TWI463633B - 晶片封裝結構 - Google Patents

晶片封裝結構 Download PDF

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TWI463633B
TWI463633B TW100149703A TW100149703A TWI463633B TW I463633 B TWI463633 B TW I463633B TW 100149703 A TW100149703 A TW 100149703A TW 100149703 A TW100149703 A TW 100149703A TW I463633 B TWI463633 B TW I463633B
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wafer
thermoelectric element
package structure
disposed
active surface
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TW100149703A
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TW201327770A (zh
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Jing Yao Chang
Tao Chih Chang
Yu Wei Huang
Yu Min Lin
Shin Yi Huang
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Ind Tech Res Inst
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Priority to TW100149703A priority Critical patent/TWI463633B/zh
Priority to CN201210567748.0A priority patent/CN103187372B/zh
Priority to US13/727,599 priority patent/US8866309B2/en
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Description

晶片封裝結構
本揭露是有關於一種晶片封裝結構,且特別是有關於一種具有熱電轉換功能的晶片封裝結構。
一般而言,積體電路(integrated circuit,IC)製造完成後需經過封裝製程來保護晶片免於外力破壞,並且將晶片上的電極透過載板擴大電極間距而引接至外部裝置(例如:印刷電路板、顯示面板等)。球格陣列封裝(Ball Grid Array,BGA)、薄膜覆晶(chip-on-film,COF)封裝皆為常見的封裝技術。
電子產品的功能不斷地擴充而體積及重量則不斷地縮小,促使晶片功能需求持續增加,相對應地I/O端點數目增加,而晶片尺寸則持續在縮小,晶片與載板之間的間距亦隨之縮小。然而,晶片功能增加伴隨而來的還有運作過程中產生的熱亦增加,而熱對於元件效能的影響也趨於明顯。
因此,如何回收且重新利用晶片運作過程中所產生的熱來進行熱電轉換已成為近年來產業研發的重點技術之一。
本揭露提供一種晶片封裝結構,其具有熱電轉換功能。
