TW200903021A - Antireflection film, process for producing antireflection film, polarizing plate, and display device - Google Patents

Antireflection film, process for producing antireflection film, polarizing plate, and display device Download PDF

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TW200903021A
TW200903021A TW097100574A TW97100574A TW200903021A TW 200903021 A TW200903021 A TW 200903021A TW 097100574 A TW097100574 A TW 097100574A TW 97100574 A TW97100574 A TW 97100574A TW 200903021 A TW200903021 A TW 200903021A
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layer
refractive index
film
mass
resin
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TW097100574A
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Chinese (zh)
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TWI457588B (en
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Yasuhiro Watanabe
Hiroshi Inoie
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Konica Minolta Opto Inc
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0273Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278Diffusing elements; Afocal elements characterized by the use used in transmission
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/0074Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00788Producing optical films
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G02B5/0215Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having a regular structure
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0268Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0273Diffusing elements; Afocal elements characterized by the use
    • G02B5/0294Diffusing elements; Afocal elements characterized by the use adapted to provide an additional optical effect, e.g. anti-reflection or filter

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Liquid Crystal (AREA)
  • Polarising Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

This invention provides an antireflection film which has excellent anti-dazzling properties and scratch resistance, has a low reflectance, and, when used in a display device, has excellent visibility. The antireflection film comprises a transparent base material, at least one anti-dazzling layer having a fine concavoconvex structure provided on the base material, and a low-refractive index layer provided on the anti-dazzling layer either directly or through another layer. The antireflection film is characterized in that the low-refractive index layer is formed by depositing very small droplets of a coating liquid having a solid content of 5 to 100% by mass and having a viscosity of 2 to 15 mPa s at 25 C.

Description

200903021 九、發明說明 【發明所屬之技術領域】 本發明係關於具有防眩性之防反射薄膜,更詳細爲具 有優良防眩性、耐擦傷性,反射率低、使用於偏光板或顯 示裝置時辨識性優良的防反射薄膜。 【先前技術】 近年來薄型輕量筆記型電腦之開發正進行者。隨之液 晶顯示裝置等顯示裝置所使用的偏光板保護薄膜亦逐漸薄 膜化’對高性能化之要求日益增強。又,欲提高辨識性會 設置防反射層、或欲防止照到雜物,且得到不均較少的顯 不性能時’使表面成凹凸’散射反射光後賦予防眩層,大 多使用於電腦或文字處理機等液晶畫像顯示裝置(亦稱爲 液晶顯不器)。 防反射層或防眩層配合用途,改良各式各樣的種類或 性能,使用將具有這些功能之種種前面板貼合於液晶顯示 器之偏光子等,於顯示器欲提高辨識性,賦予反射防止功 能或防眩功能等之方法。 防眩層爲,藉由模糊反射於表面之畫像輪廓,降低反 射像之辨識性,於使用如液晶顯示器、有機EL顯示器、 電漿顯示器之畫像顯示裝置等時不會有反射像亂攝入之情 況。 藉由畫像顯示裝置之前面板最表面上設置適當微細凹 凸結構’可具有如上述之性質。例如有使用微粒子之方法 -4- 200903021 (例如參照專利文獻1。),表面上施予滾邊加工之方法 (例如參照專利文獻2。)等種種方法。 近年來,提高畫像之高畫質化中,具有防眩性的同時 ,對比較高的顯示裝置被期待著。例如於液晶顯示裝置之 最表面上,貼合前述微粒子法過去的防眩性薄膜時會有對 比不充分或膜表面容易受傷之問題。又,透明硬塗佈薄膜 上所設置之防反射層會有外光亂射入之問題。 欲對應此問題,已多數提出於防眩性薄膜上塗佈經光 干涉之防反射層(低折射率層)的防眩性防反射薄膜之相 關技術(例如參照專利文獻3〜8。)。然而,防眩性薄膜 上藉由塗佈而形成薄膜之防反射層時,會引起塗佈液之塗 平’防眩性薄膜之微細凹凸會稍變少,又防眩性薄膜之凹 凸部分的防反射層之膜厚會相異,故無法得到均勻之反射 防止效果’未能達成充分防眩性或對比。 [專利文獻1]特開昭59-58036號公報 [專利文獻2]特開平6-234175號公報 [專利文獻3]特開2005-227407號公報 [專利文獻4]特開2000-84477號公報 [專利文獻5]特開2001-281410號公報 [專利文獻6 ]特開2 0 0 4 - 4 4 0 4號公報 [專利文獻7 ]特開2 0 0 4 - 1 2 5 9 8 5號公報 [專利文獻8]特開20〇4-24967號公報 【發明內容】 -5- 200903021 因此,本發明爲有鑑於上述課題所得者,其目的爲提 供一種防眩性、耐擦傷性優良,反射率低,使用於顯示裝 置時的辨識性優良的防反射薄膜。 本發明的上述課題係由以下構成所達成。 1 · 一種防反射薄膜,其爲透明基材上具有至少1層以 上的持微細凹凸結構之防眩層,且該防眩層上直接或介著 其他層形成低折射率層之防反射薄膜,其特徵爲該低折射 率層藉由微小液滴之附著而形成,且該低折射率層爲藉由 含有 5〜100質量。/。之固體成分,25 °c之黏度爲2〜 15mPa . s的塗佈液所形成者。 2 ·如前述1所述之防反射薄膜,其中該低折射率層藉 由噴射方式而形成。 3 .如前述1或2所述之防反射薄膜,其中該低折射率 層經乾燥後之平均膜厚爲0.05〜0.20μηι。 4. 如前述1至3中任一所述之防反射薄膜,其中該低 折射率層爲藉由含有固體成分以外之質量60%以上的沸黑占 140〜250°C,25°C之黏度爲1〜15mPa.s的至少1種類之 溶劑的塗佈液所形成者。 5. 如前述1至4中任一所述之防反射薄膜,其中於該 防眩層之凸部分所形成的低折射率層之膜厚hd 1、與於u 部分所形成的低折射率層之膜厚hd2爲滿足以下關係式% 1 (式)hd 1 /hd2 2 0.4。 6. 如前述1至5中任一所述之防反射薄膜,其中該低 -6 - 200903021 折射率層係由活性光線硬化型樹脂或熱硬化性樹脂所形成 〇 7 · —種偏光板,其特徵爲使用如前述1至6中任一所 述之防反射薄膜。 8.—種顯示裝置,其特徵爲使用如前述1至6中任一 所述之防反射薄膜、或如前述第7項之偏光板。 9·一種防反射薄膜之製造方法,其爲透明基材上具有 至少1層以上的持微細凹凸結構之防眩層,且該防眩層上 直接或介著其他層形成低折射率層之防反射薄膜的製造方 法中,其特徵爲該低折射率層係由微小液滴之附著而形成 ,且該低折射率層藉由含有5〜100質量%之固體成分, 2 5°C之黏度爲2〜1 5mPa · s的塗佈液所形成者。 10.如前述9所述之防反射薄膜之製造方法,其中該 微小液滴爲含有熱硬化性樹脂或活性光線硬化型樹脂之墨 水,將該微小液滴著落於基材後’馬上加熱或以活性光線 照射而使其固化。 藉由本發明可提供一種防眩性' 耐擦傷性優良、反射 率低、使用於顯示裝置時辨識性優良的防反射薄膜。 [實施發明之最佳形態] 以下詳細說明實施本發明之最佳形態,但本發明未受 到這些限定。 過去以提高對比作爲目的,有著於具有微細凹凸結構 之防眩性薄膜上塗佈防反射層之技術’於防眩性薄膜之微 200903021 細凹凸結構上形成防反射層之塗佈液容易引起塗平,而有 著失去藉由微細凹凸結構所要達成的防眩性能之問題。 本發明者進行詳細檢討結果,藉由本發明之構成,使 得防反射層之膜厚追隨防眩層之微細凹凸結構,可保持防 眩性下減少反射率’且進一步地改進膜強度、耐傷性擦傷 性者。 即,本發明的防反射薄膜(以下亦稱爲防眩性防反射 薄膜)爲透明基材上具有至少1層以上的持有微細凹凸結 構之防眩層’且於該防眩層上直接或介著其他層形成低折 射率層之防反射薄膜中’該低折射率層藉由微小液滴之附 著而形成’且該低折射率層爲藉由含有5〜100質量%之固 體成分’ 25°C之黏度爲2〜15mPa.s之塗佈液所形成者。 因此’於該防眩層的凸部分所形成之低折射率層的膜 厚hd 1與於凹部分所形成之低折射率層的膜厚hd2爲滿足 以下關係式之防反射薄膜爲佳。 (式) hd 1 /hd2 ^0.4 且,該低折射率層較佳爲以藉由噴射方式經微小液滴 之附著而形成者爲特徵。 藉由該噴射方式’與藉由過去塗佈方式之防反射層的 形成做比較’可使用高濃度 '高黏度之塗佈液(墨水), 使濕潤膜厚(h w )進行薄層塗佈。藉此,發現可提供塗佈 液之固化速度,迴避如過去之塗佈液所造成的凹凸結構上 之塗平。因此’表現防眩性之微細凹凸結構爲,於防反射 薄膜之最表面具有意圖之凹凸結構的狀態下形成,故不會 -8- 200903021 降低防眩性。又,實質上因形成均一膜厚,折射率可進一 步地減低,並亦可提高膜強度、耐傷性擦傷性。 以下對本發明做詳細說明。 《低折射率層》 有關本發明之低折射率層的折射率爲,比支持體之基 材薄膜的折射率還低,2 3 °C,波長5 5 Onm測定下爲1 . 3 0〜 1 . 4 5之範圍者爲佳。折射率係由設於硬塗佈層上的防反射 層之分光反射率的測定結果而求得。分光反射率爲使用 FE-3 000 (大塚電子製),試品之裏面經粗面化處理後, 以黑色噴霧進行光吸收處理,防止裏面之光反射而進行測 定,分光反射率以FE-3 000之電腦軟體進行解析及調整而 求得折射率。 又,防反射層的分光反射率越低越佳,可見光區的波 長中之平均値以〗.5%以下爲佳,最低反射率以0.8%以下 爲佳。又,可見光之波長區中具有平坦形狀之反射光譜者 爲佳。 本發明的防反射薄膜之構成表示於圖1(a)。 本發明的防反射薄膜如圖所示,低折射率層藉由微小 液滴之附著而直接或介著其他層,後述防眩層上藉由含有 5〜1 00質量%之固體成分,25°C之黏度爲2〜1 5mPa · s之 塗佈液所形成者爲特徵。 因此,於該防眩層之凸部分所形成之低折射率層的膜 厚hd 1與於凹部分所形成之低折射率層的膜厚hd2爲滿足 200903021 以下之關係式者爲佳。 (式) hd 1 /hd2 ^ 0.4 有關hdl、hd2參照圖1 ( b )。 上述式中’膜厚比hdl/hd2之値較佳爲〇·4以上ι·2 以下’較佳爲〇·6以上1.0以下,特佳爲〇.8以上1〇以 下。膜厚比爲2 〇 . 4時,可得到防眩性與耐擦傷性兼顧之 低反射率的防眩性防反射薄膜。 低折射率層的膜厚爲〇.〇5〜〇·20μιη之範圍,此由反 射防止之效果、耐擦傷性之觀點來看爲佳,較佳爲〇 . 〇 6〜 0 · 1 5 μηι。 上述低折射率層的膜厚可由電子顯微鏡之斷層照片求 得。對於所作成之防反射薄膜,可將斷層照片以2〜1 0萬 倍之擴大倍率進行攝影,以目視確認之凸部分、凹部分各 1 〇處的膜厚由斷層照片使用度測計進行實際測定,並將其 平均値作爲膜厚。所使用的電子顯微鏡可使用販賣品,例 如曰立掃描透過電子顯微鏡 HD-2700。 將低折射率層藉由微小液滴之附著而形成之方法並無 特別限定,使用公知之噴霧塗佈方式或噴射方式爲佳,特 別由本發明中之再現性、均一性之觀點來看,使用噴射方 式爲佳。 以下對於使用噴射方式之低折射率層的形成做詳細說 明。 圖2表示使用於本發明較佳噴射方式之噴射頭一例的 截面圖。 -10- 200903021 圖2(a)表示噴射頭之截面圖,圖2(b)表示圖2( a)之A-A虛線擴大圖。圖中,11爲基板、12爲壓電元件 、1 3爲流路板、1 3 a爲墨水流路、1 3 b爲壁部' 1 4爲共通 液室構成構件、14a爲共通液室、15爲墨水供給幫浦、16 爲噴嘴板、1 6 a爲噴嘴' 1 7爲驅動用電路印刷板(P c B ) 、1 8爲導線部、1 9爲驅動電極、2 0爲溝、2 1爲保護板、 22爲流體電阻、23、24爲電極、25爲上部分隔牆、26爲 加熱器、2 7爲加熱器電源、2 8爲導熱構件、3 0爲噴射頭 〇 經集成化之噴射頭3 0中’具有電極2 3、24之經層合 的壓電元件1 2爲對應流路1 3 a ’於該流路1 3 a方向施予溝 加工,區分爲溝2 0與驅動壓電元件1 2 b與非驅動壓電元 件12a。溝20中封入塡充劑。施予溝加工之壓電元件12 中,介著上部分隔牆2 5接合流路板1 3。即’前述上部分 隔牆2 5爲隔著非驅動壓電元件1 2 a與鄰接之流路以壁部 1 3 b支持。驅動壓電元件1 2 b之幅度稍比流路1 3 a之幅度 狹窄,藉由驅動用電路印刷板(pCB)上之驅動電路’經 選擇的驅動壓電元件1 2 b外加脈衝狀信號電壓時’該驅動 壓電元件12b於厚度方向起變化,介著上部分隔牆25使 流路1 3 a之容積產生變化’經由其結果噴嘴板1 6之噴嘴 1 6 a噴出墨水液滴。 流路板1 3上,介著導熱構件28 ’各銜接各加熱器26 。導熱構件2 8爲埋入噴嘴面而設置。導熱構件2 8係以將 自加熱器2 6之熱效率良好地傳至流路板1 3 ’且將自加熱 -11 - 200903021 器26之熱運送至噴嘴面旁邊,而加溫噴嘴面旁邊的空氣 爲目的,因此,使用熱傳導率良好之材料。例如可舉出鋁 '鐵、鎳、銅、不鏽鋼等金屬、或SiC、BeO、A1N等陶 瓷器等材料爲佳。 驅動壓電元件時,流路之長方向上於垂直方向變位, 使流路之容積產生變化’藉由該容積變化由噴嘴成爲墨水 液滴而噴射。於壓電兀件賦予保持常時流路谷積縮小之信 號,對於經選擇的流路’使其變位爲增大流路容積之方向 後,再次藉由外加賦予流路容積縮小的變位脈衝信號,藉 由對應流路之噴嘴,使墨水成爲墨水液滴後噴射。 圖3表示可使用於本發明之噴射頭部、噴嘴板之一例 的槪略圖。 圖3中,圖3的(a)爲頭部截面圖’圖3的(b)爲 噴嘴板之平面圖。圖中,10爲基材薄膜、31爲墨水液滴 、3 2爲噴嘴、2 9爲活性光線照射部。藉由噴嘴3 2噴射之 墨水液滴3 1往基材薄膜1 〇方向飛去並附著。於基材薄膜 1 0上著落之墨水液滴,藉由配置於該上游部的活性光線照 射部,直接以活性光線照射,使其硬化。且,3 5爲保持基 材薄膜1 〇之背輥。 本發明中,如圖3之(b )所記載,噴射頭部的噴嘴 以配置成千鳥狀時爲佳,又,於基材薄膜1 〇的搬送方向 以並列方式設置多段爲佳。又,墨水吐出時對噴射頭部賦 予微細振動,使墨水滴隨機地著落於透明基材爲佳。藉此 ,可抑制干涉條紋之產生。微細振動可藉由高頻率電壓、 -12- 200903021 音波、超音波等賦予,並無特別限定。 本發明的低折射率層之形成方法可使用由多噴嘴吐出 墨水小液滴後形成之噴射方式爲佳。圖4表示本發明可使 用的較佳噴射方式一例。 圖4中’圖4的(a )表示將噴射頭3 〇配置於透明基 材薄膜10之寬方向’一邊搬運透明基材薄膜1〇下一邊於 該表面上形成低折射率層之方法(線條頭(1 i n e h e a d )方 式)’圖4之(b )表示移動噴射頭3 〇於副掃描方向下, 於該表面形成低折射率層之方法(平面頭(fl at h e ad )方 式)’圖8的(c)表示噴射頭30爲掃描透明基材薄膜10 上之寬方向下’於該表面上形成低折射率層之方法(絞盤 方式),可使用上述所有方式,但本發明中,由生產性之 觀點來看,線條頭(1 i n e h e a d )方式爲佳。且,如圖4之 (a )〜(c )所記載之2 9 ’可設置作爲墨水使用後述活性 光線硬化型樹脂時所使用的活性光線照射部。 又,本發明中,圖4的(a) 、 ( b ) 、 (c)之基材 薄膜的搬送方向下游側,可設置另一活性光線照射部。 本發明中,對於防眩層之凹凸形狀將低折射率層塗佈 成所望膜厚時,作爲墨水液滴以〇_1〜20pl爲佳,以0.5〜 l〇pl爲較佳,以〇·5〜5pl爲特佳。又,亦可自相異噴射頭 部吐出各相異的液滴量之墨水,或由相同噴射頭部改變液 滴量而吐出墨水’此時的吐出間隔可爲一定間隔亦可爲隨 機。 其次,有關本發明之低折射率層用墨水液組成物做說 -13- 200903021 明。 本發明所使用的低折射率層用墨水液組成物(亦稱爲 塗佈液)爲有機矽化合物或其水解物或其縮聚物,含有中 空一氧化矽系微粒子、活性光線硬化型樹脂、熱硬化性樹 脂或金屬烷氧化物或其水解物爲佳,特別以含有折射率於 皮膜狀態下折射率爲1.4 5以下的活性光線硬化型樹脂' 或熱硬化性樹脂時爲佳。 (有機矽化合物) 可使用於本發明之低折射率層用墨水液組成物的有機 砂化合物以下述一般式(1 )所示化合物爲佳。 一般式(1) Si(〇R)4 式中,R表示碳數1〜4之烷基。 具體可使用四甲氧基矽烷、四乙氧基矽烷、四異丙氧 基矽烷等。 作爲對低折射率層之添加方法,將於這些四烷氧基矽 烷、純水、及醇類之混合溶液中添加作爲觸媒之少量鹼或 酸的溶液,添加於前述中空二氧化矽系微粒子之分散液中 ,使水解四烷氧基矽烷後所生成之矽酸聚合物沈澱於中空 二氧化矽系微粒子之表面。此時,亦可將四烷氧基矽烷、 醇類、觸媒同時添加於分散液中。作爲鹼觸媒可使用氨、 鹼金屬之氫氧化物、胺類。又,作爲酸觸媒,可使用各種 無機酸與有機酸。 又,本發明中於低折射率層可含有包含下述一般式( -14- 200903021 2 )所示氟取代烷基之矽烷化合物。 【化1】 一般式 R2 R4200903021 IX. Description of the Invention [Technical Field] The present invention relates to an anti-reflection film having anti-glare properties, and more particularly has excellent anti-glare property, scratch resistance, low reflectance, and is used in a polarizing plate or a display device. An anti-reflective film with excellent visibility. [Prior Art] In recent years, the development of thin and lightweight notebook computers is progressing. A polarizing plate protective film used in a display device such as a liquid crystal display device is also gradually thinned. The demand for high performance is increasing. In addition, when the anti-reflection layer is to be provided for the purpose of improving the visibility, or the anti-reflection layer is to be prevented, and the uneven performance is obtained, the surface is formed into a concave-convex scatter and reflected light is applied to the anti-glare layer, and is often used in a computer. Or a liquid crystal image display device (also referred to as a liquid crystal display device) such as a word processor. The anti-reflection layer or the anti-glare layer is used in combination with various types and properties, and various types of front panels having these functions are attached to a polarizer of a liquid crystal display, etc., and the display is intended to improve the visibility and provide a reflection preventing function. Or methods such as anti-glare function. The anti-glare layer reduces the visibility of the reflected image by blurring the contour of the image reflected on the surface, and does not reflect when the image display device such as a liquid crystal display, an organic EL display, or a plasma display is used. Happening. The appropriate fine concavo-convex structure ' on the outermost surface of the front panel of the image display device can have the properties as described above. For example, there are various methods such as a method of using fine particles -4-200903021 (see, for example, Patent Document 1), a method of applying a piping on the surface (see, for example, Patent Document 2). In recent years, in order to improve the image quality, it has anti-glare properties, and a relatively high contrast display device is expected. For example, when the anti-glare film of the fine particle method described above is bonded to the outermost surface of the liquid crystal display device, there is a problem that the contrast is insufficient or the film surface is easily damaged. Further, the antireflection layer provided on the transparent hard coat film has a problem that the external light is incident. In order to cope with this problem, a related art of an anti-glare antireflection film which is coated with an anti-reflection layer (low-refractive-index layer) having an optical interference on an anti-glare film has been proposed (see, for example, Patent Documents 3 to 8). However, when the antireflection layer of the film is formed by coating on the anti-glare film, the coating liquid is flattened. The fine unevenness of the anti-glare film is slightly reduced, and the uneven portion of the anti-glare film is caused. The film thickness of the antireflection layer is different, so that a uniform reflection preventing effect cannot be obtained, and sufficient anti-glare property or contrast cannot be achieved. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. [Patent Document 5] JP-A-2001-281410 (Patent Document 6) Japanese Patent Publication No. 2 0 0 4 - 4 4 0 4 [Patent Document 7] JP-A-2002- 1 2 5 9 8 Japanese Unexamined Patent Publication No. Hei No. Hei. No. Hei. No. Hei. An antireflection film excellent in visibility when used in a display device. The above problems of the present invention are achieved by the following constitution. An antireflection film having at least one or more layers of an antiglare layer having a fine uneven structure on a transparent substrate, and an antireflection film having a low refractive index layer formed directly or via another layer on the antiglare layer. It is characterized in that the low refractive index layer is formed by adhesion of minute droplets, and the low refractive index layer is made to contain 5 to 100 masses. /. The solid component, the viscosity at 25 °c is 2 to 15 mPa. The formation of the coating liquid. The antireflection film according to the above 1, wherein the low refractive index layer is formed by a spraying method. The antireflection film according to the above 1 or 2, wherein the low refractive index layer has an average film thickness after drying of 0.05 to 0.20 μm. 4. The antireflection film according to any one of the above 1 to 3, wherein the low refractive index layer is a boiling black having a mass of 60% or more by a solid content of 140 to 250 ° C, and a viscosity of 25 ° C It is formed by a coating liquid of at least one type of solvent of 1 to 15 mPa.s. 5. The antireflection film according to any one of the above 1 to 4, wherein a film thickness hd1 of the low refractive index layer formed in the convex portion of the antiglare layer and a low refractive index layer formed in the u portion The film thickness hd2 satisfies the following relationship % 1 (formula) hd 1 /hd2 2 0.4. 6. The antireflection film according to any one of the above 1 to 5, wherein the low -6 - 200903021 refractive index layer is formed of an active light hardening type resin or a thermosetting resin, and is a polarizing plate. It is characterized in that the antireflection film as described in any one of the above 1 to 6 is used. 8. A display device characterized by using the antireflection film according to any one of the above 1 to 6, or the polarizing plate according to item 7 above. 9. A method for producing an antireflection film, comprising: at least one or more layers of an antiglare layer having a fine uneven structure on a transparent substrate, wherein the antiglare layer is formed directly or via another layer to form a low refractive index layer; In the method for producing a reflective film, the low refractive index layer is formed by adhesion of fine droplets, and the low refractive index layer contains 5 to 100% by mass of a solid component, and the viscosity at 25 ° C is 2 to 1 5 mPa · s of the coating liquid formed. 10. The method for producing an antireflection film according to the above 9, wherein the fine droplets are inks containing a thermosetting resin or a reactive light curing resin, and the micro droplets are immediately after being placed on the substrate to be heated or The active light is irradiated to cure it. According to the present invention, it is possible to provide an antireflection film which is excellent in anti-glare property, excellent in scratch resistance, low in reflectance, and excellent in visibility when used in a display device. BEST MODE FOR CARRYING OUT THE INVENTION The best mode for carrying out the invention will be described in detail below, but the invention is not limited thereto. In the past, for the purpose of improving the contrast, the technique of applying an antireflection layer to an anti-glare film having a fine uneven structure is applied to the coating liquid of the anti-reflective layer on the fine concave-convex structure of the anti-glare film. Flat, and there is a problem of losing the anti-glare property to be achieved by the fine uneven structure. As a result of the detailed review of the present invention, the film thickness of the antireflection layer follows the fine concavo-convex structure of the antiglare layer, and the reflectance can be reduced under the antiglare property, and the film strength and scratch resistance are further improved. Sex. In other words, the antireflection film of the present invention (hereinafter also referred to as an antiglare antireflection film) has at least one or more layers of an antiglare layer having a fine uneven structure on a transparent substrate and is directly or on the antiglare layer. In the antireflection film in which the other layer forms a low refractive index layer, 'the low refractive index layer is formed by adhesion of fine droplets' and the low refractive index layer is composed of 5 to 100% by mass of solid content' 25 The viscosity of °C is 2~15mPa.s of the coating liquid formed. Therefore, the film thickness hd1 of the low refractive index layer formed in the convex portion of the antiglare layer and the film thickness hd2 of the low refractive index layer formed in the concave portion are preferably antireflection films satisfying the following relationship. (Formula) hd 1 /hd2 ^0.4 Further, the low refractive index layer is preferably characterized by being formed by adhesion of fine droplets by spraying. By the injection method 'compared with the formation of the antireflection layer by the past coating method', the wet film thickness (h w ) can be thin-coated by using a high-concentration 'high-viscosity coating liquid (ink). Thereby, it was found that the curing speed of the coating liquid can be provided, and the flattening on the uneven structure caused by the coating liquid as in the past can be avoided. Therefore, the fine concavo-convex structure exhibiting anti-glare property is formed in a state in which the outermost surface of the anti-reflection film has an intended uneven structure, so that the anti-glare property is not lowered by -8-200903021. Further, since the uniform film thickness is formed, the refractive index can be further reduced, and the film strength and scratch resistance can be improved. The invention will be described in detail below. <<Low Refractive Index Layer>> The refractive index of the low refractive index layer of the present invention is lower than the refractive index of the substrate film of the support, at 23 ° C, and the wavelength of 5 5 Onm is 1. 3 0 1 The range of 4 5 is better. The refractive index was determined from the measurement results of the spectral reflectance of the antireflection layer provided on the hard coat layer. The spectral reflectance is FE-3 000 (manufactured by Otsuka Electronics Co., Ltd.), and the inside of the sample is roughened, and then light-absorbed by a black spray to prevent reflection of light inside. The spectral reflectance is FE-3. The computer software of 000 is analyzed and adjusted to obtain the refractive index. Further, the lower the spectral reflectance of the antireflection layer, the better, and the average wavelength in the wavelength of the visible light region is preferably 5% or less, and the lowest reflectance is preferably 0.8% or less. Further, it is preferable that a reflection spectrum having a flat shape in the wavelength region of visible light is preferable. The structure of the antireflection film of the present invention is shown in Fig. 1(a). As shown in the figure, the anti-reflection film of the present invention has a low refractive index layer directly or via another layer by the adhesion of fine droplets, and the anti-glare layer described later contains 5 to 100% by mass of a solid component, 25°. The viscosity of C is characterized by a coating liquid of 2 to 15 mPa·s. Therefore, the film thickness hd1 of the low refractive index layer formed in the convex portion of the antiglare layer and the film thickness hd2 of the low refractive index layer formed in the concave portion are preferably those satisfying the relationship of 200903021. (Formula) hd 1 /hd2 ^ 0.4 Refer to Figure 1 (b) for hdl and hd2. In the above formula, the film thickness ratio hdl/hd2 is preferably 〇·4 or more and ι·2 or less, preferably 〇·6 or more and 1.0 or less, and particularly preferably 〇8 or more and 1〇 or less. When the film thickness ratio is 2 〇. 4, an anti-glare antireflection film having low reflectance and anti-glare property and scratch resistance can be obtained. The film thickness of the low refractive index layer is in the range of 〇. 5 to 〇 20 μπη, which is preferably from the viewpoint of the effect of preventing reflection and scratch resistance, and is preferably 〇 6 to 0 · 1 5 μηι. The film thickness of the above low refractive index layer can be obtained from a tomogram of an electron microscope. For the anti-reflection film formed, the tomogram can be photographed at a magnification of 2 to 100,000 times, and the film thickness at each of the convex portion and the concave portion can be visually confirmed by the tomographic photometry. The measurement was carried out, and the average enthalpy was taken as the film thickness. The electron microscope used can be used as a vending product, for example, a scanning electron microscope HD-2700. The method of forming the low refractive index layer by the adhesion of the fine droplets is not particularly limited, and a known spray coating method or a spraying method is preferably used, and in particular, from the viewpoint of reproducibility and uniformity in the present invention, The spray method is preferred. The formation of the low refractive index layer using the ejection method will be described in detail below. Fig. 2 is a cross-sectional view showing an example of a head which is used in the preferred embodiment of the present invention. -10- 200903021 Fig. 2(a) shows a cross-sectional view of the ejection head, and Fig. 2(b) shows an enlarged view of the dotted line A-A of Fig. 2(a). In the figure, 11 is a substrate, 12 is a piezoelectric element, 13 is a flow path plate, 13 3 is an ink flow path, 13 3 b is a wall portion ' 14 is a common liquid chamber constituent member, 14 a is a common liquid chamber, 15 is the ink supply pump, 16 is the nozzle plate, 1 6 a is the nozzle '1 7 is the drive circuit printed board (P c B ), 1 8 is the wire portion, 19 is the drive electrode, 20 is the groove, 2 1 is a protection plate, 22 is a fluid resistance, 23, 24 are electrodes, 25 is an upper partition wall, 26 is a heater, 27 is a heater power source, 28 is a heat conductive member, and 30 is a spray head. In the ejection head 30, the laminated piezoelectric element 12 having the electrodes 2 3 and 24 is grooved in the direction of the flow path 13 3 a corresponding to the flow path 1 3 a ', and is divided into the groove 20 and the drive. The piezoelectric element 1 2 b and the non-driven piezoelectric element 12a. The enthalpy is enclosed in the trench 20. In the piezoelectric element 12 which is subjected to the groove processing, the flow path plate 13 is joined via the upper partition wall 25. That is, the upper partition wall 25 is supported by the wall portion 1 3 b via the non-driving piezoelectric element 1 2 a and the adjacent flow path. The amplitude of the driving piezoelectric element 1 2 b is slightly narrower than the amplitude of the flow path 13 3 a, and the pulsed signal voltage is applied by the driving circuit on the driving circuit printed board (pCB) to selectively drive the piezoelectric element 1 2 b At this time, the driving piezoelectric element 12b changes in the thickness direction, and the volume of the flow path 13 3a changes through the upper partition wall 25. As a result, the ink droplets are ejected from the nozzles 116a of the nozzle plate 16. Each of the heaters 26 is connected to the flow path plate 13 via the heat transfer members 28'. The heat transfer member 28 is provided to be buried in the nozzle face. The heat conducting member 28 is configured to efficiently transfer the heat from the heater 26 to the flow path plate 1 3 ' and transport the heat from the heating -11 - 200903021 to the nozzle face, while heating the air beside the nozzle face For the purpose, therefore, a material having a good thermal conductivity is used. For example, a metal such as aluminum 'iron, nickel, copper, or stainless steel, or a ceramic such as SiC, BeO, or A1N is preferable. When the piezoelectric element is driven, the flow path is displaced in the vertical direction in the longitudinal direction, and the volume of the flow path is changed. The nozzle is made into an ink droplet by the volume change. The piezoelectric element is given a signal for maintaining the constant flow path valley reduction, and after the selected flow path is displaced to increase the direction of the flow path volume, the displacement pulse which is reduced by the flow path volume is again applied. The signal is injected into the ink droplets by the nozzle corresponding to the flow path. Fig. 3 is a schematic view showing an example of an injection head and a nozzle plate which can be used in the present invention. In Fig. 3, (a) of Fig. 3 is a cross-sectional view of the head. Fig. 3 (b) is a plan view of the nozzle plate. In the figure, 10 is a base film, 31 is an ink droplet, 32 is a nozzle, and 29 is an active light irradiation unit. The ink droplets 3 1 ejected by the nozzles 3 2 fly toward the substrate film 1 and adhere thereto. The ink droplets that have landed on the base film 10 are directly irradiated with active light by the active light illuminating portion disposed in the upstream portion to be hardened. Further, 3 5 is a back roll for holding the base film 1 。. In the present invention, as shown in Fig. 3 (b), it is preferable that the nozzles of the ejection head are arranged in a thousand bird shape, and it is preferable to provide a plurality of stages in a side by side in the conveying direction of the base film 1 . Further, it is preferable that the ejection head is given a fine vibration when the ink is ejected, and the ink droplets are randomly placed on the transparent substrate. Thereby, the generation of interference fringes can be suppressed. The fine vibration can be imparted by a high frequency voltage, -12-200903021 sound wave, ultrasonic wave, etc., and is not particularly limited. The method for forming the low refractive index layer of the present invention can preferably be carried out by using a jetting method formed by discharging small droplets of ink from a plurality of nozzles. Fig. 4 shows an example of a preferred spray pattern which can be used in the present invention. In Fig. 4, (a) of Fig. 4 shows a method of forming a low refractive index layer on the surface while transporting the transparent substrate film 1 under the width direction of the transparent substrate film 10 in the width direction of the transparent substrate film 10. (1 inehead) mode] (b) of FIG. 4 shows a method of forming a low refractive index layer on the surface by moving the ejection head 3 in the sub-scanning direction (plan by head (fl at he ad)). (c) shows that the ejection head 30 is a method of forming a low refractive index layer on the surface in the width direction of the transparent substrate film 10 (winch method), and all of the above methods can be used, but in the present invention, production is performed. From the point of view of sex, the line head (1 inehead) is better. Further, as shown in (a) to (c) of Fig. 4, the active light irradiation unit used when the active light-curing resin described later is used as the ink can be provided. Further, in the present invention, another active light illuminating portion may be provided on the downstream side in the transport direction of the base film of (a), (b), and (c) of Fig. 4 . In the present invention, when the low refractive index layer is applied to the desired film thickness in the uneven shape of the antiglare layer, it is preferable that the ink droplets are 〇_1 to 20 pl, and 0.5 to l pl is preferable, and 5~5pl is especially good. Further, it is also possible to discharge the ink of the different droplet amount from the dissimilar ejection head or to eject the ink by changing the droplet amount by the same ejection head. The ejection interval at this time may be a constant interval or a random interval. Next, the composition of the ink liquid for the low refractive index layer of the present invention is described in Japanese Patent Application Laid-Open No. Hei. The ink liquid composition (also referred to as a coating liquid) for a low refractive index layer used in the present invention is an organic hydrazine compound or a hydrolyzate thereof or a polycondensate thereof, and contains hollow cerium oxide-based fine particles, an active light-curing resin, and heat. The curable resin or the metal alkoxide or the hydrolyzate thereof is preferably used, and particularly preferably an active photocurable resin or a thermosetting resin having a refractive index of 1.45 or less in a film state. (Organic cerium compound) The organic sand compound which can be used in the ink composition for a low refractive index layer of the present invention is preferably a compound represented by the following general formula (1). General formula (1) Si(〇R)4 wherein R represents an alkyl group having 1 to 4 carbon atoms. Specifically, tetramethoxynonane, tetraethoxydecane, tetraisopropoxydecane or the like can be used. As a method of adding a low refractive index layer, a solution of a small amount of a base or an acid as a catalyst is added to a mixed solution of tetraalkoxy decane, pure water, and an alcohol, and the hollow cerium oxide-based fine particles are added. In the dispersion, the citric acid polymer formed after hydrolyzing the tetraalkoxy decane is precipitated on the surface of the hollow cerium oxide-based fine particles. At this time, tetraalkoxy decane, an alcohol, and a catalyst may be simultaneously added to the dispersion. As the base catalyst, ammonia, an alkali metal hydroxide or an amine can be used. Further, as the acid catalyst, various inorganic acids and organic acids can be used. Further, in the present invention, the low refractive index layer may contain a decane compound containing a fluorine-substituted alkyl group represented by the following general formula (-14-200903021 2 ). [Chemical 1] General formula R2 R4

I I R1—Si—Rf 一 Si-R6I I R1—Si—Rf — Si-R6

I I R3 R6 式中,R1〜R6表示碳數1〜16,較佳爲1〜4的院基 、碳數1〜6,較佳爲1〜4的鹵化烷基、碳數6〜12,較 佳爲6〜10的芳基、碳數7〜14,較佳爲7〜12的院基芳 基、芳基烷基、碳數2〜8’較佳爲2〜6的烯基、或碳數 1〜6,較佳爲1〜3的烷氧基、氫原子或鹵素原子。II R3 R6 wherein R1 to R6 represent a carbon number of 1 to 16, preferably 1 to 4, a halogenated alkyl group having a carbon number of 1 to 6, preferably 1 to 4, and a carbon number of 6 to 12, Preferably, it is an aryl group of 6 to 10, a aryl group having 7 to 14 carbon atoms, preferably 7 to 12, an arylalkyl group, an alkenyl group having 2 to 8' carbon atoms, preferably 2 to 6 carbon atoms, or carbon. The number is 1 to 6, preferably 1 to 3, an alkoxy group, a hydrogen atom or a halogen atom.

Rf表示-(CaHbFc)…a表示ι〜12之整數,b+c表 示2a’ b表示0〜24之整數,c表示〇〜24之整數。作爲 如此Rf,以具有氟伸烷基與伸烷基之基爲佳。具體作爲如 此含氟聚矽氧烷系化合物,可舉出 (MeO)3SiC2H4C2F4C2H4Si(MeO)3、 (MeO)3SiC2H4C4F8C2H4Si(MeO)3、 (MeO)3SiC2H4C6F12C2H4Si(MeO)3、 (H5C20)3SiC2H4C4F8C2H4Si(OC2H5)3、 (H5C2〇)3SiC2H4C6F12C2H4Si(OC2H5)3 所示甲氧基乙矽烷化 合物等。 作爲膠黏劑,含有含氟取代烷基之矽烷化合物時,所 形成之透明被膜本身具有疏水性,故即使透明被膜無法充 -15- 200903021 分緻密化,成爲多孔質、或會有具有裂縫或縫隙之情況, 可抑制水分或酸·鹼等藥品對透明被膜之滲入。且,含於 基材表面或底層之金屬等微粒子亦不會與水分或與酸.驗 等藥品進行反應。因此,如此透明被膜具有優良的耐藥品 性。 又,作爲膠黏劑,因含有含氟取代烷基之矽烷化合物 ,不僅具有如此疏水性,且潤滑性亦佳(接觸電阻較低) ,故可得到優良耐傷性強度之透明被膜。 又,本發明之相關低折射率層中可含有矽烷偶合劑。 作爲矽烷偶合劑,可舉出甲基三甲氧基矽烷、甲基三乙氧 基矽烷、甲基三甲氧基乙氧基矽烷、甲基三乙酸基矽烷、 甲基三丁氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽 烷、乙烯三甲氧基矽烷、乙烯三乙氧基矽烷、乙烯三乙酸 基矽烷、乙烯三甲氧基乙氧基矽烷、苯基三甲氧基矽烷、 苯基三乙氧基矽烷、苯基三乙酸基矽烷、γ-氯丙基三甲氧 基矽烷、γ-氯丙基三乙氧基矽烷、γ-氯丙基三乙酸基矽烷 、3,3,3 -二氟丙基二甲氧基砂院、γ -環氧丙基氧基丙基二 甲氧基砂院、γ -環氧丙基氧基丙基三乙氧基砂院、γ-(β-環氧丙基氧基乙氧基)丙基三甲氧基矽烷、β-(3,4-環氧 基環己基)乙基三甲氧基矽烷、β·(3,4-環氧基環己基) 乙基三乙氧基矽烷、γ -丙烯醯基氧基丙基三甲氧基矽烷、 γ-甲基丙烯醯基氧基丙基三甲氧基矽烷、γ_胺基丙基三甲 氧基砂院' γ -胺基丙基二乙氧基砂院、γ -氫硫基丙基二甲 氧基砂院' γ -氫硫基丙基三乙氧基砍院、Ν-β- ( I女基乙基 -16- 200903021 )-γ·胺基丙基三甲氧基矽烷及β•氰基乙基三乙氧 〇 又’作爲對於矽持有2取代的烷基之矽烷偶合 子’可舉出二甲基二甲氧基矽烷、苯基甲基二甲氧 '二甲基二乙氧基矽烷、苯基甲基二乙氧基矽烷、 丙基氧基丙基甲基二乙氧基矽烷、γ_環氧丙基氧基 基二甲氧基矽烷、γ_環氧丙基氧基丙基苯基二乙氧 、γ-氯丙基甲基二乙氧基矽烷、二甲基二乙酸基矽 丙烯醯基氧基丙基甲基二甲氧基矽烷、γ -丙烯醯基 基甲基二乙氧基矽烷、γ_甲基丙烯醯基氧基丙基甲 氧基矽烷、甲基丙烯醯基氧基丙基甲基二乙氧基 γ-氫硫基丙基甲基二甲氧基矽烷、γ-氫硫基丙基甲 氧基矽烷、γ-胺基丙基甲基二甲氧基矽烷、γ-胺基 基二乙氧基矽烷、甲基乙烯二甲氧基矽烷及甲基乙 氧基矽烷。 其中,以分子内具有雙鍵的乙烯三甲氧基矽烷 三乙氧基矽烷、乙烯三乙酸基矽烷、乙烯三甲氧基 矽烷、γ-丙烯醯基氧基丙基三甲氧基矽烷及γ-甲基 基氧基丙基三甲氧基矽烷爲佳,作爲對於矽持有2 烷基者以γ-丙烯醯基氧基丙基甲基二甲氧基矽烷' 醯基氧基丙基甲基二乙氧基矽烷、γ-甲基丙烯醯基 基甲基二甲氧基矽烷、γ-甲基丙烯醯基氧基丙基甲 氧基矽烷、甲基乙烯二甲氧基矽烷及甲基乙烯二乙 烷爲佳,γ-丙烯醯基氧基丙基三甲氧基矽烷及γ-甲 基砂院 劑的例 基矽烷 γ-環氧 丙基甲 基矽烷 烷、γ, 氧基丙 基二甲 矽烷、 基二乙 丙基甲 烯二乙 、乙烯 乙氧基 丙烯醯 取代的 γ-丙烯 氧基丙 基二乙 氧基矽 基丙烯 -17 - 200903021 醯基氧基丙基三甲氧基矽烷、γ -丙烯醯基氧基' 甲氧基矽烷、γ-丙烯醯基氧基丙基甲基二乙氧 甲基丙烯醯基氧基丙基甲基二甲氧基矽烷及 基氧基丙基甲基二乙氧基矽烷爲特佳。 可倂用2種類以上之偶合劑。如上述所示 以外,亦可使用其他矽烷偶合劑。其他矽烷偶 出原矽酸的烷基酯(例如原矽酸甲酯、原矽酸 酸η-丙酯、原矽酸i-丙酯、原矽酸η_ 丁酯、原 醋、原砂酸t-丁醋)及其水解物。 作爲低折射率層之其他膠黏劑所使用的聚 可舉出聚乙烯醇、聚環氧乙烷、聚甲基甲基丙 甲基丙烯酸酯、二乙醯基纖維素、三乙醯基纖 纖維素、聚酯、醇酸樹脂。 (中空二氧化矽系微粒子) 本發明的低折射率層爲具有外殻層,内部 質或空洞之中空二氧化矽系微粒子者亦佳。 中空二氧化矽系微粒子爲,(I )多孔質 於該多孔質粒子表面之被覆層所成的複合粒子 )内部具有空洞,且内容物由溶劑、氣體或多 塡充之空洞粒子。且,低折射率層中僅含有&lt; 子或(11 )空洞粒子之任一者即可,或雙方亦ϊ 且,空洞粒子爲内部具有空洞之粒子,空 包圍。空洞内由調製時所使用之溶劑、氣體或 丙基甲基二 基矽烷、γ -甲基丙烯醯 矽烷偶合劑 合劑中可舉 乙酯、原矽 石夕酸sec-丁 合物,例如 烯酸酯、聚 維素、硝基 爲含有多孔 粒子與設置 、或於(II 孔質物質經 :I )複合粒 T。 洞以粒子壁 多孔質物質 -18- 200903021 等内容物所塡充。如此中空微粒子之平均粒子徑以5〜 300nm爲佳’較佳爲1〇〜200nm之範圍。所使用之中空微 粒子可配合所形成之透明被膜厚度做適宜選擇,所形成之 低折射率層等透明被膜之膜厚2 / 3〜1 /1 〇之範圍爲佳。這 些中空微粒子於形成低折射率層時,分散於適當媒體之狀 態下使用爲佳。作爲分散媒以水 '醇類(例如,甲醇、乙 醇、異丙基醇類)及酮類(例如,甲基乙基酮、甲基異丁 基酮)、酮醇類(例如二丙酮醇類)爲佳。 複合粒子的被覆層之厚度或空洞粒子之粒子壁厚度以 1〜2 0 n m爲佳,較佳爲2〜1 5 n m之範圍。複合粒子之情況 爲,被覆層厚度未達lnm時,有時無法完全被覆粒子,後 述塗佈液成分之聚合度低的矽酸單體、寡聚物等容易進入 複合粒子之内部使得内部之多孔性減少,無法得到充分的 低折射率之效果。又’被覆層之厚度超過20nm時,前述 矽酸單體、寡聚物不會進入内部,故複合粒子之多孔性( 細孔容積)會降低’而有時無法得到充分的低折射率效果 。又’空洞粒子的情況爲,粒子壁厚度未達丨nm時,無法 維持粒子形狀,又厚度即使超過20nm,亦無法充分地顯 示低折射率之效果。 複合粒子的被覆層或空洞粒子之粒子壁以二氧化矽作 爲主成分者爲佳。又,亦可含有除二氧化矽以外之成分, 具體可舉出 Ah〇3、B2〇3、Ti〇2、Zr〇2、Sn〇2、Ce〇2、 P2〇3、Sb2〇3、Mo03、Zn02、W03等。作爲構成複合粒子 之多孔質粒子可舉出由二氧化矽所成者、或由二氧化矽與 -19- 200903021 二氧化矽以外之無機化合物所成者 '或CaF2、 NaAlF6、MgF等所成者。其中以二氧化矽與二氧化 之無機化合物的複合氧化物所成之多孔質粒子爲較 爲二氧化矽以外之無機化合物,可舉出ai2o3、 Ti02 ' Zr02 ' Sn〇2、Ce02、P203 ' Sb2〇3 ' Mo03、 W03等之1種或2種以上。如此多孔質粒子中,二 以Si02表示’二氧化矽以外之無機化合物以氧化 (MOX)表示時的莫耳比M0X/Si02爲0.0001〜1.C 爲 〇 . 〇 〇 1〜〇 · 3之範圍。難得到多孔質粒子的 M0X/Si02未達0.0001者,即使得到亦爲細孔容積 ,無法得到折射率較低的粒子。又,多孔質粒子之 MOX/Si〇2超過1.0時,二氧化砍之比率變少,而 積變大,且難以得到折射率較低者。 如此多孔質粒子之細孔容積爲0.1〜1.5ml/g’ 0.2〜1.5 ml/g之範圍。細孔容積若未達0.1ml/g時 得到充分降低折射率之粒子,若超過1.5ml/g時, 之強度會降低,所得之被膜強度亦會降低。 且,如此多孔質粒子之細孔容積可由水銀壓入 。又,作爲空洞粒子之内容物,可舉出使用於粒子 之溶劑、氣體、多孔質物質等。溶劑中亦可含有空 調製時所使用的粒子前驅體之未反應物、或經使用 等。又作爲多孔質物質,可舉出前述多孔質粒子例 的化合物所成者。這些内容物可爲單一成分所成者 爲複數成分之混合物。Rf represents -(CaHbFc)...a represents an integer of ι~12, b+c represents 2a'b represents an integer of 0-24, and c represents an integer of 〇~24. As such Rf, a group having a fluorine-extended alkyl group and an alkylene group is preferred. Specific examples of such a fluorine-containing polyoxyalkylene-based compound include (MeO)3SiC2H4C2F4C2H4Si(MeO)3, (MeO)3SiC2H4C4F8C2H4Si(MeO)3, (MeO)3SiC2H4C6F12C2H4Si(MeO)3, (H5C20)3SiC2H4C4F8C2H4Si(OC2H5)3 (H5C2〇) 3SiC2H4C6F12C2H4Si(OC2H5)3 shows a methoxyethane compound or the like. When a fluorene-containing alkyl group-containing decane compound is used as an adhesive, the transparent film itself is hydrophobic, so that even if the transparent film cannot be densified, it may become porous or may have cracks or In the case of a gap, it is possible to suppress penetration of a drug such as water or an acid or alkali into the transparent film. Further, fine particles such as metal contained on the surface or the bottom layer of the substrate do not react with moisture or chemicals such as acid. Therefore, such a transparent film has excellent chemical resistance. Further, as the adhesive, a fluorene-containing compound having a fluorine-containing substituted alkyl group has not only such hydrophobicity but also excellent lubricity (low contact resistance), so that a transparent film having excellent scratch resistance can be obtained. Further, the related low refractive index layer of the present invention may contain a decane coupling agent. Examples of the decane coupling agent include methyltrimethoxydecane, methyltriethoxydecane, methyltrimethoxyethoxydecane, methyltriacetoxydecane, methyltributoxydecane, and ethyl. Trimethoxy decane, ethyl triethoxy decane, ethylene trimethoxy decane, ethylene triethoxy decane, ethylene triacetoxy decane, ethylene trimethoxy ethoxy decane, phenyl trimethoxy decane, phenyl Triethoxydecane, phenyltriacetoxydecane, γ-chloropropyltrimethoxydecane, γ-chloropropyltriethoxydecane, γ-chloropropyltriacetoxydecane, 3,3,3 - Difluoropropyl dimethoxy sand, γ-glycidoxypropyl dimethoxy sand, γ-glycidoxypropyl triethoxy sand, γ-(β- Epoxypropyloxyethoxy)propyltrimethoxydecane, β-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, β·(3,4-epoxycyclohexyl) Ethyltriethoxydecane, γ-propylene decyloxypropyltrimethoxydecane, γ-methylpropenyloxypropyltrimethoxydecane, γ-aminopropyltrimethoxy sands γ - Propyl propyl diethoxy sand, γ - thiopropyl propyl dimethoxy sand hospital ' γ - thiopropyl propyl triethoxy cleavage, Ν - β - ( I female ethyl - 16 - 200903021 ) - γ·Aminopropyltrimethoxydecane and β·cyanoethyltriethoxy oxime and 'as a decane coupling for a 2-substituted alkyl group ' dimethyl dimethyl dimethyl ether Oxydecane, phenylmethyldimethoxy'dimethyldiethoxydecane, phenylmethyldiethoxydecane, propyloxypropylmethyldiethoxydecane, γ-epoxypropyl Hydroxydimethoxydecane, γ-epoxypropyloxypropylphenyldiethoxy, γ-chloropropylmethyldiethoxydecane, dimethyldiacetoxyhydrazine decyloxy Propyl dimethyl dimethoxy decane, γ-propylene decyl methyl diethoxy decane, γ-methyl propylene methoxy propyl methoxy decane, methacryl methoxy propyl Methyl diethoxy γ-hydrothiopropyl methyl dimethoxy decane, γ-hydrothiopropyl methoxy decane, γ-aminopropyl methyl dimethoxy decane, γ-amine Base diethoxy decane, methyl ethylene dimethoxy decane Silane-methylacetamide group. Among them, ethylene trimethoxy decane triethoxy decane, ethylene triacetoxy decane, ethylene trimethoxy decane, γ-propylene decyloxypropyl trimethoxy decane, and γ-methyl group having a double bond in the molecule Preferably, methoxypropyltrimethoxydecane is gamma-acrylenyloxypropylmethyldimethoxydecane' decyloxypropylmethyldiethoxylate as a 2 alkyl group for hydrazine. Baseline, γ-methylpropenylmethyldimethoxydecane, γ-methylpropenyloxypropylmethoxydecane, methylethylenedimethoxydecane, and methylethylenediethane More preferably, γ-propylene decyloxypropyl trimethoxy decane and γ-methyl sand compound are exemplified by decane γ-glycidylmethyl decane, γ, oxypropyl dimethyl decane, Diethyl propyl methacrylate, ethylene ethoxy propylene hydrazine substituted γ-propylene oxy propyl diethoxy fluorenyl propylene-17 - 200903021 decyloxypropyl trimethoxy decane, γ - propylene hydrazine氧基oxy 'methoxy decane, γ-acryloyloxypropyl methyldiethoxymethyl propylene decyloxypropyl methyl dimethyloxy The decane and methoxypropylmethyldiethoxy decane are particularly preferred. Two or more types of coupling agents can be used. Other decane coupling agents can also be used as indicated above. Other decanes occlude the alkyl ester of protoporic acid (for example, methyl ortho-decanoate, η-propyl phthalate, i-propyl decanoate, η-butyl phthalate, raw vinegar, orthoic acid t - Butyric vinegar) and its hydrolyzate. As the other adhesive used for the low refractive index layer, polyvinyl alcohol, polyethylene oxide, polymethyl methyl propyl methacrylate, diethyl fluorenyl cellulose, triethylene fluorene fiber can be used. Cellulose, polyester, alkyd resin. (Hollow cerium oxide-based fine particles) The low-refractive-index layer of the present invention is preferably a hollow cerium oxide-based fine particle having an outer layer and an internal substance or a void. The hollow ceria-based fine particles are hollow particles in which (I) a composite particle formed by a coating layer on the surface of the porous particle is porous, and the contents are filled with a solvent, a gas or a plurality of hollow particles. Further, the low refractive index layer may contain only one of the <sub- or (11) cavity particles, or both of them may be hollow particles surrounded by void particles. In the cavity, a solvent, a gas, a propylmethyldiyl decane or a γ-methacryl decane coupling agent mixture may be used as an ethyl ester or a ruthenium sec-butyl compound such as an enoic acid. The ester, the orvidin, and the nitro group are composed of porous particles and arranged, or (II porous substance: I) composite particles T. The hole is filled with contents such as the porous material of the particle wall -18- 200903021. The average particle diameter of the hollow fine particles is preferably from 5 to 300 nm, preferably from 1 Å to 200 nm. The hollow microparticles to be used may be appropriately selected in accordance with the thickness of the transparent film to be formed, and the film thickness of the transparent film such as the low refractive index layer is preferably 2 / 3 to 1 / 1 〇. These hollow fine particles are preferably used in a state in which a low refractive index layer is formed and dispersed in an appropriate medium. As the dispersing medium, water 'alcohols (for example, methanol, ethanol, isopropyl alcohol) and ketones (for example, methyl ethyl ketone, methyl isobutyl ketone), ketone alcohols (for example, diacetone alcohols) ) is better. The thickness of the coating layer of the composite particles or the particle wall thickness of the void particles is preferably 1 to 20 nm, preferably 2 to 15 nm. In the case of the composite particles, when the thickness of the coating layer is less than 1 nm, the particles may not be completely coated, and the tannic acid monomer or oligomer having a low degree of polymerization of the coating liquid component described later may easily enter the inside of the composite particles to make the inside porous. The effect is reduced, and a sufficient low refractive index effect cannot be obtained. Further, when the thickness of the coating layer exceeds 20 nm, the tannic acid monomer and the oligomer do not enter the inside, so that the porosity (pore volume) of the composite particles is lowered, and a sufficient low refractive index effect may not be obtained. Further, in the case of the hollow particles, when the particle wall thickness is less than 丨nm, the particle shape cannot be maintained, and even if the thickness exceeds 20 nm, the effect of the low refractive index cannot be sufficiently exhibited. It is preferred that the coating layer of the composite particles or the particle walls of the hollow particles have cerium oxide as a main component. Further, components other than cerium oxide may be contained, and specific examples thereof include Ah 〇 3, B 2 〇 3, Ti 〇 2, Zr 〇 2, Sn 〇 2, Ce 〇 2, P 2 〇 3, Sb 2 〇 3, and Mo03. , Zn02, W03, etc. Examples of the porous particles constituting the composite particles include those formed by cerium oxide or those formed by inorganic compounds other than cerium oxide and -19-200903021 cerium oxide or CaF2, NaAlF6, MgF, and the like. . The porous particles formed by the composite oxide of the cerium oxide and the inorganic compound of the oxidizing agent are inorganic compounds other than cerium oxide, and examples thereof include ai2o3, Ti02 'Zr02 'Sn2, Ce02, and P203' Sb2. 〇3 'One type or two or more types of Mo03, W03, etc. In such a porous particle, the ratio of the molar ratio M0X/SiO 2 of the inorganic compound other than cerium oxide represented by SiO 2 to oxidation (MOX) is 0.0001 to 1. C is 〇. 〇〇1 〇 〇 3 range . It is difficult to obtain a porous particle having a M0X/SiO 2 of less than 0.0001, and even if it is obtained as a pore volume, particles having a low refractive index cannot be obtained. Further, when the MOX/Si〇2 of the porous particles exceeds 1.0, the ratio of the oxidized chopping is small, and the product becomes large, and it is difficult to obtain a lower refractive index. The pore volume of such a porous particle is in the range of 0.1 to 1.5 ml/g' 0.2 to 1.5 ml/g. When the pore volume is less than 0.1 ml/g, particles having a sufficiently reduced refractive index are obtained. When the pore volume exceeds 1.5 ml/g, the strength is lowered, and the obtained film strength is also lowered. Moreover, the pore volume of such a porous particle can be pressed by mercury. Further, examples of the content of the void particles include a solvent, a gas, and a porous material used for the particles. The solvent may also contain an unreacted material of the particle precursor used in the preparation of the air, or may be used. Further, examples of the porous material include those of the above-mentioned examples of the porous particles. These contents may be a mixture of a plurality of components as a single component.

