TWI500071B - A surface treatment method and apparatus for a die, and a pattern forming method - Google Patents

A surface treatment method and apparatus for a die, and a pattern forming method Download PDF

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Publication number
TWI500071B
TWI500071B TW100104479A TW100104479A TWI500071B TW I500071 B TWI500071 B TW I500071B TW 100104479 A TW100104479 A TW 100104479A TW 100104479 A TW100104479 A TW 100104479A TW I500071 B TWI500071 B TW I500071B
Authority
TW
Taiwan
Prior art keywords
die
surface treatment
chamber
coupling agent
mold
Prior art date
Application number
TW100104479A
Other languages
English (en)
Chinese (zh)
Other versions
TW201140653A (en
Inventor
河村嘉久
小林克稔
伊藤信一
林秀和
富田寬
Original Assignee
東芝股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東芝股份有限公司 filed Critical 東芝股份有限公司
Publication of TW201140653A publication Critical patent/TW201140653A/zh
Application granted granted Critical
Publication of TWI500071B publication Critical patent/TWI500071B/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Micromachines (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
TW100104479A 2010-03-31 2011-02-10 A surface treatment method and apparatus for a die, and a pattern forming method TWI500071B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010081019 2010-03-31
JP2010280514A JP5693941B2 (ja) 2010-03-31 2010-12-16 テンプレートの表面処理方法及び装置並びにパターン形成方法

Publications (2)

Publication Number Publication Date
TW201140653A TW201140653A (en) 2011-11-16
TWI500071B true TWI500071B (zh) 2015-09-11

Family

ID=44697105

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100104479A TWI500071B (zh) 2010-03-31 2011-02-10 A surface treatment method and apparatus for a die, and a pattern forming method

Country Status (5)

Country Link
US (1) US20110244131A1 (https=)
JP (1) JP5693941B2 (https=)
KR (1) KR101226289B1 (https=)
CN (1) CN102208335B (https=)
TW (1) TWI500071B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI660401B (zh) * 2016-09-26 2019-05-21 日商斯庫林集團股份有限公司 基板處理裝置及基板處理方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5350424B2 (ja) * 2011-03-24 2013-11-27 東京エレクトロン株式会社 表面処理方法
JP5898549B2 (ja) * 2012-03-29 2016-04-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
CN102866582B (zh) * 2012-09-29 2014-09-10 兰红波 一种用于高亮度led图形化的纳米压印装置和方法
JP2015149390A (ja) * 2014-02-06 2015-08-20 キヤノン株式会社 インプリント装置、型、および物品の製造方法
JP6532419B2 (ja) * 2015-03-31 2019-06-19 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置
WO2016159312A1 (ja) * 2015-03-31 2016-10-06 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置
WO2016159310A1 (ja) * 2015-03-31 2016-10-06 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置
JP6486206B2 (ja) 2015-03-31 2019-03-20 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置
JP6529843B2 (ja) * 2015-07-14 2019-06-12 芝浦メカトロニクス株式会社 インプリント用のテンプレート製造装置及びテンプレート製造方法
JP6441181B2 (ja) 2015-08-04 2018-12-19 東芝メモリ株式会社 インプリント用テンプレートおよびその製造方法、および半導体装置の製造方法
CN109804275B (zh) * 2016-08-26 2023-08-25 分子印记公司 制造单片光子器件的方法、光子器件
US11413591B2 (en) 2017-11-02 2022-08-16 Magic Leap, Inc. Preparing and dispensing polymer materials and producing polymer articles therefrom
JP2019220647A (ja) * 2018-06-22 2019-12-26 株式会社アルバック 表面処理方法、プリント配線板の製造方法、および、表面処理装置

Citations (2)

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WO2006041115A1 (ja) * 2004-10-13 2006-04-20 Central Glass Company, Limited 含フッ素重合性単量体及びそれを用いた高分子化合物
WO2008069812A1 (en) * 2006-12-03 2008-06-12 Central Glass Co., Ltd. Photosensitive polybenzoxazines and methods of making the same

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US5626820A (en) * 1988-12-12 1997-05-06 Kinkead; Devon A. Clean room air filtering
US5690749A (en) * 1996-03-18 1997-11-25 Motorola, Inc. Method for removing sub-micron particles from a semiconductor wafer surface by exposing the wafer surface to clean room adhesive tape material
WO2003021642A2 (en) * 2001-08-31 2003-03-13 Applied Materials, Inc. Method and apparatus for processing a wafer
ATE346752T1 (de) 2002-06-20 2006-12-15 Obducat Ab Formwerkzeug, verfahren zur herstellung eines formwerkzeugs und durch verwendung des formwerkzeugs gebildetes speichermedium
KR100815372B1 (ko) * 2005-03-31 2008-03-19 삼성전기주식회사 인쇄회로기판용 임프린트 몰드의 이형처리방법
KR100815081B1 (ko) * 2006-09-05 2008-03-20 삼성전기주식회사 스탬퍼 이형처리 방법
KR100763349B1 (ko) 2006-09-14 2007-10-04 삼성전기주식회사 금속 스탬프 제조방법
JP4999069B2 (ja) * 2007-01-23 2012-08-15 株式会社日立製作所 ナノインプリント用スタンパ、ナノインプリント用スタンパの製造方法、およびナノインプリント用スタンパの表面処理剤
US8759957B2 (en) * 2008-02-07 2014-06-24 Sumitomo Bakelite Company Limited Film for use in manufacturing semiconductor device, method for producing semiconductor device and semiconductor device
JP4695679B2 (ja) * 2008-08-21 2011-06-08 株式会社東芝 テンプレートの洗浄方法及びパターン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006041115A1 (ja) * 2004-10-13 2006-04-20 Central Glass Company, Limited 含フッ素重合性単量体及びそれを用いた高分子化合物
WO2008069812A1 (en) * 2006-12-03 2008-06-12 Central Glass Co., Ltd. Photosensitive polybenzoxazines and methods of making the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI660401B (zh) * 2016-09-26 2019-05-21 日商斯庫林集團股份有限公司 基板處理裝置及基板處理方法

Also Published As

Publication number Publication date
KR20110109845A (ko) 2011-10-06
US20110244131A1 (en) 2011-10-06
CN102208335A (zh) 2011-10-05
JP5693941B2 (ja) 2015-04-01
TW201140653A (en) 2011-11-16
JP2011224965A (ja) 2011-11-10
CN102208335B (zh) 2013-09-18
KR101226289B1 (ko) 2013-01-24

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