent when cleaning device 20, the pressure of inspiration(Pi) of suction unit 21 can be slightly larger than the blow gas pressure of insufflation unit 22.
With reference to Fig. 3 d, it has shown the variation of cleaning device of the present invention, and its characteristics are that suction unit 21 ' is positioned at the both sides of insufflation unit 22 '.With reference to Fig. 3 e, insufflation unit 22 ' connects an air blowing pipeline (not shown), when cleaning, insufflation unit 22 ' blows out a gas (air) towards substrate 1, so that the particulate 3 on substrate 1 surface breaks away from this substrate 1, simultaneously, suction unit 21 ' is in the both sides of this insufflation unit 22 ', with pull of vacuum with among the particulate 3 inhale unit 21 '.Suction unit 21 ' connects a vacuum line (not shown), and particulate 3 enters suction unit 21 ' afterwards, can discharge this photoresistance coating apparatus 100 by this vacuum line.
Though in the present invention's embodiment, suction unit and insufflation unit are cavity body structure, air entry and inflatable mouth are the slit of strip.Yet it does not limit embodiments of the present invention, and suction unit and insufflation unit also can be pipeline structure, and air entry and inflatable mouth also can be cavernous structure.Perhaps utilize suction unit to remove particulate merely, and omit this insufflation unit.
The operational scenario of photoresistance coating apparatus 100 of the present invention below is described.With reference to Fig. 4 a, at first, among this manufacturing process cavity 40, this photoresistance apparatus for coating 10 is positioned at a primary importance, and this cleaning device 20 is positioned at a second place.Then, as shown in Fig. 4 b, this cleaning device 20 moves to this primary importance along one second direction-x from this second place, and removes the particulate on this platform 30 simultaneously.With reference to Fig. 4 c, after cleaning device 20 had cleaned this platform 30 and has been positioned at this primary importance, substrate 1 was transferred and is placed on this platform 30.Then, as shown in Fig. 4 d, this photoresistance apparatus for coating 10 and this cleaning device 20 are simultaneously towards this first direction x, move to this second place from this primary importance, at this moment, this cleaning device 20 is positioned at the place ahead of this photoresistance apparatus for coating 10, and this cleaning device 20 is removed the particulate on this substrate 1 in advance, and this photoresistance apparatus for coating 10 sprays photoresistance 2 to this substrate 1 subsequently.After the photoresistance coating is finished, remove this substrate, this cleaning device 20 rests on this second place, and this photoresistance apparatus for coating 10 is got back to this primary importance along this second direction-x from this second place, and recovers the state of Fig. 4 a.
The present invention can clean substrate before the photoresistance coating in advance, therefore can reduce the particulate of substrate surface, promoted the quality of product.In addition, the present invention cleans the platform that is used to put substrate simultaneously, with the particulate in the further removing photoresistance coating apparatus, therefore, can effectively control the particle number within the photoresistance coating apparatus.
Though the present invention discloses as above with concrete preferred embodiment; right its is not in order to limit the present invention; any those of ordinary skills without departing from the spirit and scope of the present invention; still can make many changes and retouching, so protection scope of the present invention is as the criterion with the appended scope that claim was defined.
Claims (14)
1. photoresistance coating apparatus in order to a base plate coating one photoresistance, comprising:
One platform is in order to put this substrate;
One cleaning device moves above this platform, removes a plurality of particulates with pull of vacuum; And
The photoresistance apparatus for coating sprays this photoresistance to this substrate,
Wherein, this cleaning device comprises an insufflation unit and a suction unit, and this insufflation unit blows out a gas towards this substrate, so that described a plurality of particulate breaks away from this substrate, this suction unit is removed described a plurality of particulates of this substrate surface with pull of vacuum,
Wherein, this insufflation unit comprises an inflatable mouth, and this inflatable mouth is a slit,
Wherein, the width of this inflatable mouth is about 1～2 millimeter.
2. photoresistance coating apparatus according to claim 1, wherein, this cleaning device is removed described a plurality of particulates of this substrate surface in the mode of scanning.
3. photoresistance coating apparatus according to claim 1, wherein, this photoresistance apparatus for coating evenly is sprayed on this photoresistance on this substrate in the mode of scanning.
4. photoresistance coating apparatus according to claim 1, wherein, this suction unit comprises an air entry, this air entry is a slit.
5. photoresistance coating apparatus according to claim 4, wherein, the width of this air entry is about 1～2 millimeter.
6. photoresistance coating apparatus according to claim 1, wherein, the blow gas pressure of this insufflation unit is about 12～14 kPas.
7. photoresistance coating apparatus according to claim 1, wherein, the pressure of inspiration(Pi) of this suction unit is about-12～-14 kPas.
8. photoresistance coating apparatus according to claim 1, wherein, this cleaning device comprises two insufflation unit and a suction unit, described insufflation unit is positioned at the both sides of this suction unit, described insufflation unit blows out a gas towards this substrate, so that described a plurality of particulate breaks away from this substrate, this suction unit is removed the described particulate of this substrate surface with pull of vacuum.
9. photoresistance coating apparatus according to claim 1, wherein, this cleaning device comprises an insufflation unit and two suction units, described suction unit is positioned at this insufflation unit both sides, this insufflation unit blows out a gas towards this substrate, so that described a plurality of particulate breaks away from this substrate, described suction unit is removed described a plurality of particulates of this substrate surface with pull of vacuum.