本揭露提出一種晶片封裝結構,其包括載板、第一晶片、第二晶片、多個凸塊、第一菊鏈線路、第二菊鏈線路、多個異質(hetero)熱電元件對、第一散熱元件、第二散熱元件以及封裝膠體。載板具有彼此相對的第一表面與第二表面。第一晶片配置於載板上。第一晶片具有第一主動面與第一背面。第一背面朝向第一表面,且第一主動面上具有多個第一接墊。第二晶片配置於第一晶片上,並與載板電性連接。第二晶片具有第二主動面與第二背面。第二主動面朝向第一主動面,且第二主動面上具有多個第二接墊。凸塊連接第一接墊與第二接墊,且作為第一晶片與第二晶片之電性傳輸接點。第一菊鏈線路配置於第一主動面上,且與第一晶片電性分離。第二菊鏈線路配置於第二主動面上,且與第二晶片電性分離。異質熱電元件對配置於第一晶片與第二晶片之間,並藉由第一菊鏈線路與第二菊鏈線路而串聯連接,且這些異質熱電元件對與外部元件構成封閉迴路。第一散熱元件配置於載板的第二表面上。第二散熱元件配置於第二晶片的第二背面上。第一散熱元件與第二散熱元件具有不同的散熱效率。封裝膠體包覆載板、第一晶片與第二晶片。
本揭露另提出一種晶片封裝結構,其包括載板、第一晶片、第二晶片、第三晶片、多個凸塊、多個第一導通孔、第一菊鏈線路、第二菊鏈線路、第三菊鏈線路、第四菊鏈線路、第二導通孔、多個異質熱電元件對、第一散熱元件、第二散熱元件以及封裝膠體。載板具有彼此相對的第一表面與第二表面。第一晶片配置於載板上。第一晶片具有第一主動面與第一背面。第一背面朝向第一表面,且第一主動面上具有多個第一接墊。第二晶片配置於第一晶片上。第二晶片具有第二主動面與第二背面。第二主動面朝向第一主動面,且第二主動面具有多個第二接墊,而第二背面具有多個第三接墊。第三晶片配置於第二晶片上,並與載板電性連接。第三晶片具有第三主動面與第三背面。第三主動面朝向第二背面,且第三主動面上具有多個第四接墊。凸塊連接第一接墊與第二接墊,以及連接第三接墊與第四接墊。第一導通孔配置於第二晶片中,並連接第二接墊與第三接墊。第一菊鏈線路配置於第一主動面上,且與第一晶片電性分離。第二菊鏈線路配置於第二主動面上,且與第二晶片電性分離。第三菊鏈線路配置於第二背面上,且與第二晶片電性分離。第四菊鏈線路配置於第三主動面上,且與第三晶片電性分離。第二導通孔配置於第二晶片中,並連接第二菊鏈線路與第三菊鏈線路。異質熱電元件對配置於第一晶片與第二晶片之間以及配置於第二晶片與第三晶片之間,並藉由第一菊鏈線路、第二菊鏈線路、第二導通孔、第三菊鏈線路與第四菊鏈線路而串聯連接,且這些異質熱電元件對與外部元件構成封閉迴路。第一散熱元件配置於載板的該第二表面上。第二散熱元件配置於第三晶片的第三背面上。第一散熱元件與第二散熱元件具有不同的散熱效率。封裝膠體包覆載板、第一晶片、第二晶片與第三晶片。
為讓本揭露之上述特徵能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。
第一實施例
圖1為依照本揭露第一實施例所繪示的晶片封裝結構之剖面示意圖。請參照圖1,晶片封裝結構10包括載板100、第一晶片102、第二晶片104、凸塊106、第一菊鏈線路108、第二菊鏈線路110、異質熱電元件對112、第一散熱元件114、第二散熱元件116以及封裝膠體118。載板100具有彼此相對的第一表面100a與第二表面100b。載板100可以是矽晶片、碳化矽晶片、氮化鎵經片、有機載板、無機載板或金屬載板。載板100用以承載配置於其上的晶片與其他構件。
第一晶片102具有彼此相對的第一主動面102a與第一背面102b。第一晶片102以第一背面102b朝向第一表面100a的方式配置於載板100上。第一主動面102a上具有多個第一接墊102c。本揭露對第一晶片102的種類並不作任何限制。在本實施例中,第一晶片102例如為高功率晶片或高發熱晶片。
第二晶片104具有彼此相對的第二主動面104a與第二背面104b。第二晶片104以第二主動面104a朝向第一主動面100a的方式配置於第一晶片102上,亦即第二晶片104以覆晶(flip chip)的方式配置於第一晶片102上。第二主動面104a上具有多個第二接墊104c。此外,在本實施例中,第二晶片104藉由打線105而電性連接至載板100。本揭露對第二晶片104的種類並不作任何限制。在本實施例中,第二晶片104例如為高功率晶片或高發熱晶片。