NaF ' 矽以外 佳。作 B 2 〇 3、 Zn 〇2、 氧化矽 物換算 ),較佳 莫耳比 較小者 莫耳比 細孔容 較佳爲 ,無法 微粒子 法求得 調製時 洞粒子 之觸媒 所舉出 、亦可 -20- 200903021 作爲如此中空二氧化矽系微粒子之製造方法,例如可 採用特開平7-133105號公報之段落號碼〔〇〇1〇〕〜〔 0 0 3 3〕所揭示的複合氧化物膠體粒子之調製方法。 中空二氧化矽系微粒子之低折射率層中的含有量以】〇 〜5〇質量%爲佳。可提局低折射率之效果下,以15皙量% 以上爲佳’超過5 0質量%時膠黏劑成分變少,使得膜強度 變得不充分。特佳爲20〜50質量%。 (活性光線硬化型樹脂、熱硬化性樹脂) 本發明之相關低折射率層爲由活性光線硬化型樹脂或 熱硬化性樹脂所形成者爲較佳。特別以皮膜狀態下折射率 爲1 .4 5以下之活性光線硬化型樹脂或熱硬化性樹脂所形 成者爲佳。 對於低折射率層之液組成物中所使用的較佳活性光線 硬化型樹脂做說明。 所謂活性光線硬化型樹脂爲藉由如紫外線或電子線之 活性光線照射後經由交聯反應等而硬化之樹脂。作爲活性 光線硬化型樹脂’可舉出紫外線硬化性樹脂或電子線硬化 性樹脂等作爲代表者’但亦可爲藉由紫外線或電子線以外 之活性光線照射而硬化之樹脂。 作爲紫外線硬化性樹脂,例如可舉出紫外線硬化型丙 燦基尿院系樹脂、紫外線硬化型聚酯丙烯酸酯系樹脂、紫 外線硬化型環氧基丙烯酸酯系樹脂、紫外線硬化型多元醇 丙稀酸醋系樹脂、或紫外線硬化型環氧基樹脂等。 -21 - 200903021 #外線硬化型丙烯基尿烷系樹脂,一般爲將聚酯多元 醇與異氰酸酯單體、或預聚物經反應後所得之生成物中, 進一步地與具有2_羥基乙基丙烯酸酯、2_羥基乙基甲基丙 稀酸_(以下作爲丙烯酸酯中包含甲基丙烯酸酯者僅以丙 稀酸醋表示)、2-羥基丙基丙烯酸酯等羥基之丙烯酸酯系 單體進行反應後容易得到。例如可舉出特開昭5 9 _ ;! 5〗〗j 〇 號所記載的優尼迪克17-806 (大日本墨水(股)製)1〇〇 份與COR〇NET L (日本聚尿烷(股)製)1份之混合物等 爲佳。 紫外線硬化型聚酯丙烯酸酯系樹脂爲,一般可由聚酯 末端之羥基或羧基與如2-羥基乙基丙烯酸酯、環氧丙基丙 稀酸酯 '丙烯酸之單體進行反應後容易得到(例如,特開 昭5 9 -1 5 1 1 1 2號公報)。 紫外線硬化型環氧基丙烯酸醋系樹脂可由環氧基樹脂 之末端經基與如丙烯酸、丙烯酸氯化物 '環氧丙基丙烯酸 酯之單體進行反應得到。 作爲紫外線硬化型多元醇丙烯酸酯系樹脂,可舉出乙 二醇(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、 甘油三(甲基)丙烯酸酯、三羥甲基丙烷三丙烯酸酯、季 戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇五 丙烯酸酯、二季戊四醇六丙烯酸酯、烷基變性二季戊四醇 五丙烯酸酯等。 作爲紫外線硬化型環氧基丙烯酸酯系樹脂、紫外線硬 化型環氧基樹脂之例子’較佳爲顯示環氧基系活性光線反 -22- 200903021 應性化合物。 (a )雙酣A之環氧丙醚(該化合物爲藉由表氯醇與 雙酚A之反應’得到作爲聚合度相異的混合物) (b) 具有2個雙酚a等酚性0ίί之化合物、與表氯 醇、環氧乙院及/或環氧丙烷進行反應後使末端具有環氧 丙醚基之化合物 (c) 4,4’-伸甲基雙酚之環氧丙醚 (d )漆用酣酸樹脂或甲階酚醛樹脂之酚甲醛樹脂的 環氧基化合物 (e )具有脂環式環氧化物之化合物,例如可舉出雙 (3,4 -環氧基環己基甲基)聚草酸酯、雙(3,4_環氧基環 己基甲基)己二酸酯、雙(3,4-環氧基-6_環己基甲基)己 二酸酯、雙(3,4-環氧基環己基甲基庚二酸酯)、3,4-環 氧基環己基甲基-3,4·環氧基環己烷羧酸酯、3,4_環氧基-甲基環己基甲基-3’,4’-環氧基環己烷羧酸酯、3,4_環氧基_ 1-甲基-環己基甲基-3’,4’-環氧基-1’-甲基環己烷羧酸酯、 3,4-環氧基-6-甲基-環己基甲基-3’,4,-環氧基- 6’ -甲基-1,-環己烷羧酸酯、2-(3,4-環氧基環己基-5,,5,一螺-3,,,4,,_環 氧基)環己院-間-一嚼院 (f) 2元酸之二環氧丙醚’例如可舉出二環氧丙基聚 草酸酯、二環氧丙基己二酸酯、二環氧丙基四氫酞酸酯、 二環氧丙基六氫酞酸醋 '二環氧丙基酞酸醋 (g) 二醇之二環氧丙醚’例如可舉出乙二醇二環氧 丙醚、二乙二醇二環氧丙醚、丙二醇二環氧丙醚、聚乙二 -23- 200903021 醇二環氧丙醚、聚丙二醇二環氧丙醚、共聚(乙二醇-丙 二醇)二環氧丙醚、1,4-丁二醇二環氧丙醚、1,6-己二醇 二環氧丙醚 (h )聚合物酸的環氧丙基酯、例如,聚丙烯酸聚環 氧丙基酯、聚酯二環氧丙基酯 (i )多元醇類之環氧丙醚,例如可舉出甘油三環氧 丙醚、三羥甲基丙烷三環氧丙醚、季戊四醇二環氧丙醚、 季戊四醇三環氧丙醚、季戊四醇四環氧丙醚、葡萄糖三環 氧丙醚 (j )作爲2-氟烷基-1,2-二醇之二環氧丙醚,可舉出 前述低折射率物質之含氟樹脂的含氟環氧基化合物所舉出 的化合物例相同者 (k)作爲含氟鏈烷末端二醇環氧丙醚,可舉出上述 低折射率物質之含氟樹脂的含氟環氧基化合物等。 上述環氧基化合物之分子量作爲平均分子量爲2000 以下,較佳爲1〇〇〇以下。 將上述環氧基化合物藉由活性光線而硬化時,欲進一 步提高硬度,使用混合具有(h)或(i)之多官能環氧基 的化合物時具有效果。 使環氧基系活性光線反應性化合物經陽離子聚合之光 聚合啓始劑或光增感劑,藉由活性光線照射可釋出陽離子 聚合開始物質之化合物,特佳爲藉由照射可釋出陽離子聚 合開始能之路易氏酸的鑰鹽之一群複合鹽。 活性光線反應性化合物環氧基樹脂並非藉由自由基聚 -24- 200903021 合’係藉由陽離子聚合而聚合,形成交聯結構或網目結構 。與自由基聚合相異’不會受到反應系中的氧之影響故爲 較佳之活性光線反應性樹脂。 於本發明有用之活性光線反應性環氧基樹脂,藉由釋 出經活性光線照射開始進行陽離子聚合的物質之光聚合啓 始劑或光增感劑而聚合。作爲光聚合啓始劑,藉由光照射 開始陽離子聚合並釋出路易氏酸的鑰鹽之複合鹽一群爲特 佳。 相關的代表性物質爲下述一般式(a )所示化合物。 一般式(a ) 〔(R1 )a(R2)b(R3)c(R4)dZ〕w+〔 MeXv〕w· 式中,陽離子爲鎗,Z爲S、Se、Te、P、As、Sb、Bi 、〇、鹵素(例如,I、Br、Cl)、或 N = N (重氮),R1、 R2、R3、R4爲可相同或相異之有機基。a、b、c、d各爲 0〜3之整數,a+b+c+d相當於Z之價數。Me爲鹵化物 錯體之中心原子的金屬或半金屬(metalloid) ,B、P、As 、Sb、Fe ' Sn、Bi、A1、Ca、In、Ti、Zn、Sc、V、Cr、 Mn、Co等。X爲鹵素,w爲鹵化錯體離子之正電荷,v爲 鹵化錯體離子中的鹵素原子之數。 作爲上述一般式(a)的陰離子〔MeXv〕w-的具體例 ,可舉出四氟硼酸酯(BF4·)、四氟磷酸酯(PF4·)、四 氟銻酸酯(SbF4·)、四氟砷酸酯(AsF4_ )、四氯銻酸酯 (SbCl,)等。 又,做爲其他陰離子,可舉出過鹽素酸離子(CIO, -25- 200903021 )、三氟甲基亜硫酸離子(CF3S03-)、氟磺酸離 FS〇3_)、甲苯磺酸離子、三硝基苯酸陰離子等。 如此鑰鹽中,特別將芳香族銷鹽作爲陽離子聚合 劑使用時具有效果’其中亦以特開昭5 0- 1 5 1 996號 5 0 - 1 5 8 6 8 0號等所記載的芳香族鹵素鑰鹽、特開昭 151997 號、同 52-30899 號、同 59-55420 號、同 1 2 5 1 05號等所記載的VIA族芳香族鎗鹽、特開昭56. 號、同56-149402號、同57-192429號等所記載的氧 鹽、特公昭4 9 - 1 7 0 4 0號等所記載的芳香族重氮鑰鹽 國專利第4,1 3 9,6 5 5號等所記載的硫代吡喃鑰鹽等爲 又,可舉出鋁錯體或光分解性矽化合物系聚合啓始劑 可倂用上述陽離子聚合啓始劑、與二苯甲酮、苯並異 醚、噻噸酮等光增感劑。 又’具有環氧基丙烯酸酯基之活性光線反應性化 的情況’可使用η-丁基胺、三乙基胺、三·η_丁基膦 : 增感劑。於該活性光線反應性化合物所使用的光增感 光啓始劑’對於紫外線反應性化合物1 〇 〇質量份而言 〇 . 1質量份〜1 5質量份即可充分開始進行光反應,較 1質量份〜1 〇質量份。該增感劑由近紫外線區域至可 線區域的吸收極大者爲佳。 含有本發明中有用之活性光線硬化型樹脂的墨水 ,一般光聚合啓始劑對於活性光線硬化型環氧基樹脂 聚物)100質量份而言爲0.1質量份〜15質量份之使 佳’更佳爲1質量份〜1 0質量份之範圍添加爲佳。 子( 啓始 、同 50- 55- 8428 代鎏 、美 佳。 等。 異丙 合物 等光 劑或 ,以 佳爲 見光 液中 (預 用爲 -26- 200903021 又’環氧基樹脂亦可與上述尿烷丙烯酸酯型樹脂、聚 醚丙烯酸酯型樹脂等倂用’此時,可倂用活性光線自由基 聚合啓始劑與活性光線陽離子聚合啓始劑爲佳。 又’本發明中’作爲光聚合啓始劑亦可使用氧雜環丁 烷化合物。所使用的氧雜環丁烷化合物爲具有含氧或硫之 3員環氧雜環丁烷環的化合物。其中具有含氧之氧雜環丁 烷環的化合物爲佳。氧雜環丁烷環亦可由鹵素原子、鹵烷 基、芳基烷基、烷氧基、烯丙氧基、乙酸基取代。具體可 舉出3,3 -雙(氯甲基)氧雜環丁烷、3,3_雙(碘甲基)氧 雜環丁烷、3,3-雙(甲氧基甲基)氧雜環丁烷、3,3_雙( 苯氧基甲基)氧雜環丁烷、3·甲基-3氯甲基氧雜環丁烷、 3,3-雙(乙酸基甲基)氧雜環丁烷、3,3_雙(氟甲基)氧 雜環丁烷、3,3-雙(溴甲基)氧雜環丁烷、3,3_二甲基氧 雜環丁烷等。且,本發明中亦可爲單體 '寡聚物、聚合物 之任一。 作爲可使用於本發明之紫外線硬化性樹脂的具體例, 例如可舉出 AdekoptomerKR、BY 系列之 KR-400、KR-410 、KR-550、KR-566、KR-567、BY-320B (以上,旭電化工 業(股)製)、Koeihard 的 A-1 0 1-KK、A-1 0 1-WS、C-302、C-4(U-N、C-501、M-101、M-102、T-102、D-102、 NS-101、FT-102Q8、MAG-1-P20、AG-106、M-101-C (以 上,廣榮化學工業(股)製)、Secabeam的PHC2210(S )、PHCX-9 ( K-3 ) 、PHC2213、DP-10、DP-20、DP-30 、P 1 000 ' P1 1 〇〇 ' P 1 200、P 1 3 00 ' P 1 400 ' PI 5 00 ' P1600 -27- 200903021 、SCR900 (以上,大日精化工業(股)製)、KRM703 3 、KRM7 03 9 ' KRM7130、KRM71 3 1、UVECRYL2920 1、 UVECRYL29202 (以上,達西耳.UCB (股))、RC-5015 、RC-5016、RC-5 02 0、RC-5 03 1、RC-5100、RC-5102、 RC-5120 ' RC-5122 ' RC-5152 ' RC-5171 ' RC-5180 ' RC-5 1 8 1 (以上,大日本墨水化學工業(股)製)、歐雷克斯 No.340克力亞(中國塗料(股)製) '山拉多 H-601、 RC-75 0 ' RC-700、RC-600、RC-5 00、RC-611、RC-612 ( 以上,三洋化成工業(股)製)、SP-1509、SP-1507 C以 上,昭和高分子(股)製)、RCC-15C(Grace Japan (股 )製)、亞羅尼克斯 Μ-6100、Μ·8030、M-8060 (以上, 東亞合成(股)製)、或可利用其他販賣品中選出之適宜 者。 又,作爲活性光線硬化型樹脂,使用紫外線硬化性樹 脂時,於不妨礙前述紫外線硬化性樹脂之光硬化的程度下 ,亦可使紫外線吸收劑含於紫外線硬化性樹脂組成物。作 爲紫外線吸收劑,由波長3 70nm以下之紫外線吸收能優良 ,且良好液晶顯示性之觀點來看,使用波長4 0 0 n m以上之 可見光吸收較少者爲佳。 作爲使用於本發明之較佳紫外線吸收劑的具體例,例 如可舉出氧二苯甲酮系化合物、苯並三哩系化合物、水楊 酸酯系化合物、二苯甲酮系化合物、氰基丙烯酸酯系化合 物、三嗪系化合物、鎳錯鹽系化合物等,但未限定於此。 作爲可使用於本發明之活性光線,僅可以紫外線、電 -28- 200903021 子線、γ線等’活化形成圖形狀之活性光線硬化型樹脂的 光源即可’並無特別限定,以紫外線、電子線爲佳,特別 以處理簡便下容易得到高能量的紫外線爲佳。作爲將紫外 線反應性化合物進行光聚合之紫外線光源,僅可產生紫外 線之光源即可。例如,可使用低壓水銀燈、中壓水銀燈、 高壓水銀燈、超高壓水銀燈、碳極電弧燈、金屬鹵素燈、 氣氣燈等。又’亦可使用ArF準分子雷射、KrF準分子雷 射、準分子燈或同步加速器放射光等。照射條件依各燈而 不同’以照射光量爲lmJ/cm2以上者爲佳,更佳爲 20mJ/cm2 〜l〇〇〇〇mJ/cm2,特佳爲 50mJ/cm2 〜2000mJ/cm2 〇 又’電子線亦可同樣地使用。作爲電子線,可舉出由 Cockroft-Walton型、范德格拉夫型、共振變壓型、絕緣 以心變壓器型、直線型、局頻闻壓加速器(dynamitron) 型、高頻率型等各種電子線加速器釋出的具有5〇〜 lOOOkeV ’較佳爲1〇〇〜300keV之能量的電子線。 本發明中,活性光線照射時之環境氣體中的氧濃度爲 1 〇%以下’特別以1 %以下者爲佳。該環境氣體爲導入氮氣 等時有效。 又’本發明中’欲有效率地進行活性光線之硬化反應 ’可加熱基材薄膜等。作爲加熱方法,並無特別限定,可 使用加熱平板、加熱輥、加熱頭、或著落墨水表面上以熱 風吹等方法爲佳。又’亦可將夾著柔版印刷部之基材薄膜 ’於反側使用的背輥作爲加熱輥,施予連續加熱。 -29- 200903021 作爲加熱溫度’依據所使用之活性光線硬化 種類’不能一槪規定,但對於基材薄膜不會產生 景;ί響之溫度範圍爲佳,以3 0〜2 0 0 °C爲較佳,更ΐ 1 2 0 °C ’特佳爲7 0〜1 〇 〇。 其次’對於本發明之低折射率層用墨水液組 用的熱硬化性樹脂作說明。 作爲本發明所使用的熱硬化性樹脂,可舉出 醋樹脂 '環氧基樹脂、乙烯酯樹脂、酚樹脂、熱 醯亞胺樹脂、熱硬化性聚醯胺亞胺等。 作爲不飽和聚酯樹脂,例如有將鄰苯二甲酸 異苯二甲酸系樹脂、對苯二甲酸系樹脂、雙酚系 二醇馬來酸系樹脂、二環戊二烯或其衍生物導入 聚醋組成後使其低分子量化、或添加被膜形成性 的低苯乙烯揮發性樹脂 '添加熱可塑性樹脂(聚 樹脂、苯乙烯.丁二烯共聚物、聚苯乙烯、飽和 之低收縮性樹脂、將不飽和聚酯直接以B r 2進行 將氯橋酸、二溴新戊基二醇經共聚合的反應性型 蠟、四溴雙酣等鹵化物與三氧化鋪、燐化合物之 氧化鋁等作爲添加劑使用的添加型之難燃性樹脂 院或聚矽氧烷經混合化、或經丨p N化的強靭性( 高彈性率、高延伸率)之強靭性樹脂等。 作爲環氧基樹脂,例如可舉出含有雙酚A型 醛酣型 '雙酚F型、溴化雙酚A型之環氧丙醚系 脂、含有環氧丙基胺系 '環氧丙基酯系、環式脂 型樹脂的 熱變形等 t爲50〜 成物所使 不飽和聚 硬化性聚 系樹脂、 樹脂、丙 於不飽和 蠟化合物 乙酸乙烯 聚酯等) 溴化、或 、氯化石 組合或Μ 、與聚尿 高強度、 、漆用酚 環氧基樹 肪系、雜 -30- 200903021 環式環氧基系之彳寸殊環氧基樹脂等。 作爲乙烯醋樹脂’例如爲將普通環氧基樹脂與甲基丙 烯酸等不飽和一元酸進行開環加成反應後所得之寡聚物, 溶解於苯乙烯等單體的物質。又,亦有含有分子末端或支 鏈上持有乙烯基的乙烯單體等之特殊型式。作爲環氧丙醚 系環氧基樹脂之乙烯醋樹脂’例如有雙酌系、漆用酣酸系 、溴化雙酚系等’作爲特殊乙烯酯樹脂有乙烯酯尿烷系、 三聚異氰酸乙烯系、支鏈乙燃酯系等。 酚樹脂爲可將酚類與甲醛類作爲原料,經縮聚合而得 到之甲階酚醛型與漆用酚醛型。 作爲熱硬化性聚酿亞胺樹脂’例如有馬來酸系聚酿亞 胺、例如聚馬來酸酐縮亞胺胺、聚胺基雙馬來酸酐縮亞胺 、雙馬來酸酐縮亞胺二烯丙基雙酚_A樹脂、雙馬 來酸酐縮亞胺.三嗪樹脂等’又有納迪克酸變性聚醯亞胺 、及乙炔末端聚醯亞胺等。 又’上述活性光線硬化型樹脂之一部亦可作爲熱硬化 性樹脂使用。 且’本發明所使用的熱硬化性樹脂所成的墨水液、及 液組成物中’亦可使用含活性光線硬化型樹脂之墨水液組 成物所記載之抗氧化劑或紫外線吸收劑。 對熱硬化性樹脂之加熱方法,雖無特別限定,可使用 加熱平板、加熱輥 '加熱頭、或吹熱風等方法爲佳。又, 將使用於薄膜搬送之背輥’作爲加熱輥可施予連續性加熱 。作爲加熱溫度’依所使用之熱硬化性樹脂的種類而不同 -31 - 200903021 而不可一槪規定,但不會對透明基材產生熱變形等;胃 範圍爲佳,30〜200 °C爲佳,更佳爲50〜120 °C,特佳爲7〇 〜100。。。 &lt;氟系樹脂&gt; 本發明中,使用皮膜狀態下折射率爲1.45以下之# 性光線硬化型樹脂或熱硬化性樹脂者爲佳,折射率爲! .3〇 〜〗.40之範圍者爲較佳。 (折射率之測定) 折射率的測定爲,可將含有上述樹脂之液組成物塗佈 於基材薄膜所得之皮膜,藉由折射率計進行測定而求得。 例如’將含有樹脂之液組成物使用微凹版印刷塗佈機 進行塗佈’ 90°C之乾燥後,使用紫外線燈,於照射部之照 度爲〇· 1 W/cm2 ’照射量作爲〇· lJ/cm2使塗佈層進行硬化 ’形成厚度5 μ m之皮膜,並以阿貝折射計測定折射率。 上述活性光線硬化型樹脂或熱硬化性樹脂之化合物中 ’亦以分子中含有1個以上氟原子及1個以上丙烯醯基及 /或甲基丙烯醯基之含氟丙烯基系單體、含氟聚合物、或 者含氟寡聚物者爲佳。 使用下述一般式(b)或者一般式(c)所示化合物爲 佳。 -32- 200903021 【化2】 一般式(叫 R1 R2NaF ' is better than 矽. For B 2 〇3, Zn 〇2, oxidized ruthenium conversion), it is preferable that the molar ratio of the molar ratio is better than that of the fine pores, and the catalyst of the pore particles can not be obtained by the microparticle method. -20-200903021 As a method for producing the hollow cerium oxide-based fine particles, for example, a composite oxide colloid disclosed in paragraph number [〇〇1〇] to [0 0 3 3] of JP-A-7-133105 can be used. Particle modulation method. The content of the hollow cerium oxide-based fine particles in the low refractive index layer is preferably 〇 5% to 5% by mass. In the case of the effect of lowering the refractive index, it is preferable that the amount of the adhesive is 15% by mass or more. When the content exceeds 50% by mass, the amount of the adhesive component is small, so that the film strength is insufficient. Particularly preferred is 20 to 50% by mass. (Active light-curing resin or thermosetting resin) The low-refractive-index layer of the present invention is preferably formed of an active ray-curable resin or a thermosetting resin. Particularly, it is preferably formed of an active light-curing resin or a thermosetting resin having a refractive index of 1.45 or less in a film state. A preferred active light-curing resin used in the liquid composition of the low refractive index layer will be described. The active light-curing resin is a resin which is cured by a crosslinking reaction or the like after being irradiated with active light such as ultraviolet rays or electron beams. The active light-curable resin is exemplified by an ultraviolet curable resin or an electron beam curable resin, but may be a resin which is cured by irradiation with active light other than ultraviolet rays or electron beams. Examples of the ultraviolet curable resin include an ultraviolet curable acryl-based resin, an ultraviolet curable polyester acrylate resin, an ultraviolet curable epoxy acrylate resin, and an ultraviolet curable polyacrylic acid acrylic acid. A vinegar resin or an ultraviolet curable epoxy resin. -21 - 200903021 #External curing type acryl-based urethane resin, generally obtained by reacting a polyester polyol with an isocyanate monomer or a prepolymer, further having 2-hydroxyethyl acrylate Ester, 2-hydroxyethyl methyl acrylate (hereinafter referred to as acrylate containing methacrylate, only acrylic acid vinegar), hydroxy acrylate monomer such as 2-hydroxypropyl acrylate It is easy to obtain after the reaction. For example, the Unitek 17-806 (made by Dainippon Ink Co., Ltd.) and the COR〇NET L (Japanese Polyurethane) described in JP-A-5 9 _ ;! 5 〗 〖J 〇 (share) system) 1 part of the mixture is preferred. The ultraviolet curable polyester acrylate resin is generally obtained by reacting a hydroxyl group or a carboxyl group at the terminal of the polyester with a monomer such as 2-hydroxyethyl acrylate or epoxy propyl acrylate 'acrylic acid (for example). , JP-A-Chang 5:9 -1 5 1 1 1 2). The ultraviolet curable epoxy acrylate vinegar resin can be obtained by reacting a terminal group of an epoxy resin with a monomer such as acrylic acid or acryl chloride 'epoxypropyl acrylate. Examples of the ultraviolet curable polyol acrylate-based resin include ethylene glycol (meth) acrylate, polyethylene glycol di(meth) acrylate, glycerol tri(meth) acrylate, and trimethylolpropane. Triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, alkyl-denatured dipentaerythritol pentaacrylate, and the like. As an example of the ultraviolet curable epoxy acrylate resin and the ultraviolet curable epoxy resin, it is preferred to exhibit an epoxy group active light ray-22-200903021 compound. (a) Glycidyl ether of biguanide A (this compound is obtained by reacting epichlorohydrin with bisphenol A to obtain a mixture having a different degree of polymerization) (b) having two phenolic properties such as bisphenol a a compound, a compound having a glycidyl ether group at the end after reacting with epichlorohydrin, epoxy epoxide and/or propylene oxide (c) a glycidyl ether of 4,4'-methyl bisphenol (d) The epoxy compound (e) of the phenolic formaldehyde resin of the decanoic resin or the resol resin has an alicyclic epoxide compound, and examples thereof include bis(3,4-epoxycyclohexylmethyl) Polyoxalate, bis(3,4-epoxycyclohexylmethyl)adipate, bis(3,4-epoxy-6-cyclohexylmethyl)adipate, bis (3) , 4-epoxycyclohexylmethylpimelate), 3,4-epoxycyclohexylmethyl-3,4·epoxycyclohexanecarboxylate, 3,4-epoxy- Methylcyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, 3,4-epoxy-1-methyl-cyclohexylmethyl-3',4'-epoxy -1'-methylcyclohexanecarboxylate, 3,4-epoxy-6-methyl-cyclohexylmethyl-3',4,-epoxy-6'-methyl-1 -cyclohexanecarboxylate, 2-(3,4-epoxycyclohexyl-5,5, a spiro-3,,,4,,-epoxy)cyclohexyl-inter-drug (f) Di-glycidyl ether of dibasic acid, for example, diepoxypropyl polyoxalate, diepoxypropyl adipate, diepoxypropyl tetrahydrofuroate, bicyclo Oxypropyl hexahydrophthalic acid vinegar 'diepoxypropyl phthalic acid vinegar (g) diol diglycidyl ether', for example, ethylene glycol diglycidyl ether, diethylene glycol diepoxypropyl Ether, propylene glycol diglycidyl ether, polyethylene-2-23-200903021 alcohol diglycidyl ether, polypropylene glycol diglycidyl ether, copolymer (ethylene glycol-propylene glycol) diglycidyl ether, 1,4-butyl Glycol propyl dimethacrylate, 1,6-hexanediol diglycidyl ether (h) a glycopropyl ester of a polymer acid, for example, polyacrylic acid polyepoxypropyl ester, polyester diepoxypropyl The ester of the (i) polyhydric alcohol, for example, glyceryl triglycidyl ether, trimethylolpropane triglycidyl ether, pentaerythritol diglycidyl ether, pentaerythritol triglycidyl ether, Pentaerythritol tetraglycidyl ether, glucose triglycidyl ether (j) as 2-fluoroalkyl-1,2- The diglycidyl ether of the diol may be the same as the compound of the fluorine-containing epoxy compound of the fluorine-containing resin of the low refractive index substance (k) as the fluorine-containing alkane-terminated diol propylene-propylene. The ether may, for example, be a fluorine-containing epoxy compound of a fluorine-containing resin of the above-mentioned low refractive index material. The molecular weight of the epoxy group-containing compound has an average molecular weight of 2,000 or less, preferably 1 Å or less. When the epoxy group is hardened by active light, it is intended to further increase the hardness, and it is effective to use a compound in which a polyfunctional epoxy group having (h) or (i) is mixed. A photopolymerization initiator or a photosensitizer for cationically polymerizing an epoxy-based reactive light-reactive compound, which can release a compound of a cationic polymerization starting material by irradiation with active light, and particularly preferably emits a cation by irradiation. A composite salt of one of the key salts of Lewis acid which can be polymerized. The active light-reactive compound epoxy resin is not polymerized by cationic polymerization by a radical polymerization to form a crosslinked structure or a network structure. An active light-reactive resin which is different from radical polymerization and which is not affected by oxygen in the reaction system. The active light-reactive epoxy resin useful in the present invention is polymerized by releasing a photopolymerization initiator or a photosensitizer of a substance which undergoes cationic polymerization by irradiation with active light. As a photopolymerization initiator, a group of a composite salt of a key salt of a Lewis acid which initiates cationic polymerization by light irradiation is preferred. A related representative substance is a compound represented by the following general formula (a). General formula (a) [(R1)a(R2)b(R3)c(R4)dZ]w+[ MeXv]w· where cation is a gun and Z is S, Se, Te, P, As, Sb, Bi, hydrazine, halogen (for example, I, Br, Cl), or N = N (diazonium), and R1, R2, R3, and R4 are the same or different organic groups. a, b, c, and d are each an integer of 0 to 3, and a+b+c+d is equivalent to the valence of Z. Me is a metal or semimetal of the central atom of the halide complex, B, P, As, Sb, Fe 'Sn, Bi, A1, Ca, In, Ti, Zn, Sc, V, Cr, Mn, Co et al. X is a halogen, w is a positive charge of a halogenated dislocation ion, and v is the number of halogen atoms in the halogenated dislocation ion. Specific examples of the anion [MeXv]w- of the above general formula (a) include tetrafluoroborate (BF4·), tetrafluorophosphate (PF4·), and tetrafluorodecanoate (SbF4·). Tetrafluoroarsenate (AsF4_), tetrachlorophthalic acid ester (SbCl,), and the like. Further, as other anions, persalt-acid ions (CIO, -25-200903021), trifluoromethylsulfate sulfate (CF3S03-), fluorosulfonic acid-free FS〇3_), toluenesulfonic acid ions, and trisole may be mentioned. Nitrobenzoic acid anion and the like. In such a key salt, when an aromatic pin salt is used as a cationic polymerization agent, it has an effect. The aromatics described in JP-A-2005-1501 996, No. 5 0 - 1 5 8 6 8 0, etc. Halogen salt, special opening No. 151997, the same as No. 52-30899, the same as 59-55420, the same as 1 2 5 1 05, etc., VIA aromatic gun salt, special opening 56. No., same 56- The oxy-salt described in No. 149402, No. 57-192429, etc., and the aromatic diazo salt national patent No. 4, 1 3 9, 6 5 5, etc. described in Japanese Patent Publication No. Sho. Further, the thiopyranium salt and the like described above may be exemplified by an aluminum dislocation or a photodecomposable ruthenium compound-based polymerization initiator which can be used with the above cationic polymerization initiator, benzophenone, and benzenosyl ether. , thioxanthone and other photosensitizers. Further, in the case where the active light having the epoxy acrylate group is reactive, η-butylamine, triethylamine or tris-n-butylphosphine: a sensitizer can be used. The photo-sensitizing initiator used in the active light-reactive compound is used for the ultraviolet-reactive compound 1 〇〇 by mass. 1 part by mass to 15 parts by mass, the photoreaction can be sufficiently started, and the mass is 1 mass. Parts ~ 1 〇 by mass. The sensitizer is preferably absorbed from the near ultraviolet region to the linear region. The ink containing the active light-curing resin useful in the present invention is generally 0.1 parts by mass to 15 parts by mass per 100 parts by mass of the active light-curing epoxy resin polymer. It is preferably added in the range of 1 part by mass to 10 parts by mass. (Starting, with 50-55- 8428, Dai, Meijia, etc.. Isopropyl or other light agent, or better in the liquid solution (pre-use is -26-200903021 and 'epoxy resin can also In combination with the above-mentioned urethane acrylate type resin, polyether acrylate type resin, etc., in this case, it is preferred to use an active light radical polymerization initiator and an active light cationic polymerization initiator. An oxetane compound can also be used as the photopolymerization initiator. The oxetane compound used is a compound having a 3-membered epoxy ringtone containing oxygen or sulfur, and having oxygen-containing oxygen. A compound of a heterocyclobutane ring is preferred. The oxetane ring may also be substituted by a halogen atom, a haloalkyl group, an arylalkyl group, an alkoxy group, an allyloxy group or an acetoxy group. Specifically, 3, 3 - bis(chloromethyl)oxetane, 3,3-bis(iodomethyl)oxetane, 3,3-bis(methoxymethyl)oxetane, 3,3 _Bis(phenoxymethyl)oxetane, 3·methyl-3chloromethyloxetane, 3,3-bis(acetoxymethyl)oxetane, 3,3 _double (fluoromethyl)oxetane, 3,3-bis(bromomethyl)oxetane, 3,3-dimethyloxetane, etc. Further, in the present invention, it may be a single The specific example of the ultraviolet ray curable resin to be used in the present invention includes, for example, Adekoptomer KR, BY series KR-400, KR-410, KR-550, KR- 566, KR-567, BY-320B (above, Xuan Electrochemical Industry Co., Ltd.), Koeihard's A-1 0 1-KK, A-1 0 1-WS, C-302, C-4 (UN, C -501, M-101, M-102, T-102, D-102, NS-101, FT-102Q8, MAG-1-P20, AG-106, M-101-C (above, Guangrong Chemical Industry ( Co., Ltd.), Secabeam's PHC2210(S), PHCX-9 (K-3), PHC2213, DP-10, DP-20, DP-30, P 1 000 'P1 1 〇〇' P 1 200, P 1 3 00 ' P 1 400 ' PI 5 00 ' P1600 -27- 200903021 , SCR900 (above, Da Ri Jing Chemical Industry Co., Ltd.), KRM703 3 , KRM7 03 9 ' KRM7130, KRM71 3 1 , UVECRYL2920 1, UVECRYL29202 (above , Darcy. UCB (share)), RC-5015, RC-5016, RC-5 02 0, RC-5 03 1, RC-5100, RC-5102, RC-5120 'RC- 5122 ' RC-5152 ' RC-5171 ' RC-5180 ' RC-5 1 8 1 (above, Dainippon Ink Chemical Industry Co., Ltd.), Orex No. 340 Kelly (China Coatings Co., Ltd.) System] 'Sarado H-601, RC-75 0' RC-700, RC-600, RC-5 00, RC-611, RC-612 (above, Sanyo Chemical Industry Co., Ltd.), SP-1509 , SP-1507 C or higher, Showa Polymer Co., Ltd., RCC-15C (Grace Japan Co., Ltd.), Jalonix Μ-6100, Μ·8030, M-8060 (above, East Asia Synthesis) )), or may use other suitable items selected from other sales items. Further, when an ultraviolet curable resin is used as the active light-curing resin, the ultraviolet absorber may be contained in the ultraviolet curable resin composition so as not to hinder the photocuring of the ultraviolet curable resin. As the ultraviolet absorber, it is preferable that the absorption of the ultraviolet light having a wavelength of 3 to 70 nm or less and the liquid crystal display property are good, and the absorption of the visible light having a wavelength of 400 nm or more is less. Specific examples of the preferred ultraviolet absorber to be used in the present invention include an oxybenzophenone compound, a benzotriazine compound, a salicylate compound, a benzophenone compound, and a cyano group. An acrylate type compound, a triazine type compound, a nickel salt fault type compound, etc. are not limited to this. As the light source which can be used for the active light of the present invention, only the ultraviolet ray, the electric -28-200903021 sub-line, the γ-ray or the like can be activated to form a pattern-shaped active ray-curable resin, which is not particularly limited, and is an ultraviolet ray or an electron. The wire is preferred, and it is particularly preferable to obtain high-energy ultraviolet rays in a simple manner. As an ultraviolet light source for photopolymerizing an ultraviolet reactive compound, only a source of ultraviolet light can be generated. For example, a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a gas lamp, or the like can be used. Further, an ArF excimer laser, a KrF excimer laser, an excimer lamp, or a synchrotron radiation can be used. Irradiation conditions vary depending on the lamp. The amount of irradiation light is preferably lmJ/cm2 or more, more preferably 20 mJ/cm2 to l〇〇〇〇mJ/cm2, and particularly preferably 50 mJ/cm2 to 2000 mJ/cm2. The line can also be used in the same way. Examples of the electron beam include various electronic wires such as Cockroft-Walton type, Vandergrave type, resonance transformer type, insulated core transformer type, linear type, local frequency dynamometer (dynamitron type), and high frequency type. An electron beam having an energy of 5 〇 to 10 OOV', preferably 1 〇〇 to 300 keV, released by the accelerator. In the present invention, the concentration of oxygen in the ambient gas at the time of irradiation with active light is 1% or less, and particularly preferably 1% or less. This ambient gas is effective when introducing nitrogen or the like. Further, in the present invention, it is desired to efficiently perform a curing reaction of an active light ray, a substrate film which can be heated, and the like. The heating method is not particularly limited, and a heating plate, a heating roller, a heating head, or a method of blowing hot air on the surface of the ink may be used. Further, the back roll used for the reverse side of the base film of the flexographic printing portion may be used as a heating roll for continuous heating. -29- 200903021 As the heating temperature 'depending on the type of active light hardening used', it cannot be specified, but the substrate film does not produce a glaze; the temperature range is good, at 30 to 200 °C. Preferably, it is more than 1 2 0 °C 'extra good for 7 0~1 〇〇. Next, the thermosetting resin for the ink liquid group for a low refractive index layer of the present invention will be described. The thermosetting resin used in the present invention may, for example, be a vinegar resin, an epoxy resin, a vinyl ester resin, a phenol resin, a thermal imine resin, or a thermosetting polyimide. As the unsaturated polyester resin, for example, a phthalic acid isophthalic acid resin, a terephthalic acid resin, a bisphenol glycol maleic acid resin, dicyclopentadiene or a derivative thereof is introduced into the poly After the vinegar is composed of a low molecular weight, or a film-forming low styrene volatile resin is added, a thermoplastic resin (poly resin, styrene. butadiene copolymer, polystyrene, saturated low shrinkage resin, The unsaturated polyester is directly subjected to a reactive type wax obtained by copolymerizing chlorobridge acid or dibromoneopentyl glycol, a halide such as tetrabromobiguanide, and an alumina of a ruthenium compound, and the like. An additive type flame-retardant resin or polyoxyalkylene which is used as an additive, or a toughness (high modulus of elasticity, high elongation) of a toughness resin which is mixed or yttrium-nized. For example, a bisphenol A type aldoxime type 'bisphenol F type, a brominated bisphenol A type of glycidyl ether type, a glycidylamine type 'epoxypropyl ester type, and a ring type are mentioned. The thermal deformation of the lipid resin, etc. t is 50~ the unsaturated polyhardenability of the composition Resin, resin, acrylic acid unsaturated wax compound vinyl acetate polyester, etc.) bromination, or combination of chlorinated stone or strontium, high strength with polyurea, phenolic epoxy tree system for paint, hetero-30-200903021 ring The epoxy group is an epoxy group-based epoxy resin. The ethylene vinegar resin is, for example, an oligomer obtained by subjecting an ordinary epoxy resin to an unsaturated monobasic acid such as methacrylic acid to undergo a ring-opening addition reaction, and is dissolved in a monomer such as styrene. Further, there is a special type containing an ethylene monomer having a vinyl group or a branch and a vinyl group. The vinyl vinegar resin which is a epoxy propylene ether type epoxy resin, for example, has a double-decoration system, a phthalic acid-based phthalic acid-based or a brominated bisphenol-based product, etc. as a special vinyl ester resin, a vinyl urethane system and a trimeric isocyanide. An acid vinyl type, a branched chain acetyl ester type, or the like. The phenol resin is a resol type and a phenol type which can be obtained by condensing and polymerizing a phenol and a formaldehyde as a raw material. As the thermosetting polyimine resin, for example, there are maleic acid-based polyamines such as polymaleic anhydride imide, polyamine-bis-maleic acid imide, and bismaleimide-imide Propyl bisphenol_A resin, bis-maleic anhydride imide, triazine resin, etc., and Nadick acid-denatured polyimine, and acetylene-terminated polyimine. Further, one of the above-mentioned active light-curing resins can also be used as a thermosetting resin. Further, the ink liquid and the liquid composition formed by the thermosetting resin used in the present invention may be an antioxidant or an ultraviolet absorber described in an ink liquid composition containing an active light curing resin. The method of heating the thermosetting resin is not particularly limited, and a heating plate, a heating roll, a heating head, or a hot air blowing method can be preferably used. Further, the back roll ‘ used for film transport can be continuously heated as a heating roll. The heating temperature is different depending on the type of thermosetting resin to be used -31 - 200903021. It is not specified, but it does not cause thermal deformation of the transparent substrate. The stomach range is good, preferably 30 to 200 °C. More preferably 50~120 °C, especially good for 7〇~100. . . &lt;Fluorine-based resin&gt; In the present invention, it is preferred to use a #-ray ray-curable resin or a thermosetting resin having a refractive index of 1.45 or less in a film state, and the refractive index is! The range of .3〇~〗.40 is preferred. (Measurement of Refractive Index) The refractive index was measured by applying a liquid composition containing the above resin to a film obtained from a base film, and measuring it by a refractometer. For example, 'the liquid composition containing the resin is applied by a micro gravure coating machine' and dried at 90 ° C, and then the illuminance at the irradiation portion is 〇· 1 W/cm 2 'the irradiation amount is used as 〇·lJ using an ultraviolet lamp. /cm2 The coating layer was hardened to form a film having a thickness of 5 μm, and the refractive index was measured by an Abbe refractometer. In the compound of the active light-curable resin or the thermosetting resin, a fluorine-containing propylene-based monomer containing one or more fluorine atoms and one or more acryl fluorenyl groups and/or methacryl fluorenyl groups in the molecule A fluoropolymer or a fluorine-containing oligomer is preferred. It is preferred to use a compound represented by the following general formula (b) or general formula (c). -32- 200903021 【化2】 General formula (called R1 R2

h2c=c-c-〇-c-r 2 II IH2c=c-c-〇-c-r 2 II I

〇 R 一般式⑹〇 R General formula (6)

