TWI565596B - 模內成形用轉印薄膜及其製造方法 - Google Patents
模內成形用轉印薄膜及其製造方法 Download PDFInfo
- Publication number
- TWI565596B TWI565596B TW104132399A TW104132399A TWI565596B TW I565596 B TWI565596 B TW I565596B TW 104132399 A TW104132399 A TW 104132399A TW 104132399 A TW104132399 A TW 104132399A TW I565596 B TWI565596 B TW I565596B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- resin
- film
- voids
- peeling
- Prior art date
Links
Landscapes
- Injection Moulding Of Plastics Or The Like (AREA)
- Laminated Bodies (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014230252A JP6429011B2 (ja) | 2014-11-13 | 2014-11-13 | インモールド成型用転写フィルム及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201632351A TW201632351A (zh) | 2016-09-16 |
TWI565596B true TWI565596B (zh) | 2017-01-11 |
Family
ID=55980043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104132399A TWI565596B (zh) | 2014-11-13 | 2015-10-01 | 模內成形用轉印薄膜及其製造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6429011B2 (ja) |
CN (1) | CN105599476B (ja) |
MY (1) | MY184463A (ja) |
TW (1) | TWI565596B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109304955B (zh) * | 2017-07-26 | 2020-05-12 | 大勤化成股份有限公司 | 转印膜结构及其制法与立体转印品及其制法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200704362A (en) * | 2005-06-02 | 2007-01-16 | Toyo Ink Mfg Co | Electromagnetic wave shielding laminate and production method therefor |
US20080251860A1 (en) * | 2004-06-09 | 2008-10-16 | Fukashi Morishita | Semiconductor Memory Device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3833368A (en) * | 1972-12-04 | 1974-09-03 | Polaroid Corp | Photographic products incorporating anti-reflection coatings |
JP2002283776A (ja) * | 2001-03-22 | 2002-10-03 | Toshiba Corp | 偽造防止用熱転写シート及びこれ用いた印刷物 |
JP2002333093A (ja) * | 2001-05-09 | 2002-11-22 | Hitachi Plant Kensetsu Service Kk | 熱反射材 |
JP4088670B2 (ja) * | 2002-07-01 | 2008-05-21 | フジコピアン株式会社 | 転写シート |
US6790594B1 (en) * | 2003-03-20 | 2004-09-14 | Eastman Kodak Company | High absorption donor substrate coatable with organic layer(s) transferrable in response to incident laser light |
DE102005017170B4 (de) * | 2005-04-13 | 2010-07-01 | Ovd Kinegram Ag | Transferfolie, Verfahren zu deren Herstellung sowie Mehrschichtkörper und dessen Verwendung |
JP2010076423A (ja) * | 2008-08-29 | 2010-04-08 | Mitsubishi Rayon Co Ltd | 樹脂積層体及び樹脂積層体の製造方法 |
EP2657730A1 (en) * | 2010-12-22 | 2013-10-30 | Mitsubishi Rayon Co., Ltd. | Film containing metal oxide particles, transfer film, method for producing same, laminate, and method for producing same |
-
2014
- 2014-11-13 JP JP2014230252A patent/JP6429011B2/ja active Active
-
2015
- 2015-09-29 MY MYPI2015703439A patent/MY184463A/en unknown
- 2015-10-01 TW TW104132399A patent/TWI565596B/zh active
- 2015-11-02 CN CN201510732261.7A patent/CN105599476B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080251860A1 (en) * | 2004-06-09 | 2008-10-16 | Fukashi Morishita | Semiconductor Memory Device |
TW200704362A (en) * | 2005-06-02 | 2007-01-16 | Toyo Ink Mfg Co | Electromagnetic wave shielding laminate and production method therefor |
Also Published As
Publication number | Publication date |
---|---|
CN105599476B (zh) | 2018-07-10 |
CN105599476A (zh) | 2016-05-25 |
JP2016093915A (ja) | 2016-05-26 |
MY184463A (en) | 2021-04-01 |
JP6429011B2 (ja) | 2018-11-28 |
TW201632351A (zh) | 2016-09-16 |
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