凸塊106連接第一接墊102c與第二接墊104c,用以電性連接第一晶片102與第二晶片104。第一菊鏈線路108配置於第一主動面102a上。在本實施例中,第一菊鏈線路108與第一主動面102a之間配置有絕緣層109,以使第一菊鏈線路108與第一晶片102電性分離。第二菊鏈線路110配置於第二主動面104a上。在本實施例中,第二菊鏈線路110與第二主動面104a之間配置有絕緣層111,以使第二菊鏈線路110與第二晶片104電性分離。也就是說,第一菊鏈線路108並非第一晶片102中用以傳導電流的線路層,且第二菊鏈線路110並非第二晶片104中用以傳導電流的線路層。
異質熱電元件對112配置於第一晶片102與第二晶片104之間,並藉由第一菊鏈線路108與第二菊鏈線路110而串聯連接。此外,這些異質熱電元件對112與外部元件115構成封閉迴路。詳細地說,在本實施例中,多個異質熱電元件對112藉由第一菊鏈線路108與第二菊鏈線路110而彼此串聯連接成一個熱電模組,且此熱電模組的兩個端點分別經由打線113而連接至外部元件115。外部元件115例如為儲能元件,以儲存熱電模組所產生的電能。上述儲能元件可以是電池或電容器等可儲存電能的元件。
以下進一步說明本實施例中的異質熱電元件對112。每一個異質熱電元件對112包括第一熱電元件112a與第二熱電元件112b。第一熱電元件112a與第二熱電元件112b具有不同的席貝克(Seebeck)係數。藉由第一晶片102與第二晶片104之間的溫度差異,由異質熱電元件對112、第一菊鏈線路108與第二菊鏈線路110所構成的熱電模組產生席貝克效應、珀耳帖(Peltier)效應或湯姆生(Thomson)效應以達到熱電轉換的效果。第一熱電元件112a與第二熱電元件112b的材料各自例如為金屬(例如鎳、鉍、銻)、合金(例如銀銅合金、銅鎳合金)、介金屬化合物(例如Cu3 Sn、Ag3S n、Ni3 Sn4 或AuSn4 )、半導體介金屬(PbTe、Bi2 Te3 )、奈米碳管、金屬玻璃或陶瓷(氮化鈦或碳化鈦)。本揭露對於第一熱電元件112a的材料與第二熱電元件112b的材料的組合並不做任何限制,只要第一熱電元件112a的材料與第二熱電元件112b的材料的符合熱電轉換特性的定義即可。此外,在其他實施例中,經由材料的選擇,第一熱電元件112a可為P型熱電元件與N型熱電元件中的一者,而第二熱電元件112b則為P型熱電元件與N型熱電元件中的另一者。P型熱電元件的材料例如為BiTe或Cu0.5 Ag0.5 InTe2 。N型熱電元件的材料例如為PbTe、ZrNi3 Sn4 或TiNi3 Sn4
第一散熱元件114配置於載板100的第二表面100b上。第二散熱元件116配置於第二晶片104的第二背面104b上。第一散熱元件114與第二散熱元件116具有不同的散熱效率。本揭露對第一散熱元件114與第二散熱元件116的種類並不做任何限定。第一散熱元件114與第二散熱元件116可具有不同的材料、尺寸、散熱方式,以達成分別具有不同的散熱效率。由於第一散熱元件114與第二散熱元件具有不同的散熱效率,使得異質熱電元件對112的兩端(分別為鄰近第一晶片102與第二晶片104的部分)之間可以具有大的溫差梯度,以延長達到熱平衡的時間,因而可持續產生電能。
封裝膠體118包覆載板100、第一晶片102與第二晶片104,以保護載板100、第一晶片102、第二晶片104以及位於第一晶片102與第二晶片104之間的各個構件。
第二實施例
圖2為依照本揭露第二實施例所繪示的晶片封裝結構之剖面示意圖。在圖2中,與圖1相同構件將以相同的標號表示,於此不另行說明。請參照圖2,在本實施例中,晶片封裝結構20與晶片封裝結構10的差異在於:在晶片封裝結構20中,第二晶片104藉由內連線200而電性連接至載板100。此外,內連線200中的線路層202位於第二晶片104上,除了用以電性連接第二晶片104與載板100之外,還可取代晶片封裝結構10中的第二散熱元件116。
第三實施例