上述一般式(b)中’ R1表示氫原子、6 烷基、或者鹵素原子。Rf表示完全或者部分 、烯基、雜環、或芳基。R2及R3各獨立表 基、烯基、雜環基、芳基、或上述Rf所定 R2、R3 '及Rf各可具有氟原子以外之取代 R3、及Rf中任意二個以上的基可彼此互相 構。 又,上述一般式(M中’A表示完全 化之η價有機基。R4表示氫原子 '碳數1〜 鹵素原子。R4爲可具有氟原子以外之取代基 之整數。 作爲含氟原子之丙烯酸酯化合物的具體 出2,2,2-三氟乙基(甲基)丙烯酸酯、2,2,: (甲基)丙烯酸酯、ΙΗ,ΙΗ -全氟-η -丁基( 酯、1Η,1Η -全氟-η -戊基(甲基)丙烯酸酯 η -己基(甲基)丙烯酸酯、ΙΗ,ΙΗ -全氟- η-辛 烯酸酯、1Η,1Η -全氟·η_癸基(甲基)丙烯 -33- 吳數爲1〜3的 經氣化之院基 示氫原子、烷 義之基。R1、 基。又,R2 、 結合形成環結 或者部分經氟 3的烷基或者 。η表示2〜8 例,例如可舉 ,3,3 -五氟丙基 甲基)丙烯酸 、ΙΗ,ΙΗ·全氟-基(甲基)丙 酸酯、1 Η , 1 Η - 200903021 全氟-η-月桂基(甲基)丙烯酸酯、ΙΗ,ΐΗ -全氟異丁基( 甲基)丙稀酸醋、ΙΗ,ΙΗ -全氟異辛基(甲基)丙烯酸酯、 1Η,1Η-全氟異月桂基(甲基)丙烯酸酯、2,2,3,3_四氟丙 基(甲基)丙烯酸酯' 1Η,1Η,5Η_全氟戊基(甲基)丙烯 酸酯、111,1}1,711_全氟庚基(甲基)丙烯酸酯、^,11^,911-全氟壬基(甲基)丙烯酸酯、ΙΗ,ΙΗ,ΙΙΗ-全氟十一烷基( 甲基)丙烯酸酯、3,3,3 -三氟丙基(甲基)丙烯酸酯、 3,3,4,4,4-五氟丁基(甲基)丙烯酸酯、2-(全氟-11_丙基 )乙基(甲基)丙烯酸酯'2·(全氟·η· 丁基)乙基(甲基 )丙烯酸酯、2-(全氟-η_己基)乙基(甲基)丙烯酸酯、 2-(全氟- η-辛基)乙基(甲基)丙烯酸酯、2-(全氟-η-癸基)乙基(甲基)丙烯酸酯、2-(全氟異丁基)乙基( 甲基)丙烯酸酯、2·(全氟異辛基)乙基(甲基)丙烯酸 酯、3,3,4,4-四氟丁基(甲基)丙烯酸酯、1Η,1Η,6Η-全氟 己基(甲基)丙烯酸酯、1Η,1Η,8Η-全氟辛基(甲基)丙 烯酸酯、ΙΗ,ΙΗ,ΙΟΗ-全氟癸基(甲基)丙烯酸酯、 ΙΗ,ΙΗ,12Η-全氟月桂基(甲基)丙烯酸酯、季戊四醇二丙 烯酸酯二氟丁酸酯、迪芬沙 〇Ρ(大日本墨水化學工業( 股)製)'歐普斯達JN ( JSR (股)製)、歐普斯達JM (JSR (股)製)、萊特酯M-3F(共榮公司化學(股)製 )、萊特酯FM-108(共榮公司化學(股)製)等。且’ 其中所使用的含氟原子之丙烯酸酯化合物可僅使用1種類 ,但視必要可任意比率下混合2種類以上之含氟原子的丙 烯酸酯化合物後使用。 -34- 200903021 本發明所使用的低折射率層用墨水液組成物含有全體 下5〜〗00質量%之固體成分。較佳爲15〜85質量1M),更 佳爲3 0〜7 0質量%。 本發明的低折射率層用墨水液組成物之黏度於2 5 °C中 爲2〜15mP.s,更佳爲5〜lOmP.s。黏度未達2mP.s時 ,黏度過低而難以得到所望形狀之圖形,超過1 5 mP · s時 ,因與墨水之流動性變差,而降低墨水之射出性。 低折射率層用墨水液組成物之黏度,可藉由所使用的 樹脂、其他添加劑、溶劑等種類或固體成分比率而進行調 整,特別爲調整樹脂之種類與量、及後述之溶劑的種類與 量爲佳。 墨水的黏度之測定可由Jis Z 8 809所規定之黏度計校 正用標準液下進行檢測者即可,並無特別限定,可使用轉 動式、振動式或細管式之黏度計。作爲黏度計,可由 Saybolt黏度計、Redwood黏度計等進行測定,例如可舉 出TOKIMEC INC製、圓錐平板型E型黏度計、東機產業 公司製的E Type Viscometer (轉動黏度計)、東京計器公 司製之B型黏度計BL、山一電機公司製之FVM-80A、 Nametore工業公司製之 Viscoliner、山一電機公司製之 VISCO MATE MODEL VM-1G 等。 (接觸角) 本發明的低折射率層用墨水液與底層之後述防眩層或 其他層之接觸角(Θ)爲45〜70°時,可得到本發明之效果 -35- 200903021 而較佳,較佳爲5 0〜6 0°。7 5。以上或4 0°以下時,墨水液 滴之形狀無法成爲一定。 欲調整低折射率層用墨水液之表面張力,聚矽氧烷油 、變性聚矽氧烷油、聚矽氧烷系界面活性劑、氟系界面活 性劑、氟系樹脂、氟系寡聚物、氟變性聚矽氧烷油、氟系 矽烷偶合劑等活性劑以〇質量。/。以上5質量%以下爲佳。 添加量過多時’凸部高度會過低,因撥水撥油效果使得低 折射率層無法塗佈於防眩層之凹凸上。界面活性劑因取決 於墨水組成、溶劑組成、底基材表面能量,故並非必須添 加。以下對於本發明所使用的界面活性劑做說明。 本發明所使用的聚矽氧烷油依據結合於矽原子之有機 基種類,可分爲純聚矽氧烷油與變性聚矽氧烷油。所謂純 聚砂氧烷油爲’將甲基、苯基、氫原子作爲取代基而結合 者。所謂變性聚矽氧烷油爲,具有自純聚矽氧院油經二次 衍生的構成部分者。一方面亦可由聚矽氧烷油之反應性來 做分類。將此歸納如下。 聚矽氧烷油 1 ·純聚矽氧烷油 1- 1 ·非反應性聚砂氧丨兀油· 一甲基、甲基苯基取代等 1 - 2 .反應性聚矽氧烷油:甲基氫取代等 2 .變性聚矽氧烷油 於二甲基聚矽氧烷油導入種種有機基所生成者爲變性 聚矽氧烷油 2- 1 .非反應性聚矽氧烷油:烷基 '烷基/芳院基、院基 -36- 200903021 /聚酿、聚醚、闻級脂肪酸醋取代等、 烷基/方烷基變性聚矽氧烷油爲,將二甲基聚矽 油之甲基的一部份取代爲長鏈烷基或苯基烷基之聚矽 油、 聚醚變性聚矽氧烷油爲,將親水性聚氧伸烷基導 疏水性二甲基聚砂氧烷之聚矽氧烷系高分子界面活性】 高級脂肪酸變性聚矽氧烷油爲,將二甲基聚矽氧 之甲基的一部份取代爲高級脂肪酸酯之聚矽氧烷油、 胺基變性聚矽氧烷油爲,具有將聚矽氧烷油之甲 一部份取代爲胺基烷基的結構之聚砂氧院油、 環氧基變性聚矽氧烷油爲,具有將聚矽氧烷油之 的一部份取代爲含有環氧基之烷基的結構之聚矽氧烷; 羧基變性或醇類變性聚矽氧烷油爲,具有將聚矽 油之甲基的一部份取代爲含有羧基或羥基之烷基的結 聚矽氧烷油 2 - 2 ·反應性聚矽氧烷油:胺基、環氧基、羧基、 取代等 彼等中,較佳爲添加聚醚變性聚矽氧烷油。聚醚 聚矽氧烷油之數平均分子量,例如爲1000〜100000, 爲2000〜50000,數平均分子量未達1000時,塗膜之 性會降低,相反地若數平均分子量超過100000時, 塗膜表面不容易外滲之傾向。 作爲具體商品,可舉出日本uni car (股)公司的 、L-9300 、 FZ-3704 、 FZ-3703 、 FZ-3720 ' FZ-3786 、 氧烷 氧烷 入於 flj、 烷油 基的 甲基 由、 氧烷 構之 醇類 變性 較佳 乾燥 有著 L-45 FZ- -37- 200903021 3501 、 FZ-3504 、 FZ-3508 、 FZ-3705 、 FZ-3707 、 FZ-3710 、FZ-3750、 FZ-3760、 FZ-3785、 FZ-3785、 Y-7499 &gt; 信越 化學公司的 KF96L、 KF96、 KF96H、 KF99、 KF54、 KF965 、KF968 、 KF56 、 KF995 、 KF3 5 1 、 KF3 5 2 、 KF3 5 3 、 KF354 、 KF355 、 KF615 、 KF618 、 KF945 、 KF6004 、 FL100 等。 本發明所使用的聚矽氧烷界面活性劑可使用具有將聚 矽氧烷油之甲基的一部份取代爲親水性基者。取代位置有 聚矽氧烷油之支鏈、兩末端、單末端、兩末端支鏈等。作 爲親水性基有聚醚、聚甘油、吡咯烷酮、甜菜鹼、硫酸鹽 、磷酸鹽、4級鹽等。 非離子界面活性劑爲,將水溶液中不具有解離爲離子 之基的界面活性劑作爲總稱,其爲具有疏水基以外作爲親 水性基之多元醇類的羥基,又具有將聚氧伸烷基鏈(聚環 氧乙烷)等作爲親水基者。親水性爲隨著醇類性羥基之數 增多,又隨著聚氧伸烷基鏈(聚環氧乙烷鏈)增長而變強 。本發明所使用的非離子界面活性劑爲具有作爲疏水基之 疏水基使用二甲基聚矽氧烷,親水基使用由聚氧伸烷 基所構成之非離子界面活性劑時,可提供低折射率層之不 均或膜表面之防污性。此可考慮爲由聚甲基矽氧烷所成之 疏水基配置於表面而形成不容易弄髒的膜表面。此爲使用 其他界面活性劑而無法得到的效果。 作爲這些非離子活性劑之具體例,例如可舉出日本 -38- 200903021 unicar (股)製、聚矽氧烷界面活性劑311^\¥£丁1^-77、卩 720 ' L-7001 ' L-7002 ' L-7604 &gt; Y-7006 &gt; FZ-2101 &gt; FZ-2104 、 FZ-2105 、 FZ-2110 、 FZ-2118 、 FZ-2120 、 FZ-2122 、FZ-2123、FZ-2130、FZ-2154、FZ-2161、FZ-2162、FZ-2163' FZ-2164、 FZ-2166、 FZ-2191 等。 又,可舉出 SUPERSILWET SS-2801、SS-2802、SS-2803 、 SS-2804 、 SS-2805 等 ° 又’這些疏水基爲二甲基聚矽氧烷,親水基爲由聚氧 伸烷基所構成之非離子系的界面活性劑之較佳結構,以二 甲基聚矽氧烷結構部分與聚氧伸烷基鏈成交互重複結合之 直鏈狀嵌段共聚物爲佳。主鏈骨架之鏈長較長,且爲直鏈 狀結構故優良。親水基與疏水基爲交互重複嵌段共聚物, 故可考慮爲二氧化矽微粒子表面,對於1個活性劑分子於 多處進行吸附至如覆蓋此一般。 作爲這些具體例,例如可舉出日本unicar (股)製、 聚矽氧烷界面活性劑ABN SILWET FZ-2203、FZ.2207、 FZ-2208 等。 這些聚矽氧烷油或聚矽氧烷界面活性劑中,具有聚酸 基者爲佳。 接觸角之測定方法如圖5所示。放入未圖示之注射器 狀液滴調整器所測定之水溶液試料。如(a )所示,可改 變上下左右位置之未圖示的試料台上載置將表面調整爲水 平之固體試料,於光學鏡下觀察該固體試料表面。於光學 鏡裝上可轉動的轉動交叉。配置於固體試料上面的液滴調 -39- 200903021 整器之針頭做出液滴。 所不,提局固體試料表面,將液滴接 其次’如(b)所示 。此後’如(C )所示, ’將固體試料下In the above general formula (b), 'R1' represents a hydrogen atom, a 6-alkyl group or a halogen atom. Rf represents a complete or partial, alkenyl, heterocyclic, or aryl group. Each of R2 and R3 independently of a group, an alkenyl group, a heterocyclic group, an aryl group, or each of R, R3' and Rf defined by Rf may have a substituent other than a fluorine atom, R3, and any two or more of Rf may be mutually mutually Structure. Further, in the above general formula (wherein 'A represents a completely completed η-valent organic group. R4 represents a hydrogen atom' carbon number 1 to a halogen atom. R4 is an integer which may have a substituent other than a fluorine atom. Specific ester compounds are 2,2,2-trifluoroethyl (meth) acrylate, 2, 2, : (meth) acrylate, hydrazine, hydrazine - perfluoro-η-butyl (ester, 1 hydrazine, 1Η-Perfluoro-η-pentyl (meth) acrylate η-hexyl (meth) acrylate, hydrazine, fluorene-perfluoro- η-octenoate, 1 Η, 1 Η - perfluoro·η_ fluorenyl (Meth)propylene-33- a vaporized group having a valence of 1 to 3, wherein the hydrogen atom or the alkyl group is represented by R1, R1, R2, or a ring-forming or partially fluorine-containing alkyl group or η represents 2 to 8 cases, for example, 3,3-pentafluoropropylmethyl)acrylic acid, hydrazine, fluorene-perfluoro-yl (meth)propionate, 1 Η , 1 Η - 200903021 perfluoro -η-lauryl (meth) acrylate, hydrazine, hydrazine - perfluoroisobutyl (meth) acrylate vinegar, hydrazine, hydrazine - perfluoroisooctyl (meth) acrylate, 1 Η, 1 Η - Perfluoroisolauryl (Meth) acrylate, 2,2,3,3_tetrafluoropropyl (meth) acrylate ' 1 Η, 1 Η, 5 Η _ perfluoropentyl (meth) acrylate, 111, 1} 1, 711 _Perfluoroheptyl (meth) acrylate, ^, 11 ^, 911-perfluorodecyl (meth) acrylate, hydrazine, hydrazine, fluorene-perfluoroundecyl (meth) acrylate, 3 ,3,3-trifluoropropyl (meth) acrylate, 3,3,4,4,4-pentafluorobutyl (meth) acrylate, 2-(perfluoro-11-propyl)ethyl (Meth)acrylate '2·(perfluoro·η·butyl)ethyl (meth)acrylate, 2-(perfluoro-η-hexyl)ethyl (meth)acrylate, 2-(all) Fluorine-n-octyl)ethyl (meth) acrylate, 2-(perfluoro-η-mercapto)ethyl (meth) acrylate, 2-(perfluoroisobutyl)ethyl (methyl Acrylate, 2·(perfluoroisooctyl)ethyl (meth) acrylate, 3,3,4,4-tetrafluorobutyl (meth) acrylate, 1 Η, 1 Η, 6 Η-perfluorohexyl (Meth) acrylate, 1 Η, 1 Η, 8 Η-perfluorooctyl (meth) acrylate, hydrazine, hydrazine, fluorene-perfluorodecyl (meth) acrylate, hydrazine , ΙΗ, 12Η-perfluoro lauryl (meth) acrylate, pentaerythritol diacrylate difluorobutyrate, diphene samarium (Daily Ink Chemical Industry Co., Ltd.) 'Opsta JN (JSR ( Co., Ltd.), Opsta JM (JSR (share) system), Wright ester M-3F (Kyoei Chemical Co., Ltd.), Wright ester FM-108 (Kyoei Chemical Co., Ltd.). Further, the fluorinated atomic acrylate compound to be used may be used alone, but if necessary, two or more kinds of fluorine atom-containing acrylate compounds may be mixed at an arbitrary ratio. -34- 200903021 The ink composition for a low refractive index layer used in the present invention contains a total of 5 to 00% by mass of a solid component. It is preferably 15 to 85 mass 1 M), more preferably 30 to 70 mass%. The viscosity of the ink composition for a low refractive index layer of the present invention is 2 to 15 mP.s, more preferably 5 to 10 mP.s at 25 °C. When the viscosity is less than 2 mP.s, the viscosity is too low and it is difficult to obtain a pattern of a desired shape. When the viscosity exceeds 15 mP·s, the fluidity of the ink is deteriorated, and the ink emission property is lowered. The viscosity of the ink composition for the low refractive index layer can be adjusted by the type of resin, other additives, solvent, or the like, or the ratio of the solid components, in particular, the type and amount of the resin, and the type of the solvent to be described later. The amount is better. The viscosity of the ink can be measured by using a standard solution for viscosity meter calibration as defined by Jis Z 8 809, and is not particularly limited. A vibrating type, a vibrating type or a thin tube type viscometer can be used. The viscometer can be measured by a Saybolt viscometer, a Redwood viscometer, etc., for example, a TOKIMEC INC, a conical flat type E-type viscometer, an E Type Viscometer manufactured by Toki Sangyo Co., Ltd., and a Tokyo Metrology Co., Ltd. The B-type viscometer BL, the FVM-80A manufactured by Yamaichi Electric Co., Ltd., the Viscoliner manufactured by Nametore Industries Co., Ltd., and the VISCO MATE MODEL VM-1G manufactured by Yamaichi Electric Co., Ltd. (Contact angle) When the contact angle (Θ) of the ink layer for a low refractive index layer of the present invention with the antiglare layer or other layer described later is 45 to 70°, the effect of the present invention can be obtained - 35 to 200903021. Preferably, it is 5 0~6 0°. 7 5. Above or below 40°, the shape of the ink droplets cannot be made constant. To adjust the surface tension of the ink liquid for the low refractive index layer, polyoxyalkylene oil, denatured polyoxyalkylene oil, polyoxyalkylene surfactant, fluorine surfactant, fluorine resin, fluorine oligomer The active agent such as fluorine-denatured polysiloxane oil or fluorine-based decane coupling agent is in the form of ruthenium. /. The above 5 mass% or less is preferred. When the amount of addition is too large, the height of the convex portion is too low, and the low refractive index layer cannot be applied to the unevenness of the antiglare layer due to the water repellency effect. The surfactant does not have to be added depending on the ink composition, solvent composition, and surface energy of the substrate. The surfactant used in the present invention will be described below. The polyoxyalkylene oil used in the present invention can be classified into a pure polydecane oil and a denatured polysiloxane oil depending on the kind of the organic group bonded to the ruthenium atom. The pure polysiloxane oil is a combination of a methyl group, a phenyl group and a hydrogen atom as a substituent. The so-called denatured polyoxyalkylene oil is a component having a secondary derivatization of pure polyxanthene oil. On the one hand, it can also be classified by the reactivity of polyoxyalkylene oil. This is summarized as follows. Polyoxyalkylene oil 1 ·Pure polyoxane oil 1- 1 ·Non-reactive polysapphire oil · Monomethyl, methylphenyl substitution, etc. 1 - 2. Reactive polyoxane oil: A Substituted hydrogen substitution, etc. 2. Derivatized polyoxyalkylene oil is introduced into various organic groups in dimethyl polysiloxane oil. The product is denatured polyoxyalkylene oil 2- 1 . Non-reactive polyoxane oil: alkyl 'Alkyl/fangyuan base, yard base-36-200903021/poly brewing, polyether, sulphuric acid vinegar substitution, etc., alkyl/cylylene modified polyoxyalkylene oil, dimethyl phthalate A part of the group is substituted with a long-chain alkyl or phenylalkyl polyanthracene oil, a polyether-modified polyoxyalkylene oil, and a hydrophilic polyoxyalkylene alkyl-conductive hydrophobic dimethyl polysiloxane.矽 系 系 高分子 】 】 】 】 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级 高级The phthalic acid oil is a polysalt oil having a structure in which a part of a polyoxyalkylene oil is substituted with an aminoalkyl group, and an epoxy-modified polysiloxane oil having a polyfluorene a polyoxane having a structure in which a part of the alkane oil is substituted with an alkyl group having an epoxy group; a carboxyl group-denatured or alcohol-modified polysiloxane oil having a part of a methyl group of the polyanthracene oil substituted with A polyoxyalkylene oil containing a carboxyl group or a hydroxyl group; 2 - 2 - a reactive polyoxyalkylene oil: an amine group, an epoxy group, a carboxyl group, a substituent, etc., preferably a polyether modified polyfluorene Oxygen oil. The number average molecular weight of the polyether polyoxyalkylene oil is, for example, 1000 to 100,000, 2000 to 50000, and the number average molecular weight is less than 1000, the film properties are lowered, and conversely, if the number average molecular weight exceeds 100,000, the coating film The surface is not prone to extravasation. Specific examples of the products include L-9300, FZ-3704, FZ-3703, FZ-3720 'FZ-3786, and oxyalkyloxane in the flj, alkyl oil-based methyl group of Japan uni car Co., Ltd. Alcohol degeneration by oxyalkylene is preferably dried with L-45 FZ--37-200903021 3501, FZ-3504, FZ-3508, FZ-3705, FZ-3707, FZ-3710, FZ-3750, FZ- 3760, FZ-3785, FZ-3785, Y-7499 &gt; Shin-Etsu Chemical Co., Ltd. KF96L, KF96, KF96H, KF99, KF54, KF965, KF968, KF56, KF995, KF3 5 1 , KF3 5 2 , KF3 5 3 , KF354 , KF355, KF615, KF618, KF945, KF6004, FL100, etc. The polyoxyalkylene surfactant used in the present invention may be one which has a part of a methyl group of a polysiloxane oil substituted with a hydrophilic group. The substitution sites include a branched chain of polyoxyalkylene oil, two ends, a single terminal, and two terminal branches. As the hydrophilic group, there are a polyether, a polyglycerin, a pyrrolidone, a betaine, a sulfate, a phosphate, a 4-grade salt and the like. The nonionic surfactant is a general term for a surfactant which does not have a group which dissociates into an ion in an aqueous solution, and is a hydroxyl group of a polyol having a hydrophilic group other than a hydrophobic group, and has a polyoxyalkylene chain. (Polyethylene oxide) or the like as a hydrophilic group. The hydrophilicity increases as the number of alcoholic hydroxyl groups increases, and as the polyoxyalkylene chain (polyethylene oxide chain) grows. The nonionic surfactant used in the present invention is a nonionic surfactant having a hydrophobic group as a hydrophobic group, and a low refractive index when a hydrophilic group is used as a nonionic surfactant composed of a polyoxyalkylene group. Unevenness of the layer or antifouling of the film surface. This is considered to be that the hydrophobic group formed of polymethyl siloxane is disposed on the surface to form a film surface which is not easily soiled. This is an effect that cannot be obtained by using other surfactants. Specific examples of such a nonionic active agent include, for example, Japanese-38-200903021 unicar (shares), polyoxyalkylene surfactants 311^\¥£丁1^-77, 卩720 'L-7001' L-7002 ' L-7604 &gt; Y-7006 &gt; FZ-2101 &gt; FZ-2104 , FZ-2105 , FZ-2110 , FZ-2118 , FZ-2120 , FZ-2122 , FZ-2123 , FZ-2130 , FZ-2154, FZ-2161, FZ-2162, FZ-2163' FZ-2164, FZ-2166, FZ-2191, etc. Further, examples include SUPERSILWET SS-2801, SS-2802, SS-2803, SS-2804, SS-2805, etc., and these hydrophobic groups are dimethyl polyoxyalkylene, and the hydrophilic group is a polyoxyalkylene group. A preferred structure of the nonionic surfactant is preferably a linear block copolymer in which a dimethyl polyoxyalkylene moiety and a polyoxyalkylene chain are alternately and repeatedly bonded. The chain skeleton of the main chain has a long chain length and is excellent in a linear structure. The hydrophilic group and the hydrophobic group are mutually repeating block copolymers, so that it can be considered as the surface of the cerium oxide microparticles, and adsorption is carried out at a plurality of places for one active agent molecule as it is covered. As such a specific example, a unicar (manufactured by Japan), a polyoxyalkylene surfactant ABN SILWET FZ-2203, FZ.2207, FZ-2208, and the like can be given. Among these polyoxyalkylene oils or polyoxyalkylene surfactants, those having a polyacid base are preferred. The method of measuring the contact angle is shown in FIG. The aqueous solution sample measured by a syringe-shaped droplet adjuster (not shown) was placed. As shown in (a), a solid sample having a surface adjusted to a level was placed on a sample stage (not shown) which can be changed from the top, bottom, left, and right positions, and the surface of the solid sample was observed under an optical microscope. Rotating and rotating on the optical mirror. The droplets placed on the solid sample are adjusted to -39- 200903021. No, pick up the surface of the solid sample and connect the droplets to the next one as shown in (b). Thereafter, as shown in (C), 'under the solid sample

觸於固體試料表面。此 降至原先位置, 滴至轉動交叉之中心。 後,如(d )所不,轉動轉動交叉下,做成卞 固體試料表面之連接線,該角度爲Θ。該θ爲接觸角Touch the surface of the solid sample. This drops to the original position and drops to the center of the turning intersection. Thereafter, as shown in (d), the rotation is crossed and crossed to form a connecting line of the surface of the solid sample, which is Θ. The θ is the contact angle

進行(e )〜(g )所示之接觸角讀取方法。 爲準,The contact angle reading method shown in (e) to (g) is performed. Prevail,

使交叉與液滴兩側呈左右對稱而銜接。其次,如(丨)所 不,提高試料台,將交叉的中心調整至液滴之頂點。然後 如(g )所示,液滴頂點與固體試料與液滴銜接點重疊 測定該延長線之角度。該角度爲接觸角Θ之— 千,即θ/ο 。本發明之接觸角可使用DropMaster (協和界面科與 )製)進行測定。 (溶劑) 作爲可使用於本發明所使用的低折射率層用墨水液,組 成物的溶劑,例如可舉出甲醇、乙醇、;1 -丙醇、2 _ I J醇、 丁醇等醇類;丙酮、甲基乙基酮、環己酮等酮類·一 一、’一丙酮 醇類等酮醇類;苯、甲苯 '二甲苯等的芳香族烴類;乙〜 醇、丙二醇、己二醇二醇等二醇類;乙基溶纖劑、 J j基溶 纖劑、乙基卡必醇'丁基卡必醇、二乙基溶纖劑、一The intersection is connected to the sides of the droplet in a bilaterally symmetrical manner. Secondly, if (丨) does not, raise the sample table and adjust the center of the intersection to the apex of the droplet. Then, as shown in (g), the apex of the droplet overlaps with the solid sample and the droplet junction to determine the angle of the extension line. This angle is the contact angle — - thousand, which is θ / ο. The contact angle of the present invention can be measured using DropMaster (Concord Interface Division). (Solvent) Examples of the solvent which can be used in the ink liquid for a low refractive index layer used in the present invention include methanol, ethanol, and alcohols such as 1-propanol, 2_IJ alcohol, and butanol; Ketones such as acetone, methyl ethyl ketone, and cyclohexanone, ketone alcohols such as monoacetone, aromatic hydrocarbons such as benzene and toluene'xylene; and ethyl alcohol, propylene glycol, and hexanediol Glycols such as diols; ethyl cellosolve, J j-based cellosolve, ethyl carbitol 'butyl carbitol, diethyl cellosolve, one

