TWI500679B - 無機粒子分散體、能量射線硬化性樹脂組成物及膜片 - Google Patents

無機粒子分散體、能量射線硬化性樹脂組成物及膜片 Download PDF

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Publication number
TWI500679B
TWI500679B TW100109915A TW100109915A TWI500679B TW I500679 B TWI500679 B TW I500679B TW 100109915 A TW100109915 A TW 100109915A TW 100109915 A TW100109915 A TW 100109915A TW I500679 B TWI500679 B TW I500679B
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Taiwan
Prior art keywords
meth
slurry
group
film
dispersion
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TW100109915A
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English (en)
Chinese (zh)
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TW201200555A (en
Inventor
Ryou Minakuchi
Masao Yamada
Hisayoshi Arai
Youichi Tanimoto
Hideyuki Ishida
Hiroyuki Tereda
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Dainippon Ink & Chemicals
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Publication of TW201200555A publication Critical patent/TW201200555A/zh
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Publication of TWI500679B publication Critical patent/TWI500679B/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/14Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/02Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/04Ingredients treated with organic substances
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2300/00Characterised by the use of unspecified polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/14Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/002Physical properties
    • C08K2201/003Additives being defined by their diameter

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Materials Engineering (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
TW100109915A 2010-03-24 2011-03-23 無機粒子分散體、能量射線硬化性樹脂組成物及膜片 TWI500679B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010067855A JP5610191B2 (ja) 2010-03-24 2010-03-24 無機粒子分散体、エネルギー線硬化性樹脂組成物、及びフィルム

Publications (2)

Publication Number Publication Date
TW201200555A TW201200555A (en) 2012-01-01
TWI500679B true TWI500679B (zh) 2015-09-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW100109915A TWI500679B (zh) 2010-03-24 2011-03-23 無機粒子分散體、能量射線硬化性樹脂組成物及膜片

Country Status (4)

Country Link
JP (1) JP5610191B2 (ko)
KR (1) KR101292720B1 (ko)
CN (1) CN102206439B (ko)
TW (1) TWI500679B (ko)

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EP2657263B1 (en) * 2010-12-22 2015-09-30 DIC Corporation Process for production of dispersion, dispersion, coating material, coating film, and film
WO2012176570A1 (ja) * 2011-06-24 2012-12-27 Dic株式会社 活性エネルギー線硬化型樹脂組成物、活性エネルギー線硬化型樹脂組成物の製造方法、塗料、塗膜、及びフィルム
KR101603932B1 (ko) 2011-09-30 2016-03-25 디아이씨 가부시끼가이샤 활성 에너지선 경화형 수지 조성물, 그 제조 방법, 도료, 도막, 및 필름
JP5824725B2 (ja) * 2012-03-08 2015-11-25 東洋インキScホールディングス株式会社 活性エネルギー線硬化型樹脂組成物
TWI627061B (zh) * 2012-06-21 2018-06-21 迪愛生股份有限公司 活性能量線硬化型樹脂組成物、活性能量線硬化型樹脂組成物之製造方法、塗料、塗膜及薄膜
EP3913024A1 (en) * 2012-08-29 2021-11-24 Hempel A/S Anti-corrosive zinc primer coating compositions comprising hollow glass spheres and a conductive pigment
WO2014109407A1 (ja) * 2013-01-11 2014-07-17 大日本印刷株式会社 ハードコートフィルム、ハードコート層用硬化性樹脂組成物およびハードコートフィルムの製造方法
JP6168341B2 (ja) * 2013-03-28 2017-07-26 Dic株式会社 活性エネルギー線硬化型樹脂組成物、その製造方法、塗料、塗膜、及びフィルム
JP5374761B1 (ja) * 2013-03-29 2013-12-25 東洋インキScホールディングス株式会社 活性エネルギー線硬化性組成物
WO2014192654A1 (ja) * 2013-05-28 2014-12-04 Dic株式会社 活性エネルギー線硬化性組成物及びそれを用いたフィルム
JP6292388B2 (ja) * 2014-03-24 2018-03-14 Jsr株式会社 感放射線性樹脂組成物
JP6421972B2 (ja) * 2014-06-24 2018-11-14 Dic株式会社 活性エネルギー線硬化性組成物、その硬化塗膜、及び該硬化塗膜を有する物品
KR101855877B1 (ko) * 2014-08-06 2018-05-09 미쯔비시 케미컬 주식회사 도포 필름
CN106999883B (zh) * 2014-11-25 2019-11-05 新东工业株式会社 分散装置以及分散方法
WO2016103957A1 (ja) * 2014-12-24 2016-06-30 Dic株式会社 活性エネルギー線硬化性樹脂組成物、塗料、塗膜、及びフィルム
KR102487673B1 (ko) * 2015-02-23 2023-01-11 린텍 오브 아메리카, 인크. 점착 시트
CN105160992A (zh) * 2015-07-29 2015-12-16 竹林伟业科技发展(天津)股份有限公司 一种局部易撕开的三层不干胶物流标签
JPWO2018003516A1 (ja) * 2016-06-29 2018-10-11 Dic株式会社 樹脂組成物、塗料、及び該塗料が塗装された物品
KR102350325B1 (ko) * 2017-03-23 2022-01-11 아라까와 가가꾸 고교 가부시끼가이샤 활성에너지선 경화형 하드코팅제, 경화도포막, 적층필름
KR20210087455A (ko) * 2018-11-06 2021-07-12 리껭테크노스 가부시키가이샤 광 확산층 형성용 도료, 프로젝션 스크린용 필름 및 프로젝션 스크린
JP7321781B2 (ja) * 2019-06-04 2023-08-07 太陽ホールディングス株式会社 有機無機複合粒子を含む樹脂組成物、ドライフィルム、硬化物、電子部品
CN111070932A (zh) * 2019-12-31 2020-04-28 东莞市美盈森环保科技有限公司 一种uv立体效果印刷工艺