圖3為依照本揭露第三實施例所繪示的晶片封裝結構之剖面示意圖。在圖3中,與圖1相同構件將以相同的標號表示,於此不另行說明。請參照圖3,在本實施例中,晶片封裝結構30與晶片封裝結構10的差異在於:在晶片封裝結構30中,第二晶片104藉由內連線300而電性連接至載板100。此外,由異質熱電元件對112、第一菊鏈線路108與第二菊鏈線路110所構成的熱電模組的兩個端點分別經由內連線302以及打線304而連接至外部元件115。需要注意的是,內連線302並未穿過第二晶片104與第二散熱元件116,而是繞過第二晶片104與第二散熱元件116,並在封裝膠體118外部藉由打線304而電性連接至外部元件115。
第四實施例
圖4為依照本揭露第四實施例所繪示的晶片封裝結構之剖面示意圖。在圖4中,與圖1相同構件將以相同的標號表示,於此不另行說明。請參照圖4,在本實施例中,晶片封裝結構40與晶片封裝結構10的差異在於:在晶片封裝結構40中,具有三個堆疊的晶片。當然,本揭露並不限於此,在其他實施例中也可以是具有更多個堆疊的晶片。在晶片封裝結構40中,第二晶片104上還配置有第三晶片400。詳細地說,第二晶片104的第二背面104b上具有多個第三接墊104d。第三晶片400具有彼此相對的第三主動面400a與第三背面400b。第三晶片400以第三主動面400a朝向第二背面104b的方式配置於第二晶片104上,亦即第三晶片400以覆晶的方式配置於第二晶片104上。此外,在本實施例中,第二晶片104並未藉由打線105電性連接至載板100,而是第三晶片400藉由打線402而電性連接至載板100。當然,在其他實施例中,第三晶片400也可藉由內連線而電性連接至載板100(如第三實施例所述)。第三主動面400a上具有多個第四接墊400c。凸塊404連接第三接墊104d與第四接墊400c。第一導通孔406配置於第二晶片104中,並連接第二接墊104c與第三接墊104d。
此外,第三菊鏈線路407配置於第二背面104b上。在本實施例中,第三菊鏈線路407與第二背面104b之間配置有絕緣層408,以使第三菊鏈線路407與第二晶片104電性分離。第四菊鏈線路410配置於第三主動面400a上。在本實施例中,第四菊鏈線路410與第三主動面400a之間配置有絕緣層412,以使第四菊鏈線路410與第三晶片400電性分離。第二導通孔414配置於第二晶片104中,並連接第二菊鏈線路110與第三菊鏈線路407。異質熱電元件對112除了配置於第一晶片102與第二晶片104之間外,亦配置於第二晶片104與第三晶片400之間,並藉由第三菊鏈線路407與第四菊鏈線路410而串聯連接。第三導通孔416配置於第三晶片400中,並連接第四菊鏈線路410與線路層418。藉此,多個異質熱電元件對112藉由第一菊鏈線路108、第二菊鏈線路110、第三菊鏈線路407與第四菊鏈線路410而彼此串聯連接成一個熱電模組,且此熱電模組的兩個端點分別經由第三導通孔416、線路層418與打線113而連接至外部元件115。當然在其他實施例中,熱電模組的兩個端點亦可皆僅經由打線而連接至外部元件115(如第二實施例所述)。
第二散熱元件116配置於第三晶片400的第三背面400b上。封裝膠體118包覆載板100、第一晶片102、第二晶片104與第三晶片400,以保護載板100、第一晶片102、第二晶片104、第三晶片400以及位於第一晶片102與第二晶片104之間以及第二晶片104與第三晶片400之間的各個構件。
特別一提的是,在上述各個實施例中,第一熱電元件112a、第二熱電元件112b以及凸塊106、404皆是採用先印刷(printing)或噴印((inject)膏狀原料於第一菊鏈線路108,再將第二晶片104以覆晶(flip chip)的方式配置於第一晶片102上,接著進行高溫燒結的方式來形成第一熱電元件112a、第二熱電元件112b及凸塊106、404。
基於上述,在本揭露的晶片封裝結構中,於晶片之間配置異質熱電元件對,且利用二個具有不同散熱效率的散熱元件來製造異質熱電元件對二側的溫度差異,並使異質熱電元件對與外部元件構成封閉迴路。因此,本揭露可以有效地使用晶片運作過程中所產生的熱來進行熱電轉換。