10. photoresistance coating apparatus according to claim 1, it also comprises a manufacturing process cavity, wherein, this platform, this cleaning device and this photoresistance apparatus for coating all are located among this manufacturing process cavity.
11. a photoresistance coating process comprises:
(a) provide photoresistance coating apparatus as claimed in claim 1;
(b) this substrate is placed on this platform; And
(c) simultaneously this cleaning device and this photoresistance apparatus for coating are moved to a second place from a primary importance towards a first direction, at this moment, this cleaning device is positioned at the place ahead of this photoresistance apparatus for coating, this cleaning device is removed the described a plurality of particulates on this substrate in advance, and this photoresistance apparatus for coating sprays this photoresistance to this substrate subsequently.
12. photoresistance coating process according to claim 11 wherein, between step (a) and step (b), also comprises the step (d) of removing the described a plurality of particulates on this platform with this cleaning device.
13. photoresistance coating process according to claim 12, wherein, in this step (d), this cleaning device moves to this primary importance along a second direction from this second place, and removes the described a plurality of particulates on this platform simultaneously.
14. photoresistance coating process according to claim 13 wherein, in this step (c) afterwards, also comprises this photoresistance apparatus for coating moving to the step (e) of this primary importance from this second place along this second direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200510079116XA CN1885164B (en) | 2005-06-24 | 2005-06-24 | Photoresist coating method and photoresist coating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200510079116XA CN1885164B (en) | 2005-06-24 | 2005-06-24 | Photoresist coating method and photoresist coating apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1885164A CN1885164A (en) | 2006-12-27 |
| CN1885164B true CN1885164B (en) | 2010-04-07 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN200510079116XA Expired - Fee Related CN1885164B (en) | 2005-06-24 | 2005-06-24 | Photoresist coating method and photoresist coating apparatus |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102419511A (en) * | 2011-06-07 | 2012-04-18 | 上海华力微电子有限公司 | Method for removing dust particles on surface of optical lithography mask slice |
| CN104162496A (en) * | 2013-05-15 | 2014-11-26 | 上海和辉光电有限公司 | Slit coater |
| CN105093578B (en) * | 2015-07-25 | 2019-05-28 | 武汉华星光电技术有限公司 | Light blockage coating device |
| CN106842646B (en) * | 2017-03-03 | 2019-11-29 | 惠科股份有限公司 | A kind of display panel cleaning machine |
| CN109643657B (en) * | 2017-06-22 | 2022-08-16 | 深圳市柔宇科技股份有限公司 | Manufacturing equipment and manufacturing method of array substrate |
| CN112007826A (en) * | 2019-05-29 | 2020-12-01 | 夏普株式会社 | Coating device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4025663A1 (en) * | 1990-08-14 | 1991-10-24 | Bayerische Motoren Werke Ag | Applying consistent coating to substrate - cleaning the substrate in front of the coating head by using spring-loaded block with doctoring edge set at acute angle |
| CN1570767A (en) * | 2003-03-06 | 2005-01-26 | 三星电子株式会社 | Discharging unit for discharging a photosensitive material, coater and apparatus for coating a photosensitive material |
| CN1574221A (en) * | 2003-06-04 | 2005-02-02 | 大日本网目版制造株式会社 | Liquid supplying device and substrate processing device |
| CN1618527A (en) * | 2003-11-18 | 2005-05-25 | 大日本网目版制造株式会社 | Base plate treater, slit jet nozzle and mechanism for determining liquid filling degree and gas mixing degree in filled body |
| CN1695822A (en) * | 2004-05-10 | 2005-11-16 | 鸿富锦精密工业（深圳）有限公司 | Coating equipment |
-
2005
- 2005-06-24 CN CN200510079116XA patent/CN1885164B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4025663A1 (en) * | 1990-08-14 | 1991-10-24 | Bayerische Motoren Werke Ag | Applying consistent coating to substrate - cleaning the substrate in front of the coating head by using spring-loaded block with doctoring edge set at acute angle |
| CN1570767A (en) * | 2003-03-06 | 2005-01-26 | 三星电子株式会社 | Discharging unit for discharging a photosensitive material, coater and apparatus for coating a photosensitive material |
| CN1574221A (en) * | 2003-06-04 | 2005-02-02 | 大日本网目版制造株式会社 | Liquid supplying device and substrate processing device |
| CN1618527A (en) * | 2003-11-18 | 2005-05-25 | 大日本网目版制造株式会社 | Base plate treater, slit jet nozzle and mechanism for determining liquid filling degree and gas mixing degree in filled body |
| CN1695822A (en) * | 2004-05-10 | 2005-11-16 | 鸿富锦精密工业（深圳）有限公司 | Coating equipment |
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| Publication number | Publication date |
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| CN1885164A (en) | 2006-12-27 |
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Owner name: YOUDA PHOTOELECTRIC CO., LTD. Free format text: FORMER OWNER: GUANGHUI ELECTRONIC CO., LTD. Effective date: 20080215 |
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Effective date of registration: 20080215 Address after: Hsinchu, Taiwan, China Applicant after: AU Optronics Corporation Address before: China Taiwan Taoyuan County Applicant before: Guanghui Electronic Co., Ltd. |
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Granted publication date: 20100407 Termination date: 20200624 |
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