-- C I -40- R) '0-(CxH2x-0)n-R2 芳基、碳數】〜6的 200903021 卡必醇、丙二醇單甲醚等二醇醚類;N -甲基吐| 甲基甲醯胺、乳酸甲基、乳酸乙酯、乙酸甲_ 、乙酸戊酯等酯類;二甲醚、二乙醚等醚類' 可單獨或混合2種以上使用。 本發明所使用的低折射率層用墨水液組员 溶劑中以至少1種以上之沸點爲1 4 0〜2 5 0 °C 爲1〜1 5mPa .s之溶劑,其含量爲除固體成夭 的60質量%以上爲佳。較佳爲至少1種以上㈢ 〜230°C、25°C之黏度爲1〜i〇mpa.s之溶劑 質量%以上爲佳。此理由爲,期望上述低折象 液組成物所含有的溶劑於轉移印刷、或著落爸 圖形形狀的程度下’可快速揮發、乾燥,但老 圍時,與底部之密著性會變差,且所形成之低 易產生乾燥不均。 本發明所謂的沸點爲,1氣壓,即丨.0 i 3 壓力下的沸點。沸點之測定可適用公知技術, 體的情況可參考化學手冊等文獻中所記載的値 滿足上述沸點、黏度之溶劑中,亦以下 )所示化合物爲佳。 —般式(3 ) R丨、R2 :氫原子 烷基、烷基羰基。煙鏈可爲直鏈或支鏈。但 少1個爲氫原子以外之取代基。 η : 1〜3的整數 咯烷酮、二 、乙酸乙酯 水等,這些 物中,上述 25°C之黏度 •以外之質量 i]沸點爲18 0 ,含量爲7〇 率層用墨水 可維持所望 超過上述範 ,折射率層容 X105N/m2 之 除此以外單 〇 Φ —般式(3 :基、烷氧基 Ri、R2的至 -41 - 200903021 χ : 2〜4的整數 更佳爲x = 2或3、R2爲乙醯基之化合物。 本發明之墨水所使用的較佳溶劑中,具體可舉出下述 溶劑,但未特別限定。 [表1] 溶劑種類 黏度 7? (mPa · s) 沸點(°c ) 異丁酸 1.2 155 環己酮 1.8 156 N-甲基乙醇胺別名:2-甲基胺乙醇 10.0 159 4-羥基-4-甲基-2-戊酮 2.5 168 N-甲基甲醯胺 1.7 180 乙醯乙酸乙酯 1.5 181 乳酸丁酯 3.2 185 二甲基亞碾 2.0 189 1-辛醇 8.0 195 N-甲基吡咯烷酮 1.7 202 r -丁內酯 1.7 204 苯甲醇 5.0 205 N_甲基乙醯胺 2.5 206 3,5,5-三甲基-2-環己烯-1-酮別名:異佛爾酮 2.4 213 η-壬醇 13.0 214 1,3-二甲基-2-咪唑二酮 1.9 226 3-二丁基胺乙醇 6.0 229 2-吡咯烷酮 13.3 245 且,上述一般式(3)所示化合物中,具體可舉出下 述溶劑,但未特別限定。 -42 - 200903021 [表2] 一般式(1)表化合物 11 X R1 R2 黏度7? (m P a · s ) 沸點 (°c ) 乙二醇單乙醚乙酸酯 別名:乙酸2-乙氧基乙酯 1 2 c2h5 COCH3 1.0 156 乙二醇二乙酸酯 別名:二乙酸乙烯酯 1 2 coch3 COCH3 2.8 190 乙二醇單丁醚乙酸酯 別名:乙酸2-n-丁氧基乙酯 1 2 C4H9 COCH3 1.5 192 二乙二醇單丁醚乙酸酯 別名:乙酸2-(2·η-丁氧基乙氧基)乙酯 2 2 C4H9 COCH3 3.0 247 乙二醇單丁醚 1 2 C4H9 H 3.2 171 二乙二醇乙基甲基醚 2 2 c2h5 ch3 1.0 179 二乙二醇二乙基醚 2 2 C2H5 C2H5 1.2 188 二乙二醇單甲基醚 2 2 ch3 H 3.5 194 二乙二醇單乙基醚 2 2 C2H5 H 3.7 202 二乙二醇單丁基醚 2 2 C4H9 H 6.0 231 二乙二醇單甲基醚 3 2 ch3 H 7.0 245 丙二醇單甲基醚乙酸酯 1 3 ch3 COCH3 1.1 146 二丙二醇單甲基醚 2 3 ch3 H 3.3 189 三丙二醇單甲基醚 3 3 ch3 H 6.2 243 上述以外亦可舉出乙二醇單異丙醚、乙二醇單-t-丁醚 、二乙二醇單丙醚、二乙二醇單異丙醚、二乙二醇單-t-丁 醚、丙二醇單乙醚、丙二醇單丙醚、丙二醇單異丙醚、丙 二醇單丁醚、丙二醇單-t-丁醚、二丙二醇單乙醚、二丙二 醇單丙醚、二丙二醇單異丙醚、二丙二醇單丁醚、乙二醇 單異丙醚乙酸酯、乙二醇單-t-丁醚乙酸酯、二乙二醇單甲 醚乙酸酯、二乙二醇單丙醚乙酸酯、二乙二醇單異丙醚乙 酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚乙酸酯、丙二 -43 - 200903021 醇單異丙醚乙酸醋、丙二醇單丁醚乙酸酯、丙二醇單_t_丁 醚乙酸酯、二丙二醇單乙醚 '二丙二醇單丙醚 '二丙二醇 單異丙醚、乙二醇單甲氧基甲醚、二乙二醇單乙醚乙酸酯 (別名:乙酸2-(乙氧基乙氧基)乙基)、三乙二醇二甲 醚 '二乙二醇二乙酸酯、丙二醇二乙酸酯(別名:丨,2-二 乙酸基丙烷)、一丙二醇二甲醚、二丙二醇單甲醚乙酸酯 等。 适些丨谷劑中可混口沸點、黏度相異的溶劑,而適當 變更該比率下’可控制低折射率層之膜厚。 各溶劑之黏度可使用則述biscomend VM-1G(山一電 機(股)製)進行測定。 低折射率層用墨水液經塗佈後,以紫外線或電子線等 活性光線進行照射 '或藉由加熱處理使其硬化,但以含有 前述熱硬化性樹脂或活性光線硬化型樹脂之墨水作爲微小 液滴而著落於基材後’將該液滴馬上加熱或以活性光線照 射使其固化爲佳。 所謂馬上進行前述加熱或者活性光線之照射爲,墨水 於基材著落後,馬上〜5分鐘以内進行加熱或者照射而言 ,使低折射率層之膜厚成均一 ’欲使於防眩層之凸部分所 形成之低折射率層膜厚hd 1 '與於凹部分所形成之低折射 率層膜厚hd2的比率滿足前述關係式時,進行〇.1秒〜1 分鐘以内爲佳,進行0.1秒〜3 0秒以内爲較佳’進行〇 · 1 秒〜1秒以内爲特佳。 本發明中,可於塗佈於透明基材上之防眩層呈未硬化 -44 - 200903021 狀態、或完全硬化後之任一時期,可藉由噴射方式落下形 成低折射率層之墨水液滴。 防眩層爲半處理(半硬化狀態)時,使墨水液滴著落 後形成低折射率層時,不僅生產性優良,且可提高防眩層 與低折射率層之密著性故較佳。 換言之,本發明之低折射率層爲,不損害表現防眩層 之防眩性的微細凹凸形狀下可賦予表面凹凸形狀。該低折 射率層表面之〗I S B 0 6 0 1所規定的算術平均表面粗度R a 以0_05μηι〜Ι.ΟΟμηι之範圍爲佳,較佳爲Ο.ΙΟμηι〜0·50μηι 之範圍。 《防眩層》 本發明之防眩層爲,藉由模糊反射於表面之像輪廓而 降低反射像之辨識性,可減低如液晶顯示器、有機E L顯 示器、電漿顯示器之畫像顯示裝置等使用時反射像的映出 。藉由於薄膜表面設置適當的凹凸,可持有此種性質。 作爲如此凹凸之形成方法,可選擇對透明基材之加工 、對設置於透明基材上之硬塗佈層的加工、對塗佈防反射 層後之防反射薄膜的加工等,但對防反射薄膜之加工’因 凹凸形狀之凸部會突破防反射層,使得防反射層變形而損 害反射防止效果,故本發明中對於透明基材之加工、對硬 塗佈層之加工爲佳,本發明中以對硬塗佈層之加工爲較佳 〇 作爲本發明所謂的凹凸結構’其可舉出選自直圓錐、 -45- 200903021 斜圓錐、角錐、斜角錐、楔型、凸多角體、半球狀等之結 構,以及具有這些部分形狀之結構。且,半球狀其表面形 狀並非必須爲真球形狀,可橢圓體形狀、或經變形之凸曲 面形狀。又,凹凸形狀之稜線成線狀延伸之棱鏡形狀、 lentlcular透鏡形狀、菲湼耳透鏡形狀。自其稜線至谷線 之斜面可爲平面狀、曲面狀、或者兩者之複合形狀。 硬塗佈層或者後述之透明基材的表面上形成凹凸形狀 之方法’例如可舉出下述方法等。 (1 )於輥或原盤上形成作爲目的形狀之負型後,於 滾邊賦予形狀之方法。 (2 )於輥或原盤上形成作爲目的形狀之負型後,將 熱硬化性樹脂塡充於負型,經加熱硬化後自負型剝離之方 法。 C 3 )於輥或原盤上形成作爲目的形狀之負型後,塗 佈紫外線或電子線硬化樹脂,於凹部塡充後,介著樹脂液 於凹版上被覆透明支持體下照射紫外線或電子線,將使其 硬化之樹脂與其所黏著的透明支持體自負型剝離之方法。 (4 )將作爲目的形狀之負型於流延輸送帶形成後, 於澆鑄時賦予作爲目的之形狀的溶劑澆鑄法。 (5 )將藉由光或加熱使其硬化的樹脂,於透明基板 上進行凸版印刷,經光或加熱而硬化之形成凹凸的方法。 (6 )將於透明支持體表面上經光或加熱後硬化的樹 脂’藉由噴射方式進行印刷、藉由光或加熱使其硬化,使 透明支持體表面呈凹凸形狀之方法。 -46- 200903021 (7 )將表面以工作機械等進行切削加工之方法。 (8 )將球、多角體等各種形狀之粒子,於透明支持 體表面上使其壓入至一半埋入的程度而成爲一體化,使透 明支持體表面呈凹凸形狀之方法。 (9 )將球、多角體等各種形狀之微粒子分散於少量 膠黏劑,塗佈於透明支持體表面,使透明支持體表面呈凹 凸形狀之方法。 (1 0 )於透明支持體表面上塗佈膠黏劑,其上散佈球 、多角體等各種形狀之粒子,使透明支持體表面呈凹凸形 狀之方法。 本發明中,以(6 )及(9 )之對硬塗佈層的凹凸形狀 作成方法爲佳。 首先對於構成本發明之防反射薄膜的防眩層一例之( 9 )凹凸形狀的作成方法做說明。 &lt;使用微粒子之防眩層的作成&gt; 本發明所使用的防眩層爲’於硬塗佈層含有微粒子下 形成微細凹凸形狀,將如下述之平均粒徑0 〇丨μηι〜4 μπι的 微粒子含於硬塗佈層中者爲佳。以下亦將該防眩層稱爲防 眩性硬塗佈層。 (含於防眩性硬塗佈層之粒子) 作爲防眩性硬塗佈層中所含有之粒子,例如可使用無 機或有機微粒子。 -47 - 200903021 作爲無機微粒子可舉出氧化矽、氧化鈦、氧化鋁、氧 化錫、氧化鋅、碳酸鈣、硫酸鋇、滑石、陶土'硫酸鈣等 。又’作爲有機微粒子,可舉出聚甲基丙烯酸甲基丙烯酸 酯樹脂微粒子'丙烯基苯乙烯系樹脂微粒子、聚甲基甲基 丙烯酸酯樹脂微粒子、矽系樹脂微粒子、聚苯乙烯系樹脂 微粒子、聚碳酸酯樹脂微粒子、苯並鳥糞胺系樹脂微粒子 、三聚氰胺系樹脂微粒子、聚烯烴系樹脂微粒子、聚酯系 樹脂微粒子、聚醯胺系樹脂微粒子、聚醯亞胺系樹脂微粒 子、或聚氟化乙烯系樹脂微粒子等。 本發明中特別以氧化矽微粒子或聚苯乙烯系樹脂微粒 子爲佳。 上述記載之無機或有機微粒子,加入含有防眩性硬塗 佈層之製作上所使用的樹脂等的塗佈組成物後使用爲佳。 又,作爲這些微粒子之平均粒徑以〇 . (Π μηι〜4 μηι爲佳,較 佳爲 Ο.ΟΙμηα 〜3μηι。 本發明所使用的防眩性硬塗佈層上賦予防眩性中,無 機或有機微粒子之含有量對於防眩性硬塗佈層製作用之樹 脂100質量份而言,以0_1質量份〜30質量份爲佳’更佳 爲0.1質量份〜20質量份。欲賦予更佳的防眩效果’使用 平均粒徑〇 μ m〜1 μ m之微粒子’其用量對於防眩性硬塗 佈層製作用之樹脂100質量份而言爲1質量份〜15質量份 爲佳。又亦可使用2種以上的相異平均粒徑之微粒子。 (防眩性硬塗佈層之算術平均表面粗度(Ra) -48 - 200903021 本發明所使用的防眩性硬塗佈層爲其表面具有微細凹 凸形狀者,如前述,添加適宜選出的上述微粒子,調整至 設於該防眩性硬塗佈層上之防反射層最表面的凹凸爲JIS B 060 1所規定之算術平均表面粗度(Ra)爲〇.05 μηι〜 Ι.ΟΟμηι之範圍內爲佳。 (防眩性硬塗佈層之微細凹凸) 本發明所使用的防眩性硬塗佈層表面之微細凹凸,可 由上述記載之微粒子添加量、粒徑、膜厚等做調整,可得 到具有更佳凹凸之防眩性硬塗佈層。又,本發明所使用的 防眩性硬塗佈層表面之微細凹凸,以形成每1 00μιη2中具 有5〜20個鄰接凹部底作爲基準之高度爲〇.5 μηι〜2 μηι的 凸部之微細結構爲佳。 防眩性硬塗佈層表面之微細凹凸可藉由販賣的觸針式 表面粗度測定機或販賣的光學干涉式表面粗度測定機等進 行測定。例如藉由光學干涉式表面粗度測定機,對於約 4000μπι2之範圍(55μιηχ75μηι)進行凹凸的2次元測定, 將凹凸由底部側等高線方式以不同顏色表示。 其中計算出將鄰接底部作爲基準的高度爲 〇.5μη!〜 2 μηι的凸部數,算出毎1 00 μιη2面積之數目。測定爲每防 眩性防反射薄膜1 m2測定任意1 0點後求得其平均値。 又,本發明之防眩性硬塗佈層的表面爲,具有每 100 μηι2具有80個以上的表面平均水準爲基準的高度爲 0.2 μιη以上之凸部的微細結構爲佳,對於該微細結構,使 -49- 200903021 用與上述相同的光學干涉式表面粗度測定機,對於約 4000μηι2的範圍(55μηιχ75μιη)測定凹凸之2次元,未達 平均水準的部分、平均水準以上〜高度爲未達〇 · 2 μιη之部 分、局度爲0 · 2 μη)以上之部分以至少3種以上的顏色區域 作區分’計算高度〇.2μπι以上部分成爲凸部分之數,可表 示每ΙΟΟμπι2之面積的數目。 (防眩性硬塗佈層表面之微細凹凸的平均山谷間隔) 本發明所使用的防眩性硬塗佈層以表面微細凹凸之平 均山谷間隔爲Ιμηι〜80μιη者爲佳,更佳爲10gm〜4(^m。 其中’微細凹凸結構之形狀可由觸針式表面粗度測定 機等測定’例如將鑽石所成的先端部可介著頂角5 5度圓 錐形之直徑1 mm的測定針,將微細凹凸結構面上於一定 方向以3 m m長度進行掃描,測定此時的測定針的上下方 向的移動變化,記錄此之表面粗度曲線而得到。或可藉由 如前述的光學干涉式表面粗度測定機進行測定。 其中所謂平均山谷間隔爲,前述表面粗度曲線中的凹 凸變化係以微小部分(接近平坦之部分)爲準,預設表面 粗度曲線之凹凸變化作爲凸部而可評估的基準線,由該基 準線之該凸部的高度平均作爲中心線,表面粗度曲線爲自 下至上通過該中心線(或自上至下)時的交點爲準,可定 義出其交點間之平均距離。 (防眩性硬塗佈層之折射率) -50- 200903021 本發明所使用的防眩性硬塗佈層之折射率,由欲得到 低反射性薄膜之光學設計上來看以折射率爲1 . 5〜2 . 〇 ,特 別以1 . 6〜1 · 7爲佳。防眩性硬塗佈層之折射率可藉由添加 之微粒子或無機主料(matrix )之折射率或含有量而調製 (防眩性硬塗佈層之膜厚) 由賦予充分耐久性、耐衝撃性之觀點來看,防眩性硬 塗佈層之乾燥膜厚以0.5 μηι〜1 5 μιη的範圍爲佳,更佳爲3 〜ΙΟμηι,較佳爲5〜ΙΟμηι。 (防眩性硬塗佈層之霧値) 欲得到本發明所記載的效果(對比向上),防眩性硬 塗佈層之霧値以5 %〜4 0%爲佳,更佳爲6 %〜3 0 %。 其中,霧値測定可依據ASTM-D 1 003 -52測定。 將本發明所使用的防眩性硬塗佈層之霧値調整爲較佳 範圍之手段,將上述記載之有機微粒子及/或無機微粒子 含於防眩性硬塗佈層中者爲佳,其中亦以二氧化矽可容易 均一分散而較佳。又,使用將如二氧化矽之微粒子藉由有 機物進行表面處理者爲佳。 防眩性硬塗佈層爲,含有前述低折射率層所使用的紫 外線等活性光線硬化型樹脂、或熱硬化性樹脂作爲膠黏劑 使用爲佳。 又,同樣地含有光聚合啓始劑、光增感劑、紫外線吸 -51 - 200903021 收劑、抗氧化劑、界面活性劑等爲佳。 塗佈防眩性硬塗佈層時的溶劑,例如可適宣地 類、醇類、酮類'酯類、二醇醚類、其他溶劑中, 合使用。較佳爲含有丙二醇單(C1〜C4)院醚或pg (C 1〜C4 )烷醚酯5質量%以上,更佳爲含有5 ^ 80質量%以上之溶劑。 作爲防眩性硬塗佈層塗佈液之塗佈方法,可使 塗佈機 '旋轉塗佈機、線圈棒塗佈機、輥塗佈機、 機、壓出塗佈機 '氣刀塗佈機等公知方法。 塗佈量以濕膜厚5μηι〜30μηι爲適當,較佳爲 20μηι。塗佈速度以1 0m/分鐘〜60m/分鐘爲佳。 防眩性硬塗佈層組成物經塗佈乾燥後,以紫外 子線等活性能量線照射後進行硬化處理爲佳,前述 量線之照射時間以0.5秒〜5分鐘爲佳,由紫外線 樹脂之硬化效率、作業效率等觀點來看以1秒〜2 更佳。 &lt;使用噴射方式之防眩層的作成&gt; 本發明中’透明基材上藉由噴射方式形成凹凸 防眩層者爲佳。且’進一步地預先於透明基材或其 樹S曰層上以噴射方式形成凸部後’將該凸部以透明 行覆蓋塗佈之防眩層的形成較能實現較高防眩性而j 因此’本發明所使用的防眩層爲,於透明基材 噴射方式形成微細凸部,該凸部之徑爲]5〜40 選自烴 或經混 二醇單 「量%〜 用凹版 逆塗佈 1 Ο μ m 〜 線或電 活性能 硬化性 分鐘爲 部作爲 他硬化 樹脂進 绞佳。 上藉由 ,凸部 -52- 200903021 高度爲2〜ΙΟμιη之凸部’且包覆該凸部下形成透明樹脂層 者爲佳。該防眩層之算術平均表面粗度Ra爲前述〇 . 〇 5 μηι 〜Ι.ΟΟμίΏ之範圍者爲佳,較佳爲0_ι〇μηι〜〇.50μηι之範圍 〇 該凸部之形成爲使用下述圖形製作方法經由噴射方式 而形成爲佳。其次’將該凸部藉由活性光線或者加熱而硬 化後’於上面藉由微凹版法、壓出塗佈法、線圈棒法、噴 霧塗佈法 '柔版印刷法 '噴射方式等薄膜均一塗佈法,均 勻地塗佈透明樹脂層而製作。 圖6表示本發明之凸部形成與藉由透明樹脂層覆蓋之 模式圖。 圖7表示本發明的較佳微細凹凸結構之模式圖。 (a )表示透明基材薄膜上所形成之凸部藉由透明樹 脂層覆蓋的截面圖;(b )表示透明基材薄膜上設置如後 述之硬化樹脂層,進一步再配置凸部、透明樹脂層之截面 圖。 欲形成防眩層之凸部的噴射方式所使用的裝置,可使 用前述低折射率層的項目中所說明者爲佳。 本發明中,欲形成微細凹凸結構,作爲墨水液滴以 0.1〜20pl爲佳,0.5〜10pl爲較佳,0.5〜5pl爲特佳。又 ,可自相異噴射頭部吐出各相異液滴量之墨水,亦可由相 同噴射頭部改變液滴量吐出墨水,此時的吐出間隔可爲一 定間隔亦可爲隨機。 凸部爲,具有凸部長徑1 5〜4 0 μ m,較佳爲1 5〜3 0 μ m -53- 200903021 ,凸部之高度爲2〜ΙΟμηι’較佳爲2〜8μιη之一定尺寸與 高度者爲佳’凸部之配置藉由FM篩選等方法可做隨機配 置者爲佳。其中所謂凸部徑爲’凸部爲圓形時以直徑表示 ,爲三角形、四角形、多角形 '不定形時於同一面積下換 算之直徑表示。所謂凸部高度爲,與基材薄膜面的點( dot)最高部分之高度差。 所謂F Μ篩選法爲,點(d o t )與點之間隔,即調整( modulate)周期性(frequency)下,將打入基本點之頻率 (點密度)以濃淡做表現之方法。FM餘選法亦可稱爲隨 機·篩選法或隨機(s t 〇 c h a s t i c ) •篩選法。所謂F M筛選 法爲,點與點之間隔,即調整周期性之方法。具體而言, 已知有晶體·表袖•飾選法(Agfa-Gevaert)、鑽石.舗子 法(Linotype Hell )、等級•篩選法及FU L L T ON E .舗選 法(Sytecs公司)、Velvet·篩選法(烏古拉•可漢公司 )' Accutone ·篩選法(達年尼公司)、負點(d〇t ) ·餘 選法(美國.彩色公司)、Clear.舖選法(西卡拉公司) 、monette·飾選法(Barco公司)等。這些方法之點(d〇t )產生的規則系統皆相異,但皆爲藉由點密度之變化可表 現濃淡之方法,可作爲F Μ篩選法之種種型態。 F Μ飾3¾中’墨水點上的點(d 〇 t )尺寸爲一定,配合 畫像濃度而改變點(d 〇 t )出現頻度。F Μ歸選中之各點尺 寸比所謂的網點還小,故可將作爲必要之圖形以高分解能 下重現。FM篩選中之點(dot )與所謂的網點相異,點之 排列並非周期性。FM篩選中,點(dot )之排列因非周期 -54- 200903021 性,故具有不產生moire (雲彩紋)之特徵。 對於使用於防眩層之形成的凸部形成用墨水液及透明 樹脂層之液組成物,可使用低折射率層之項目所說明之活 性光線硬化型樹脂、或熱硬化性樹脂爲佳。 又,同樣地含有光聚合啓始劑、光增感劑、紫外線吸 收劑、抗氧化劑、界面活性劑等爲佳。 墨水液、及透明樹脂層之液組成物中的活性光線硬化 型樹脂之固體成分濃度以1 0〜95質量%爲佳,藉由塗佈方 法等可選擇最適濃度。 藉由噴射方式之防眩層的乾燥膜厚,由透明基材之防 眩層的最大高度平均値而言,以3〜15μιη爲佳,較佳爲5 〜1 Ομπι。未達 3 μηι時,防眩性會不充分,依情況無法得 到令人滿意的硬度。又,超過15μηι時,膜物性中之耐曲 性或顯著惡化,於防眩層形成後之搬送或切斷等處理時容 易產生微小曲折而降低生產性。乾燥膜厚爲依據常法,可 藉由測微計測定、或藉由薄膜切片之顯微鏡觀察分析等進 行測定。 乾燥膜厚,例如本發明之透明樹脂層係由活性光線硬 化樹脂或熱硬化性樹脂所成時,藉由調整樹脂之固體成分 量與樹脂之溶劑的比率,可得到所望乾燥膜厚。 形成凸部之墨水液滴的黏度,於 25°C下以2〜 15mP · s爲佳,更佳爲5〜10mp · s。黏度未達2mP · s時 ’因黏度過低而無法得到所望形狀之圖形,超過1 5 m P · s 時,墨水之流動性變差,墨水之射出性亦降低而不佳。墨 -55- 200903021 水液中可使用如低折射率層之項目所說明的溶 作爲本發明的透明樹脂層所使用的溶劑, 甲醇、乙醇、1-丙醇、2-丙醇、丁醇等醇類; 乙基酮 '環己酮等酮類;N -甲基吡咯烷酮、二 、二甲基乙醯胺等醯胺類;二丙酮醇類等酮醇 苯、二甲苯等的芳香族烴類;聚乙二醇、聚丙 二醇類;乙二醇、丙二醇、丁二醇、三乙二酉 三醇、硫撐二乙醇、己二醇二醇、二乙二醇等 2〜6個碳原子之烷二醇類;乙基溶纖劑'丁基 基卡必醇、丁基卡必醇、二乙基溶纖劑、二乙 丙二醇單甲醚等二醇醚類;乙酸溶纖劑、二乙 乙酸酯等二醇酯類;乳酸甲基、乳酸乙酯、乙 酸乙酯、乙酸戊基等酯類;二甲醚、二乙醚等 ,這些可單獨或混合2種以上使用。又,分子 者爲特佳,使用二醇醚類亦佳。 作爲二醇醚類,具體可舉出下述溶劑,但 。可舉出丙二醇單甲醚、丙二醇單乙醚、丙二 二乙二醇二甲醚、乙二醇單甲醚 '乙二醇單弓 二醇單丁醚、乙二醇單乙醚、乙二醇單乙醚 二乙醚等,其中Ac表示乙酸酯。 本發明之透明樹脂層含有聚矽氧烷油、變 油、聚矽氧烷系界面活性劑、氟系界面活性劑 、氟系寡聚物 '氟變性聚矽氧烷油、氟系矽烷 性劑〇.〗質量%以上5質量%以下爲佳。 劑。 例如可舉出 丙酮、甲基 甲基甲醯胺 類;苯、甲 二醇等聚烷 享、1 ,2,6-己 伸烷基含有 溶纖劑、乙 基卡必醇、 二醇單乙醚 酸甲基、乙 醚類、水等 内具有醚鍵 未特別限定 醇單丁醚、 3醚 Ac、乙 Ac 、乙二醇 性聚矽氧烷 、氟系樹脂 偶合劑等活 -56- 200903021 本發明中,凸部、透明樹脂層中皆含有Sn02、ITO、 ZnO等導電性微粒子或交聯陽離子聚合物粒子等靜電防止 劑。本發明中將靜電防止劑添加於透明樹脂層者爲佳。 本發明中,於凸部、透明樹脂層中同時含有微粒子, 例如可添加無機微粒子或有機微粒子。 作爲無機微粒子,例如可舉出含有矽之化合物、二氧 化矽、氧化鋁、氧化锆、碳酸鈣 '滑石、黏土、燒成陶土 、燒成矽酸鈣、水和矽酸鈣、矽酸鋁、矽酸鎂及磷酸鈣等 爲佳,更佳爲含有矽之無機化合物或氧化銷,但以二氧化 矽爲特佳。這些可舉出球狀、平板狀、無定形狀等形狀粒 子。 作爲二氧化矽之微粒子,例如可使用 Aer〇SilR972、 R972V 、 R974 、 R812 、 200 、 200V 、 300 、 R202 、 0X50 、 TT6 00 (以上日本Aerosil (股)製)等販賣品。 作爲氧化锆之微粒子,例如可使用 AerosilR976及 R81 1 (以上日本Aerosil (股)製)等販賣品。 又,作爲有機微粒子可舉出聚甲基丙烯酸甲基丙烯酸 酯樹脂微粒子、丙烯基苯乙烯系樹脂微粒子、聚甲基甲基 丙烯酸酯樹脂微粒子、矽系樹脂微粒子、聚苯乙烯系樹脂 微粒子、聚碳酸酯樹脂微粒子、苯並鳥糞胺系樹脂微粒子 、三聚氰胺系樹脂微粒子、聚烯烴系樹脂微粒子、聚醋系 樹脂微粒子、聚醯胺系樹脂微粒子、聚酿亞胺系樹脂微粒 子、或聚氟化乙烯系樹脂微粒子等。 含有上述微粒子時,該平均粒徑以5〜300nm爲佳, -57- 200903021 更佳爲20〜1 OOnm。亦可含有粒徑或折射率相異的2種以 上微粒子。又,含有量對於凸部或透明樹脂層而言以5〜 5 〇質量%爲佳。 凸部或者透明樹脂層還有活性光線硬化型樹脂時,作 爲活性光線之照射方法,將墨水落於透明基體上,蒸發溶 劑等後照射活性光線爲佳。照射之時間點可考慮到所形成 之圖形形狀而決定,例如墨水爲無溶劑的情況時,著落後 〜2min以内進行照射,又墨水含有溶劑時,墨水中的溶 劑揮發終了後馬上〜2min以内進行照射爲佳。 作爲可使用的活性光線可使用前述光源。 本發明的防眩層中,透明基材上可藉由直接噴射方式 形成凸部,較佳爲1層以上之硬化性樹脂層、或塗佈方式 下形成平滑型光擴散層後,於該硬化性樹脂層、或平滑型 之光擴散層表面上形成凸部爲佳。這些層之乾燥膜厚以 0.1〜ΙΟμηι爲佳,以0.1〜5μηι爲較佳。 硬化性樹脂層或平滑型之光擴散層中,可使用凸部形 成用墨水組成物及透明樹脂層所使用的相同活性線硬化型 樹脂或熱硬化性樹脂爲佳,特別以紫外線硬化樹脂爲佳。 又,形成硬化性樹脂層或平滑型之光擴散層時,可適宜地 添加上述各樹脂以外的凸部形成用墨水組成物所記載的相 同光聚合啓始劑、光增感劑、抗氧化劑、紫外線吸收劑、 靜電防止劑 '無機微粒子、有機微粒子等。 又,本發明中,硬化性樹脂層或平滑型之光擴散層可 由複數層所構成,但落下墨水液滴之硬化性樹脂層或平滑 -58- 200903021 型的光擴散層之最表層含有可塑劑爲佳。 可塑劑之含有量以0.1〜1 0質量%爲佳。例如,於前 述硬化性樹脂層或平滑型之光擴散層的塗佈組成物中預先 添加可塑劑爲佳,或可於硬化性樹脂層或平滑型之光擴散 層的塗佈前預先於基材表面上塗佈或附著可塑劑。藉此, 可改善硬化後之墨水滴的密著性。 作爲可於硬化性樹脂層或平滑型光擴散層所使用的可 塑劑,例如可使用磷酸酯系可塑劑、鄰苯二甲酸酯系可塑 劑、偏苯三酸酯系可塑劑、均苯四甲酸系可塑劑、乙醇酸 酯系可塑劑、檸檬酸酯系可塑劑、聚酯系可塑劑等。 作爲磷酸酯系可塑劑,例如可舉出三苯基磷酸酯、三 甲酚磷酸酯、甲酚二苯基磷酸酯、辛基二苯基磷酸酯、二 苯基聯苯基磷酸酯、三辛基磷酸酯、三丁基磷酸酯等、鄰 苯二甲酸酯系可塑劑可舉出二乙基酞酸酯、二甲氧基乙基 酞酸酯、二甲基酞酸酯、二辛基酞酸酯、二丁基酞酸酯、 二-2-乙基己基酞酸酯'丁基苯甲基酞酸酯、二苯基酞酸酯 '二環己基酞酸酯等、偏苯三酸系可塑劑可舉出三丁基偏 苯三酸酯、三苯基偏苯三酸酯、三乙基偏苯三酸酯等、均 苯四甲酸酯系可塑劑可舉出四丁基均苯四甲酸酯、四苯基 均苯四甲酸酯、四乙基均苯四甲酸酯等、乙醇酸酯系可塑 劑可舉出三醋精、甘油三丁酸酯、乙基鄰苯二醯基乙基乙 醇酸酯、甲基鄰苯二醯基乙基乙醇酸酯、丁基鄰苯二醯基 丁基乙醇酸酯等 '檸檬酸酯系可塑劑舉出三乙基檸檬酸酯 、三-η -丁基檸檬酸酯、乙醯基三乙基檸檬酸酯、乙醯基 -59- 200903021 三-η -丁基檸檬酸酯、乙醯基三_η· (2·乙基己基)檸檬酸 酯等。其他羧酸酯的例子中含有油酸丁酯、蓖麻醇酸甲基 乙醯酯、癸二酸二丁酯等種種偏苯三酸酯。又,亦可使用 三羥甲基丙烷三苯甲酸酯等。 作爲聚酯系可塑劑,可使用脂肪族二元酸、脂環式二 元酸、芳香族二元酸等二元酸與二醇之共聚物。作爲脂肪 族二元酸並無特別限定,可使用己二酸、癸二酸、鄰苯二 甲酸、對苯二甲酸、1,4-環己基二羧酸等。作爲二醇可使 用乙二醇、二乙二醇' 1,3·丙二醇、1,2-丙二醇、1,4-丁二 醇、1,3 -丁二醇、1,2-丁二醇等。這些二元酸及二醇可各 單獨使用或混合二種以上使用。 特別爲使用具有特開2002- 1 46044號公報所記載之環 氧基系化合物、松香系化合物、酚漆用酚醛型環氧基樹脂 、甲酚漆用酚醛型環氧基樹脂、酮樹脂、甲苯磺醯胺樹脂 等添加物之纖維素酯爲佳。 作爲上述化合物,ΚΕ-604與ΚΕ-610爲購自荒川化學 工業(股)之各酸價2 3 7與1 7 0者。同樣地,作爲購自荒 川化學工業(股)之松香酸、脫氫松香酸及長葉松酯酸3 者之混合物的酯化物,ΚΕ-100及ΚΕ-3 5 6之各酸價爲8與 〇。又,松香酸、脫氫松香酸及長葉松酯酸3者之混合物 購自播磨化成(股),各爲酸價爲167、168之G-7及哈 多路R-X 。 又,作爲環氧基樹脂可購得旭千葉(股)之阿拉魯來 得ΕΡΝ 1 1 79及阿拉魯來得AER260爲旭千葉(股)。 -60 - 200903021 作爲酮樹脂,海拉克1 1 0及海拉克1 1 〇H爲購自日立 化成(股)。 作爲對甲苯磺醯胺樹脂,多普拉爲購自富士醯胺化學 (股)。 塗佈本發明所使用的硬化性樹脂層或平滑型光擴散層 時的溶劑,例如可適宜地選自烴類、醇類、酮類、酯類、 二醇醚類、其他溶劑、或混合使用。較佳爲含有丙二醇單 (碳數1〜4)烷醚或丙二醇單(碳數1〜4)烷醚酯5質 量%以上,更佳使用含有5質量%〜80質量%以上之溶劑 〇 將上述說明之組成所成之硬化性樹脂層或平滑型光擴 散層組成物塗佈液,塗佈於透明基材上之方法,可使用凹 版塗佈機、旋轉塗佈機、線圈棒塗佈機、輥塗佈機、逆塗 佈機、壓出塗佈機、氣刀塗佈機等公知方法。適當塗佈量 爲濕膜厚5μιη〜30μηι,較佳爲ΙΟμηι〜20μιη。塗佈速度以 10m/分鐘〜60m/分鐘爲佳。又,作爲乾燥膜厚以 〇_ι〜 1 0 μ m爲佳。 硬化性樹脂層組成物、或平滑型光擴散層經塗佈乾燥 後’與墨水硬化之相同方法,照射紫外線或電子線等活性 光線、或藉由加熱處理使其硬化爲佳,前述活性光線之照 射時間以〇 · 1秒〜5分鐘爲佳’由紫外線硬化性樹脂之硬 化效率、作業效率等來看更佳爲ο · 1〜1 0秒。 本發明中,以上述方法於透明基材上進行塗佈之硬化 性樹脂層或平滑型光擴散層於未硬化狀態、或完全硬化終 -61 - 200903021 了後的任一時期,可藉由噴射方式,將形成凸部之墨水液 滴落下,繼續再以透明樹脂層包覆,較佳爲硬化性樹脂層 或平滑型之光擴散層經硬化後,藉由噴射方式落下墨水液 滴而形成凸部爲佳。硬化性樹脂層或平滑型光擴散層進行 半處理(半硬化狀態)時,落下墨水液滴而形成凸部,繼 續再以透明樹脂層包覆時,可容易形成微細凹凸,且生產 性亦優良而較佳,且可提高凸部或透明樹脂層與硬化性樹 脂層或平滑型光擴散層表面之密著性。 本發明中,形成凸部,表面經電漿處理後,覆蓋該凸 部下形成透明樹脂層爲佳,但電漿處理特別施予大氣電漿 處理爲佳,可使用氦氣、氬氣等稀有氣體或者氮、空氣等 放電氣體、與視必要使用含有氧、氫、氮、一氧化碳、二 氧化碳、一氧化氮、二氧化氮、水蒸氣、甲烷、4氟化甲 院等1種以上之反應氣體。特開2000-356714號公報中, 參考具體電漿處理方法,可對硬化樹脂層表面施予電漿處 理。 圖8表示透明基材上藉由噴射方式形成凸部後,覆蓋 該凸部下所形成之透明樹脂層防眩性薄膜的製造流程一例 模式圖。詳細爲表示透明基材上將硬化性樹脂層或平滑型 光擴散層以塗佈方式設置後,以噴射方式形成凸部,覆蓋 該凸部下所形成之透明樹脂層的防眩層上,再將低折射率 層以噴射方式設置,製造防眩性防反射薄膜之流程一例。 圖8中’藉由層合輥1 〇 1重複的透明基材丨〇2經搬送 ’以第1塗佈階段A ’藉由壓出方式的第1塗佈]0 3塗佈 -62- 200903021 設置於硬化性樹脂層或平滑型光擴散層。此時,硬化性樹 脂層或平滑型之光擴散層可爲單層構成、或組合複數層所 構成之層。塗佈設置硬化性樹脂層或平滑型光擴散層之透 明基材1 02,可繼續於乾燥區域1 05 A下進行乾燥。乾燥 爲’透明基材1 〇 2之兩面藉由經控制溫濕度之溫風施予乾 燥。乾燥後,於硬化性樹脂層或平滑型光擴散層作爲膠黏 劑使用活性光線硬化型樹脂時,以活性光線照射部1 06A ,以活性光線,例如以紫外線等照射並使其硬化、或可控 制照射量或照射條件使其呈半處理狀態、或未進行硬化而 直接運送至噴射射出部1 09。 繼續,雖運送到使用噴射方式設置凸部之第2塗佈階 段B,但硬化性樹脂層以半處理狀態爲佳。或形成凸部前 ,於電漿處理部107亦可施予表面處理。噴射射出部109 上連接墨水供給筒 1 08,由此供給墨水液。噴射射出部 109爲如圖3之(b)所示,複數噴射噴嘴於透明基材之寬 全區被配置成千鳥狀,較佳爲多段方式,將墨水液滴射出 於硬化性樹脂層或平滑型光擴散層上,該表面形成凸部。 又,射出2種以上之墨水液滴時’亦可藉由配置成2列以 上的噴射噴嘴,射出各墨水液滴、或隨機藉由任意噴射噴 嘴射出墨水液滴。又,亦可配置複數噴射射出部下,藉由 各墨水射出部射出相異墨水液滴。本發明中欲射出0.1〜 10 0pl,依情況射出0.1〜〗〇pI之微細液滴,對於墨水液滴 之飛翔性,因容易受到外面氣體的氣流之影響,將第2塗 佈階段B及第4塗佈階段D全體以分隔牆等覆蓋下施予防 -63- 200903021 風處理爲佳。又,欲使1 pi以下之極微細液滴進 飛翔,於噴射射出部109與透明基材102或背| 1 04D間外加電壓,於墨水液滴賦予電荷輔助電 滴之飛翔安定性的方法亦佳。又,欲防止著落後 滴之變形,冷卻透明基材使著落後之墨水液滴流 低的方法亦佳。或墨水液滴經射出後至著落的飛 有之溶劑會揮發,減少墨水液滴中之含有溶劑量 著落,於形成更微細凸部上較佳。因此,提高墨 間之溫度、或將氣壓控制於1氣壓以下,例如控彳 lOOkPa之方法亦佳。又,可降低墨水飛翔空間之 溶劑濃度亦佳,飽和濃度之5 0%以下,較佳爲1、 著落於硬化性樹脂層或平滑型光擴散層表面 滴,使用活性光線硬化型樹脂時,於噴射射出部 所配置之活性光線照射部1 06B照射活性光線, 紫外線等使其硬化。又,墨水液滴使用熱硬化性 藉由加熱部11 0,例如藉由加熱平板進行加熱、 ’將背輥1 04B作爲加熱輥進行加熱之方法亦佳。 第2塗佈階段B中,活性光線照射部1 06B 不會直接影響噴射射出部1 0 9的噴射噴嘴下,將 照射部1 06B與噴射射出部1 09配置爲適當間隔 性光線照射部1 06B與噴射射出部1 09之間設置 爲佳。又’加熱部1 1 0之熱不會直接影響噴射射 之噴射噴嘴下將噴射射出部1 0 9以保溫外套包覆 8所示,將加熱部1 1 0配置於透明基材I 〇 2之裏 行高精度 1 104B ' 性墨水液 的墨水液 動快速降 翔中所含 的狀態下 水飛翔空 制於2 0〜 環境氣體 ‘ 3 0%。 之墨水液 109之後 例如照射 樹脂時, 硬化。又 的照射光 活性光線 、或於活 遮光壁等 出部1 0 9 、或如圖 面側,不 -64- 200903021 會影響到噴射射出部1 09爲佳。 可維持藉由著落之墨水液滴所形成之凸部的程度下進行 硬化處理的透明基材102,於乾燥區域105B蒸發不需要 的有機溶劑等後,再以活性光線照射部1 06C照射活性光 線,即使完成硬化可爲半處理狀態,以半處理狀態爲佳。 設有凸部之透明基材102,繼續被運送至塗佈設置有 覆蓋凸部的透明樹脂層之第3塗佈階段C,凸部以透明樹 脂層包覆前,於電漿處理部107施予表面處理爲佳。 塗佈設置透明樹脂層之透明基材1 0 2,繼續於乾燥區 域1 0 5 C進行乾燥。乾燥爲,於透明基材1 0 2之兩面以控 制溫濕度之溫風施予乾燥。再以活性光線照射部1 06D照 射活性光線,並完成硬化。 設有具有凸部之防眩層的透明基材〗〇 2,繼續於第4 塗佈階段D,藉由噴射射出部1 0 9塗佈設置低折射率層, 以活性光線照射部1 06E及乾燥區域1 05D進行硬化。於低 折射率層的塗佈設置前,將前述透明樹脂層表面以電漿處 理部107施予表面處理爲佳。 且設有複數防反射層或防污層時,僅設置必要塗佈階 段即可(未圖示),與第1塗佈階段A同樣下,進行塗佈 、乾燥、硬化處理而製造出防眩性防反射薄膜,其後以捲 取筒1 1 3進行捲取。且,透明基材1 02於各塗佈階段進行 塗佈、乾燥、硬化處理後,適宜地以捲取筒進行捲取即可 -65- 《透明 作 性光線 、光學 本 較佳爲 僅 維素二 丙酸酯 、聚酯 颯(亦 烯萘酸 紙、聚 薄膜、 膜、原 聚醚酮 聚甲基 亦以聚 及纖維 又 原菠烯 學(股 (股) 本 200903021 基材》 爲本發明所使用的透明基材,其爲容易製造、 硬化型樹脂層之密著性良好,其爲光學性各向 性透明等爲佳’故適合作爲透明薄膜。 發明中所謂的透明爲,可見光透過率60%以上 8 〇 %以上,特佳爲9 0 %以上。 具有上述性質即可,並無特別限定,例如可舉 乙酸醋薄膜、纖維素三乙酸酯薄膜、纖維素乙 薄膜、纖維素乙酸酯丁酸酯薄膜等纖維素酯系 系薄膜、聚碳酸醋系薄膜、聚丙稀酸醋系薄膜 含有聚醚颯)系薄膜 '聚乙稀對苯二甲酸醋、 醋醋等聚酯薄膜、聚乙嫌薄膜、聚丙稀薄膜、 氯化亞乙烧薄膜、聚乙;)¾醇薄膜、伸乙基乙嫌 間規(syndiotactic)聚苯乙烯系薄膜,聚碳酸 疲嫌系樹脂薄膜、聚甲基戊烯薄膜、聚醚酮薄 亞胺薄膜、聚醯胺薄膜、氟樹脂薄膜、尼龍薄 甲基丙烯酸醋薄膜、丙烯基薄膜或玻璃板等。 碳酸酯系薄膜、聚酯系薄膜、原菠烯系樹脂薄 素酯系薄膜爲佳。 ’本發明所使用的較佳原菠烯系樹脂薄膜爲, 結構之非晶性聚烯烴薄膜,例如可舉出三井石 )製AP0或日本ΖΕΟΝ (股)製的ΖΕΟΝΕΧ、 製之ARTON等。 發明中’其中特別使用纖維素酯系薄膜爲佳。 與活 同性 者, 出纖 酸酯 薄膜 、聚 聚乙 玻璃 醇類 酯薄 膜、 膜、 其中 膜、 具有 油化 JSR 作爲 -66- 200903021 纖維素酯’以纖維素乙酸酯、纖維素乙酸酯丁酸酯、纖維 素乙酸酯丙酸酯爲佳,其中亦以纖維素乙酸酯丁酸酯、纖 維素乙酸酯酞酸酯、纖維素乙酸酯丙酸酯爲較佳。作爲販 賣的纖維素酯薄膜,例如可舉出 Konicaminolta tak KC8UX、KC4UX、KC5UX、KC8UCR3、KC8UCR4、 KC8UCR5 、 KC8UY 、 KC4UY 、 KC12UR 、 KC4FR ( Konicaminolta opt (股)製)等,由製造上、成本面、透 明性、密著性等觀點來看爲佳。這些薄膜可爲溶融流延製 膜所製造之薄膜、或溶液流延製膜所製造之薄膜。 又’藉由滾邊加工等於表面上形成凹凸形狀之透明基 材薄膜亦可。 《防反射薄膜的製作》 本發明中,於基材薄膜上形成防眩層,使用高折射率 層組成物、低折射率層組成物依序塗佈之步驟而製造出防 反射層爲佳。又,亦可塗佈防污層、背塗佈層。 具有較佳防眩性之防反射薄膜的構成如下所述,但未 限定於此。 透明基材/防眩層/低折射率層 透明基材/防眩層/高折射率層/低折射率層 透明基材/防靜電層/防眩層/低折射率層 透明基材/防靜電層/防眩層/高折射率層/低折射率層 透明基材/防眩層/低折射率層/防污層 透明基材/防眩層/高折射率層/低折射率層/防污層 -67 - 200903021 透明基材/防靜電層/防眩層/低折射率層/防污層 透明基材/防靜電層/防眩層/高折射率層/低折射率層/ 防污層 背塗佈層/透明基材/防眩層/低折射率層 背塗佈層/透明基材/防眩層/低折射率層/防污層 背塗佈層/透明基材/防眩層/高折射率層/低折射率層/ 防污層 &lt;局折射率層&gt; 本發明中,欲進一步提高反射防止性,於前述低折射 率層之底層設置複數層的下述高折射率層。 本發明的較佳高折射率層含有平均粒子徑爲1 〇〜 2 0 0 nm之金屬氧化物微粒子、金屬化合物、活性光線硬化 型樹脂爲佳。 (金屬氧化物微粒子) 本發明的高折射率層含有金屬氧化物微粒子者爲佳。 金屬氧化物微粒子之種類並無特別限定,可使用具有至少 1 種選自 Ti、Zr、Sn、Sb、Cu、Fe、Mn' Pb、Cd、As、 Cr、Hg、Zn、Al、Mg、Si、P及S之元素的金屬氧化物’ 這些金屬氧化物微粒子可摻合Al、In、Sn、Sb、Nb、鹵 元素、Ta等等微量原子。又,可爲這些混合物。本發明 中’使用以至少1種選自氧化锆、氧化銻、氧化錫、氧化 鋅、氧化銦-錫(ITO )、銻摻合氧化錫(ΑΤΟ )、及銻酸 -68- 200903021 鋅的金屬氧化物微粒子作爲主成分爲佳,特 錫(ITO )。 這些金屬氧化物微粒子之一次粒子的; 10nm〜2〇〇nm之範圍,10〜150nm爲特佳。 粒子之平均粒子徑可藉由掃描電子顯微鏡( 顯微鏡照片進行測定,利用動態散光法或靜 由粒度分佈計等進行測定。粒徑過小時容易 散性惡化。粒徑過大時霧値會顯著提高而不 物微粒子之形狀以米粒狀、球形狀、立方體 、針狀或不定形狀爲佳。 高折射率層之折射率,具體爲比支持體 折射率還高,23°C下波長5 50nm測定爲1.50 爲佳。調整高折射率層之折射率之手段,因 化物微粒子之種類、添加量,故金屬氧化物 率以1.80〜2.60爲佳,1·85〜2.50爲更佳。 金屬氧化物微粒子可藉由有機化合物進 金屬氧化物微粒子之表面藉由有機化合物進 ,可提高有機溶劑中之分散安定性,容易控 同時,亦可經時性地抑制凝集、沈澱。因此 合物之表面修飾量對於金屬氧化物粒子而言 〜5質量%,較佳爲0.5質量%〜3質量%。 理之有機化合物的例子,含有多元醇、烷醇 矽烷偶合劑及鈦酸酯偶合劑。其中以後述矽 。亦可組合二種以上之表面處理。 ;佳爲氧化銦- Ρ均粒子徑爲 金屬氧化物微 SEM )等電子 態散光法等藉 凝集,使得分 佳。金屬氧化 狀、紡錘形狀 之透明基材的 〜1.9 0之範圍 取決於金屬氧 微粒子之折射 行表面處理。 行表面修飾時 制分散粒徑的 ,較佳有機化 爲0 . 1質量% 使用於表面處 胺、硬脂酸、 烷偶合劑爲佳 -69- 200903021 含有前述金屬氧化物微粒子之高折射; 5nm 〜Ιμηι 爲佳,l〇nm 〜0.2μιη 爲更佳,30: 最佳。 所使用之金屬氧化物微粒子與後述之活 樹脂等膠黏劑的比率,依金屬氧化物微粒子 尺寸等而不同,但體積比爲對前者1而言後 者2而言後者爲1之程度爲佳。 本發明所使用的金屬氧化物微粒子的使 率層中5質量%〜8 5質量%爲佳,1 0質量% 較佳,2 0〜7 5質量%爲最佳。使用量若過少 望折射率或本發明的效果,過多時,會產生 等。 上述金屬氧化物微粒子爲,分散於媒體 下,以使用於形成高折射率層之塗佈液方式 屬氧化物粒子之分散媒體,使用沸點爲6(L· 爲佳。作爲分散溶劑之具體例,可舉出水、 甲醇、乙醇、異丙醇、丁醇、苯甲醇類)、 酮、甲基乙基酮、甲基異丁基酮、環己酮) 如,二丙酮醇類)、酯(例如,乙酸甲酯、 酸丙酯、乙酸丁酯、蟻酸甲酯、蟻酸乙酯、 酸丁酯)、脂肪族烴(例如,己烷、環己烷 例如’二氯甲烷、氯仿、四氯化碳)、芳香 苯、甲苯、二甲苯)、醯胺(例如,二甲基 基乙醯胺、η -甲基吡咯烷酮)、醚(例如, 寧層的厚度以 nm 〜0 . 1 μηι 爲 性光線硬化型 之種類、粒子 者爲2至對前 用量以高折射 〜8 0質量%爲 ,無法得到所 膜強度之劣化 之分散體狀態 提供。作爲金 〜170°C之液體 醇類(例如, 酮(例如,丙 、酮醇類(例 乙酸乙酯、乙 蟻酸丙酯、蟻 )、鹵化烴( 族烴(例如, 甲酿胺、二甲 二乙醚、二噁 -70- 200903021 烷、四氫呋喃)、醚醇類(例如,〗·甲氧基-2-丙醇)。其 中亦以甲苯、二甲苯、甲基乙基酮、甲基異丁基酮、環己 酮及丁醇爲特佳。 又,金屬氧化物微粒子可使用分散機而分散於媒體中 。作爲分散機之例子,可舉出磨砂硏磨機(例如,附針珠 硏磨機)、高速葉輪式硏磨機、石英片硏磨機、輥硏磨機 、攪拌球磨機及膠體硏磨機。以磨砂硏磨機及高速葉輪式 硏磨機爲特佳。又,可實施預備分散處理。作爲使用於預 備分散處理之分散機例,可舉出球硏磨機、三根輥硏磨機 、捏合機及擠壓機。 本發明中’進一步可含有具有核心/殼結構之金屬氧 化物微粒子。殼可形成於核心周圍1層,欲進一步提高耐 光性可形成複數層。核心爲藉由殼完全覆蓋者爲佳。 核心可使用氧化鈦(金紅石型、銳鈦礦型、不定型等 )、氧化锆、氧化鋅、氧化鈽、摻合錫之氧化銦、摻合銻 之氧化錫等,但亦可將金紅石型之氧化鈦作爲主成分。 殼以氧化鈦以外之無機化合物作爲主成分,由金屬之 氧化物或硫化物所形成者爲佳。例如可使用二氧化砂(二 氧化矽)、氧化鋁(alumina )、氧化鉻、氧化鋅、氧化 錫、氧化錄、氧化銦、氧化鐵、硫化鋅等作爲主成分之無 機化合物。其中以氧化鋁 '二氧化矽、氧化锆爲佳。又, 亦可爲彼等之混合物。 對於核心的殼之覆蓋量’平均覆蓋量爲2〜50質量% 。較佳爲3〜40質量% ’更佳爲4〜25質量%。殼之覆蓋 -71 - 200903021 量過多時,微粒子之折射率會降低,覆蓋量過少時,耐光 性會劣化。可倂用二種以上的金屬氧化物微粒子。 成爲核心之氧化鈦可使用由液相法或氣相法所製作者 。又’作爲將殼形成於核心周圍的手法,例如可使用美國 專利第3,4 1 0,7 0 8號、特公昭5 8-4706 1號、美國專利第 2,8 8 5,3 66號 '同第3,43 7,502號、英國專利第丨,丨34,249 號、美國專利第3,3 83,23 1號、英國專利第2,62 9,9 5 3號 、同第1,3 65,999號所記載的方法等。 (金屬化合物) 本發明所使用的金屬化合物可使用下述一般式(4 ) 所示化合物或其螯合化合物。 —般式(4 ) AnMBx-n 式中,Μ表示金屬原子,A表示可水解之官能基或具 有可水解官能基之烴基,B表示金屬原子Μ經共價鍵或離 子鍵之原子團。X表示金屬原子Μ之原子價,η表示2以 上,X以下的整數。 作爲可水解之官能基A,例如可舉出烷氧基、氯原子 等的鹵素、酯基、醯胺基等。屬與上述式(4)之金屬化 合物中,含有具有2個以上具有直接鍵結於金屬原子的烷 氧基的烷氧化物、或其螯合化合物。作爲較佳金屬化合物 ,可舉出鈦烷氧化物、锆烷氧化物或彼等螯合化合物。鈦 烷氧化物爲反應速度快,且折射率高而容易處理,但因具 有光觸媒作用,若大量添加時會使耐光性劣化。锆烷氧化 -72- 200903021 物爲折射率高但容易白濁,故必須注意塗佈時的曝光管理 等。又,鈦烷氧化物因具有促進紫外線硬化樹脂、金屬烷 氧化物之反應的效果,僅少量添加即可提高塗膜之物理特 性。 作爲鈦烷氧化物,例如可舉出四甲氧基鈦、四乙氧基 鈦、四-iso-丙氧基鈦、四-η-丙氧基鈦、四-n-丁氧基鈦、 四- sec-丁氧基鈦、四- tert_ 丁氧基鈦等。 作爲锆烷氧化物,例如可舉出四甲氧基鍩、四乙氧基 锆 '四-iso-丙氧基锆、四-n-丙氧基銷、四-n-丁氧基鍩、 四- sec-丁氧基锆、四- tert-丁氧基鍩等。 作爲形成配位於游離金屬化合物之螯合化合物的較佳 螯合化劑’可舉出二乙醇胺、三乙醇胺等烷醇胺類、乙二 醇、二乙二醇、丙二醇等二醇類、乙醯基丙酮、乙醯乙酸 乙酯等分子量1萬以下者。藉由使用這些螯合化劑,對於 水分之混入等亦安定,可形成塗膜的補強效果亦優良的螯 合化合物。 金屬化合物之添加量調整爲含於高折射率層之來自該 金屬化合物的金屬氧化物含有量爲〇 . 3〜5質量。/。者爲佳。 未達〇 · 3質量%時,耐擦傷性會不足,超過5質量%時,會 有耐光性劣化之傾向。 (活性光線硬化型樹脂) 活性光線硬化型樹脂爲,作爲金屬氧化物微粒子之膠 黏劑而添加於提高塗膜的成膜性或物理特性上。作爲活性 -73- 200903021 光線硬化型樹脂,可使用具有2個以上的官能基的單體或 寡聚物,該官能基爲藉由如紫外線或電子線之活性光線的 照射,直接或接受光聚合啓始劑之作用而間接地進行聚合 反應者。作爲官能基,可舉出具有如(甲基)丙烯醯基氧 基等不飽和雙鍵之基、環氧基、砂院醇基等。其中亦可使 用具有2個以上的不飽和雙鍵之自由基聚合性單體或寡聚 物。視必要可組合光聚合啓始劑。作爲如此活性光線硬化 型樹脂,例如可舉出多官能丙烯酸酯化合物等,選自季戊 四醇多官能丙烯酸酯、二季戊四醇多官能丙烯酸酯、季戊 四醇多官能甲基丙烯酸酯、及二季戊四醇多官能甲基丙烯 酸酯所成群之化合物爲佳。其中,所謂多官能丙烯酸酯化 合物爲,分子中具有2個以上之丙烯醯基氧基及/或甲基 丙烯醯氧基的化合物。 作爲多官能丙烯酸酯化合物之單體,例如可舉出乙二 醇二丙烯酸酯、二乙二醇二丙烯酸酯、1,6 -己二醇二丙烯 酸酯、新戊基二醇二丙烯酸醋、三羥甲基丙院三丙稀酸醋 、二經甲基乙院三丙稀酸醋、四經甲基甲院三丙稀酸醋、 四趨甲基甲院四丙稀酸酯、五甘油三丙嫌酸酯、季戊四醇 一丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯 、甘油三丙烯酸酯'二季戊四醇三丙烯酸酯'二季戊四醇 四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙燏 酸醋、參(丙稀醯基氧基乙基)三聚異氰酸醋、乙一醇二 甲基丙烯酸酯、二乙二醇二甲基丙烯酸酯、丨,6_己二醇二 甲基丙烯酸酯、新戊基二醇二甲基丙烯酸酯、三經甲基丙 -74- 200903021 烷三甲基丙烯酸酯、三羥甲基乙烷三甲基丙烯酸酯、四羥 甲基甲烷三甲基丙烯酸酯、四羥甲基甲烷四甲基丙烯酸酯 、五甘油三甲基丙烯酸酯、季戊四醇二甲基丙烯酸酯、季 戊四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯、甘油 三甲基丙嫌酸酯、二季戊四醇三甲基丙烧酸酯、二季戊四 醇四甲基丙烯酸酯、二季戊四醇五甲基丙烯酸酯、二季戊 四醇六甲基丙烯酸酯。這些化合物可單獨使用或混合2種 以上使用。又,亦可爲上述單體之2聚物、3聚物等寡聚 物。 活性光線硬化型樹脂之添加量於高折射率組成物中以 未達固體成分中50質量%爲佳。 本發明之相關活性光線硬化型樹脂的硬化促進上,含 有質量比爲3: 7〜1:9的光聚合啓始劑與分子中具有2 個以上可聚合之不飽和結合的丙烯基系化合物爲佳。 作爲光聚合啓始劑,具體可舉出乙醯苯、二苯甲酮、 羥基二苯甲酮、米希勒酮、α-胺肟酯、噻噸酮等及彼等之 衍生物。 (溶劑) 作爲塗佈本發明所使用的高折射率層時所使用的有機 溶劑,例如可舉出醇類(例如,甲醇、乙醇、丙醇、異丙 醇、丁醇、異丁醇、第二丁醇、第三丁醇、戊醇'己醇、 環己醇、苯甲醇類等)、多元醇類(例如,乙二醇、二乙 二醇、三乙二醇、聚乙二醇、丙二醇、二丙二醇、聚丙二 -75- 200903021 醇、丁二醇、己二醇、戊二醇、甘油、己三醇、硫撐二乙 醇等)、多元醇類醚類(例如,乙二醇單甲醚、乙二醇單 乙醚、乙二醇單丁醚、二乙二醇單甲醚 '二乙二醇單甲酸 、二乙二醇單丁醚、丙二醇單甲醚、丙二醇單丁醒、乙二 醇單甲酸乙酸酯、三乙二醇單甲醚、三乙二醇單乙醚、乙 二醇單苯醚、丙二醇單苯醚等)、胺類(例如’乙醇胺、 二乙醇胺、三乙醇胺、N -甲基二乙醇胺、N -乙基二乙醇胺 、嗎啉、N -乙基嗎啉、伸乙基二胺、二伸乙基二胺、三伸 乙基四胺、四伸乙基五胺、聚乙烯亞胺、五甲基二伸乙基 三胺、四甲基伸丙基二胺等)、醯胺類(例如’甲醯胺、 Ν,Ν -二甲基甲醯胺、Ν,Ν -二甲基乙醯胺等)、雜環類(例 如,2 -卩比略院酮、Ν ·甲基-2 _卩比略院酮、環己基π比略院酮、 2 -噁唑酮、1,3 -二甲基-2 -咪哩二酮等)、亞硼類(例如, 二甲基亞碾等)、颯類(例如’環丁颯等)、尿素、乙腈 、丙酮等,特別以醇類、多元醇類、多元醇類醚類爲佳。 &lt;防污層&gt; 具有本發明之防眩性的防反射薄膜爲’最表層設有防 污層爲佳。 本發明的較佳防污層爲’將含氟矽院化合物含於防污 層形成用組成物爲佳,塗佈具有氟烷基或氟烷醚基之矽烷 化合物溶液而製作。特別以含氟矽烷化合物爲矽氮烷或者 烷氧基矽烷時較佳。 又,具有前述氟烷基或氟烷醚基之矽烷化合物中,矽 -76- 200903021 烷化合物中之氟烷基爲,對1個s i原子而言’以1個以 下之比率與s i原子結合,剩餘爲水解性基或者矽氧烷結 合基之矽烷化合物爲佳。 作爲其中所謂的水解性基,例如烷氧基等基’藉由水 解成爲羥基,藉此前述矽烷化合物形成縮聚物。 例如,上述矽烷化合物爲餾去水(視必要存在酸觸媒 )、與副產物的醇類下,一般於室溫〜1 〇〇°c之範圍下進 行反應。藉此烷氧基矽烷(部分)經水解,一部分產生縮 合反應,可得到具有羥基之水解物。水解、縮合之程度可 依據進行反應之水量做適宜調節,本發明中,使用於防污 處理的矽烷化合物溶液中,並未積極地添加水,調製後進 行主要乾燥時,因空氣中的水分等會引起水解反應,稀釋 溶液的固體成分成低濃度後使用爲佳。 較佳的防污層形成用組成物中,具有前述氟烷基之矽 烷化合物如下述一般式(5 )所示,且使用該矽烷化合物 之濃度稀釋至0.01〜5質量%的溶液,進行防污處理。 —般式(5) CF3(CF2)m(CH2)n-Si-(ORa)3 其中,m表示1〜10的整數。η表示0〜10的整數。 Ra表示相同或相異的烷基。 前述一般式(5 )所示化合物中,Ra表示碳原子數爲 3的以下,且僅碳與氫所成之烷基,例如以甲基、乙基、 異丙基等基爲佳。 作爲本發明中較佳的具有氟烷基或氟烷醚基之矽烷化 合物’可舉出 CF3(CH2)2Si(OCH3)3、CF3(CH2)2Si(〇C2H5)3 -77- 200903021 、CF3(CH2)2Si(OC3H7)3、CF3(CH2)2Si(OC4H9)3、 CF3(CF2)5(CH2)2Si(OCH3)3、CF3(CF2)5(CH2)2Si(OC2H5)3、 CF3(CF2)5(CH2)2Si(OC3H7)3、CF3(CF2)7(CH2)2Si(OCH3)3、 CF3(CF2)7(CH2)2Si(OC2H5)3 、CF3 (C F2)7(CH2)2 S i (OC3 H7)3 、CF3(CF2)7(CH2)2Si(OCH3)(〇C3H7h、 CF3(CF2)7(CH2)2Si(OCH3)2OC3H7、 CF3(CF2)7(CH2)2SiCH3(OCH3)2、 CF3(CF2)7(CH2)2SiCH3(OC2H5)2、 CF3(CF2)7(CH2)2SiCH3(OC3H7)2、 (CF3)2CF(CF2)8(CH2)2Si(OCH3)3、 C7F15CONH(CH2)3Si(OC2H5)3 ' CsF!7S02NH(CH2)3Si(0C2H5)3、 C8F17(CH2)2OCONH(CH2)3Si(OCH3)3、 CF3(CF2)7(CH2)2Si(CH3)(OCH3)2、 CF3(CF2)7(CH2)2Si(CH3)(OC2H5)2、 CF3(CF2)7(CH2)2Si(CH3)(OC3H7)2、 CF3(CF2)7(CH2)2Si(C2H5)(OCH3)2、 CF3(CF2)7(CH2)2Si(C2H5)(OC3H7)2、 CF3(CH2)2Si(CH3)(OCH3)2、CF3(CH2)2Si(CH3)(OC2H5)2、 CF3(CH2)2Si(CH3)(OC3H7)2、 CF3(CF2)5(CH2)2Si(CH3)(OCH3)2、 CF3(CF2)5(CH2)2Si(CH3)(OC3H7)2 ' CF3(CF2)20(CF2)3(CH2)2Si(0C3H7)、 C7F15CH20(CH2)3Si(0C2H5)3、C8F17S020(CH2)3Si(0C2H5)3 -78 - 200903021 、C8F17(CH2)2OCHO(CH2)3Si(OCH3)3 等。 作爲上述氟系矽烷化合物,例如可舉出信越化學工業 股份有限公司製KP801M、X-24-9146、GE東芝聚矽氧烷 股份有限公司 XC98-A5382 'XC98-B2472、大金工業(股 )歐普希爾 DSX、Fluoro Technology 製 FG5010 等,作爲 使用於表面處理之化合物,可舉出全氟烷基矽氮烷、全氟 烷基矽烷、或者全氟聚醚基含有矽烷化合物,特別可舉出 全氟烷基三烷氧基矽烷、全氟聚醚三烷氧基矽烷、全氟聚 醚二三烷氧基矽烷。 使用這些矽烷化合物時,未含有氟之有機溶劑稀釋至 0.01〜10質量%,較佳爲0.03〜5質量%,更佳爲0.05〜2 質量%之狀態下使用。 本發明中’雖以使用於調製前述矽烷化合物溶液之未 含氟的有機溶劑爲佳,但亦可舉出以下者。 作爲本發明所使用的防污層用塗佈組成物之溶劑,可 舉出丙二醇單(C1〜C4)烷醚及/或丙二醇單(C1〜C4) 烷醚酯,作爲丙二醇單(C1〜C4)烷醚,可舉出丙二醇單 甲醚(PGME)、丙二醇單乙醚、丙二醇單-n_丙醚、丙二 醇單異丙醚、丙二醇單丁醚等。又,作爲丙二醇單(Cl〜 C4)烷醚酯,特別可舉出丙二醇單烷醚乙酸酯,具體可舉 出丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯等。丙二醇 單(C1〜C4)烷醚及/或丙二醇單(C1〜C4)烷醚酯等、 甲醇、乙醇、丙醇' η·丁醇、2-丁醇、t-丁醇、環己醇等 醇類、甲基乙基酮、甲基異丁基酮、丙酮等酮類、乙酸乙 -79- 200903021 酯、乙酸甲酯、乳酸乙酯、乙酸異丙酯 '乙酸戊酯、丁酸 乙醋等酯類、苯、甲苯、二甲苯等烴類、二噁烷、N,N-二 甲基甲醯胺之其他溶劑等。或這些溶劑可適宜地混合使用 。作爲混合之溶劑,並無特別限定。 作爲特佳溶劑’其爲1種以上選自乙醇、異丙基醇類 、丙二醇、丙二醇單甲醚之有機溶劑。 這些溶劑中’如甲醇、乙醇、異丙基醇類之常壓下沸 點爲未達1 〇 〇 °c之單(低沸點溶劑)、與如丙二醇單甲醚 、η - 丁基醇類之沸點爲! 〇 〇 °C以上的單(高沸點溶劑)倂 用爲佳’特別以沸點爲6 0〜9 8 °C者、與1 〇 〇〜1 6 0。(:者倂用 爲佳。倂用時的低沸點溶劑與高沸點溶劑之比率爲,低沸 點溶劑爲組成物中爲98.0質量。/。以上,高沸點溶劑爲〇.5 〜2質量%時較佳。 本發明所使用的防污層形成用組成物中,添加酸調整 PH爲5 · 0以下後使用爲佳。酸爲促進前述矽烷化合物之水 解,可作爲縮聚合反應之觸媒而作用,故於基材表面容易 形成矽烷化合物之縮聚合膜,而提高防污性。pH以1 . 5〜 5 · 〇之範圍爲佳,1 . 5以下時溶液之酸性過強,恐怕會傷害 容器或配管,或5以上時難以進行反應。較佳爲pH2 _0〜 4.0之範圍。 本發明中,使用於防污處理之矽烷化合物溶液中未積 極地添加水,調製後,於主要乾燥時,藉由空氣中的水分 等引起水解反應者爲佳。因此將溶液的固體成分濃度經稀 釋後使用。於處理液中添加過多水時,會使其適用期減短 -80- 200903021 本發明中可使用硫酸、鹽酸'硝酸、次氯酸、硼酸、 氟酸’較佳爲鹽酸、硝酸等無機酸以外,亦可使用具有磺 基(亦稱爲磺酸基)或殘基的有機酸,例如,可使用乙酸 、聚丙烯酸、苯磺酸、對甲苯磺酸'甲基磺酸等。有機酸 僅爲〗分子内具有羥基與羧基之化合物即可,例如可使用 棒檬酸或酒石酸等經基二羧酸。又,有機酸以水溶性酸者 爲更佳’例如除上述檸檬酸或酒石酸以外,亦可使用乙酿 丙酸、甲酸、丙酸、蘋果酸、琥珀酸、甲基琥珀酸、富馬 酸、草醯乙酸、丙酮酸、2 -酮己二酸、二醇酸、D·甘油酸 、D -葡糖酸、丙二酸、馬來酸、草酸、異檸檬酸、乳酸等 。又,亦可使用安息香酸、經基安息香酸、阿托酸等。 添加量對於前述矽烷化合物之部分水解物1 0 0質量份 而言爲〇·1質量份〜1〇質量份,較佳爲0.2質量份〜5質 量份。又,對於水的添加量而言’部分水解物於理論上可 得到1 0 0 %水解之量以上即可,添加1 0 0 %〜3 0 0 %相當量, 較佳爲添加1 〇 〇 %〜2 0 0 %量。 藉由使用含氟之矽烷化合物,不僅於防污層之低折射 率化及賦予撥水•撥油性之觀點來看爲較佳,且其耐傷性 高,具有薄膜彼此的結塊問題上亦爲特優之效果。 &lt;背塗佈層&gt; 本發明的防反射薄膜中’設有成爲透明基材之纖維素 酯薄膜的活性能量線硬化樹脂層的反面上設有背塗佈層時 -81 - 200903021 爲佳。背塗佈層爲,欲矯正設有活性能量線硬化 其他層所產生的捲曲而設置者。即,將設有背塗 成爲内側並使其具有彎曲之性質下可平衡彎曲情 背塗佈層較佳爲塗佈設置成可兼具結塊防止層, 塗佈層塗佈組成物中可添加具有結塊防止功能之 佳。 作爲添加於背塗佈層之微粒子的無機化合物 舉出二氧化矽、二氧化鈦、氧化鋁、氧化銷、碳 酸鈣、滑石、黏土、燒成陶土、燒成矽酸鈣、氧 化銦、氧化鋅、IT 0、水和矽酸鈣、矽酸鋁、矽 酸鈣。微粒子爲含有矽者因霧値較低而較佳,特 化矽爲佳。 這些微粒子,例如可使用 AerosilR972、 R974 、 R812 、 200 、 200V 、 300 、 R202 、 0X50 、 以上日本Aerosil (股)製)之商品名。氧化锆 ’例如可使用 AerosilR976及R811 (以上日本 股)製)之商品名。作爲聚合物之例子,可舉出 樹脂、氟樹脂及丙烯基樹脂。以聚矽氧烷樹脂爲 爲具有三次元的網狀結構者爲佳,例如可舉出 103、同 105、同 108、同 120、同 145、同 3120 (以上東芝聚矽氧烷(股)製)之商品名。 其中以 Aerosil200V、AerosilR9 72V 可保持 ’而具有結塊防止效果,故爲特佳。本發明所使 射薄膜爲,活性能量線硬化樹脂層之裏面側的動 樹脂層或 佈層之面 況。且, 此時,背 微粒子爲 例子,可 酸鈣、碳 化錫、氧 酸鎂及磷 別以二氧 R972V 、 TT600 ( 之微粒子 Aerosil ( 聚矽氧烷 佳,特別 Tospearl 及同240 較低霧値 用的防反 摩擦係數 -82- 200903021 爲0 · 9以下,特別以〇 · 1〜〇 · 9者爲佳。 含於背塗佈層之微粒子,對於膠黏劑而言以( 質量%爲佳,〇. 1〜10質量%爲較佳。設有背塗佈層 値之增加以1%以下爲佳,0.5%以下爲較佳,0.0〜 特佳。 背塗佈層,具體爲塗佈含有溶解纖維素酯薄膜 或經膨潤之溶劑的組成物而進行。作爲所使用的溶 其溶解之溶劑及/或使其膨潤之溶劑的混合物以外 有其他使其未溶解的溶劑之情況,可使用將此依據 脂薄膜之捲曲程度或樹脂種類以適當比率混合之組 塗佈量進行。 欲強化捲曲防止功能時,使所使用的溶解於溶 的溶劑及/或使其膨潤之溶劑的混合比率變大,使 解的溶劑的比率變小時可得到效果。該混合比率較 用(使其溶解之溶劑及/或使其膨潤之溶劑):( 溶解之溶劑)=1 〇 : 〇〜1 : 9。作爲含於如此混合組 使透明樹脂薄膜溶解或膨潤的溶劑,例如可舉出二 丙酮、甲基乙基酮、Ν,Ν-二甲基甲醯胺、乙酸甲基 乙酯、三氯伸乙基、二氯甲烷、伸乙基氯化物、四 、三氯乙烷、氯仿等。作爲未使其溶解之溶劑,例 醇、乙醇、η -丙基醇類、i -丙基醇類、η -丁醇、環 烴類(甲苯、二甲苯)等。 將這些塗佈組成物使用凹版塗佈機、浸漬塗佈 塗佈機、線圈棒塗佈機、塑模塗佈機、或噴霧塗佈 I · 1 〜5 0 時的霧 〇. 1 % 爲 的溶劑 劑,使 ,亦含 透明樹 成物及 劑組成 其未溶 佳爲使 未使其 成物且 噁烷、 、乙酸 氯乙烷 如有甲 己醇或 機、逆 、噴射 -83- 200903021 塗佈等,於透明樹脂薄膜的表面上塗佈至濕膜厚1〜 100 μιη爲佳,特佳爲5〜3Mm。作爲背塗佈層的膠黏劑所 使用的樹脂’例如可舉出氯化乙烯-乙酸乙烯共聚物、氯 化乙烯樹脂、乙酸乙烯樹脂、乙酸乙烯與乙烯醇類之共聚 物、部分經水解之氯化乙烯·乙酸乙烯共聚物、氯化乙烯-氯化亞乙烯共聚物、氯化乙烯·丙烯醯基共聚物、伸乙基 乙烯醇類共聚物、氯化聚氯化乙烯 '乙烯-氯化乙烯共聚 物、乙烯-乙酸乙烯共聚物等乙烯系聚合體或共聚物、硝 基纖維素、纖維素乙酸酯丙酸酯(較佳爲乙醯基取代度 1.8〜2.3、丙醯基取代度0.1〜1.0)、二乙醯基纖維素、 纖維素乙酸酯丁酸酯樹脂等纖維素衍生物、馬來酸及/或 丙烯酸之共聚物、丙烯酸酯共聚物、丙烯醯基·苯乙烯共 聚物 '氯化聚乙烯、丙烯醯基·氯化聚乙烯苯乙烯共聚物 、甲基甲基丙烯酸酯-丁二烯苯乙烯共聚物、丙烯基樹脂 、聚乙烯縮醛樹脂、聚乙烯丁縮醛樹脂、聚酯聚尿烷樹脂 、聚醚聚尿烷樹脂、聚碳酸酯聚尿烷樹脂、聚酯樹脂、聚 醚樹脂、聚醯胺樹脂、胺基樹脂、苯乙烯丁二烯樹脂、丁 二烯丙烯醯基樹脂等橡膠系樹脂、聚矽氧烷系樹脂、氟系 樹脂等’但不限定於此。例如’作爲丙烯基樹脂可適用選 自 ACRYPET MD、VH、MF ' V (三菱 Rayon (股)製) 、亥巴錄 M-4003、M-4005、M-4006 &gt; M-42 02 ' M-5 000 ' M-5 00 1、M-4 5 0 1 (根上工業股份有限公司製)、台亞那 路 BR-50 ' BR-52、BR-53、BR-60、BR-64 ' BR-73、BR-75、BR-77、BR-79、BR-80、BR-82、BR-83、BR-85 、 -84- 200903021 BR-87 ' BR-88、BR-90 ' BR-93、BR-95、BR-100、 101、BR· 1 02、BR· 1 05、BR-1 06、BR-1 07、BR-1 08、 112、BR-113、BR-115、BR-116、BR-1I7、BR-118 三菱Rayon (股)製)之丙烯基及甲基丙烯酸系單體 原料所製造之各種均聚物、以及共聚物等。 特佳爲如二乙醯基纖維素、纖維素乙酸酯丙酸酯 維素系樹脂層。 塗佈設置背塗佈層的順序,可爲塗佈纖維素酯薄 活性能量線硬化樹脂層前或之後,但背塗佈層爲可兼 塊防止層時,於前塗佈設置爲佳。或亦可分爲2次以 行背塗佈層之塗佈。 前述低折射率層所說明之BYK Japan公司製的界 性劑BYK系列、GE東芝聚矽氧烷公司製之二甲基聚 烷系列亦可使用於低折射率層以外之防反射層。 &lt;表面處理&gt; 形成上述本發明之相關防眩層後,該防眩層之表 進行表面處理,於進行該表面處理的防眩層表面上形 反射層(低折射率層或高折射率層)爲佳。又,設置 層前於低折射率層進行表面處理亦佳。 表面處理可舉出洗淨法、鹼處理法、火焰電漿處 、高頻率放電電漿法、電子束法、離子束法、濺射法 處理、電暈處理法、大氣壓發光放電電漿法等,較佳 處理法、電暈處理法,特佳爲鹼處理法。所謂電暈處 BR- BR- 等( 作爲 之纖 膜之 具結 上進 面活 砂氧 面上 成防 防污 理法 、酸 爲驗 理爲 -85 - 200903021 ,大氣壓下,電極間外加1 k v以上之高電壓’ 處理,可使用春日電機(股)或(股)Toy〇 賣的裝置進行。電暈放電處理之強度取決於電 每單位面積之出力、發生器之頻率數。電暈處 方電極(A電極)可使用販賣品’材質可選自-- CI -40- R) '0-(CxH2x-0)n-R2 aryl, carbon number>~6 200903021 carbitol, propylene glycol monomethyl ether and other glycol ethers; N-methyl spit | An ester such as carbamide, methyl lactate, ethyl lactate, methyl acetate or amyl acetate; an ether such as dimethyl ether or diethyl ether may be used singly or in combination of two or more. In the ink liquid member solvent for a low refractive index layer used in the present invention, at least one type of solvent having a boiling point of 140 to 250 ° C is 1 to 15 mPa·s, and the content thereof is a solid residue. More than 60% by mass is preferred. It is preferred that at least one or more (3) to 230 ° C and a viscosity at 25 ° C of 1 to i 〇 mpa.s are preferably used. The reason for this is that it is desirable that the solvent contained in the low-fold liquid composition described above can be quickly volatilized and dried at the extent of transfer printing or the shape of the daddy pattern, but the adhesion to the bottom portion is deteriorated when the circumference is old. And the low formation is easy to produce uneven drying. The so-called boiling point of the present invention is 1 gas pressure, i.e., the boiling point at a pressure of 丨.0 i 3 . A well-known technique can be applied to the measurement of the boiling point. For the case of the body, it can be referred to the compound described in the literature, such as the chemistry manual, and the compound having the above boiling point and viscosity, and the compound shown by the following formula is preferred. General formula (3) R丨, R2: a hydrogen atom, an alkyl group, an alkylcarbonyl group. The tobacco chain can be straight or branched. However, one less substituent is a hydrogen atom. η : an integer of 1 to 3, a pyrrolidone, a second, an ethyl acetate water, etc., in which the above-mentioned viscosity at 25 ° C, the mass i] has a boiling point of 18 0, and the content is 7 〇. It is expected that the refractive index layer capacity X105N/m2 is other than the above-mentioned range, and the integer of 3Φ (3: base, alkoxy Ri, R2 to -41 - 200903021 χ : 2 to 4 is more preferably x In the preferred solvent to be used for the ink of the present invention, the following solvents are specifically exemplified, but the solvent is not particularly limited. [Table 1] Solvent type viscosity 7? (mPa · s) Boiling point (°c) Isobutyric acid 1.2 155 Cyclohexanone 1.8 156 N-methylethanolamine Alias: 2-methylamine ethanol 10.0 159 4-hydroxy-4-methyl-2-pentanone 2.5 168 N-A Base acetamide 1.7 180 acetonitrile ethyl acetate 1.5 181 butyl lactate 3.2 185 dimethyl amide mill 2.0 189 1-octanol 8.0 195 N-methylpyrrolidone 1.7 202 r - butyrolactone 1.7 204 benzyl alcohol 5.0 205 N _Methylacetamide 2.5 206 3,5,5-trimethyl-2-cyclohexen-1-one Alias: isophorone 2.4 213 η-sterol 13.0 214 1,3-dimethyl-2 -imidazoledione 1.9 226 3-Dibutylamine Ethanol 6.0 229 2-Pyrrolidone 13.3 245 Further, the compound represented by the above formula (3) is specifically, but not limited thereto. -42 - 200903021 [Table 2] Compound of formula (1) 11 X R1 R2 viscosity 7? (m P a · s ) boiling point (°c) ethylene glycol monoethyl ether acetate alias: 2-ethoxyethyl acetate 1 2 c2h5 COCH3 1.0 156 B Diol diacetate alias: divinyl acetate 1 2 coch3 COCH3 2.8 190 ethylene glycol monobutyl ether acetate alias: 2-n-butoxyethyl acetate 1 2 C4H9 COCH3 1.5 192 diethylene glycol single Butyl ether acetate alias: 2-(2·η-butoxyethoxy)ethyl acetate 2 2 C4H9 COCH3 3.0 247 Ethylene glycol monobutyl ether 1 2 C4H9 H 3.2 171 Diethylene glycol ethyl methyl Ether 2 2 c2h5 ch3 1.0 179 Diethylene glycol diethyl ether 2 2 C2H5 C2H5 1.2 188 Diethylene glycol monomethyl ether 2 2 ch3 H 3.5 194 Diethylene glycol monoethyl ether 2 2 C2H5 H 3.7 202 II Ethylene glycol monobutyl ether 2 2 C4H9 H 6.0 231 Diethylene glycol monomethyl ether 3 2 ch3 H 7.0 245 Propylene glycol monomethyl ether acetate 1 3 ch3 COCH3 1.1 146 Dipropylene glycol monomethyl ether 2 3 c H3 H 3.3 189 Tripropylene glycol monomethyl ether 3 3 ch3 H 6.2 243 In addition to the above, ethylene glycol monoisopropyl ether, ethylene glycol mono-t-butyl ether, diethylene glycol monopropyl ether, diethyl Glycol monoisopropyl ether, diethylene glycol mono-t-butyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monoisopropyl ether, propylene glycol monobutyl ether, propylene glycol mono-t-butyl ether, dipropylene glycol monoethyl ether , dipropylene glycol monopropyl ether, dipropylene glycol monoisopropyl ether, dipropylene glycol monobutyl ether, ethylene glycol monoisopropyl ether acetate, ethylene glycol mono-t-butyl ether acetate, diethylene glycol monomethyl Ether acetate, diethylene glycol monopropyl ether acetate, diethylene glycol monoisopropyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene di-43 - 200903021 alcohol Monoisopropyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol mono-t-butyl ether acetate, dipropylene glycol monoethyl ether 'dipropylene glycol monopropyl ether' dipropylene glycol monoisopropyl ether, ethylene glycol monomethoxy Methyl ether, diethylene glycol monoethyl ether acetate (alias: 2-(ethoxyethoxy)ethyl acetate), triethylene glycol dimethyl ether 'diethylene glycol diacetic acid , Propylene glycol diacetate (alias: Shu, 2-acetoxy-propane), a propylene glycol dimethyl ether, dipropylene glycol monomethyl ether acetate. A suitable solvent for the boiling point and viscosity of the glutinous agent may be mixed, and the film thickness of the low refractive index layer may be controlled by appropriately changing the ratio. The viscosity of each solvent can be measured by using biscomend VM-1G (manufactured by Yamato Electric Co., Ltd.). After the ink solution for the low refractive index layer is applied, it is irradiated with active light such as ultraviolet rays or electron beams, or hardened by heat treatment, but the ink containing the thermosetting resin or the active light curing resin is used as a minute. After the droplets are deposited on the substrate, it is preferred to heat the droplets immediately or to cure them with active light. Immediately after the heating or the irradiation of the active light, the ink is behind the substrate, and immediately after heating or irradiation within ~5 minutes, the film thickness of the low refractive index layer is made uniform. When the ratio of the low refractive index layer film thickness hd 1 ' formed in the concave portion to the low refractive index layer film thickness hd2 formed in the concave portion satisfies the above relationship, it is preferably performed in 0.1 second to 1 minute, and 0.1 second is performed. It is better to do it within ~30 seconds. It is especially good for 1 second to 1 second. In the present invention, the ink droplets which form the low refractive index layer can be dropped by spraying in any period in which the antiglare layer applied to the transparent substrate is in an unhardened state of -44 - 200903021 or completely cured. When the antiglare layer is semi-treated (semi-hardened state), when the ink droplets are dropped and the low refractive index layer is formed, it is excellent not only in productivity but also in improving the adhesion between the antiglare layer and the low refractive index layer. In other words, the low refractive index layer of the present invention can impart a surface uneven shape without impairing the fine uneven shape which exhibits the antiglare property of the antiglare layer. The arithmetic mean surface roughness Ra of the surface of the low refractive index layer is preferably in the range of 0_05μηι~Ι.ΟΟμηι, preferably in the range of Ο.ΙΟμηι~0·50μηι. <<Anti-glare layer>> The anti-glare layer of the present invention reduces the visibility of the reflected image by blurring the image contour reflected on the surface, and can reduce the use of an image display device such as a liquid crystal display, an organic EL display, or a plasma display. Reflection of the reflected image. This property can be possessed by providing appropriate irregularities on the surface of the film. As a method of forming such irregularities, processing for a transparent substrate, processing of a hard coat layer provided on a transparent substrate, processing of an antireflection film after applying an antireflection layer, or the like may be selected, but antireflection In the processing of the film, the convex portion of the uneven shape breaks through the antireflection layer, and the antireflection layer is deformed to impair the reflection preventing effect. Therefore, in the present invention, the processing of the transparent substrate and the processing of the hard coating layer are preferred, and the present invention Preferably, the processing of the hard coat layer is preferred as the so-called uneven structure of the present invention, which is selected from the group consisting of a straight cone, -45-200903021 oblique cone, pyramid, oblique cone, wedge, convex polyhedron, hemisphere Structures such as shapes, and structures having the shape of these portions. Further, the hemispherical shape of the surface does not have to be a true spherical shape, an elliptical shape, or a deformed convex curved shape. Further, the ridgeline of the uneven shape has a prism shape extending in a line shape, a lentlcular lens shape, and a Fresnel lens shape. The slope from the ridgeline to the valley line may be planar, curved, or a composite shape of the two. The method of forming the uneven shape on the surface of the hard coat layer or the transparent substrate to be described later, for example, the following method can be mentioned. (1) A method of imparting a shape to a roll after forming a negative shape as a target shape on a roll or a master. (2) A method in which a thermosetting resin is impregnated into a negative type after being formed into a negative shape as a target shape on a roll or a master, and is subjected to self-negative peeling after heat curing. C 3) After forming a negative shape as a target shape on a roll or a master, an ultraviolet ray or an electron beam hardening resin is applied, and after the recess is filled, the resin liquid is applied to the intaglio plate to cover the transparent support to irradiate the ultraviolet ray or the electron line. A method of peeling off a resin whose hardening is adhered to a transparent support to which it is adhered. (4) A solvent casting method in which a negative shape of a target shape is formed after a casting belt is formed, and a desired shape is imparted at the time of casting. (5) A method in which a resin which is cured by light or heat is subjected to relief printing on a transparent substrate, and is cured by light or heat to form irregularities. (6) A method in which a resin which is cured by light or heat on a surface of a transparent support is printed by a jetting method, and is cured by light or heat to have a surface of the transparent support having an uneven shape. -46- 200903021 (7) A method of cutting a surface with a work machine or the like. (8) A method in which particles of various shapes such as a sphere and a polygonal body are pressed into a semi-buried surface on the surface of a transparent support to be integrated, and the surface of the transparent support has an uneven shape. (9) A method in which fine particles of various shapes such as spheres and polyhedrons are dispersed in a small amount of an adhesive and applied to the surface of a transparent support to make the surface of the transparent support have a concave convex shape. (10) A method in which an adhesive is applied to a surface of a transparent support, and particles of various shapes such as a sphere or a polyhedron are scattered thereon to make the surface of the transparent support have a concavo-convex shape. In the present invention, it is preferred to form the uneven shape of the hard coat layer by (6) and (9). First, a method of forming the uneven shape of the (9) antiglare layer constituting the antireflection film of the present invention will be described. &lt;Preparation of anti-glare layer using fine particles&gt; The anti-glare layer used in the present invention has a fine uneven shape formed by containing fine particles in the hard coat layer, and has an average particle diameter of 0 〇丨μηι 4 μm μm as follows. It is preferred that the microparticles are contained in the hard coat layer. Hereinafter, the antiglare layer is also referred to as an antiglare hard coat layer. (Particles contained in the anti-glare hard coat layer) As the particles contained in the anti-glare hard coat layer, for example, inorganic or organic fine particles can be used. -47 - 200903021 Examples of the inorganic fine particles include cerium oxide, titanium oxide, aluminum oxide, tin oxide, zinc oxide, calcium carbonate, barium sulfate, talc, and clay 'calcium sulfate. Further, examples of the organic fine particles include polymethacrylic acid methacrylate resin fine particles 'acryl styrene resin fine particles, polymethyl methacrylate resin fine particles, lanthanum resin fine particles, and polystyrene resin fine particles. Polycarbonate resin fine particles, benzoguanamine-based resin fine particles, melamine-based resin fine particles, polyolefin-based resin fine particles, polyester-based resin fine particles, polyamide-based resin fine particles, polyamidene-based resin fine particles, or polyfluoride Ethylene resin fine particles and the like. In the present invention, in particular, cerium oxide microparticles or polystyrene resin microparticles are preferred. The inorganic or organic fine particles described above are preferably used after adding a coating composition such as a resin used for the production of the antiglare hard coating layer. Further, the average particle diameter of the fine particles is preferably Π. Πμηι 4 μηι, preferably Ο.ΟΙμηα 〜3μηι. In the anti-glare hard coat layer used in the present invention, the anti-glare property is imparted to the inorganic The content of the organic fine particles is preferably from 0 to 1 part by mass to 30 parts by mass, more preferably from 0.1 to 20 parts by mass, per 100 parts by mass of the resin for producing the antiglare hard coat layer. The anti-glare effect 'use of the fine particles having an average particle diameter of 〇μ m to 1 μm' is preferably 1 part by mass to 15 parts by mass per 100 parts by mass of the resin for producing the anti-glare hard coat layer. Two or more kinds of fine particles having different average particle diameters can be used. (Arithmetic average surface roughness (Ra) of the anti-glare hard coat layer - 48 - 200903021 The anti-glare hard coat layer used in the present invention is When the surface has a fine uneven shape, as described above, the fine particles which are appropriately selected are added, and the unevenness of the outermost surface of the antireflection layer provided on the antiglare hard coat layer is an arithmetic mean surface roughness defined by JIS B 060 1 Degree (Ra) is 〇.05 μηι~ Ι.ΟΟμηι (fine irregularities of the anti-glare hard coat layer) The fine unevenness on the surface of the anti-glare hard coat layer used in the present invention can be adjusted by the amount of fine particles added, the particle diameter, and the film thickness described above. The anti-glare hard coat layer having a better unevenness is obtained. Further, the fine unevenness on the surface of the anti-glare hard coat layer used in the present invention is formed to have 5 to 20 adjacent concave bottoms per 100 μm 2 The fine structure of the convex portion having a height of 〇.5 μηι to 2 μηι is preferable. The fine unevenness of the surface of the anti-glare hard coating layer can be obtained by a commercially available stylus type surface roughness measuring machine or a commercially available optical interference type. The measurement is performed by a surface roughness measuring machine, etc. For example, an optical interference type surface roughness measuring machine performs a two-dimensional measurement of the unevenness in a range of about 4000 μm (55 μm χ 75 μηι), and the unevenness is represented by a bottom side contour line in different colors. The number of convex portions having a height of 〇.5μη!~ 2 μηι with the height of the adjacent bottom as a reference was calculated, and the number of areas of 毎100 μm 2 was calculated. The measurement was performed for each anti-glare antireflection film 1 m2. In addition, the surface of the anti-glare hard coat layer of the present invention has a height of 0.2 μm or more based on a surface average level of 80 or more per 100 μm 2 . For the fine structure, the same optical interferometer surface roughness measuring machine is used for the fine structure, and the second dimension of the unevenness is measured for the range of about 4000 μm 2 (55 μηιχ75 μηη), and the portion which does not reach the average level , the average level or higher ~ the height is less than 〇 · 2 μηη part, the degree is 0 · 2 μη) or more is distinguished by at least three or more color areas 'calculation height 〇. 2μπι or more becomes the convex part , can represent the number of areas per ΙΟΟμπι2. (Average valley spacing of fine concavities and convexities on the surface of the anti-glare hard coat layer) The anti-glare hard coat layer used in the present invention preferably has an average valley interval of fine irregularities on the surface of Ιμηι to 80 μιη, more preferably 10 gm. 4 (^m. where 'the shape of the fine concavo-convex structure can be measured by a stylus type surface roughness measuring machine, etc.', for example, the tip end of the diamond can be placed between the measuring needle having a conical angle of 5 mm and a conical diameter of 1 mm. The fine uneven structure surface is scanned at a length of 3 mm in a predetermined direction, and the change in the vertical direction of the measuring needle at this time is measured, and the surface roughness curve is recorded. Alternatively, the optical interference surface can be obtained by the above. The measurement is performed by a thickness measuring machine. The average valley spacing is such that the unevenness change in the surface roughness curve is based on a minute portion (a portion close to a flat portion), and the unevenness of the surface roughness curve is used as a convex portion. The baseline of the evaluation, the height of the convex portion of the reference line is taken as the center line, and the surface roughness curve is the intersection point from the bottom to the top through the center line (or from top to bottom). The average distance between the intersections can be defined. (Refractive index of the anti-glare hard coating layer) -50- 200903021 The refractive index of the anti-glare hard coating layer used in the present invention is obtained from a low-reflection film. The optical design is preferably a refractive index of 1.5 to 2. 〇, particularly preferably 1.6 to 1.7. The refractive index of the anti-glare hard coating layer can be increased by adding fine particles or inorganic main materials ( Modification of the refractive index or the content of the matrix (the thickness of the anti-glare hard coat layer) The dry film thickness of the anti-glare hard coat layer is 0.5 μm from the viewpoint of imparting sufficient durability and impact resistance. The range of ~1 5 μηη is preferably more preferably 3 ΙΟμηι, preferably 5 ΙΟμηι. (Irrigation of the anti-glare hard coating layer) To obtain the effect described in the present invention (contrast upward), anti-glare The haze of the hard coating layer is preferably from 5% to 40%, more preferably from 6% to 30%, wherein the haze measurement can be determined in accordance with ASTM-D 1 003-52. The smog of the anti-glare hard coat layer is adjusted to a preferred range, and the organic fine particles and/or inorganic fine particles described above are contained. It is preferable that the anti-glare hard coat layer is preferable, and it is preferable that the cerium oxide can be easily uniformly dispersed. Further, it is preferable to use a surface treated by an organic substance such as cerium oxide. The coating layer is preferably an active light-curing resin such as ultraviolet light used in the low refractive index layer or a thermosetting resin as an adhesive. Further, the photopolymerization initiator and the photosensitizer are contained in the same manner. UV-absorbing -51 - 200903021 It is preferred to use a solvent, an antioxidant, a surfactant, etc. The solvent for applying the anti-glare hard coating layer can be, for example, a suitable type, an alcohol, a ketone, an ester, or a second. It is preferably used together with an alcohol ether or another solvent, preferably containing propylene glycol mono (C1 to C4) or a pg (C 1 - C4 ) alkyl ether ester in an amount of 5 mass% or more, more preferably 5 mass% or more. Solvent. As a coating method of the anti-glare hard coat layer coating liquid, the coater 'rotary coater, coil bar coater, roll coater, machine, and extrusion coater' can be applied by air knife coating. A well-known method such as a machine. The coating amount is suitably a wet film thickness of 5 μm to 30 μm, preferably 20 μm. The coating speed is preferably from 10 m/min to 60 m/min. After the composition of the anti-glare hard coating layer is coated and dried, it is preferably subjected to hardening treatment by irradiation with an active energy ray such as an ultraviolet ray, and the irradiation time of the above-mentioned measuring line is preferably 0.5 second to 5 minutes, and is preferably made of an ultraviolet resin. From the viewpoints of hardening efficiency and work efficiency, it is preferably 1 second to 2 seconds. &lt;Preparation of an anti-glare layer using a jetting method&gt; In the present invention, it is preferable that the transparent substrate is formed by a scattering method to form an unevenness antiglare layer. And 'further forming a convex portion in a sprayed manner on the transparent substrate or the S layer of the tree in advance, 'the anti-glare layer coated with the transparent portion is coated with a transparent line to achieve higher anti-glare property. Therefore, the anti-glare layer used in the present invention is formed by forming a fine convex portion in a transparent substrate spray method, and the diameter of the convex portion is from 5 to 40, which is selected from a hydrocarbon or a mixed glycol. Cloth 1 Ο μ m ~ line or electroactive sclerosing minute is the part of the hardening resin as the best. The upper part is -52-200903021 The height is 2~ΙΟμιη's convex part' and is formed under the convex part The transparent resin layer is preferred. The arithmetic mean surface roughness Ra of the anti-glare layer is preferably in the range of 〇. 〇5 μηι 〜Ι.ΟΟμίΏ, preferably in the range of 0_ι〇μηι~〇.50μηι. The formation of the portion is preferably carried out by means of a spray pattern using the following patterning method. Secondly, 'the convex portion is hardened by active light or heating,' by microgravure method, extrusion coating method, coil bar Method, spray coating method - flexographic printing method A film uniform coating method such as a uniform coating method is applied to uniformly apply a transparent resin layer. Fig. 6 is a view showing a convex portion of the present invention and a pattern covered by a transparent resin layer. Fig. 7 shows a preferred fine uneven structure of the present invention. (a) is a cross-sectional view showing a convex portion formed on a transparent base film covered with a transparent resin layer; (b) showing a cured resin film as described later on the transparent base film, and further arranging the convex portion, A cross-sectional view of the transparent resin layer. The apparatus used for forming the projection of the convex portion of the anti-glare layer can be preferably used in the item of the low refractive index layer. In the present invention, a fine uneven structure is formed as The ink droplets are preferably 0.1 to 20 pl, 0.5 to 10 pl is preferred, and 0.5 to 5 pl is particularly preferred. Further, the ink of each of the different droplet amounts can be ejected from the dissimilar ejection head, or can be changed by the same ejection head. The amount of liquid droplets is ejected, and the discharge interval may be random at a certain interval. The convex portion has a convex diameter of 1 5 to 40 μm, preferably 1 5 to 3 0 μm -53 - 200903021 , the height of the convex part is 2~ΙΟμ ι' is preferably a certain size and height of 2~8μηη. The configuration of the convex portion is preferably performed by means of FM screening, etc. The so-called convex diameter is 'the diameter of the convex portion is circular It is expressed as a diameter in which the triangle, the square, and the polygon are 'conformed' in the same area. The height of the convex portion is the height difference from the highest point of the dot on the surface of the base film. The so-called F Μ screening method is , dot (dot) and dot spacing, that is, modulate the frequency (frequency), the frequency of the basic point (point density) is expressed in shades. FM reselection method can also be called random Screening method or random (st 〇chastic) • Screening method. The so-called F M screening method is a method of adjusting the periodicity by the point-to-point spacing. Specifically, there are known crystals, sleeves, and accessories (Agfa-Gevaert), diamonds, Linotype Hell, grades and screening methods, and FU LLT ON E. Shopping method (Sytecs), Velvet ·Screening method (Ugula Cohan Company) 'Acutone · Screening method (Daini company), negative point (d〇t) · Residual method (USA. Color company), Clear. Shop selection method (Xicala Company), monette·decoration method (Barco company), etc. The rule systems produced by these methods (d〇t) are different, but they are all methods that can express the shade by the change of dot density, and can be used as various types of F Μ screening method. The size of the dot (d 〇 t ) on the ink dot in the F Μ 33 33⁄4 is constant, and the frequency of occurrence of the dot (d 〇 t ) is changed in accordance with the image density. The size of each point selected by F is smaller than the so-called dot, so that the necessary pattern can be reproduced with high decomposition energy. The dot in the FM screening is different from the so-called dot, and the arrangement of the dots is not periodic. In the FM screening, the dot arrangement is characterized by a non-period -54-200903021 property, so that it does not produce a moire. For the liquid composition of the ink for forming the convex portion and the transparent resin layer to be used for the formation of the antiglare layer, an active light curing resin or a thermosetting resin described in the item of the low refractive index layer can be preferably used. Further, it is preferable to contain a photopolymerization initiator, a photosensitizer, an ultraviolet absorber, an antioxidant, a surfactant, and the like. The solid content concentration of the active light-curing resin in the liquid composition of the ink liquid and the transparent resin layer is preferably from 10 to 95% by mass, and the optimum concentration can be selected by a coating method or the like. The dry film thickness of the antiglare layer by the spray method is preferably from 3 to 15 μm, more preferably from 5 to 1 μm, based on the maximum height of the antiglare layer of the transparent substrate. When the pressure is less than 3 μη, the anti-glare property may be insufficient, and satisfactory hardness may not be obtained depending on the case. Further, when it exceeds 15 μm, the film resistance in the film properties is remarkably deteriorated, and when the treatment such as transportation or cutting after the formation of the antiglare layer, slight tortuosity is easily generated to reduce productivity. The dry film thickness is measured in accordance with a conventional method by micrometer measurement or by microscopic observation analysis of a film section. When the thickness of the transparent resin layer of the present invention is made of an active light hardening resin or a thermosetting resin, the desired dry film thickness can be obtained by adjusting the ratio of the solid content of the resin to the solvent of the resin. The viscosity of the ink droplets forming the convex portion is preferably 2 to 15 mP · s at 25 ° C, more preferably 5 to 10 mp · s. When the viscosity is less than 2 mP · s ‘ Because the viscosity is too low, the shape of the desired shape cannot be obtained. When the viscosity exceeds 15 m P · s, the fluidity of the ink is deteriorated, and the ink ejection property is also lowered. Ink-55-200903021 A solvent such as a low refractive index layer can be used as a solvent for the transparent resin layer of the present invention, methanol, ethanol, 1-propanol, 2-propanol, butanol, etc. Alcohols; ketones such as ethyl ketone 'cyclohexanone; decylamines such as N-methylpyrrolidone and di-dimethylacetamide; aromatic hydrocarbons such as ketone alcohols such as diacetone alcohols and xylene Polyethylene glycol, polypropylene glycol; ethylene glycol, propylene glycol, butanediol, triethylene glycol, thiodiethanol, hexanediol diol, diethylene glycol, etc. 2~6 carbon atoms Alkanediols; ethyl cellosolves 'butyl carbitol, butyl carbitol, diethyl cellosolve, diethylene glycol monomethyl ether and other glycol ethers; cellosolve acetate, diethyl A glycol ester such as an acetate; an ester such as methyl lactate, ethyl lactate, ethyl acetate or pentyl acetate; dimethyl ether or diethyl ether; these may be used alone or in combination of two or more. Further, the molecules are particularly excellent, and glycol ethers are also preferred. Specific examples of the glycol ethers include the following solvents. Examples thereof include propylene glycol monomethyl ether, propylene glycol monoethyl ether, propane diethylene glycol dimethyl ether, ethylene glycol monomethyl ether 'ethylene glycol monochadiol monobutyl ether, ethylene glycol monoethyl ether, and ethylene glycol single Ether diethyl ether or the like, wherein Ac represents an acetate. The transparent resin layer of the present invention contains a polyoxyalkylene oil, a modified oil, a polyoxyalkylene-based surfactant, a fluorine-based surfactant, a fluorine-based oligomer, a fluorine-denatured polyoxyalkylene oil, and a fluorine-based decane-based agent. 〇. 〗 〖% by mass or more of 5% by mass or less. Agent. Examples thereof include acetone and methylmethylformamide; polyalkylenes such as benzene and methyl glycol; and 1,2,6-hexylalkyl group containing cellosolve, ethyl carbitol, and diol monoethyl ether; The ether bond in the acid methyl group, the ether group, the water or the like is not particularly limited, and the alcohol monobutyl ether, the 3 ether Ac, the ethyl Ac, the ethylene glycol polysiloxane, the fluorine resin coupling agent, etc. - 56-200903021 In the middle of the convex portion and the transparent resin layer, an antistatic agent such as conductive fine particles such as Sn02, ITO or ZnO or crosslinked cationic polymer particles is contained. In the present invention, it is preferred to add an antistatic agent to the transparent resin layer. In the present invention, fine particles are contained in the convex portion and the transparent resin layer, and for example, inorganic fine particles or organic fine particles may be added. Examples of the inorganic fine particles include a compound containing cerium, cerium oxide, aluminum oxide, zirconium oxide, calcium carbonate 'talc, clay, calcined clay, calcined calcium citrate, water and calcium citrate, and aluminum citrate. Magnesium citrate and calcium phosphate are preferred, and an inorganic compound or an oxidized pin containing cerium is more preferred, but cerium oxide is particularly preferred. These include spherical particles, a flat plate shape, and an amorphous shape. As the fine particles of cerium oxide, for example, Aer〇SilR972, R972V, R974, R812, 200, 200V, 300, R202, 0X50, TT6 00 (manufactured by Japan Aerosil Co., Ltd.) can be used. As the fine particles of zirconia, for example, commercially available products such as Aerosil R976 and R81 1 (manufactured by Japan Aerosil Co., Ltd.) can be used. Further, examples of the organic fine particles include polymethacrylic acid methacrylate resin fine particles, acryl-based styrene resin fine particles, polymethyl methacrylate resin fine particles, fluorene-based resin fine particles, polystyrene-based resin fine particles, and polycondensation. Carbonate resin fine particles, benzoguanamine-based resin fine particles, melamine-based resin fine particles, polyolefin-based resin fine particles, polyacetal resin fine particles, polyamine-based resin fine particles, poly-bromide-based resin fine particles, or polyfluorinated Ethylene resin fine particles or the like. When the above fine particles are contained, the average particle diameter is preferably 5 to 300 nm, more preferably -57 to 200903021 is 20 to 100 nm. It is also possible to contain two or more kinds of fine particles having different particle diameters or refractive indices. Further, the content is preferably 5 to 5 % by mass for the convex portion or the transparent resin layer. When the convex portion or the transparent resin layer or the active light-curing resin is used, as the irradiation method of the active light, it is preferred that the ink is dropped on the transparent substrate, and the active light is irradiated after evaporating the solvent or the like. The time of irradiation can be determined in consideration of the shape of the formed pattern. For example, when the ink is solvent-free, the irradiation is performed within ~2 min, and when the ink contains the solvent, the solvent in the ink is volatilized immediately after the end of ~2 min. Irradiation is preferred. The aforementioned light source can be used as the active light that can be used. In the antiglare layer of the present invention, a convex portion can be formed by a direct ejection method on the transparent substrate, preferably a cured resin layer of one or more layers or a smooth light diffusion layer is formed by a coating method, and then the hardening layer is formed. It is preferable that a convex portion is formed on the surface of the resin layer or the smooth type light diffusion layer. The dried film thickness of these layers is preferably 0.1 to ΙΟμηι, and preferably 0.1 to 5 μη. In the curable resin layer or the smooth light-diffusing layer, the same active-strand-type resin or thermosetting resin used for the ink composition for forming a convex portion and the transparent resin layer can be preferably used, and particularly preferably an ultraviolet-curable resin. . In addition, when a curable resin layer or a smooth type light-diffusing layer is formed, the same photopolymerization initiator, photosensitizer, antioxidant, and the like described in the ink composition for forming a convex portion other than the above-described respective resins can be added. Ultraviolet absorber, antistatic agent 'inorganic fine particles, organic fine particles, and the like. Further, in the present invention, the curable resin layer or the smooth type light-diffusing layer may be composed of a plurality of layers, but the curable resin layer from which the ink droplets are dropped or the outermost layer of the light-diffusion layer of the smooth type -58-200903021 contains a plasticizer It is better. The content of the plasticizer is preferably from 0.1 to 10% by mass. For example, it is preferable to add a plasticizer to the coating composition of the curable resin layer or the smooth light-diffusing layer, or to pre-coat the substrate before the coating of the curable resin layer or the smooth light-diffusing layer. A plasticizer is coated or attached to the surface. Thereby, the adhesion of the ink droplets after hardening can be improved. As a plasticizer which can be used for the curable resin layer or the smooth light-diffusing layer, for example, a phosphate-based plasticizer, a phthalate-based plasticizer, a trimellitate-based plasticizer, and a pyromelli can be used. A formic acid plasticizer, a glycolate plasticizer, a citric acid ester plasticizer, a polyester plasticizer, or the like. Examples of the phosphate ester plasticizer include triphenyl phosphate, cresol phosphate, cresol diphenyl phosphate, octyl diphenyl phosphate, diphenyl biphenyl phosphate, and trioctyl group. Phosphate ester, tributyl phosphate, etc., and phthalate-based plasticizers include diethyl phthalate, dimethoxyethyl phthalate, dimethyl phthalate, dioctyl hydrazine. Acid ester, dibutyl phthalate, di-2-ethylhexyl decanoate 'butyl benzyl decanoate, diphenyl phthalate 'dicyclohexyl decanoate, etc., trimellitic acid Examples of the plasticizer include tributyl trimellitate, triphenyl trimellitate, triethyl trimellitate, and the like, and the pyromellitic plasticizer may be tetrabutylbenzene. Examples include tetracarboxylic acid ester, tetraphenyl pyromellitic acid ester, tetraethyl pyromellitic acid ester, and the like, and glycolic acid ester plasticizers include triacetin, glyceryl tributyrate, and ethyl phthalate. The 'citric acid ester plasticizers such as mercaptoethyl glycolate, methyl phthalyl ethyl glycolate, butyl phthalyl butyl glycolate, etc., give triethyl citrate, Tri-n-butyl lemon Ethyl ester, acetyltriethyl citrate, acetamyl-59-200903021 tri-n-butyl citrate, acetamyl tris-n (2-ethylhexyl) citrate, and the like. Examples of the other carboxylic acid esters include various kinds of trimellitic acid esters such as butyl oleate, ricinoleic acid methyl acetate, and dibutyl sebacate. Further, trimethylolpropane tribenzoate or the like can also be used. As the polyester-based plasticizer, a copolymer of a dibasic acid such as an aliphatic dibasic acid, an alicyclic dibasic acid or an aromatic dibasic acid and a diol can be used. The aliphatic dibasic acid is not particularly limited, and adipic acid, sebacic acid, phthalic acid, terephthalic acid, 1,4-cyclohexyl dicarboxylic acid or the like can be used. As the diol, ethylene glycol, diethylene glycol '1,3·propanediol, 1,2-propanediol, 1,4-butanediol, 1,3-butanediol, 1,2-butanediol, etc. can be used. . These dibasic acids and diols may be used alone or in combination of two or more. In particular, the epoxy group-based compound, the rosin-based compound, the phenolic-type epoxy resin for phenol paint, the phenolic epoxy resin for cresol paint, the ketone resin, and toluene are described in JP-A-2002-146044. A cellulose ester of an additive such as a sulfonamide resin is preferred. As the above compound, cesium-604 and cesium-610 are those having an acid value of 2 3 7 and 170 from the Arakawa Chemical Industry Co., Ltd. Similarly, as an esterified product of a mixture of rosin acid, dehydroabietic acid and long-leaf pine acid 3 purchased from Arakawa Chemical Industry Co., Ltd., the acid value of each of ΚΕ-100 and ΚΕ-3 5 6 is 8 Hey. Further, a mixture of rosin acid, dehydroabietic acid and long-leaf pine acid was purchased from a sonicated product, and each was a G-7 having an acid value of 167, 168 and a R-X of Hadido. In addition, as an epoxy resin, Alaru Lai ΕΡΝ 1 1 79 of Asahi Chiba (shares) and AER260 of Alaruide are purchased as Asahi Chiba (shares). -60 - 200903021 As a ketone resin, Hailake 1 1 0 and Hailake 1 1 〇H were purchased from Hitachi Chemical Co., Ltd. As a p-toluenesulfonamide resin, Doppler was purchased from Fujimidine Chemical Co., Ltd. The solvent in the case of applying the curable resin layer or the smooth light-diffusing layer used in the present invention may be, for example, preferably selected from the group consisting of hydrocarbons, alcohols, ketones, esters, glycol ethers, other solvents, or a mixture thereof. . It is preferable to contain propylene glycol mono (carbon number 1 to 4) alkyl ether or propylene glycol mono (carbon number 1 to 4) alkyl ether ester in an amount of 5% by mass or more, more preferably 5% by mass to 80% by mass or more of the solvent. A method of applying a curable resin layer or a smooth light-diffusing layer composition coating liquid to the transparent substrate, and applying a gravure coater, a spin coater, a coil bar coater, or the like, may be used. A known method such as a roll coater, a reverse coater, an extrusion coater, or an air knife coater. A suitable coating amount is a wet film thickness of 5 μm to 30 μm, preferably ΙΟμηι to 20 μmη. The coating speed is preferably from 10 m/min to 60 m/min. Further, the dry film thickness is preferably 〇_ι to 10 μm. After the coating of the curable resin layer or the smoothing type light-diffusing layer is dried and dried, it is preferably irradiated with active light such as ultraviolet rays or electron beams, or hardened by heat treatment, in the same manner as the ink is cured. The irradiation time is preferably from 1 second to 5 minutes. The curing efficiency of the ultraviolet curable resin, the work efficiency, and the like are more preferably ο 1 to 10 seconds. In the present invention, the curable resin layer or the smooth light-diffusing layer coated on the transparent substrate by the above method may be sprayed at any time after the uncured state or the complete hardening end -61 - 200903021 The ink droplets forming the convex portion are dropped, and further covered with a transparent resin layer. Preferably, the curable resin layer or the smooth light diffusion layer is cured, and then the ink droplets are dropped by the ejection method to form the convex portion. It is better. When the curable resin layer or the smooth light-diffusing layer is subjected to a semi-treatment (semi-hardened state), the ink droplets are dropped to form a convex portion, and when the transparent resin layer is further coated, fine irregularities can be easily formed and the productivity is excellent. Preferably, the adhesion between the convex portion or the transparent resin layer and the surface of the curable resin layer or the smooth light diffusion layer can be improved. In the present invention, the convex portion is formed, and after the surface is subjected to plasma treatment, it is preferable to form a transparent resin layer under the convex portion, but the plasma treatment is particularly preferably applied to the atmospheric plasma treatment, and a rare gas such as helium or argon may be used. Or a discharge gas such as nitrogen or air, or a reaction gas containing at least one of oxygen, hydrogen, nitrogen, carbon monoxide, carbon dioxide, nitrogen monoxide, nitrogen dioxide, water vapor, methane, or tetrafluorocarbon. In Japanese Laid-Open Patent Publication No. 2000-356714, the surface of the hardened resin layer can be subjected to plasma treatment with reference to a specific plasma treatment method. Fig. 8 is a view showing an example of a manufacturing flow of a transparent resin layer anti-glare film formed by forming a convex portion by a spray method on a transparent substrate and covering the convex portion. Specifically, the curable resin layer or the smooth light-diffusing layer is provided on the transparent substrate by a coating method, and then a convex portion is formed by spraying to cover the anti-glare layer of the transparent resin layer formed under the convex portion, and then An example of the flow of the low refractive index layer which is provided by spraying to produce an antiglare antireflection film. In Fig. 8, 'transparent substrate 丨〇2 which is repeated by laminating roll 1 〇1 is transported' in the first coating stage A' by the first coating by extrusion method] 0 3 coating -62- 200903021 It is provided in a curable resin layer or a smooth light diffusion layer. In this case, the curable resin layer or the smooth type light diffusion layer may be a single layer structure or a combination of a plurality of layers. The transparent substrate 102 in which the curable resin layer or the smooth type light diffusion layer is applied is coated and dried in the dry region at 10,000 A. Drying is carried out on both sides of the 'transparent substrate 1 〇 2 by applying warm air under controlled temperature and humidity. After drying, when the curable resin layer or the smooth light-diffusing layer is used as an adhesive, the active light-ray-curable resin is irradiated with active light, for example, ultraviolet rays, or the like, by the active light irradiation portion 106A. The irradiation amount or the irradiation condition is controlled to be in a semi-processed state, or is not directly hardened and is directly transported to the ejection emitting unit 109. Continuing, the second coating step B is provided by the ejection method to provide the convex portion, but the curable resin layer is preferably in a semi-processed state. Before the convex portion is formed, the surface treatment may be applied to the plasma processing portion 107. The ink supply cylinder 108 is connected to the ejection emitting portion 109, thereby supplying the ink liquid. The ejection emitting portion 109 is as shown in FIG. 3(b), and the plurality of ejection nozzles are arranged in a wide bird shape in a wide area of the transparent substrate, preferably in a multi-stage manner, and the ink droplets are emitted from the curable resin layer or smoothed. On the type light diffusing layer, the surface forms a convex portion. Further, when two or more types of ink droplets are ejected, it is also possible to emit ink droplets by ejecting nozzles arranged in two or more columns or randomly ejecting ink droplets by any of the ejecting nozzles. Further, the plurality of ejection emitting portions may be disposed, and the respective ink ejecting portions may eject the different ink droplets. In the present invention, it is desired to emit 0.1 to 10 0 pl, and a fine droplet of 0.1 to 〇pI is emitted depending on the case, and the flying property of the ink droplet is easily affected by the flow of the outside air, and the second coating stage B and the first 4 In the coating stage D, it is best to apply the anti-63-200903021 air treatment under the cover of a partition wall or the like. Further, in order to fly ultrafine droplets of 1 pi or less, a voltage is applied between the ejection emitting portion 109 and the transparent substrate 102 or the back |104D, and the method for imparting the flying stability of the charge-assisted electro-drip to the ink droplets is also good. Moreover, in order to prevent the deformation of the trailing drops, it is also preferable to cool the transparent substrate to make the flow of the backward ink droplets low. Or the ink droplets which are ejected from the ink droplets to the landing are volatilized, and the amount of the solvent contained in the ink droplets is reduced, and it is preferable to form a finer convex portion. Therefore, it is also preferable to increase the temperature between the inks or to control the gas pressure to 1 or less. For example, the method of controlling 100 kPa is also preferable. Further, the solvent concentration in the ink flying space can be reduced, and the saturated concentration is preferably 50% or less, preferably 1. landing on the surface of the curable resin layer or the smooth light diffusion layer, and when the active light curing resin is used, The active light illuminating unit 106B disposed in the ejection emitting portion irradiates the active light, and is cured by ultraviolet rays or the like. Further, it is also preferable that the ink droplets are made of a thermosetting property by heating the heating portion 110, for example, by heating the flat plate, and heating the back roller 1024B as a heating roller. In the second coating step B, the active light irradiation unit 106B does not directly affect the ejection nozzle of the ejection emitting unit 109, and the irradiation unit 106B and the ejection emitting unit 109 are disposed as the appropriate interval light irradiation unit 106B. It is preferably disposed between the injection projecting portion 109. Further, the heat of the heating unit 1 10 does not directly affect the jetting nozzle, and the injection emitting portion 1 0 9 is disposed as a heat insulating jacket covering 8 , and the heating portion 1 10 is disposed on the transparent substrate I 〇 2 In the state of high-precision 1 104B 'intentional ink liquid, the liquid contained in the liquid is quickly hoisted in the state of water flying in 2 0~ ambient gas '30%. After the ink liquid 109 is cured, for example, when the resin is irradiated. Further, the illuminating light, the active light, or the illuminating wall or the like, or the surface of the light-shielding wall, or the side of the surface, is not preferably -64-200903021. The transparent substrate 102 which is subjected to the hardening treatment to the extent that the convex portion formed by the ink droplets is formed is maintained, and an unnecessary organic solvent or the like is evaporated in the drying region 105B, and then the active light is irradiated by the active light irradiation portion 106C. Even if the hardening is completed, it may be in a semi-process state, and it is preferable to use a semi-process state. The transparent substrate 102 having the convex portion is continuously transported to the third coating stage C to which the transparent resin layer covering the convex portion is applied, and the convex portion is coated with the transparent resin layer before being applied to the plasma processing portion 107. Surface treatment is preferred. The transparent substrate 10 2 on which the transparent resin layer was applied was applied, and drying was continued in the drying zone 1 0 5 C. Drying is carried out on both sides of the transparent substrate 1 0 2 by applying warm air with controlled temperature and humidity. The active light is then irradiated with the active light illuminating unit 106D, and hardening is completed. a transparent substrate 〇2 having an anti-glare layer having a convex portion is provided, and the fourth coating step D is continued, and the low refractive index layer is applied by the ejection emitting portion 109, and the active light irradiation portion 106E and The dry zone 1 05D is hardened. It is preferred that the surface of the transparent resin layer is subjected to surface treatment by the plasma treatment portion 107 before the application of the low refractive index layer. When a plurality of antireflection layers or antifouling layers are provided, only a necessary coating step (not shown) may be provided, and coating, drying, and hardening are performed in the same manner as in the first coating step A to produce an antiglare. The anti-reflection film is then taken up by a take-up reel 1 1 3 . Further, after the transparent substrate 102 is applied, dried, and hardened at each coating stage, it can be suitably wound up by a take-up reel - 65 - "transparent light, optical, preferably only Dipropionate, polyester bismuth (also ennaphthalene paper, poly film, film, original polyether ketone polymethyl is also poly and fiber and raw sinene (shares) 200903021 substrate" for the present invention The transparent substrate to be used is easy to manufacture, and the adhesiveness of the cured resin layer is good, and it is excellent in optically isotropic transparency. Therefore, it is suitable as a transparent film. In the invention, the transparency is visible light transmittance. 60% or more and 8 % or more, particularly preferably 90% or more. The above properties are not particularly limited, and examples thereof include a cellulose acetate film, a cellulose triacetate film, a cellulose film, and a cellulose B. A cellulose ester-based film such as a acrylate butyrate film, a polycarbonate film, or a polyacrylic acid vine film contains a polyether oxime film, a polyester film such as polyethylene terephthalate or vinegar, Polyethylene film, polypropylene film, chlorination Ethylene film, polyethylene;) 3⁄4 alcohol film, syndiotactic polystyrene film, polycarbonate fatigue resin film, polymethylpentene film, polyether ketone thin imine film , polyamide film, fluororesin film, nylon thin methacrylate film, acrylic film or glass plate. A carbonate-based film, a polyester-based film, or a raw spinel-based resin thin film is preferably used. The preferred raw olefinic resin film to be used in the present invention is an amorphous polyolefin film having a structure, and examples thereof include AP0 manufactured by Mitsui Co., Ltd., and ARTON manufactured by Nippon Co., Ltd., and the like. In the invention, a cellulose ester-based film is particularly preferably used. With homogenous, fibrate film, polyethoxylated glass ester film, film, film, with oily JSR as -66-200903021 cellulose ester' to cellulose acetate, cellulose acetate Butyrate and cellulose acetate propionate are preferred, and cellulose acetate butyrate, cellulose acetate phthalate, cellulose acetate propionate are also preferred. Examples of the cellulose ester film to be sold include Konicaminolta tak KC8UX, KC4UX, KC5UX, KC8UCR3, KC8UCR4, KC8UCR5, KC8UY, KC4UY, KC12UR, KC4FR (Konicaminolta opt), etc., from the manufacturing cost side, It is preferable from the viewpoints of transparency and adhesion. These films may be films produced by melt-casting films or films produced by solution casting films. Further, a transparent substrate film having a concave-convex shape formed on the surface by trimming may be used. <<Preparation of Antireflection Film>> In the present invention, it is preferred to form an antiglare layer on the base film, and to form an antireflection layer by sequentially applying a high refractive index layer composition and a low refractive index layer composition. Further, an antifouling layer or a back coating layer may be applied. The structure of the antireflection film having better antiglare property is as follows, but is not limited thereto. Transparent substrate / anti-glare layer / low refractive index layer transparent substrate / anti-glare layer / high refractive index layer / low refractive index layer transparent substrate / antistatic layer / anti-glare layer / low refractive index layer transparent substrate / anti Electrostatic layer / anti-glare layer / high refractive index layer / low refractive index layer transparent substrate / anti-glare layer / low refractive index layer / antifouling layer transparent substrate / anti-glare layer / high refractive index layer / low refractive index layer / Antifouling layer -67 - 200903021 Transparent substrate / antistatic layer / anti-glare layer / low refractive index layer / antifouling layer transparent substrate / antistatic layer / anti-glare layer / high refractive index layer / low refractive index layer / anti Smudge back coating layer / transparent substrate / anti-glare layer / low refractive index layer back coating layer / transparent substrate / anti-glare layer / low refractive index layer / antifouling layer back coating layer / transparent substrate / anti Glare layer / high refractive index layer / low refractive index layer / antifouling layer &lt;Localized refractive index layer&gt; In the present invention, in order to further improve the antireflection property, a plurality of layers of the following high refractive index layer are provided on the underlayer of the low refractive index layer. The preferred high refractive index layer of the present invention preferably contains metal oxide fine particles having an average particle diameter of 1 Å to 200 nm, a metal compound, and an active light curing resin. (Metal Oxide Fine Particles) The high refractive index layer of the present invention preferably contains metal oxide fine particles. The type of the metal oxide fine particles is not particularly limited, and at least one selected from the group consisting of Ti, Zr, Sn, Sb, Cu, Fe, Mn' Pb, Cd, As, Cr, Hg, Zn, Al, Mg, Si can be used. Metal oxides of elements of P and S' These metal oxide fine particles may be doped with a trace atom such as Al, In, Sn, Sb, Nb, a halogen element, Ta or the like. Also, these may be mixtures. In the present invention, 'a metal selected from at least one selected from the group consisting of zirconium oxide, cerium oxide, tin oxide, zinc oxide, indium tin oxide (ITO), antimony-doped tin oxide (strontium), and tannic acid-68-200903021 zinc is used. The oxide fine particles are preferred as the main component, and special tin (ITO). The primary particles of these metal oxide fine particles; 10 nm to 2 〇〇 nm range, 10 to 150 nm is particularly preferable. The average particle diameter of the particles can be measured by a scanning electron microscope (microscopic photograph, and measured by a dynamic astigmatism method or a static particle size distribution meter. When the particle diameter is too small, the dispersibility is deteriorated. When the particle diameter is too large, the haze is remarkably improved. The shape of the non-object particles is preferably a rice grain shape, a spherical shape, a cube shape, a needle shape or an indefinite shape. The refractive index of the high refractive index layer is specifically higher than the refractive index of the support, and the wavelength of 5 50 nm at 23 ° C is determined to be 1.50. Preferably, the means for adjusting the refractive index of the high refractive index layer is preferably 1.80 to 2.60, more preferably 1.85 to 2.50, depending on the type and amount of the fine particles. The metal oxide fine particles can be borrowed. When the organic compound enters the surface of the metal oxide fine particles by the organic compound, the dispersion stability in the organic solvent can be improved, and it is easy to control, and the aggregation and precipitation can be suppressed over time. The oxide particles are 5% by mass or less, preferably 0.5% by mass to 3% by mass. Examples of the organic compound include a polyhydric alcohol and an alkanol decane Mixture and titanate coupling agent, which will be described later. It is also possible to combine two or more kinds of surface treatments; preferably indium oxide - ruthenium particle diameter is metal oxide micro-SEM) and other electronic astigmatism methods, etc. Scored well. The range of ~1.90 of the metal oxide-like, spindle-shaped transparent substrate depends on the surface treatment of the metal oxide microparticles. When the surface is modified, the particle size is preferably 0.1% by mass. The amine, stearic acid, and alkane coupling agent are preferably used at the surface. -69-200903021 High refractive index containing the aforementioned metal oxide fine particles; 5 nm~ Ιμηι is better, l〇nm ~ 0.2μιη is better, 30: best. The ratio of the metal oxide fine particles to be used and the adhesive such as a living resin to be described later differs depending on the size of the metal oxide fine particles, etc., but the volume ratio is preferably such that the latter is 1 for the former one. The metal oxide fine particles used in the present invention preferably have a mass ratio of 5 mass% to 85 mass%, preferably 10 mass%, and most preferably 2 to 7 mass%. If the amount of use is too small, the refractive index or the effect of the present invention is excessively generated. The metal oxide fine particles are dispersed in a medium and used as a dispersion medium for forming a coating liquid of a high refractive index layer, which is an oxide particle, and a boiling point of 6 (L· is preferable. As a specific example of the dispersion solvent, Examples thereof include water, methanol, ethanol, isopropanol, butanol, and benzyl alcohol), ketone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone (e.g., diacetone alcohol) and ester (for example). For example, methyl acetate, propyl acrylate, butyl acetate, methyl formic acid, ethyl formate, butyl acrylate, aliphatic hydrocarbons (eg, hexane, cyclohexane such as 'dichloromethane, chloroform, tetrachlorinated Carbon), aromatic benzene, toluene, xylene), decylamine (for example, dimethyl acetamide, η-methylpyrrolidone), ether (for example, the thickness of the layer is from nm to 0.1 μm). The type of the hardening type, the amount of the particles is from 2 to the previous amount, and the high refractive index is -80% by mass, and the dispersion state in which the film strength is not deteriorated is provided. As a liquid alcohol of gold ~ 170 ° C (for example, a ketone) (for example, C, ketone alcohols (eg ethyl acetate, ant ants) Propyl esters, ants, halogenated hydrocarbons (group hydrocarbons (eg, amide, dimethyl ether, dioxo-70-200903021 alkane, tetrahydrofuran), ether alcohols (eg, methoxy ketone) Among them, toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and butanol are particularly preferred. Further, the metal oxide fine particles can be dispersed in the medium using a disperser. Examples of the dispersing machine include a sanding honing machine (for example, a bead honing machine), a high-speed impeller honing machine, a quartz honing machine, a roll honing machine, a stirring ball mill, and a colloid honing machine. A sanding honing machine and a high-speed impeller honing machine are particularly preferable. Further, a preliminary dispersion treatment can be carried out. As a dispersion machine used for preliminary dispersion treatment, a ball honing machine, a three-roll honing machine, and a kneading machine can be cited. And an extruder. In the present invention, 'further may contain metal oxide fine particles having a core/shell structure. The shell may be formed in one layer around the core, and a plurality of layers may be formed to further improve light resistance. The core is completely covered by the shell. It is better. The core can use titanium oxide ( Rutile, anatase, amorphous, etc.), zirconia, zinc oxide, cerium oxide, indium oxide doped with tin, tin oxide doped with cerium, etc., but rutile type titanium oxide may also be used as the main The shell is preferably composed of an inorganic compound other than titanium oxide, and is formed of a metal oxide or a sulfide. For example, silica sand dioxide (cerium oxide), alumina (alumina), chromium oxide, oxidation may be used. An inorganic compound containing zinc, tin oxide, oxidation, indium oxide, iron oxide, zinc sulfide, etc. as a main component, among which alumina 'cerium oxide, zirconium oxide is preferred. Further, it may be a mixture thereof. The coverage of the shell 'average coverage is 2 to 50% by mass. It is preferably 3 to 40% by mass', more preferably 4 to 25% by mass. Cover of the shell -71 - 200903021 When the amount is too large, the refractive index of the fine particles will be When the amount of coverage is too small, the light resistance is deteriorated. Two or more kinds of metal oxide fine particles can be used. As the core titanium oxide, it can be produced by a liquid phase method or a gas phase method. Further, as a method of forming a shell around a core, for example, U.S. Patent No. 3,410,075, Japanese Patent No. 5 8-4706, and U.S. Patent No. 2,8 8 5,3 66 can be used. 'Same as No. 3,43 7,502, British Patent No. 丨, 丨34,249, US Patent No. 3,3 83,23 1 , British Patent No. 2,62 9,9 5 3, and No. 1,3 65,999 The method described, and the like. (Metal Compound) The metal compound used in the present invention can be a compound represented by the following general formula (4) or a chelate compound thereof. - (4) AnMBx-n wherein Μ represents a metal atom, A represents a hydrolyzable functional group or a hydrocarbyl group having a hydrolyzable functional group, and B represents a metal atom enthalpy via a covalent bond or an ion bond. X represents the valence of the metal atom ,, and η represents an integer of 2 or more and X or less. Examples of the hydrolyzable functional group A include a halogen such as an alkoxy group or a chlorine atom, an ester group, and a guanamine group. The metal compound of the above formula (4) contains an alkoxide having two or more alkoxy groups directly bonded to a metal atom, or a chelate compound thereof. The preferred metal compound may, for example, be a titanium alkoxide, a zirconium alkoxide or a chelating compound. Titanium alkoxide has a high reaction rate and a high refractive index and is easy to handle. However, it has a photocatalytic action and deteriorates light resistance when added in a large amount. Zirconium Oxide Oxidation -72- 200903021 The material has a high refractive index but is easily cloudy. Therefore, attention must be paid to exposure management during coating. Further, since the titanium alkoxide has an effect of promoting the reaction of the ultraviolet curable resin and the metal alkoxide, the physical properties of the coating film can be improved by adding only a small amount. Examples of the titanium alkoxide include tetramethoxytitanium, tetraethoxytitanium, tetra-iso-propoxytitanium, tetra-n-propoxytitanium, tetra-n-butoxytitanium, and tetra. - sec-butoxytitanium, tetra-tert_butoxytitanium, and the like. Examples of the zirconium alkoxide include tetramethoxy fluorene, tetraethoxy zirconium 'tetra-iso-propoxy zirconium, tetra-n-propoxy pin, tetra-n-butoxy fluorene, and tetra. - sec-butoxy zirconium, tetra-tert-butoxy fluorene, and the like. Examples of preferred chelating agents for forming a chelate compound to be a free metal compound include alkanolamines such as diethanolamine and triethanolamine, glycols such as ethylene glycol, diethylene glycol, and propylene glycol, and acetamidine. A molecular weight of 10,000 or less such as acetone or ethyl acetate. By using these chelating agents, it is also stable in the mixing of water and the like, and a chelate compound having an excellent reinforcing effect of the coating film can be formed. The amount of the metal compound added is adjusted so that the metal oxide content of the metal compound contained in the high refractive index layer is 〇 3 to 5 by mass. /. It is better. When the amount is less than 3% by mass, the scratch resistance is insufficient, and when it exceeds 5% by mass, the light resistance tends to deteriorate. (Active Light Curing Resin) The active light curing resin is added as a binder of metal oxide fine particles to improve the film forming property or physical properties of the coating film. As the active-73-200903021 light-curable resin, a monomer or oligomer having two or more functional groups which are directly or accepting photopolymerization by irradiation with active light such as ultraviolet rays or electron beams can be used. The polymerization reaction is indirectly carried out by the action of the initiator. The functional group may, for example, be a group having an unsaturated double bond such as a (meth)acrylinyloxy group, an epoxy group, or a triol group. Further, a radical polymerizable monomer or oligomer having two or more unsaturated double bonds can also be used. The photopolymerization initiator can be combined as necessary. Examples of the active light-curable resin include a polyfunctional acrylate compound and the like, and are selected from the group consisting of pentaerythritol polyfunctional acrylate, dipentaerythritol polyfunctional acrylate, pentaerythritol polyfunctional methacrylate, and dipentaerythritol polyfunctional methacrylic acid. Compounds in which the esters are grouped are preferred. Here, the polyfunctional acrylate compound is a compound having two or more acryloyloxy groups and/or methacryloxy groups in the molecule. Examples of the monomer of the polyfunctional acrylate compound include ethylene glycol diacrylate, diethylene glycol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate vinegar, and three. Hydroxymethyl propyl triacetate vinegar, dimethyl ketone triacetic acid vinegar, tetramethyl methacrylate triacetic acid vinegar, tetramethyl methacrylate tetrapropyl acrylate, pentaglycerol Acrylic acid ester, pentaerythritol monoacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, glycerol triacrylate 'dipentaerythritol triacrylate' dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexapropylene vinegar , ginseng (acrylic oxyethyl) trimeric isocyanurate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, hydrazine, 6-hexanediol dimethacrylate, Neopentyl glycol dimethacrylate, trimethyl methacrylate-74-200903021 alkyl trimethacrylate, trimethylolethane trimethacrylate, tetramethylol methane trimethacrylate, Tetramethylol methane tetramethacrylate, Triglyceride, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, trimethyl propylene triacrylate, dipentaerythritol trimethyl propionate, dipentaerythritol Methacrylate, dipentaerythritol pentamethyl acrylate, dipentaerythritol hexamethacrylate. These compounds may be used singly or in combination of two or more. Further, it may be an oligomer such as a dimer or a trimer of the above monomer. The amount of the active light-curing resin to be added is preferably 50% by mass of the solid content in the high refractive index composition. In the hardening acceleration of the related active light-curing resin of the present invention, the photopolymerization initiator having a mass ratio of 3:7 to 1:9 and the propylene-based compound having two or more polymerizable unsaturated bonds in the molecule are good. Specific examples of the photopolymerization initiator include acetophenone, benzophenone, hydroxybenzophenone, michelone, ?-amine oxime ester, thioxanthone, and the like. (Solvent) Examples of the organic solvent used in the application of the high refractive index layer used in the present invention include alcohols (for example, methanol, ethanol, propanol, isopropanol, butanol, isobutanol, and the like). Dibutanol, tert-butanol, pentanol 'hexanol, cyclohexanol, benzyl alcohol, etc.), polyols (for example, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, Propylene glycol, dipropylene glycol, polypropylene-75-200903021 alcohol, butanediol, hexanediol, pentanediol, glycerin, hexanetriol, thiodiethanol, etc.), polyol ethers (for example, ethylene glycol single Methyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether 'diethylene glycol monocarboxylic acid, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monobutyl ketone, B Glycol monoformate acetate, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, ethylene glycol monophenyl ether, propylene glycol monophenyl ether, etc.), amines (eg 'ethanolamine, diethanolamine, triethanolamine, N-methyldiethanolamine, N-ethyldiethanolamine, morpholine, N-ethylmorpholine, ethylidene diamine, diethylenediamine, Ethyltetramine, tetraethylidene pentaamine, polyethyleneimine, pentamethyldiethylideneamine, tetramethyldipropyldiamine, etc.), guanamines (eg 'carbamamine, guanidine , Ν-dimethylformamide, hydrazine, hydrazine-dimethylacetamide, etc.), heterocyclics (for example, 2-indole ketone, oxime-methyl-2 _birabinone, Cyclohexyl pibicanol, 2-oxazolone, 1,3-dimethyl-2-imindoledione, etc.), boron (for example, dimethyl arsenic, etc.), guanidines (eg ' In particular, it is preferably an alcohol, a polyhydric alcohol or a polyhydric alcohol ether. &lt;Antifouling layer&gt; The antireflection film having the antiglare property of the present invention is preferably provided with an antifouling layer on the outermost layer. The preferred antifouling layer of the present invention is preferably a composition in which a fluorine-containing brothel compound is contained in an antifouling layer-forming composition, and a solution of a decane compound having a fluoroalkyl group or a fluoroalkyl ether group is applied. Particularly, the fluorine-containing decane compound is decazane or alkoxy decane. Further, in the decane compound having the fluoroalkyl group or the fluoroalkyl ether group, the fluoroalkyl group in the 矽-76-200903021 alkyl compound is bonded to the Si atom in a ratio of one or less for one si atom. The decane compound remaining as a hydrolyzable group or a siloxane coupling group is preferred. As the so-called hydrolyzable group, for example, a group such as an alkoxy group is hydrolyzed to a hydroxyl group, whereby the above-described decane compound forms a polycondensate. For example, the above decane compound is subjected to a reaction in the range of room temperature to 1 〇〇 °c under the distillation of dehydrated water (acid catalyst if necessary) and by-product alcohol. Thereby, the alkoxydecane (partially) is hydrolyzed, and a part of it is subjected to a condensation reaction to obtain a hydrolyzate having a hydroxyl group. The degree of hydrolysis and condensation can be appropriately adjusted depending on the amount of water to be reacted. In the present invention, the decane compound solution used for the antifouling treatment is not actively added with water, and the main drying is carried out after the preparation, due to moisture in the air, etc. The hydrolysis reaction may be caused, and it is preferred that the solid content of the diluted solution is used at a low concentration. In the composition for forming an antifouling layer, the fluoroalkyl group-containing decane compound is represented by the following general formula (5), and is diluted with a concentration of the decane compound to a concentration of 0.01 to 5% by mass to carry out antifouling treatment. deal with. General formula (5) CF3(CF2)m(CH2)n-Si-(ORa)3 wherein m represents an integer of 1 to 10. η represents an integer of 0 to 10. Ra represents the same or different alkyl groups. In the compound represented by the above formula (5), Ra represents a group having 3 or less carbon atoms, and only an alkyl group derived from carbon and hydrogen is preferably a group such as a methyl group, an ethyl group or an isopropyl group. Preferred examples of the decane compound having a fluoroalkyl group or a fluoroalkyl ether group in the present invention include CF3(CH2)2Si(OCH3)3, CF3(CH2)2Si(〇C2H5)3-77-200903021, and CF3( CH2) 2Si(OC3H7)3, CF3(CH2)2Si(OC4H9)3, CF3(CF2)5(CH2)2Si(OCH3)3, CF3(CF2)5(CH2)2Si(OC2H5)3, CF3(CF2) 5(CH2)2Si(OC3H7)3, CF3(CF2)7(CH2)2Si(OCH3)3, CF3(CF2)7(CH2)2Si(OC2H5)3, CF3(C F2)7(CH2)2 S i (OC3 H7)3, CF3(CF2)7(CH2)2Si(OCH3)(〇C3H7h, CF3(CF2)7(CH2)2Si(OCH3)2OC3H7, CF3(CF2)7(CH2)2SiCH3(OCH3)2 CF3(CF2)7(CH2)2SiCH3(OC2H5)2, CF3(CF2)7(CH2)2SiCH3(OC3H7)2, (CF3)2CF(CF2)8(CH2)2Si(OCH3)3, C7F15CONH(CH2)3Si (OC2H5)3 'CsF!7S02NH(CH2)3Si(0C2H5)3, C8F17(CH2)2OCONH(CH2)3Si(OCH3)3, CF3(CF2)7(CH2)2Si(CH3)(OCH3)2, CF3( CF2)7(CH2)2Si(CH3)(OC2H5)2, CF3(CF2)7(CH2)2Si(CH3)(OC3H7)2, CF3(CF2)7(CH2)2Si(C2H5)(OCH3)2, CF3 (CF2)7(CH2)2Si(C2H5)(OC3H7)2, CF3(CH2)2Si(CH3)(OCH3)2, CF3(CH2)2Si(CH3)(OC2H5)2, CF3(CH2)2Si(CH3) (OC3H7)2, CF3(CF2)5(CH2)2Si(CH3)(OCH3)2, CF3(CF2)5(CH2)2Si(CH3)(OC3H7)2 'CF3(CF2)20(CF2)3(CH2 ) 2Si(0C3H7), C7F15CH20(CH2)3Si(0C2H5)3, C8F17S020(CH2)3Si(0C2H5)3 -78 - 200903021, C8F17(CH2)2OCHO(CH2)3Si(OCH3)3, etc. as the above fluorine-based decane compound For example, KP801M, X-24-9146, GE Toshiba Polyoxane Co., Ltd. XC98-A5382 'XC98-B2472, Daikin Industries Co., Ltd. Opshir DSX, Fluoro Technology FG5010, etc., as a compound used for the surface treatment, a perfluoroalkyl decazane, a perfluoroalkyl decane, or a perfluoropolyether group containing a decane compound, and a perfluoroalkyl trialkoxide is especially mentioned. Pyridinium, perfluoropolyether trialkoxydecane, perfluoropolyetherditaneoxydecane. When these decane compounds are used, the organic solvent containing no fluorine is diluted to 0.01 to 10% by mass, preferably 0.03 to 5% by mass, more preferably 0.05 to 2% by mass. In the present invention, it is preferable to use an organic solvent which is not fluorine-containing to prepare the solution of the decane compound, but the following may be mentioned. The solvent of the coating composition for an antifouling layer used in the present invention may, for example, be a propylene glycol mono(C1 to C4) alkyl ether and/or a propylene glycol mono(C1 to C4) alkyl ether ester, as a propylene glycol mono(C1 to C4). The alkyl ether may, for example, be propylene glycol monomethyl ether (PGME), propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol monoisopropyl ether or propylene glycol monobutyl ether. Further, examples of the propylene glycol mono(Cl~C4) alkyl ether ester include propylene glycol monoalkyl ether acetate, and specific examples thereof include propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate. Propylene glycol mono(C1~C4) alkyl ether and/or propylene glycol mono(C1~C4) alkyl ether ester, etc., methanol, ethanol, propanol 'η·butanol, 2-butanol, t-butanol, cyclohexanol, etc. Alcohols, methyl ethyl ketone, methyl isobutyl ketone, ketones such as acetone, ethyl acetate-79-200903021 ester, methyl acetate, ethyl lactate, isopropyl acetate 'amyl acetate, ethyl butyrate Other solvents such as esters, hydrocarbons such as benzene, toluene, and xylene, dioxane, and N,N-dimethylformamide. Or these solvents may be suitably used in combination. The solvent to be mixed is not particularly limited. The solvent is particularly preferred. The organic solvent is one or more selected from the group consisting of ethanol, isopropyl alcohol, propylene glycol, and propylene glycol monomethyl ether. Among these solvents, such as methanol, ethanol, isopropyl alcohol, the boiling point of the monomer at a normal pressure of less than 1 〇〇 °c (low boiling point solvent), and the boiling point of propylene glycol monomethyl ether, η - butyl alcohol for!单 单 °C above a single (high-boiling solvent) 为 is preferred 'specially with a boiling point of 60 ~ 9 8 ° C, and 1 〇 〇 ~ 1 60. (The ratio of the low-boiling solvent to the high-boiling solvent at the time of use is, the low-boiling solvent is 98.0 mass in the composition, and the high-boiling solvent is 〇. 5 to 2% by mass. In the composition for forming an antifouling layer to be used in the present invention, it is preferred to use an acid-adjusted pH of 5.0 or less, and the acid is used as a catalyst for the polycondensation reaction to promote hydrolysis of the decane compound. Therefore, a polycondensation film of a decane compound is easily formed on the surface of the substrate to improve the antifouling property. The pH is preferably in the range of 1.5 to 5 · 〇, and the acidity of the solution is too strong at 1.5 or less, which may damage the container. In the case of piping or 5 or more, it is difficult to carry out the reaction. Preferably, it is in the range of pH 2 _0 to 4.0. In the present invention, water is not actively added to the decane compound solution used for the antifouling treatment, and after the preparation, it is mainly dried. It is preferred that the hydrolysis reaction is caused by moisture in the air, etc. Therefore, the solid content concentration of the solution is diluted and used. When excessive water is added to the treatment liquid, the pot life is shortened -80-200903021 sulfuric acid, The acid 'nitric acid, hypochlorous acid, boric acid, and hydrofluoric acid' is preferably an inorganic acid such as hydrochloric acid or nitric acid, and an organic acid having a sulfo group (also referred to as a sulfonic acid group) or a residue may be used. For example, acetic acid may be used. And polyacrylic acid, benzenesulfonic acid, p-toluenesulfonic acid 'methanesulfonic acid, etc. The organic acid is only a compound having a hydroxyl group and a carboxyl group in the molecule, and for example, a transbasic dicarboxylic acid such as citric acid or tartaric acid can be used. Further, the organic acid is preferably a water-soluble acid. For example, in addition to the above citric acid or tartaric acid, it is also possible to use propionic acid, formic acid, propionic acid, malic acid, succinic acid, methyl succinic acid, fumaric acid, Grass, acetic acid, pyruvic acid, 2-ketoadipate, glycolic acid, D. glyceric acid, D-gluconic acid, malonic acid, maleic acid, oxalic acid, isocitric acid, lactic acid, etc. The benzoic acid, the benzoic acid, the arsenic acid, etc. are added in an amount of 〇·1 part by mass to 1 〇 part by mass, preferably 0.2 part by mass, based on 100 parts by mass of the partial hydrolyzate of the decane compound. 5 parts by mass. In addition, for the amount of water added, 'partial hydrolyzate is reasonable The amount of hydrolysis may be more than 100%, and the amount of 100% to 30,000% is added, preferably 1% to 2% by weight. By using a fluorine-containing decane compound It is preferable not only in the viewpoint of lowering the refractive index of the antifouling layer but also imparting water repellency and oil repellency, and the scratch resistance is high, and the problem of agglomeration of the films is also excellent. &lt;Back Coating Layer&gt; In the antireflection film of the present invention, when the back surface layer is provided on the reverse side of the active energy ray-curable resin layer provided with the cellulose ester film as the transparent substrate, it is preferable to -81 - 200903021 . The back coating layer is intended to correct the curl generated by the active energy ray hardening of the other layers. That is, it is preferable to apply a back coating to the inside and to have a curved property, and to balance the curved coating layer, it is preferable to apply the coating layer so as to have an agglomeration preventing layer, and the coating layer coating composition can be added. It has a good blocking prevention function. Examples of the inorganic compound added to the fine particles of the back coating layer include ceria, titania, alumina, oxidized pin, calcium carbonate, talc, clay, calcined clay, calcined calcium citrate, indium oxide, zinc oxide, and IT. 0, water and calcium citrate, aluminum citrate, calcium citrate. The microparticles are preferred because of the low haze and the special microparticles. As the fine particles, for example, trade names of Aerosil R972, R974, R812, 200, 200V, 300, R202, 0X50, and the above Japanese Aerosil (manufactured by Japan) can be used. As the zirconia, for example, the trade names of Aerosil R976 and R811 (manufactured by Japan) can be used. Examples of the polymer include a resin, a fluororesin, and a propylene-based resin. It is preferable that the polyoxyalkylene resin is a network structure having a three-dimensional structure, and examples thereof include 103, the same 105, the same 108, the same 120, the same 145, and the same 3120 (above the Toshiba polyoxane). ) The trade name. Among them, Aerosil 200V and AerosilR9 72V can be maintained to have a blocking effect, which is particularly preferable. The radiation-coated film of the present invention is a surface of a dynamic resin layer or a cloth layer on the back side of the active energy ray-curable resin layer. Moreover, at this time, the back microparticles are exemplified, and the calcium sulphate, the tin carbide, the magnesium oxyacid, and the phosphorus are used in the dioxin R972V, TT600 (the granule Aerosil (the polyoxane, especially the Tospearl and the 240 lower smog) The anti-anti-friction coefficient -82- 200903021 is 0 · 9 or less, especially 〇 · 1 ~ 〇 · 9. The fine particles contained in the back coating layer are preferably (% by mass) for the adhesive. 1. 1 to 10% by mass is preferred. The addition of the back coating layer is preferably 1% or less, more preferably 0.5% or less, and preferably 0.0%. The back coating layer is specifically coated to dissolve. The cellulose ester film or the composition of the swelled solvent may be used, and other solvents may be used as a solvent for dissolving the solvent and/or a solvent for swelling thereof. It is carried out according to the degree of curling of the fat film or the type of the resin to be mixed at an appropriate ratio. When the curl prevention function is to be strengthened, the mixing ratio of the solvent dissolved in the solvent and/or the solvent to be swollen is increased. Reduce the ratio of solvent to solution The effect is obtained by using a solvent which dissolves the solvent and/or swells it: (dissolved solvent) = 1 〇: 〇~1: 9. As a transparent resin film contained in such a mixed group Examples of the solvent to be dissolved or swelled include diacetone, methyl ethyl ketone, hydrazine, hydrazine-dimethylformamide, methyl ethyl acetate, trichloroethylene, dichloromethane, and ethyl chloride. a compound, tetrakis, trichloroethane, chloroform, etc. as a solvent which is not dissolved, such as alcohol, ethanol, η-propyl alcohol, i-propyl alcohol, η-butanol, cyclic hydrocarbon (toluene, Xylene), etc. The smog of these coating compositions using a gravure coater, a dip coating coater, a coil bar coater, a die coater, or a spray coating of I·1 to 50 1% is a solvent agent which also contains a transparent tree composition and a composition which is not dissolved so that it is not formed and the methane, ethyl acetate, such as methylhexanol or machine, reverse, spray -83- 200903021 Coating, etc., is applied to the surface of the transparent resin film to a wet film thickness of 1 to 100 μm, preferably 5 to 3 Mm. Examples of the resin used as the adhesive of the back coating layer include a vinyl chloride-vinyl acetate copolymer, a vinyl chloride resin, a vinyl acetate resin, a copolymer of vinyl acetate and a vinyl alcohol, and a partial hydrolysis. Chlorinated ethylene-vinyl acetate copolymer, chlorinated ethylene-vinylidene copolymer, chlorinated ethylene/acrylonitrile-based copolymer, ethyl vinyl alcohol copolymer, chlorinated polyvinyl chloride 'ethylene-chloride An ethylene-based polymer or copolymer such as an ethylene copolymer or an ethylene-vinyl acetate copolymer, nitrocellulose or cellulose acetate propionate (preferably having an ethyl thiol substitution degree of 1.8 to 2.3, and a propyl thiol group substitution) Cellulose derivative such as 0.1 to 1.0), diethyl acetyl cellulose, cellulose acetate butyrate resin, copolymer of maleic acid and/or acrylic acid, acrylate copolymer, acrylonitrile styrene Copolymer 'chlorinated polyethylene, propylene sulfonate · chlorinated polyethylene styrene copolymer, methyl methacrylate - butadiene styrene copolymer, propylene based resin, polyvinyl acetal resin, polyethylene condensed Aldehyde resin, polyester polyurethane resin Rubber resin such as polyether polyurethane resin, polycarbonate polyurethane resin, polyester resin, polyether resin, polyamide resin, amine resin, styrene butadiene resin, butadiene acryl resin A polyoxyalkylene-based resin, a fluorine-based resin, or the like 'but is not limited thereto. For example, 'as a propylene-based resin, it can be selected from ACRYPET MD, VH, MF 'V (Mitsubishi Rayon), Hiba M-4003, M-4005, M-4006 &gt; M-42 02 ' M- 5 000 ' M-5 00 1 , M-4 5 0 1 (made by Gensei Industrial Co., Ltd.), Taiana Road BR-50 'BR-52, BR-53, BR-60, BR-64 ' BR- 73, BR-75, BR-77, BR-79, BR-80, BR-82, BR-83, BR-85, -84- 200903021 BR-87 'BR-88, BR-90 'BR-93, BR-95, BR-100, 101, BR·1 02, BR·1 05, BR-1 06, BR-1 07, BR-1 08, 112, BR-113, BR-115, BR-116, BR -1I7, BR-118 Mitsubishi Rayon (manufactured by Mitsubishi Rayon Co., Ltd.), various homopolymers and copolymers produced from acryl-based and methacrylic monomer raw materials. Particularly preferred are diacetyl cellulose, cellulose acetate propionate resin layer. The order in which the back coating layer is applied may be applied before or after the application of the cellulose ester thin active energy ray-curable resin layer, but when the back coating layer is a structurable barrier layer, the prior coating is preferably provided. Alternatively, it may be divided into two coats for coating the back coating layer. The BYK series manufactured by BYK Japan Co., Ltd. and the dimethylpolyalkylene series manufactured by GE Toshiba Polyoxane Co., Ltd., which are described in the above-mentioned low refractive index layer, can also be used for the antireflection layer other than the low refractive index layer. &lt;Surface Treatment&gt; After the above-described antiglare layer of the present invention is formed, the surface of the antiglare layer is subjected to surface treatment to form a reflective layer (low refractive index layer or high refractive index) on the surface of the antiglare layer on which the surface treatment is performed. Layer) is better. Further, it is also preferable to carry out surface treatment on the low refractive index layer before the layer is provided. The surface treatment may be a washing method, an alkali treatment method, a flame plasma, a high frequency discharge plasma method, an electron beam method, an ion beam method, a sputtering method, a corona treatment method, an atmospheric pressure luminescence discharge plasma method, or the like. Preferably, the treatment method, the corona treatment method, and the alkali treatment method. The so-called corona is BR-BR-, etc. (As the anti-fouling method on the surface of the vibrating membrane, the anti-fouling method is used as the anti-fouling method, and the acid is tested as -85 - 200903021. Under atmospheric pressure, the electrode is added with more than 1 kv. The high voltage 'treatment can be carried out using a device that is sold by Kasuga Electric Co., Ltd. or Tos. The intensity of the corona discharge treatment depends on the output per unit area of the electric power and the frequency of the generator. Corona Prescription Electrode (A Electrode) can be used for sale 'material can be selected from

