HK1174400A1 - Frame for dust-prevention film component, the manufacturing method thereof, and dust-prevention film component - Google Patents

Frame for dust-prevention film component, the manufacturing method thereof, and dust-prevention film component

Info

Publication number
HK1174400A1
HK1174400A1 HK13101207.2A HK13101207A HK1174400A1 HK 1174400 A1 HK1174400 A1 HK 1174400A1 HK 13101207 A HK13101207 A HK 13101207A HK 1174400 A1 HK1174400 A1 HK 1174400A1
Authority
HK
Hong Kong
Prior art keywords
dust
prevention film
film component
manufacturing
frame
Prior art date
Application number
HK13101207.2A
Other languages
English (en)
Chinese (zh)
Inventor
関原敏
Original Assignee
信越化學工業株式會社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 信越化學工業株式會社 filed Critical 信越化學工業株式會社
Publication of HK1174400A1 publication Critical patent/HK1174400A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
HK13101207.2A 2011-04-04 2013-01-28 Frame for dust-prevention film component, the manufacturing method thereof, and dust-prevention film component HK1174400A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011082844A JP5663376B2 (ja) 2011-04-04 2011-04-04 ペリクルフレーム、その製造方法、及びペリクル

Publications (1)

Publication Number Publication Date
HK1174400A1 true HK1174400A1 (en) 2013-06-07

Family

ID=46992130

Family Applications (1)

Application Number Title Priority Date Filing Date
HK13101207.2A HK1174400A1 (en) 2011-04-04 2013-01-28 Frame for dust-prevention film component, the manufacturing method thereof, and dust-prevention film component

Country Status (5)

Country Link
JP (1) JP5663376B2 (xx)
KR (1) KR101746874B1 (xx)
CN (1) CN102736401B (xx)
HK (1) HK1174400A1 (xx)
TW (1) TWI460532B (xx)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5940283B2 (ja) * 2011-11-04 2016-06-29 信越化学工業株式会社 ペリクル
JP6027319B2 (ja) * 2012-03-02 2016-11-16 旭化成株式会社 塗装材及びペリクル
CN103279008A (zh) * 2013-05-23 2013-09-04 上海华力微电子有限公司 掩膜板覆盖膜设计方法
CN111458973B (zh) 2014-11-17 2024-02-09 Asml荷兰有限公司 表膜框架附接设备
KR102495880B1 (ko) * 2022-09-06 2023-02-06 주식회사에이피에스케미칼 카본복합재 펠리클 프레임 제조방법

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2630396B2 (ja) * 1987-04-30 1997-07-16 三菱レイヨン株式会社 ドクターナイフブレード
JPH04279331A (ja) * 1991-03-08 1992-10-05 Sekisui Chem Co Ltd 繊維強化樹脂積層体
JP2001291757A (ja) * 2000-02-03 2001-10-19 Nippon Mitsubishi Oil Corp 加工面を被覆処理したｃｆｒｐ製搬送用部材およびその処理方法
JP4116236B2 (ja) * 2000-10-06 2008-07-09 東芝アイテック株式会社 積層部材およびそれを用いた回転電機
JP2002161157A (ja) * 2000-11-27 2002-06-04 Toho Tenax Co Ltd 硬質被膜を有する炭素繊維強化樹脂複合材料製板材
JP2002295737A (ja) * 2001-03-29 2002-10-09 Toray Ind Inc 炭素繊維強化プラスチック製角形管およびその製造方法
JP4024596B2 (ja) * 2002-06-03 2007-12-19 三菱電機株式会社 光学機器用反射鏡およびその製造方法
JP2006301525A (ja) * 2005-04-25 2006-11-02 Shin Etsu Chem Co Ltd ペリクルフレーム
KR20060116152A (ko) * 2005-05-09 2006-11-14 미쓰이 가가쿠 가부시키가이샤 오염이 적은 펠리클
JP4324944B2 (ja) * 2005-06-29 2009-09-02 信越ポリマー株式会社 精密部材収納容器
JP2007082645A (ja) * 2005-09-21 2007-04-05 Asahi Glass Matex Co Ltd 洗浄用ブラシ
KR101191055B1 (ko) * 2007-07-06 2012-10-15 아사히 가세이 이-매터리얼즈 가부시키가이샤 대형 펠리클 프레임체 및 그 프레임체의 파지 방법
JP2009063740A (ja) * 2007-09-05 2009-03-26 Shin Etsu Chem Co Ltd ペリクルフレーム
JP2009139879A (ja) * 2007-12-11 2009-06-25 Toppan Printing Co Ltd ペリクル
JP2009233254A (ja) * 2008-03-28 2009-10-15 Toray Ind Inc Ｘ線診断装置用天板およびその製造方法
JP2010076356A (ja) * 2008-09-29 2010-04-08 Toray Ind Inc プリフォームおよび繊維強化プラスチックの成型方法
JP5133229B2 (ja) * 2008-12-05 2013-01-30 信越ポリマー株式会社 ペリクル収納容器
JP5280243B2 (ja) * 2009-02-16 2013-09-04 東海旅客鉄道株式会社 まくら木
EP2415649A4 (en) * 2009-03-30 2014-06-18 Kawasaki Heavy Ind Ltd BRAKE VEHICLE BODY STRUCTURE AND METHOD OF MANUFACTURING THE SAME
JP2011052417A (ja) * 2009-08-31 2011-03-17 Sekisui Chem Co Ltd 転轍機取付用まくら木

Also Published As

Publication number Publication date
TW201303485A (zh) 2013-01-16
JP5663376B2 (ja) 2015-02-04
KR20120113176A (ko) 2012-10-12
CN102736401A (zh) 2012-10-17
JP2012220532A (ja) 2012-11-12
TWI460532B (zh) 2014-11-11
KR101746874B1 (ko) 2017-06-14
CN102736401B (zh) 2015-01-21

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20220330