TWI460532B - 防塵薄膜組件框架、其製造方法以及防塵薄膜組件 - Google Patents

防塵薄膜組件框架、其製造方法以及防塵薄膜組件 Download PDF

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Publication number
TWI460532B
TWI460532B TW101111859A TW101111859A TWI460532B TW I460532 B TWI460532 B TW I460532B TW 101111859 A TW101111859 A TW 101111859A TW 101111859 A TW101111859 A TW 101111859A TW I460532 B TWI460532 B TW I460532B
Authority
TW
Taiwan
Prior art keywords
frame
pellicle
pellicle frame
carbon fibers
sheet
Prior art date
Application number
TW101111859A
Other languages
English (en)
Chinese (zh)
Other versions
TW201303485A (zh
Inventor
Kazutoshi Sekihara
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of TW201303485A publication Critical patent/TW201303485A/zh
Application granted granted Critical
Publication of TWI460532B publication Critical patent/TWI460532B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
TW101111859A 2011-04-04 2012-04-03 防塵薄膜組件框架、其製造方法以及防塵薄膜組件 TWI460532B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011082844A JP5663376B2 (ja) 2011-04-04 2011-04-04 ペリクルフレーム、その製造方法、及びペリクル

Publications (2)

Publication Number Publication Date
TW201303485A TW201303485A (zh) 2013-01-16
TWI460532B true TWI460532B (zh) 2014-11-11

Family

ID=46992130

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101111859A TWI460532B (zh) 2011-04-04 2012-04-03 防塵薄膜組件框架、其製造方法以及防塵薄膜組件

Country Status (5)

Country Link
JP (1) JP5663376B2 (ja)
KR (1) KR101746874B1 (ja)
CN (1) CN102736401B (ja)
HK (1) HK1174400A1 (ja)
TW (1) TWI460532B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5940283B2 (ja) * 2011-11-04 2016-06-29 信越化学工業株式会社 ペリクル
JP6027319B2 (ja) * 2012-03-02 2016-11-16 旭化成株式会社 塗装材及びペリクル
CN103279008A (zh) * 2013-05-23 2013-09-04 上海华力微电子有限公司 掩膜板覆盖膜设计方法
CN111458973B (zh) 2014-11-17 2024-02-09 Asml荷兰有限公司 表膜框架附接设备
KR102495880B1 (ko) * 2022-09-06 2023-02-06 주식회사에이피에스케미칼 카본복합재 펠리클 프레임 제조방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006301525A (ja) * 2005-04-25 2006-11-02 Shin Etsu Chem Co Ltd ペリクルフレーム
US20060257754A1 (en) * 2005-05-09 2006-11-16 Mitsui Chemicals, Inc. Pellicles having low adhesive residue
US20090068573A1 (en) * 2007-09-05 2009-03-12 Toru Shirasaki Pellicle frame

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JP2630396B2 (ja) * 1987-04-30 1997-07-16 三菱レイヨン株式会社 ドクターナイフブレード
JPH04279331A (ja) * 1991-03-08 1992-10-05 Sekisui Chem Co Ltd 繊維強化樹脂積層体
JP2001291757A (ja) * 2000-02-03 2001-10-19 Nippon Mitsubishi Oil Corp 加工面を被覆処理したｃｆｒｐ製搬送用部材およびその処理方法
JP4116236B2 (ja) * 2000-10-06 2008-07-09 東芝アイテック株式会社 積層部材およびそれを用いた回転電機
JP2002161157A (ja) * 2000-11-27 2002-06-04 Toho Tenax Co Ltd 硬質被膜を有する炭素繊維強化樹脂複合材料製板材
JP2002295737A (ja) * 2001-03-29 2002-10-09 Toray Ind Inc 炭素繊維強化プラスチック製角形管およびその製造方法
JP4024596B2 (ja) * 2002-06-03 2007-12-19 三菱電機株式会社 光学機器用反射鏡およびその製造方法
JP4324944B2 (ja) * 2005-06-29 2009-09-02 信越ポリマー株式会社 精密部材収納容器
JP2007082645A (ja) * 2005-09-21 2007-04-05 Asahi Glass Matex Co Ltd 洗浄用ブラシ
KR101191055B1 (ko) * 2007-07-06 2012-10-15 아사히 가세이 이-매터리얼즈 가부시키가이샤 대형 펠리클 프레임체 및 그 프레임체의 파지 방법
JP2009139879A (ja) * 2007-12-11 2009-06-25 Toppan Printing Co Ltd ペリクル
JP2009233254A (ja) * 2008-03-28 2009-10-15 Toray Ind Inc Ｘ線診断装置用天板およびその製造方法
JP2010076356A (ja) * 2008-09-29 2010-04-08 Toray Ind Inc プリフォームおよび繊維強化プラスチックの成型方法
JP5133229B2 (ja) * 2008-12-05 2013-01-30 信越ポリマー株式会社 ペリクル収納容器
JP5280243B2 (ja) * 2009-02-16 2013-09-04 東海旅客鉄道株式会社 まくら木
EP2415649A4 (en) * 2009-03-30 2014-06-18 Kawasaki Heavy Ind Ltd BRAKE VEHICLE BODY STRUCTURE AND METHOD OF MANUFACTURING THE SAME
JP2011052417A (ja) * 2009-08-31 2011-03-17 Sekisui Chem Co Ltd 転轍機取付用まくら木

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006301525A (ja) * 2005-04-25 2006-11-02 Shin Etsu Chem Co Ltd ペリクルフレーム
TWI323385B (en) * 2005-04-25 2010-04-11 Shinetsu Chemical Co Pellicle frame
US20060257754A1 (en) * 2005-05-09 2006-11-16 Mitsui Chemicals, Inc. Pellicles having low adhesive residue
US20090068573A1 (en) * 2007-09-05 2009-03-12 Toru Shirasaki Pellicle frame

Also Published As

Publication number Publication date
TW201303485A (zh) 2013-01-16
HK1174400A1 (en) 2013-06-07
JP5663376B2 (ja) 2015-02-04
KR20120113176A (ko) 2012-10-12
CN102736401A (zh) 2012-10-17
JP2012220532A (ja) 2012-11-12
KR101746874B1 (ko) 2017-06-14
CN102736401B (zh) 2015-01-21

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