等。另一方爲使用於包住塑質薄膜之電極(B 使電暈處理可於安定且均勻下實施,對於前述 定距離下設置的輥電極。此亦可使用一般販賣 鋁、不鏽鋼 '及彼等金屬之輥上,以陶瓷器、 膠、海普龍橡膠等做裏襯的輥爲佳。本發明所 處理所使用的頻率數爲20kHz以上l〇〇kHz以 ’ 30kHz〜60kHz之頻率數爲佳。頻率數下降 處理之均一性劣化,產生電暈處理之不均。又 大’進行高出力之電暈處理時,並無特別問題 出力之電暈處理時’難於安定下進行處理,結 理不均。電景處理之出力爲1〜5w.mi] 4W . min./m2之出力爲佳。電極與薄膜之距離赁 50mm以下’較佳爲i〇mm以上35mrn以下。 ’欲維持一定出力時必須爲高電壓,容易產生 間隙過窄時’外加電壓會過低,容易產生不均 薄膜進行連續處理時,於電極上會有薄膜接觸 〇 ί乍胃驗處S方法,將硬塗佈層經塗佈設置 於鹼水溶液之方法即可,並無特別限定。 進行放電下 電機等所販 極間距離、 理裝置之一 鋁、不鏽鋼 電極),欲 Α電極以一 者,材質爲 矽、EPT橡 使用的電暈 下之頻率數 時會使電暈 ,頻率數越 ,但實施低 果會產生處 1 /m2,2 〜 ! 5 m m 以上 間隙過開時 不均。又, 。且,搬運 而產生傷痕 的薄膜浸漬 -86- 200903021 作爲鹼水溶液,可使用氫氧化鈉水溶液、氫氧化鉀水 溶液、氨水溶液等,其中以氫氧化鈉水溶液爲佳。 鹼水溶液之鹼濃度,例如氫氧化鈉濃度以0.1〜25質 量%爲佳,0.5〜15質量%爲較佳。 鹼處理溫度一般爲10〜80 °c,較佳爲20〜60 °c。 驗處理時間爲5秒〜5分鐘,較佳爲30秒〜3分鐘。 鹼處理後之薄膜以酸性水中和後,以水充分洗淨爲佳。 本發明中’將形成防眩層之後表面進行電漿處理形成 防反射層(低折射率層或高折射率層)者爲佳,但電漿處 理,特別以施予大氣電漿處理爲佳,使用含有1種以上的 氦氣、氬氣等稀有氣體或者氮、空氣等放電氣體與視必要 的氧 '氫、氮、一氧化碳、二氧化碳、一氧化氮、二氧化 氮 '水蒸氣、甲烷、4氟化甲烷等反應氣體。可參考特開 2000-356714號公報之具體電漿處理方法,於硬化樹脂層 表面施予電發處理。 高折射率層、背塗佈層或防污層可使用浸漬塗佈法、 氣刀塗佈法、簾幕塗佈法、轉動塗佈法、線圈棒塗佈法、 凹版塗佈法 '微凹版塗佈法或擠壓機塗佈法,藉由塗佈形 成。塗佈時’基材薄膜可於寬度1_4〜4111下捲取成輕狀之 狀態而重複進行,進行上述塗佈,並進行乾燥.硬化處理 後,捲取成輥狀爲佳。 且,本發明的防反射薄膜捲取爲輥狀之狀態下,可藉 由進行50〜150°C、1〜30臼之範圍下之加熱處理的製造 方法而製:!Η。加熱處理期間’僅依據所設定之溫度進行適 -87- 200903021 宜決定即可’例如,於5 0 °C下,較佳爲3天以上未達3 0 天之期間’ 150 °C下,1〜3日之範圍爲佳。一般不會偏向 捲外部、捲中央部、捲芯部之加熱處理效果下,設定爲較 低溫者爲佳,50〜80°C附近下進行3〜7天程度爲佳。 欲使加熱處理於安定下進行,於可調整溫濕度之場所 進行爲必要,於無塵埃等無塵室等加熱處理室中進行爲佳 〇 將上述防反射薄膜捲取成輥狀時,作爲捲核心,僅爲 圓筒上之核心即可,亦可使用任何材質,較佳爲中空塑質 核心,作爲塑質材料使用可耐住加熱處理溫度之耐熱性塑 質即可,例如可舉出酚樹脂 '二甲苯樹脂、三聚氰胺樹脂 、聚酯樹脂、環氧基樹脂等樹脂。又,以藉由玻璃繊維等 塡充材強化之熱硬化性樹脂爲佳。 對於這些捲核心之捲數,以100捲以上爲佳,500捲 以上爲更佳,捲厚度以5 c m以上爲佳。 如此長捲之基材薄膜上塗佈功能性薄膜,於塑質核心 上捲取之輥,於經捲取之狀態下進行前述加熱處理,並轉 動該輥爲佳,轉動爲1分鐘轉動1次以下之速度爲佳,可 爲連續或斷斷續續下轉動。又,加熱期間中該輥之交替捲 取可進行1次爲佳。 《偏光板》 偏光板可使用一般方法製作。將本發明的防眩性防反 射薄膜之裏面側進行鹼鹼化處理,於碘溶液中進行浸漬延 -88- 200903021 伸後所製作之偏光膜的至少一面上,使用完全鹼化型聚乙 燒醇水溶液進行貼合爲佳。另一面上使用該薄膜,或亦可 使用其他偏光板保護薄膜。販賣的纖維素酯薄膜(例如, Konicaminolta tak KC8UX ' KC4UX ' KC5UX ' KC8UCR3 、KC8UCR4 、 KC8UCR5 、 KC8UY 、 KC4UY 、 KC12UR 、 KC4FR、以上Konicaminolta opt (股)製)亦佳。對於本 發明的防眩性防反射薄膜,使用於另一面的偏光板保護薄 膜爲,具有面内滯溜値R〇爲590nm、30〜300nm、Rt爲 70〜400nm之相位差爲佳。這些可由例如特開2002-71957 、特願2 002- 1 5 5 3 9 5所記載的方法製作。或使用兼具具有 將盤狀液晶等液晶化合物配向後形成之光學異方層的光學 補償薄膜之偏光板保護薄膜爲佳。例如,可由特開2003 -9 8 3 4 8所記載的方法形成光學異方性層。組合具有本發明 之防眩性的防反射薄膜使用時,可得到平面性優良,具有 安定視野角擴大效果之偏光板。 偏光板之主要構成要素之偏光膜爲,僅通過一定方向 之偏波面的光之元件’現今已知的代表性偏光膜爲聚乙烯 醇系偏光薄膜’此爲於聚乙烯醇系薄膜上將碘進行染色所 得者與經二色性染料染色所得者。偏光膜爲,將聚乙烯醇 水溶液進行製膜’將此經一軸延伸後染色、或經染色後再 進行一軸延伸後,較佳爲以硼化合物進行耐久性處理者。 該偏光膜面上貼合本發明之防眩性薄膜、防眩性防反射薄 膜片面後形成偏光板。較佳爲藉由以完全鹼化聚乙烯醇等 作爲主成分之水系接著劑進行貼合。 -89- 200903021 又’施予反射防止處理的偏光板表面之反射色相爲, 於反射防止膜之設計上可見光區中短波長區或長波長區之 反射率變高’故染成紅或藍色較多,但反射光之色調爲依 據用途而要求不同,使用於FPD電視等最表面時,要求自 然色調。此時,一般較佳反射色相範圍爲X Y Z表色系( CIE1931 表色系)上 〇.17Sx$0.27,0.07Sy$0.17。 《顯示裝置》 藉由將本發明的偏光板裝入顯示裝置,可製作出種種 辨識性優良的本發明之顯示裝置。本發明的防眩性防反射 薄膜可使用反射型、透過型、半透過型LCD或TN型、 S TN 型、〇 C B 型、Η AN 型、V A 型(PVA 型、MVA 型) 、IP S型等各種驅動方式之L C D。又,本發明的防眩性防 反射薄膜爲平面性優良’亦可適用於電漿顯示器、場發射 顯示器、有機EL顯示器、無機EL顯示器、電子紙等各 種顯示裝置。特別爲畫面爲30吋以上,特別爲30吋〜54 吋之大畫面的顯示裝置中,亦無畫面周邊部的脫白,其效 果可長期間維持’於Μ V A型液晶顯示裝置、I p s型液晶顯 示裝置中有顯著效果。特別具有色不均、閃燦或波紋不均 較少,長時間的鑑賞下眼睛亦不會疲勞之效果。 【實施方式】 [實施例] 以下舉出實施例對本發明做具體說明,但本發明未受 -90- 200903021 到這些限定。 實施例1 〔纖維素酯薄膜1的製作〕 &lt;聚合物X的合成&gt; 於附有攪拌機、2個滴下漏斗、氣體導入管及溫度計 之玻璃燒瓶上’裝入如表3所記載的種類及比率(莫耳組 成比)之單體Xa、Xb混合液40g、連鏈移動劑之氫硫基 丙酸2g及甲苯30g ’昇溫至9(rc。其後由—方滴下漏斗 經3小時滴入表3所記載的種類及比率(莫耳組成比)之 單體Xa、Xb混合液6〇g,同時自另一漏斗經3小時滴入 溶解於甲苯l4g之偶氮雙異丁腈〇.4g。其後再將溶解於甲 苯5 6 g之偶氮雙異丁腈〇 · 6 g經2小時滴入後,再繼續反 應2小時,得到聚合物X。所得之聚合物X於常溫爲固體 。聚合物X之重量平均分子量由下述測定法測定,其結果 如表3所示。 且,表3所記載的MMA、HEA係爲以下各化合物之 簡稱。 MMA :甲基丙烯酸甲基 HEA : 2-羥基乙基丙烯酸酯 (重量平均分子量測定) 重量平均分子量之測定使用凝膠滲透層析法測定。 測定條件如以下所示。 -91 - 200903021 溶劑:二氯甲烷 管柱:Shodex K806,K805,K803G (使用連接3根昭和 電工(股)所製者) 管柱溫度:2 5 °C 試料濃度:〇. 1質量% 檢測器:RI Model 504 ( GLScience 公司製) 幫浦:L 6 0 0 0 (日立製作所(股)製) 流量:1.0ml/min 校對曲線:使用由標準聚苯乙稀STK standard聚苯乙 烯(Tosoh (股)製)1 000000〜500之13個試品所做 出的校對曲線。1 3個試品幾乎爲等間隔下使用。 &lt;聚合物Y之合成&gt; 藉由特開2000- 1 289 1 1號公報所記載的聚合方法進行 嵌段聚合。即,於具備攪拌機、氮氣導入管、溫度計、投 入口及環流冷卻管之燒瓶中,投入作爲單體Ya之下述甲 基丙烯酸酯(MA) ’導入氮氣後將燒瓶内由氮氣取代之 下述硫甘油於攪拌下添加。添加硫甘油後,適宜地改變内 容物之溫度後進行4小時聚合,將内容物恢復至室溫後, 於此添加苯並喹啉5質量°/。之四氫呋喃溶液2 0質量份,並 停止聚合。將内容物移至蒸餾器,於8(TC,減壓下除去四 氫呋喃 '殘存單體及殘存硫甘油’得到表3所記載的聚合 物Y。所得之聚合物Y於常溫下爲液體。該聚合物γ之重 量平均分子量藉由上述測定法測定,結果如表3所示。 -92- 200903021 甲基丙烯酸酯 100質量份 硫甘油 5質量份 [表3] 聚合物-X 聚合物-Y 添加量0X1) Xa X ) 重量平均 分子量 單體 種類 重量平均 分子量 聚合物-X 聚合物-Y 單體 種類 比率 (%) 單體 種類 比率 (%) MMA 80 HEA 20 4500 MA 1000 12 7 則:對1 0 0質量份的纖維素酯的添加質量份 &lt;摻合之組成&gt; (二氧化矽分散液)Wait. The other is an electrode used to enclose the plastic film (B enables the corona treatment to be carried out in a stable and uniform manner, for the roller electrode provided at the above-mentioned fixed distance. This can also be used to sell aluminum, stainless steel and other metals. On the roll, it is preferable to use a lining roller such as a ceramic, a rubber or a Heplon rubber. The frequency used in the treatment of the present invention is 20 kHz or more and l kHz is preferably a frequency of 30 kHz to 60 kHz. The uniformity of the frequency number reduction process is degraded, and the corona treatment is uneven. When the corona treatment with high output is performed, there is no particular problem. When the corona treatment is performed, it is difficult to perform the treatment under stability, and the processing is uneven. The output of the electric circuit treatment is 1~5w.mi] 4W. The output of min./m2 is better. The distance between the electrode and the film is less than 50mm. It is preferably below i〇mm and above 35mrn. When the voltage is too high, the applied voltage is too low, and the applied voltage is too low. When the film is easily processed, there is a film contact on the electrode. The method of S is applied to the hard coating layer. Set in aqueous alkali solution The method is not particularly limited. One of the distance between the poles of the motor and the like, and the aluminum and stainless steel electrodes are used for the discharge of the motor, and the frequency of the corona is used for one of the electrodes, and the material is 矽, EPT rubber. When it is counted, it will cause corona, and the frequency will be higher, but the implementation of low fruit will produce 1 / m2, 2 ~ ! 5 mm or more when the gap is too wide. Again, . Further, the film is impregnated by the conveyance to cause scratches. -86-200903021 As the aqueous alkali solution, an aqueous sodium hydroxide solution, a potassium hydroxide aqueous solution, an aqueous ammonia solution or the like can be used, and among them, an aqueous sodium hydroxide solution is preferred. The alkali concentration of the aqueous alkali solution, for example, the concentration of sodium hydroxide is preferably 0.1 to 25 % by mass, and preferably 0.5 to 15% by mass. The alkali treatment temperature is usually from 10 to 80 ° C, preferably from 20 to 60 ° C. The processing time is from 5 seconds to 5 minutes, preferably from 30 seconds to 3 minutes. After the alkali-treated film is neutralized with acidic water, it is preferably washed with water. In the present invention, it is preferred that the surface of the antiglare layer is subjected to plasma treatment to form an antireflection layer (low refractive index layer or high refractive index layer), but the plasma treatment is particularly preferably performed by applying atmospheric plasma treatment. Use one or more kinds of rare gases such as helium or argon, or discharge gases such as nitrogen and air, and optionally oxygen 'hydrogen, nitrogen, carbon monoxide, carbon dioxide, nitrogen monoxide, nitrogen dioxide', water vapor, methane, and 4 fluorine. A reaction gas such as methane. The electric hair treatment can be applied to the surface of the cured resin layer by referring to the specific plasma treatment method of JP-A-2000-356714. The high refractive index layer, the back coating layer or the antifouling layer may be a dip coating method, an air knife coating method, a curtain coating method, a spin coating method, a coil bar coating method, or a gravure coating method. A coating method or an extruder coating method is formed by coating. At the time of coating, the base film can be repeatedly wound up in a state of being wound up in a width of from 1 to 4 to 4,111, and dried, and after being hardened, it is preferably wound into a roll. Further, in the state in which the antireflection film of the present invention is wound into a roll, it can be produced by a production method of heat treatment in the range of 50 to 150 ° C and 1 to 30 Torr. During the heat treatment period, 'depending on the set temperature only -87-200903021 should be determined as 'for example, at 50 ° C, preferably more than 3 days and less than 30 days ' 150 ° C, 1 The range of ~3 days is better. Generally, it is not preferable to set the temperature to the outside of the roll, the center of the roll, and the core of the roll. It is preferable to set it to a lower temperature, and it is preferable to carry out it for 3 to 7 days at around 50 to 80 °C. In order to carry out the heat treatment in a stable place, it is necessary to carry out the temperature and humidity adjustment, and it is preferable to carry out the above-mentioned antireflection film in a roll shape in a heat treatment chamber such as a dust-free room such as dust-free. The core is only the core on the cylinder. Any material can be used, preferably a hollow plastic core. As a plastic material, a heat-resistant plastic that can withstand the heat treatment temperature can be used. For example, phenol can be used. A resin such as a resin such as xylene resin, melamine resin, polyester resin or epoxy resin. Further, it is preferable to use a thermosetting resin reinforced by a ruthenium material such as glass enamel. The number of rolls of these volume cores is preferably 100 or more, more preferably 500 or more, and more preferably 5 cm or more. The functional film is coated on the substrate film of such a long roll, and the roll wound on the plastic core is subjected to the aforementioned heat treatment in a state of being wound up, and the roll is preferably rotated, and the rotation is performed once for 1 minute. The speed is preferably good for continuous or intermittent rotation. Further, it is preferable that the alternate winding of the rolls can be performed once during the heating period. "Polarizing Plate" The polarizing plate can be produced by a general method. The back side of the anti-glare anti-reflection film of the present invention is subjected to alkali alkalization treatment, and at least one side of the polarizing film produced by the immersion stretching in the iodine solution is used, and the fully alkalized polyethene is used. It is preferred to carry out the bonding with an aqueous alcohol solution. The film is used on the other side, or other polarizing plates may be used to protect the film. Commercially available cellulose ester films (for example, Konicaminolta tak KC8UX 'KC4UX ' KC5UX ' KC8UCR3 , KC8UCR4 , KC8UCR5 , KC8UY , KC4UY , KC12UR , KC4FR , above Konicaminolta opt ) are also preferred. In the antiglare antireflection film of the present invention, the polarizing plate protective film used on the other surface has a phase difference of 590 nm, 30 to 300 nm, and Rt of 70 to 400 nm. These can be produced by the method described in, for example, JP-A-2002-71957 and Japanese Patent Application No. 2 002- 1 5 5 3 95. Or, it is preferable to use a polarizing plate protective film which has an optical compensation film having an optical heterogeneous layer formed by aligning a liquid crystal compound such as a discotic liquid crystal. For example, an optical anisotropic layer can be formed by the method described in JP-A-2003-9 8 3 48. When the antireflection film having the antiglare property of the present invention is used in combination, it is possible to obtain a polarizing plate which is excellent in planarity and has a stable viewing angle expansion effect. The polarizing film which is a main component of the polarizing plate is a light element which passes only a polarizing surface in a certain direction. A representative polarizing film which is known today is a polyvinyl alcohol-based polarizing film. This is an iodine on a polyvinyl alcohol-based film. Those obtained by dyeing are dyed with a dichroic dye. The polarizing film is formed by forming a polyvinyl alcohol aqueous solution. The dye is stretched by one axis, dyed, or subjected to one-axis stretching after dyeing, and is preferably subjected to durability treatment with a boron compound. On the surface of the polarizing film, the anti-glare film of the present invention and the anti-glare anti-reflection film surface are bonded to each other to form a polarizing plate. It is preferred to carry out the lamination by a water-based adhesive containing a fully alkalized polyvinyl alcohol or the like as a main component. -89- 200903021 In addition, the reflection hue of the surface of the polarizing plate to which the reflection preventing treatment is applied is such that the reflectance of the short-wavelength region or the long-wavelength region in the visible light region becomes high in the design of the anti-reflection film, so that it is dyed red or blue. There are many, but the color of the reflected light is different depending on the application, and when used on the outermost surface such as an FPD TV, a natural color tone is required. At this time, it is generally preferable that the range of the reflected hue is X.17Sx$0.27, 0.07Sy$0.17 on the X Y Z color system (CIE1931 color system). <<Display Device>> By incorporating the polarizing plate of the present invention into a display device, various display devices of the present invention having excellent visibility can be produced. The anti-glare anti-reflection film of the present invention can be used in a reflective, transmissive, semi-transmissive LCD or TN type, S TN type, 〇CB type, Η AN type, VA type (PVA type, MVA type), IP S type. LCDs of various driving methods. Further, the anti-glare antireflection film of the present invention is excellent in planarity. It can also be applied to various display devices such as a plasma display, a field emission display, an organic EL display, an inorganic EL display, and an electronic paper. In particular, in a display device having a screen size of 30 吋 or more, particularly a large screen of 30 吋 to 54 吋, there is no whitening of the peripheral portion of the screen, and the effect can be maintained for a long period of time. Μ VA type liquid crystal display device, I ps type There are significant effects in the liquid crystal display device. In particular, it has uneven color, flashing or uneven ripples, and the eyes will not fatigue under long-term appreciation. [Embodiment] [Examples] Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited by the above-mentioned -90-200903021. Example 1 [Preparation of cellulose ester film 1] &lt;Synthesis of polymer X&gt; The type described in Table 3 was placed on a glass flask equipped with a stirrer, two dropping funnels, a gas introduction tube, and a thermometer. And the ratio (molar composition ratio) of the monomer Xa, Xb mixture 40g, the chain shifting agent thiosyl propionate 2g and toluene 30g 'heated to 9 (rc. Then dripped by the funnel for 3 hours The mixture of the monomers Xa and Xb of the type and ratio (molar composition ratio) described in Table 3 was 6 〇g, and the azobisisobutyronitrile oxime dissolved in toluene of 14 g was added dropwise from another funnel over 3 hours. 4 g. Thereafter, the azobisisobutyronitrile 〇·6 g dissolved in toluene (5 6 g) was added dropwise over 2 hours, and the reaction was further continued for 2 hours to obtain a polymer X. The obtained polymer X was solid at normal temperature. The weight average molecular weight of the polymer X is measured by the following measurement method, and the results are shown in Table 3. Further, MMA and HEA described in Table 3 are abbreviations of the following compounds. MMA: methyl methacrylate HEA: 2-Hydroxyethyl acrylate (measurement of weight average molecular weight) Determination of weight average molecular weight using coagulation The measurement conditions are as follows. -91 - 200903021 Solvent: Dichloromethane column: Shodex K806, K805, K803G (used by connecting 3 Showa Denko (shares)) Column temperature: 2 5 °C Sample concentration: 〇. 1 mass% Detector: RI Model 504 (manufactured by GLScience) Pump: L 6 0 0 0 (Hitachi, Ltd.) Flow: 1.0 ml/min Proofreading curve: Use Calibration curve made by 13 samples of standard polystyrene STK standard polystyrene (made by Tosoh Co., Ltd.) 1 000000~500. 1 3 samples are used at almost equal intervals. &lt;Polymer Y In the polymerization method described in JP-A-2000- 1 289 1-1, the block polymerization is carried out in a flask equipped with a stirrer, a nitrogen gas introduction tube, a thermometer, an inlet, and a circulation cooling tube. The following methacrylate (MA) of the monomer Ya was introduced. After the introduction of nitrogen gas, the following thioglycerol substituted with nitrogen in the flask was added under stirring. After the addition of the sulfur glycerin, the temperature of the content was appropriately changed and polymerization was carried out for 4 hours. , restore the contents to the room Thereafter, 20 parts by mass of a benzoquinoline 5 mass% tetrahydrofuran solution was added thereto, and the polymerization was stopped. The contents were transferred to a distiller, and the remaining monomers and remaining were removed at 8 (TC, under reduced pressure). The polymer Y shown in Table 3 was obtained as the thioglycerol. The obtained polymer Y was a liquid at normal temperature. The weight average molecular weight of the polymer γ was measured by the above-described measurement method, and the results are shown in Table 3. -92- 200903021 100 parts by mass of methacrylate, 5 parts by mass of thioglycerin [Table 3] Polymer-X Polymer-Y Addition amount 0X1) Xa X) Weight average molecular weight Monomer type Weight average molecular weight Polymer-X Polymer-Y monomer Species ratio (%) Monomer type ratio (%) MMA 80 HEA 20 4500 MA 1000 12 7 Then: Addition by mass of 100 parts by mass of cellulose ester &lt; Composition of blending &gt; (dispersion of cerium oxide liquid)