雖然本揭露已以實施例舉例說明如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。
10、20、30、40...晶片封裝結構
100...載板
100a...第一表面
100b...第二表面
102...第一晶片
102a...第一主動面
102b...第一背面
102c...第一接墊
104...第二晶片
104a...第二主動面
104b...第二背面
104c...第二接墊
104d...第三接墊
105、304、402...打線
106、404...凸塊
108...第一菊鏈線路
109、111、408、412...絕緣層
110...第二菊鏈線路
112...異質熱電元件對
112a...第一熱電元件
112b...第二熱電元件
114...第一散熱元件
115...外部元件
116...第二散熱元件
118...封裝膠體
200、300、302...內連線
202...線路層
400...第三晶片
400a...第三主動面
400b...第三背面
400c...第四接墊
406...第一導通孔
407...第三菊鏈線路
410...第四菊鏈線路
414...第二導通孔
416...第三導通孔
418...線路層
圖1為依照本揭露第一實施例所繪示的晶片封裝結構之剖面示意圖。
圖2為依照本揭露第二實施例所繪示的晶片封裝結構之剖面示意圖。
圖3為依照本揭露第三實施例所繪示的晶片封裝結構之剖面示意圖。
圖4為依照本揭露第四實施例所繪示的晶片封裝結構之剖面示意圖。
10...晶片封裝結構
100...載板
100a...第一表面
100b...第二表面
102...第一晶片
102a...第一主動面
102b...第一背面
102c...第一接墊
104...第二晶片
104a...第二主動面
104b...第二背面
104c...第二接墊
105...打線
106...凸塊
108...第一菊鏈線路
109、111...絕緣層
110...第二菊鏈線路
112...異質熱電元件對
112a...第一熱電元件
112b...第二熱電元件
114...第一散熱元件
115...外部元件
116...第二散熱元件
118...封裝膠體

Claims (20)

  1. 一種晶片封裝結構,包括:一載板,具有彼此相對的一第一表面與一第二表面;一第一晶片,配置於該載板上,該第一晶片具有一第一主動面與一第一背面,該第一背面朝向該第一表面,且該第一主動面上具有獨立區域的多個第一接墊及絕緣層;一第二晶片,配置於該第一晶片上,並與該載板電性連接,該第二晶片具有一第二主動面與一第二背面,該第二主動面朝向該第一主動面,且該第二主動面上具有獨立區域的多個第二接墊及一絕緣層;多個凸塊,連接該些第一接墊與該些第二接墊,作為第一晶片與第二晶片電性導通功能;一第一菊鏈線路,配置於該第一主動面的絕緣層上;一第二菊鏈線路,配置於該第二主動面的絕緣層上;多個異質熱電元件對,配置於該第一晶片與該第二晶片之間,並藉由該第一菊鏈線路與該第二菊鏈線路而串聯連接,且該些異質熱電元件對與一外部元件構成一迴路,其中每一異質熱電元件對包括一第一熱電元件與一第二熱電元件,且該第一熱電元件與該第二熱電元件具有不同的席貝克(Seebeck)係數;一第一散熱元件,配置於該載板的該第二表面上;一第二散熱元件,配置於該第二晶片的該第二背面上,其中該第一散熱元件與該第二散熱元件具有不同的散熱效率;以及 一封裝膠體,包覆該載板、該第一晶片與該第二晶片。
  2. 如申請專利範圍第1項所述之晶片封裝結構,其中該第一熱電元件與該第二熱電元件的材料各自包括金屬、合金、介金屬化合物、奈米碳管、金屬玻璃或陶瓷。
  3. 如申請專利範圍第1項所述之晶片封裝結構,其中該第一熱電元件為P型熱電元件與N型熱電元件中的一者,而該第二熱電元件為P型熱電元件與N型熱電元件中的另一者。
  4. 如申請專利範圍第1項所述之晶片封裝結構,其中該第二晶片藉由一打線而與該載板電性連接。
