CN101553758B - 图案的形成方法及其所使用的感光性树脂组合物 - Google Patents

图案的形成方法及其所使用的感光性树脂组合物 Download PDF

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Publication number
CN101553758B
CN101553758B CN2007800394213A CN200780039421A CN101553758B CN 101553758 B CN101553758 B CN 101553758B CN 2007800394213 A CN2007800394213 A CN 2007800394213A CN 200780039421 A CN200780039421 A CN 200780039421A CN 101553758 B CN101553758 B CN 101553758B
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China
Prior art keywords
pattern
solvent
polymer combination
mixed solvent
photosensitive polymer
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Chinese (zh)
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CN101553758A (zh
Inventor
河户俊二
远山宜亮
谷口克人
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Merck Patent GmbH
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Az电子材料（日本）株式会社
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN2007800394213A 2006-12-25 2007-12-21 图案的形成方法及其所使用的感光性树脂组合物 Active CN101553758B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006347323A JP4403174B2 (ja) 2006-12-25 2006-12-25 パターン形成方法およびそれに用いる感光性樹脂組成物
JP347323/2006 2006-12-25
PCT/JP2007/074643 WO2008078676A1 (ja) 2006-12-25 2007-12-21 パターン形成方法およびそれに用いる感光性樹脂組成物

Publications (2)

Publication Number Publication Date
CN101553758A CN101553758A (zh) 2009-10-07
CN101553758B true CN101553758B (zh) 2012-04-04

Family

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CN2007800394213A Active CN101553758B (zh) 2006-12-25 2007-12-21 图案的形成方法及其所使用的感光性树脂组合物

Country Status (5)

Country Link
JP (1) JP4403174B2 (ja)
KR (1) KR101330558B1 (ja)
CN (1) CN101553758B (ja)
TW (1) TWI447782B (ja)
WO (1) WO2008078676A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5329999B2 (ja) 2009-01-29 2013-10-30 ＡｚエレクトロニックマテリアルズＩｐ株式会社 パターン形成方法
US8257901B2 (en) 2009-03-10 2012-09-04 Lg Chem, Ltd. Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same
CN102549497B (zh) * 2009-09-10 2013-07-31 东丽株式会社 感光性树脂组合物及感光性树脂膜的制造方法
JP5924760B2 (ja) * 2011-12-06 2016-05-25 東京応化工業株式会社 スピンレスコーティング用レジストの製造方法
CN104662476B (zh) * 2012-09-28 2019-04-23 富士胶片株式会社 感光性树脂组合物、图案的制造方法、硬化膜、有机el显示装置及液晶显示装置的制造方法
WO2014126034A1 (ja) * 2013-02-14 2014-08-21 富士フイルム株式会社 インクジェット塗布用感光性樹脂組成物、熱処理物及びその製造方法、樹脂パターン製造方法、液晶表示装置、有機ｅｌ表示装置、タッチパネル及びその製造方法、並びに、タッチパネル表示装置
TWI731961B (zh) 2016-04-19 2021-07-01 德商馬克專利公司 正向感光材料及形成正向凸紋影像之方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1191992A (zh) * 1996-12-26 1998-09-02 克拉瑞特国际有限公司 滚涂用敏射线组合物
CN1550897A (zh) * 2003-01-03 2004-12-01 ���ǵ�����ʽ���� 用于多个微型喷嘴涂布机的光致抗蚀剂组合物
CN1721989A (zh) * 2004-07-05 2006-01-18 东进世美肯株式会社 光致抗蚀剂组合物
CN1777842A (zh) * 2003-04-24 2006-05-24 Az电子材料（日本）株式会社 抗蚀剂组合物以及用于除去抗蚀剂的有机溶剂
CN1881081A (zh) * 2005-06-16 2006-12-20 Jsr株式会社 用于形成着色层的放射线敏感性组合物和滤色器
CN1881080A (zh) * 2005-06-15 2006-12-20 Jsr株式会社 感光性树脂组合物、显示面板用间隔物和显示面板

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08110634A (ja) * 1994-10-07 1996-04-30 Fuji Photo Film Co Ltd フォトレジスト塗布液
JP2002267833A (ja) 2001-03-14 2002-09-18 Toray Ind Inc 液晶ディスプレイ用カラーフィルタの製造方法。
JP2005234045A (ja) * 2004-02-17 2005-09-02 Fujifilm Electronic Materials Co Ltd 着色樹脂組成物
JP2005257884A (ja) * 2004-03-10 2005-09-22 Fuji Photo Film Co Ltd ポジ型レジスト組成物及びパターン形成方法
JP4687902B2 (ja) * 2005-06-15 2011-05-25 Ｊｓｒ株式会社 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP2007219499A (ja) * 2006-01-18 2007-08-30 Fujifilm Electronic Materials Co Ltd 光硬化性組成物並びにそれを用いたカラーフィルタ及びその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1191992A (zh) * 1996-12-26 1998-09-02 克拉瑞特国际有限公司 滚涂用敏射线组合物
CN1550897A (zh) * 2003-01-03 2004-12-01 ���ǵ�����ʽ���� 用于多个微型喷嘴涂布机的光致抗蚀剂组合物
CN1777842A (zh) * 2003-04-24 2006-05-24 Az电子材料（日本）株式会社 抗蚀剂组合物以及用于除去抗蚀剂的有机溶剂
CN1721989A (zh) * 2004-07-05 2006-01-18 东进世美肯株式会社 光致抗蚀剂组合物
CN1881080A (zh) * 2005-06-15 2006-12-20 Jsr株式会社 感光性树脂组合物、显示面板用间隔物和显示面板
CN1881081A (zh) * 2005-06-16 2006-12-20 Jsr株式会社 用于形成着色层的放射线敏感性组合物和滤色器

Also Published As

Publication number Publication date
JP2008158281A (ja) 2008-07-10
KR20090094216A (ko) 2009-09-04
CN101553758A (zh) 2009-10-07
TWI447782B (zh) 2014-08-01
WO2008078676A1 (ja) 2008-07-03
JP4403174B2 (ja) 2010-01-20
KR101330558B1 (ko) 2013-11-18
TW200849329A (en) 2008-12-16

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