TWI572419B - 用於清理半導體晶圓的錐形刷 - Google Patents

用於清理半導體晶圓的錐形刷 Download PDF

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Publication number
TWI572419B
TWI572419B TW102111168A TW102111168A TWI572419B TW I572419 B TWI572419 B TW I572419B TW 102111168 A TW102111168 A TW 102111168A TW 102111168 A TW102111168 A TW 102111168A TW I572419 B TWI572419 B TW I572419B
Authority
TW
Taiwan
Prior art keywords
brush
substrate
axis
linear velocity
cleaning device
Prior art date
Application number
TW102111168A
Other languages
English (en)
Chinese (zh)
Other versions
TW201345620A (zh
Inventor
泰瑞爾傑夫利Ｊ
維斯爾布蘭迪Ｓ
Original Assignee
伊利諾工具工程公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 伊利諾工具工程公司 filed Critical 伊利諾工具工程公司
Publication of TW201345620A publication Critical patent/TW201345620A/zh
Application granted granted Critical
Publication of TWI572419B publication Critical patent/TWI572419B/zh

Links

Classifications

    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B7/00—Bristle carriers arranged in the brush body
    • A46B7/04—Bristle carriers arranged in the brush body interchangeably removable bristle carriers
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B9/00—Arrangements of the bristles in the brush body
    • A46B9/08—Supports or guides for bristles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02096—Cleaning only mechanical cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B13/00—Brushes with driven brush bodies or carriers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Brushes (AREA)
  • Cleaning In General (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
TW102111168A 2012-04-03 2013-03-28 用於清理半導體晶圓的錐形刷 TWI572419B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261619512P 2012-04-03 2012-04-03
US13/803,211 US8778087B2 (en) 2012-04-03 2013-03-14 Conical sponge brush for cleaning semiconductor wafers

Publications (2)

Publication Number Publication Date
TW201345620A TW201345620A (zh) 2013-11-16
TWI572419B true TWI572419B (zh) 2017-03-01

Family

ID=49233228

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102111168A TWI572419B (zh) 2012-04-03 2013-03-28 用於清理半導體晶圓的錐形刷

Country Status (5)

Country Link
US (2) US8778087B2 (enExample)
JP (1) JP6378168B2 (enExample)
KR (1) KR102054536B1 (enExample)
TW (1) TWI572419B (enExample)
WO (1) WO2013152008A1 (enExample)

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USD735430S1 (en) * 2013-09-24 2015-07-28 Ebara Corporation Roller shaft for substrate cleaning
TWD170203S (zh) * 2013-09-24 2015-09-01 荏原製作所股份有限公司 基板洗淨用滾軸桿之部分
USD735429S1 (en) * 2013-09-24 2015-07-28 Ebara Corporation Roller shaft for substrate cleaning
CN103639130B (zh) * 2013-12-25 2015-11-25 河北宇牛电气设备有限公司 佛尘式绝缘子宽阈定位快速清洁装置
US9475272B2 (en) 2014-10-09 2016-10-25 Taiwan Semiconductor Manufacturing Company, Ltd. De-bonding and cleaning process and system
US10271636B2 (en) * 2014-11-10 2019-04-30 Illinois Tool Works Inc. Archimedes brush for semiconductor cleaning
AU2016245963A1 (en) * 2015-04-09 2017-11-23 Gen-Probe Incorporated Sample testing systems and methods with automated cleaning
CN105268671B (zh) * 2015-10-30 2017-08-29 国网山东省电力公司东营供电公司 附着式绝缘子本体清洁装置
CN106423949A (zh) * 2016-11-04 2017-02-22 广东技术师范学院 一种带有高效清理装置的控制器
WO2018124211A1 (ja) * 2016-12-28 2018-07-05 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法
JP6975588B2 (ja) * 2017-09-13 2021-12-01 三和テッキ株式会社 トロリ線用塗布装置
USD923890S1 (en) * 2018-09-07 2021-06-29 Maradyne Corporation Mattress surface cleaning agitator
CN111215367B (zh) * 2018-11-27 2021-11-05 荣耀终端有限公司 针棒和清胶装置
US10758946B2 (en) * 2019-01-23 2020-09-01 Tung An Development Ltd. Device of cleaning brush
US11694910B2 (en) * 2019-09-10 2023-07-04 Illinois Tool Works Inc. Brush with non-constant nodule density
KR102748075B1 (ko) * 2020-10-12 2024-12-30 삼성전자주식회사 웨이퍼 세척 장치 및 웨이퍼 연마 장비
US12023779B2 (en) 2021-07-14 2024-07-02 Applied Materials, Inc. Post-chemical mechanical polishing brush cleaning box
CN116403948B (zh) * 2023-06-08 2023-09-05 山东凯一达智能科技有限公司 一种半导体元件制造设备及使用方法

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CN1341045A (zh) * 1999-02-26 2002-03-20 阿伊昂株式会社 洗净用的海绵辊
TW526100B (en) * 1999-06-01 2003-04-01 Applied Materials Inc Brush core for disk scrubbing apparatus and method for use thereof
US20080276394A1 (en) * 2007-05-08 2008-11-13 Fuji Electric Device Technology Co., Ltd. Scrubbing device and roll sponge assembly used therein
WO2011103538A2 (en) * 2010-02-22 2011-08-25 Entegris,Inc. Post-cmp cleaning brush

Also Published As

Publication number Publication date
KR102054536B1 (ko) 2019-12-10
US20130255720A1 (en) 2013-10-03
WO2013152008A1 (en) 2013-10-10
US8778087B2 (en) 2014-07-15
US20140283320A1 (en) 2014-09-25
JP6378168B2 (ja) 2018-08-22
JP2015517215A (ja) 2015-06-18
US9237797B2 (en) 2016-01-19
KR20140143431A (ko) 2014-12-16
TW201345620A (zh) 2013-11-16

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