Aerosil972V(日本 Aerosil(股)製) 12 質量份 (1次粒子之平均徑16nm,外觀比重90g/公升) 乙醇 8 8質量份 將上述以溶解器進行3 0分鐘攪拌混合後。以加壓乳 化機進行分散。分散後之液濁度爲200ppm。於二氧化矽 分散液中將88質量份之二氯甲烷一邊攪拌下一邊投入, 於溶解器進行3 0分鐘攪拌混合,製作出二氧化矽分散稀 釋液。 (摻合添加液) 5 〇質量份 1 2質量份 7質量份 1 〇質量份Aerosil 972V (manufactured by Aerosil Co., Ltd.) 12 parts by mass (average diameter of primary particles of 16 nm, apparent specific gravity: 90 g/liter) Ethanol 8 8 parts by mass The above-mentioned stirring was carried out for 30 minutes in a dissolver. Dispersion was carried out using a pressure emulsifier. The liquid turbidity after dispersion was 200 ppm. 88 parts by mass of methylene chloride was added to the cerium oxide dispersion while stirring, and the mixture was stirred and mixed in a dissolver for 30 minutes to prepare a cerium oxide dispersion diluted solution. (Mixed addition liquid) 5 parts by mass 1 2 parts by mass 7 parts by mass 1 〇 parts by mass