  5. 如申請專利範圍第1項所述之晶片封裝結構,其中該第二晶片藉由一內連線而與該載板電性連接。
  6. 如申請專利範圍第5項所述之晶片封裝結構,其中該第二散熱元件為該內連線的一部分。
  7. 如申請專利範圍第1項所述之晶片封裝結構,其中該些異質熱電元件對與該外部元件藉由一外部連線而構成該封閉迴路。
  8. 如申請專利範圍第1項所述之晶片封裝結構,其中該些異質熱電元件對與該外部元件藉由一內連線與一外部連線而構成該封閉迴路。
  9. 如申請專利範圍第1項所述之晶片封裝結構,其中該第一晶片及第二晶片包括高功率晶片、高發熱晶片。
  10. 如申請專利範圍第1項所述之晶片封裝結構,其中該外部元件包括儲能元件。
  11. 一種晶片封裝結構,包括:一載板,具有彼此相對的一第一表面與一第二表面;一第一晶片,配置於該載板上,該第一晶片具有一第一主動面與一第一背面,該第一背面朝向該第一表面,且該第一主動面上具有獨立區域的多個第一接墊及一絕緣層;一第二晶片,配置於該第一晶片上,該第二晶片具有一第二主動面與一第二背面,該第二主動面朝向該第一主動面,且該第二主動面具有獨立區域的多個第二接墊及一絕緣層,而該第二背面具有獨立區域的多個第三接墊及一絕緣層;一第三晶片,配置於該第二晶片上,並與該載板電性連接,該第三晶片具有一第三主動面與一第三背面,該第三主動面朝向該第二背面,且該第三主動面上具有獨立區域的多個第四接墊及一絕緣層;多個凸塊,連接該些第一接墊與該些第二接墊,作為第一晶片與第二晶片電性導通功能,以及連接該些第三接墊與該些第四接墊,作為第三晶片與第二晶片電性導通功能;多個第一導通孔,配置於該第二晶片中,並連接該些第二接墊與該些第三接墊;一第一菊鏈線路,配置於該第一主動面的絕緣層上;一第二菊鏈線路,配置於該第二主動面的絕緣層上;一第三菊鏈線路,配置於該第二背面的絕緣層上; 一第四菊鏈線路,配置於該第三主動面的絕緣層上;一第二導通孔,配置於該第二晶片中,並連接該第二菊鏈線路與該第三菊鏈線路;多個異質熱電元件對,配置於該第一晶片與該第二晶片之間以及配置於該第二晶片與該第三晶片之間,並藉由該第一菊鏈線路、該第二菊鏈線路、該第二導通孔、該第三菊鏈線路與該第四菊鏈線路而串聯連接,且該些異質熱電元件對與一外部元件構成一迴路;一第一散熱元件,配置於該載板的該第二表面上;一第二散熱元件,配置於該第三晶片的該第三背面上,其中該第一散熱元件與該第二散熱元件具有不同的散熱效率;以及一封裝膠體,包覆該載板、該第一晶片、該第二晶片與該第三晶片。
  12. 如申請專利範圍第11項所述之晶片封裝結構,其中每一異質熱電元件對包括一第一熱電元件與一第二熱電元件,且該第一熱電元件與該第二熱電元件具有不同的席貝克(Seebeck)係數。
  13. 如申請專利範圍第12項所述之晶片封裝結構,其中該第一熱電元件與該第二熱電元件的材料各自包括金屬、合金、介金屬化合物、奈米碳管、金屬玻璃或陶瓷。
  14. 如申請專利範圍第12項所述之晶片封裝結構,其中該第一熱電元件為P型熱電元件與N型熱電元件中的一者,而該第二熱電元件為P型熱電元件與N型熱電元件中 的另一者。
  15. 如申請專利範圍第11項所述之晶片封裝結構,其中該第三晶片藉由一打線而與該載板電性連接。
  16. 如申請專利範圍第11項所述之晶片封裝結構,其中該第三晶片藉由一內連線而與該載板電性連接。
  17. 如申請專利範圍第16項所述之晶片封裝結構,其中該第二散熱元件為該內連線的一部分。
  18. 如申請專利範圍第11項所述之晶片封裝結構,其中該些異質熱電元件對與該外部元件藉由一連線而構成該封閉迴路。
  19. 如申請專利範圍第11項所述之晶片封裝結構,其中該第一晶片、第二晶片及第三晶片包括高功率晶片、高發熱晶片。
  20. 如申請專利範圍第11項所述之晶片封裝結構,其中該外部元件包括儲能元件。
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