TWI456079B - 石墨烯製造用銅箔及其製造方法、以及石墨烯之製造方法 - Google Patents
石墨烯製造用銅箔及其製造方法、以及石墨烯之製造方法 Download PDFInfo
- Publication number
- TWI456079B TWI456079B TW101140271A TW101140271A TWI456079B TW I456079 B TWI456079 B TW I456079B TW 101140271 A TW101140271 A TW 101140271A TW 101140271 A TW101140271 A TW 101140271A TW I456079 B TWI456079 B TW I456079B
- Authority
- TW
- Taiwan
- Prior art keywords
- graphene
- producing
- copper foil
- copper
- rolling
- Prior art date
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims 19
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims 18
- 229910021389 graphene Inorganic materials 0.000 title claims 18
- 239000011889 copper foil Substances 0.000 title claims 12
- 238000004519 manufacturing process Methods 0.000 title claims 11
- 229910052802 copper Inorganic materials 0.000 claims 6
- 239000010949 copper Substances 0.000 claims 6
- 238000005096 rolling process Methods 0.000 claims 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 229910052786 argon Inorganic materials 0.000 claims 1
- 238000003490 calendering Methods 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000005097 cold rolling Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/40—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling foils which present special problems, e.g. because of thinness
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/10—Removing layers, or parts of layers, mechanically or chemically
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
- B21B1/227—Surface roughening or texturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
- C01B32/186—Preparation by chemical vapour deposition [CVD]
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/02—Alloys based on copper with tin as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0254—Physical treatment to alter the texture of the surface, e.g. scratching or polishing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
- B21B2003/005—Copper or its alloys
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B27/00—Rolls, roll alloys or roll fabrication; Lubricating, cooling or heating rolls while in use
- B21B27/005—Rolls with a roughened or textured surface; Methods for making same
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011241953 | 2011-11-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201323633A TW201323633A (zh) | 2013-06-16 |
TWI456079B true TWI456079B (zh) | 2014-10-11 |
Family
ID=48191950
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101140271A TWI456079B (zh) | 2011-11-04 | 2012-10-31 | 石墨烯製造用銅箔及其製造方法、以及石墨烯之製造方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20140246399A1 (ko) |
EP (1) | EP2762446B1 (ko) |
JP (1) | JP5847834B2 (ko) |
KR (1) | KR101589392B1 (ko) |
CN (1) | CN104024156B (ko) |
ES (1) | ES2639493T3 (ko) |
TW (1) | TWI456079B (ko) |
WO (1) | WO2013065601A1 (ko) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5822669B2 (ja) | 2011-02-18 | 2015-11-24 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 |
EP2716601B1 (en) | 2011-06-02 | 2017-03-15 | JX Nippon Mining & Metals Corporation | Copper foil for manufacturing graphene and graphene manufacturing method |
JP5850720B2 (ja) | 2011-06-02 | 2016-02-03 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔、及びグラフェンの製造方法 |
JP5721609B2 (ja) | 2011-11-15 | 2015-05-20 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔、及びグラフェンの製造方法 |
JP2014037577A (ja) * | 2012-08-16 | 2014-02-27 | Jx Nippon Mining & Metals Corp | グラフェン製造用圧延銅箔、及びグラフェンの製造方法 |
JP5865211B2 (ja) * | 2012-08-16 | 2016-02-17 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 |
JP6078024B2 (ja) | 2014-06-13 | 2017-02-08 | Jx金属株式会社 | 2次元六角形格子化合物製造用圧延銅箔、及び2次元六角形格子化合物の製造方法 |