二氯甲烷 聚合物X 聚合物Y 二氧化矽分散稀釋液 -93- 200903021 TINUVIN109(Ciba Specialty chemicals(股)製)1.2 質量份 TINUVIN 171(Ciba Specialty Chemicals(股)製)0.8 質量份 對於上述’將二氯甲烷與聚合物χ與聚合物γ 一邊 攪拌下使其完全溶解後,添加二氧化矽分散液並攪拌混合 後調製出ί參合添加液。 (主摻合液之調製) 纖維素酯(由棉絨綿合成之纖維素三乙酸酯、乙醯基 取代度2.92 ) 二氯甲烷 乙醇 摻合添加液 100質量份 3 8 0質量份 3 〇質量份 前述製作質量份 將上述投入於密閉容器,一邊加熱並攪拌下,使其完 全溶解’使用安積濾紙(股)製之安積濾紙Ν 〇 . 2 4進行過 爐,調製出主摻合液。 以日本精線(股)製的Finemate NF過濾上述主摻合 液,使用輸送帶流延裝置,於溫度221,2m寬度下於不 鏽鋼輸送帶支持體上均勻地流延。以不鏽鋼輸送帶支持體 ,將溶劑蒸發至殘留溶劑量至I 0 5 %,以剝離張力! 6 2 N /m 自不鏽鋼輸送帶支持體上剝離。經剝離之纖維素酯的織物 (web)於35°C下蒸發溶劑,切成1·6ιη寬度,其後,以拉 幅器於寬方向延伸至1 · 1倍下,以1 3 5 t之乾燥溫度進行 乾燥。此時以拉幅器開始延伸時的殘留溶劑量爲]〇 %。以 拉幅器進行延伸後於1 3 0 °C下使寬張力緩和並解開寬保持 -94- 200903021 後,於120°C、130°C之乾燥區域以多數輥之搬送下 燥,切成1.5m寬度,於薄膜兩端施予寬10mm高 之痕刻加工’以初期張力22〇N/m、終張力110N/m 成内徑6英吋核心,得到纖維素酯薄膜1。由不鏽 帶支持體之轉動速度與拉幅器之運轉速度所算出之 向的延伸倍率爲1 · 1倍。纖維素酯薄膜1之殘留溶 未達0.1 %,膜厚爲4 Ο μ m。 〔防眩性薄膜1的製作〕 上述纖維素酯薄膜1之表面(B面側;流延製 所使用的不鏽鋼輸送帶等支持體鏡面所銜接的面; 側)上,將下述硬塗佈層用塗佈液1以孔徑2 Ο μ m 烯製過濾器過濾後調製出硬塗佈層用塗佈液,將此 凹版印刷塗佈機進行塗佈,於90 °C乾燥後,使用紫 以照射部之照度O.lW/cm2下,照射量爲O.lJ/cm2 層硬化,形成厚度5 μηι之防眩性硬塗佈層製作出防 膜1。對於所形成之防眩性薄膜,使用WYKO公司 干涉式表面粗度測定機,進行算術平均表面粗度( 測定,結果爲1 33nm。又,凸部平均中心間距離赁 (硬塗佈層用塗佈液1 ) 下述材料經攪拌、混合後作成硬塗佈層用塗佈 丙烯基單體;KAYARAD DPHA(二季戊四醇六 結束乾 度 7μηι 下捲取 鋼輸送 MD方 劑量各 膜法中 支持體 之聚丙 使用微 外線燈 使塗佈 眩性薄 製光學 Ra )之 \ 3 7 μ m 液1。 丙烯酸 -95 - 200903021 酯,日本化藥製)六丙烯酸醋、日本化藥製) 200質量份 光聚合啓始劑(IRGACURE 184(Ciba Specialty Chemicals(股)製)) 25質量份 丙二醇單甲醚 110質量份 乙酸乙酯 1 1 〇質量份 合成二氧化矽微粒子平均粒子徑1.8μιη 40質量份 界面活性劑(矽系界面活性劑;FZ2207(日本unicar製 )10質量%丙二醇單甲醚溶液) 固體成分爲0.6質量份 〔防眩性薄膜2 (藉由噴射法之防眩性薄膜)的製作〕 (第1層的製作) 纖維素酯薄膜1的表面上(B面側;流延製膜法中所 使用的不鏽鋼輸送帶等支持體鏡面所銜接的面;支持體側 )’將下述硬化樹脂層塗佈組成物1以狹縫模頭進行塗佈 ’以徐徐加強熱風溫度、風速,於最終爲8 5 °C下乾燥,繼 續藉由活性光線照射部,以1 1 5nU/cm2的照射強度下進行 紫外線照射使其硬化樹脂層,製作出第1層。經下述組成 物所得之乾燥膜厚爲5μηι。 (固體成分) 丙烯基單體;KAYARAD DPHA(二季戊四醇六丙稀酸 酯,日本化藥製) 7〇質量份 三羥甲基丙烷三丙烯酸酯 3 0質量份 光聚合啓始劑(IRGACURE 1 84(Ciba Specialty -96- 200903021Methylene chloride polymer X polymer Y cerium oxide dispersion dilution-93- 200903021 TINUVIN 109 (manufactured by Ciba Specialty Chemicals Co., Ltd.) 1.2 parts by mass of TINUVIN 171 (manufactured by Ciba Specialty Chemicals Co., Ltd.) 0.8 parts by mass for the above After the dichloromethane and the polymer ruthenium and the polymer γ are completely dissolved by stirring, the cerium oxide dispersion is added and stirred and mixed to prepare a ginseng addition liquid. (Preparation of main blending liquid) Cellulose ester (cellulose triacetate synthesized from cotton wool, degree of substitution of acetyl group 2.92) Dichloromethane ethanol blending liquid 100 parts by mass 3 80 parts by mass 3 〇 The above-mentioned mass parts were placed in a sealed container, and the mixture was heated and stirred to completely dissolve the mixture. The mixture was filtered using an anti-filter paper (manufactured with a filter paper) to prepare a main blend. The main blending liquid was filtered by Finemate NF manufactured by Nippon Seisaku Co., Ltd., and uniformly spread on a stainless steel conveyor belt support at a temperature of 221, 2 m using a conveyor belt casting device. With a stainless steel conveyor belt support, evaporate the solvent to a residual solvent level of I 0 5 % to strip the tension! 6 2 N / m Peel off from the stainless steel conveyor belt support. The peeled cellulose ester web was evaporated at 35 ° C, cut into a width of 1 · 6 ιη, and then extended by a tenter in the width direction to 1 · 1 times to 1 3 5 t Dry at dry temperature. At this time, the amount of residual solvent when the tenter starts to extend is 〇%. After stretching with a tenter, the wide tension is relaxed at 130 ° C and the width is maintained -94-200903021. After drying in a dry zone at 120 ° C and 130 ° C, it is dried by a plurality of rolls and cut into 1.5 m. The width was applied to the both ends of the film by a process of marking a width of 10 mm in height. The initial temperature was 22 〇N/m, and the final tension was 110 N/m to form an inner diameter of 6 inches, thereby obtaining a cellulose ester film 1. The stretching ratio calculated from the rotational speed of the stainless belt support and the running speed of the tenter is 1.1 times. The residual solubility of the cellulose ester film 1 was less than 0.1%, and the film thickness was 4 Ο μ m. [Preparation of the anti-glare film 1] The surface of the cellulose ester film 1 (on the side of the B surface; the surface on which the support mirror surface such as the stainless steel conveyor belt used for casting is joined; the side) is hard-coated as follows. The layer coating liquid 1 was filtered with a pore size of 2 μm m olefin filter to prepare a coating liquid for a hard coat layer, which was applied by a gravure coater, dried at 90 ° C, and then purple. The illuminance of the illuminating unit was 0.1°W/cm2, the irradiation amount was 0.1 J/cm2, and the layer was hardened to form an anti-glare hard coating layer having a thickness of 5 μm. The WYKO interferometric surface roughness measuring machine was used to perform an arithmetic mean surface roughness (measured as 1 33 nm. Further, the average center-to-center distance of the convex portion was applied (coating of the hard coating layer) Cloth liquid 1) The following materials are stirred and mixed to form a propylene-based monomer for hard coating layer coating; KAYARAD DPHA (dipentaerythritol six-end dryness 7μηι under coiled steel to transport MD square dose in each membrane method) Polyacrylic using a micro-external lamp to make a coating of glare thin optical Ra) of 3 3 μ m liquid 1. Acrylic acid-95 - 200903021 Ester, manufactured by Nippon Chemical Co., Ltd.) hexaacrylate vinegar, manufactured by Nippon Chemical Co., Ltd.) 200 parts by mass photopolymerization Starting agent (IRGACURE 184 (manufactured by Ciba Specialty Chemicals Co., Ltd.)) 25 parts by mass of propylene glycol monomethyl ether 110 parts by mass of ethyl acetate 1 1 〇 parts by mass of synthetic cerium oxide fine particles average particle diameter 1.8 μmη 40 parts by mass of surfactant (lanthanum surfactant; FZ2207 (manufactured by Nippon Unicar) 10 mass% propylene glycol monomethyl ether solution) Solid content: 0.6 parts by mass [anti-glare film 2 (anti-glare film by spray method)) (Production of the first layer) The surface of the cellulose ester film 1 (the surface on the B side; the surface on which the support mirror surface such as the stainless steel conveyor belt used in the casting film forming method is joined; the support side) The hardened resin layer coating composition 1 is coated with a slit die to gradually strengthen the hot air temperature and the wind speed, and is finally dried at 85 ° C, and continues to be irradiated with the active light to be 1 1 5 nU/cm 2 . Ultraviolet irradiation was performed under irradiation intensity to cure the resin layer, and the first layer was produced. The dried film thickness obtained by the following composition was 5 μm. (solid content) propylene-based monomer; KAYARAD DPHA (dipentaerythritol hexaacrylate, manufactured by Nippon Kasei Co., Ltd.) 7 parts by mass of trimethylolpropane triacrylate 30 parts by mass of photopolymerization initiator (IRGACURE 1 84) (Ciba Specialty -96- 200903021

Chemicals(股)製)) 4質量份 (溶劑) 丙一醇單甲酸 75質量份 甲基乙基酮 25質量份 前述第1層上面’將下述凸部塗佈液1藉由噴射方式 射出墨水液滴2〜1 6 p 1 ’乾燥後〇 · 2秒,藉由活性光線照 射部以紫外線照度O.lW/cm2、照射量爲i〇〇mj/cm2使其硬 化形成凸部。 噴射射出裝置爲使用線條頭(line head)方式(圖4 之(a)) ’準備1〇個具有256個噴嘴徑爲3·5μπι之噴嘴 。噴射頭爲使用如圖3所記載的構成者。墨水供給系係由 墨水供給筒、過濾器、加壓型之噴射頭及配管所構成,自 墨水供給筒至噴射頭部爲經隔熱及加溫(40t ),射出溫 度爲40 °C,驅動頻率數爲20kHz下進行。 凸部形成後於薄膜表面,含有1 %氧之氮環境氣體的 大氣壓下,以100 KHz之高頻率電壓下藉由電漿放電進行 表面處理後,將下述透明樹脂層用塗佈液1藉由減壓壓出 法進行塗佈,製作出防眩性薄膜2。 對於所形成之防眩性薄膜使用WYKO公司製光學干涉 式表面粗度測定機,進行算術平均表面粗度Ra之測定, 結果爲1 2 7 n m。又,凸部之平均中心間距離爲2 8 μιη。 (凸部塗佈液1 ) -97- 200903021 丙烯基單體; KAYARAD DPHA(二季戊四醇 酯,日本化藥製) 7 〇質量份 三羥甲基丙烷 三丙烯酸酯 3 0質量份 光聚合啓 始劑(IRGACURE 1 84(Ciba Chemicals(股)製)) 4質量份 丙二醇單甲醚 20質量份 二乙二醇單丁醚乙酸酯 1 8 0質量份 混合攪拌上述組成物,調製出凸部塗佈液。 (透明樹脂層塗佈液1 ) 丙烯基單體; KAYARAD DPHA(二季戊四醇 酯、日本化藥製) 1〇〇質量份 三羥甲基丙烷 三丙烯酸酯 40質量份 光聚合啓 始劑(IRGACURE 184(Ciba Chemicals(股)製)) 6質量份 丙二醇單甲醚 5 0質量份 甲基乙基酮 5 0質量份 混合攪拌上述組成物,調製出透明樹脂層塗 六丙烯酸Chemicals (manufactured by Chemicals Co., Ltd.)) 4 parts by mass (solvent), 75 parts by mass of propanol monocarboxylic acid, 25 parts by mass of methyl ethyl ketone, 25 parts by mass of the above first layer, 'the following convex portion coating liquid 1 is ejected by spraying The droplets 2 to 1 6 p 1 'after drying for 2 seconds, the active light irradiation portion was cured to form a convex portion with an ultraviolet ray illuminance of 0.1 W/cm 2 and an irradiation amount of i 〇〇 mj/cm 2 . The jet ejection device was prepared by using a line head method (Fig. 4 (a))' to have one nozzle having 256 nozzle diameters of 3·5 μm. The head is a member as shown in FIG. The ink supply system is composed of an ink supply cylinder, a filter, a pressurized injection head, and a pipe. The ink supply cylinder and the injection head are insulated and heated (40t), and the injection temperature is 40 °C. The frequency is performed at 20 kHz. After the convex portion is formed, the surface of the film is subjected to surface treatment by plasma discharge at a high frequency of 100 KHz at atmospheric pressure of 1% oxygen nitrogen atmosphere gas, and then the following transparent resin layer coating liquid 1 is used. The anti-glare film 2 was produced by coating by a reduced pressure extrusion method. The optical interferometric surface roughness measuring machine manufactured by WYKO Co., Ltd. was used to measure the arithmetic mean surface roughness Ra, and the result was 1 2 7 n m. Further, the average center-to-center distance of the convex portions is 28 μm. (Protrusion coating liquid 1) -97- 200903021 Propylene-based monomer; KAYARAD DPHA (dipentaerythritol ester, manufactured by Nippon Kasei Co., Ltd.) 7 〇 parts by mass of trimethylolpropane triacrylate 30 parts by mass of photopolymerization initiator (IRGACURE 1 84 (manufactured by Ciba Chemicals Co., Ltd.)) 4 parts by mass of propylene glycol monomethyl ether 20 parts by mass of diethylene glycol monobutyl ether acetate 1 80 parts by mass, and the above composition was stirred and mixed to prepare a convex coating. liquid. (Transparent resin layer coating liquid 1) Propylene-based monomer; KAYARAD DPHA (dipentaerythritol ester, manufactured by Nippon Kayaku Co., Ltd.) 1 part by mass of trimethylolpropane triacrylate 40 parts by mass of photopolymerization initiator (IRGACURE 184) (manufactured by Ciba Chemicals Co., Ltd.)) 6 parts by mass of propylene glycol monomethyl ether 50 parts by mass of methyl ethyl ketone 50 parts by mass, and the above composition was stirred and mixed to prepare a transparent resin layer coated with hexaacrylic acid.

Specialty 六丙烯酸Specialty Six Acrylic

Specialty 佈液。 〔防眩性薄膜3的製作〕 2同樣之 使用下述凸部塗佈液2以外,與防眩性薄 方法製作出防眩性薄膜3。 (凸部塗佈液2) -98- 200903021 丙烯基單體;KAYARAD DPHA(二季戊四醇六丙烯酸 酯,日本化藥製) 7 0質量份 三經甲基丙院三丙嫌酸醋 30質量份 光聚合啓始齊}| (IRGACURE 184(Ciba SpecialtySpecialty cloth. [Preparation of the anti-glare film 3] In the same manner as the above-mentioned convex portion coating liquid 2, the anti-glare film 3 was produced in a thin manner. (Protrusion coating liquid 2) -98- 200903021 Propylene-based monomer; KAYARAD DPHA (dipentaerythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.) 70 parts by mass of trimethoprimin tripropylene vinegar 30 parts by mass of light Aggregation Starts}| (IRGACURE 184 (Ciba Specialty

Chemicals(股)製)) 4質量份 丙二醇單甲醚 20質量份 二乙二醇單丁醚乙酸酯 80質量份 混合攪拌上述組成物,調製出凸部塗佈液。 對於所製作之防眩性薄膜3,使用WYKO公司製光學 干涉式表面粗度測定機,進行平均表面粗度(Ra )之測定 ,結果爲146nm。又,凸部之平均中心間距離爲33μπι。 〔背塗佈層之形成〕 塗佈設置上述硬塗佈層之反面上,進行下述背塗佈層 塗佈液之膜塗佈至濕膜厚成爲1 4 μηι,於8 5 °C進行乾燥並 捲取,設置背塗佈層。 (背塗佈層用塗佈液)4 parts by mass of propylene glycol monomethyl ether 20 parts by mass of diethylene glycol monobutyl ether acetate 80 parts by mass The above composition was stirred and mixed to prepare a convex coating liquid. The optical interference type surface roughness measuring instrument manufactured by WYKO Co., Ltd. was used to measure the average surface roughness (Ra), and the result was 146 nm. Further, the average center-to-center distance of the convex portions was 33 μm. [Formation of Back Coating Layer] The back surface of the hard coating layer was applied and applied, and the film of the following back coating layer coating liquid was applied to a wet film thickness of 14 μm, and dried at 85 ° C. And take up and set the back coating layer. (coating solution for back coating layer)

Aerosil200V) 丙酮 乙酸乙酯 異丙基醇類 二Aerosil200V) Acetone Ethyl acetate Isopropyl alcohol II

超微粒子二氧化矽 3 〇質量份 45質量份 1 〇質量份 0.6質量份 2 %丙酮分散液(曰本 0.2質量份Ultrafine particle cerium oxide 3 〇 parts by mass 45 parts by mass 1 〇 parts by mass 0.6 parts by mass 2% acetone dispersion (0.2 parts by mass)

