TWI447782B - 圖案形成方法及用於它之感光性樹脂組成物 - Google Patents

圖案形成方法及用於它之感光性樹脂組成物 Download PDF

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Publication number
TWI447782B
TWI447782B TW096149676A TW96149676A TWI447782B TW I447782 B TWI447782 B TW I447782B TW 096149676 A TW096149676 A TW 096149676A TW 96149676 A TW96149676 A TW 96149676A TW I447782 B TWI447782 B TW I447782B
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TW
Taiwan
Prior art keywords
coating
propylene glycol
solvent
alkyl group
mixed solvent
Prior art date
Application number
TW096149676A
Other languages
English (en)
Chinese (zh)
Other versions
TW200849329A (en
Inventor
Shunji Kawato
Katsuto Taniguchi
Yoshisuke Toyama
Original Assignee
Az Electronic Mat Ip Japan Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Az Electronic Mat Ip Japan Kk filed Critical Az Electronic Mat Ip Japan Kk
Publication of TW200849329A publication Critical patent/TW200849329A/zh
Application granted granted Critical
Publication of TWI447782B publication Critical patent/TWI447782B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW096149676A 2006-12-25 2007-12-24 圖案形成方法及用於它之感光性樹脂組成物 TWI447782B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006347323A JP4403174B2 (ja) 2006-12-25 2006-12-25 パターン形成方法およびそれに用いる感光性樹脂組成物

Publications (2)

Publication Number Publication Date
TW200849329A TW200849329A (en) 2008-12-16
TWI447782B true TWI447782B (zh) 2014-08-01

Family

ID=39562466

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096149676A TWI447782B (zh) 2006-12-25 2007-12-24 圖案形成方法及用於它之感光性樹脂組成物

Country Status (5)

Country Link
JP (1) JP4403174B2 (ja)
KR (1) KR101330558B1 (ja)
CN (1) CN101553758B (ja)
TW (1) TWI447782B (ja)
WO (1) WO2008078676A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5329999B2 (ja) * 2009-01-29 2013-10-30 ＡｚエレクトロニックマテリアルズＩｐ株式会社 パターン形成方法
US8257901B2 (en) 2009-03-10 2012-09-04 Lg Chem, Ltd. Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same
JP4911248B2 (ja) * 2009-09-10 2012-04-04 東レ株式会社 感光性樹脂組成物および感光性樹脂膜の製造方法
JP5924760B2 (ja) * 2011-12-06 2016-05-25 東京応化工業株式会社 スピンレスコーティング用レジストの製造方法
KR101729599B1 (ko) * 2012-09-28 2017-04-24 후지필름 가부시키가이샤 감광성 수지 조성물, 이것을 사용한 패턴의 제조 방법
KR20150091380A (ko) * 2013-02-14 2015-08-10 후지필름 가부시키가이샤 잉크젯 도포용 감광성 수지 조성물, 열 처리물 및 그 제조 방법, 수지 패턴 제조 방법, 액정 표시 장치, 유기 el 표시 장치, 터치패널 및 그 제조 방법, 및 터치패널 표시 장치
TWI731961B (zh) * 2016-04-19 2021-07-01 德商馬克專利公司 正向感光材料及形成正向凸紋影像之方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1881080A (zh) * 2005-06-15 2006-12-20 Jsr株式会社 感光性树脂组合物、显示面板用间隔物和显示面板

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JPH08110634A (ja) * 1994-10-07 1996-04-30 Fuji Photo Film Co Ltd フォトレジスト塗布液
JPH10186637A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP2002267833A (ja) 2001-03-14 2002-09-18 Toray Ind Inc 液晶ディスプレイ用カラーフィルタの製造方法。
KR100973799B1 (ko) * 2003-01-03 2010-08-03 삼성전자주식회사 Ｍｍｎ 헤드 코터용 포토레지스트 조성물
KR20040092550A (ko) * 2003-04-24 2004-11-04 클라리언트 인터내셔널 리미티드 레지스트 조성물 및 레지스트 제거용 유기용제
JP2005234045A (ja) * 2004-02-17 2005-09-02 Fujifilm Electronic Materials Co Ltd 着色樹脂組成物
JP2005257884A (ja) * 2004-03-10 2005-09-22 Fuji Photo Film Co Ltd ポジ型レジスト組成物及びパターン形成方法
KR101042667B1 (ko) * 2004-07-05 2011-06-20 주식회사 동진쎄미켐 포토레지스트 조성물
JP4687902B2 (ja) * 2005-06-15 2011-05-25 Ｊｓｒ株式会社 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP4661384B2 (ja) * 2005-06-16 2011-03-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP2007219499A (ja) * 2006-01-18 2007-08-30 Fujifilm Electronic Materials Co Ltd 光硬化性組成物並びにそれを用いたカラーフィルタ及びその製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1881080A (zh) * 2005-06-15 2006-12-20 Jsr株式会社 感光性树脂组合物、显示面板用间隔物和显示面板

Also Published As

Publication number Publication date
JP4403174B2 (ja) 2010-01-20
JP2008158281A (ja) 2008-07-10
CN101553758B (zh) 2012-04-04
CN101553758A (zh) 2009-10-07
KR101330558B1 (ko) 2013-11-18
KR20090094216A (ko) 2009-09-04
WO2008078676A1 (ja) 2008-07-03
TW200849329A (en) 2008-12-16

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