TWI565596B - 模內成形用轉印薄膜及其製造方法 - Google Patents

模內成形用轉印薄膜及其製造方法 Download PDF

Info

Publication number
TWI565596B
TWI565596B TW104132399A TW104132399A TWI565596B TW I565596 B TWI565596 B TW I565596B TW 104132399 A TW104132399 A TW 104132399A TW 104132399 A TW104132399 A TW 104132399A TW I565596 B TWI565596 B TW I565596B
Authority
TW
Taiwan
Prior art keywords
layer
resin
film
voids
peeling
Prior art date
Application number
TW104132399A
Other languages
English (en)
Chinese (zh)
Other versions
TW201632351A (zh
Inventor
金內和彦
中川英秋
芝田岳永
井上知之
Original Assignee
松下知識產權經營股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 松下知識產權經營股份有限公司 filed Critical 松下知識產權經營股份有限公司
Publication of TW201632351A publication Critical patent/TW201632351A/zh
Application granted granted Critical
Publication of TWI565596B publication Critical patent/TWI565596B/zh

Links

Landscapes

  • Injection Moulding Of Plastics Or The Like (AREA)
  • Laminated Bodies (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
TW104132399A 2014-11-13 2015-10-01 模內成形用轉印薄膜及其製造方法 TWI565596B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014230252A JP6429011B2 (ja) 2014-11-13 2014-11-13 インモールド成型用転写フィルム及びその製造方法

Publications (2)

Publication Number Publication Date
TW201632351A TW201632351A (zh) 2016-09-16
TWI565596B true TWI565596B (zh) 2017-01-11

Family

ID=55980043

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104132399A TWI565596B (zh) 2014-11-13 2015-10-01 模內成形用轉印薄膜及其製造方法

Country Status (4)

Country Link
JP (1) JP6429011B2 (ja)
CN (1) CN105599476B (ja)
MY (1) MY184463A (ja)
TW (1) TWI565596B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109304955B (zh) * 2017-07-26 2020-05-12 大勤化成股份有限公司 转印膜结构及其制法与立体转印品及其制法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200704362A (en) * 2005-06-02 2007-01-16 Toyo Ink Mfg Co Electromagnetic wave shielding laminate and production method therefor
US20080251860A1 (en) * 2004-06-09 2008-10-16 Fukashi Morishita Semiconductor Memory Device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3833368A (en) * 1972-12-04 1974-09-03 Polaroid Corp Photographic products incorporating anti-reflection coatings
JP2002283776A (ja) * 2001-03-22 2002-10-03 Toshiba Corp 偽造防止用熱転写シート及びこれ用いた印刷物
JP2002333093A (ja) * 2001-05-09 2002-11-22 Hitachi Plant Kensetsu Service Kk 熱反射材
JP4088670B2 (ja) * 2002-07-01 2008-05-21 フジコピアン株式会社 転写シート
US6790594B1 (en) * 2003-03-20 2004-09-14 Eastman Kodak Company High absorption donor substrate coatable with organic layer(s) transferrable in response to incident laser light
DE102005017170B4 (de) * 2005-04-13 2010-07-01 Ovd Kinegram Ag Transferfolie, Verfahren zu deren Herstellung sowie Mehrschichtkörper und dessen Verwendung
JP2010076423A (ja) * 2008-08-29 2010-04-08 Mitsubishi Rayon Co Ltd 樹脂積層体及び樹脂積層体の製造方法
EP2657730A1 (en) * 2010-12-22 2013-10-30 Mitsubishi Rayon Co., Ltd. Film containing metal oxide particles, transfer film, method for producing same, laminate, and method for producing same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080251860A1 (en) * 2004-06-09 2008-10-16 Fukashi Morishita Semiconductor Memory Device
TW200704362A (en) * 2005-06-02 2007-01-16 Toyo Ink Mfg Co Electromagnetic wave shielding laminate and production method therefor

Also Published As

Publication number Publication date
CN105599476B (zh) 2018-07-10
CN105599476A (zh) 2016-05-25
JP2016093915A (ja) 2016-05-26
MY184463A (en) 2021-04-01
JP6429011B2 (ja) 2018-11-28
TW201632351A (zh) 2016-09-16

Similar Documents

Publication Publication Date Title
CN106660387B (zh) 转印膜以及转印膜的制造方法
EP3544792B1 (en) Powder coated fdm printed item, related manufacturing method and apparatus
US20170133638A1 (en) Method for manufacturing member having irregular pattern
CN103332031B (zh) 印刷版的制作方法、散射膜层及其制作方法、显示装置
TWI447136B (zh) Organic and inorganic composite film
TW201532330A (zh) 光學基板、用於光學基板製造之模具、及含光學基板之發光元件
TW200903021A (en) Antireflection film, process for producing antireflection film, polarizing plate, and display device
JP2003222701A (ja) 光学部品及びその製造方法
JP2014205247A (ja) 転写用部材
KR20200018954A (ko) 굴절률 조절이 가능한 나노입자, 이를 포함하는 광산란층, 및 그 제조방법
CN106796317A (zh) 光学相位差构件、具备光学相位差构件的复合光学构件、及光学相位差构件的制造方法
TWI565596B (zh) 模內成形用轉印薄膜及其製造方法
CN113235046B (zh) 壳体的加工方法、壳体和电子设备
US20160250661A1 (en) Uv-curing process with exterior masking for internal and selective decoration of tube-like and 3d electronic housing
WO2015071943A1 (ja) 光学フィルムおよびその作製方法
JP5299044B2 (ja) 光学フィルタおよびその製造方法
CN114670563A (zh) 一种图案化涂层结构及制作方法
KR102214121B1 (ko) 플라스틱 글레이징의 제조방법
JP6501070B2 (ja) 機能性フィルム
TW201838784A (zh) 塗層材料及其製造方法
KR102101888B1 (ko) 입체 기재의 제조 방법
CN113552657A (zh) 一种防眩光超低反射薄膜制备方法
JP2006119423A (ja) 複合型光学素子及びその製造方法
KR102335406B1 (ko) 플라스틱 글레이징의 제조방법
KR101360086B1 (ko) 레이저 조사를 이용한 나노패턴의 형성방법 및 이에 따라 형성되는 나노패턴