Aerosil(股)製 -99- 200903021 &lt;大氣壓電漿處理&gt; 使用特願2005 -3 5 1 829號之圖7所記載的大氣壓電漿 處理裝置,於硬塗佈層表面進行下述大氣壓電發處理。 使電極間隙爲〇 · 5 m m,將以下所示放電氣體供給於放 電空間,使用神鋼電機公司製高頻率電源,於頻率數 13.5MHz、外加電壓Vp = 9.5kV及出力密度i.5\V/cm2下形 成放電進行表面處理。 (放電氣體) 氮氣 80.0體積% 氧氣 2 0.0體積% 〔高折射率層之形成〕 於硬塗佈層之表面上,進行下述高折射率層塗佈液之 膜塗佈,於80°C下乾燥後,將120mJ/cm2之紫外線以高壓 水銀燈照射,設置高折射率層至硬化後的膜厚爲1 1 Onm。 高折射率層之折射率爲1.60。 (高折射率層塗佈液) 40質量份 25質量份 25質量份 〇. 9質量份 PGME(丙二醇單甲醚) 異丙基醇類 甲基乙基酮 季戊四醇三丙烯酸酯 -100- 200903021 季戊四醇四丙烯酸酯 1.0質量份 尿烷丙烯酸酯(商品名_·υ-4 Η A,新中村化學工業公司製 ) 〇 · 6質量份 粒子分散液Α(下述) 20質量份 1-羥基-環己基-苯基-酮(IRGACURE 184、Ciba SpecialtyChemicals 公司製) 〇.4 質量份 2 -甲基· 1 -〔 4 -(甲基硫)苯基〕-2 ·嗎啉代丙烷-1 -酮 (IRGACURE 907、Ciba Specialty Chemicals 公司製) 〇·2質量份 FZ-2207(10%丙二醇單甲醚溶液,日本unicar公司製) 〇·4質量份 (粒子分散液A之調製) 甲醇分散銻複氧化物膠體(固體成分60%、日產化學 工業(股)製、銻酸鋅溶膠、商品名:西路拿克斯CX-Z610M-F2) 6.0kg中將異丙基醇類12.0kg攪拌下徐徐添加 ,調製出粒子分散液A。 〔防眩性防反射薄膜1的製作〕 於上述防眩性薄膜1上,將下述低折射率層塗佈液1 以壓出塗佈機進行塗佈,於1 00 °C下進行1分鐘乾燥後, 以紫外線0.1 J/cm2、照射量爲lOOmJ/cm2下使其硬化,再 於1 20°C下進行5分鐘熱硬化,製作出防眩性防反射薄膜 1。且,低折射率層塗佈液之黏度爲].8 m P a · s,所得之低 -101 - 200903021 折射率層之折射率爲1 . 3 7 ° 且,黏度爲25°C中使用山一電機公司製之 VISCO MATE MODEL VM-1G進行測定,折射率以阿貝之折射計 進行測定。 (低折射率層塗佈液1 ) 丙二醇單甲醚 500質量份 異丙基醇類 500質量份 四乙氧基矽烷水解物A (下述、固型分2 1 %換算) 120質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ503,信越化學工業公司製) 3.0質量份 異丙基醇類分散中空二氧化矽系微粒子1(下述,固 體成分20%,平均粒徑45 nm、粒徑變動係數30% ) 40質量份 銘乙基乙醯乙酸酯•二異丙酸醋(Kawaken Fine ChemicalsCo.,Ltd 製 ALCH) 3.0 質量份 FZ-2207 ( 10%丙二醇單甲醚溶液、日本unicar公司 製) 3 · 0質量份 (四乙氧基矽烷水解物A之調製) 混合四乙氧基矽烷23 0g (商品名:KBE04、信越化學 工業公司製)與乙醇4 4 0 g ’於此添加2 %乙酸水溶液1 2 0 g 後,室溫(2 51:)下攪拌2 8小時’調製出四乙氧基矽烷 -102 - 200903021 水解物A。 (異丙基醇類分散中空二氧化矽系微粒子1之調製) 將平均粒徑5 n m、S i Ο 2濃度2 0質量%之二氧化矽溶膠 l〇〇g與純水1900g之混合物加溫至80°C。該反應母液之 pH爲10.5,同母液中作爲Si〇2同時添加0.98質量%之矽 酸鈉水溶液9 0 0 0 g與作爲A12 Ο 3之1 . 0 2質量%的鋁酸鈉水 溶液9000g。其間,反應液之溫度保持於80°C。反應液之 pH於添加後馬上上升至1 2 · 5,其後幾乎無變化。添加終 了後,將反應液於室溫下冷卻,以極限過濾膜洗淨調製出 固體成分濃度20質量%之Si02 · Al2〇3核粒子分散液。( 步驟(a )) 該核粒子分散液 5 0 0 g中加入純水1 7 0 0 g,加溫至 98°C,保持該溫度下,添加將矽酸鈉水溶液使用陽離子交 換樹脂進行脫鹼所得之矽酸液(Si02濃度3.5質量% ) 3000g,得到形成第1二氧化矽被覆層之核粒子的分散液 。(步驟(b )) 其次,形成以極限過濾膜洗淨後成爲固體成分濃度1 3 質量%之第〗二氧化矽被覆層之核粒子分散液500g中加入 純水1 1 2 5 g,再滴入濃鹽酸(3 5.5 % )使pH 1 . 0,進行脫鋁 處理。其次加入pH3之鹽酸水溶液1 0L與純水5L下,以 極限過濾膜分離經溶解之鋁鹽,調製出形成第1二氧化矽 被覆層之核粒子的構成成分之一部經除去的S i Ο 2 · A 12 0 3 多孔質粒子之分散液(步驟(c ))。上述多孔質粒子分 -103- 200903021 散液1 5 00g、與純水5 00g、乙醇l,7 5 0g及28%氨水62 6g 之混合液經加溫至35°C後,添加乙基矽酸酯(Si0228質量 %) 104g’形成第1二氧化矽被覆層之多孔質粒子的表面 以乙基矽酸酯的水解縮聚物進行包覆而形成第2二氧化矽 被覆層。其次,使用極限過濾膜調製出溶劑由異丙基醇類 取代的固體成分濃度20質量%之中空二氧化矽系微粒子1 的分散液。 該中空二氧化矽系微粒子之第1二氧化矽被覆層的厚 度爲 3nm,平均粒徑爲 45nm,M0x/Si02(莫耳比)爲 0 · 0 0 1 7 ’折射率爲1 · 2 8。其中,平均粒徑及粒徑之變動係 數藉由動態散光法進行測定。 〔防眩性防反射薄膜2的製作〕 於上述防眩性薄膜3上,將下述低折射率層塗佈組成 物2以壓出塗佈機進行塗佈以外,與防反射薄膜丨之同樣 方法下製作出防眩性防反射薄膜2。且,低折射率層塗佈 液之黏度爲3.2mPa · s,所得之低折射率層的折射率爲 1.38。 (低折射率層塗佈液2 ) 丙烯基單體;OP-38Z (氟化丙烯基樹脂、大日本墨水 化學工業(股)製) 3 · 3質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty G· 17質量份 hemicals (股)製)) -104 - 200903021 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ503,信越化學工業公司製) 0.17質量份 乙二醇單丁醚乙酸酯 77質量份 丙二醇單甲醚 20質量份 〔防眩性防反射薄膜3的製作〕 上述防眩性薄膜3上,欲將上述低折射率層塗佈液2 成爲表4所示平均乾燥膜厚(hd ),藉由噴射方式以2〜 1 6 p 1射出墨水液滴,乾燥後〇 . 2秒後藉由活性光線照射部 以紫外線照度爲0 · 1 W / c m2、照射量爲1 0 0 m J / c m2下使其硬 化’製作出防眩性防反射薄膜3。 噴射射出裝置爲使用線條頭(line head )方式(圖4 的(a)),噴嘴徑準備1〇個具有256個10·5μπι噴嘴徑 之噴射頭。噴射頭爲使用如圖3所記載的構成者。墨水供 給系係由墨水供給筒、過濾器、加壓型噴射頭及配管所構 成’自墨水供給筒至噴射頭部,進行隔熱及加溫(4 0 °C ) ’射出溫度爲40 °C,驅動頻率數爲20kHz下進行。 〔防眩性防反射薄膜4〜1 9的製作〕 於上述防眩性薄膜1〜3上欲使下述低折射率層塗佈 液3〜14成爲如表4所示之平均乾燥膜厚(hd),藉由噴 射方式進行塗佈以外,與防眩性防反射薄膜3之同樣方法 下製作出防眩性防反射薄膜4〜1 9。 -105- 200903021 (低折射率層塗佈液3 ) 丙烯基單體;OP-38Z (氟化丙烯基樹脂,大日本墨水 化學工業(股)製) 10質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 0.5 質量份 γ -甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ503、信越化學工業公司製) 0.5質量份 乙二醇單丁醚乙酸酯 72質量份 丙二醇單甲醚 17質量份 且,低折射率層塗佈液的黏度爲5 . 1 mPa · s,所得之 低折射率層的折射率爲3 8。 (低折射率層塗佈液4 ) 丙烯基單體;OP-38Z (氟化丙烯基樹脂,大日本墨水 化學工業(股)製) 2 5質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 1.3 質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ503,信越化學工業公司製) 1.3質量份 乙二醇單丁醚乙酸酯 60質量份 丙二醇單甲醚 15質量份 且,低折射率層塗佈液之黏度爲6.2mPa . s,所得之 低折射率層的折射率爲1 . 3 8。 -106- 200903021 (低折射率層塗佈液5) 乙二醇單丁醚乙酸酯 150質量份 異丙基醇類 70胃Μ Μ 四乙氧基矽烷水解物Α (下述、固型分2 1 %換算) 120質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(茼品名: ΚΒΜ503,信越化學工業公司製) 3·0質量份 異丙基醇類分散中空二氧化砂系微粒子1 (下述’固 體成分2 0 %、平均粒徑4 5 n m、粒徑變動係數3 0 % ) 40質量份 鋁乙基乙醯乙酸酯•二異丙酸酯(Kawaken Fine ChemicalsCo.,Ltd 製 ALCH) 3.0 質量份 FZ-2207 ( 10%丙二醇單甲醚溶液、日本unicar公司 製) 3 · 0質量份 且,低折射率層塗佈液之黏度爲3.8mPa · s,所得之 低折射率層的折射率爲1 . 3 8。 (低折射率層塗佈液6 ) 丙烯基單體;OP-3 8Z (氟化丙烯基樹脂,大日本墨水 化學工業(股)製) 5 0質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 2.5 質量份 γ -甲基丙嫌與基丙基三甲氧基石夕院(商品名: ΚΒΜ503’信越化學工業公司製) 2.5質量份 -107- 200903021 乙二醇單丁醚乙酸酯 38質量份 丙二醇單甲醚 10質量份 且,低折射率層塗佈液的黏度爲8 . 3 mPa · s,所得之 低折射率層的折射率爲1 . 3 8。 (低折射率層塗佈液7 ) 丙烯基單體;OP-38Z (氟化丙烯基樹脂,大日本墨水 化學工業(股)製) 50質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 2.5 質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ503,信越化學工業公司製) 2_5質量份 異丙基醇類分散中空二氧化矽系微粒子1 25質量份 乙二醇單丁醚乙酸酯 14質量份 丙二醇單甲醚 9質量份 且,低折射率層塗佈液的黏度爲4.6mPa · s,所得之 低折射率層的折射率爲1 . 3 7。 (低折射率層塗佈液8) 丙烯基單體;OP-38Z (氟化丙烯基樹脂、大日本墨水 化學工業(股)製) 50質量份 光聚合啓始劑(IRGACURE ]84 ( Ciba Specialty Chemicals (股)製)) 2.5 質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: -108- 200903021 ΚΒΜ 5 0 3,信越化學工業公司製) 2.5質量份 異丙基醇類分散中空二氧化矽系微粒子1 25質量份 乙二醇單丁醚乙酸酯 14質量份 丙二醇 9質量份 且,低折射率層塗佈液的黏度爲1 8mPa . s ,所得之低 折射率層的折射率爲1 . 3 7。 (低折射率層塗佈液9 ) 丙烯基單體;OP-3 8Z (氟化丙烯基樹脂,大日本墨水 化學工業(股)製) 5 0質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 2.5 質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ503,信越化學工業公司製) 2.5質量份 乙二醇單丁醚乙酸酯 24質量份 丙二醇單甲醚 24質量份 且,該低折射率層之折射率爲 1.38,黏度爲 7 · 6 m P a · s。 (低折射率層塗佈液1 0 ) 丙烯基單體;OP-3 8Z (氟化丙烯基樹脂,大日本墨水 化學工業(股)製) 5 0質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 2.5 質量份 109- 200903021 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ503,信越化學工業公司製) 2.5質量份 乙二醇 3 8質量份 丙二醇單甲醚 10質量份 且,低折射率層塗佈液的黏度爲1 4 · 8 m P a · s,所得之 低折射率層的折射率爲1 . 3 8。 (低折射率層塗佈液11 ) 丙烯基單體;歐普斯達JM5010(:iSR (股)製) 1 3 0質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 2.5 質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ5 03,信越化學工業公司製) 2.5質量份 乙二醇單丁醚乙酸酯 38質量份 丙二醇單甲醚 10質量份 且’低折射率層塗佈液的黏度爲6.6 m P a . s,所得之 低折射率層的折射率爲1 .4 1。 (低折射率層塗佈液1 2 ) 丙燦基單體;萊特醋FM-108(共榮公司化學(股) 製) 1 〇 〇質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 2.5 質量份 -110- 200903021 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名 2.5質量份 ΚΒΜ503,信越化學工業公司製Aerosil (manufactured by the company) - 99-200903021 &lt;Atmospheric piezoelectric slurry treatment&gt; The atmospheric piezoelectric slurry treatment device described in Fig. 7 of Japanese Patent Application No. 2005-35 No. 829, the following atmospheric piezoelectricity is applied to the surface of the hard coating layer. Send processing. The electrode gap was 〇·5 mm, and the discharge gas shown below was supplied to the discharge space, and a high-frequency power source manufactured by Kobelco Electric Co., Ltd. was used at a frequency of 13.5 MHz, an applied voltage of Vp = 9.5 kV, and an output density of i.5/V/ A discharge was formed under cm2 for surface treatment. (Discharge gas) Nitrogen gas 80.0% by volume Oxygen gas 2 0.0% by volume [Formation of high refractive index layer] On the surface of the hard coat layer, film coating of the following high refractive index layer coating liquid was carried out at 80 ° C After drying, ultraviolet rays of 120 mJ/cm 2 were irradiated with a high pressure mercury lamp, and the high refractive index layer was set to a film thickness of 1 1 Onm after hardening. The refractive index of the high refractive index layer was 1.60. (High refractive index layer coating liquid) 40 parts by mass of 25 parts by mass of 25 parts by mass of ruthenium. 9 parts by mass of PGME (propylene glycol monomethyl ether) isopropyl alcohol methyl ethyl ketone pentaerythritol triacrylate-100-200903021 Pentaerythritol IV Acrylate 1.0 part by mass of urethane acrylate (trade name _·υ-4 Η A, manufactured by Shin-Nakamura Chemical Co., Ltd.) 〇·6 parts by mass of particle dispersion Α (described below) 20 parts by mass of 1-hydroxy-cyclohexyl group Phenyl-ketone (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 4. 4 parts by mass of 2-methyl·1-[4-(methylthio)phenyl]-2·morpholinopropan-1-one (IRGACURE 907) , manufactured by Ciba Specialty Chemicals Co., Ltd. 2·2 parts by mass of FZ-2207 (10% propylene glycol monomethyl ether solution, manufactured by Unicar, Japan) 〇·4 parts by mass (modulation of particle dispersion A) Methanol dispersed ruthenium complex oxide colloid ( 60% solid content, Nissan Chemical Industry Co., Ltd., zinc citrate sol, trade name: West Lukes CX-Z610M-F2) 6.0 kg of isopropyl alcohol 12.0 kg was slowly added and stirred to prepare Particle dispersion A. [Preparation of the anti-glare anti-reflection film 1] The low-refractive-index layer coating liquid 1 described below was applied to the anti-glare film 1 by an extrusion coater, and dried at 100 ° C for 1 minute. After drying, it was cured by ultraviolet rays of 0.1 J/cm 2 and an irradiation amount of 100 μJ/cm 2 , and then thermally cured at 10 ° C for 5 minutes to prepare an anti-glare antireflection film 1 . Further, the viscosity of the low refractive index layer coating liquid is .8 m P a · s, and the obtained low-101 - 200903021 refractive index layer has a refractive index of 1.37 ° and the viscosity is 25 ° C. The VISCO MATE MODEL VM-1G manufactured by Aki Electric Co., Ltd. was measured, and the refractive index was measured by Abbe's refractometer. (Low-refractive-index layer coating liquid 1) Propylene glycol monomethyl ether 500 parts by mass of isopropyl alcohol 500 parts by mass of tetraethoxy decane hydrolyzate A (hereinafter, solid type conversion is 2%) 120 parts by mass γ- Methacryloxypropyltrimethoxydecane (trade name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 3.0 parts by mass of isopropyl alcohol-dispersed hollow ceria-based fine particles 1 (hereinafter, solid content 20%, average particle size) 45 nm diameter, particle size variation coefficient 30%) 40 parts by mass of ethyl ethyl acetate acetate • Diisopropyl vinegar (ALCH, manufactured by Kawaken Fine Chemicals Co., Ltd.) 3.0 parts by mass FZ-2207 (10% propylene glycol monomethyl) Ether solution, manufactured by Nippon Unicar Co., Ltd.) 3 · 0 parts by mass (preparation of tetraethoxy decane hydrolysate A) Mixed tetraethoxy decane 23 0 g (trade name: KBE04, manufactured by Shin-Etsu Chemical Co., Ltd.) and ethanol 4 4 0 After adding 1 2 0 g of a 2% aqueous acetic acid solution, the mixture was stirred at room temperature (2 51 :) for 28 hours to prepare tetraethoxy decane-102 - 200903021 hydrolyzate A. (Preparation of isopropyl alcohol-dispersed hollow cerium oxide-based fine particles 1) A mixture of cerium oxide sol 100 μg having an average particle diameter of 5 nm and a concentration of 20 μ% of S i Ο 2 and 1900 g of pure water was heated. To 80 ° C. The pH of the reaction mother liquid was 10.5, and 0.90 mass% of an aqueous sodium citrate solution of 0.98 mass% and 9000 g of a sodium aluminate aqueous solution of 1.02 mass% of A12 Ο 3 were simultaneously added as Si〇2 in the mother liquid. In the meantime, the temperature of the reaction liquid was maintained at 80 °C. The pH of the reaction solution rose to 1 2 · 5 immediately after the addition, and there was almost no change thereafter. After the completion of the addition, the reaction solution was cooled at room temperature, and washed with a limiting filtration membrane to prepare a SiO 2 · Al 2 〇 3 core particle dispersion having a solid concentration of 20% by mass. (Step (a)) Adding 1 700 g of pure water to the 500 g of the core particle dispersion, heating to 98 ° C, and maintaining the temperature, adding the sodium citrate aqueous solution to remove the alkali using a cation exchange resin The obtained citric acid solution (SiO 2 concentration: 3.5% by mass) was 3000 g, and a dispersion liquid of the core particles forming the first ceria coating layer was obtained. (Step (b)) Next, a 500 g of a core particle dispersion liquid of a cerium oxide coating layer which is washed with a limit filtration membrane and having a solid content concentration of 13% by mass is added to the raw water 1 1 2 5 g, and then dropped. The concentrated hydrochloric acid (35.5 %) was allowed to bring the pH to 1.0, and the dealumination treatment was carried out. Next, 10 L of a hydrochloric acid aqueous solution of pH 3 and 5 L of pure water were added, and the dissolved aluminum salt was separated by a limiting filtration membrane to prepare a S i 除去 which was removed from one of the constituent components of the core particle forming the first ceria coating layer. 2 · A 12 0 3 dispersion of porous particles (step (c)). The above porous substrate is divided into -103-200903021, a liquid mixture of 1 500 00g, a pure water of 500 g, an ethanol 1,7550 g, and a 28% aqueous ammonia 62 6 g, and the mixture is heated to 35 ° C, and then ethyl citric acid is added. Ester (Si0228% by mass) 104 g' The surface of the porous particle forming the first ceria coating layer was coated with a hydrolyzed polycondensate of ethyl phthalate to form a second ceria coating layer. Next, a dispersion of hollow ceria-based fine particles 1 having a solid content of 20% by mass in which the solvent was replaced by isopropyl alcohol was prepared by using a limiting filtration membrane. The first ceria coating layer of the hollow ceria-based fine particles has a thickness of 3 nm, an average particle diameter of 45 nm, and a M0x/SiO 2 (mole ratio) of 0 · 0 0 1 7 ' refractive index of 1 · 28 . Among them, the coefficient of variation of the average particle diameter and the particle diameter was measured by a dynamic astigmatism method. [Preparation of the anti-glare film 2] The following low-refractive-index layer coating composition 2 is applied to the anti-glare film 3 by an extrusion coater, and is the same as the anti-reflection film. An anti-glare antireflection film 2 was produced by the method. Further, the viscosity of the low refractive index layer coating liquid was 3.2 mPa·s, and the refractive index of the obtained low refractive index layer was 1.38. (low refractive index layer coating liquid 2) propylene-based monomer; OP-38Z (fluorinated propylene-based resin, manufactured by Dainippon Ink Chemicals Co., Ltd.) 3 · 3 parts by mass of photopolymerization initiator (IRGACURE 184 (Ciba) Specialty G· 17 parts by mass of hemicals ())) -104 - 200903021 γ-Methyl acryloxypropyltrimethoxy decane (trade name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 0.17 parts by mass of ethylene glycol monobutyl Ethyl acetate 77 parts by mass of propylene glycol monomethyl ether 20 parts by mass [Preparation of anti-glare antireflection film 3] The above-mentioned anti-glare film 3 is intended to have the above-mentioned low refractive index layer coating liquid 2 as shown in Table 4. The film thickness (hd) is dried, and the ink droplets are ejected by spraying at 2 to 16 p 1 , and dried. After 2 seconds, the ultraviolet illuminance is 0 · 1 W / c m2 by the active light irradiation portion. An anti-glare antireflection film 3 was produced by hardening it under 100 m J / c m2. The jet injection device was a line head method (Fig. 4 (a)), and a nozzle having a nozzle diameter of 256 10·5 μπι was prepared for the nozzle diameter. The head is a member as shown in FIG. The ink supply system consists of an ink supply cylinder, a filter, a pressurized spray head, and a pipe from the ink supply cylinder to the injection head for heat insulation and heating (40 ° C). The injection temperature is 40 °C. The driving frequency is 20 kHz. [Preparation of anti-glare antireflection film 4 to 19] The above-mentioned anti-glare films 1 to 3 are required to have the following low-refractive-index layer coating liquids 3 to 14 having an average dry film thickness as shown in Table 4 ( Hd) An anti-glare anti-reflection film 4 to 19 was produced in the same manner as the anti-glare anti-reflection film 3 except that the coating was carried out by spraying. -105- 200903021 (low refractive index layer coating liquid 3) propylene-based monomer; OP-38Z (fluorinated propylene-based resin, manufactured by Dainippon Ink Chemicals Co., Ltd.) 10 parts by mass of photopolymerization initiator (IRGACURE 184) (manufactured by Ciba Specialty Chemicals Co., Ltd.) 0.5 parts by mass of γ-methacryloxypropyltrimethoxydecane (trade name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 0.5 parts by mass of ethylene glycol monobutyl ether acetate 17 parts by mass of propylene glycol monomethyl ether was 17 parts by mass, and the viscosity of the low refractive index layer coating liquid was 5.1 mPa·s, and the obtained low refractive index layer had a refractive index of 38. (low refractive index layer coating liquid 4) propylene-based monomer; OP-38Z (fluorinated propylene-based resin, manufactured by Dainippon Ink Chemicals Co., Ltd.) 2 5 parts by mass of photopolymerization initiator (IRGACURE 184 (Ciba Specialty Chemicals (manufactured by Chemicals Co., Ltd.)) 1.3 parts by mass of γ-methacryloxypropyltrimethoxydecane (trade name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 1.3 parts by mass of ethylene glycol monobutyl ether acetate 60 parts by mass The propylene glycol monomethyl ether was 15 parts by mass, and the viscosity of the low refractive index layer coating liquid was 6.2 mPa·s, and the obtained low refractive index layer had a refractive index of 1.38. -106- 200903021 (low refractive index layer coating liquid 5) ethylene glycol monobutyl ether acetate 150 parts by mass isopropyl alcohol 70 stomach Μ Μ tetraethoxy decane hydrolyzate Α (hereinafter, solid type 2% conversion) 120 parts by mass of γ-methacryloxypropyltrimethoxydecane (product name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 3·0 parts by mass of isopropyl alcohol-dispersed hollow silica sand-based fine particles 1 (The following 'solid content 20%, average particle diameter 45 nm, particle diameter variation coefficient 30%) 40 parts by mass of aluminum ethyl acetonitrile acetate • diisopropyl ester (Kawaken Fine Chemicals Co., Ltd. ALCH) 3.0 parts by mass of FZ-2207 (10% propylene glycol monomethyl ether solution, manufactured by Nippon Unicar Co., Ltd.) 3 · 0 parts by mass, and the viscosity of the low refractive index layer coating liquid is 3.8 mPa · s, and the resulting low refractive index The refractive index of the layer is 1.38. (Low-refractive-index layer coating liquid 6) Propylene-based monomer; OP-3 8Z (fluorinated propylene-based resin, manufactured by Dainippon Ink Chemicals Co., Ltd.) 50 parts by mass of photopolymerization initiator (IRGACURE 184 (Ciba) Specialty Chemicals Co., Ltd.)) 2.5 parts by mass of γ-methyl propyl and propyl trimethoxy sylvestre (trade name: ΚΒΜ503' by Shin-Etsu Chemical Co., Ltd.) 2.5 parts by mass -107- 200903021 Ethylene glycol monobutyl The epoxy resin ester 38 parts by mass of propylene glycol monomethyl ether is 10 parts by mass, and the low refractive index layer coating liquid has a viscosity of 8.3 mPa · s, and the obtained low refractive index layer has a refractive index of 1.38. (low refractive index layer coating liquid 7) propylene-based monomer; OP-38Z (fluorinated propylene-based resin, manufactured by Dainippon Ink Chemicals Co., Ltd.) 50 parts by mass of photopolymerization initiator (IRGACURE 184 (Ciba Specialty Chemicals) (Stock))) 2.5 parts by mass of γ-methacryloxypropyltrimethoxydecane (trade name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 2_5 parts by mass of isopropyl alcohol-dispersed hollow cerium oxide-based fine particles 1 25 parts by mass of ethylene glycol monobutyl ether acetate, 14 parts by mass of propylene glycol monomethyl ether, 9 parts by mass, and the viscosity of the low refractive index layer coating liquid is 4.6 mPa · s, and the obtained low refractive index layer has a refractive index of 1 . 3 7. (low refractive index layer coating liquid 8) propylene-based monomer; OP-38Z (fluorinated propylene-based resin, manufactured by Dainippon Ink Chemicals Co., Ltd.) 50 parts by mass of photopolymerization initiator (IRGACURE) 84 (Ciba Specialty Chemicals (manufactured by Chemicals Co., Ltd.)) 2.5 parts by mass of γ-methacryloxypropyltrimethoxydecane (trade name: -108-200903021 ΚΒΜ 5 0 3, manufactured by Shin-Etsu Chemical Co., Ltd.) 2.5 parts by mass of isopropyl alcohol 9 parts by mass of ethylene oxide monobutyl ether acetate dispersing 14 parts by mass of propylene glycol and 9 parts by mass of propylene glycol, and the viscosity of the low refractive index layer coating liquid is 18 mPa·s , the obtained low refractive index layer The refractive index is 1.37. (Low-refractive-index layer coating liquid 9) Propylene-based monomer; OP-3 8Z (fluorinated propylene-based resin, manufactured by Dainippon Ink Chemicals Co., Ltd.) 50 parts by mass of photopolymerization initiator (IRGACURE 184 (Ciba) Specialty Chemicals Co., Ltd.)) 2.5 parts by mass of γ-methacryloxypropyltrimethoxydecane (trade name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 2.5 parts by mass of ethylene glycol monobutyl ether acetate 24 mass The propylene glycol monomethyl ether was 24 parts by mass, and the low refractive index layer had a refractive index of 1.38 and a viscosity of 7 · 6 m P a · s. (low refractive index layer coating liquid 10) propylene-based monomer; OP-3 8Z (fluorinated propylene-based resin, manufactured by Dainippon Ink Chemical Industry Co., Ltd.) 50 parts by mass of photopolymerization initiator (IRGACURE 184 ( Ciba Specialty Chemicals Co., Ltd.)) 2.5 parts by mass 109-200903021 γ-methacryloxypropyltrimethoxydecane (trade name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 2.5 parts by mass of ethylene glycol 3 8 parts by mass The propylene glycol monomethyl ether was 10 parts by mass, and the viscosity of the low refractive index layer coating liquid was 1 4 · 8 m P a · s, and the refractive index of the obtained low refractive index layer was 1.38. (Low-refractive-index layer coating liquid 11) Propylene-based monomer; Opsta JM5010 (manufactured by iSR Co., Ltd.) 1 30 parts by mass of photopolymerization initiator (IRGACURE 184 (manufactured by Ciba Specialty Chemicals Co., Ltd.)) 2.5 parts by mass of γ-methacryloxypropyltrimethoxydecane (trade name: ΚΒΜ5 03, manufactured by Shin-Etsu Chemical Co., Ltd.) 2.5 parts by mass of ethylene glycol monobutyl ether acetate 38 parts by mass of propylene glycol monomethyl ether 10 mass The viscosity of the low refractive index layer coating liquid was 6.6 m P a .s, and the refractive index of the obtained low refractive index layer was 1.41. (Low-refractive-index layer coating liquid 1 2 ) Propylene monomer; Wright vinegar FM-108 (manufactured by Kyoei Chemical Co., Ltd.) 1 〇〇 by mass photopolymerization initiator (IRGACURE 184 (Ciba Specialty Chemicals ( ())))) 2.5 parts by mass -110- 200903021 γ-methacryloxypropyltrimethoxydecane (trade name 2.5 parts by mass ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.

丙二醇單甲醚 3 8質量份 1 〇質量份 且,低折射率層塗佈液的黏度爲5.2mPa · s,所得之 低折射率層的折射率爲1 . 4 1。 (低折射率層塗佈液1 3 ) 丙烯基單體;萊特酯M _3F (共榮公司化學(股)製 ) 9 0質量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 2·5 質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ503,信越化學工業公司製) 2.5質量份 乙二醇單丁醚乙酸酯 38質量份 丙二醇單甲醚 10質量份 且,該低折射率層之折射率爲1 . 3 5,黏度爲6 · 1。 (低折射率層塗佈液1 4 ) 丙烯基單體;迪芬沙FH800ME(大日本墨水化學工業 (股)製) 3 00質量份 光聚合啓始劑(IRGACURE 184 (Ciba Specialty Chemicals (股)製)) 2.5 質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: -111 - 200903021 KBM503’信越化學工業公司製) 2.5質量份 乙二醇單丁醚乙酸酯 3 8質量份 丙二醇單甲醚 10質量份 且’低折射率層塗佈液的黏度爲9.8 m P a · s,所得之 低折射率層的折射率爲1 . 4 7。 〔防眩性防反射薄膜20〜23的製作〕 於上述防眩性薄膜3上,欲使下述低折射率層塗佈液 15成爲如表4所示的平均膜厚(hd),藉由噴射方式進行 塗佈’將到照射紫外線的時間改爲防眩性防反射薄膜20 爲〇. 1秒,防眩性防反射薄膜2 1爲2秒,防眩性防反射 薄膜22爲45秒,防眩性防反射薄膜23爲2分鐘以外, 與防眩性防反射薄膜3同樣之方法下製作出防眩性防反射 薄膜2 0〜2 3。 (低折射率層塗佈液1 5 ) 丙烯基單體;季戊四醇二丙烯酸酯二氟丁酸酯50質 量份 光聚合啓始劑(IRGACURE 184 ( Ciba Specialty Chemicals (股)製)) 3.0 質量份 γ-甲基丙烯氧基丙基三甲氧基矽烷(商品名: ΚΒΜ503,信越化學工業公司製) 3.0質量份 乙二醇單丁醚乙酸酯 38質量份 丙二醇單甲醚 〗〇質量份 112- 200903021 且,低折射率層塗佈液的黏度爲9.6mPa · s,所得之 低折射率層的折射率爲1 . 3 7。 《防眩性防反射薄膜的評估》 對於所製作之防眩性防反射薄膜,如下述對算術平均 表面粗度、膜厚、防眩性、反射率及擦傷性進行評估。 (算術平均表面粗度) 具JIS B 060 1 : 200 1,使用光學千涉式表面粗度計 RST/PLUS ( WYKO公司製),對於透明支持體(b面)、 硬塗佈層及防反射薄膜之各表面1.2mm&gt;&lt;0.9mm的面積, 求得算術平均表面粗度。 (膜厚) 對於所作成之防反射薄膜,使用日立掃描透過電子顯 微鏡HD-2 7 00,將斷層照片以10萬倍之擴大倍率下進行 攝影,目視下被確認之凸部分、凹部分各1 〇處的膜厚由 斷層照片使用計測器進行實測之平均値作爲hd 1、hd2之 各膜厚。又,hdl與hd2之平均値作爲平均膜厚。 (防眩性) 於具有窗戶的辦公室中,將各薄膜平放於桌子上,對 於由天窗之螢光燈照明及外光射入於薄膜者以如下述進行 評估。 -113- 200903021 5 :螢光燈之輪廓、及外光稍有射入,但未受到影響 〇 4 : 5與3之中間 3 :僅確認到稍有螢光燈之輪廓、及外光的射入 2 : 3與1之中間 1 :螢光燈之輪廓 '及外光明顯地射入而受到影響 (反射率) 對於製作之防眩性防反射薄膜,使用分光光度計(日 本分光(股)製),380〜7 80nm之波長區中,測定入射 角5 °中的分光反射率。反射防止性能爲較廣波長區中反射 率越小越佳,故由測定結果求得450〜650nm中之最低反 射率。測定爲觀察側的裏面經粗面化處理後,使用黑色噴 霧進行光吸收處理’防止薄膜裏面之光反射,進行反射率 之測定。 (擦傷性) 將S式料於23t,55%RH之環境下,於#〇〇〇〇之鋼絲絨 (SW )賦予25 0g/cm2之荷重,測定1〇次往復後的每 寬之傷痕數。且,傷痕數爲,賦予荷重之部分中傷痕條數 最多之位置進行測定。僅爲1〇條/cm以下即可,於實用上 不會有問題’但5條/cm以下爲佳’ 3條—以下爲更佳。 -114 - 200903021 備考 比較 比較 I比較| 1本發明1 1本發明1 I本發明| 1本發明ι 1本發明ι 1本發明ι 1本發明ι ι本發明ι 1本發明ι 1本發明1 1本發明| 1本發明1 本發明 1本發明ι 1本發明ι 本發明 本發明 本發明 本發明 本發明 評估 « w (N l/Ί 卜 00 (Ν Os 卜 Ο νο (Ν ro Ο ο (Ν m Ο 反射率 (%) vq oo 卜 rn «ο cn —· 00 Ο 二 q 〇. d Ον Ο 00 ο 卜 ο ο ο -* 寸· 防眩性 — '― - ΓΛ 对 ro 对 V5 rn ΓΛ 防反射層(低折射率層) 表面凹 凸Ra (μ m ) | 1 0.086 1 「0.098 |〇Tl02 1 0.057 0.137 1 0.123 , 1 0.128 1 1 0.136 1 1 o.iio 1 0.122 1 1 0.144 1 0.133 | 1 0.135 I |o7i4〇 | 1 0.142 1 0.142 1 1 0.142 1 1 0.144 1 1 0.141 0.146 0.139 0.131 0.121 hdl/hd2 _I o 寸 ο 00 ο oo (N o o ο o (Ν Ο 2 〇s v〇 ο i 1 〇 ΓΛ 00 〇 £ ο ο 〇s ΟΟ ο αν ο 00 00 ο οο ο (Ν 00 Ο νο V© ο Ο 凹部膜厚 hd2 (μ m ) 「0.175 | 1 0.175 1 1 0.170 1 0.390 0.045 0.136 1 0.128 | 1 0.116 1 1 0.127 1 1 0.118 1 1 0.103 1 1 0.120 | 0.117 | 1 0.109 | 0.107 0.106 1 1 0.107 1 ι 0.102 1 1 0.107 0.100 0.111 0.123 0.139 凸部膜厚 hdl (μηι) 0.025 0.025 0.030 ! 0.110 0.015 0.064 , | 0.072 | 1 0.084 1 1 0.073 1 0.082 1 1 0.097 1 1 0.080 | | 0.083 | | 0.091 | 1 0.093 1 0.094 1 0.093 1 1 0.098 1 1 0.093 0.100 0.089 0.077 0.061 平均膜厚 (μπι) __I 〇 o Ο Ο ο ο (N 〇 S 〇 ο ο 〇 o ο ο ο ο ο ο ο ο 〇 〇 〇 〇 〇 〇 ο ο ο ο ο ο ο ο ο ο S ο Ξ ο ο ο ο ο 塗佈 方式 |押出| 1押出 ·—» i ·—i »—a p-a &gt;—» &gt;—S a I—J 二 S 二 二 二 黏度 (mPa s) 」 oo (Ν (Ν c*-j IT) wS (N 00 ΠΊ m 00 r^i οο ΓΛ οο — 00 vq ΟΟ — νο CN \6 00 σ&lt; σ&lt; VD Ό c&gt; ν〇 σί Μ冬 _ 1¾ 画Φ ft ✓ 00 rn m m cn 〇 〇 ο (N 沄 沄 沄 - Ό Ό m ν'» 00 沄 低折射率 層塗佈液 No. 1 一 (N (Ν m -rr νο 卜 00 ON ο *— 寸 W-i m 嫩 廿I 表面凹 凸Ra (μ m ) I 0.133 I 0.146 0.146 0.146 I 0.146 I 1 0.146 1 0.146 Ι 0.146 Ι I 0.127 0.133 0.146 I 0.146 I 1 0.146 I 1 0.146 I 0.146 Ι 0.146 Ι 1 0.146 Ι 1 0.146 Ι 1 0.146 0.146 0.146 0.146 0.146 w αα 111 — m m m ΓΛ (Ν — ΓΛ m m m m m 防眩性 防反射 薄膜 No. — (N yr) Ό 卜 00 ΟΝ ο — (N m 卜 οο (Ν (Ν m (Ν -115- 200903021 由表4得知,本發明的試料與比較例相比較,具有優 良的防眩性、反射率、擦傷性。又,低折射率層之塗佈〜 照射紫外線之時間越短’防眩性、反射率、擦傷性越優良 ,其中以〇 · 1秒爲最良好。 實施例2 使用實施例1所製作之防眩性防反射薄膜1〜2 3,如 下述製作出偏光板’將該偏光板裝入液晶顯示板(畫像顯 示裝置),評估辨識性。 依據下述方法,於防眩性防反射薄膜與該薄膜,作爲 支持體所使用的纖維素三乙酸酯薄膜各1片作爲偏光板保 護薄膜使用而製作出偏光板。 (a )偏光膜的製作 將厚度120μιη長之聚乙烯醇薄膜’進行一軸延伸(溫 度1 1 0。(:,延伸倍率5倍)。將此浸漬於缺〇 · 〇 7 5 g、碘化 鉀5 g、水1 0 0 g之比率所成的水溶液中6 0秒,其次再浸漬 於碘化鉀6g、硼酸7.5g、水10〇g之比率所成的68°C之水 溶液。將此經水洗、乾燥後得到偏光膜。 (b )偏光板的製作 其次,依據下述步驟1〜5 ’貼合偏光膜與偏光板用保 護薄膜製作偏光板。 步驟1 :將纖維素三乙酸酯薄膜於2 m 0丨/L之氫氧化鈉 -116 - 200903021 溶液中6 0。(:下浸漬9 0秒,再經水洗 '乾燥。於設有防眩 性防反射薄膜之防反射層的面上預先貼上剝離性保護薄膜 (PET製)進行保護。 步驟2 :將前述偏光膜浸漬於固體成分2質量%之聚 乙烯醇接著劑槽中1〜2秒。 步驟3 :輕輕取出步驟2中附著於偏光膜的過剩接著 劑,將此以步驟1中進行鹼處理的纖維素三乙酸酯薄膜與 防反射薄膜夾住,並層合。 步驟4 :於2個轉動轉動子’於20〜3 ON/cm2之壓力 下以約2m/min的速度進行貼合。此時注意氣泡的進入。 步驟5 :於8 0 °C之乾燥機中,以步驟4所製作之試料 經2分鐘乾燥處理,製作出偏光板。 非常小心地剝離購得之液晶顯示板(NEC製彩色液 晶顯示器 MultiSync LCD 1 525J :型名 LA- 1 529HM )的最 表面之偏光板,於此配合偏光方向張貼偏光板製作出液晶 顯示裝置。 (評估) 確認作爲顯示裝置之動畫中的辨識性。使用比較防眩 性防反射薄膜的顯示裝置爲’經畫面會有其他影像射入或 顏色不均之現象產生,對於此,使用本發明之防眩性防反 射薄膜之顯示裝置爲對比亦高’辨識性完全無問題之良好 者。 -117 - 200903021 【圖式簡單說明】 [圖1 ]表示本發明的防反射薄膜之構成的模式圖。 [圖2]表示可使用於本發明所使用的噴射方式中之噴 射頭一例的截面圖。 [圖3 ]表示於本發明可使用的噴射頭部、噴嘴板一例 之槪略圖。 [圖4 ]表示可適用於本發明之噴射方式一例的模式圖 〇 [圖5 ]表示將凸部與無凸部部分之兩者以透明樹脂層 覆蓋後,形成平緩凹凸之情況模式圖。 [圖6 ]本發明之較佳微細凹凸結構之模式圖。 [圖7]接觸角之測定流程。 [圖8]基材薄膜上以噴射方式進行微細凹凸結構形成 之方法一例。 【主要元件符號說明】 1 0 :基材薄膜 1 1 :基板 1 2 :壓電元件 Π :流路版 1 3 a :墨水流路 1 3 b :壁部 1 4 :共通液室構成構件 1 5 :墨水供給幫浦 -118- 200903021 1 6 :噴嘴板 1 6 a :噴嘴 1 7 :驅動用電路印刷板 1 8 :導線部 1 9 :驅動電極 20 :溝 2 1 :保護板 22 :流體電阻 23 、 24 :電極 25 :上部分隔牆 2 6 :加熱器 2 7 :加熱器電源 2 8 :導熱構件 29 :活性光線照射部 3 0 :噴射頭 3 1 :液滴 3 2 :噴嘴 3 5 :背輥 1 0 1 :層合輥 1 0 3 :第1塗佈 1 0 4 A〜D :背輥 1 0 5 A〜D :乾燥區域 106A〜E :活性光線照射部 1 〇 7 :電漿處理部 -119 - 200903021 1 0 8 :墨水供給筒 109 :噴射射出部 1 1 〇 :加熱部 1 1 3 :捲取筒Propylene glycol monomethyl ether 3 8 parts by mass 1 〇 by mass, and the viscosity of the low refractive index layer coating liquid was 5.2 mPa · s, and the refractive index of the obtained low refractive index layer was 1.41. (Low-refractive-index layer coating liquid 1 3 ) Propylene-based monomer; Literite M _3F (manufactured by Kyoei Chemical Co., Ltd.) 90 parts by mass of photopolymerization initiator (IRGACURE 184 (manufactured by Ciba Specialty Chemicals Co., Ltd.) )) 2 parts by mass of γ-methacryloxypropyltrimethoxydecane (trade name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 2.5 parts by mass of ethylene glycol monobutyl ether acetate 38 parts by mass of propylene glycol monomethyl 10 parts by mass of the ether, and the refractive index of the low refractive index layer was 1.35, and the viscosity was 6.1. (low refractive index layer coating liquid 1 4 ) propylene-based monomer; Difensha FH800ME (manufactured by Dainippon Ink Chemical Industry Co., Ltd.) 300 parts by mass of photopolymerization initiator (IRGACURE 184 (Ciba Specialty Chemicals) ()) 2.5 parts by mass of γ-methacryloxypropyltrimethoxydecane (trade name: -111 - 200903021 KBM503 'Shin-Etsu Chemical Co., Ltd.) 2.5 parts by mass of ethylene glycol monobutyl ether acetate 3 8 mass The propylene glycol monomethyl ether is 10 parts by mass and the viscosity of the low refractive index layer coating liquid is 9.8 m P a · s, and the refractive index of the obtained low refractive index layer is 1.47. [Preparation of Anti-glare Antireflection Films 20 to 23] The above-mentioned anti-glare film 3 is formed so that the following low refractive index layer coating liquid 15 has an average film thickness (hd) as shown in Table 4 The spraying method is applied to change the time from the irradiation of ultraviolet rays to the anti-glare anti-reflection film 20 to 1 second, the anti-glare anti-reflection film 21 to 2 seconds, and the anti-glare anti-reflection film 22 to 45 seconds. The anti-glare anti-reflection film 23 was produced in the same manner as the anti-glare anti-reflection film 3 except that the anti-glare anti-reflection film 23 was used for 2 minutes. (low refractive index layer coating liquid 15) propylene-based monomer; pentaerythritol diacrylate difluorobutyrate 50 parts by mass photopolymerization initiator (IRGACURE 184 (manufactured by Ciba Specialty Chemicals Co., Ltd.)) 3.0 parts by mass γ -Methacryloxypropyltrimethoxydecane (trade name: ΚΒΜ503, manufactured by Shin-Etsu Chemical Co., Ltd.) 3.0 parts by mass of ethylene glycol monobutyl ether acetate 38 parts by mass of propylene glycol monomethyl ether 〇 mass parts 112- 200903021 Further, the viscosity of the low refractive index layer coating liquid was 9.6 mPa·s, and the refractive index of the obtained low refractive index layer was 1.37. <<Evaluation of Anti-glare Antireflection Film>> For the anti-glare anti-reflection film produced, the arithmetic mean surface roughness, film thickness, anti-glare property, reflectance, and scratch resistance were evaluated as follows. (Arithmetic average surface roughness) With JIS B 060 1 : 200 1, using optical multi-dimensional surface roughness meter RST/PLUS (made by WYKO Co., Ltd.), transparent support (b surface), hard coating layer, and anti-reflection The area of each surface of the film of 1.2 mm &gt;&lt; 0.9 mm was used to obtain an arithmetic mean surface roughness. (Thickness) For the antireflection film formed, a tomographic image was taken at a magnification of 100,000 times using a Hitachi scanning electron microscope HD-2 7 00, and the convex portion and the concave portion were visually confirmed. The film thickness at the crucible is measured by a tomogram using a measuring instrument, and the average enthalpy is used as the thickness of each of hd 1 and hd2. Further, the average enthalpy of hdl and hd2 is taken as the average film thickness. (Anti-glare property) In an office having a window, each film was placed flat on a table, and the person who irradiated the fluorescent lamp of the sunroof and the external light into the film was evaluated as follows. -113- 200903021 5 : The outline of the fluorescent lamp and the external light are slightly incident, but it is not affected. 4: 5 and 3 in the middle 3: Only the outline of the fluorescent light and the external light are confirmed. Into 2: 3 and 1 in the middle 1 : The outline of the fluorescent lamp 'and the external light are obviously incident and affected (reflectance) For the anti-glare anti-reflection film produced, use a spectrophotometer (Japan Spectrophotometer) In the wavelength range of 380 to 7 80 nm, the spectral reflectance at an incident angle of 5 ° was measured. The reflection preventing performance is preferably as small as possible in a wide wavelength region, so that the lowest reflectance of 450 to 650 nm is obtained from the measurement results. The inside of the observation side was subjected to roughening treatment, and then light absorption treatment was performed using black spray. The light reflection inside the film was prevented, and the reflectance was measured. (Scratch) The S-type material was placed in a 23t, 55% RH environment, and the weight of 25#g/cm2 was given to the steel wool (SW) of #〇〇〇〇, and the number of flaws per width after one turn was measured. . Further, the number of the flaws was measured at the position where the number of the scars was the highest in the portion to which the load was applied. It is only 1 inch/cm or less, and there is no problem in practical use 'but 5 pieces/cm or less is good' 3 pieces - the following is better. -114 - 200903021 Preparation for comparison comparison I comparison | 1 invention 1 1 invention 1 I invention | 1 invention ι 1 invention ι 1 invention ι 1 invention ι ι invention ι 1 invention ι 1 invention 1 1 invention 1 invention 1 invention invention 1 invention ι 1 invention ι invention invention invention invention invention invention evaluation « w (N l / Ί 00 00 (Ν Os Ο Ο νο (Ν ro Ο ο ( Ν m 反射 reflectance (%) vq oo 卜 «ο cn —· 00 Ο two q 〇. d Ον Ο 00 ο οο ο ο -* inch · anti-glare - '― - ΓΛ for ro vs V5 rn ΓΛ Antireflection layer (low refractive index layer) Surface roughness Ra (μ m ) | 1 0.086 1 "0.098 |〇Tl02 1 0.057 0.137 1 0.123 , 1 0.128 1 1 0.136 1 1 o.iio 1 0.122 1 1 0.144 1 0.133 | 1 0.135 I |o7i4〇| 1 0.142 1 0.142 1 1 0.142 1 1 0.144 1 1 0.141 0.146 0.139 0.131 0.121 hdl/hd2 _I o inch ο 00 ο oo (N oo ο o (Ν Ο 2 〇sv〇ο i 1 〇ΓΛ 00 〇 ο ο ΟΟ ΟΟ ο αν ο 00 00 ο οο ο (Ν 00 Ο νο V© ο 凹 Concave film thickness hd2 (μ m ) "0.175 | 1 0.175 1 1 0.170 1 0.390 0.045 0.136 1 0.128 | 1 0.116 1 1 0.127 1 1 0.118 1 1 0.103 1 1 0.120 | 0.117 | 1 0.109 | 0.107 0.106 1 1 0.107 1 ι 0.102 1 1 0.107 0.100 0.111 0.123 0.139 Convex film thickness hdl (μηι) 0.025 0.025 0.030 ! 0.110 0.015 0.064 , | 0.072 | 1 0.084 1 1 0.073 1 0.082 1 1 0.097 1 1 0.080 | | 0.083 | | 0.091 | 1 0.093 1 0.094 1 0.093 1 1 0.098 1 1 0.093 0.100 0.089 0.077 0.061 Average film thickness (μπι __I 〇 Ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο Cloth method|Exit|1Export·»» i ·-i »—a pa &gt;—» &gt;—S a I—J 2 S 2 22 viscosity (mPa s) ” oo (Ν (Ν c*-j IT) wS (N 00 ΠΊ m 00 r^i οο ΓΛ οο — 00 vq ΟΟ — νο CN \6 00 σ&lt;σ&lt; VD Ό c&gt; ν〇σί Μ冬_ 13⁄4 画 Φ ft ✓ 00 rn mm cn 〇〇 ο (N 沄沄沄- Ό Ό m ν'» 00 沄 low refractive index layer coating liquid No. 1 one (N (Ν m -rr νο 00 ON ο * - inch Wi m tender I Surface roughness Ra (μ m ) I 0.133 I 0.146 0.146 0.146 I 0.146 I 1 0.146 1 0.146 Ι 0.146 Ι I 0.127 0.133 0.146 I 0.146 I 1 0.146 I 1 0.146 I 0.146 Ι 0.146 Ι 1 0.146 Ι 1 0.146 Ι 1 0.146 0.146 0.146 0.146 0.146 w αα 111 — mmm ΓΛ (Ν — ΓΛ mmmmm Anti-glare anti-reflection film No. — (N yr) Ό 00 00 ΟΝ ο — (N m οοο (Ν m (Ν -115- 200903021 by Table 4 shows that the sample of the present invention has excellent anti-glare property, reflectance, and scratch resistance as compared with the comparative example. Further, the application of the low refractive index layer to the shorter time of irradiation with ultraviolet rays is more excellent in antiglare property, reflectance, and scratch resistance, and 〇 · 1 second is the most preferable. [Example 2] Using the anti-glare antireflection films 1 to 2 3 produced in Example 1, a polarizing plate was produced as follows. This polarizing plate was placed in a liquid crystal display panel (image display device), and the visibility was evaluated. According to the method described below, a polarizing plate was produced by using one sheet of each of the cellulose triacetate films used as the support as the polarizing plate protective film in the antiglare antireflection film and the film. (a) Preparation of a polarizing film A polyvinyl alcohol film having a thickness of 120 μm was subjected to one-axis stretching (temperature 1 1 0. (:, stretching ratio 5 times). This was immersed in a defect 〇 7 5 g, potassium iodide 5 g In an aqueous solution formed by a ratio of water of 100 g, 60 seconds, and then immersed in an aqueous solution of 6 g of potassium iodide, 7.5 g of boric acid, and 10 g of water. The water was washed and dried. A polarizing film was obtained. (b) Preparation of a polarizing plate Next, a polarizing plate was prepared by bonding a polarizing film and a protective film for a polarizing plate according to the following steps 1 to 5'. Step 1: A cellulose triacetate film was applied at 2 m 0丨 / L of sodium hydroxide -116 - 200903021 solution in 60. (: immersed for 90 seconds, then washed by water 'dry. Pre-attached on the surface of the anti-reflective layer with anti-glare anti-reflective film The protective film (made of PET) is protected. Step 2: The polarizing film is immersed in a polyvinyl alcohol adhesive tank having a solid content of 2% by mass for 1 to 2 seconds. Step 3: Gently removing the polarizing film attached to the step 2 Excess adhesive, the cellulose triacetate film subjected to alkali treatment in step 1 The reflective film is clamped and laminated. Step 4: The two rotating rotors are pressed at a speed of about 2 m/min under a pressure of 20 to 3 ON/cm2. At this time, attention is paid to the entry of bubbles. Step 5: The sample prepared in step 4 was dried in a dryer at 80 ° C for 2 minutes to prepare a polarizing plate. The commercially available liquid crystal display panel was carefully peeled off (NEC color liquid crystal display MultiSync LCD 1 525J: type A polarizing plate of the outermost surface of the LA- 1 529 HM, and a polarizing plate is attached to the polarizing plate to produce a liquid crystal display device. (Evaluation) Confirmation of visibility in an animation of a display device. Use of an anti-glare anti-reflection film The display device is caused by the phenomenon that other images are incident on the screen or the color is uneven. For this reason, the display device using the anti-glare anti-reflection film of the present invention is superior in comparison with the fact that the identification is completely satisfactory. -117 - 200903021 [Brief Description of the Drawings] Fig. 1 is a schematic view showing the configuration of an antireflection film of the present invention. [Fig. 2] Fig. 2 is a view showing an example of a head which can be used in the injection method used in the present invention. Fig. 3 is a schematic view showing an example of an injection head and a nozzle plate which can be used in the present invention. [Fig. 4] A schematic view showing an example of an injection method applicable to the present invention [Fig. 5] shows a convex view. Fig. 6 is a schematic view showing a preferred fine concavo-convex structure of the present invention. [Fig. 7] A measurement flow of a contact angle. Fig. 8 shows an example of a method of forming a fine uneven structure by spraying on a base film. [Description of main component symbols] 1 0 : Substrate film 1 1 : Substrate 1 2 : Piezoelectric element Π : Flow path plate 1 3 a : Ink flow path 1 3 b : Wall portion 1 4 : Common liquid chamber constituent member 1 5 : Ink supply pump -118- 200903021 1 6 : Nozzle plate 1 6 a : Nozzle 1 7 : Driving circuit printed board 1 8 : Lead portion 1 9 : Drive electrode 20 : Groove 2 1 : Protective plate 22 : Fluid resistance 23 24: electrode 25: upper partition wall 2 6 : heater 2 7 : heater power supply 2 8 : heat conductive member 29 : active light irradiation portion 3 0 : ejection head 3 1 : droplet 3 2 : nozzle 3 5 : back roller 1 0 1 : Laminating roll 1 0 3 : 1st coating 1 0 4 A to D: Back roll 1 0 5 A to D: Drying area 106A to E: Active light irradiation unit 1 〇 7 : Plasma processing unit - 119 - 200903021 1 0 8 : Ink supply cylinder 109 : Injection injection part 1 1 〇: Heating part 1 1 3 : Reeling cylinder

Claims (1)

200903021 十、申請專利範圍 1 · 一種防反射薄膜,其爲透明基材上具有至少1層以 上的持微細凹凸結構之防眩層,且該防眩層上直接或介著 其他層形成低折射率層之防反射薄膜,其特徵爲該低折射 率層藉由微小液滴之附著而形成,且該低折射率層爲藉由 含有5〜100質量%之固體成分,25 t之黏度爲2〜 1 5mPa · s的塗佈液所形成者。 2·如申請專利範圍第1項之防反射薄膜,其中該低折 射率層藉由噴射方式而形成。 3 .如申請專利範圍第1項或第2項之防反射薄膜,其 中該低折射率層經乾燥後之平均膜厚爲0.05〜0.20μηι。 4. 如申請專利範圍第1項至第3項中任一項之防反射 薄膜’其中該低折射率層爲藉由含有固體成分以外之質量 6 0 %以上的沸點1 4 0〜2 5 0 °C,2 5 °C之黏度爲1〜1 5 mP a · s 的至少1種類之溶劑的塗佈液所形成者。 5. 如申請專利範圍第1項至第4項中任一項之防反射 薄膜,其中於該防眩層之凸部分所形成的低折射率層之膜 厚hd 1、與於凹部分所形成的低折射率層之膜厚hd2爲滿 足以下關係式者; (式)hdl/hd2 $ 0.4 ° 6 ·如申請專利範圍第1項至第5項中任一項之防反射 薄膜,其中該低折射率層係由活性光線硬化型樹脂或熱硬 化性樹脂所形成。 7 . —種偏光板,其特徵爲使用如申請專利範圍第1項 -121 - 200903021 至第6項中任一項之防反射薄膜。 8 . —種顯示裝置,其特徵爲使用如 項至第6項中任一項之防反射薄膜、或 7項之偏光板。 9.一種防反射薄膜之製造方法,其 至少1層以上的持微細凹凸結構之防眩 直接或介著其他層形成低折射率層之防 法中,其特徵爲該低折射率層係由微小 ,且該低折射率層藉由含有5〜100質 2 5 °C之黏度爲2〜1 5 m P a · s的塗佈液所J 1 0 .如申請專利範圍第9項之防反射 其中該微小液滴爲含有熱硬化性樹脂或 脂之墨水,將該微小液滴著落於s材·後 性光線照射而使其固化。 申請專利範圍第1 如申請專利範圍第 爲透明基材上具有 層,且該防眩層上 反射薄膜的製造方 液滴之附著而形成 量%之固體成分, 孩成者。 薄膜之製造方法, 活性光線硬化型樹 ,馬上加熱或以活 122-200903021 X. Patent Application No. 1 - An antireflection film having at least one or more layers of anti-glare layers on a transparent substrate, and having a low refractive index directly or via other layers on the anti-glare layer The antireflection film of the layer is characterized in that the low refractive index layer is formed by the adhesion of fine droplets, and the low refractive index layer is composed of a solid component of 5 to 100% by mass, and the viscosity of 25 t is 2~ The formation of a coating liquid of 1 5 mPa · s. 2. The antireflection film of claim 1, wherein the low refractive index layer is formed by spraying. 3. The antireflection film of claim 1 or 2, wherein the low refractive index layer has an average film thickness of 0.05 to 0.20 μm after drying. 4. The antireflection film of any one of claims 1 to 3 wherein the low refractive index layer has a boiling point of more than 60% by weight other than a solid component 1 4 0 to 2 5 0 °C, a viscosity of 2 5 °C is formed by a coating liquid of at least one type of solvent of 1 to 15 mP a · s. 5. The antireflection film according to any one of claims 1 to 4, wherein a film thickness hd1 of the low refractive index layer formed in the convex portion of the antiglare layer is formed with the concave portion The film thickness hd2 of the low refractive index layer is such that the following relationship is satisfied; (formula) hdl/hd2 $ 0.4 ° 6 The antireflection film of any one of claims 1 to 5, wherein the low The refractive index layer is formed of an active light curing resin or a thermosetting resin. A polarizing plate characterized by using an antireflection film according to any one of claims 1 to 121 to 200903021 to claim 6. A display device characterized by using the antireflection film according to any one of items 6 to 6, or a polarizing plate of 7 items. A method for producing an antireflection film, wherein at least one or more layers of the fine concavo-convex structure have an antiglare effect or a method of forming a low refractive index layer via another layer, wherein the low refractive index layer is microscopically And the low refractive index layer is provided by a coating liquid containing 5 to 100 masses of 5 5 ° C and having a viscosity of 2 to 15 m P a · s. As in the anti-reflection of claim 9 The fine droplets are inks containing a thermosetting resin or a fat, and the fine droplets are placed on the s material and the late light to be cured. Patent Application No. 1 is a solid component having a layer on a transparent substrate and a droplet of the reflective film on the anti-glare layer to form a solid content of the surface of the anti-glare layer, which is a child. Film manufacturing method, active light hardening tree, heat or live immediately 122-
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