TWI592294B (zh) * | 2015-06-22 | 2017-07-21 | Univ Chung Yuan Christian | Metal foil and its composite heat sink |
CN105058213A (zh) * | 2015-08-10 | 2015-11-18 | 常州二维碳素科技股份有限公司 | 一种连续抛光设备 |
JP6177299B2 (ja) * | 2015-11-04 | 2017-08-09 | Jx金属株式会社 | メタルマスク材料及びメタルマスク |
US11031240B2 (en) | 2016-03-08 | 2021-06-08 | Xidian University | Method for growing gallium nitride based on graphene and magnetron sputtered aluminum nitride |
KR101802948B1 (ko) * | 2016-04-28 | 2017-11-29 | 일진머티리얼즈 주식회사 | 그래핀용 전해동박 및 그의 제조방법 |
CN111349905B (zh) * | 2019-10-29 | 2022-03-29 | 北京碳垣新材料科技有限公司 | 增强型铜基复合线材的制备方法 |
US11447887B2 (en) | 2020-12-10 | 2022-09-20 | Saudi Arabian Oil Company | Surface smoothing of copper by electropolishing |
US11512400B2 (en) | 2020-12-10 | 2022-11-29 | Saudi Arabian Oil Company | Electrochemical reduction of carbon dioxide |
US11718575B2 (en) | 2021-08-12 | 2023-08-08 | Saudi Arabian Oil Company | Methanol production via dry reforming and methanol synthesis in a vessel |
US11787759B2 (en) | 2021-08-12 | 2023-10-17 | Saudi Arabian Oil Company | Dimethyl ether production via dry reforming and dimethyl ether synthesis in a vessel |
US11578016B1 (en) | 2021-08-12 | 2023-02-14 | Saudi Arabian Oil Company | Olefin production via dry reforming and olefin synthesis in a vessel |
US11617981B1 (en) | 2022-01-03 | 2023-04-04 | Saudi Arabian Oil Company | Method for capturing CO2 with assisted vapor compression |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004074214A (ja) * | 2002-08-16 | 2004-03-11 | Nikko Metal Manufacturing Co Ltd | ラミネート材とのピーリング強度を向上した金属圧延箔 |
JP2010227971A (ja) * | 2009-03-27 | 2010-10-14 | Nippon Mining & Metals Co Ltd | 圧延銅箔 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101344493B1 (ko) | 2007-12-17 | 2013-12-24 | 삼성전자주식회사 | 단결정 그라펜 시트 및 그의 제조방법 |
JP5822669B2 (ja) * | 2011-02-18 | 2015-11-24 | Jx日鉱日石金属株式会社 | グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法 |
JP2014037577A (ja) * | 2012-08-16 | 2014-02-27 | Jx Nippon Mining & Metals Corp | グラフェン製造用圧延銅箔、及びグラフェンの製造方法 |
-
2012
- 2012-10-26 ES ES12845162.2T patent/ES2639493T3/es active Active
- 2012-10-26 CN CN201280053628.7A patent/CN104024156B/zh active Active
- 2012-10-26 US US14/355,348 patent/US20140246399A1/en not_active Abandoned
- 2012-10-26 KR KR1020147010266A patent/KR101589392B1/ko active IP Right Grant
- 2012-10-26 EP EP12845162.2A patent/EP2762446B1/en active Active
- 2012-10-26 JP JP2013541754A patent/JP5847834B2/ja active Active
- 2012-10-26 WO PCT/JP2012/077745 patent/WO2013065601A1/ja active Application Filing
- 2012-10-31 TW TW101140271A patent/TWI456079B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004074214A (ja) * | 2002-08-16 | 2004-03-11 | Nikko Metal Manufacturing Co Ltd | ラミネート材とのピーリング強度を向上した金属圧延箔 |
JP2010227971A (ja) * | 2009-03-27 | 2010-10-14 | Nippon Mining & Metals Co Ltd | 圧延銅箔 |
Non-Patent Citations (1)
Title |
---|
Zhengtang Luo et al.,"Effect of Substrate Roughness and Feedstock Concentration on Growth of Wafer-Scale Graphene at Atmospheric Pressure", Chem. Mater., 2011, 23, 1441-1447 * |
Also Published As
Publication number | Publication date |
---|---|
KR20140092310A (ko) | 2014-07-23 |
WO2013065601A1 (ja) | 2013-05-10 |
EP2762446A4 (en) | 2015-01-28 |
EP2762446A1 (en) | 2014-08-06 |
KR101589392B1 (ko) | 2016-01-27 |
ES2639493T3 (es) | 2017-10-26 |
US20140246399A1 (en) | 2014-09-04 |
JP5847834B2 (ja) | 2016-01-27 |
EP2762446B1 (en) | 2017-06-07 |
JPWO2013065601A1 (ja) | 2015-04-02 |
CN104024156B (zh) | 2016-03-30 |
CN104024156A (zh) | 2014-09-03 |
TW201323633A (zh) | 2013-06-16 |
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