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TW445218B (en) * 1997-08-12 2001-07-11 Nissha Printing A transfer material and a surface protecting sheet excellent in abrasion resistance and chemical resistance, and method for producing molded article excellent in abrasion resistance and chemical resistance
TW200809437A (en) * 2006-05-18 2008-02-16 Mitsubishi Chem Corp Electrographic photoreceptor, image forming apparatus, and electrographic cartridge
TW200907401A (en) * 2007-06-26 2009-02-16 Konica Minolta Opto Inc Clear hard coat film, and antireflection film, polarizing plates and displays, made by using the same

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JP3819245B2 (ja) * 2000-02-28 2006-09-06 三菱レイヨン株式会社 被覆用硬化性組成物、被覆物品、および自動車用外板
JP2007177194A (ja) 2005-11-30 2007-07-12 Kri Inc 光硬化性組成物
JP5407114B2 (ja) * 2006-03-30 2014-02-05 荒川化学工業株式会社 反応性分散体を含有する活性エネルギー線硬化型コーティング剤組成物、反応性分散体の製造方法および硬化被膜
JP5446071B2 (ja) * 2006-09-11 2014-03-19 Dic株式会社 保護粘着フィルム、スクリーンパネル及び携帯電子端末
JP5221109B2 (ja) 2007-03-13 2013-06-26 関西ペイント株式会社 金属表面処理組成物
US8344039B2 (en) * 2007-11-29 2013-01-01 Nissan Chemical Industries, Ltd. Three-dimensional pattern forming material

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
TW445218B (en) * 1997-08-12 2001-07-11 Nissha Printing A transfer material and a surface protecting sheet excellent in abrasion resistance and chemical resistance, and method for producing molded article excellent in abrasion resistance and chemical resistance
TW200809437A (en) * 2006-05-18 2008-02-16 Mitsubishi Chem Corp Electrographic photoreceptor, image forming apparatus, and electrographic cartridge
TW200907401A (en) * 2007-06-26 2009-02-16 Konica Minolta Opto Inc Clear hard coat film, and antireflection film, polarizing plates and displays, made by using the same

Also Published As

Publication number Publication date
KR20110107293A (ko) 2011-09-30
CN102206439A (zh) 2011-10-05
JP2011201938A (ja) 2011-10-13
TW201200555A (en) 2012-01-01
CN102206439B (zh) 2014-05-21
JP5610191B2 (ja) 2014-10-22
KR101292720B1 (ko) 2013-08-01

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